CN112740958A - Application method of LED lamp in needle mushroom cultivation - Google Patents
Application method of LED lamp in needle mushroom cultivation Download PDFInfo
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- CN112740958A CN112740958A CN202110093259.5A CN202110093259A CN112740958A CN 112740958 A CN112740958 A CN 112740958A CN 202110093259 A CN202110093259 A CN 202110093259A CN 112740958 A CN112740958 A CN 112740958A
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01G—HORTICULTURE; CULTIVATION OF VEGETABLES, FLOWERS, RICE, FRUIT, VINES, HOPS OR SEAWEED; FORESTRY; WATERING
- A01G18/00—Cultivation of mushrooms
- A01G18/60—Cultivation rooms; Equipment therefor
- A01G18/69—Arrangements for managing the environment, e.g. sprinklers
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P60/00—Technologies relating to agriculture, livestock or agroalimentary industries
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Abstract
The invention relates to an application method of an LED lamp in flammulina velutipes cultivation, which comprises a heat-preservation shell cultivation device and a central control processor, wherein the flammulina velutipes cultivation device is arranged, flammulina velutipes in different cultivation bins can be in different cultivation stages, in addition, the invention judges the cultivation condition of the flammulina velutipes in different cultivation stages in the cultivation bin by arranging the photographic device and the gravity sensor in the cultivation bin and detecting the hypha coverage area or the size of the flammulina velutipes pileus, the temperature, the humidity and the LED growing lamp are adjusted according to the temperature, the humidity and the LED growing lamp, the whole process is controlled by a central control processor, so as to realize automation, ensure that the flammulina velutipes can be in the best cultivation state in different cultivation stages, and the culture time of each culture stage can be ensured to be optimal, the culture time of a certain period is prevented from being overlong, and further refined culture is realized.
Description
Technical Field
The invention belongs to the field of culture methods, and particularly relates to an application method of an LED lamp in needle mushroom culture.
Background
Golden mushroom is an edible fungus cultivated in autumn and winter and early spring, is famous for being fresh and tender in mushroom cap, crisp in stem, rich in nutrition and palatable in taste, is particularly a good food material for salad dishes and hot pots, is rich in nutrition, fragrant and delicious in taste, is deeply popular with the public, is increasingly popularized in a mode of cultivating golden mushroom at home in recent years, and has more and more culture and control devices, but the traditional golden mushroom culture control device has the following problems:
1. the cultivation process is not intelligent enough, a unit for monitoring the cultivation condition of the flammulina velutipes is lacked, and environmental parameters cannot be automatically regulated according to the development conditions of the flammulina velutipes in different cultivation stages.
2. Different control parameters are not provided for different cultivation stages of the flammulina velutipes in the cultivation process so as to ensure that the flammulina velutipes are well developed in each cultivation stage, and particularly, the flammulina velutipes are uniformly cultivated and inhibited, and the LED growth lamp is intelligently controlled.
Disclosure of Invention
The present invention is directed to solving the above problems, and to this end, the present invention provides an apparatus for controlling an environment for culturing liquid spawn of enoki mushroom, comprising:
cultivating needle mushroom by using a cultivating device, arranging an LED growth lamp, a photographic device and a gravity sensor in a cultivating bin of the cultivating device, externally connecting a central control device, finishing data exchange with the LED growth lamp, the photographic device and the gravity sensor, judging whether an abnormal condition exists in a needle mushroom cultivating inhibition stage by image information shot by the photographic device and gravity information obtained by the gravity sensor, adjusting the temperature in the cultivating bin, adjusting the illumination intensity of the LED growth lamp and the running power of a fan on the cultivating bin, wherein,
when needle mushroom uniform cultivation and inhibition stage cultivation are carried out, selecting uniform cultivation and inhibition stage cultivation options through a control panel, enabling a central control processor to control a camera and a weight sensor in a cultivation bin to be started, starting to shoot the needle mushrooms in the cultivation bin, controlling the camera to shoot needle mushroom pictures by the central control processor every shooting interval T2 time, identifying the diameter R of a single needle mushroom cap, calculating the diameter growth rate VR of each needle mushroom cap and the average diameter growth rate VRH of all the needle mushrooms in the cultivation bin, judging whether the needle mushroom inhibition cultivation in different time periods is abnormal or not according to the average diameter growth rate VRH of all the needle mushrooms and judging whether inhibition cultivation time needs to be prolonged or not, when inhibition is finished and uniform cultivation is started, calculating a uniform cultivation contrast parameter JY by the central control processor according to the average diameter growth rate H of all the cap of all the needle mushrooms and the quality change rate of the needle mushrooms, the temperature in the cultivation bin, the running speed of the fan and the irradiation intensity of the LED lamp are adjusted through the central control processor according to the homoiotomy contrast parameter JY.
Further, when the cultivation in the equalizing and inhibiting stage is carried out, the central control processor obtains the total number N of needle mushroom cultivation bags in the cultivation bin according to the picture information shot by the camera device, obtains the average size G of needle mushroom caps in the cultivation bin, obtains the total mass M of the loaded objects in the cultivation bin according to the weight sensor, calculates the average weight M of each cultivation bag, wherein M is M/N, calculates the initial contrast parameter W according to the average size G of the needle mushroom caps and the weight M of each cultivation bag,
W＝(m/m0)+(G/G0)，
wherein m represents the average weight of a single cultivation bag, m0 represents the average weight of a preset cultivation bag, G represents the average size G of flammulina velutipes pileus, G0 represents the average size G of the preset flammulina velutipes pileus, a central control processor determines the initial temperature in an inhibition stage, the running speed of a fan and the illumination intensity of an LED growth lamp in an equalization stage according to the initial contrast parameter W, an ith parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4) is preset in the central control processor, i is 1, 2.. n, wherein Xi1 represents a parameter selection range, Xi2 represents the ith temperature, Xi3 represents the running power of the ith fan, and Xi4 represents the ith illumination intensity;
when the initial contrast parameter W belongs to a parameter selection range Xi1 of an i-th parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4), the central control processor selects the i-th temperature Xi2 as an initial temperature of a suppression stage, the i-th fan running power Xi3 as initial fan running power of the suppression stage, and the i-th illumination intensity Xi4 as initial illumination intensity of a homoiotic stage.
Further, the central control processor calculates the diameter growth rate VR of each needle mushroom cap according to the following formula and calculates the average diameter growth rate VRH of all needle mushrooms in the cultivation bin and the average diameter growth rate VRH of the cap, which is calculated by dividing the sum of the diameter growth rates VR of all needle mushroom caps by the number of the needle mushroom caps,
VR＝(Ri-Ri-1)/T2
wherein R isiRepresents the maximum diameter, R, of the cap of Flammulina velutipes at the ith shootingi-1The maximum diameter of the flammulina velutipes pileus in the i-1 th shooting is shown, and T2 shows the shooting interval;
meanwhile, the central control processor calculates an inhibition contrast parameter Z according to the average pileus diameter growth rate VRH of the flammulina velutipes,
Z＝VRH/VRH0
wherein VRH represents the average diameter growth rate of the pileus of the flammulina velutipes, and VRH0 represents the average diameter growth rate of the pileus of the preset flammulina velutipes.
Further, a suppression adjustment matrix Y (Y1, Y2, Y3) is arranged in the central processor, wherein Y1 represents a first time duration, Y2 represents a second time duration, Y3 represents a third time duration, Y3> Y2> Y1, a suppression temperature adjustment matrix J (J1, J2) is also arranged in the central processor, wherein J1 represents a first adjustment temperature, J2 represents a second adjustment temperature, J1< J2 central processor preset suppression interval parameter matrix Ei (Ei1, Ei2), i ═ 1,2,3, wherein Ei1 represents a first suppression contrast parameter, Ei2 represents a second suppression contrast parameter, the central processor determines a suppression time duration for cultivating needle mushrooms and a temperature at the time of suppression, wherein the central processor preset suppression time TJ divides the suppression time into three divisional TJ intervals, which include a first divisional TJ1, A second divisional interval TJ2, a third divisional interval TJ3,
when the cultivation time of the flammulina velutipes in the cultivation bin is in any ith division area TJi, the central control processor calls data in an inhibition area parameter matrix Ei (Ei1, Ei2) as comparison parameters,
when the Z is less than or equal to Ei1, the central control processor judges that the inhibition cultivation of the needle mushrooms is normal and maintains the original temperature unchanged;
when Ei1 is less than or equal to Ei2, the central control processor judges that the cultivation inhibition of the needle mushrooms is abnormal, and reduces the temperature by J1;
when Z is greater than Ei1, the central control processor judges that the flammulina velutipes inhibits cultivation abnormity, and reduces the temperature by J2.
Further, when the central control processor determines that the cultivation time of the needle mushrooms in the cultivation bin is in the third division interval TJ3, the central control processor calls data in a suppression interval parameter matrix Ei (Ei1, Ei2) as comparison parameters,
when Z is less than or equal to Ei1, the central control processor judges that the inhibition cultivation of the needle mushrooms is normal and maintains the inhibition time TJ unchanged;
when Ei1 is less than or equal to Ei2, the central control processor judges that the flammulina velutipes is abnormally inhibited and cultivated, and prolongs the inhibition duration TJ to be TJ + Y1;
and when Z is greater than Ei1, the central control processor judges that the flammulina velutipes is abnormally inhibited and cultivates the flammulina velutipes, and prolongs the inhibition time TJ to be TJ + Y2.
Furthermore, a nursery stage temperature matrix YT (YT1, YT2, YT3), an illumination control matrix L (L1, L2, L3) and a nursery stage fan power matrix P (P1, P2, P3) are preset inside the central processor, wherein YT1 represents a first nursery temperature adjustment parameter, YT2 represents a second nursery temperature adjustment parameter, YT3 represents a third nursery temperature adjustment parameter, YT1< YT2< YT3, L1 represents a first illumination intensity, L2 represents a second illumination intensity, L3 represents a third illumination intensity, P1 represents a first fan operating power, P2 represents a second fan operating power, and P3 represents a third fan operating power;
when the flammulina velutipes in the cultivation bin reaches the inhibition duration or reaches the prolonged inhibition duration, the central control processor judges that the inhibition is finished and controls the LED growth lamps in the cultivation bin to be started, the central control processor calculates a uniform cultivation contrast parameter JY according to the average pileus diameter growth rate VRH of the flammulina velutipes and the mass change rate MV of the flammulina velutipes in the cultivation bin according to the following formula,
JY＝(MV/MV0)+(VRH/VRH0)
wherein M represents the mass change rate of needle mushrooms in the cultivation bin, MV0 represents the mass change rate of needle mushrooms in the preset cultivation bin, VRH represents the average diameter growth rate of pili of needle mushrooms, and VRH0 represents the average diameter growth rate of pili of needle mushrooms.
Furthermore, contrast parameters JY01, JY02 and JY03 are also preset in the central processor, when the central processor adjusts the temperature in the cultivation bin, the running speed of the fan and the irradiation intensity of the LED lamp according to the average cultivation contrast parameter JY,
when JY is less than or equal to JY01, the central control processor adjusts the temperature, increases a third incubation temperature adjusting parameter YT3, simultaneously adjusts the fan operation power, increases a third fan operation power P3, and adjusts the illumination intensity of the LED growth lamp to a third illumination intensity L3;
when JY01< JY02, the central control processor adjusts the temperature, increases a second incubation temperature adjusting parameter YT2, simultaneously adjusts the fan operation power, increases a third fan operation power P2, and adjusts the illumination intensity of the LED growth lamp to a third illumination intensity L2;
when JY02 is less than JY and less than JY03, the central control processor judges that the current homonuresis effect is good, and maintains the original temperature of the breeding bin, the running power of the fan and the illumination intensity of the LED growth lamp unchanged;
when JY > JY03 is adopted, the central control processor adjusts the temperature to reduce the first incubation temperature adjusting parameter YT1, meanwhile, the fan operation power is adjusted to reduce the first fan operation power P1, and the illumination intensity of the LED growth lamp is adjusted to be the first illumination intensity L1.
Further, the present invention also provides a needle mushroom cultivation apparatus, which comprises,
the surface of the heat preservation shell is provided with a control panel for inputting an operation command;
the cultivation device is arranged in the heat preservation shell and comprises a layered support, the layered support is used for dividing the cultivation device into a plurality of cultivation bins, the cultivation bins are used for bearing needle mushroom cultivation bases or cultivation bags so as to respectively cultivate needle mushrooms in different cultivation stages, a slide rail is arranged on the layered support, a photographing device and an LED growth lamp are arranged on the slide rail so that the photographing device can freely slide on the guide rail and photograph the interiors of the cultivation bins arranged between the layered baffles, and a gravity sensor is arranged at the bottom of each cultivation bin so as to detect the bearing weight in each cultivation bin;
through control panel can select the cultivation storehouse that the asparagus cultivated the stage and cultivate the asparagus in advance, well accuse processor basis cultivation stage option that control panel selected and the cultivation storehouse control of cultivating the asparagus in advance correspond and cultivate the gravity sensor and the camera device start in the storehouse, discern whether the asparagus of different cultivation stages is cultivated and have an anomaly to the adjustment is cultivated temperature, illumination intensity, the operating power of fan and the illumination intensity of LED growth lamp in the storehouse.
Compared with the prior art, the golden mushroom cultivation device has the technical effects that golden mushrooms in different cultivation bins can be in different cultivation stages, the photographing device and the gravity sensor are arranged in the cultivation bins, cultivation conditions of the golden mushrooms in the different cultivation stages in the cultivation bins are judged by detecting the hypha coverage area or the sizes of the golden mushroom caps, the temperature, the humidity and the LED growth lamps are adjusted according to the judgment, the whole process is controlled by the central control processor, automation is achieved, the golden mushrooms can be in the optimal cultivation state in the different cultivation stages, the cultivation time of each cultivation stage can be guaranteed to be optimal, the overlong cultivation time in a certain period is avoided, and further refined cultivation is achieved.
Particularly, an ith parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4) preset in the central control processor selects initial results for inhibition and uniform breeding according to the initial contrast parameter W, wherein the initial results are obtained by carrying out inhibition and uniform breeding
Particularly, for the inhibition and cultivation stages, the central control processor is provided with an inhibition adjustment matrix Y (Y1, Y2, Y3) and an inhibition temperature adjustment matrix J (J1, J2), the growth rate of flammulina velutipes pileus in the inhibition process is monitored, an inhibition contrast parameter Z is calculated, the temperature in the cultivation bin is adjusted in real time according to the inhibition contrast parameter Z, the inhibition duration is adjusted, the growth rate of the flammulina velutipes pileus is easy to monitor, the flammulina velutipes inhibition stage is characterized, the cultivation duration is divided into sections, the carbon dioxide and the temperature in the cultivation bin are enabled to be in a better standard according to the inhibition contrast parameter Z, the current flammulina velutipes cultivation duration, the flammulina velutipes adjustment temperature and the fan speed, the inhibition effect is improved, the inhibition duration is properly adjusted, the length difference of the flammulina velutipes mushroom is.
Particularly, for the inhibition and cultivation stage, the central control processor calculates a comparison parameter JY according to the growth speed of the pileus and the gravity growth speed, and adjusts the temperature, the humidity and the intensity of the LED growth lamp according to the comparison parameter JY, so that the flammulina velutipes are ensured to be in a better growth environment in the uniform cultivation stage, the uniform cultivation speed is improved, and the uniform cultivation quality is ensured.
Drawings
FIG. 1 is a front view of a control apparatus for an environment for culturing liquid strains of Flammulina velutipes according to an embodiment of the present invention;
FIG. 2 is a schematic structural view of the surface A of a culture bin of a control device for the culture environment of liquid strains of needle mushrooms according to an embodiment of the present invention;
FIG. 3 is a schematic structural view of the side B of a culture bin of a control device for a liquid strain culture environment of needle mushrooms according to an embodiment of the present invention;
FIG. 4 is a schematic view of the shape of a cultivation bin of a control device for the cultivation environment of liquid strains of Flammulina velutipes according to an embodiment of the present invention;
FIG. 5 is a schematic diagram of a bottom orbit of a layered partition plate of a control device for a liquid strain culture environment of needle mushrooms according to an embodiment of the present invention;
FIG. 6 is a schematic view of a layered partition structure of a control device for an environment for culturing liquid strains of needle mushrooms according to an embodiment of the present invention;
FIG. 7 is a schematic view of the outline of an apparatus for controlling the cultivation environment of liquid strains of Flammulina velutipes according to an embodiment of the present invention.
Detailed Description
The above and further features and advantages of the present invention are described in more detail below with reference to the accompanying drawings.
Preferred embodiments of the present invention are described below with reference to the accompanying drawings. It should be understood by those skilled in the art that these embodiments are only for explaining the technical principle of the present invention, and are not intended to limit the scope of the present invention.
It should be noted that in the description of the present invention, the terms of direction or positional relationship indicated by the terms "upper", "lower", "left", "right", "inner", "outer", etc. are based on the directions or positional relationships shown in the drawings, which are only for convenience of description, and do not indicate or imply that the device or element must have a specific orientation, be constructed in a specific orientation, and be operated, and thus, should not be construed as limiting the present invention.
Furthermore, it should be noted that, in the description of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood by those skilled in the art according to specific situations.
Referring to fig. 1 and 7, which are schematic front views and schematic external shapes of an apparatus for controlling an environment for culturing liquid spawn of enoki mushroom according to an embodiment of the present invention, the apparatus for controlling an environment for culturing liquid spawn of enoki mushroom according to the embodiment includes:
the surface of the heat preservation shell 1 is provided with an operation panel 22 for inputting operation instructions;
an incubation device, comprising: a motor 6, a bearing circular truncated cone 5, a layered bracket and a cultivating bin 2, wherein the motor is arranged at the central position of the bottom of the heat-insulating shell 1, a motor shaft of the motor is connected with the bearing circular truncated cone 5 to drive the bearing circular truncated cone 5 to rotate, the bearing circular truncated cone 5 is fixedly connected with the bottom of the layered bracket, to support the layered bracket and drive the layered bracket to rotate, the layered bracket comprises a middle shaft and a layered clapboard 3, the middle shaft is provided with the layered clapboard 3 for heat insulation, the bottom of the layered partition board 3 is provided with a slide rail, the slide rail is provided with a photographic device 14 and an LED growth lamp 15, so that the photographing device 14 can freely slide on the guide rail 12 and photograph the inside of the cultivation room 2 provided between the layering partition plates 3, the cultivation bin 2 is used for bearing a needle mushroom cultivation base or cultivation bags and can extend out of the layering partition plate 3. The central control processor controls the gravity sensor and the photographic device 14 in the corresponding cultivation bin 2 to be started according to the cultivation stage option selected by the operation panel and the pre-cultivation bin 2, identifies whether the needle mushroom cultivation in different cultivation stages is abnormal, adjusts the temperature, the illumination intensity and the running power of the fan 4 in the cultivation bin 2, and when the central control processor works, the motor 6 drives the cultivation device to rotate slowly and ceaselessly so as to ensure the ventilation quantity in the cultivation bin.
The central control processor is electrically connected with the photographic device 14, the LED growth lamp 15 and the fan, and is used for finishing data exchange with the photographic device 14, controlling the illumination intensity of the LED growth lamp 15 and controlling the running power of the fan 4;
specifically, when the cultivation of the flammulina velutipes in the spawn running stage is to be performed, the pre-placed cultivation bin 2 is selected through the operation panel, and selects the spawn running and cultivating stage option, the central control processor shoots the images of the needle mushroom cultivating bags in the cultivating bin 2 at intervals of preset time T1, recording the hypha coverage area S of the upper surface of each needle mushroom cultivation bag and the average value SP of the hypha coverage area of the upper surface of each needle mushroom cultivation bag according to the shot images, calculating the growth rate V of the hypha coverage area of the flammulina velutipes according to the average value SP of the hypha coverage area of the upper surface of the flammulina velutipes cultivation bag, meanwhile, the gravity change rate MV is calculated according to the data transmitted by the gravity sensor, and the spawn running cultivation adjustment coefficient K1 is calculated, judging whether the first cultivation stage of the flammulina velutipes is abnormal or not according to the spawn running cultivation adjustment coefficient K1, and adjusting the temperature in the cultivation bin 2 and the running power of a fan 4 of the cultivation bin 2;
specifically, when the cultivation of the flammulina velutipes in the bud forcing stage is performed in advance, the pre-arranged cultivation bin 2 is selected through the operation panel, the bud forcing cultivation stage option is selected, the flammulina velutipes in the bud forcing cultivation stage is subjected to bud forcing cultivation, the central control processor controls the camera 14 in the cultivation bin 2 to be started, the flammulina velutipes in the cultivation bin 2 starts to be shot, the size S of the bud head of the flammulina velutipes is identified according to shot image information, and when the bud head of the flammulina velutipes reaches the preset value S0, the central control processor judges that the flamm
And (4) completing bud forcing, recording the pictures of the flammulina velutipes subjected to the bud forcing, and simultaneously sending out voice prompts.
Specifically, when cultivation in the uniform cultivation and inhibition stage of needle mushrooms is to be performed, the pre-placed cultivation bin 2 is selected through the operation panel, and the options of the uniform cultivation and inhibition cultivation stage are selected, cultivation in the uniform cultivation and inhibition stage of needle mushrooms is performed, the central control processor controls the photographing device 14 and the weight sensor in the cultivation bin 2 to be started, photographing of needle mushrooms in the cultivation bin 2 is started, the central control processor controls the photographing device 14 to photograph needle mushroom pictures every photographing interval T2 time, the diameter R of a single needle mushroom cap is identified, the diameter growth rate VR of each needle mushroom cap and the average diameter growth rate VRH of all needle mushrooms in the cultivation bin 2 are calculated, whether abnormality exists in the inhibition cultivation of needle mushrooms in different periods is determined according to the average diameter growth rate VRH of all needle mushrooms, and whether the inhibition cultivation time needs to be prolonged or not is determined, when the inhibition is finished and the homogenesis is started, the central control processor calculates homogenesis contrast parameters JY according to the average pileus diameter growth rate VRH and the needle mushroom quality change rate MV of all needle mushrooms, and the central control processor adjusts the temperature in the cultivation bin 2, the running rate of the fan 4 and the irradiation intensity of the LED lamp according to the homogenesis contrast parameters JY.
As shown in fig. 1, the top of the heat-insulating casing 1 is provided with an opening and closing cover 7, and a humidifying device (not shown in the figure) is arranged in the heat-insulating casing 1 to control the humidity in the cultivation bin 2.
With reference to fig. 2,3 and 4, which are schematic diagrams of a surface a, a surface B and an external shape of a culture bin of a control device for an environment for culturing liquid strains of flammulina velutipes according to an embodiment of the present invention, a screw nut 8 is disposed at the bottom of the culture bin 2, which is matched with a lead screw 11 arranged on the layered clapboard 3, the lead screw 11 is connected with a micro motor 9, the micro motor 9 is electrically connected with the central processor so that the central processor can control the motor, the bottom of the culture bin is also provided with a track 10, when in work, the central control processor drives the screw rod 11 to move by controlling the micro motor so as to drive the culture bin 2 to extend or retract along the track 10, the culture bin 2 is provided with a fan 4, carry out ventilation through fan 4 in to cultivating the storehouse 2, in time get rid of and cultivate the carbon dioxide in the storehouse 2.
Referring to fig. 5, which is a schematic view of a bottom track of a layered partition plate of a control device for a needle mushroom liquid spawn culture environment according to an embodiment of the present invention, a plurality of cultivation bins 2 are disposed between the layered partition plates 3, each cultivation bin 2 is separated by a thermal insulation board, a guide rail 12 is vertically disposed on the layered partition plate 3 corresponding to the position of the cultivation bin 2, a moving rod 13 is transversely disposed on the guide rail 12, a motor 18 is disposed at one end of the moving rod 13, the motor 18 is electrically connected to a central control processor, so that the central control processor can control the start, stop, rotation, and reverse rotation of the motor 18, a gear 17 is disposed at an end of a motor rod of the motor, so as to cooperate with a sawtooth groove 16 disposed along the guide rail 12, the motor drives the moving rod 13 to freely move on the guide rail 12 by driving the gear to rotate, a photographing device 14 and an LED growth lamp 15 are fixedly disposed, so that the moving rod 13 drives the photographic device 14 to move freely on the guide rail 12, the condition inside the cultivation bin 2 can be shot, the flammulina velutipes in the cultivation bin 2 can be irradiated by light, and meanwhile, when the cultivation bin 2 extends out of the layered bracket, the photographic device 14 and the LED growth lamp 15 also move properly along the guide rail 12 towards the extension direction of the cultivation bin 2, so that the edge of the cultivation bin 2 is prevented from colliding with the photographic device 14 and the LED growth lamp 15.
Referring to fig. 6, which is a schematic view of a layered partition structure of a control device for a needle mushroom liquid spawn cultivation environment according to an embodiment of the present invention, the layered support includes a vertically-arranged central axis and layered partitions 3 disposed on the central axis at intervals, the layered partitions 3 include a heat insulation layer 21, an electric heating layer 20, and a heat dissipation layer 19 inside, the heat insulation layer is made of a heat insulation material to insulate heat, the electric heating layer is provided with a heating element and is electrically connected to a central control processor to control a heating degree of the heating element through the central control processor, the heat dissipation layer 19 is used to dissipate heat out of the cultivation bin 2 above, and the central control processor can control a temperature inside the cultivation bin 2 through the heating degree of the heating element in combination with an operation of a fan.
Specifically, when the cultivation in the equalizing and inhibiting stage is carried out, the central control processor obtains the total number N of needle mushroom cultivation bags in the cultivation bin according to picture information shot by the photographic device, obtains the average size G of needle mushroom caps in the cultivation bin, obtains the total mass M of loaded objects in the cultivation bin according to the weight sensor, calculates the average weight M of each cultivation bag, wherein M is M/N, calculates the initial contrast parameter W according to the average size G of the needle mushroom caps and the weight M of each cultivation bag,
W＝(m/m0)+(G/G0)，
wherein m represents the average weight of a single cultivation bag, m0 represents the average weight of a preset cultivation bag, G represents the average size G of flammulina velutipes pileus, G0 represents the average size G of the preset flammulina velutipes pileus, a central control processor determines the initial temperature in an inhibition stage, the running speed of a fan and the illumination intensity of an LED growth lamp in an equalization stage according to the initial contrast parameter W, an ith parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4) is preset in the central control processor, i is 1, 2.. n, wherein Xi1 represents a parameter selection range, Xi2 represents the ith temperature, Xi3 represents the running power of the ith fan, and Xi4 represents the ith illumination intensity;
when the initial contrast parameter W belongs to a parameter selection range Xi1 of an i-th parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4), the central control processor selects the i-th temperature Xi2 as an initial temperature of a suppression stage, the i-th fan running power Xi3 as initial fan running power of the suppression stage, and the i-th illumination intensity Xi4 as initial illumination intensity of a homoiotic stage.
Specifically, when pre-cultivated golden mushroom is placed, the pre-placed cultivating bin 2 is selected through the operation panel, a first-stage option is selected, cultivation in a first stage of golden mushroom is carried out, the central control processor controls the quality sensor in the cultivating bin 2 to be started, the photographing device 14 in the cultivating bin 2 is controlled to be started, photographing of the golden mushroom in the cultivating bin 2 is started, the central control processor photographs images of golden mushroom cultivating bags in the cultivating bin 2 at preset time intervals of T1, the hypha coverage area S of the upper surface of each golden mushroom cultivating bag is recorded according to the photographed images, the hypha coverage area average value SP of the upper surface of each golden mushroom cultivating bag is calculated according to the following formula,
V＝(SPi-SPi-1)/T1
wherein: t1 denotes a predetermined time interval, SPiRepresents the average area of the upper surface of the needle mushroom cultivation bag in the ith shooting, SPi-1Representing the average area of the upper surface of the needle mushroom cultivation bag shot in the i-1 th time; meanwhile, the central control processor records the data of the gravity sensor in the cultivating bin 2 every preset time D1, calculates the gravity change rate MV,
MV＝(Mi-Mi-1)/D1
the central control processor calculates a spawn running and cultivating adjustment coefficient K1 according to the hypha coverage area growth rate V and the gravity change rate MV,
K1＝(V/V0)+(MV/MV0)，
wherein V represents a hypha coverage area growth rate, V0 represents a preset hypha coverage area growth rate, MV represents a gravity change rate, a central processor is internally preset with a temperature adjusting matrix D (D1, D2, D3), wherein D1 represents the 1 st adjustment temperature, D2 represents the 2 nd adjustment temperature, D3 represents the 3 rd adjustment temperature, D3> D2> D1, the central processor is also internally preset with a fan 4 adjusting matrix F (F1, F2, F3), wherein F1 represents the first operating power, F2 represents the second operating power, F3 represents the third operating power, F3> F2> F1, the central processor is also preset with contrast parameters K01, K02 and K03, the central processor compares the fungus growing adjusting coefficient K1 with preset contrast parameters K01, K02 and K03 to determine whether the first mushroom growing chamber has abnormal operating temperature, and adjusts the operating power of the fan 2 in the first mushroom growing chamber, when the judgment is carried out:
when K1 is not more than K01, the central control processor judges that needle mushroom cultivation in the first cultivation stage in the cultivation bin 2 is abnormal, the central control processor selects the 1 st adjustment temperature D1 in the temperature adjustment matrix D (D1, D2 and D3) as a control parameter to control the temperature in the cultivation bin 2 to increase D1, and the central control processor selects the third operating power F1 in the fan 4 adjustment matrix F (F1, F2 and F3) as a control parameter to control the operating power of the fan 4 in the cultivation bin 2 to increase F1;
when K01 is more than K1 and less than or equal to K02, the central control processor judges that the needle mushrooms in the first cultivation stage in the cultivation bin 2 are normally cultivated, and maintains the original temperature in the cultivation bin 2 and the original power of the fan 4;
when K02 is more than or equal to K1 and less than or equal to K03, the central control processor judges that the cultivation of the flammulina velutipes in the first cultivation stage in the cultivation bin 2 is abnormal, selects the 2 nd adjustment temperature D2 in the temperature adjustment matrix D (D1, D2 and D3) as a control parameter, controls the temperature in the cultivation bin 2 to be reduced by D2, selects the third operating power F2 in the fan 4 adjustment matrix F (F1, F2 and F3) as a control parameter, and controls the operating power of the fan 4 in the cultivation bin 2 to be increased by F2;
when K1 is more than K03, the central control processor judges that needle mushroom cultivation in the first cultivation stage in the cultivation bin 2 is abnormal, the central control processor selects the 3 rd adjustment temperature D3 in the temperature adjustment matrix D (D1, D2 and D3) as a control parameter to control the temperature in the cultivation bin 2 to be reduced by D3, and the central control processor selects the third operating power F3 in the fan 4 adjustment matrix F (F1, F2 and F3) as a control parameter to control the operating power of the fan 4 in the cultivation bin 2 to be increased by F3.
Specifically, when the cultivation of the flammulina velutipes in the bud forcing stage is carried out in advance, the pre-placed cultivation bin 2 is selected through the operation panel, the option of the bud forcing cultivation stage is selected, the central control processor controls the motor to be started, the selected cultivation bin 2 is pushed to extend out, meanwhile, the camera 14 in the selected cultivation bin 2 is controlled to be started, the flammulina velutipes in the cultivation bin 2 starts to be shot, the size S of the bud heads of the flammulina velutipes is identified according to shot image information, when the bud heads of the flammulina velutipes reach the preset value S0, the central control processor judges that the bud forcing is completed, records the pictures of the flammulina velutipes with the bud forcing completed, and.
Specifically, when cultivation in a uniform cultivation and inhibition stage of flammulina velutipes is to be performed, a pre-placed cultivation bin 2 is selected through an operation panel, and options of the uniform cultivation and inhibition cultivation stage are selected, cultivation in the uniform cultivation and inhibition stage of the flammulina velutipes is performed, the central control processor controls the camera 14 and the weight sensor in the cultivation bin 2 to be started, photographing of the flammulina velutipes in the cultivation bin 2 is started, the central control processor controls the camera 14 to photograph flammulina velutipes pictures every photographing interval T2, the diameter R of a single flammulina velutipes cap is identified, the diameter growth rate VR of each flammulina velutipes cap and the average diameter growth rate VRH of all flammulina velutipes in the cultivation bin 2 are calculated, VRH is equal to the sum of the diameter growth rates of all the flammulina velutipes caps divided by,
VR＝(Ri-Ri-1)/T2
wherein: riRepresents the maximum diameter, R, of the cap of Flammulina velutipes at the ith shootingi-1The maximum diameter of the flammulina velutipes pileus in the i-1 th shooting is shown, and T2 shows the shooting interval;
the central control processor calculates an inhibition contrast parameter Z according to the average pileus diameter growth rate VRH of the flammulina velutipes,
Z＝VRH/VRH0
wherein VRH represents the average diameter growth rate of the pileus of the flammulina velutipes, and VRH0 represents the average diameter growth rate of the pileus of the preset flammulina velutipes;
the central processor sets a throttle adjustment matrix Y (Y1, Y2, Y3), where Y1 denotes a first duration, Y2 denotes a second duration, Y3 denotes a third duration, Y3> Y2> Y1,
a suppression temperature adjusting matrix J (J1, J2) is also preset in the central control processor, wherein J1 represents a first adjusting temperature, J2 represents a second adjusting temperature, J1< J2 the central control processor presets a suppression interval parameter matrix Ei (Ei1, Ei2), i is 1,2,3, wherein Ei1 represents a first suppression contrast parameter, Ei2 represents a second suppression contrast parameter, the central control processor determines the suppression duration and the suppression temperature of flammulina velutipes in the cultivation bin 2 according to the pileus average diameter growth rate VRH of the flammulina velutipes, the central control processor presets a suppression time TJ and divides the suppression time TJ into three intervals which comprise a first division interval TJ1, a second division interval TJ2 and a third division interval TJ3,
when the cultivation time of the flammulina velutipes in the cultivation bin 2 is in any ith division area TJi, the central control processor calls data in a suppression area parameter matrix Ei (Ei1, Ei2) as comparison parameters,
when the Z is less than or equal to Ei1, the central control processor judges that the inhibition cultivation of the needle mushrooms is normal and maintains the original temperature unchanged;
when Ei1 is less than or equal to Ei2, the central control processor judges that the cultivation of the flammulina velutipes is inhibited abnormally, and reduces the temperature by J1
When Z is more than Ei1, the central control processor judges that the flammulina velutipes is abnormally inhibited from cultivating, and reduces the temperature by J2
When the cultivation time of the needle mushrooms in the cultivation bin 2 is within the third division interval TJ3, the central control processor calls the data in the inhibition interval parameter matrix Ei (Ei1, Ei2) as the comparison parameters,
when Z is less than or equal to Ei1, the central control processor judges that the inhibition cultivation of the needle mushrooms is normal and maintains the inhibition time TJ unchanged;
when Ei1 is less than or equal to Ei2, the central control processor judges that the flammulina velutipes is abnormally inhibited and cultivated, and prolongs the inhibition duration TJ to be TJ + Y1;
and when Z is greater than Ei1, the central control processor judges that the flammulina velutipes is abnormally inhibited and cultivates the flammulina velutipes, and prolongs the inhibition time TJ to be TJ + Y2.
Specifically, a nursery stage temperature matrix YT (YT1, YT2, YT3), an illumination control matrix L (L1, L2, L3) and a nursery stage fan 4 power matrix P (P1, P2, P3) are also preset inside the central control processor, wherein YT1 represents a first nursery temperature adjustment parameter, YT2 represents a second nursery temperature adjustment parameter, YT3 represents a third nursery temperature adjustment parameter, YT1< YT2< YT3, L1 represents a first illumination intensity, L2 represents a second illumination intensity, L3 represents a third illumination intensity, P1 represents a first fan 4 operating power, P2 represents a second fan 4 operating power, P3 represents a third fan 4 operating power, the central control processor judges that the suppression is finished and controls the growth rate of the needle mushroom in the nursery bin 2 after the flammulina velutipes growth rate in the nursery bin 2 reaches the suppression or the suppression after the suppression is reached, and the growth rate of the needle growth of the flammulina velutipes growth in the nursery bin 2 is calculated according to the variation rate of the needle growth indicator h 2 and the variation of The parameters JY are used to determine,
JY＝(MV/MV0)+(VRH/VRH0)
wherein M represents the needle mushroom mass change rate in the cultivating bin 2, MV0 represents the preset needle mushroom mass change rate in the cultivating bin 2, VRH represents the average pileus diameter increase rate of needle mushrooms, VRH0 represents the average pileus diameter increase rate of needle mushrooms, comparison parameters JY01, JY02 and JY03 are also preset in the central control processor, the central control processor adjusts the temperature in the cultivating bin 2, the running rate of the fan 4 and the irradiation intensity of the LED lamp according to the average breeding comparison parameter JY,
when JY is less than or equal to JY01, the central control processor adjusts the temperature, increases a third incubation temperature adjusting parameter YT3, simultaneously adjusts the operation power of the fan 4, increases the operation power P3 of the third fan 4, and adjusts the illumination intensity of the LED growth lamp 15 to a third illumination intensity L3;
when JY01< JY02, the central control processor adjusts the temperature, increases a second incubation temperature adjusting parameter YT2, simultaneously adjusts the running power of the fan 4, increases the running power P2 of the third fan 4, and adjusts the illumination intensity of the LED growth lamp 15 to a third illumination intensity L2;
when JY02 is more than JY and less than JY03, the central control processor judges that the current homonuresis effect is good, and maintains the original temperature of the breeding bin 2, the running power of the fan 4 and the illumination intensity of the LED growth lamp 15 unchanged;
when JY > JY03 is adopted, the central control processor adjusts the temperature to reduce the first incubation temperature adjusting parameter YT1, meanwhile, the operation power of the fan 4 is adjusted to reduce the operation power P1 of the first fan 4, and the illumination intensity of the LED growth lamp 15 is adjusted to be the first illumination intensity L1.
Specifically, the central control processor is arranged inside the operation panel, and the structure of the central control processor is not limited in the embodiment of the invention, for example, a microcomputer or a PLC circuit board, and only data operation, receiving and processing need to be completed.
Specifically, the spawn running stage in this embodiment is that hyphae can cover the whole material surface 20-25 days after the cultivation bag is placed into the cultivation bag 2 of the present invention for cultivation and inoculation, mycelium stimulation is manually performed after spawn running is finished, the spawn block during spawn running is dug off, sporocarp can be produced from the surface of the culture medium at the same time, if the surface of the culture medium is very dry, scratching can be used, old seed coats and 5-10 mm of culture medium are scraped off together in blocks, hyphae can form primordium under mechanical stimulation and low-temperature stimulation of mycelium stimulation, the spawn after mycelium stimulation is placed in the culture bag to induce fruiting, after one week, spire buds grow continuously, the bud heads are normal, the uniform cultivation and inhibition are divided into a uniform cultivation stage and an inhibition stage, the primordium with weak resistance is not withered by utilizing the low temperature of the inhibition process, the resistance is increased, and the uniform development can be realized, the inhibition is to inhibit the growth of the golden mushroom which grows first and promote the growth of the golden mushroom which grows later, so that all the stipes are uniform and consistent in length, and the effect of promoting the growth and production increase of the stipes and improving the quality is achieved by providing proper illumination in the stage of uniform cultivation;
when the harvesting requirement is met, the mushroom is harvested in the proper period when the length of the stipe is 13-14 cm, the mushroom is tidy, the diameter of the pileus is about 1cm, the edge of the pileus is inward curled and has no distortion, the pileus of the stipe is not water-absorbing, the root of the stipe is clear, the pileus is round and thick, the whole body is pure white, the mushroom body is solid, and the harvesting period is when the water content is too much. The moisture content of the pileus is checked in the first few days of harvesting, and if the pileus contains much moisture, ventilation is performed in the first two days of harvesting to promote moisture evaporation. After harvesting, removing part of culture medium connected with the stipe base and the culture medium and the mushroom with poor growth, and carrying out small packaging according to market requirements or carrying out air extraction sealing by using a polyethylene film bag, and carrying out low-temperature preservation. After the second step of fruiting, in order to improve the yield and the quality, the fungus columns can be separated from the turning bags, the original fruiting bag opening can be sealed, and the other end of the fungus column can be opened for fruiting.
So far, the technical solutions of the present invention have been described in connection with the preferred embodiments shown in the drawings, but it is easily understood by those skilled in the art that the scope of the present invention is obviously not limited to these specific embodiments. Equivalent changes or substitutions of related technical features can be made by those skilled in the art without departing from the principle of the invention, and the technical scheme after the changes or substitutions can fall into the protection scope of the invention.
Claims (9)
1. An application method of an LED lamp in needle mushroom cultivation is characterized by comprising the following steps:
cultivating needle mushroom by using a cultivating device, arranging an LED growth lamp, a photographic device and a gravity sensor in a cultivating bin of the cultivating device, externally connecting a central control device, finishing data exchange with the LED growth lamp, the photographic device and the gravity sensor, judging whether an abnormal condition exists in a needle mushroom cultivating inhibition stage by image information shot by the photographic device and gravity information obtained by the gravity sensor, adjusting the temperature in the cultivating bin, adjusting the illumination intensity of the LED growth lamp and the running power of a fan on the cultivating bin, wherein,
the central control processor is electrically connected with the photographic device, the LED growth lamp and the fan so as to complete data exchange with the photographic device, control the illumination intensity of the LED growth lamp and control the running power of the fan;
when needle mushroom uniform cultivation and inhibition stage cultivation are carried out, selecting uniform cultivation and inhibition stage cultivation options through a control panel, enabling a central control processor to control a camera and a weight sensor in a cultivation bin to be started, starting to shoot the needle mushrooms in the cultivation bin, controlling the camera to shoot needle mushroom pictures by the central control processor every shooting interval T2 time, identifying the diameter R of a single needle mushroom cap, calculating the diameter growth rate VR of each needle mushroom cap and the average diameter growth rate VRH of all the needle mushrooms in the cultivation bin, judging whether the needle mushroom inhibition cultivation in different time periods is abnormal or not according to the average diameter growth rate VRH of all the needle mushrooms and judging whether inhibition cultivation time needs to be prolonged or not, when inhibition is finished and uniform cultivation is started, calculating a uniform cultivation contrast parameter JY by the central control processor according to the average diameter growth rate H of all the cap of all the needle mushrooms and the quality change rate of the needle mushrooms, the temperature in the cultivation bin, the running speed of the fan and the irradiation intensity of the LED lamp are adjusted through the central control processor according to the homoiotomy contrast parameter JY.
2. The method of claim 1, wherein during the incubation period of the equalization and inhibition phases, the central control processor obtains the total number N of needle mushroom culture bags in the incubation chamber and the average size G of needle mushroom caps in the incubation chamber according to the picture information taken by the camera, and simultaneously, the central control processor obtains the total mass M of the load in the incubation chamber according to the weight sensor, calculates the average weight M of the single culture bag, M being M/N, calculates the initial comparison parameter W according to the average size G of the needle mushroom caps and the weight M of the single culture bag,
W＝(m/m0)+(G/G0)，
wherein m represents the average weight of a single cultivation bag, m0 represents the average weight of a preset cultivation bag, G represents the average size G of flammulina velutipes pileus, G0 represents the average size G of the preset flammulina velutipes pileus, a central control processor determines the initial temperature in an inhibition stage, the running speed of a fan and the illumination intensity of an LED growth lamp in an equalization stage according to the initial contrast parameter W, an ith parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4) is preset in the central control processor, i is 1, 2.. n, wherein Xi1 represents a parameter selection range, Xi2 represents the ith temperature, Xi3 represents the running power of the ith fan, and Xi4 represents the ith illumination intensity;
when the initial contrast parameter W belongs to a parameter selection range Xi1 of an i-th parameter selection matrix Xi (Xi1, Xi2, Xi3 and Xi4), the central control processor selects the i-th temperature Xi2 as an initial temperature of a suppression stage, the i-th fan running power Xi3 as initial fan running power of the suppression stage, and the i-th illumination intensity Xi4 as initial illumination intensity of a homoiotic stage.
3. The method of applying an LED lamp to cultivation of Flammulina velutipes as claimed in claim 1, wherein the central control processor calculates the cap diameter growth rate VR for each Flammulina velutipes according to the following formula and calculates the average cap diameter growth rate VRH of all the Flammulina velutipes in the cultivation silo, the average cap diameter growth rate VRH being calculated by dividing the sum of the cap diameter growth rates VR of all the Flammulina velutipes by the number of the Flammulina velutipes,
VR＝(Ri-Ri-1)/T2
wherein R isiRepresents the maximum diameter, R, of the cap of Flammulina velutipes at the ith shootingi-1The maximum diameter of the flammulina velutipes pileus in the i-1 th shooting is shown, and T2 shows the shooting interval;
meanwhile, the central control processor calculates an inhibition contrast parameter Z according to the average pileus diameter growth rate VRH of the flammulina velutipes,
Z＝VRH/VRH0
wherein VRH represents the average diameter growth rate of the pileus of the flammulina velutipes, and VRH0 represents the average diameter growth rate of the pileus of the preset flammulina velutipes.
4. The method of using LED lamp in cultivation of Flammulina velutipes as claimed in claim 3, wherein the central processor is provided with a suppression adjustment matrix Y (Y1, Y2, Y3), wherein Y1 represents a first time duration, Y2 represents a second time duration, Y3 represents a third time duration, Y3> Y2> Y1, and a suppression temperature adjustment matrix J (J1, J2) is preset in the central processor, wherein J1 represents a first adjustment temperature, J2 represents a second adjustment temperature, J1< J2 central processor preset suppression interval parameter matrix Ei (Ei1, Ei2), i ═ 1,2,3, wherein Ei1 represents a first suppression contrast parameter, Ei2 represents a second suppression contrast parameter, the central processor determines suppression of needle cultivation and the temperature at the time of the suppression according to the pileus average diameter VRH of Flammulina velutipes, wherein TJ suppression time of the central processor is preset, and divides the inhibition time TJ into three sections including a first section TJ1, a second section TJ2, a third section TJ3,
when the cultivation time of the flammulina velutipes in the cultivation bin is in any ith division area TJi, the central control processor calls data in an inhibition area parameter matrix Ei (Ei1, Ei2) as comparison parameters,
when the Z is less than or equal to Ei1, the central control processor judges that the inhibition cultivation of the needle mushrooms is normal and maintains the original temperature unchanged;
when Ei1 is less than or equal to Ei2, the central control processor judges that the cultivation inhibition of the needle mushrooms is abnormal, and reduces the temperature by J1;
when Z is greater than Ei1, the central control processor judges that the flammulina velutipes inhibits cultivation abnormity, and reduces the temperature by J2.
5. The method for applying the LED lamp to flammulina velutipes cultivation according to claim 4, wherein when the central control processor determines that the cultivation time of the flammulina velutipes in the cultivation bin is in the third division interval TJ3, the central control processor calls data in the inhibition interval parameter matrix Ei (Ei1, Ei2) as comparison parameters,
when Z is less than or equal to Ei1, the central control processor judges that the inhibition cultivation of the needle mushrooms is normal and maintains the inhibition time TJ unchanged;
when Ei1 is less than or equal to Ei2, the central control processor judges that the flammulina velutipes is abnormally inhibited and cultivated, and prolongs the inhibition duration TJ to be TJ + Y1;
and when Z is greater than Ei1, the central control processor judges that the flammulina velutipes is abnormally inhibited and cultivates the flammulina velutipes, and prolongs the inhibition time TJ to be TJ + Y2.
6. The method of claim 5, wherein a nursery stage temperature matrix YT (YT1, YT2, YT3), an illumination control matrix L (L1, L2, L3), and a nursery stage fan power matrix P (P1, P2, P3) are preset in the central processor, wherein YT1 represents a first nursery temperature adjustment parameter, YT2 represents a second nursery temperature adjustment parameter, YT3 represents a third nursery temperature adjustment parameter, YT1< YT2< YT3, L1 represents a first illumination intensity, L2 represents a second illumination intensity, L3 represents a third illumination intensity, P1 represents a first fan operating power, P2 represents a second fan operating power, and P3 represents a third fan operating power;
when the flammulina velutipes in the cultivation bin reaches the inhibition duration or reaches the prolonged inhibition duration, the central control processor judges that the inhibition is finished and controls the LED growth lamps in the cultivation bin to be started, the central control processor calculates a uniform cultivation contrast parameter JY according to the average pileus diameter growth rate VRH of the flammulina velutipes and the mass change rate MV of the flammulina velutipes in the cultivation bin according to the following formula,
JY＝(MV/MV0)+(VRH/VRH0)
wherein M represents the mass change rate of needle mushrooms in the cultivation bin, MV0 represents the mass change rate of needle mushrooms in the preset cultivation bin, VRH represents the average diameter growth rate of pili of needle mushrooms, and VRH0 represents the average diameter growth rate of pili of needle mushrooms.
7. The method for applying the LED lamp to the cultivation of flammulina velutipes according to claim 6, wherein the central processor is also preset with contrast parameters JY01, JY02 and JY03, and when the central processor adjusts the temperature in the cultivation bin, the fan operation rate and the LED lamp illumination intensity according to the contrast parameter JY for cultivation,
when JY is less than or equal to JY01, the central control processor adjusts the temperature, increases a third incubation temperature adjusting parameter YT3, simultaneously adjusts the fan operation power, increases a third fan operation power P3, and adjusts the illumination intensity of the LED growth lamp to a third illumination intensity L3;
when JY01< JY02, the central control processor adjusts the temperature, increases a second incubation temperature adjusting parameter YT2, simultaneously adjusts the fan operation power, increases a third fan operation power P2, and adjusts the illumination intensity of the LED growth lamp to a third illumination intensity L2;
when JY02 is less than JY and less than JY03, the central control processor judges that the current homonuresis effect is good, and maintains the original temperature of the breeding bin, the running power of the fan and the illumination intensity of the LED growth lamp unchanged;
when JY > JY03 is adopted, the central control processor adjusts the temperature to reduce the first incubation temperature adjusting parameter YT1, meanwhile, the fan operation power is adjusted to reduce the first fan operation power P1, and the illumination intensity of the LED growth lamp is adjusted to be the first illumination intensity L1.
8. An apparatus for culturing Flammulina velutipes, which is applied to the method according to any one of claims 1 to 7, comprising,
the surface of the heat preservation shell is provided with a control panel for inputting an operation command;
the cultivation device is arranged in the heat preservation shell and comprises a layered support, the layered support is used for dividing the cultivation device into a plurality of cultivation bins, the cultivation bins are used for bearing needle mushroom cultivation bases or cultivation bags and are used for cultivating needle mushrooms in different cultivation stages respectively, a slide rail is arranged on the layered support, a photographing device and an LED growth lamp are arranged on the slide rail, so that the photographing device can freely slide on the guide rail and photograph the inside of the cultivation bins arranged between the layered baffles, a gravity sensor is arranged at the bottom of each cultivation bin to detect the bearing weight in each cultivation bin, and a fan is further arranged on the side wall of each cultivation bin and is used for enabling air in each cultivation bin to flow through;
the central control processor is electrically connected with the photographic device, the LED growth lamp and the fan so as to complete data exchange with the photographic device, control the illumination intensity of the LED growth lamp and control the running power of the fan;
through control panel can select the cultivation storehouse that the asparagus cultivated the stage and cultivate the asparagus in advance, well accuse processor basis cultivation stage option that control panel selected and the cultivation storehouse control of cultivating the asparagus in advance correspond and cultivate the gravity sensor and the camera device start in the storehouse, discern whether the asparagus of different cultivation stages is cultivated and have an anomaly to the adjustment is cultivated temperature, illumination intensity, the operating power of fan and the illumination intensity of LED growth lamp in the storehouse.
9. The needle mushroom cultivation device according to claim 8, wherein the cultivation device further comprises a motor and a supporting circular truncated cone, the motor is arranged at the center of the bottom of the heat preservation housing, a motor shaft of the motor is connected with the supporting circular truncated cone to drive the supporting circular truncated cone to rotate, the supporting circular truncated cone is fixedly connected with the bottom of the layering support to support the layering support and drive the layering support to rotate, the layering support comprises a central shaft and layering partition plates, and the central shaft is provided with the layering partition plates to insulate heat.
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