CN112466774A - Etching equipment - Google Patents
Etching equipment Download PDFInfo
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- CN112466774A CN112466774A CN201910842526.7A CN201910842526A CN112466774A CN 112466774 A CN112466774 A CN 112466774A CN 201910842526 A CN201910842526 A CN 201910842526A CN 112466774 A CN112466774 A CN 112466774A
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- tank
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- spraying
- conveyor
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- 238000005530 etching Methods 0.000 title claims abstract description 30
- 239000007788 liquid Substances 0.000 claims abstract description 77
- 238000005507 spraying Methods 0.000 claims abstract description 65
- 239000003513 alkali Substances 0.000 claims abstract description 47
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 239000002253 acid Substances 0.000 claims description 8
- 239000007921 spray Substances 0.000 claims description 8
- 238000007605 air drying Methods 0.000 claims description 7
- 238000005086 pumping Methods 0.000 claims description 6
- 238000003860 storage Methods 0.000 claims description 4
- 238000005406 washing Methods 0.000 abstract description 21
- 238000002425 crystallisation Methods 0.000 abstract description 11
- 230000008025 crystallization Effects 0.000 abstract description 11
- 239000000243 solution Substances 0.000 description 20
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000012670 alkaline solution Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 230000001105 regulatory effect Effects 0.000 description 4
- 230000005540 biological transmission Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000008367 deionised water Substances 0.000 description 2
- 229910021641 deionized water Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000005096 rolling process Methods 0.000 description 2
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000007888 film coating Substances 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004064 recycling Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67075—Apparatus for fluid treatment for etching for wet etching
- H01L21/67086—Apparatus for fluid treatment for etching for wet etching with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
The application discloses etching equipment, which comprises a roller type conveyor, wherein a first lye tank and a first rinsing tank are sequentially arranged in the conveying direction of the roller type conveyor, and are positioned below the roller type conveyor; and a first spraying device is arranged between the first lye tank and the first rinsing tank, is positioned below the roller conveyor and is provided with a plurality of first liquid spraying ports which are arranged upwards. By adopting the scheme, the crystallization of residual alkali liquor on the battery piece and the roller of the roller conveyor can be prevented, and the problems that the subsequent washing cannot be thoroughly cleaned due to the crystallization and the roller conveyor is damaged by the crystallization on the roller are avoided.
Description
Technical Field
The invention relates to the technical field of photovoltaics, in particular to etching equipment.
Background
At present, Back Contact solar cells, such as IBC (Interdigitated Back Contact), MWT (Metallization Wrap Through), EWT (Emitter Wrap Through), are widely used, because the front surface of the Back Contact solar cell has no main grid line or even no electrode pattern, and the positive electrode and the negative electrode are both arranged on the Back surface of the cell, the shading of the cell is reduced, the short-circuit current of the cell is effectively increased, the energy conversion efficiency of the cell is improved, and the Back Contact solar cell is a research hotspot of a high-efficiency photovoltaic cell assembly.
The production process of solar cells is generally: the method comprises the following steps of texturing, diffusing, etching, coating, printing, sintering, testing, sorting and the like, wherein the etching can be performed by plasma etching, wet acid etching or wet alkali etching to remove the phosphorosilicate glass on the side face and the back face. When wet alkali etching is carried out, particularly for a back contact solar cell, the required concentration of alkali liquor is greater than that of the conventional solar cell, and the temperature of the alkali liquor is much higher than that of the alkali etching alkali liquor of the conventional solar cell, so that the high-concentration alkali liquor remained on the surface of a cell after alkali etching is easy to crystallize after being discharged from an alkali liquor tank due to temperature reduction, the alkali liquor residue cannot be completely removed in the subsequent water washing process, and adverse effects are caused on the appearance and the performance of the cell.
Disclosure of Invention
In view of the above defects or shortcomings in the prior art, it is desirable to provide an etching apparatus for solving the problem that the alkaline solution residue on the surface of the battery piece is easily crystallized after the battery piece is subjected to alkali etching in the prior art, so that the alkaline solution residue cannot be completely removed in the subsequent water washing process.
The invention provides etching equipment which comprises a roller-type conveyor, wherein a first lye tank and a first rinsing tank are sequentially arranged along the conveying direction of the roller-type conveyor, and are positioned below the roller-type conveyor;
and a first spraying device is arranged between the first lye tank and the first rinsing tank, is positioned below the roller conveyor and is provided with a plurality of first liquid spraying ports which are arranged upwards.
Further, a solution collecting tank is arranged below the first spraying device.
Furthermore, a closing-in groove wall bent towards the inside of the first lye tank is arranged at the top of the side wall of the first lye tank close to one side of the first rinsing tank, and the closing-in groove wall at least forms the bottom of the solution collecting tank.
Further, the bottom of the solution collecting groove is connected with the liquid storage tank through a pipeline.
Further, still include second lye tank, the tank bottom of first lye tank is provided with inlet and returns the liquid mouth, the inlet is located the middle part of tank bottom, it is located to return the liquid mouth the edge of tank bottom, the inlet pass through the pumping pipeline with the second lye tank is connected, return the liquid mouth through return the liquid pipeline with the second lye tank is connected.
Further, the plurality of first liquid spraying ports are arranged along the axis of the roller type conveyor.
Furthermore, the spraying device also comprises spraying pipes, wherein each first liquid spraying opening is arranged on the liquid spraying pipe, the first liquid spraying openings are distributed along the axis of the liquid spraying pipe, and a liquid inlet end of each spraying pipe is connected with a water quantity regulating valve.
Furthermore, a second spraying device is arranged above the roller-type conveyor and is right opposite to the first rinsing bath, the second spraying device is provided with a plurality of second liquid spraying ports which are arranged downwards, and the plurality of second liquid spraying ports are at least arranged in a row along the axis of the roller-type conveyor.
Further, an acid liquid tank and a second water washing tank are sequentially arranged in the conveying direction of the roller conveyor, and the acid liquid tank and the second water washing tank are located in front of the first water washing tank in the conveying direction.
Further, an air drying device is arranged above and/or below the roller type conveyor, the air drying device is provided with an air outlet extending along the axis of the roller type conveyor, the air outlet is over against the roller type conveyor, and the air outlet is located in front of the second rinsing bath in the conveying direction.
The above-mentioned scheme that this application provided, first lye tank with be provided with first spray set between the first wash bowl, solar wafer is before the washing after the alkali sculpture, via first spray set blowout deionized water, dilutes and gets rid of remaining alkali lye on the solar wafer, prevents to remain the crystallization of alkali lye on the roller bearing of battery piece and roller type conveyer, avoids causing follow-up washing can not rinse thoroughly because of the crystallization, and crystallization causes the problem of injury to the roller type conveyer on the roller bearing. Along with the reduction of the solubility of the residual alkali liquor on the battery piece, the requirements on subsequent washing can be reduced, such as the washing time is reduced, and the production efficiency is improved.
Drawings
Other features, objects and advantages of the present application will become more apparent upon reading of the following detailed description of non-limiting embodiments thereof, made with reference to the accompanying drawings in which:
fig. 1 is a schematic structural diagram of an etching apparatus according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of an etching apparatus according to another embodiment of the present invention.
Detailed Description
The present application will be described in further detail with reference to the following drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the relevant invention and not restrictive of the invention. It should be noted that, for convenience of description, only the portions related to the present invention are shown in the drawings.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
As shown in fig. 1, an etching apparatus provided in an embodiment of the present invention includes a roller conveyor, a first lye tank 1 and a first rinsing tank 8 are sequentially disposed along a conveying direction of the roller conveyor, and the first lye tank 1 and the first rinsing tank 8 are located below the roller conveyor; a first spraying device 5 is arranged between the first lye tank 1 and the first rinsing tank 8, the first spraying device 5 is positioned below the roller conveyor, and the first spraying device 5 is provided with a plurality of first liquid spraying openings which are arranged upwards.
According to the scheme, the first spraying device 5 is arranged between the first alkali liquor tank 1 and the first water washing tank 8, deionized water is sprayed out of the solar cell 2 through the first spraying device 5 after the solar cell is subjected to alkali etching before water washing, residual alkali liquor on the solar cell 2 is diluted and removed, crystallization of the residual alkali liquor on the cell and a roller of the roller conveyor is prevented, and the problems that subsequent water washing cannot be thoroughly cleaned due to crystallization and the roller conveyor is damaged by crystallization on the roller are solved. Along with the reduction of the solubility of the residual alkali liquor on the battery piece, the requirements on subsequent washing can be reduced, such as the washing time is reduced, and the production efficiency is improved.
In practical use, the roller conveyor may include a plurality of rollers 7 arranged side by side, and the rollers 7 may be driven independently, that is, each roller 7 is connected to a driving motor, or may be driven independently, that is, a plurality of rollers 7 may be driven by a gear transmission or a chain transmission. The battery pieces to be etched, washed and the like are placed on the roller type conveyor and conveyed along one direction.
Generally, the lowest point of each roller 7 is located below the liquid level of the first lye tank 1 and the first rinsing tank 8, and the liquid in the first lye tank 1 and the first rinsing tank 8 is continuously carried to the back side of the solar cell 2 during the rotation of the roller 7. In addition, the highest point of each roller is located on the top surfaces of the first lye tank 1 and the first rinsing tank 8, so that the solar cell pieces 2 are smoothly transmitted, and the clamping stagnation at the edges of the first lye tank 1 and the first rinsing tank 8 is avoided.
Preferably, the first spraying device 5 should be as close to the first lye tank 1 as possible, so that the solar cell 2 is sprayed by the first spraying device 5 as soon as possible after being output from the range of the first lye tank 1 by the roller conveyor, thereby reducing the concentration of the lye remaining on the solar cell 2 in the fastest time and preventing crystallization due to temperature reduction. How the first spray means 5 is located as close as possible to the first lye tank 1 will be described hereinafter in terms of one of the possible configurations.
As used herein, the first liquid ejecting port may be disposed upward, or may be disposed obliquely upward. The solar cell can be arranged in an inclined mode, the inclined direction of the solar cell can be inclined towards the interior of the first lye tank 1, on one hand, the solar cell 2 can be sprayed to the inside of the first lye tank 1 after exiting from the first lye tank 1 to reduce the possibility of lye crystallization, on the other hand, liquid sprayed to the back of the solar cell 2 cannot fall on a liquid spraying path of the first liquid spraying opening when falling under the action of gravity, the falling liquid is prevented from influencing the traveling path of the sprayed liquid of the first liquid spraying opening, and the falling liquid is prevented from polluting the sprayed liquid and reducing the spraying effect.
When the etching process is carried out, the alkali liquor contained in the first alkali liquor tank 1 can be KOH solution, and the solar cell 2 is polished on the back surface when the solar cell 2 passes through the first alkali liquor tank 1 so as to remove PN junctions on the back surface of the solar cell 2. During etching, as the solar cell 2 is positioned on the roller 7 and the highest point of the roller 7 is positioned above the liquid level, the solar cell 2 is in a floating state on the transmission roller when the back surface of the solar cell is polished, and the front surface of the solar cell 2 cannot be etched by alkali liquor.
In order to achieve a better back polishing effect, the mass concentration of the general KOH solution can be 5-30%, and the temperature of the KOH solution can be between 60 ℃ and 90 ℃. For example, the KOH solution has a mass concentration of 15% and the temperature of the KOH solution is 80 ℃. The use of such a high concentration hot solution of KOH can increase the reaction rate.
The arrow above the roller conveyor in fig. 1 indicates the conveying direction.
Further, in order to prevent the alkali solution dropping after spraying from polluting the working environment, a solution collecting tank 4 is arranged below the first spraying device 5, and the solution collecting tank 4 is used for collecting the alkali solution dropping during spraying.
Furthermore, in order to make the first spraying device 5 as close to the first lye tank 1 as possible, a closing-in tank wall 3 bent towards the first lye tank 1 is arranged at the top of the side wall of the first lye tank 1 close to the first rinsing tank 8, and the closing-in tank wall 3 at least forms the tank bottom of the solution collecting tank 4. Namely, a solution collecting groove 4 is formed in the range of the first lye tank 1, and the solution collecting groove 4 is located at one side of the solar cell 2 where the first lye tank 1 is conveyed, and based on the fact that the solution collecting groove 4 is located below the first spraying device 5, the first spraying device 5 is also located in the range of the first lye tank 1, so that the solar cell 2 is sprayed by the first spraying device 5 at the fastest speed after being separated from the liquid in the first lye tank 1. The range of the first alkaline solution tank 1 as used herein refers to the range of the outermost boundary of the first alkaline solution tank 1 in plan view.
Further, in order to collect and recycle the sprayed and dropped alkali liquor, the bottom of the solution collecting tank 4 is connected with the liquid storage tank 9 through a pipeline, and the dropped solution collected by the solution collecting tank 4 is conveyed to the liquid storage tank 9 for recycling.
Further, still include second lye tank 12, the tank bottom of first lye tank 1 is provided with the inlet and returns the liquid mouth, and the inlet is located the middle part of tank bottom, returns the liquid mouth and is located the edge of tank bottom, and the inlet passes through pumping pipeline 11 to be connected with second lye tank 12, returns the liquid mouth and is connected with second lye tank 12 through returning liquid pipeline 10.
The second lye tank 12 may be, but is not limited to being, located below the first lye tank 1. The pumping line 11 may include a transfer pump and a transfer pipe connected to the transfer pump. The conveying pump is used for upwards pumping the alkali liquor in the second alkali liquor tank 12 into the first alkali liquor tank 1 through the conveying pipe, so that the concentration of the first alkali liquor tank 1 is stable, the liquid level in the middle of the first alkali liquor tank 1 is ensured to have enough height, and the liquid level can also contact the lowest point of the rolling shaft.
When the alkali liquor in the second alkali liquor tank 12 is pumped to the first alkali liquor tank 1 by the pumping pipeline, the pressure in the second alkali liquor tank 12 is reduced, the alkali liquor in the first alkali liquor tank 1 flows back to the second alkali liquor tank 12 through the liquid return port at the edge of the tank bottom, and because the liquid return port is located at the edge, the liquid level at the edge has a certain amount of decline compared with the liquid level at the middle part, so that the alkali liquor can be prevented from overflowing from the first alkali liquor tank 1, the area where the liquid level declines can be called as a buffer zone, and the width of the general buffer zone can be in the distance between 3-10 rolling shafts 7. The size of the buffer zone can be determined by the pressure drop between the first lye tank 1 and the second lye tank 12, the size of the liquid return port, etc.
In FIG. 1, the arrows in the first lye tank 1 and the second lye tank 12 indicate the flow direction of the lye.
Further, in order to sufficiently spray the solar cell 2, a plurality of first liquid-spraying ports are arranged along the axis of the roller 7 of the roller conveyor. Generally, the axial length of the solar cell 2 and the roller 7 is smaller than the axial length of the roller 7, so that the solar cell 2 can be sufficiently sprayed in the axial direction of the roller by distributing a plurality of first liquid spraying ports along the axial direction of the roller 7, so as to reduce the concentration of residual alkali liquor of the solar cell 2.
Furthermore, the spraying device also comprises a spraying pipe, wherein each first liquid spraying opening is arranged on the liquid spraying pipe, the plurality of first liquid spraying openings are arranged along the axis of the liquid spraying pipe, and a liquid inlet end of the spraying pipe is connected with a water quantity regulating valve. The spraying pipe has the advantages of simple structure, high use reliability, long service life and low processing cost. In addition, be connected with the water regulating valve on the feed liquor end of shower, through the regulation to the water regulating valve, can control the flow and the velocity of flow of the liquid that sprays out, prevent to make the battery piece position take place to remove because of the too big velocity of flow of the liquid flowmeter who sprays, cause adverse effect to follow-up technology. In addition, the consumption of pure water can be saved.
Further, in order to improve the washing quality and efficiency, a second spraying device 6 is arranged above the roller-type conveyor, the second spraying device 6 is opposite to the first washing tank 8, the second spraying device 6 is provided with a plurality of second liquid spraying openings which are arranged downwards, and the plurality of second liquid spraying openings are at least arranged in a row along the axis of the roller 7 of the roller-type conveyor. The second spraying device 6 is used for spraying and cleaning the upper surface of the solar cell 2.
Further, as shown in fig. 2, an acid liquid tank 13 and a second washing tank 14 are sequentially provided in the conveying direction of the roller conveyor, and the acid liquid tank 13 and the second washing tank 14 are located in front of the first washing tank 8 in the conveying direction. The acid liquid tank 13 is used for containing hydrofluoric acid/hydrochloric acid and removing the phosphorosilicate glass on the front side of the battery piece. The second washing tank 14 is used for containing pure water to wash out hydrofluoric acid/hydrochloric acid remaining on the solar cell 2.
Further, an air drying device 15 is arranged above and/or below the roller conveyor, preferably, the air drying devices 15 are arranged above and below the roller conveyor, the air drying devices 15 are provided with air outlets extending along the axis of the roller conveyor, the air outlets are opposite to the roller conveyor, and the air outlets are positioned in front of the second rinsing bath 14 in the conveying direction. The air outlet can blow out high-speed and high-pressure airflow for blowing off water on the surface of the solar cell so as to dry the surface of the solar cell 2 and prepare for a subsequent film coating process.
The above description is only a preferred embodiment of the application and is illustrative of the principles of the technology employed. It will be appreciated by a person skilled in the art that the scope of the invention as referred to in the present application is not limited to the embodiments with a specific combination of the above-mentioned features, but also covers other embodiments with any combination of the above-mentioned features or their equivalents without departing from the inventive concept. For example, the above features may be replaced with (but not limited to) features having similar functions disclosed in the present application.
Claims (10)
1. An etching device is characterized by comprising a roller-type conveyor, wherein a first lye tank and a first rinsing tank are sequentially arranged along the conveying direction of the roller-type conveyor, and are positioned below the roller-type conveyor;
and a first spraying device is arranged between the first lye tank and the first rinsing tank, is positioned below the roller conveyor and is provided with a plurality of first liquid spraying ports which are arranged upwards.
2. The etching apparatus according to claim 1, wherein a solution collecting tank is arranged below the first spraying device.
3. The etching apparatus according to claim 2, wherein a close-up groove wall bent towards the inside of the first lye tank is arranged at the top of the side wall of the first lye tank on the side close to the first rinsing tank, and the close-up groove wall is at least formed as the bottom of the solution collecting tank.
4. Etching apparatus according to claim 2 or 3, wherein the bottom of the solution collection tank is connected to the liquid storage tank through a pipeline.
5. The etching apparatus according to any one of claims 1 to 3, further comprising a second alkali solution tank, wherein the bottom of the first alkali solution tank is provided with a liquid inlet and a liquid return port, the liquid inlet is located in the middle of the bottom of the tank, the liquid return port is located at the edge of the bottom of the tank, the liquid inlet is connected with the second alkali solution tank through a pumping pipeline, and the liquid return port is connected with the second alkali solution tank through a liquid return pipeline.
6. The etching apparatus according to any one of claims 1 to 3, wherein a plurality of the first liquid ejection ports are arranged along a roller axis of the roller conveyor.
7. The etching apparatus according to claim 6, further comprising a spray pipe, wherein each of the first liquid spraying ports is disposed on the liquid spraying pipe, the plurality of first liquid spraying ports are arranged along an axis of the liquid spraying pipe, and a liquid inlet end of the spray pipe is connected with a water amount adjusting valve.
8. The etching equipment according to any one of claims 1 to 3, wherein a second spraying device is arranged above the roller conveyor, the second spraying device is opposite to the first rinsing bath, the second spraying device is provided with a plurality of second liquid spraying ports arranged downwards, and the plurality of second liquid spraying ports are at least arranged in a row along the axis of the roller conveyor.
9. The etching apparatus according to any one of claims 1 to 3, wherein an acid liquid tank and a second rinsing tank are further provided in sequence along the conveying direction of the roller conveyor, and the acid liquid tank and the second rinsing tank are located in front of the first rinsing tank in the conveying direction.
10. Etching apparatus according to claim 9, wherein an air drying device is provided above and/or below the roller conveyor, the air drying device having an air outlet extending along a roller axis of the roller conveyor, the air outlet facing the roller conveyor, the air outlet being located in front of the second rinsing bath in the conveying direction.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910842526.7A CN112466774B (en) | 2019-09-06 | 2019-09-06 | Etching equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910842526.7A CN112466774B (en) | 2019-09-06 | 2019-09-06 | Etching equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112466774A true CN112466774A (en) | 2021-03-09 |
| CN112466774B CN112466774B (en) | 2023-11-17 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910842526.7A Active CN112466774B (en) | 2019-09-06 | 2019-09-06 | Etching equipment |
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| CN (1) | CN112466774B (en) |
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2019
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| CN107195730A (en) * | 2017-06-29 | 2017-09-22 | 昊诚光电（太仓）有限公司 | A kind of etching cleaning machine and water circulation method |
| CN109119338A (en) * | 2018-08-06 | 2019-01-01 | 横店集团东磁股份有限公司 | A kind of highback polishing and efficient single crystal process |
| CN110197802A (en) * | 2019-05-16 | 2019-09-03 | 武汉华星光电半导体显示技术有限公司 | Wet-method etching equipment |
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| CN112466774B (en) | 2023-11-17 |
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