CN112655077B - 基板处理装置的制造工艺判定装置、基板处理系统、基板处理装置的制造工艺判定方法、学习模型组、学习模型组的生成方法以及程序 - Google Patents

基板处理装置的制造工艺判定装置、基板处理系统、基板处理装置的制造工艺判定方法、学习模型组、学习模型组的生成方法以及程序 Download PDF

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CN112655077B
CN112655077B CN202080004996.7A CN202080004996A CN112655077B CN 112655077 B CN112655077 B CN 112655077B CN 202080004996 A CN202080004996 A CN 202080004996A CN 112655077 B CN112655077 B CN 112655077B
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manufacturing process
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CN112655077A (zh
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花田克司
藤原佑挥
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Sumitomo Precision Products Co Ltd
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    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
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    • G06N3/0464—Convolutional networks [CNN, ConvNet]
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    • G06N—COMPUTING ARRANGEMENTS BASED ON SPECIFIC COMPUTATIONAL MODELS
    • G06N20/00—Machine learning
    • G06N20/10—Machine learning using kernel methods, e.g. support vector machines [SVM]

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  • Manufacturing & Machinery (AREA)
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  • Chemical Vapour Deposition (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
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CN202080004996.7A 2019-03-04 2020-03-02 基板处理装置的制造工艺判定装置、基板处理系统、基板处理装置的制造工艺判定方法、学习模型组、学习模型组的生成方法以及程序 Active CN112655077B (zh)

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PCT/JP2019/008393 WO2020178945A1 (ja) 2019-03-04 2019-03-04 基板処理装置のプロセス判定装置、基板処理システム、基板処理装置のプロセス判定方法及び学習モデル群
PCT/JP2020/008659 WO2020179729A1 (ja) 2019-03-04 2020-03-02 基板処理装置の製造プロセス判定装置、基板処理システム、基板処理装置の製造プロセス判定方法、学習モデル群、学習モデル群の生成方法及びプログラム

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JP7176143B2 (ja) * 2021-03-31 2022-11-21 Ｓｐｐテクノロジーズ株式会社 基板処理装置のプロセス判定装置、基板処理システム、基板処理装置のプロセス判定方法、学習モデル群、学習モデル群の生成方法及びプログラム
JP7041773B1 (ja) 2021-05-26 2022-03-24 Ｓｐｐテクノロジーズ株式会社 基板処理装置のプロセス判定装置、基板処理システム、基板処理装置のプロセス判定方法、学習モデルの生成方法及びプログラム
JP7041776B1 (ja) 2021-06-30 2022-03-24 Ｓｐｐテクノロジーズ株式会社 基板処理装置のプロセス判定装置、基板処理システム、基板処理装置のプロセス判定方法、学習モデルの生成方法及びプログラム
TW202310131A (zh) * 2021-08-24 2023-03-01 日商東京威力科創股份有限公司 基板處理裝置、模型資料產生裝置、基板處理方法、及模型資料產生方法
KR102673673B1 (ko) * 2021-12-09 2024-06-07 한국핵융합에너지연구원 Rf 신호를 이용한 플라즈마 상태 감지 장치 및 이를 이용한 플라즈마 상태 감지 방법
JP7750775B2 (ja) * 2022-03-02 2025-10-07 株式会社Ｓｃｒｅｅｎホールディングス 制御支援装置および制御支援方法
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Publication number Publication date
WO2020178945A1 (ja) 2020-09-10
JP7504863B2 (ja) 2024-06-24
KR20210134298A (ko) 2021-11-09
JPWO2020178945A1 (ja) 2021-03-18
KR102820933B1 (ko) 2025-06-16
WO2020179729A1 (ja) 2020-09-10
EP3819930A4 (en) 2021-10-27
CN112655077A (zh) 2021-04-13
JP6696059B1 (ja) 2020-05-20
US20220114484A1 (en) 2022-04-14
EP3819930A1 (en) 2021-05-12
JPWO2020179729A1 (enExample) 2020-09-10

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