CN113210873B - A kind of preparation method of metal nanomesh based on electronic dynamic regulation - Google Patents

A kind of preparation method of metal nanomesh based on electronic dynamic regulation Download PDF

Info

Publication number
CN113210873B
CN113210873B CN202110619429.9A CN202110619429A CN113210873B CN 113210873 B CN113210873 B CN 113210873B CN 202110619429 A CN202110619429 A CN 202110619429A CN 113210873 B CN113210873 B CN 113210873B
Authority
CN
China
Prior art keywords
metal
processed
mirror
femtosecond laser
nano
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202110619429.9A
Other languages
Chinese (zh)
Other versions
CN113210873A (en
Inventor
姜澜
刘威
胡洁
邱兆岭
柳海林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Institute of Technology BIT
Original Assignee
Beijing Institute of Technology BIT
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Institute of Technology BIT filed Critical Beijing Institute of Technology BIT
Priority to CN202110619429.9A priority Critical patent/CN113210873B/en
Publication of CN113210873A publication Critical patent/CN113210873A/en
Application granted granted Critical
Publication of CN113210873B publication Critical patent/CN113210873B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/352Working by laser beam, e.g. welding, cutting or boring for surface treatment
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0643Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising mirrors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/064Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
    • B23K26/0648Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)

Abstract

本发明涉及一种基于电子动态调控的金属纳米网的制备方法,属于激光应用技术领域。本发明基于电子动态调控的思想,使用偏振方向互相垂直的、脉冲延迟在4ps‑9ps范围内、双脉冲总能量密度在待加工金属材料的烧蚀阈值的0.9倍至0.99倍的范围内的飞秒激光双脉冲序列进行直写加工,在合适的扫描参数下,即可得到金属纳米网状结构。相比于传统加工方法,本发明无需掩膜、模板等,工艺过程简单,成本低。

Figure 202110619429

The invention relates to a preparation method of a metal nano-mesh based on electronic dynamic regulation, and belongs to the technical field of laser application. The present invention is based on the idea of electronic dynamic regulation, and uses the polarization directions perpendicular to each other, the pulse delay is in the range of 4ps-9ps, and the total energy density of the double pulse is in the range of 0.9 times to 0.99 times the ablation threshold of the metal material to be processed. Second laser double pulse sequence for direct writing processing, under suitable scanning parameters, the metal nano-network structure can be obtained. Compared with the traditional processing method, the present invention does not need a mask, a template, etc., the process is simple, and the cost is low.

Figure 202110619429

Description

一种基于电子动态调控的金属纳米网的制备方法A kind of preparation method of metal nanomesh based on electronic dynamic regulation

技术领域technical field

本发明涉及一种基于电子动态调控的金属纳米网的制备方法,属于激光应用技术领域。The invention relates to a preparation method of a metal nano-mesh based on electronic dynamic regulation, and belongs to the technical field of laser application.

背景技术Background technique

金属纳米网状结构是尺寸尺度在纳米量级的微纳结构,其结构尺寸在十几纳米至几十纳米之间。随着微纳米科技的快速发展,由于其在浸润性、表面增强拉曼散射、结构色表面、太阳能电池等领域有较大的应用前景,金属纳米网状结构的制备受到了广泛关注。当前,制备金属纳米网状结构的方法有模板辅助法、汽-液-固直接生长法、光刻以及薄膜沉积法等。然而,这些方法往往需要复杂的工艺流程以及昂贵的装置和苛刻的加工环境,使得金属纳米网状结构的制备成本较高。The metal nano-network structure is a micro-nano structure with a size scale in the nanometer scale, and its structure size is between ten nanometers to several tens of nanometers. With the rapid development of micro-nano technology, the preparation of metal nano-networks has received extensive attention due to its great application prospects in the fields of wettability, surface-enhanced Raman scattering, structural color surfaces, and solar cells. At present, the methods for preparing metal nano-networks include template-assisted method, vapor-liquid-solid direct growth method, photolithography, and thin film deposition method. However, these methods often require complicated process flow, expensive equipment and harsh processing environment, which makes the preparation cost of metal nano-networks relatively high.

近年来,飞秒激光由于其具有能实现纳米尺度加工、灵活的3D加工以及几乎能加工任何材料的能力,飞秒激光直写技术在金属微纳结构的制造领域中逐渐发挥了重大的作用。In recent years, femtosecond laser direct writing technology has gradually played an important role in the fabrication of metal micro-nano structures due to its ability to realize nano-scale processing, flexible 3D processing, and the ability to process almost any material.

发明内容SUMMARY OF THE INVENTION

本发明的目的是提供一种基于电子动态调控的使用飞秒激光制备金属纳米网状结构的方法,改方法使用偏振方向互相垂直的、脉冲延迟在4ps-9ps范围内的、双脉冲总能量密度在待加工金属材料的烧蚀阈值的0.9倍至0.99倍的范围内的飞秒激光双脉冲序列,在金属表面制备金属纳米网状结构。The purpose of the present invention is to provide a method for preparing a metal nano-mesh structure by using a femtosecond laser based on electronic dynamic regulation. A femtosecond laser double-pulse sequence in the range of 0.9 times to 0.99 times the ablation threshold of the metal material to be processed produces a metal nano-network structure on the metal surface.

为实现上述发明目的,本发明提供了一下技术方案:In order to realize the above-mentioned purpose of the invention, the present invention provides the following technical solutions:

一种基于电子动态调控的金属纳米网状结构的制备方法,包括如下步骤:A preparation method of a metal nano-network structure based on electronic dynamic regulation, comprising the following steps:

步骤一:将飞秒激光单脉冲经过迈克逊干涉仪与四分之一波片的组合光路转变为偏振方向互相垂直的飞秒激光双脉冲序列,然后调整飞秒激光双脉冲两个子脉冲能量相等,同时双脉冲总能量密度调整到待加工金属材料的烧蚀阈值的0.9倍至0.99倍的范围内;然后调节迈克尔逊干涉仪光路的一臂,使得飞秒激光双脉冲的脉冲延迟在4ps-9ps的范围内。Step 1: The femtosecond laser single pulse is transformed into a femtosecond laser double pulse sequence with the polarization directions perpendicular to each other through the combined optical path of the Michelson interferometer and the quarter-wave plate, and then the energy of the two sub-pulses of the femtosecond laser double pulse is adjusted to be equal , at the same time, the total energy density of the double pulse is adjusted to the range of 0.9 times to 0.99 times the ablation threshold of the metal material to be processed; in the range of 9ps.

步骤二:将步骤一中得到的飞秒激光双脉冲序列通过光学透镜垂直聚焦到待加工金属材料的表面,控制待加工金属材料以设定的移动速度运动,即可在金属表面得到金属纳米网状结构。Step 2: The femtosecond laser double-pulse sequence obtained in step 1 is vertically focused on the surface of the metal material to be processed through an optical lens, and the metal material to be processed is controlled to move at a set moving speed, and the metal nano-mesh can be obtained on the metal surface. like structure.

进一步的,步骤一产生偏振方向互相垂直的飞秒激光双脉冲序列过程中,四分之一波片的光轴与激光的偏振方向的夹角为45°。Further, in the process of generating the femtosecond laser double pulse sequence with the polarization directions perpendicular to each other in step 1, the included angle between the optical axis of the quarter-wave plate and the polarization direction of the laser light is 45°.

步骤二中,当使用的聚焦透镜为焦距为100mm的的平凸透镜时,激光重复频率为1000Hz,待加工金属材料的移动速度为200-500μm/s。In step 2, when the used focusing lens is a plano-convex lens with a focal length of 100 mm, the laser repetition frequency is 1000 Hz, and the moving speed of the metal material to be processed is 200-500 μm/s.

实现上述方法的装置,包括:飞秒激光器、第一反射镜、第二反射镜、第一衰减片、第三反射镜、一维平移台、分束镜、第二衰减片、四分之一波片、第四反射镜、第五反射镜、光快门、第六反射镜、第七反射镜、第八反射镜后,产生偏振方向互相垂直的、脉冲延迟在4ps-10ps范围内的飞秒激光双脉冲序列,经透镜聚焦后在待加工金属材料表面扫描加工即可制备出金属纳米网。The device for implementing the above method includes: a femtosecond laser, a first reflector, a second reflector, a first attenuator, a third reflector, a one-dimensional translation stage, a beam splitter, a second attenuator, a quarter After the wave plate, the fourth mirror, the fifth mirror, the optical shutter, the sixth mirror, the seventh mirror, and the eighth mirror, the polarization directions are perpendicular to each other, and the femtosecond pulse delay is in the range of 4ps-10ps. The laser double-pulse sequence, after being focused by a lens, scans and processes the surface of the metal material to be processed to prepare a metal nano-mesh.

有益效果:Beneficial effects:

本发明基于电子动态调控的思想,使用偏振方向互相垂直的、脉冲延迟在4ps-9ps范围内、双脉冲总能量密度在待加工金属材料的烧蚀阈值的0.9倍至0.99倍的范围内的飞秒激光双脉冲序列进行直写加工,在合适的扫描参数下,即可得到金属纳米网状结构。相比于传统加工方法,本发明无需掩膜、模板等,工艺过程简单,成本低。The present invention is based on the idea of electronic dynamic regulation, and uses the polarization directions perpendicular to each other, the pulse delay is in the range of 4ps-9ps, and the total energy density of the double pulse is in the range of 0.9 times to 0.99 times the ablation threshold of the metal material to be processed. Second laser double pulse sequence for direct writing processing, under suitable scanning parameters, the metal nano-network structure can be obtained. Compared with the traditional processing method, the present invention does not need a mask, a template, etc., the process is simple, and the cost is low.

附图说明Description of drawings

图1是本发明的加工方法的光路图。FIG. 1 is an optical path diagram of the processing method of the present invention.

图2是本发明实施例1所述的脉冲延迟为4ps在金属钛材料表面加工出的金属纳米网状结构的SEM图,(a)为低倍率下的图,(b)为高倍率下的放大图。2 is a SEM image of the metal nano-network structure processed on the surface of a metal titanium material with a pulse delay of 4 ps according to Embodiment 1 of the present invention, (a) is the image under low magnification, (b) is the image under high magnification Enlarge the image.

图3是本发明实施例2所述的脉冲延迟为5ps在金属钛材料表面加工出的金属纳米网状结构的SEM图3 is a SEM image of the metal nano-mesh structure processed on the surface of the metal titanium material with a pulse delay of 5ps according to Embodiment 2 of the present invention

图4是本发明实施例3所述的脉冲延迟为6ps在金属钛材料表面加工出的金属纳米网状结构的SEM图4 is a SEM image of the metal nano-mesh structure processed on the surface of the metal titanium material with a pulse delay of 6ps according to Embodiment 3 of the present invention

图5是本发明实施例4所述的脉冲延迟为8ps在金属钛材料表面加工出的金属纳米网状结构的SEM图Fig. 5 is the SEM image of the metal nano-mesh structure processed on the surface of the metal titanium material with the pulse delay of 8ps according to the embodiment 4 of the present invention

图6是本发明实施例5所述的脉冲延迟为9ps在金属钛材料表面加工出的金属纳米网状结构的SEM图FIG. 6 is a SEM image of the metal nano-network structure processed on the surface of the metal titanium material with a pulse delay of 9 ps according to Embodiment 5 of the present invention

图7是本发明实施例6所述的脉冲延迟为10ps在金属钛材料表面加工出的金属纳米结构的SEM图FIG. 7 is a SEM image of the metal nanostructure processed on the surface of the metal titanium material with a pulse delay of 10ps according to Embodiment 6 of the present invention

其中,1-飞秒激光器、2-第一反射镜、3-第二反射镜、4-第一衰减片、5-第三反射镜、6-一维平移台、7-分束镜、8-第二衰减片、9-四分之一波片、10-第四反射镜、11-第五反射镜、12-光快门、13-第六反射镜、14-第七反射镜、15-第八反射镜、16-聚焦透镜、17-待加工金属材料、18-三维平移台。Among them, 1-femtosecond laser, 2-first reflector, 3-second reflector, 4-first attenuator, 5-third reflector, 6-one-dimensional translation stage, 7-beam splitter, 8- -2nd attenuation plate, 9-quarter wave plate, 10-fourth mirror, 11-fifth mirror, 12-light shutter, 13-sixth mirror, 14-seventh mirror, 15- Eighth reflection mirror, 16-focusing lens, 17-metal material to be processed, 18-three-dimensional translation stage.

具体实施方式Detailed ways

下面几何附图和实施例对本发明的内容进一步说明。The following geometric figures and embodiments further illustrate the content of the present invention.

实施例1:Example 1:

一种基于电子动态调控的金属纳米网的制备方法,具体步骤如下:A preparation method of a metal nanomesh based on electronic dynamic regulation, the specific steps are as follows:

步骤(1)使用飞秒激光器1产生重复频率为1000Hz、波长为800nm水平偏振的飞秒激光单脉冲,经由第一反射镜2和第二反射镜3进入迈克尔逊干涉仪结构光路。将四分之一波片9的角度旋转至0°,此时由迈克尔逊干涉仪产生的双脉冲的两个子脉冲均为水平偏振,在迈克尔逊干涉仪出射处前放置荧光片来观测两个子脉冲空间重合后的光斑,调节一维平移台6来调节两个子脉冲的时间延迟,当观测到荧光片上两个子脉冲空间重合后的光斑开始不断闪烁时,调至光斑闪烁最强烈的位置,此时两个子脉冲的延时为零。然后旋转四分之一波片9的角度旋转至45°,此时迈克尔逊干涉仪透射臂的子脉冲的偏振方向由水平偏振变为竖直偏振。然后调节第一衰减片4和第二衰减片8使两个子脉冲的能量相等,均为0.325μJ。接下来调节一维平移台6在之前延时零点的基础上在移动600μm,使两束子脉冲的广成差为1200μm,此时两个子脉冲的延时时间为4ps。此时经过步骤(1)得到偏振方向互相垂直的、子脉冲能量相等的、脉冲延迟为4ps的飞秒激光双脉冲序列。Step (1) Using a femtosecond laser 1 to generate a single pulse of a femtosecond laser with a repetition frequency of 1000 Hz and a wavelength of 800 nm horizontally polarized, it enters the optical path of the Michelson interferometer structure through the first mirror 2 and the second mirror 3. Rotate the angle of the quarter-wave plate 9 to 0°. At this time, the two sub-pulses of the double pulse generated by the Michelson interferometer are both horizontally polarized. A fluorescent plate is placed in front of the exit of the Michelson interferometer to observe the two sub-pulses. For the light spot after the spatial overlap of the pulses, adjust the one-dimensional translation stage 6 to adjust the time delay of the two sub-pulses. When it is observed that the light spot after the spatial overlap of the two sub-pulses starts to flicker continuously on the phosphor plate, adjust to the position where the light spot flickers the most. The delay between the two sub-pulses is zero. Then, the angle of the quarter-wave plate 9 is rotated to 45°, and at this time, the polarization direction of the sub-pulses of the transmission arm of the Michelson interferometer is changed from horizontal polarization to vertical polarization. Then, the first attenuator 4 and the second attenuator 8 are adjusted to make the energy of the two sub-pulses equal, both being 0.325 μJ. Next, adjust the one-dimensional translation stage 6 to move 600 μm on the basis of the previous delay zero point, so that the difference between the two sub-pulses is 1200 μm, and the delay time of the two sub-pulses is 4 ps. At this time, through step (1), a femtosecond laser double-pulse sequence with mutually perpendicular polarization directions, equal sub-pulse energies, and pulse delay of 4ps is obtained.

步骤(2)将步骤(1)中得到的飞秒激光双脉冲序列经由第五反射镜11、光快门12、第六反射镜13、第七反射镜14和第八反射镜15到达聚焦透镜16,经由聚焦透镜16聚焦到待加工金属材料17表面,本实施例中待加工金属材料为金属钛,本实施例中聚焦透镜为焦距为100mm的平凸透镜,光束到达聚焦透镜前光束直径为4mm,经聚焦后,束腰直径约为38μm,飞秒激光双脉冲总能量为0.65μJ,经聚焦后能量密度为0.117J/cm^2,小于金属钛材料的烧蚀阈值0.119J/cm^2。打开光快门12,控制三维平移台18以350μm/s的速度运动,即可制备得到如图2所示的金属纳米网状结构。Step (2) The femtosecond laser double pulse sequence obtained in step (1) reaches the focusing lens 16 via the fifth mirror 11, the optical shutter 12, the sixth mirror 13, the seventh mirror 14 and the eighth mirror 15 , and focus on the surface of the metal material 17 to be processed through the focusing lens 16. In this embodiment, the metal material to be processed is titanium metal. In this embodiment, the focusing lens is a plano-convex lens with a focal length of 100 mm, and the beam diameter before the beam reaches the focusing lens is 4 mm. After focusing, the beam waist diameter is about 38μm, the total energy of the femtosecond laser double pulse is 0.65μJ, and the energy density after focusing is 0.117J/cm^2, which is less than the ablation threshold of metal titanium material 0.119J/cm^2. Open the light shutter 12 and control the three-dimensional translation stage 18 to move at a speed of 350 μm/s, and then the metal nano-mesh structure as shown in FIG. 2 can be prepared.

如图2所示,为本发明实施例所述的在金属钛材料表面加工出的金属纳米网状结构的SEM图,(a)为低倍率下的图,(b)为高倍率下的放大图。经测量,纳米网孔的直径大部分在50nm至100nm之间。As shown in FIG. 2, it is the SEM image of the metal nano-network structure processed on the surface of the metal titanium material according to the embodiment of the present invention, (a) is the image under low magnification, (b) is the magnification under high magnification picture. The diameter of the nanomesh is mostly between 50nm and 100nm by measurement.

如图1所示,实现上述方法的装置如下:As shown in Figure 1, the device for realizing the above method is as follows:

本发明所使用秒激光器1为美国光谱物理(Spectrum Physics)公司生产的激光器,激光中心波长800nm,脉冲宽度50fs,最大重复频率1000Hz,单面冲最大能量3mJ,光强分布为高斯形,出口激光为水平线偏振。The second laser 1 used in the present invention is a laser produced by Spectrum Physics, a company in the United States, with a laser center wavelength of 800 nm, a pulse width of 50 fs, a maximum repetition frequency of 1000 Hz, a maximum energy of 3 mJ for single-side punching, a Gaussian light intensity distribution, and an export laser. for horizontal linear polarization.

本实施例中所使用的金属材料为金属钛,本发明不局限于金属钛材料,其他金属材料均可。The metal material used in this embodiment is metal titanium, and the present invention is not limited to metal titanium materials, and other metal materials are acceptable.

本发明使用第一衰减片4和第二衰减片8调节双脉冲两个子脉冲的能量,本发明要求两个子脉冲能量相等。本实施例中,所使用的飞秒激光双脉冲序列总能量密度为0.117J/cm^2,本发明要求使用的总能量密度需要严格小于金属材料的烧蚀阈值且不能太小,当使用的总能量密度大于或等于金属材料的烧蚀阈值时,会产生其他亚波长结构,使得制备得到的金属纳米网结构受到破坏;当使用的总能量密度远小于金属材料的烧蚀阈值时,不会在金属材料表面加工得到微纳结构。本发明不局限于上述能量密度,只需要总能量密度在待加工金属材料的烧蚀阈值的0.9倍至0.99倍的范围内均可。The present invention uses the first attenuating sheet 4 and the second attenuating sheet 8 to adjust the energy of the two sub-pulses of the double pulse, and the present invention requires the two sub-pulses to be equal in energy. In this embodiment, the total energy density of the femtosecond laser double pulse sequence used is 0.117J/cm^2, and the total energy density required by the present invention needs to be strictly smaller than the ablation threshold of the metal material and cannot be too small. When the total energy density is greater than or equal to the ablation threshold of the metal material, other subwavelength structures will be generated, which will destroy the prepared metal nanomesh structure; when the total energy density used is much smaller than the ablation threshold of the metal material, it will not Micro-nano structures are obtained by processing the surface of metal materials. The present invention is not limited to the above-mentioned energy density, as long as the total energy density is in the range of 0.9 times to 0.99 times the ablation threshold of the metal material to be processed.

本实施例中,使用聚焦透镜为焦距为100mm的平凸透镜,用于将飞秒激光双脉冲序列光束聚焦到待加工金属材料表面。本发明不局限于聚焦透镜为焦距为100mm的平凸透镜,其他焦距的凸透镜或加工物镜均可。In this embodiment, the focusing lens is a plano-convex lens with a focal length of 100 mm, which is used to focus the femtosecond laser double-pulse sequence beam onto the surface of the metal material to be processed. The present invention is not limited to the focusing lens being a plano-convex lens with a focal length of 100 mm, a convex lens with other focal lengths or a processed objective lens can be used.

本发明使用三维平移台18来控制待加工金属材料的运动。本实施例中,使用焦距为100mm的平凸透镜,金属材料的运动速度为350μm/s。本发明不局限于此运动速度,只需要在其他合适加工参数下,能在材料表面加工出金属纳米网即可,待加工金属材料的移动速度在200-500μm/s范围内均可。The present invention uses a three-dimensional translation stage 18 to control the motion of the metal material to be processed. In this embodiment, a plano-convex lens with a focal length of 100 mm is used, and the movement speed of the metal material is 350 μm/s. The present invention is not limited to this moving speed, it only needs to be able to process metal nano-mesh on the surface of the material under other suitable processing parameters, and the moving speed of the metal material to be processed can be in the range of 200-500 μm/s.

实施例2:Example 2:

其他步骤均与实施例1相同,不同之处在于:步骤(1)中两个子脉冲的延时时间为5ps。Other steps are the same as in Embodiment 1, except that the delay time of the two sub-pulses in step (1) is 5ps.

制备得到如图3所示的金属纳米网状结构。The metal nano-network structure shown in Figure 3 was prepared.

如图3所示,为本发明实施例所述的在金属钛材料表面加工出的金属纳米网状结构高倍率下的SEM图。经测量,纳米网孔的直径大部分在60nm至150nm之间。As shown in FIG. 3 , it is an SEM image under high magnification of the metal nano-network structure processed on the surface of the metal titanium material according to the embodiment of the present invention. The diameter of the nanomesh is mostly between 60nm and 150nm by measurement.

实施例3:Example 3:

其他步骤均与实施例1相同,不同之处在于:步骤(1)中两个子脉冲的延时时间为6ps。Other steps are the same as those in Embodiment 1, except that the delay time of the two sub-pulses in step (1) is 6ps.

制备得到如图4所示的金属纳米网状结构。The metal nano-network structure shown in Figure 4 was prepared.

如图4所示,为本发明实施例所述的在金属钛材料表面加工出的金属纳米网状结构高倍率下的SEM图。经测量,纳米网孔的直径大部分在80nm至150nm之间。As shown in FIG. 4 , it is an SEM image under high magnification of the metal nano-network structure processed on the surface of the metal titanium material according to the embodiment of the present invention. The diameter of the nanomesh is mostly between 80nm and 150nm by measurement.

实施例4:Example 4:

其他步骤均与实施例1相同,不同之处在于:步骤(1)中两个子脉冲的延时时间为8ps。The other steps are the same as in Embodiment 1, except that the delay time of the two sub-pulses in step (1) is 8ps.

制备得到如图5所示的金属纳米网状结构。The metal nano-network structure shown in Figure 5 was prepared.

如图5所示,为本发明实施例所述的在金属钛材料表面加工出的金属纳米网状结构高倍率下的SEM图。此时产生的纳米网状结构不再是实施例1-3中长宽相对一致的纳米网孔,而是呈长条状的纳米网孔。经测量,纳米网孔的短径大部分在100nm至200nm之间,长径大部分在300nm至450nm之间。As shown in FIG. 5 , it is an SEM image under high magnification of the metal nano-network structure processed on the surface of the metal titanium material according to the embodiment of the present invention. The nano-mesh structure produced at this time is no longer the nano-mesh with relatively uniform length and width in Examples 1-3, but the nano-mesh in the shape of a long strip. After measurement, most of the short diameters of the nanomesh are between 100nm and 200nm, and most of the long diameters are between 300nm and 450nm.

实施例5:Example 5:

其他步骤均与实施例1相同,不同之处在于:步骤(1)中两个子脉冲的延时时间为9ps。制备得到如图6所示的金属纳米网状结构。Other steps are the same as in Embodiment 1, except that the delay time of the two sub-pulses in step (1) is 9ps. The metal nano-network structure shown in Figure 6 was prepared.

如图6所示,为本发明实施例所述的在金属钛材料表面加工出的金属纳米网状结构高倍率下的SEM图。此时产生的纳米网状结构不再是实施例1-3中长宽相对一致的纳米网孔,而是呈长条状的纳米网孔,经测量,纳米网孔的短径大部分在100nm至200nm之间,长径大部分在300nm至500nm之间。As shown in FIG. 6 , it is an SEM image under high magnification of the metal nano-network structure processed on the surface of the metal titanium material according to the embodiment of the present invention. The nano-mesh structure produced at this time is no longer the nano-mesh with relatively consistent length and width in Examples 1-3, but the nano-mesh in the shape of a long strip. After measurement, the short diameter of the nano-mesh is mostly 100 nm. Between 200nm, the major diameter is mostly between 300nm and 500nm.

实施例6:Example 6:

其他步骤均与实施例1相同,不同之处在于:步骤(1)中两个子脉冲的延时时间为10ps。制备得到如图7所示的金属纳米结构。Other steps are the same as those in Embodiment 1, except that the delay time of the two sub-pulses in step (1) is 10ps. The metal nanostructure shown in Figure 7 was prepared.

如图7所示,为本发明实施例所述的在金属钛材料表面加工出的金属纳米网状结构高倍率下的SEM图。此时产生的纳米网状结构不再是实施例1-3中长宽相对一致的纳米网孔,也不是实施例4-5中呈长条状的纳米网孔,此时产生的纳米结构主要呈单一方向的纳米条纹结构,不再是纳米网状结构,因此,在此实施例中的脉冲延迟下不能得到纳米网状结构。As shown in FIG. 7 , it is an SEM image under high magnification of the metal nano-network structure processed on the surface of the metal titanium material according to the embodiment of the present invention. The nano-mesh structure produced at this time is no longer the nano-mesh with relatively uniform length and width in Example 1-3, nor the elongated nano-mesh in Example 4-5. The nano-structure produced at this time is mainly The nano-stripe structure in a single direction is no longer a nano-mesh structure. Therefore, the nano-mesh structure cannot be obtained under the pulse delay in this embodiment.

以上所述的具体描述,对发明的目的、技术方案和有益效果进行了进一步详细说明,所应理解的是,以上所述仅为本发明的具体实施例而已,并不用于限定本发明的保护范围,凡在本发明的精神和原则之内,所做的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above-mentioned specific descriptions further describe the purpose, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above-mentioned descriptions are only specific embodiments of the present invention, and are not intended to limit the protection of the present invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included within the protection scope of the present invention.

Claims (4)

1.一种基于电子动态调控的金属纳米网状结构的制备方法,其特征在于:包括如下步骤:1. a preparation method based on the metal nano-network structure of electronic dynamic regulation, is characterized in that: comprise the steps: 步骤一:将飞秒激光单脉冲经过迈克逊干涉仪与四分之一波片的组合光路转变为偏振方向互相垂直的飞秒激光双脉冲序列,然后调整飞秒激光双脉冲两个子脉冲能量相等,同时双脉冲总能量密度调整到待加工金属材料的烧蚀阈值的0.9倍至0.99倍的范围内;然后调节迈克尔逊干涉仪光路的一臂,使得飞秒激光双脉冲的脉冲延迟在4ps-9ps的范围内;Step 1: The femtosecond laser single pulse is transformed into a femtosecond laser double pulse sequence with the polarization directions perpendicular to each other through the combined optical path of the Michelson interferometer and the quarter-wave plate, and then the energy of the two sub-pulses of the femtosecond laser double pulse is adjusted to be equal , at the same time, the total energy density of the double pulse is adjusted to the range of 0.9 times to 0.99 times the ablation threshold of the metal material to be processed; within the range of 9ps; 步骤二:将步骤一中得到的飞秒激光双脉冲序列通过光学透镜垂直聚焦到待加工金属材料的表面,控制待加工金属材料以设定的移动速度运动,即可在金属表面得到金属纳米网状结构。Step 2: The femtosecond laser double-pulse sequence obtained in step 1 is vertically focused on the surface of the metal material to be processed through an optical lens, and the metal material to be processed is controlled to move at a set moving speed, and the metal nano-mesh can be obtained on the metal surface. like structure. 2.如权利要求1所述的基于电子动态调控的金属纳米网状结构的制备方法,其特征在于:所述步骤一产生偏振方向互相垂直的飞秒激光双脉冲序列过程中,四分之一波片的光轴与激光的偏振方向的夹角为45°。2. the preparation method of the metal nano-network structure based on electronic dynamic regulation as claimed in claim 1, is characterized in that: in described step 1 producing the femtosecond laser double pulse sequence process that polarization direction is perpendicular to each other, quarter The angle between the optical axis of the wave plate and the polarization direction of the laser is 45°. 3.如权利要求1所述的基于电子动态调控的金属纳米网状结构的制备方法,其特征在于:所述步骤二中,当使用的聚焦透镜为焦距为100mm的平凸透镜时,激光重复频率为1000Hz,待加工金属材料的移动速度为200-500μm/s。3. the preparation method of the metal nano-mesh structure based on electronic dynamic regulation as claimed in claim 1 is characterized in that: in described step 2, when the focusing lens used is a plano-convex lens with a focal length of 100mm, the laser repetition rate is 1000Hz, and the moving speed of the metal material to be processed is 200-500μm/s. 4.实现如权利要求1至3任意一项方法的装置,其特征在于:包括:飞秒激光器、第一反射镜、第二反射镜、第一衰减片、第三反射镜、一维平移台、分束镜、第二衰减片、四分之一波片、第四反射镜、第五反射镜、光快门、第六反射镜、第七反射镜、第八反射镜后,产生偏振方向互相垂直的、脉冲延迟在4ps-10ps范围内的飞秒激光双脉冲序列,经透镜聚焦后在待加工金属材料表面扫描加工即可制备出金属纳米网。4. The device for realizing the method according to any one of claims 1 to 3, characterized in that: comprising: a femtosecond laser, a first reflection mirror, a second reflection mirror, a first attenuator, a third reflection mirror, and a one-dimensional translation stage , beam splitter, second attenuator, quarter-wave plate, fourth mirror, fifth mirror, optical shutter, sixth mirror, seventh mirror, and eighth mirror, the polarization directions are mutually A vertical femtosecond laser double pulse sequence with a pulse delay in the range of 4ps-10ps can prepare a metal nano-mesh by scanning and processing the surface of the metal material to be processed after being focused by a lens.
CN202110619429.9A 2021-06-03 2021-06-03 A kind of preparation method of metal nanomesh based on electronic dynamic regulation Active CN113210873B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110619429.9A CN113210873B (en) 2021-06-03 2021-06-03 A kind of preparation method of metal nanomesh based on electronic dynamic regulation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110619429.9A CN113210873B (en) 2021-06-03 2021-06-03 A kind of preparation method of metal nanomesh based on electronic dynamic regulation

Publications (2)

Publication Number Publication Date
CN113210873A CN113210873A (en) 2021-08-06
CN113210873B true CN113210873B (en) 2022-04-05

Family

ID=77082521

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110619429.9A Active CN113210873B (en) 2021-06-03 2021-06-03 A kind of preparation method of metal nanomesh based on electronic dynamic regulation

Country Status (1)

Country Link
CN (1) CN113210873B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114161004A (en) * 2021-11-25 2022-03-11 北京理工大学 A method for precise machining of air film holes in turbine blades

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1859894A1 (en) * 2005-03-02 2007-11-28 Sumitomo Electric Industries, Ltd. Material treatment method by laser ablation and material treated by the treatment method
CN103934576A (en) * 2014-04-15 2014-07-23 北京理工大学 Method for inducting two-dimensional periodic structure on surface of material through femtosecond laser
CN105108342A (en) * 2015-09-18 2015-12-02 南开大学 Method for preparing two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing
CN106735925A (en) * 2017-03-21 2017-05-31 商丘师范学院 A kind of femtosecond laser direct write preparation method of two-dimentional sub-micron butterfly metal micro structure
CN109014566A (en) * 2018-10-16 2018-12-18 北京理工大学 A kind of method of simple control laser induced surface periodic structure arragement direction
CN111168233A (en) * 2020-02-14 2020-05-19 南京理工大学 Method for inducing periodic structure on surface of optical glass by picosecond laser
CN111250874A (en) * 2020-02-14 2020-06-09 南京理工大学 Method for inducing periodic structure on surface of semiconductor material by multi-pulse picosecond laser

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE9800665D0 (en) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
EP3024569B1 (en) * 2013-07-22 2019-02-27 Kumar, Kitty Interferometric laser processing
CN104668778B (en) * 2015-01-27 2016-11-23 吉林大学 The bionical process equipment of surface of hot working die multi-point combination formula and strengthening repair method

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1859894A1 (en) * 2005-03-02 2007-11-28 Sumitomo Electric Industries, Ltd. Material treatment method by laser ablation and material treated by the treatment method
CN103934576A (en) * 2014-04-15 2014-07-23 北京理工大学 Method for inducting two-dimensional periodic structure on surface of material through femtosecond laser
CN105108342A (en) * 2015-09-18 2015-12-02 南开大学 Method for preparing two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing
CN106735925A (en) * 2017-03-21 2017-05-31 商丘师范学院 A kind of femtosecond laser direct write preparation method of two-dimentional sub-micron butterfly metal micro structure
CN109014566A (en) * 2018-10-16 2018-12-18 北京理工大学 A kind of method of simple control laser induced surface periodic structure arragement direction
CN111168233A (en) * 2020-02-14 2020-05-19 南京理工大学 Method for inducing periodic structure on surface of optical glass by picosecond laser
CN111250874A (en) * 2020-02-14 2020-06-09 南京理工大学 Method for inducing periodic structure on surface of semiconductor material by multi-pulse picosecond laser

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
《飞秒激光诱导TC4 表面微观组织研究》;崔静;《激光与红外》;20200930;第1035-1041页 *

Also Published As

Publication number Publication date
CN113210873A (en) 2021-08-06

Similar Documents

Publication Publication Date Title
CN108015410B (en) A method for preparing crystalline nanostructures based on femtosecond laser-induced amorphous GemSbnTek thin films
CN105108342B (en) Method for preparing two-dimensional metallic photonic crystal structure in large area through femtosecond laser direct writing
CN103862171B (en) Dual wavelength femtosecond laser prepares the method for two-dimension periodic metallic particles array structure
CN109434289B (en) A femtosecond laser fabrication method for tunable phase-change nanostructured metasurfaces
WO2021155826A1 (en) Method and device using femtosecond laser to prepare nano-precision structure
CN106216833B (en) Method based on dynamic control laser machine semiconductor twin-stage surface texture
CN108568594A (en) Regulate and control the method for crystal silicon external waviness structure based on class plasmonic lenses effect
CN105458529A (en) Method for efficiently making large-depth-diameter-ratio micropore arrays
CN108213718B (en) A kind of femtosecond laser regulation GemSbnTekCrystalline state nanostructure geometric shape method
CN110640305A (en) A system for preparing superhydrophobic surfaces based on femtosecond laser spatiotemporal shaping
CN107790887A (en) The femtosecond laser direct write preparation method of two-dimentional rhombus cycle micro-nano metal structure
CN113102892B (en) System and method for processing nano convex structure on titanium surface by femtosecond laser
CN113210873B (en) A kind of preparation method of metal nanomesh based on electronic dynamic regulation
CN109014566A (en) A kind of method of simple control laser induced surface periodic structure arragement direction
CN106735925A (en) A kind of femtosecond laser direct write preparation method of two-dimentional sub-micron butterfly metal micro structure
CN104625417A (en) Method for controlling topography of nickel surface through femtosecond laser based on electronic dynamic control
CN108788472A (en) Titanium dioxide surface periodic structure processing method based on dynamic control
CN112792451A (en) Method for fabricating geometric phase optical elements inside sapphire by femtosecond laser
CN111474616A (en) A method for fabricating subwavelength metal gratings with broad-beam femtosecond laser double pulses
Lu et al. Nanochannels with a 18-nm feature size and ultrahigh aspect ratio on silica through surface assisting material ejection
CN106744662A (en) A kind of method that utilization dynamic control prepares silicon nanowire structure
Ahsan et al. Formation mechanism of nanostructures in soda–lime glass using femtosecond laser
CN112355483B (en) A method for fabricating submicron concentric rings on silicon surface by femtosecond laser
CN111390378B (en) Device and method for reducing pulse number required by femtosecond laser introduction structure
CN109822214B (en) Method for regulating and controlling periodic structure of surface of zinc oxide film based on grating auxiliary enhancement

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant