CN112481052B - Gold foil electrode cleaning agent and preparation method thereof - Google Patents
Gold foil electrode cleaning agent and preparation method thereof Download PDFInfo
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- 239000012459 cleaning agent Substances 0.000 title claims abstract description 32
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 title claims abstract description 18
- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- 238000005260 corrosion Methods 0.000 claims abstract description 25
- 230000007797 corrosion Effects 0.000 claims abstract description 25
- 239000003112 inhibitor Substances 0.000 claims abstract description 25
- 239000002455 scale inhibitor Substances 0.000 claims abstract description 25
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims abstract description 24
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 claims abstract description 16
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 claims abstract description 16
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 claims abstract description 8
- 235000019253 formic acid Nutrition 0.000 claims abstract description 8
- 238000003756 stirring Methods 0.000 claims description 15
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 12
- NFDRPXJGHKJRLJ-UHFFFAOYSA-N edtmp Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CCN(CP(O)(O)=O)CP(O)(O)=O NFDRPXJGHKJRLJ-UHFFFAOYSA-N 0.000 claims description 12
- 238000002156 mixing Methods 0.000 claims description 11
- 239000011259 mixed solution Substances 0.000 claims description 10
- 239000011521 glass Substances 0.000 abstract description 28
- 238000002161 passivation Methods 0.000 abstract description 14
- 238000004140 cleaning Methods 0.000 abstract description 11
- 239000000843 powder Substances 0.000 abstract description 11
- 230000000694 effects Effects 0.000 abstract description 5
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000004094 surface-active agent Substances 0.000 abstract description 4
- 150000001875 compounds Chemical class 0.000 abstract description 3
- 239000006185 dispersion Substances 0.000 abstract description 2
- 230000035515 penetration Effects 0.000 abstract description 2
- 238000011160 research Methods 0.000 abstract description 2
- 230000000052 comparative effect Effects 0.000 description 11
- 238000000034 method Methods 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 8
- 238000011109 contamination Methods 0.000 description 6
- 238000001962 electrophoresis Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- GVVPGTZRZFNKDS-JXMROGBWSA-N geranyl diphosphate Chemical compound CC(C)=CCC\C(C)=C\CO[P@](O)(=O)OP(O)(O)=O GVVPGTZRZFNKDS-JXMROGBWSA-N 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 239000013049 sediment Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- YDONNITUKPKTIG-UHFFFAOYSA-N [Nitrilotris(methylene)]trisphosphonic acid Chemical compound OP(O)(=O)CN(CP(O)(O)=O)CP(O)(O)=O YDONNITUKPKTIG-UHFFFAOYSA-N 0.000 description 2
- 238000005034 decoration Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 238000002791 soaking Methods 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- 230000002195 synergetic effect Effects 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- IXPNQXFRVYWDDI-UHFFFAOYSA-N 1-methyl-2,4-dioxo-1,3-diazinane-5-carboximidamide Chemical compound CN1CC(C(N)=N)C(=O)NC1=O IXPNQXFRVYWDDI-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 229920002301 cellulose acetate Polymers 0.000 description 1
- 230000002860 competitive effect Effects 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 150000005690 diesters Chemical class 0.000 description 1
- GVGUFUZHNYFZLC-UHFFFAOYSA-N dodecyl benzenesulfonate;sodium Chemical compound [Na].CCCCCCCCCCCCOS(=O)(=O)C1=CC=CC=C1 GVGUFUZHNYFZLC-UHFFFAOYSA-N 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000001652 electrophoretic deposition Methods 0.000 description 1
- 235000019387 fatty acid methyl ester Nutrition 0.000 description 1
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 239000000661 sodium alginate Substances 0.000 description 1
- 235000010413 sodium alginate Nutrition 0.000 description 1
- 229940005550 sodium alginate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 229940080264 sodium dodecylbenzenesulfonate Drugs 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/26—Organic compounds containing oxygen
- C11D7/265—Carboxylic acids or salts thereof
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/32—Organic compounds containing nitrogen
- C11D7/3281—Heterocyclic compounds
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/22—Organic compounds
- C11D7/36—Organic compounds containing phosphorus
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Emergency Medicine (AREA)
- Detergent Compositions (AREA)
Abstract
The invention discloses a novel gold foil electrode cleaning agent and a preparation method thereof, and belongs to the technical field of cleaning agents. The gold foil electrode cleaning agent comprises the following components in percentage by mass: 5-10% of glycolic acid, 1-5% of citric acid, 1-2% of formic acid, 1-10% of scale inhibitor, 0.5-1% of corrosion inhibitor and the balance of water. The components of the cleaning agent are selected and adjusted in a targeted manner, the glass powder deposited on the surface of the gold foil electrode has a strong dispersing and suspending effect, the cleaning equipment is simple, the cleaning time is short, and the existing electrophoretic glass passivation production process can be well met. In addition, through research on various surfactants and cleaning aids, the compound of the surfactants in a specific ratio has excellent penetration and dispersion on the deposit on the surface of the electrode.
Description
Technical Field
The invention belongs to the technical field of cleaning agents, and particularly relates to a novel gold foil electrode cleaning agent and a preparation method thereof.
Background
The surface passivation technology is an important process link in the manufacturing process of a semiconductor device and has important influence on the electrical characteristics and reliability of the device. In the traditional semiconductor separation device products, the main semiconductor product surface passivation technology adopts silicon dioxide, silicon nitride, polyimide glue, white glue, glass and the like. As the glass as the passivation layer has the advantages of low cost and high reliability, the glass gradually replaces white glue, polyimide glue and the like, so that the glass becomes a mainstream material of the passivation layer on the surface of a semiconductor product. With the development of semiconductor technology, the demand for passivation of semiconductor surfaces is higher and higher.
In the prior art, a glass passivated silicon diode (GPP) chip made of special glass for semiconductor passivation is an ideal semiconductor passivation material. The electrophoretic glass passivation method is to prepare glass powder and organic solvents (isopropanol and ethyl acetate) into suspension, and add proper amount of activator and cellulose acetate into the suspension. Under the action of the direct current electric field, the glass particles with negative electricity move towards the direction of the silicon chip on the positive electrode and are deposited in the groove of the silicon chip.
Patent CN 106653600A discloses a GPP chip electrophoresis method manufacturing process, which comprises the steps of selecting manufacturing materials, cleaning a silicon wafer, pre-depositing phosphorus, diffusing boron, blasting sand on two sides to remove an oxidation layer, protecting passivation, passivating glass, rinsing and scribing, wherein the electrophoresis method is used for passivating glass so that the attachment surface of the glass is wider, the attachment is more uniform, and the quality of the GPP chip is improved.
However, in the electrophoresis process, the solid particles in the suspension can be deposited on the anode electrode, and the electrophoresis efficiency is continuously reduced along with the continuous deposition of the glass powder on the anode electrode, so the anode electrode must be taken out in time to clean the deposits on the surface of the anode electrode. At present, no special cleaning agent exists, and some similar electrode cleaning agents are used. Because the existing cleaning agent is not specific, and the glass powder deposited on the surface of the electrode is dense, the common electrode cleaning agent needs to be manually brushed after being soaked for a long time or ultrasonic cleaning equipment is used for removing the deposits on the surface of the electrode. For example, patent CN 108251231 a discloses an electrode cleaning agent and a preparation method thereof, wherein the electrode cleaning agent comprises: 1-5 parts of sodium citrate, 3-5 parts of sodium carbonate, 0.8-3 parts of sodium alginate, 4-8 parts of carboxymethyl cellulose, 0.5-3 parts of sodium dodecyl benzene sulfonate, 0.5-3 parts of succinic acid diester sulfonate, 1-6 parts of fatty acid methyl ester ethoxylate and 80-100 parts of water. However, the electrode cleaning agent only removes dirt attached to the surface of the electrode, and in addition, the electrophoretic deposition is fast in the electrophoretic glass passivation method, so that the electrode cleaning needs to be frequent, and if the cleaning needs a long time, the continuous production cannot be kept up with.
Therefore, the invention develops and designs a special electrode cleaning agent which can rapidly remove glass powder deposits on the surface of a gold foil electrode in an electrophoretic glass passivation method.
Disclosure of Invention
The invention aims to provide a novel gold foil electrode cleaning agent for cleaning glass powder deposits on the surface of an electrophoretic anode gold foil in a glass passivation process of a GPP chip electrophoresis method, aiming at solving the technical problems in the background art.
The invention also aims to provide a preparation method of the novel gold foil electrode cleaning agent.
The technical scheme adopted for realizing the aim of the invention is as follows:
a novel gold foil electrode cleaning agent comprises the following components in percentage by mass: 5-10% of glycolic acid, 1-5% of citric acid, 1-2% of formic acid, 1-10% of scale inhibitor, 0.5-1% of corrosion inhibitor and the balance of water.
Preferably, the scale inhibitor provided by the invention is selected from one or more of HEDP, EDTMPA or ATMP.
More preferably, the scale inhibitor is formed by mixing HEDP and EDTMPA according to the mass ratio of 1: 1.2.
Preferably, the corrosion inhibitor provided by the invention is selected from one or more of BTA, MBT and TTA.
More preferably, the corrosion inhibitor is composed of BTA and TTA mixed according to the mass ratio of 2: 1.
The technical scheme adopted for realizing the other purpose of the invention is as follows:
a preparation method of a novel gold foil electrode cleaning agent comprises the following steps:
step one, mixing glycolic acid, citric acid and formic acid according to a ratio and uniformly stirring;
step two, slowly adding the scale inhibitor into the mixed solution and uniformly stirring;
step three, slowly adding the corrosion inhibitor into the mixed solution and uniformly stirring;
and step four, adding water, and adjusting the pH value to 6-7 to obtain the electrode cleaning agent.
The invention has the advantages and beneficial effects that:
1. the components of the cleaning agent are selected and adjusted in a targeted manner, the glass powder deposited on the surface of the gold foil electrode has a strong dispersing and suspending effect, the cleaning equipment is simple, the cleaning time is short, and the existing electrophoretic glass passivation production process can be well met.
2. Through research on various different surfactants and cleaning aids, the compound of the surfactants in a certain specific ratio is found to have excellent penetration and dispersion on the deposits on the surface of the electrode, so the components and the weight percentage of the cleaning agent are finally determined, wherein the cleaning agent comprises the scale inhibitor HEDP and EDTMPA which are compounded according to the mass ratio of 1:1.2, and the corrosion inhibitor BTA and TTA which are compounded according to the mass ratio of 2:1, and has a certain synergistic effect on the cleaning effect on the deposits on the surface of the electrode.
3. The cleaning agent has good removing power for glass powder sediment on the surface of the gold foil electrode, and when the cleaning agent is used, the electrode is only required to be soaked in the cleaning agent for a short time and is washed with clean water after being taken out.
Detailed Description
The following further describes embodiments of the present invention with reference to examples. The following examples are only for illustrating the technical solutions of the present invention more clearly, and the protection scope of the present invention is not limited thereby.
Example 1:
1) mixing 5% of glycolic acid, 5% of citric acid and 1.5% of formic acid according to the proportion, and uniformly stirring;
2) slowly adding 10% of scale inhibitor into the mixed solution and uniformly stirring;
3) slowly adding 1% of corrosion inhibitor into the mixed solution and uniformly stirring, wherein the scale inhibitor is HEDP and EDTMPA mixed according to the mass ratio of 1:1.2, and the corrosion inhibitor is BTA and TTA mixed according to the mass ratio of 2: 1;
4) adding water, and adjusting the pH value to 6 to obtain the novel gold foil electrode cleaning agent.
Example 2:
1) mixing 10% of glycolic acid, 1% of citric acid and 2% of formic acid according to the proportion, and uniformly stirring;
2) slowly adding 6 percent of scale inhibitor into the mixed solution and uniformly stirring;
3) slowly adding 0.8% of corrosion inhibitor into the mixed solution and uniformly stirring, wherein the scale inhibitor is HEDP and EDTMPA mixed according to the mass ratio of 1:1.2, and the corrosion inhibitor is BTA and TTA mixed according to the mass ratio of 2: 1;
4) adding water, and adjusting the pH value to 6.5 to obtain the novel gold foil electrode cleaning agent.
Example 3:
1) mixing 8% of glycolic acid, 3% of citric acid and 1% of formic acid according to the proportion, and uniformly stirring;
2) slowly adding 1% of scale inhibitor into the mixed solution and uniformly stirring;
3) slowly adding 0.5% of corrosion inhibitor into the mixed solution and uniformly stirring, wherein the scale inhibitor is HEDP and EDTMPA mixed according to the mass ratio of 1:1.2, and the corrosion inhibitor is BTA and TTA mixed according to the mass ratio of 2: 1;
4) adding water, and adjusting the pH value to 7 to obtain the novel gold foil electrode cleaning agent.
The comparative tests were carried out at room temperature on the electrodes of the above examples, which were contaminated with glass powder deposits to the same extent by using the scale inhibitor alone and the corrosion inhibitor alone, respectively. The method is an electrode dipping method, electrodes with the same pollution degree of glass powder sediments are respectively put into the solution of the embodiment 1-3, the scale inhibitor and the corrosion inhibitor with the same mass, the soaking time is 2min, and the surface condition of each electrode is observed by a micrograph. The summary is given in Table 1 below:
TABLE 1
| Example 1 | Example 2 | Example 3 | Scale inhibitor HEDP | Scale inhibitor EDTMPA | Scale inhibitor ATMP | Corrosion inhibitor BTA | Corrosion inhibitor MBT | Corrosion inhibitor TTA | |
| pH | 6 | 6.5 | 7 | - | - | - | - | - | |
| Surface condition of the surface | Basically has no pollution | Basically has no pollution | Basically has no pollution | Has obvious pollution | Contamination with residual part | Contamination with residual part | Without obvious change | Without obvious change | Without obvious change |
Comparative example 1:
selecting a scale inhibitor which is a mixture of HEDP and EDTMPA according to the mass ratio of 1: 0.5; the corrosion inhibitor is prepared by mixing BTA and TTA according to the mass ratio of 3: 1. The rest is the same as example 1.
Comparative example 2:
selecting a scale inhibitor which is a mixture of HEDP and EDTMPA according to the mass ratio of 1: 2; the corrosion inhibitor is prepared by mixing BTA and TTA according to the mass ratio of 1:1. The rest is the same as example 2.
Comparative example 3:
selecting a scale inhibitor which is a mixture of HEDP and EDTMPA according to the mass ratio of 1: 3; the corrosion inhibitor is prepared by mixing BTA and TTA according to the mass ratio of 4: 1. The rest is the same as example 3.
Comparative tests were conducted at room temperature on electrodes having the same degree of contamination of glass frit deposits as in comparative examples 1 to 3 and examples 1 to 3. And (3) similarly, adopting an electrode dipping method, respectively putting the electrodes with the same pollution degree of the glass powder sediments into the solutions of the comparative examples 1-3, soaking for 5min, and observing the surface condition of each electrode by using a micrograph. The summary is given in Table 2 below:
TABLE 2
| Example 1 | Example 2 | Example 3 | Comparative example 1 | Comparative example 2 | Comparative example 3 | |
| pH | 6 | 6.5 | 7 | 6 | 6.5 | 7 |
| Surface condition of the surface | Basically has no pollution | Basically has no pollution | Basically has no pollution | Contamination with residual part | Contamination with residual part | Contamination with residual part |
As can be seen from table 2, the scale inhibitors HEDP and EDTMPA in examples 1 to 3 of the present invention are compounded in a mass ratio of 1:1.2, and the corrosion inhibitors BTA and TTA are compounded in a mass ratio of 2:1, so that the electrode surface after the combined use is substantially free of pollution, and the effect is superior to the compound ratio of the scale inhibitors and corrosion inhibitors in comparative examples 1 to 3, which may be that the suitable concentration ratio can generate co-adsorption, and has a certain synergistic effect, and when the concentration is inappropriate, competitive adsorption occurs, resulting in poor effect.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the technical principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (1)
1. The preparation method of the gold foil electrode cleaning agent is characterized by comprising the following steps:
step one, mixing glycolic acid, citric acid and formic acid according to a ratio and uniformly stirring;
step two, slowly adding the scale inhibitor into the mixed solution and uniformly stirring;
step three, slowly adding the corrosion inhibitor into the mixed solution and uniformly stirring;
adding water, and adjusting the pH value to 6-7 to obtain the electrode cleaning agent;
wherein, the mass percentage content of glycolic acid is 5-10%, citric acid is 1-5%, formic acid is 1-2%, scale inhibitor is 1-10%, corrosion inhibitor is 0.5-1%, and the balance is water;
the scale inhibitor is prepared by mixing HEDP and EDTMPA according to the mass ratio of 1: 1.2;
the corrosion inhibitor is prepared by mixing BTA and TTA according to the mass ratio of 2: 1.
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| CN108103513B (en) * | 2017-11-16 | 2019-11-26 | 云南电网有限责任公司电力科学研究院 | A kind of chemical of DC converter valve screening electrodes deposit |
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| CN104277932A (en) * | 2014-09-25 | 2015-01-14 | 苏州长盛机电有限公司 | Scale cleaning agent and preparation method thereof |
| CN105645611A (en) * | 2016-02-03 | 2016-06-08 | 青岛科润生物科技有限公司 | Multifunctional industrial water disposal agent and preparing method thereof |
| CN108251231A (en) * | 2018-02-28 | 2018-07-06 | 佛山市高明区杨和金属材料专业镇技术创新中心 | A kind of electrode clean agent and preparation method thereof |
| CN109487278A (en) * | 2018-12-29 | 2019-03-19 | 陈江清 | A kind of acid environment protection cleaning agent and preparation method thereof |
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