CN112685980B - Comparison and positioning method for DRC violations of layout - Google Patents
Comparison and positioning method for DRC violations of layout Download PDFInfo
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Abstract
The invention provides a comparison and positioning method of layout DRC violations, which generates an original version violation coordinate file containing original version violation coordinates and a new version violation coordinate file containing new version violation coordinates; judging whether the types of the violations are consistent; if the original edition violation coordinate file and the new edition violation coordinate file are consistent and all polygonal, respectively converting the original edition violation coordinate file and the new edition violation coordinate file into an original edition layout file and a new edition layout file, and comparing and highlighting and positioning different polygons after comparison; if the types of the violation coordinates are consistent and the violation coordinates are edges, highlighting and positioning different edges after comparison; if the types of the violation coordinates are inconsistent, converting the violation coordinates into consistent types. The contrast and positioning method of the territory DRC violations can efficiently realize the contrast and positioning of territory violations, and avoid the defects of time consumption, labor consumption and error prone of manual contrast when the number of violations is too large, thereby improving the efficiency and accuracy of DRC development, shortening project period and reducing research and development cost.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a method for comparing and positioning violation of a layout DRC.
Background
The layout design rule is a key factor for ensuring successful circuit design, smooth mass production of products and ensuring the yield of chips. As process nodes shrink, layout design rules become more complex, and the accuracy of Design Rule Checking (DRC) is also particularly important. In the DRC development process, to ensure the accuracy of a new version of DRC, a typical method is to evaluate the same layout as an original version of DRC and compare the number and position of layout violations checked by the two versions of DRC. When the number of violations is too large, the manual comparison method is time-consuming, labor-consuming and error-prone, and cannot guarantee the efficiency and accuracy of DRC development.
The coordinate data comparison method of DRC file disclosed in the prior art discloses rules of data coordinate comparison, but does not provide specific implementation steps of coordinate comparison. The coordinates of the error pattern are rectangular coordinates, and the comparison between other types of coordinates (such as other polygon coordinates and edge coordinates) and the comparison method between the different types of coordinates (such as polygon coordinates and edge coordinates) are not solved.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, an object of the present invention is to provide a method for comparing and locating violations of a layout DRC, which is used to solve the problem that in the prior art, in the rule of data coordinate comparison, comparison between different types of graphics coordinates is lacking to meet the requirement of DRC development.
To achieve the above and other related objects, the present invention provides a method for comparing and locating violations of a layout DRC, including at least:
step one, providing a layout for DRC evaluation, and respectively evaluating the layout by using an original edition DRC method and a new edition DRC method to respectively generate an original edition violation coordinate file containing original edition violation coordinates and a new edition violation coordinate file containing new edition violation coordinates;
step two, judging whether the original edition violation coordinates are consistent with the violation types of the new edition violation coordinates or not;
if the violation types are consistent and all the violation files are polygons, converting the original edition violation coordinate file and the new edition violation coordinate file into an original edition layout file and a new edition layout file respectively, comparing the original edition layout file and the new edition layout file, and highlighting and positioning different polygons after comparison; or comparing the original version of the violation coordinate file with the new version of the violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different polygons after comparison;
if the types of the violation coordinates are consistent and are edges, comparing the original edition violation coordinate file with the new edition violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different edges after comparison;
if the types of the violation coordinates are inconsistent, firstly converting the violation coordinates into consistent types, obtaining an original edition violation coordinate file and a new edition violation coordinate file which are consistent in type after conversion, respectively converting the original edition violation coordinate file and the new edition violation coordinate file which are consistent in type after conversion into an original edition layout file and a new edition layout file, and comparing the original edition layout file and the new edition layout file and highlighting and positioning different polygons after comparison; or comparing the original version of the violation coordinate file with the new version of the violation coordinate file by using a coordinate comparison and filtering method, and highlighting and positioning different polygons after comparison.
Preferably, in the second step, whether the violation type is a polygon or a side is judged through the expression form of the violation coordinates, so as to judge whether the violation type is consistent.
Preferably, in the second step, the original edition violation coordinate file and the new edition violation coordinate file are respectively converted into an original edition layout file and a new edition layout file by using layout editing software.
Preferably, in the second step, the original edition layout file and the new edition layout file are used for comparison in the layout editing software, the same graph is filtered, only different polygon graphs are left, and different polygons after comparison are highlighted and positioned.
Preferably, in the second step, the different polygons after comparison are highlighted and positioned in the layout.
Preferably, in the second step, a different polygon is stored as a new coordinate file.
Preferably, the method for comparing and filtering coordinates in the second step includes: and filtering out the same coordinates in the same inspection rule by automatic screening the original version violation coordinate file and the new version violation coordinate file, and leaving different coordinates.
Preferably, in the second step, when the types of the violations are inconsistent, the violations are converted into consistent types through automatic script conversion.
Preferably, the automated script transformation includes transformation of polygon coordinates to edge coordinates or transformation of edge coordinates to polygon coordinates.
As described above, the layout DRC violation comparison and positioning method of the invention has the following beneficial effects: the contrast and positioning method of the territory DRC violations can efficiently realize the contrast and positioning of territory violations, and avoid the defects of time consumption, labor consumption and error prone of manual contrast when the number of violations is too large, thereby improving the efficiency and accuracy of DRC development, shortening project period and reducing research and development cost.
Drawings
FIG. 1 is a flow chart of a method for comparing and locating layout DRC violations in the present invention;
FIG. 2 is a schematic view of a portion of an original violation coordinate file of the present invention;
FIG. 3 is a schematic view of a portion of a new version of a violation coordinate file according to the present invention;
FIG. 4 is a schematic diagram of a portion of an original layout file when the violation type is a polygon in the present invention;
FIG. 5 is a schematic diagram of a portion of a new layout file when the violation type is a polygon in the present invention;
FIG. 6 is a schematic illustration of the present invention after the original layout file and the new layout file are compared to leave a different polygon;
FIG. 7 is a schematic diagram of the present invention showing different polygons after comparison highlighted in the layout being evaluated;
FIG. 8 is a schematic representation of a portion of an original violation coordinate file with violation coordinate types as edges in the present invention;
FIG. 9 is a schematic diagram of a portion of a new version of a violation coordinate file with violation coordinate types as edges in the present invention;
FIG. 10 is a schematic diagram of a portion of a coordinate file containing different coordinates after automatic filtering of a coordinate type edge according to the present invention;
FIG. 11 is a schematic diagram of an automatically filtered edge of the present invention after highlighting in the layout being evaluated.
Detailed Description
Other advantages and effects of the present invention will become apparent to those skilled in the art from the following disclosure, which describes the embodiments of the present invention with reference to specific examples. The invention may be practiced or carried out in other embodiments that depart from the specific details, and the details of the present description may be modified or varied from the spirit and scope of the present invention.
Please refer to fig. 1 to 11. It should be noted that, the illustrations provided in the present embodiment merely illustrate the basic concept of the present invention by way of illustration, and only the components related to the present invention are shown in the illustration, rather than being drawn according to the number, shape and size of the components in actual implementation, and the form, number and proportion of each component in actual implementation may be changed arbitrarily, and the layout of the components may be more complex.
The invention provides a comparison and positioning method of layout DRC violations, as shown in figure 1, figure 1 shows a flow chart of the comparison and positioning method of layout DRC violations in the invention, and the method at least comprises the following steps:
step one, providing a layout for DRC evaluation, and respectively evaluating the layout by using an original edition DRC method and a new edition DRC method to respectively generate an original edition violation coordinate file containing original edition violation coordinates and a new edition violation coordinate file containing new edition violation coordinates; as shown in fig. 2 and 3, wherein fig. 2 is a schematic view of a master violation coordinate file portion of the present invention; FIG. 3 is a schematic view of a portion of a new version of a violation coordinate file according to the present invention;
step two, judging whether the original edition violation coordinates are consistent with the violation types of the new edition violation coordinates or not; in the second step of this embodiment, whether the violation type is polygonal or edge is determined according to the expression form of the violation coordinates, so as to determine whether the violation type is consistent.
If the violation types are consistent and all the violation files are polygons, the original edition violation coordinate file and the new edition violation coordinate file are respectively converted into an original edition layout file and a new edition layout file. FIG. 4 and FIG. 5 are schematic views of a portion of an original layout file when the type of violation is a polygon in accordance with the present invention; FIG. 5 is a schematic diagram of a portion of a new layout file when the violation type is a polygon in the present invention;
then comparing the original edition layout file with the new edition layout file and highlighting and positioning different polygons after comparison; in the second step of the embodiment, the original layout file and the new layout file are compared in the layout editing software, the same graph is filtered, only different polygon graphs are left, and different polygons after comparison are highlighted and positioned. And further, in the second step, the different polygons after comparison are highlighted and positioned in the layout.
FIG. 6 is a schematic illustration of the present invention in which the original layout file and the new layout file are compared to leave a different polygon; FIG. 7 is a schematic diagram of the present invention after highlighting the different polygons compared in the layout being evaluated.
Or comparing the original version of the violation coordinate file with the new version of the violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different polygons after comparison; and highlighting and positioning different polygons in the layout after comparison. In the second step of this embodiment, a different polygon is stored as a new coordinate file.
If the types of the violation coordinates are consistent and are edges, comparing the original edition violation coordinate file with the new edition violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different edges after comparison; FIG. 8 is a schematic view of a portion of an original violation coordinate file with violation coordinate types as edges in the present invention, as shown in FIGS. 8 and 9; FIG. 9 is a schematic diagram of a portion of a new version of a violation coordinate file with violation coordinate types as edges in the present invention.
The method for comparing and filtering coordinates in the second step of the embodiment further comprises the following steps: and filtering out the same coordinates in the same inspection rule by automatic screening the original version violation coordinate file and the new version violation coordinate file, and leaving different coordinates. A coordinate file is formed containing the different coordinates. And then highlighting the position in the layout being evaluated. FIG. 10 is a schematic diagram of a portion of a coordinate file containing different coordinates after automatic filtering of a coordinate type edge according to the present invention. FIG. 11 is a schematic illustration of the present invention with automatically filtered edges highlighted in the layout being evaluated, as shown in FIG. 11.
If the types of the violation coordinates are inconsistent, converting the violation coordinates into consistent types, and obtaining an original version violation coordinate file and the new version violation coordinate file which are consistent in the converted types.
In the second step of this embodiment, when the types of the violation coordinates are inconsistent, the violation coordinates are converted into the consistent type through an automated script conversion. Still further, the automated script transformation includes transformation of the polygon coordinates to the edge coordinates or transformation of the edge coordinates to the polygon coordinates.
The original edition violation coordinate file and the new edition violation coordinate file which are consistent in the type after conversion and are all polygons are respectively transferred into an original edition layout file and a new edition layout file, and then the original edition layout file and the new edition layout file are utilized for comparison and different polygons after comparison are highlighted and positioned; or comparing the original version of the violation coordinate file with the new version of the violation coordinate file by using a coordinate comparison and filtering method, and highlighting and positioning different polygons after comparison.
That is, if the converted type is polygonal, the original edition violation coordinate file and the new edition violation coordinate file with the same converted type are respectively transferred into an original edition layout file and a new edition layout file.
Then comparing the original edition layout file with the new edition layout file and highlighting and positioning different polygons after comparison; the invention further utilizes the original edition layout file and the new edition layout file to compare in the layout editing software, filters the same graph, only leaves different polygon graphs, and further highlights and positions the different polygons in the layout after comparison.
Or comparing the original version violation coordinate file with the new version violation coordinate file by utilizing a coordinate comparison and filtering method, storing different polygon patterns as new coordinate files, and highlighting and positioning the different polygons after comparison in the layout.
And comparing the original version violation coordinate file with the new version violation coordinate file by using a coordinate comparison and filtering method, and highlighting and positioning different edges after comparison.
If the converted type is an edge, comparing the original version of the violation coordinate file with the new version of the violation coordinate file by using a coordinate comparison and filtering method, and highlighting and positioning different edges after comparison; the invention further provides a coordinate comparison and filtering method, which comprises the following steps: and filtering out the same coordinates in the same inspection rule by automatic screening the original version violation coordinate file and the new version violation coordinate file, and leaving different coordinates.
In conclusion, the comparison and positioning method of the layout DRC violations can efficiently realize comparison and positioning of the layout violations, and the defects of time consumption, labor consumption and error prone caused by manual comparison when the number of violations is too large are avoided, so that the efficiency and accuracy of DRC development are improved, project period is shortened, and research and development cost is reduced. Therefore, the invention effectively overcomes various defects in the prior art and has high industrial utilization value.
The above embodiments are merely illustrative of the principles of the present invention and its effectiveness, and are not intended to limit the invention. Modifications and variations may be made to the above-described embodiments by those skilled in the art without departing from the spirit and scope of the invention. Accordingly, it is intended that all equivalent modifications and variations of the invention be covered by the claims, which are within the ordinary skill of the art, be within the spirit and scope of the present disclosure.
Claims (9)
1. A comparison and positioning method for DRC violations of a layout is characterized by at least comprising the following steps:
step one, providing a layout for DRC evaluation, and respectively evaluating the layout by using an original edition DRC method and a new edition DRC method to respectively generate an original edition violation coordinate file containing original edition violation coordinates and a new edition violation coordinate file containing new edition violation coordinates;
step two, judging whether the original edition violation coordinates are consistent with the violation types of the new edition violation coordinates or not;
if the violation types are consistent and all the violation files are polygons, converting the original edition violation coordinate file and the new edition violation coordinate file into an original edition layout file and a new edition layout file respectively, comparing the original edition layout file and the new edition layout file, and highlighting and positioning different polygons after comparison; or comparing the original version of the violation coordinate file with the new version of the violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different polygons after comparison;
if the types of the violation coordinates are consistent and are edges, comparing the original edition violation coordinate file with the new edition violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different edges after comparison;
if the types of the violation coordinates are inconsistent, firstly converting the violation coordinates into consistent types, and obtaining original edition violation coordinate files and new edition violation coordinate files with consistent types after conversion;
the original edition violation coordinate file and the new edition violation coordinate file which are consistent in the type after conversion and are all polygons are respectively transferred into an original edition layout file and a new edition layout file, and then the original edition layout file and the new edition layout file are utilized for comparison and different polygons after comparison are highlighted and positioned; or comparing the original version of the violation coordinate file with the new version of the violation coordinate file by utilizing a coordinate comparison and filtering method, and highlighting and positioning different polygons after comparison;
and comparing the original version violation coordinate file with the new version violation coordinate file by using a coordinate comparison and filtering method, and highlighting and positioning different edges after comparison.
2. The method for comparing and locating layout DRC violations according to claim 1, wherein: and step two, judging whether the violation type is a polygon or a side according to the expression form of the violation coordinates, so as to judge whether the violation type is consistent.
3. The method for comparing and locating layout DRC violations according to claim 1, wherein: and step two, converting the original edition violation coordinate file and the new edition violation coordinate file into an original edition layout file and a new edition layout file respectively by using layout editing software.
4. A method for comparing and locating layout DRC violations according to claim 3, wherein: and step two, comparing the original edition layout file with the new edition layout file in the layout editing software, filtering the same graph, only leaving different polygon graphs, and highlighting and positioning the different polygons after comparison.
5. The method for comparing and locating layout DRC violations according to claim 4, wherein: and step two, highlighting and positioning different polygons in the layout after comparison.
6. The method for comparing and locating layout DRC violations according to claim 5, wherein: and step two, storing different polygon patterns as new coordinate files.
7. The method for comparing and locating layout DRC violations according to claim 1, wherein: the coordinate comparison and filtering method in the second step comprises the following steps: and filtering out the same coordinates in the same inspection rule by automatic screening the original version violation coordinate file and the new version violation coordinate file, and leaving different coordinates.
8. The method for comparing and locating layout DRC violations according to claim 1, wherein: and step two, converting the violation coordinates into a consistent type through automatic script conversion when the violation coordinate types are inconsistent.
9. The method for comparing and locating layout DRC violations according to claim 8, wherein: automated script transformation includes transformation of polygon coordinates to edge coordinates or transformation of edge coordinates to polygon coordinates.
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4571072A (en) * | 1983-09-30 | 1986-02-18 | Honeywell Information Systems Inc. | System and method for making changes to printed wiring boards |
| JPH08185437A (en) * | 1994-12-29 | 1996-07-16 | Dainippon Printing Co Ltd | Cad system provided with actual article collating function |
| JPH10232484A (en) * | 1997-02-21 | 1998-09-02 | Toppan Printing Co Ltd | Device for designing photomask pattern and method therefor |
| JP2002197134A (en) * | 2000-12-27 | 2002-07-12 | Nec Microsystems Ltd | Design rule checking method of hierarchical layout pattern |
| CN103646031A (en) * | 2013-11-08 | 2014-03-19 | 上海华力微电子有限公司 | Method for contrasting coordinate data of DRC files |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11016035B2 (en) * | 2017-09-18 | 2021-05-25 | Elite Semiconductor Inc. | Smart defect calibration system and the method thereof |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4571072A (en) * | 1983-09-30 | 1986-02-18 | Honeywell Information Systems Inc. | System and method for making changes to printed wiring boards |
| JPH08185437A (en) * | 1994-12-29 | 1996-07-16 | Dainippon Printing Co Ltd | Cad system provided with actual article collating function |
| JPH10232484A (en) * | 1997-02-21 | 1998-09-02 | Toppan Printing Co Ltd | Device for designing photomask pattern and method therefor |
| JP2002197134A (en) * | 2000-12-27 | 2002-07-12 | Nec Microsystems Ltd | Design rule checking method of hierarchical layout pattern |
| CN103646031A (en) * | 2013-11-08 | 2014-03-19 | 上海华力微电子有限公司 | Method for contrasting coordinate data of DRC files |
Non-Patent Citations (1)
| Title |
|---|
| 电子产品面板控制芯片的物理验证;王仁平;施隆照;;电子工艺技术;20100518(03);全文 * |
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