CN113231944A - Plasma polishing equipment and method for surface treatment of large-size CVD (chemical vapor deposition) cavity back plate - Google Patents
Plasma polishing equipment and method for surface treatment of large-size CVD (chemical vapor deposition) cavity back plate Download PDFInfo
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- CN113231944A CN113231944A CN202110494225.7A CN202110494225A CN113231944A CN 113231944 A CN113231944 A CN 113231944A CN 202110494225 A CN202110494225 A CN 202110494225A CN 113231944 A CN113231944 A CN 113231944A
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- polishing
- back plate
- rigid coupling
- hanger
- polished
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/102—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration with means for agitating the liquid
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention discloses a plasma polishing device and a plasma polishing method for surface treatment of a large-size CVD cavity back plate. The hanger assembly is internally provided with the two upper clamping hooks and the distance between the two lower clamping hooks, workpieces with different sizes can be conveniently handled, the hanger does not need to be replaced, the practical value is high, the circulating system is arranged in the polishing tank, polishing liquid in the polishing tank is in a flowing state through the circulating pump, the overall upper and lower concentration of the polishing liquid is uniform, the concentration difference is avoided, the phenomenon that the glossiness of the polished surface is not uniform due to the concentration difference of the polishing liquid is avoided, the cleaning tank is internally sprayed and washed by the spray head, water after spraying and washing can be used for soaking the workpieces, and the water continuously flows under the action of the stirring blades in the soaking and washing process, so that the cleaning quality is improved.
Description
Technical Field
The invention relates to the technical field of polishing equipment, in particular to plasma polishing equipment and a plasma polishing method for surface treatment of a large-size CVD cavity back plate.
Background
With the increasing upgrading of display technologies, the development of liquid crystal panels towards large size and ultra high definition has become a necessary trend. The data show that for the liquid crystal panel products of 65 inches or more, it is the 10.5 generation line with the most economical cutting efficiency, which has become an important opportunity for manufacturers to occupy the high point of the large-size market. From the technical point of view, the production and manufacturing of the display screen are a high-precision process, the difficulty of controlling the equipment of a large-size TFT-LCD production line exceeds that of any one of the previous liquid crystal panel production lines, which puts a very high demand on the maintenance of the equipment. Generally, during the chemical vapor deposition process, the thin film deposited on the inner wall of the process chamber may drop onto the glass substrate to a certain extent, resulting in the glass substrate being defective. In order to avoid the bad phenomenon, the process chamber needs to be disassembled and cleaned after a certain production period, and the film pollutants formed on the inner wall of the process chamber are removed. The cleanliness of the surface of the backing plate directly affects the operating conditions of the entire process chamber. The cavity back plate has high requirement on glossiness, polishing treatment is needed, and the existing polishing mode has the following defects:
at present, polishing is mainly carried out through polishing liquid, the polishing needs to be carried out in a polishing groove, the polishing groove increases along with the height of a groove body, the difference of the glossiness of a polishing piece at a vertical position is caused due to the difference of the vertical concentration of the polishing liquid of the groove body, and the difference of the glossiness increases along with the increase of the height of the groove body; meanwhile, the workpiece is fixed by mainly using a hanger during polishing, the conventional hanger can only fix workpieces with corresponding sizes, and when workpieces with different sizes need to be fixed, the hanger needs to be replaced, so that the production time is wasted; need wash after the polishing is accomplished, at present mainly use the shower nozzle to wash, later soak and wash, rivers are quiescent condition during the soaking, and the cleaning performance is poor.
Therefore, a plasma polishing device and a method for processing the surface of the back plate of the large-size CVD cavity are provided for solving the problems.
Disclosure of Invention
The invention aims to provide a plasma polishing device and a plasma polishing method for surface treatment of a large-size CVD cavity back plate, so as to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme: a plasma polishing device and method for surface treatment of a large-size CVD cavity back plate comprise a platform, a polishing groove, a cleaning groove and a control cabinet, wherein the top surface of the platform is fixedly connected with two guide rails, a moving platform is placed above the two guide rails, the bottom surface of the moving platform is rotatably connected with four guide wheels, the four guide wheels are respectively connected in the two guide rails in a sliding manner, the top surface of the moving platform is fixedly connected with a transmission mechanism, the top surface of the transmission mechanism is rotatably connected with the bottom end of a mechanical arm, the end part of the mechanical arm is provided with a locking assembly, a hanger assembly is inserted in the locking assembly, the polishing groove comprises a polishing groove body, the bottom surface and the middle position in the polishing groove body are respectively and fixedly connected with two heating pipes, a mounting groove is formed in the polishing groove body, two guide flaring holes are fixedly connected with the two side surfaces in the polishing groove body, a circulating pump is fixedly connected with the middle position in the mounting groove, and two guide pipes are fixedly connected in the mounting groove, one end of each of the two flow guide pipes is communicated with the two flow guide flaring openings, and the other end of each of the two flow guide pipes is communicated with the circulating pump.
Preferably, the washing tank is including wasing the cell body, wash the inside rotation of cell body and connect the pivot, a plurality of stirring leaves of pivot lateral wall rigid coupling, washing tank lateral wall rigid coupling motor storehouse outward, rigid coupling motor in the motor storehouse, motor pivot department rigid coupling pivot.
Preferably, a plurality of shower nozzles of internal lateral wall rigid coupling of washing tank, washing tank external lateral wall rigid coupling water inlet, the internal rigid coupling water pipe of washing tank, water pipe one end intercommunication a plurality of shower nozzles, the other end intercommunication water inlet.
Preferably, the locking assembly comprises a locking block fixedly connected to the end of the mechanical arm, a slot is formed in the end of the locking block, the hanger assembly comprises an insertion block inserted into the slot, and the end of the insertion block is fixedly connected to a hanger plate.
Preferably, the insert block is provided with a second threaded hole, the locking block is provided with a first threaded hole, and the first threaded hole and the second threaded hole are in threaded connection with a fixing bolt.
Preferably, two sliding chutes are formed in one side of the hanger plate, two upper sliding blocks are slidably connected to the upper positions of the two sliding chutes, two lower sliding blocks are slidably connected to the lower positions of the two sliding chutes, an upper clamping hook is fixedly connected to the upper sliding block, a lower clamping hook is fixedly connected to the lower sliding block, and a fixed block is fixedly connected to the center position of the sliding chute.
Preferably, the bull stick is connected in the fixed block internal rotation, bull stick upper end rigid coupling first lead screw, lower extreme rigid coupling second lead screw, first lead screw top is located hanger board top surface rigid coupling hand wheel, the first nut of rigid coupling in the upper slide the rigid coupling second nut in the lower slide, first nut is connected in the meshing of first lead screw, the second nut is connected in the meshing of second lead screw.
The polishing method comprises the following steps:
fixing a workpiece to be polished on a hanger assembly, and operating a mechanical arm to lock a hanger;
step two, adding polishing liquid into the polishing tank, starting a circulating pump, and driving the hanger assembly and the workpiece to move into the polishing tank by the mechanical arm;
thirdly, switching on a power supply, and connecting a circuit, so that the workpiece back plate to be polished can be polished;
after polishing is finished, the mechanical arm moves to drive the hanger assembly to move the polished cavity back plate workpiece from the polishing groove to the cleaning groove for cleaning, and after cleaning is finished, the mechanical arm drives the hanger assembly to place the polished cavity back plate workpiece on the platform;
fixing the next cavity back plate workpiece to be polished on the hanger assembly, operating the mechanical arm to drive the hanger to place the cavity back plate workpiece to be polished into a polishing groove, sequentially performing polishing treatment in the third step and cleaning in the fourth step to finish polishing treatment of the next cavity back plate workpiece to be polished, and sequentially and circularly performing polishing treatment in the first step, the second step and the third step and the fourth step to finish continuous polishing work of a plurality of cavity back plates;
and step six, cutting off a power supply after polishing and cleaning all the cavity back plates to be polished.
Compared with the prior art, the invention has the beneficial effects that:
the hanger assembly is internally provided with the two upper clamping hooks and the distance between the two lower clamping hooks, workpieces with different sizes can be conveniently handled, the hanger does not need to be replaced, the practical value is high, the circulating system is arranged in the polishing tank, polishing liquid in the polishing tank is in a flowing state through the circulating pump, the overall upper and lower concentration of the polishing liquid is uniform, the concentration difference is avoided, the phenomenon that the glossiness of the polished surface is not uniform due to the concentration difference of the polishing liquid is avoided, the cleaning tank is internally sprayed and washed by the spray head, water after spraying and washing can be used for soaking the workpieces, and the water continuously flows under the action of the stirring blades in the soaking and washing process, so that the cleaning quality is improved.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is an enlarged structural view of a polishing trough according to the present invention;
FIG. 3 is an enlarged structural view of a cross-sectional structure of a polishing trough in the present invention;
FIG. 4 is a schematic cross-sectional view of a connection structure between a hanger assembly and a locking assembly according to the present invention;
FIG. 5 is an enlarged view of the structure of the hanger assembly of the present invention;
FIG. 6 is an enlarged view of the mechanism at the cleaning tank of the present invention.
In the figure: 1 platform, 2 moving platforms, 3 polishing grooves, 4 cleaning grooves, 5 transmission mechanisms, 6 mechanical arms, 7 locking assemblies, 8 hanger assemblies, 9 control cabinets, 11 guide rails, 21 guide wheels, 31 polishing groove bodies, 32 heating pipes, 33 mounting grooves, 34 guide pipes, 35 diversion flaring holes, 36 circulating pumps, 41 cleaning groove bodies, 42 rotating shafts, 43 stirring blades, 44 motor bins, 45 motors, 46 spray heads, 47 water inlets, 48 water pipes, 71 locking blocks, 72 slots, 73 first threaded holes, 74 fixing bolts, 81 sliding grooves, 82 upper sliding blocks, 83 upper clamping hooks, 84 lower sliding blocks, 85 lower clamping hooks, 86 fixing blocks, 87 rotating rods, 88 first lead screws, 89 second lead screws, 810 first nuts, 811 second nuts, hand wheels 812, 813 inserting blocks, 814 hanger plates and 815 second threaded holes.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-6, the present invention provides a technical solution: a plasma polishing device and method for surface treatment of a large-size CVD cavity back plate comprise a platform 1, a polishing groove 3, a cleaning groove 4 and a control cabinet 9, wherein the top surface of the platform 1 is fixedly connected with two guide rails 11, a moving platform 2 is placed above the two guide rails 11, the bottom surface of the moving platform 2 is rotatably connected with four guide wheels 21, the four guide wheels 21 are respectively and slidably connected into the two guide rails 11, the top surface of the moving platform 2 is fixedly connected with a transmission mechanism 5, the top surface of the transmission mechanism 5 is rotatably connected with the bottom end of a mechanical arm 6, the end part of the mechanical arm 6 is estimated to be a locking assembly 7, and a hanger assembly 8 is inserted into the locking assembly 7.
Referring to fig. 4-5, the locking assembly 7 includes a locking block 71 fixed at an end of the mechanical arm 6, the end of the locking block 71 is provided with a slot 72, the hanger assembly 8 includes an insertion block 814 inserted in the slot 72, the end of the insertion block 814 is fixed to a hanger plate 814, one side of the hanger plate 814 is provided with two sliding slots 81, two upper sliding blocks 82 are slidably connected to upper positions of the two sliding slots 81, two lower sliding blocks 84 are slidably connected to lower positions of the two sliding slots, an upper hook 83 is fixedly connected to the upper sliding block 82, a lower hook 85 is fixedly connected to the lower sliding block 84, a fixed block 86 is fixedly connected to a center position of the sliding slot 81, a rotating rod 87 is rotatably connected to the fixed block 86, an upper end of the rotating rod 87 is fixedly connected to a first lead screw 88, a lower end of the rotating rod is fixedly connected to a second lead screw 89, a top end of the first lead screw 88 is located on a top surface of the hanger plate 814 and fixedly connected to a hand wheel 812, a first nut 810 is fixedly connected to the upper sliding block 82, a second nut 811 is fixedly connected to the lower sliding block 84, the first lead screw 88 is engaged with a first nut 810, the second screw 89 is meshed with the second nut 811, a workpiece is placed between the upper hook 83 and the lower hook 85, then the hand wheel 812 is rotated to fix the workpiece, the distance between the upper hook 83 and the lower hook 85 can be changed by rotating the hand wheel 812, and the workpieces of different sizes can be conveniently handled.
Referring to fig. 4, the second threaded hole 815 is formed in the insertion block 814, the first threaded hole 73 is formed in the locking block 71, and the fixing bolt 74 is threadedly connected to the first threaded hole 74 and the second threaded hole 815, so that the hanger assembly 8 can be fixed to the locking assembly 7 through the fixing bolt 74.
Referring to fig. 2-3, the polishing tank 3 includes a polishing tank body 31, two heating pipes 32 are respectively fixedly connected to the bottom surface and the middle portion inside the polishing tank body 31, an installation groove 33 is formed inside the polishing tank body 31, two flow guide expanding holes 35 are fixedly connected to two side surfaces inside the polishing tank body 31, a circulation pump 36 is fixedly connected to the middle portion inside the installation groove 33, two flow guide pipes 34 are fixedly connected to the installation groove 33, one ends of the two flow guide pipes 34 are respectively communicated with the two flow guide expanding holes 35, the other ends of the two flow guide pipes 34 are communicated with the circulation pump 36, and the circulation pump 36 is started to ensure the uniformity of the concentration of the polishing liquid inside the polishing tank body 31.
Please refer to fig. 6, the cleaning tank 4 includes a cleaning tank body 41, the inside of the cleaning tank body 41 is rotatably connected with a rotating shaft 42, the outer side wall of the rotating shaft 42 is fixedly connected with a plurality of stirring blades 43, the outer side wall of the cleaning tank body 41 is fixedly connected with a motor cabin 44, a motor 45 is fixedly connected with the motor cabin 44, the rotating shaft of the motor 45 is fixedly connected with the rotating shaft 42, the inner side wall of the cleaning tank body 41 is fixedly connected with a plurality of nozzles 46, the outer side wall of the cleaning tank body 41 is fixedly connected with a water inlet 47, the cleaning tank body 41 is fixedly connected with a water pipe 48, one end of the water pipe 48 is communicated with the plurality of nozzles 46, the other end is communicated with the water inlet 47, the stirring blades 43 can be driven to rotate by the starting motor 45, so that the water in the cleaning tank body 41 continuously flows, and the cleaning quality is ensured.
The polishing method comprises the following steps:
firstly, fixing a workpiece to be polished on a hanger component 8, and operating a mechanical arm 6 to lock a hanger;
step two, adding polishing liquid into the polishing tank 3, starting the circulating pump 36, and then driving the hanger assembly 8 and the workpiece to move into the polishing tank 3 by the mechanical arm 6;
thirdly, switching on a power supply, and connecting a circuit, so that the workpiece back plate to be polished can be polished;
after polishing is finished, the mechanical arm 6 moves to drive the hanger assembly 8 to move the polished cavity back plate workpiece from the polishing groove 3 to the cleaning groove 4 for cleaning, and after cleaning is finished, the mechanical arm drives the hanger assembly 8 to place the polished cavity back plate workpiece on the platform 1;
step five, fixing the next cavity back plate workpiece to be polished on the hanger assembly 8, operating the mechanical arm 6 to drive the hanger to place the cavity back plate workpiece to be polished into the polishing groove 3, sequentially performing polishing treatment in the step three and cleaning in the step four to finish polishing treatment of the next cavity back plate workpiece to be polished, and sequentially and circularly performing polishing treatment in the step one, the step two and the step three and the step four to finish continuous polishing work of a plurality of cavity back plates;
and step six, cutting off a power supply after polishing and cleaning all the cavity back plates to be polished.
The working principle is as follows: the invention adopts the following steps when in use: firstly, fixing a workpiece to be polished on a hanger component 8, and operating a mechanical arm 6 to lock a hanger; step two, adding polishing liquid into the polishing tank 3, starting the circulating pump 36, and then driving the hanger assembly 8 and the workpiece to move into the polishing tank 3 by the mechanical arm 6; thirdly, switching on a power supply, and connecting a circuit, so that the workpiece back plate to be polished can be polished; after polishing is finished, the mechanical arm 6 moves to drive the hanger assembly 8 to move the polished cavity back plate workpiece from the polishing groove 3 to the cleaning groove 4 for cleaning, and after cleaning is finished, the mechanical arm drives the hanger assembly 8 to place the polished cavity back plate workpiece on the platform 1; and step five, fixing the next cavity back plate workpiece to be polished on the hanger assembly 8, operating the mechanical arm 6 to drive the hanger to place the cavity back plate workpiece to be polished into the polishing groove 3, sequentially carrying out polishing treatment in the step three and cleaning in the step four to finish polishing treatment of the next cavity back plate workpiece to be polished, and sequentially and circularly carrying out polishing treatment in the step one, the step two and the step three and the step four to finish continuous polishing work of a plurality of cavity back plates. The hanging tool assembly 8 is internally provided with the two upper clamping hooks 83 and the distance between the two lower clamping hooks 85, workpieces with different sizes can be conveniently handled, the hanging tool does not need to be replaced, the practical value is high, the circulating system is arranged in the polishing tank 3, the polishing solution in the polishing tank is in a flowing state through the circulating pump 36, the overall upper concentration and the lower concentration of the polishing solution are uniform, the concentration difference is avoided, the phenomenon that the glossiness of the polished surface is not uniform due to the concentration difference of the polishing solution is avoided, the cleaning tank 4 is sprayed and washed by the spray head, the sprayed water can soak the workpieces, the water continuously flows under the action of the stirring blades 43 in the soaking and washing process, and the cleaning quality is improved.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (8)
1. A plasma polishing device for surface treatment of a back plate of a large-size CVD cavity comprises a platform (1), a polishing groove (3), a cleaning groove (4) and a control cabinet (9), and is characterized in that:
the top surface of the platform (1) is fixedly connected with two guide rails (11), a moving platform (2) is placed above the two guide rails (11), the bottom surface of the moving platform (2) is rotatably connected with four guide wheels (21), the four guide wheels (21) are respectively connected into the two guide rails (11) in a sliding manner, the top surface of the moving platform (2) is fixedly connected with a transmission mechanism (5), the top surface of the transmission mechanism (5) is rotatably connected with the bottom end of a mechanical arm (6), a locking assembly (7) is estimated at the end part of the mechanical arm (6), and a hanger assembly (8) is inserted into the locking assembly (7);
polishing groove (3) are including polishing cell body (31), two heating pipes (32) of polishing cell body (31) inside bottom surface and middle part position rigid coupling respectively, polishing cell body (31) inside mounting groove (33) of seting up, two water conservancy diversion flaring (35) of polishing cell body (31) inside both sides face rigid coupling, middle part position rigid coupling circulating pump (36) in mounting groove (33), two honeycomb duct (34) of rigid coupling in mounting groove (33), two honeycomb duct (34) one end communicates two water conservancy diversion flaring (35), two honeycomb duct (34) other end intercommunication circulating pump (36) respectively.
2. The plasma polishing apparatus for surface treatment of the back plate of the large-size CVD chamber as claimed in claim 1, wherein: washing tank (4) is including wasing cell body (41), wash cell body (41) internal rotation and connect pivot (42), a plurality of stirring leaves of pivot (42) lateral wall rigid coupling (43), wash cell body (41) lateral wall rigid coupling motor storehouse (44), rigid coupling motor (45) in motor storehouse (44), motor (45) pivot department rigid coupling pivot (42).
3. The plasma polishing apparatus for surface treatment of the back plate of the large-size CVD chamber as claimed in claim 2, wherein: wash a plurality of shower nozzles of cell body (41) inside wall rigid coupling (46), wash cell body (41) outside wall rigid coupling water inlet (47), wash rigid coupling water pipe (48) in cell body (41), water pipe (48) one end intercommunication a plurality of shower nozzles (46), the other end intercommunication water inlet (47).
4. The plasma polishing apparatus for surface treatment of the back plate of the large-size CVD chamber as claimed in claim 1, wherein: the locking assembly (7) comprises a locking block (71) fixedly connected to the end of the mechanical arm (6), a slot (72) is formed in the end of the locking block (71), the hanger assembly (8) comprises an inserting block (814) inserted into the slot (72), and the end of the inserting block (814) is fixedly connected with a hanger plate (814).
5. The plasma polishing apparatus for surface treatment of the back plate of the large-size CVD chamber as claimed in claim 4, wherein: the insert block (814) is provided with a second threaded hole (815), the locking block (71) is provided with a first threaded hole (73), and the first threaded hole (74) and the second threaded hole (815) are in threaded connection with a fixing bolt (74).
6. The plasma polishing apparatus for surface treatment of the back plate of the large-size CVD chamber as claimed in claim 4, wherein: two chutes (81) are arranged on one side of the hanger plate (814), two upper sliding blocks (82) are connected at positions above the chutes (81) in a sliding manner, two lower sliding blocks (84) are connected at positions below the chutes (81) in a sliding manner, upper clamping hooks (83) are fixedly connected on the upper sliding blocks (82), lower clamping hooks (85) are fixedly connected on the lower sliding blocks (84), and fixed blocks (86) are fixedly connected at the central positions of the chutes (81).
7. The plasma polishing apparatus for surface treatment of the back plate of the large-size CVD chamber as claimed in claim 6, wherein: rotating rod (87) is connected in fixed block (86) internal rotation, first lead screw (88), lower extreme rigid coupling second lead screw (89) of rotating rod (87) upper end rigid coupling, first lead screw (88) top is located hanger board (814) top surface rigid coupling hand wheel (812), first nut of rigid coupling (810) in top shoe (82) rigid coupling second nut (811) in lower slider (84), first nut (810) is connected in first lead screw (88) meshing, second nut (811) is connected in second lead screw (89) meshing.
8. The plasma polishing method for processing the surface of the back plate of the large-size CVD cavity according to claims 1-7, which is characterized by comprising the following steps:
firstly, fixing a workpiece to be polished on a hanger component (8), and operating a mechanical arm (6) to lock a hanger;
adding polishing liquid into the polishing tank (3), starting a circulating pump (36), and driving the hanger assembly (8) and the workpiece to move into the polishing tank (3) by the mechanical arm (6);
thirdly, switching on a power supply, and connecting a circuit, so that the workpiece back plate to be polished can be polished;
after polishing is finished, the mechanical arm (6) moves to drive the hanger assembly (8) to move the polished cavity back plate workpiece from the polishing groove (3) to the cleaning groove (4) for cleaning, and after cleaning is finished, the mechanical arm drives the hanger assembly (8) to place the polished cavity back plate workpiece on the platform (1);
fixing the next cavity back plate workpiece to be polished on a hanger assembly (8), operating a mechanical arm (6) to drive the hanger to place the cavity back plate workpiece to be polished into a polishing groove (3), sequentially performing polishing treatment in the third step and cleaning in the fourth step to finish polishing treatment of the next cavity back plate workpiece to be polished, and sequentially and circularly performing polishing treatment in the first step, the second step, the third step and the fourth step to finish continuous polishing work of a plurality of cavity back plates;
and step six, cutting off a power supply after polishing and cleaning all the cavity back plates to be polished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110494225.7A CN113231944A (en) | 2021-05-07 | 2021-05-07 | Plasma polishing equipment and method for surface treatment of large-size CVD (chemical vapor deposition) cavity back plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110494225.7A CN113231944A (en) | 2021-05-07 | 2021-05-07 | Plasma polishing equipment and method for surface treatment of large-size CVD (chemical vapor deposition) cavity back plate |
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| Publication Number | Publication Date |
|---|---|
| CN113231944A true CN113231944A (en) | 2021-08-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110494225.7A Withdrawn CN113231944A (en) | 2021-05-07 | 2021-05-07 | Plasma polishing equipment and method for surface treatment of large-size CVD (chemical vapor deposition) cavity back plate |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115354330A (en) * | 2022-09-23 | 2022-11-18 | 浙江缘旺门窗有限公司 | Smokeless polishing process for door and window aluminum profile |
| CN117463183A (en) * | 2023-12-27 | 2024-01-30 | 中唯精密工业有限公司 | Plasma nanometer polishing solution stirring device and polishing equipment |
-
2021
- 2021-05-07 CN CN202110494225.7A patent/CN113231944A/en not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115354330A (en) * | 2022-09-23 | 2022-11-18 | 浙江缘旺门窗有限公司 | Smokeless polishing process for door and window aluminum profile |
| CN115354330B (en) * | 2022-09-23 | 2024-02-06 | 浙江缘旺门窗有限公司 | Smokeless polishing process for aluminum profile of door and window |
| CN117463183A (en) * | 2023-12-27 | 2024-01-30 | 中唯精密工业有限公司 | Plasma nanometer polishing solution stirring device and polishing equipment |
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Application publication date: 20210810 |
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| WW01 | Invention patent application withdrawn after publication |