CN112322191B - Liquid polishing wax and preparation method thereof - Google Patents
Liquid polishing wax and preparation method thereof Download PDFInfo
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- CN112322191B CN112322191B CN202011386202.6A CN202011386202A CN112322191B CN 112322191 B CN112322191 B CN 112322191B CN 202011386202 A CN202011386202 A CN 202011386202A CN 112322191 B CN112322191 B CN 112322191B
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- polishing wax
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/06—Other polishing compositions
- C09G1/08—Other polishing compositions based on wax
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
Abstract
The invention discloses a liquid polishing wax which comprises the following raw materials in parts by mass: 20-50 parts of silicon carbide, 5-10 parts of ferrate, 15-35 parts of palmitic acid, 5-10 parts of paraffin oil, 3-8 parts of rosin, 10-20 parts of fatty alcohol-polyoxyethylene ether and 0.5-3 parts of phosphoric acid, and the liquid polishing wax is prepared. The invention can improve the polishing efficiency and has good polishing brightness; the preparation process is environment-friendly and pollution-free.
Description
Technical Field
The invention relates to a liquid polishing wax and a preparation method thereof, belonging to the technical field of surface polishing wax.
Background
The polishing process is one of the important processes in the surface treatment. Polishing refers to a process of leveling the surface of an object by using a polishing material, reducing roughness, and improving surface gloss and appearance quality. In the polishing process, solid polishing wax is generally adopted for polishing, but the solid polishing wax can form residues on the surface of stainless steel due to instantaneous high temperature and high pressure, the stainless steel is difficult to completely clean even wax removing water is used, and the surface of an object cannot shine or the light is insufficient, so that the liquid polishing wax gradually becomes the solid polishing wax. Liquid polishing waxes are currently on the market, but they have the common problems of: low polishing efficiency and poor brightness.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides the liquid polishing wax which can improve the polishing efficiency and has good polishing brightness; the preparation process is environment-friendly and pollution-free.
In order to achieve the purpose, the invention adopts the following technical scheme: the liquid polishing wax is characterized by comprising the following raw materials in parts by mass: 20-50 parts of silicon carbide, 5-10 parts of ferrate, 15-35 parts of palmitic acid, 5-10 parts of paraffin oil, 3-8 parts of rosin, 10-20 parts of fatty alcohol-polyoxyethylene ether and 0.5-3 parts of phosphoric acid.
Preferably, the liquid polishing wax comprises the following raw materials in parts by mass: 37 parts of silicon carbide, 7 parts of ferrate, 30 parts of palmitic acid, 7 parts of paraffin oil, 6 parts of rosin, 14 parts of fatty alcohol-polyoxyethylene ether and 0.8 part of phosphoric acid.
The invention also provides a preparation method of the liquid polishing wax, which comprises the following steps:
1) grinding silicon carbide for later use under the condition that the rotating speed is 400-1000 r/min;
2) crushing rosin into particles for later use under the condition that the rotating speed is 200-400 r/min;
3) heating the paraffin oil in parts by mass, adding the palmitic acid in parts by mass and the crushed rosin in parts by mass, stirring and melting, and uniformly mixing to obtain an organic liquid I;
4) cooling the obtained organic liquid I, stirring, adding the fatty alcohol-polyoxyethylene ether in parts by mass, adding the phosphoric acid in parts by weight, and uniformly mixing to obtain an organic liquid II;
5) and adding the silicon carbide in parts by mass into an organic liquid II, stirring to uniformly disperse the silicon carbide, adding the ferrate in the above amount, continuing stirring to uniformly disperse the ferrate, and cooling to room temperature to obtain the liquid polishing wax.
Wherein, in the step 1), the grain diameter of the silicon carbide grinding is 100-150 nm.
Wherein, in the step 3), the paraffin oil is heated to 90-95 ℃.
Wherein in the step 3), the stirring speed is 100-150 r/min.
In the step 4), the temperature of the organic liquid I is reduced to 40-45 ℃.
Wherein in the step 4), the stirring speed is 80-120 r/min.
Wherein in the step 5), the stirring speed is 150-200 r/min.
The invention has the beneficial effects that: the liquid polishing wax fully exerts the characteristic that the potassium ferrate strong oxidant has high polishing efficiency on silicon carbide, and has high polishing efficiency; grinding the silicon carbide to the particle size of 100-150 nm, and adding rosin to effectively improve the polishing brightness and ensure good surface quality; the preparation method is simple to operate, and the process is environment-friendly and pollution-free; the proper stirring speed is selected in each step of the preparation process, so that the liquid polishing wax is easy to store for a long time.
Detailed Description
In order to more clearly and completely illustrate the present invention, the following examples are given by way of illustration of the present invention, and are not intended to limit the present invention.
Example 1
A liquid polishing wax comprises the following raw materials in parts by mass: 20 parts of silicon carbide, 5 parts of ferrate, 15 parts of palmitic acid, 5 parts of paraffin oil, 3 parts of rosin, 10 parts of fatty alcohol-polyoxyethylene ether and 0.5 part of phosphoric acid.
The preparation method of the liquid polishing wax comprises the following steps:
1) grinding the silicon carbide to a particle size of 100-150 nm for later use under the condition that the rotating speed is 400-1000 r/min;
2) crushing rosin into particles for later use under the condition that the rotating speed is 200-400 r/min;
3) heating the paraffin oil in parts by mass to 90-95 ℃, adding the palmitic acid in parts by mass and the crushed rosin in parts by mass, stirring and melting at the speed of 100-150 r/min, and uniformly mixing to obtain an organic liquid I;
4) and (3) cooling the obtained organic liquid I to 40-45 ℃, stirring at the speed of 80-120 r/min, adding the fatty alcohol-polyoxyethylene ether in parts by mass, adding the phosphoric acid in parts by weight, and uniformly mixing to obtain an organic liquid II.
5) And adding the silicon carbide in parts by mass into an organic liquid II, stirring at the speed of 150-200 r/min to uniformly disperse the silicon carbide, adding the ferrate in the above amount, continuing stirring to uniformly disperse the ferrate, and cooling to room temperature to obtain the liquid polishing wax.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5psi, the lower disc rotating speed of a polishing machine is 50RPM, the upper disc rotating speed is 50RPM in a reverse direction, and the polishing time is 15 min. The test result shows that the surface of the iron sheet has the roughness of 0.007, smoothness and bright color.
Example 2
A liquid polishing wax comprises the following raw materials in parts by mass: 25 parts of silicon carbide, 7.5 parts of ferrate, 25 parts of palmitic acid, 7.5 parts of paraffin oil, 5.5 parts of rosin, 15 parts of fatty alcohol-polyoxyethylene ether and 2 parts of phosphoric acid.
The procedure for preparing the liquid polishing wax of this example was exactly the same as in example 1.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is set to be 60RPM, the upper disc rotating speed is set to be 60RPM in a reverse direction, and the polishing time is 15 min. The test result shows that the surface of the iron sheet has the roughness of 0.006, smoothness and bright color.
Example 3
A liquid polishing wax comprises the following raw materials in parts by mass: 50 parts of silicon carbide, 10 parts of ferrate, 35 parts of palmitic acid, 10 parts of paraffin oil, 8 parts of rosin, 20 parts of fatty alcohol-polyoxyethylene ether and 3 parts of phosphoric acid.
The procedure for preparing the liquid polishing wax of this example was exactly the same as in example 1.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is 60RPM, the upper disc rotating speed is 60RPM in a reverse direction, and the polishing time is 40 min. The test result shows that the surface of the iron sheet has the roughness of 0.005, smoothness and bright color.
Example 4
A liquid polishing wax comprises the following raw materials in parts by mass: 37 parts of silicon carbide, 7 parts of ferrate, 30 parts of palmitic acid, 7 parts of paraffin oil, 6 parts of rosin, 14 parts of fatty alcohol-polyoxyethylene ether and 0.8 part of phosphoric acid.
The procedure for preparing the liquid polishing wax of this example was exactly the same as in example 1.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is set to be 60RPM, the upper disc rotating speed is set to be 60RPM in a reverse direction, and the polishing time is 15 min. The test result shows that the roughness of the surface of the iron sheet is 0.002, the iron sheet is smooth, and the color is brighter.
Example 5
A liquid polishing wax comprises the following raw materials in parts by mass: 37 parts of silicon carbide, 8 parts of ferrate, 30 parts of palmitic acid, 7 parts of paraffin oil, 8 parts of rosin, 17 parts of fatty alcohol-polyoxyethylene ether and 1.3 parts of phosphoric acid.
The procedure for preparing the liquid polishing wax of this example was exactly the same as in example 1.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is set to be 60RPM, the upper disc rotating speed is set to be 60RPM in a reverse direction, and the polishing time is 15 min. The test result shows that the surface of the iron sheet has the roughness of 0.006, smoothness and bright color.
Comparative example 1
A liquid polishing wax comprises the following raw materials in parts by mass: 37 parts of silicon carbide, 30 parts of palmitic acid, 7 parts of paraffin oil, 6 parts of rosin, 14 parts of fatty alcohol-polyoxyethylene ether and 0.8 part of phosphoric acid.
The procedure for preparing the liquid polishing wax of this comparative example was exactly the same as that of example 4.
This comparative example differs from example 4 in that: the starting material is free of ferrate.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is set to be 60RPM, the upper disc rotating speed is set to be 60RPM in a reverse direction, and the polishing time is 15 min. The test result shows that the roughness of the surface of the iron sheet is 0.05, the iron sheet is still rough and dull in color, the iron sheet is continuously polished for 10min, and the roughness of the surface of the iron sheet is 0.006, smooth, bright in color and slightly dull.
Comparative example 2
A liquid polishing wax comprises the following raw materials in parts by mass: 37 parts of silicon dioxide, 30 parts of palmitic acid, 7 parts of paraffin oil, 6 parts of rosin, 14 parts of fatty alcohol-polyoxyethylene ether and 0.8 part of phosphoric acid.
The procedure for preparing the liquid polishing wax of this comparative example was exactly the same as that of example 4.
This comparative example differs from example 4 in that: silicon dioxide is added into the raw materials, and silicon carbide and ferrate are not contained.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is set to be 60RPM, the upper disc rotating speed is set to be 60RPM in a reverse direction, and the polishing time is 15 min. The test result shows that the roughness of the surface of the iron sheet is 0.06, the iron sheet still has some roughness and dull color, the iron sheet is continuously polished for 13min, and the roughness of the surface of the iron sheet is 0.002, smooth and bright in color but slightly dull.
Comparative example 3
A liquid polishing wax comprises the following raw materials in parts by mass: 37 parts of silicon carbide, 7 parts of ferrate, 30 parts of palmitic acid, 7 parts of paraffin oil, 14 parts of fatty alcohol-polyoxyethylene ether and 0.8 part of phosphoric acid.
The procedure for preparing the liquid polishing wax of this comparative example was exactly the same as that of example 4.
This comparative example differs from example 4 in that: the raw material is free of rosin.
The liquid polishing wax obtained in the embodiment is used for polishing iron sheets, the polishing pressure is set to be 5.5psi, the lower disc rotating speed of a polishing machine is set to be 60RPM, the upper disc rotating speed is set to be 60RPM in a reverse direction, and the polishing time is 15 min. The test results showed that the surface of the iron sheet had a roughness of 0.003, smoothness, but a dull color.
Comparative example 4
The raw materials and parts by mass of the liquid polishing wax of the comparative example were exactly the same as those of the liquid polishing wax of example 4.
The preparation method of the liquid polishing wax comprises the following steps:
1) grinding the silicon carbide to a particle size of 100-150 nm for later use under the condition that the rotating speed is 400-1000 r/min;
2) crushing rosin into particles for later use under the condition that the rotating speed is 200-400 r/min;
3) heating the paraffin oil in parts by mass to 90-95 ℃, adding the palmitic acid in parts by mass and the crushed rosin in parts by mass, stirring and melting the mixture at a speed of less than 100r/min, and uniformly mixing to obtain an organic liquid I;
4) and cooling the obtained organic liquid I to 40-45 ℃, stirring at the speed of less than 80r/min, adding the fatty alcohol-polyoxyethylene ether in parts by mass, adding the phosphoric acid in parts by weight, and uniformly mixing to obtain an organic liquid II.
5) And adding the silicon carbide in parts by mass into an organic liquid II, stirring at a speed of less than 150r/min to uniformly disperse the silicon carbide, adding the ferrate in the above amount, continuously stirring to uniformly disperse the ferrate, and cooling to room temperature to obtain the liquid polishing wax.
Comparative example 5
The raw materials and parts by mass of the liquid polishing wax of the comparative example were exactly the same as those of the liquid polishing wax of example 5.
The preparation method of the liquid polishing wax comprises the following steps:
1) grinding the silicon carbide to a particle size of 100-150 nm for later use under the condition that the rotating speed is 400-1000 r/min;
2) crushing rosin into particles for later use under the condition that the rotating speed is 200-400 r/min;
3) heating the paraffin oil in parts by mass to 90-95 ℃, adding the palmitic acid in parts by mass and the crushed rosin in parts by mass, stirring and melting the mixture at a speed of more than 150r/min, and uniformly mixing to obtain an organic liquid I;
4) and cooling the obtained organic liquid I to 40-45 ℃, stirring at the speed of more than 120r/min, adding the fatty alcohol-polyoxyethylene ether in parts by mass, adding the phosphoric acid in parts by weight, and uniformly mixing to obtain an organic liquid II.
5) Adding the silicon carbide in parts by mass into an organic liquid II, stirring at a speed of more than 200r/min to uniformly disperse the silicon carbide, adding the ferrate in the above amount, continuing stirring to uniformly disperse the ferrate, and cooling to room temperature to obtain the liquid polishing wax.
The liquid polishing wax obtained in comparative example 4, the liquid polishing wax obtained in comparative example 5, and the liquid polishing wax obtained in this example 4 were used for polishing iron pieces, respectively, with a polishing pressure of 5psi, a lower disc rotation speed of 50RPM of a polishing machine, and an upper disc rotation speed of 50RPM in reverse. The liquid polishing wax of comparative example 4, the liquid polishing wax of comparative example 5, and the liquid polishing wax of this example 4 were left to stand for half a year, and the iron pieces were polished separately for 15 min; the test results showed that the surface of the iron sheet polished with the liquid polishing wax of comparative example 4 had a roughness of 0.003, smoothness and a brighter color; the surface of the iron piece polished with the liquid polishing wax of comparative example 5 had a roughness of 0.003, smoothness and a brighter color; the roughness of the surface of the iron sheet polished by the liquid polishing wax of the embodiment 4 is 0.002, and the iron sheet is smooth and bright in color. The liquid polishing wax of comparative example 4, the liquid polishing wax of comparative example 5, and the liquid polishing wax of this example 4 were left to stand for 1 year, and the iron pieces were polished separately for 15 min; the test results showed that the surface of the iron piece polished with the liquid polishing wax of comparative example 4 had a roughness of 0.003, smoothness, and a bright but somewhat dull color; the liquid polishing wax polished iron sheet of comparative example 5 had a surface roughness of 0.003, smoothness, and a bright but somewhat dull color; the roughness of the surface of the iron sheet polished by the liquid polishing wax of the embodiment 4 is 0.002, and the iron sheet is smooth and bright in color. The liquid polishing wax of comparative example 4, the liquid polishing wax of comparative example 5, and the liquid polishing wax of this example 4 were left for 1 year and half, and the iron pieces were polished separately for 15 min; the test results showed that the surface of the iron piece polished with the liquid polishing wax of comparative example 4 had a roughness of 0.003, smoothness and dull color; the surface of the iron piece polished with the liquid polishing wax of comparative example 5 had a roughness of 0.003, smoothness and dull color; the roughness of the surface of the iron sheet polished by the liquid polishing wax of the embodiment 4 is 0.002, and the iron sheet is smooth and bright in color.
Finally, it should be noted that the above embodiments are only used for illustrating and not limiting the technical solutions of the present invention, and although the present invention has been described in detail with reference to the above embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made to the present invention without departing from the spirit and scope of the present invention, and all modifications or partial substitutions should be covered by the scope of the claims of the present invention.
Claims (9)
1. The liquid polishing wax is characterized by comprising the following raw materials in parts by mass: 20-50 parts of silicon carbide, 5-10 parts of ferrate, 15-35 parts of palmitic acid, 5-10 parts of paraffin oil, 3-8 parts of rosin, 10-20 parts of fatty alcohol-polyoxyethylene ether and 0.5-3 parts of phosphoric acid.
2. The liquid polishing wax is characterized by comprising the following raw materials in parts by mass: 37 parts of silicon carbide, 7 parts of ferrate, 30 parts of palmitic acid, 7 parts of paraffin oil, 6 parts of rosin, 14 parts of fatty alcohol-polyoxyethylene ether and 0.8 part of phosphoric acid.
3. A method of preparing a liquid polishing wax according to claim 1 or 2, comprising the steps of:
1) grinding silicon carbide for later use under the condition that the rotating speed is 400-1000 r/min;
2) crushing rosin into particles for later use under the condition that the rotating speed is 200-400 r/min;
3) heating the paraffin oil in parts by mass, adding the palmitic acid in parts by mass and the crushed rosin in parts by mass, stirring and melting, and uniformly mixing to obtain an organic liquid I;
4) cooling the obtained organic liquid I, stirring, adding the fatty alcohol-polyoxyethylene ether in parts by mass, adding the phosphoric acid in parts by weight, and uniformly mixing to obtain an organic liquid II;
5) and adding the silicon carbide in parts by mass into an organic liquid II, stirring to uniformly disperse the silicon carbide, adding the ferrate in the above amount, continuing stirring to uniformly disperse the ferrate, and cooling to room temperature to obtain the liquid polishing wax.
4. The method of claim 3, wherein the silicon carbide powder in step 1) has a particle size of 100 to 150 nm.
5. The method of claim 3, wherein the paraffin oil is heated to 90 to 95 ℃ in the step 3).
6. The method of claim 5, wherein the stirring speed in step 3) is 100 to 150 r/min.
7. The method for preparing a liquid polishing wax as claimed in claim 6, wherein in the step 4), the temperature of the organic liquid I is reduced to 40-45 ℃.
8. The method for preparing a liquid polishing wax as claimed in claim 7, wherein the stirring speed in the step 4) is 80 to 120 r/min.
9. The method of claim 8, wherein the stirring speed in step 5) is 150 to 200 r/min.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN202011386202.6A CN112322191B (en) | 2020-12-02 | 2020-12-02 | Liquid polishing wax and preparation method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202011386202.6A CN112322191B (en) | 2020-12-02 | 2020-12-02 | Liquid polishing wax and preparation method thereof |
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| CN112322191A CN112322191A (en) | 2021-02-05 |
| CN112322191B true CN112322191B (en) | 2021-06-29 |
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Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CA2474640A1 (en) * | 2002-02-18 | 2003-08-21 | Hilmar Weinert | Method of producing plane-parallel structures of silicon suboxide, silicon dioxide and/or silicon carbide, plane-parallel structures obtainable by such methods, and the use thereof |
| CN104403572B (en) * | 2014-11-21 | 2016-08-24 | 广东红日星实业有限公司 | A kind of liquor finish wax and preparation method thereof |
| CN108084885A (en) * | 2016-11-22 | 2018-05-29 | 重庆思比德复合材料有限公司 | The preparation method of medal polish wax |
| CN111748285A (en) * | 2020-06-22 | 2020-10-09 | 宁波日晟新材料有限公司 | Ferrate-containing silicon carbide polishing solution and preparation method and application thereof |
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