CN112853316A - 镀膜装置及其承载座 - Google Patents

镀膜装置及其承载座 Download PDF

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CN112853316A
CN112853316A CN202011627010.XA CN202011627010A CN112853316A CN 112853316 A CN112853316 A CN 112853316A CN 202011627010 A CN202011627010 A CN 202011627010A CN 112853316 A CN112853316 A CN 112853316A
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CN112853316B (zh
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郭月
刘春�
刘子优
王卓
李景舒
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Piotech Inc
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Priority to KR1020210176389A priority patent/KR20220097237A/ko
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
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Abstract

本发明揭露一种镀膜装置，包含：一第一外壳，具有一顶部和一侧部；及一第二外壳，容置于该第一外壳中且至少部分自该第一外壳的顶部朝下扩散延伸，该第一外壳与该第二外壳之间定义一第一空间，该第二外壳定义一第二空间，该第一空间围绕该第二空间且两者不连通。

Description

镀膜装置及其承载座
技术领域
本发明是关于一种镀膜装置，尤其是关于一种适用于三维样品的气相沉积装置。
背景技术
气相沉积处理装置，尤其是用于在块状物体(如镜片)上形成薄膜(如原子沉积层，ALD)，通常会面临一些问题，像是块状物体的背面会形成非期望的薄膜，这是因为块状体的非沉积背面不一定是平面，因此块状体会与一承载面之间产生缝隙，导致沉积气体经由缝隙流过块状体的背面。此外，由于块状体具有一定的体积，所需的处理腔体也必须具有相当的空间容纳块状体，因此需要清洁腔体的能力也需要一并提升。再者，由于腔体的空间增加，腔体温度方面的控制，像是温度分布均匀度和散热速度等，也成为一项挑战。
因此，有必要发展出可改善前述问题的气相沉积装置。
发明内容
本发明的目的在于提供一种镀膜装置，包含：一第一外壳，具有一顶部和一侧部；及一第二外壳，容置于该第一外壳中且至少部分自该第一外壳的顶部朝下扩散延伸，该第一外壳与该第二外壳之间定义一第一空间，该第二外壳定义一第二空间，该第一空间围绕该第二空间且两者不连通。
在一具体实施例中，该第二外壳具有一顶部和一底部，该第二外壳的顶部具有一直径，该第二外壳的底部具有一直径，该第二外壳的直径自其顶部至底部为增加。
在一具体实施例中，该第一外壳的侧部具有一壁架，该第二外壳的底部坐落于该壁架上。
在一具体实施例中，该第一空间维持在一大气压，该第二空间为用于镀膜的一反应区。
在一具体实施例中，该第二外壳的顶部具有一气体信道，该气体信道的一下游处提供有用于分散气体的一气体阻隔板。
本发明的另一目的在于提供一种承载座，用于承载被镀膜的一物体且配置成可升降于一第一壳体中，包含：一支撑杆，具有一顶部并配置成自该顶部提供一气体；及一承载盘，连接于该支撑杆的顶部且具有一朝上面和自该朝上面向上延伸用于支撑该物体的一支撑部，其中该朝上面具有接收该气体的至少一进气孔以及自该朝上面向该承载盘体的一外侧延伸的多个排气孔。其中，该朝上面、该支撑部与该物体之间定义一排气路径，该气体自该进气孔经由该排气路径流至该等排气孔。
在一具体实施例中，该支撑部具有一垫片，该垫片的一内侧具有用于和该物体接触的一倾斜面。
在一具体实施例中，该支撑部与该朝上面之间具有一倾斜面。
在一具体实施例中，该支撑部具有一板，该板形成有多个篓空，该等用于容置多个物体。
在一具体实施例中，该支撑杆具有一密封板，该第一壳体的一侧部提供有一壁架，该密封板配置成在支撑杆位于一高度时接触该壁架，使所述承载座进入由该密封板所密封的一反应区。
附图说明
参考下列实施方式描述及图式，将会更清楚了解到本发明的前述和其他特色及优点。
图1为本发明镀膜装置的示意图。
图2为本发明承载座的一实施例。
图3为本发明承载座的另一实施例。
图4为本发明承载座的再一实施例。
图5为本发明反应区的一实施例。
图6为本发明反应区的另一实施例。
图7为本发明反应区的再一实施例。
图中，101、第一外壳；102、顶部；103、侧部；104、底部；105、开口；106、进气单元；107、抽气单元；108、抽气单元；109、第二外壳；110、顶部；111、底部；112、壁架；113、加热单元；114、承载座；115、底板；116、孔；117、加热单元；200、承载座；201、支撑杆；202、承载盘；203、朝上面；204、支撑部；205、垫片；206、排气孔；300、承载座；304、支撑部；400、承载座；403、朝上面；404、支撑部；405、板；500、第二外壳；501、气体阻隔板；600、第二外壳；700、第二外壳；L、物体；D、直径。
具体实施方式
在以下多个示例具体实施例的详细叙述中，对该等随附图进行参考，该等图式形成本发明之一部分。且系以范例说明的方式显示，藉由该范例可实作该等所叙述之具体实施例。提供足够的细节以使该领域技术人员能够实作该等所述具体实施例，而要了解到在不背离其精神或范围下，也可以使用其他具体实施例，并可以进行其他改变。此外，虽然可以如此，但对于「一具体实施例」的参照并不需要属于该相同或单数的具体实施例。因此，以下详细叙述并不具有限制的想法，而该等叙述具体实施例的范围系仅由该等附加申请专利范围所定义。
在说明书与权利要求书范围中，除非在上下文中另外明确说明，否则以下用词系具有与此明确相关联的意义。当在此使用时，除非另外明确说明，否则该用词「或」系为一种包含的「或」用法，并与该用词「及/或」等价。除非在上下文中另外明确说明，否则该用词「根据」并非排他，并允许根据于并未叙述的多数其他因子。此外，在整体申请书中，「一」、「一个」与「该」的意义包含复数的参照。「在…中」的意义包含「在…中」与「在…上」。
以下简短提供该等创新主题的简要总结，以提供对某些态样的一基本了解。并不预期此简短叙述做为一完整的概述。不预期此简短叙述用于辨识主要或关键组件，或用于描绘或是限缩该范围。其目的只是以简要形式呈现某些概念，以做为稍后呈现之该更详细叙述的序曲。
图1显示本发明镀膜装置的一实施例，包含一第一外壳101，其具有一顶部102、一侧部103及一底部104。第一外壳101的侧部103提供有一开口105，其经由一个可动阀门(未显示)与一传输腔体(未显示)连接以接收一被镀物或卸除一经处理物。化学气相沉积于第一外壳101中执行。第一外壳101的顶部102提供有一进气单元106，用于提供一反应气体或一清洁气体至第一外壳中101。第一外壳101的底部104连接有多个抽气单元107、108，分别控制第一外壳101中不同空间的气压。
一第二外壳109被固定地容置于第一外壳101中。第二外壳109具有一顶部110和一底部111。第二外壳109的顶部110连接于第一外壳101的顶部102，且第二外壳109自其顶部110扩散延伸至其底部111，意即第二外壳109的顶部110具有一直径，而第二外壳109的底部111具有一直径，故如图所示第二外壳109的直径D自其顶部110至底部111为增加。换言之，第二外壳109为上半部较窄而下半部相对较宽的形状。在一实施例中，第二外壳109的底部111连接于第一外壳101的侧部103。第二外壳109的顶部110具有一气体通道，其穿过第一外壳101的顶部102且其上游耦接至进气单元106。图示实施例的侧部103内侧提供有一壁架112，第二外壳109的底部111连接于壁架112的一上表面。第二外壳109与第一外壳101的连接为密封连接。例如，在第一外壳101的顶部102与第二外壳109的顶部110之间提供有一O型环，以及在第一外壳101的壁架112与第二外壳109的底部111之间提供有另一O型环。因此，第一外壳101与第二外壳109之间定义了密封的一第一空间，且该的一空间维持在一大气压。该第一空间中还可提供有一或多个加热单元113，用于加热第二外壳109。
一承载座114配置成可升降于第一外壳101中。如图所示，承载座114可在一最高位置和一最低位置(虚线描绘)之间移动。承载座114包含一底板115，其随着承载座114升降移动。当承载座114升高最高位置，底板115与壁架112的一下表面紧密接触。壁架112与底板115之间提供有一O型环，使两者构成密封接触。此时，第二外壳109和底板115定义一第二空间。
如图所示，壁架112与底板115的密封接触将第一外壳101区分为包含第一空间和第二空间的一上半部以及一下半部，其中下半部的空间为提供物体暂时停留的过渡空间。当承载座114升高使底板115密封接触壁架112，第二空间与底板115之下的过渡空间不连通，且两者具有独立的压力。密封的第二空间主要作为用于镀膜处理的一反应区。承载座114下降至最低位置时，底板115离开壁架112，使第二空间与下方的过渡空间连通，此时第二空间也不构成作为反应区的条件。
虽然未显示，应了解在其他实施例中，抬升的底板115可配置成与第二外壳109密封接触以形成反应区。可替代地，抬升的底板115也可配置成与第一外壳101的侧部103密封接触以形成反应区。意即，采用适当的密封手段，反应区的建立可在没有壁架112的情况下实现。
第一外壳101的材质为陶瓷(如Al2O3)或可以是其他膨胀系数较小的材质，使第一外壳101能够作为一保温层，抵抗来自反应区或加热单元113的高温。第二外壳109的一外侧可涂覆有一高导热材质，使加热单元113产生的热更容易传递至第二外壳109。由第一外壳101和第二外壳109定义的第一空间维持在一大气压。由第二外壳109、壁架112和底板115定义的反应区则控制在适于实现镀膜的真空环境。由壁架112、抬升的底板115和第一外壳底部104定义的过渡空间则控制在防止被镀物体污染的真空环境。过度空间的压力由一抽气单元107控制，反应区的压力则由另一抽气单元108控制。如图所示，底板115具有一孔116，反应腔中所残留的气体经由孔116被排出至抽气单元108。底板115的上方还可提供另一加热单元117，以控制反应区下方的温度。
本发明镀膜装置中，由第二外壳所定义的反应区，因第二外壳具有一个扩散的形状，类似漏斗状，反应区的空间得以相对缩减。此有助于镀膜后清洁处理的效率。再者，因第一壳体和第二壳体之间定义的第一空间维持在大气环境，容置于其中的加热单元所产生的热传导至反应区的效率比真空环境佳，此有助于反应区温度的控制。
图2显示本发明承载座的一实施例，承载座200包含一支撑杆201及一承载盘202。支撑杆201如图1所示由第一外壳101的底部104垂直延伸，且与底板115连接。支撑杆201的一底部连接至一驱动单元(未显示)。支撑杆201相对于底部具有一顶部，其配置成与承载盘202的一底部密封连接。例如，支撑杆201的顶部可以具有一平面或一倾斜面的组合。支撑杆201的顶部与承载盘202的底部之间可提供至少一个O型环，以实现所述密封连接。承载盘202具有一朝上面203，其基本上是一平坦面。承载盘202还具有用于支撑被镀物体L的一或多个支撑部204，其自朝上面203向上延伸。如图所示，支撑部204围绕于朝上面203的外围，使得支撑部204和朝上面203定义一凹入空间。在其他可能的实施例中，承载盘202可具有多个高度不同的支撑部204，用以配合一被镀物体的形状。
支撑部204的一顶部或一表面还可提供一垫片205，其可以是与承载盘202相同或不同的材质，如陶瓷。垫片205的一内侧可形成一倾斜面，作为与物体L的一接触面。垫片205的尺寸经适当选择，以至少不遮蔽物体L将被镀膜的一上表面。如图所示，安放的物体L、支撑部204与朝上面203定义一缝隙，其为反应气体所不希望进入的空间。
支撑杆201的杆身中提供有惰性气体的一进气管，其延伸至支撑杆201顶部的一排气孔，使支撑杆201的顶部可提供拓性气体。承载盘202对应支撑杆201的位置提供有一进气孔，藉此惰性气体可通过承载盘202的朝上面203释放至缝隙中并填满缝隙。承载盘202还具有多个排气孔206，其自朝上面203向承载盘202的一外侧延伸，或者可自支撑部204的一内侧向外延伸。因此，当承载座200被密封于反应腔时，反应腔的真空环境迫使承载座200提供的惰性气体经由这些排气孔206流动至反应区中并进一步由抽气单元108排出反应区。因此，物体L的下方具有至少由朝上面203、支撑部204与物体L定义的一排气路径。实际上，在镀膜处理中，部分沉积粒子仍有机会从物体L和支撑部204之间进入物体L下方并沉积在物体L的下表面。所述排气路径则可避免不希望的背面沉积。穿越的粒子可被惰性气体吹扫至朝上面203的边缘并通过排气孔206回归反应区。如此，可有效维持物体背面的清洁度。这样的效果对于提升镜片制程的良率是尤其有帮助的。
图3显示承载盘的另一实施例。承载座300具有相对较高的支撑部304，其可满足特定物体L的形状。图4显示承载盘的再一实施例。在镀膜处理是应用于多个小尺寸的物体L的情况中，承载座400的支撑部404的顶部提供有一板405，其具有用于放置多个物体L的多个篓空。至少板405的一下表面与朝上面403定义一排气路径，其通过这些物体L的下方以吹扫不希望沉积的粒子。
图5显示本发明反应区的一实施例。定义所述反应区的一第二外壳500，在其顶端的气体通道的一下游处可提供有用于分散气体的一或多个气体阻隔板501，用于决定沉积气体的流动方向。在一实施例中，气体阻隔板501可替换为一多孔喷淋板。图6显示本发明反应区的另一实施例。定义所述反应区的一第二外壳600配置成具有符合曲面物体L形状的一曲面结构。图7显示本发明反应区的再一实施例。定义所述反应区的一第二外壳700配置成具有符合物体L数组的一平坦顶部。此有助于将反应区的体积最小化，或者有助于平均的沉积。
以上内容提供该等叙述具体实施例之组合的制造与使用的完整描述。因为在不背离此叙述精神与范围下可以产生许多具体实施例，因此这些具体实施例将存在于以下所附加之该等申请专利范围之中。

Claims (10)

1.一种镀膜装置，其特征在于，包括：
一第一外壳，具有一顶部和一侧部；及
一第二外壳，容置于该第一外壳中且至少部分自该第一外壳的顶部朝下扩散延伸，该第一外壳与该第二外壳之间定义一第一空间，该第二外壳定义一第二空间，该第一空间围绕该第二空间且两者不连通。
2.如权利要求1所述的镀膜装置，其特征在于：该第二外壳具有一顶部和一底部，该第二外壳的顶部具有一直径，该第二外壳的底部具有一直径，该第二外壳的直径自其顶部至底部为增加。
3.如权利要求1所述的镀膜装置，其特征在于：该第一外壳的侧部具有一壁架，该第二外壳的底部坐落于该壁架上。
4.如权利要求1所述的镀膜装置，其特征在于：该第一空间维持在一大气压，该第二空间为用于镀膜的一反应区。
5.如权利要求2所述的镀膜装置，其特征在于：该第二外壳的顶部具有一气体信道，该气体信道的一下游处提供有用于分散气体的一气体阻隔板。
6.一种承载座，用于承载被镀膜的一物体且配置成可升降于一第一壳体中，其特征在于，包括：
一支撑杆，具有一顶部并配置成自该顶部提供一气体；及
一承载盘，连接于该支撑杆的顶部且具有一朝上面和自该朝上面向上延伸用于支撑该物体的一支撑部，其中该朝上面具有接收该气体的至少一进气孔以及自该朝上面向该承载盘体的一外侧延伸的多个排气孔，
其中，该朝上面、该支撑部与该物体之间定义一排气路径，该气体自该进气孔经由该排气路径流至该等排气孔。
7.如权利要求6所述的承载座，其特征在于：该支撑部具有一垫片，该垫片的一内侧具有用于和该物体接触的一倾斜面。
8.如权利要求6所述的承载座，其特征在于：该支撑部与该朝上面之间具有一倾斜面。
9.如权利要求6所述的承载座，其特征在于：该支撑部具有一板，该板形成有多个篓空，该等用于容置多个物体。
10.如权利要求6所述的承载座，其特征在于：该支撑杆具有一密封板，该第一壳体的一侧部提供有一壁架，该密封板配置成在支撑杆位于一高度时接触该壁架，使所述承载座进入由该密封板所密封的一反应区。
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