CN113330140B - 成膜品的制造方法及溅射装置 - Google Patents
成膜品的制造方法及溅射装置 Download PDFInfo
- Publication number
- CN113330140B CN113330140B CN201980089119.1A CN201980089119A CN113330140B CN 113330140 B CN113330140 B CN 113330140B CN 201980089119 A CN201980089119 A CN 201980089119A CN 113330140 B CN113330140 B CN 113330140B
- Authority
- CN
- China
- Prior art keywords
- workpiece
- film
- rotation
- rotation axis
- rotating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004544 sputter deposition Methods 0.000 title claims abstract description 44
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 25
- 238000005477 sputtering target Methods 0.000 claims description 16
- 238000012545 processing Methods 0.000 claims description 11
- 239000010410 layer Substances 0.000 claims description 6
- 238000005546 reactive sputtering Methods 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- 239000002356 single layer Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 31
- 239000010408 film Substances 0.000 description 91
- 239000010409 thin film Substances 0.000 description 18
- 239000000463 material Substances 0.000 description 17
- 230000002093 peripheral effect Effects 0.000 description 15
- 230000007547 defect Effects 0.000 description 14
- 239000011248 coating agent Substances 0.000 description 13
- 238000000576 coating method Methods 0.000 description 13
- 230000015572 biosynthetic process Effects 0.000 description 11
- 238000011156 evaluation Methods 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 10
- 239000002245 particle Substances 0.000 description 8
- 230000001105 regulatory effect Effects 0.000 description 7
- 238000005520 cutting process Methods 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 6
- 238000005299 abrasion Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 5
- 238000003754 machining Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000001659 ion-beam spectroscopy Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000002035 prolonged effect Effects 0.000 description 2
- 238000001552 radio frequency sputter deposition Methods 0.000 description 2
- 238000009987 spinning Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910000531 Co alloy Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000011982 device technology Methods 0.000 description 1
- 238000004512 die casting Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000007737 ion beam deposition Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23B—TURNING; BORING
- B23B27/00—Tools for turning or boring machines; Tools of a similar kind in general; Accessories therefor
- B23B27/14—Cutting tools of which the bits or tips or cutting inserts are of special material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23C—MILLING
- B23C5/00—Milling-cutters
- B23C5/16—Milling-cutters characterised by physical features other than shape
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Cutting Tools, Boring Holders, And Turrets (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-024033 | 2019-02-14 | ||
| JP2019024033A JP6772315B2 (ja) | 2019-02-14 | 2019-02-14 | 成膜品の製造方法及びスパッタリング装置 |
| PCT/JP2019/046043 WO2020166167A1 (ja) | 2019-02-14 | 2019-11-26 | 成膜品の製造方法及びスパッタリング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113330140A CN113330140A (zh) | 2021-08-31 |
| CN113330140B true CN113330140B (zh) | 2024-05-28 |
Family
ID=72044955
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201980089119.1A Active CN113330140B (zh) | 2019-02-14 | 2019-11-26 | 成膜品的制造方法及溅射装置 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JP6772315B2 (ja) |
| KR (1) | KR102615201B1 (ja) |
| CN (1) | CN113330140B (ja) |
| TW (1) | TWI737048B (ja) |
| WO (1) | WO2020166167A1 (ja) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114959610B (zh) * | 2022-05-30 | 2023-08-22 | 陕西工业职业技术学院 | 一种平行臂式三自由协同驱动型薄膜掠射角溅射平台 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005208212A (ja) * | 2004-01-21 | 2005-08-04 | Olympus Corp | 反射膜の形成方法及び回転多面鏡 |
| JP2007077469A (ja) * | 2005-09-15 | 2007-03-29 | Nachi Fujikoshi Corp | コーティング小径工具及びその製造装置 |
| JP2011168827A (ja) * | 2010-02-17 | 2011-09-01 | Hitachi Kokusai Electric Inc | 基板処理装置及び半導体装置の製造方法 |
| CN106256926A (zh) * | 2015-06-17 | 2016-12-28 | 动力专家有限公司 | 涂覆制品的设备、装置和方法 |
| US20170183769A1 (en) * | 2015-03-20 | 2017-06-29 | Shibaura Mechatronics Corporation | Film formation apparatus and film-formed workpiece manufacturing method |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3611492A1 (de) * | 1986-04-05 | 1987-10-22 | Leybold Heraeus Gmbh & Co Kg | Verfahren und vorrichtung zum beschichten von werkzeugen fuer die zerspanungs- und umformtechnik mit hartstoffschichten |
| WO2007011751A2 (en) * | 2005-07-14 | 2007-01-25 | Nanonexus, Inc. | Method and apparatus for producing controlled stresses and stress gradients in sputtered films |
| JP2008013817A (ja) * | 2006-07-06 | 2008-01-24 | Fujifilm Corp | スパッタリングによる薄膜の製造方法及び製造装置 |
| JP2012066341A (ja) * | 2010-09-24 | 2012-04-05 | Mitsubishi Materials Corp | 表面被覆立方晶窒化ほう素基超高圧焼結材料製切削工具 |
| JP5634289B2 (ja) * | 2011-02-08 | 2014-12-03 | 株式会社アルバック | 真空処理方法 |
| JP6000173B2 (ja) * | 2013-03-19 | 2016-09-28 | 株式会社神戸製鋼所 | Ｐｖｄ処理装置及びｐｖｄ処理方法 |
| JP5793737B1 (ja) * | 2014-07-10 | 2015-10-14 | ナルックス株式会社 | 蒸着装置 |
-
2019
- 2019-02-14 JP JP2019024033A patent/JP6772315B2/ja active Active
- 2019-11-26 WO PCT/JP2019/046043 patent/WO2020166167A1/ja active Application Filing
- 2019-11-26 KR KR1020217022046A patent/KR102615201B1/ko active IP Right Grant
- 2019-11-26 TW TW108143023A patent/TWI737048B/zh active
- 2019-11-26 CN CN201980089119.1A patent/CN113330140B/zh active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005208212A (ja) * | 2004-01-21 | 2005-08-04 | Olympus Corp | 反射膜の形成方法及び回転多面鏡 |
| JP2007077469A (ja) * | 2005-09-15 | 2007-03-29 | Nachi Fujikoshi Corp | コーティング小径工具及びその製造装置 |
| JP2011168827A (ja) * | 2010-02-17 | 2011-09-01 | Hitachi Kokusai Electric Inc | 基板処理装置及び半導体装置の製造方法 |
| US20170183769A1 (en) * | 2015-03-20 | 2017-06-29 | Shibaura Mechatronics Corporation | Film formation apparatus and film-formed workpiece manufacturing method |
| CN106256926A (zh) * | 2015-06-17 | 2016-12-28 | 动力专家有限公司 | 涂覆制品的设备、装置和方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113330140A (zh) | 2021-08-31 |
| JP6772315B2 (ja) | 2020-10-21 |
| TW202045758A (zh) | 2020-12-16 |
| JP2020132906A (ja) | 2020-08-31 |
| WO2020166167A1 (ja) | 2020-08-20 |
| KR20210103509A (ko) | 2021-08-23 |
| KR102615201B1 (ko) | 2023-12-19 |
| TWI737048B (zh) | 2021-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |