CN112358194A - Etching and thinning device and method for extremely-thin glass - Google Patents
Etching and thinning device and method for extremely-thin glass Download PDFInfo
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- CN112358194A CN112358194A CN202011275352.XA CN202011275352A CN112358194A CN 112358194 A CN112358194 A CN 112358194A CN 202011275352 A CN202011275352 A CN 202011275352A CN 112358194 A CN112358194 A CN 112358194A
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The invention provides an etching and thinning device and method for extremely thin glass, which comprises the following steps: the glass clamping frames comprise clamping discs arranged at two ends, and waterfall flow baffle grooves of the clamping discs at two sides are connected through a flow baffle plate; the plurality of movable shafts are movably inserted on the same drawing connecting rod; the two ends of the plurality of glass clamping frames are movably arranged on the two sides of the thinning etching box through sealing bearings; the invention relates to a cascade flow type etching device, which comprises a cascade flow spraying plate, wherein a plurality of spraying heads are arranged at the bottom of the cascade flow spraying plate in an array manner.
Description
Technical Field
The invention relates to the technical field of etching thinning devices, in particular to an etching thinning device and method for extremely thin glass.
Background
With the development of portable electronic devices, portable electronic devices such as mobile phones and flat panels are becoming more and more fine and thinner, so thinner glass substrates need to be manufactured.
The three chemical thinning methods have advantages and disadvantages, such as:
multi-piece vertical soaking method: reaction products can suspend in the glass thinning liquid and then adhere to the glass, uneven etching is easily caused by the method, polishing treatment is needed after thinning, and preparation cost is increased;
single-chip vertical spraying method: the etching requirements of two surfaces can be met, but the etching efficiency is low, and concave points are easy to appear on the surface of the glass due to the non-uniformity of spraying;
waterfall flow method: due to the adoption of the waterfall type etching mode, the etching liquid can slide off the glass, the surface of the glass treated by the etching method is smooth, even polishing is not needed, but the waterfall flow method still has the obvious defect, and due to the adoption of the gravity type falling method, the waterfall flow etching can not be simultaneously carried out on the front side and the back side of the glass, so that the etching efficiency is low.
The glass thinning equipment and the glass thinning method which have the application number of CN201410066425.2 in the prior art comprise a box body and a spraying device arranged in the box body, wherein the box body is provided with a first spraying groove, a first etching groove, a second etching groove, a third etching groove, a second spraying groove, a third spraying groove, a fourth spraying groove and a drying groove which are sequentially arranged, the spraying device comprises a first spraying pipe, a second spraying pipe, a third spraying pipe, a fourth spraying pipe, a fifth spraying pipe, a sixth spraying pipe and a seventh spraying pipe which are respectively positioned above the bottoms of the first spraying groove, the first etching groove, the second etching groove, the third spraying groove and the fourth spraying groove, the thinning method for spraying, washing and etching in different grooves by the glass thinning equipment can avoid the problem that reaction products in the soaking type thinning method are adhered to glass, and the etching solution is subjected to three times of etching in the first etching groove, the second etching groove and the third etching groove in sequence, so that the problem of uneven immersion etching is avoided.
Although the device adopts the vertical spraying type thinning method and the spraying etching is carried out in different grooves, the problems of reactant adhesion and glass are solved, but the spraying etching method adopted by the device easily causes the concave points on the surface of the glass.
Therefore, the invention aims to design the device and the method for etching and thinning the extremely thin glass, which have the advantages of multiple functions, high efficiency, effective reduction of reject ratio and high etching quality.
Disclosure of Invention
The invention aims to provide an etching and thinning device and method for extremely thin glass, which aim to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme:
an extremely thin glass etching thinning apparatus comprising:
the clamping device comprises a plurality of glass clamping frames, wherein the glass clamping frames comprise clamping discs arranged at two ends, the clamping discs at two sides are fixedly connected through a connecting rod, glass clamping grooves are formed in the inner sides of the clamping discs at two sides, clamping rubber strips are movably arranged in the glass clamping grooves, waterfall flow baffle grooves are also formed in the clamping discs at two sides of the glass clamping grooves, and the waterfall flow baffle grooves at two sides of the clamping discs are connected through baffle plates;
the uniform operating mechanism comprises inclined connecting rods fixedly arranged on one sides of the glass clamping frames, movable shafts are fixedly arranged at one ends, far away from the glass clamping frames, of the inclined connecting rods, and the movable shafts are movably inserted in the same drawing connecting rod;
the two ends of the plurality of glass clamping frames are movably arranged on the two sides of the thinning etching box through sealing bearings;
the device comprises a waterfall flow spraying plate, wherein a plurality of spraying heads are arranged at the bottom of the waterfall flow spraying plate in an array mode, and the waterfall flow spraying plate is movably arranged above an attenuation etching box.
Preferably, the clamping rubber strips on the two sides are movably connected with the threaded knobs through connecting pieces, and the threaded knobs on the two sides are in threaded connection with the through holes formed in the axis of the clamping disc.
Preferably, the bottom of the thinning etching box is provided with a through hole communicated with a circulating pipeline, one end of the circulating pipeline, far away from the through hole, is communicated with a liquid inlet hole of a circulating pump machine, and a liquid outlet end of the circulating pump machine is communicated with the waterfall flow spraying plate.
Preferably, the liquid outlet end fixed mounting of circulating pump machine has first quill pipe, the activity is inserted in the first quill pipe and is equipped with the fall way, the fall way is kept away from first quill pipe one end and is sprayed the board intercommunication with the waterfall flow.
Preferably, the circulating pipeline is provided with a filtering box body.
The etching and thinning method for the extremely thin glass adopts the etching and thinning device for the extremely thin glass, and comprises the following steps: a multi-piece vertical immersion etching thinning method or a waterfall flow etching thinning method.
Preferably, the vertical immersion etching thinning method includes the following steps:
the method comprises the following steps: stacking two pieces of ultrathin glass, performing sealing treatment of UV (ultraviolet) glue on the edges of the two pieces of ultrathin glass, and curing to obtain glass to be etched;
step two: after the integrity of the sealing glue of the glass to be etched is checked, the processed glass to be etched is respectively inserted into a plurality of glass clamping frames, the glass clamping frames are kept upright by moving the traction connecting rod, and the glass to be thinned is sequentially clamped by rotating the threaded knobs on the two sides of the glass clamping frames;
step three: and adding etching liquid into the thinning etching box, so that the etching liquid overflows the whole piece of glass to be etched to etch and thin, and taking out the glass after the thinning is finished.
Preferably, the waterfall flow type etching thinning method comprises the following steps:
the method comprises the following steps: stacking two pieces of ultrathin glass, performing sealing treatment of UV (ultraviolet) glue on the edge of the glass, and curing to obtain glass to be etched;
step two: after the integrity of the sealing glue of the glass to be etched is checked, the processed glass to be etched is respectively inserted into a plurality of glass clamping frames, the glass clamping frames are in an inclined state by moving a traction connecting rod, the glass to be thinned is sequentially clamped by rotating threaded knobs on two sides of the glass clamping frames, and flow baffle plates are respectively inserted into waterfall flow baffle grooves on two sides of each group of glass to be etched;
step three: and moving the waterfall flow spraying plate to enable the spraying heads to be positioned at the gap formed by the two sides of each group of glass to be etched and the flow blocking plate, supplying etching liquid into the waterfall flow spraying plate through a circulating pump, enabling the etching liquid to flow down in a waterfall manner along the gap formed by the glass to be etched and the flow blocking plate, carrying out waterfall flow type thinning treatment on the glass to be etched, and taking down the glass after thinning is finished.
Compared with the prior art, the invention has the beneficial effects that:
1. the invention can carry out vertical immersion etching and waterfall flow type etching methods by clamping the plurality of glass clamping frames, and can select etching modes according to actual production requirements when in use, thereby improving the application range of the device;
2. according to the invention, the flow baffle plates are arranged on the two sides of the glass to be etched, so that the etching liquid is sprayed to the gap formed by the two sides of the glass to be etched and the flow baffle plates, thereby overcoming the defect that the waterfall flow method cannot carry out bilateral etching, and greatly improving the etching quality.
The invention can carry out vertical immersion etching and waterfall flow type etching methods by clamping the plurality of glass clamping frames, and the flow baffle plates are arranged on the two sides of the glass to be etched, so that the gap formed by the two sides of the glass to be etched and the flow baffle plates overcomes the defect that the waterfall flow method can not carry out bilateral etching, the etching quality is greatly improved, and the application range of the device is enlarged.
Drawings
FIG. 1 is a schematic diagram of a waterfall flow type etching thinning state of the present invention;
FIG. 2 is a schematic diagram of a multi-plate vertical immersion etching thinning state according to the present invention;
FIG. 3 is a schematic view of a disassembled structure of the glass holder of the present invention;
FIG. 4 is a schematic view of the glass holder assembly according to the present invention;
FIG. 5 is a schematic view of the overall structure of the present invention;
FIG. 6 is a schematic diagram of a waterfall flow spray plate structure of the present invention;
FIG. 7 is a schematic diagram of a waterfall flow type etching thinning state of the present invention.
In the figure: the glass-etching-free water-spraying device comprises a glass clamping frame 1, a clamping disc 2, a connecting rod 3, a glass clamping groove 4, a clamping rubber strip 5, a waterfall flow baffle groove 6, a flow baffle plate 7, a unified operating mechanism 8, an inclined connecting rod 9, a movable shaft 10, a drawing connecting rod 11, an etching box 12, a waterfall flow spraying plate 13, a spraying head 14, a threaded knob 15, a circulating pipeline 16, a circulating pump 17, a first sleeve pipe 18, a lifting pipe 19, glass to be etched 20 and a filtering box body 21.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example (b):
referring to fig. 1-7, the present invention provides a technical solution:
an extremely thin glass etching thinning apparatus comprising:
the glass clamping frames 1 comprise clamping discs 2 arranged at two ends, the clamping discs 2 on two sides are fixedly connected through connecting rods 3, glass clamping grooves 4 are formed in the inner sides of the clamping discs 2 on two sides, clamping rubber strips 5 are movably mounted in the glass clamping grooves 4, waterfall flow baffle grooves 6 are formed in the clamping discs 2 on two sides of the glass clamping grooves 4, and the waterfall flow baffle grooves 6 of the clamping discs 2 on two sides are connected through baffle plates 7;
the corner of the glass 20 to be etched is clamped through the clamping rubber strip 5, so that etching thinning is facilitated, the flow blocking plate 7 can be freely assembled and disassembled from the waterfall flow baffle groove 6, the flow blocking plate 7 is disassembled when a plurality of pieces of glass are immersed in the vertical type etching thinning operation, and the flow blocking plate 7 is installed in the waterfall flow baffle groove 6 when the waterfall flow type etching thinning operation is performed.
The glass clamping frame deflection adjusting mechanism comprises a unified operating mechanism 8, wherein the unified operating mechanism 8 comprises an inclined connecting rod 9 fixedly installed on one side of a plurality of glass clamping frames 1, movable shafts 10 are fixedly installed at one ends, far away from the glass clamping frames 1, of the inclined connecting rods 9, the movable shafts 10 are movably inserted in the same drawing connecting rod 11, the rotating angle of the inclined connecting rod 9 is changed by moving the drawing connecting rod 11, the inclined connecting rod 9 rotates to drive the glass clamping frames 1 to incline for a certain angle, and therefore different glass clamping frames 1 deflection states are selected according to different thinning modes;
the device comprises an thinning etching box 12, a plurality of glass clamping frames 1 and a plurality of glass clamping frames, wherein two ends of each glass clamping frame are movably arranged on two sides of the thinning etching box 12 through sealing bearings, and etching liquid is stored in the thinning etching box 12;
the method comprises the steps that a waterfall flow spraying plate 13 is arranged at the bottom of the waterfall flow spraying plate 13, a plurality of spraying heads 14 are arranged at the bottom of the waterfall flow spraying plate 13 in an array mode, the waterfall flow spraying plate 13 is movably arranged above a thinning etching box 12, etching liquid is injected into gaps formed between two sides of glass 20 to be etched and a flow blocking plate 7 through the spraying heads 14, the etching liquid forms free fluid in a similar waterfall state under the action of gravity, and then the glass 20 to be etched is etched, referring to the attached figure 7 in the specification, the etching liquid on the back of the glass 20 to be etched is blocked by the flow blocking plate 7, and the etching liquid is contacted with the back of the glass 20 to be etched in the flowing process to be etched, so that the defect that only single-side etching can be achieved.
Preferably, the clamping rubber strips 5 on the two sides are movably connected with the threaded knobs 15 through connecting pieces, the threaded knobs 15 on the two sides are in threaded connection with the through holes formed in the axis of the clamping disc 2, the threaded knobs 15 are rotated to stretch in the through holes, so that the clamping rubber strips 5 are driven to stretch, and the glass 20 to be etched is clamped and fixed by the aid of stretching of the clamping rubber strips 5.
Preferably, the bottom of the thinning and etching box 12 is provided with a through hole communicated with a circulating pipeline 16, one end of the circulating pipeline 16, which is far away from the through hole, is communicated with a liquid inlet hole of a circulating pump 17, and a liquid outlet end of the circulating pump 17 is communicated with the waterfall flow spraying plate 13.
Preferably, a first sleeve pipe 18 is fixedly installed at the liquid outlet end of the circulating pump 17, an elevating pipe 19 is movably inserted in the first sleeve pipe 18, one end, far away from the first sleeve pipe 18, of the elevating pipe 19 is communicated with the waterfall flow spraying plate 13, the elevating pipe 19 and the waterfall flow spraying plate 13 can move through the design of the elevating pipe 19, and when a plurality of pieces of vertical soaking, etching and thinning operations are performed, only the waterfall flow spraying plate 13 needs to be moved to one side.
Preferably, the circulating pipeline 16 is provided with a filtering box 20, the etching liquid inside is pumped out by the circulating pump 17 and enters the filtering box 20 through the circulating pipeline 16, so that flocculates in the etching liquid are effectively filtered, and the quality of the etched glass is ensured.
The method for etching and thinning the extremely thin glass comprises a multi-piece vertical soaking etching thinning method or a waterfall flow type etching thinning method.
Preferably, the vertical immersion etching thinning method comprises the following steps:
the method comprises the following steps: stacking two pieces of ultrathin glass, performing sealing treatment of UV (ultraviolet) glue on the edges of the two pieces of ultrathin glass, and curing to obtain glass 20 to be etched;
step two: after the sealing integrity of the glass 20 to be etched is checked, the processed glass 20 to be etched is respectively inserted into a plurality of glass clamping frames 1, the glass clamping frames 1 are kept upright by moving the traction connecting rod 11, and the glass 20 to be thinned is sequentially clamped by rotating the threaded knobs 15 on the two sides of the glass clamping frames 1;
step three: and adding etching liquid into the thinning etching box 12, so that the etching liquid is spread over the whole piece of glass 20 to be etched for etching and thinning, and taking out the glass after thinning is finished.
Preferably, the waterfall flow type etching thinning method comprises the following steps:
the method comprises the following steps: stacking the two pieces of ultrathin glass, performing sealing treatment of UV (ultraviolet) glue on the edge of the glass, and curing to obtain glass 20 to be etched;
step two: after the sealing integrity of the glass 20 to be etched is checked, the processed glass 20 to be etched is respectively inserted into a plurality of glass clamping frames 1, the glass clamping frames 1 are in an inclined state by moving the traction connecting rod 11, the glass 20 to be thinned is sequentially clamped by rotating the threaded knobs 15 on the two sides of the glass clamping frames 1, and the flow baffle plates 7 are respectively inserted into the waterfall flow baffle grooves 6 on the two sides of each group of glass 20 to be etched;
step three: moving the waterfall flow spraying plate 13 to enable the spraying heads 14 to be positioned at the gap formed by the two sides of each group of glass to be etched 20 and the flow blocking plate 7, supplying etching liquid into the waterfall flow spraying plate 13 through the circulating pump 17, enabling the etching liquid to flow down in a waterfall manner along the gap formed by the glass to be etched 20 and the flow blocking plate 7, and thus carrying out waterfall flow type thinning treatment on the glass to be etched 20, and after the thinning is finished, taking down the glass.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (8)
1. An extremely thin glass etching and thinning device, comprising:
the glass clamping frames (1) comprise clamping discs (2) arranged at two ends, the clamping discs (2) on two sides are fixedly connected through connecting rods (3), glass clamping grooves (4) are formed in the inner sides of the clamping discs (2) on two sides, clamping rubber strips (5) are movably mounted in the glass clamping grooves (4), waterfall flow baffle grooves (6) are further formed in the clamping discs (2) on two sides of the glass clamping grooves (4), and the waterfall flow baffle grooves (6) in the clamping discs (2) on two sides are connected through baffle plates (7);
the glass clamping device comprises a uniform operating mechanism (8), wherein the uniform operating mechanism (8) comprises inclined connecting rods (9) fixedly arranged on one sides of a plurality of glass clamping frames (1), movable shafts (10) are fixedly arranged at one ends, far away from the glass clamping frames (1), of the inclined connecting rods (9), and the movable shafts (10) are movably inserted into the same drawing connecting rod (11);
the glass clamping frames (1) are movably arranged on two sides of the thinning etching box (12) through sealing bearings; and
the device comprises a waterfall flow spraying plate (13), wherein a plurality of spraying heads (14) are arranged at the bottom of the waterfall flow spraying plate (13) in an array mode, and the waterfall flow spraying plate (13) is movably arranged above a thinning etching box (12).
2. The extremely thin glass etching and thinning apparatus according to claim 1, wherein: the clamping rubber strips (5) on the two sides are movably connected with the threaded knobs (15) through connecting pieces, and the threaded knobs (15) on the two sides are in threaded connection with the through holes formed in the axis of the clamping disc (2).
3. The extremely thin glass etching and thinning apparatus according to claim 1, wherein: the through hole that communicates with circulating line (16) is seted up to attenuate sculpture case (12) bottom, circulating line (16) are kept away from through hole one end and are communicated with the feed liquor hole of circulating pump machine (17), the play liquid end and the waterfall flow of circulating pump machine (17) spray board (13) intercommunication.
4. The extremely thin glass etching and thinning apparatus according to claim 3, wherein: the liquid outlet end fixed mounting of circulating pump machine (17) has first quill pipe (18), the activity is inserted in first quill pipe (18) and is equipped with fall way (19), fall way (19) are kept away from first quill pipe (18) one end and waterfall flow and are sprayed board (13) intercommunication.
5. The extremely thin glass etching and thinning apparatus according to claim 3, wherein: and a filtering box body (21) is arranged on the circulating pipeline (16).
6. An extremely thin glass etching and thinning method using the extremely thin glass etching and thinning apparatus according to any one of claims 1 to 5, comprising: a multi-piece vertical immersion etching thinning method or a waterfall flow etching thinning method.
7. The method of claim 6, wherein said vertical immersion etching thinning comprises the steps of:
the method comprises the following steps: stacking two pieces of ultrathin glass, performing sealing treatment of UV (ultraviolet) glue on the edges of the two pieces of ultrathin glass, and curing to obtain glass (20) to be etched;
step two: after the sealing integrity of the glass (20) to be etched is checked, the processed glass (20) to be etched is respectively inserted into a plurality of glass clamping frames (1), the glass clamping frames (1) are kept upright by moving a traction connecting rod (11), and the glass (20) to be thinned is sequentially clamped by rotating thread knobs (15) on two sides of the glass clamping frames (1);
step three: and adding etching liquid into the thinning etching box (12), so that the etching liquid is spread over the whole glass (20) to be etched for etching and thinning, and taking out the glass after thinning is finished.
8. The etching and thinning method for the extremely thin glass according to claim 6, wherein the waterfall flow etching and thinning method comprises the following steps:
the method comprises the following steps: stacking the two pieces of ultrathin glass, performing sealing treatment of UV (ultraviolet) glue on the edge of the glass, and curing to obtain glass (20) to be etched;
step two: after the integrity of the sealing glue of the glass (20) to be etched is checked, the processed glass (20) to be etched is respectively inserted into a plurality of glass clamping frames (1), the glass clamping frames (1) are in an inclined state by moving a traction connecting rod (11), the glass (20) to be thinned is sequentially clamped by rotating thread knobs (15) on two sides of the glass clamping frames (1), and flow baffle plates (7) are respectively inserted into waterfall flow baffle grooves (6) on two sides of each group of glass (20) to be etched;
step three: moving the waterfall flow spraying plate (13) to enable the spraying head (14) to be positioned at a gap formed by two sides of each group of glass (20) to be etched and the flow blocking plate (7), supplying etching liquid into the waterfall flow spraying plate (13) through a circulating pump (17), enabling the etching liquid to flow down in a waterfall manner along the gap formed by the glass (20) to be etched and the flow blocking plate (7), and then carrying out waterfall flow type thinning treatment on the glass (20) to be etched, and after the thinning is finished, taking down the glass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011275352.XA CN112358194B (en) | 2020-11-16 | 2020-11-16 | Etching and thinning device and method for extremely-thin glass |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011275352.XA CN112358194B (en) | 2020-11-16 | 2020-11-16 | Etching and thinning device and method for extremely-thin glass |
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| Publication Number | Publication Date |
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| CN112358194A true CN112358194A (en) | 2021-02-12 |
| CN112358194B CN112358194B (en) | 2022-06-17 |
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| CN202011275352.XA Active CN112358194B (en) | 2020-11-16 | 2020-11-16 | Etching and thinning device and method for extremely-thin glass |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113213769A (en) * | 2021-04-16 | 2021-08-06 | 河北光兴半导体技术有限公司 | Etching thinning system |
| CN113233780A (en) * | 2021-04-07 | 2021-08-10 | 合肥京东方半导体有限公司 | Liquid crystal glass substrate thinning and etching equipment |
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| CN211921321U (en) * | 2019-12-31 | 2020-11-13 | 东莞市银泰玻璃有限公司 | Multistation glass etching structure |
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| US20020139475A1 (en) * | 2001-03-30 | 2002-10-03 | Industrial Technology Research Institute | Apparatus and method for etching glass panels |
| JP2013237579A (en) * | 2012-05-14 | 2013-11-28 | Asahi Glass Co Ltd | Apparatus for etching glass plate, glass plate holding jig and method for manufacturing glass plate |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113233780A (en) * | 2021-04-07 | 2021-08-10 | 合肥京东方半导体有限公司 | Liquid crystal glass substrate thinning and etching equipment |
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| CN113213769B (en) * | 2021-04-16 | 2023-09-15 | 河北光兴半导体技术有限公司 | Etching thinning system |
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