CN112245331A

CN112245331A - Chitosan deep moisturizing and anti-saccharification mask

Info

Publication number: CN112245331A
Application number: CN202011244896.XA
Authority: CN
Inventors: 陶瑞丰; 唐丽霞; 王燕虹; 伍阳春
Original assignee: Guangzhou Pujiana Biotechnology Co ltd
Current assignee: Guangzhou Pujiana Biotechnology Co ltd
Priority date: 2020-11-10
Filing date: 2020-11-10
Publication date: 2021-01-22

Abstract

The invention discloses a chitosan deep moisturizing and anti-saccharification mask which comprises the following components in percentage by weight: 1.6 to 2.65 percent of humectant, 0.1 to 0.12 percent of first skin conditioner, 0.12 to 0.15 percent of thickening agent, 0.1 percent of first preservative, 0.705 to 0.94 percent of second skin conditioner, 0.12 to 0.15 percent of PH regulator, 0.4 percent of second preservative, 0.00004 percent of essence and water, wherein the sum of the mass percentages of all the components is 100 percent. The facial mask is used for quickly moisturizing the skin, particularly in autumn and winter, the skin of people can be dried very much, the skin is peeled, and when the skin is lack of moisture, if the moisturizing facial mask is applied to the skin at the moment, the skin can be quickly moisturized, and the original moisturizing state is recovered.

Description

Chitosan deep moisturizing and anti-saccharification mask

Technical Field

The invention belongs to the technical field of cosmetic production, and particularly relates to a chitosan deep moisturizing and anti-saccharification mask.

Background

With the improvement of living standard of people, people pay more and more attention to the requirements on life quality, especially to self maintenance. Cosmetics as a luxury product with high consumption and high beauty play an indispensable role in daily life of people, and particularly, in the case of cosmetic masks, the forms of masks on the market are now various, and the forms of masks mainly include four types, namely, a paste type, a tear type, a jelly type, and a wet tissue type. The mud paste type facial mask is commonly an alga facial mask, a mud facial mask and the like, the tear type facial mask is the nasal paste special for blackheads, the jelly type is the best known as a sleep facial mask, and the wet tissue type is generally a facial mask paper which is packaged by a single sheet and is soaked with beauty treatment liquid. With the development of beauty science, a facial mask made of silk has appeared, and strictly speaking, it should be included in a wet tissue type facial mask. The principle of the facial mask is that the facial mask is covered on the face for a short time, so that the external air and pollution are temporarily isolated, the skin temperature is increased, pores of the skin are expanded, the secretion and metabolism of sweat glands are promoted, the oxygen content of the skin is increased, products of epidermal cell metabolism and accumulated grease substances are favorably removed from the skin, water in the facial mask permeates into the horny layer of the epidermis, the skin becomes soft, and the skin is naturally bright and elastic.

However, the long-term application of the facial mask easily causes the situation of pore blockage if facial cleaning is not performed in place, resulting in the generation of acne. And when the whitening facial mask is used for a long time, because the skin is over-nutritious, fat particles are generated, and mercury poisoning is easily caused when some whitening facial masks are applied for a long time. The mask can help to supplement nutrition needed by skin and repair problems of skin. Although the facial mask is good, the facial mask can be used too frequently and is counterproductive. The skin is changed, and the skin is changed by making more masks. Excessive masks can affect the thickening of the horny layer, change the normal metabolism of the whole skin and easily cause adverse reactions such as redness, swelling, sensitivity and the like. The mask is made more, and particularly, the nourishing mask is made more, excessive nutrition is accumulated at pores, so that the smoothness of the pores is easily influenced, and acnes and pimples can be caused for a long time.

Therefore, it is necessary to invent a chitosan deep moisturizing anti-glycation mask to solve the above problems.

Disclosure of Invention

In order to solve the problems, the invention provides a chitosan deep moisturizing and anti-saccharification mask, which aims to solve the problems in the background technology.

In order to achieve the purpose, the invention provides the following technical scheme: the chitosan deep moisturizing and anti-saccharification mask comprises the following components in percentage by weight: 1.6 to 2.65 percent of humectant, 0.1 to 0.12 percent of first skin conditioner, 0.12 to 0.15 percent of thickening agent, 0.1 percent of first preservative, 0.705 to 0.94 percent of second skin conditioner, 0.12 to 0.15 percent of PH regulator, 0.4 percent of second preservative, 0.00004 percent of essence and water, wherein the sum of the mass percentages of all the components is 100 percent.

Further, the humectant comprises the following components in percentage by weight: allantoin 0.01-0.15% and glycerin 1.5-2.5%.

Further, the first skin conditioner is 0.1% -0.12% of chitin, and the second skin conditioner comprises the following components in percentage by weight: 0.015% of first hyaluronic acid, 0.04% -0.06% of second hyaluronic acid, 0.03% -0.035% of hydroxyethyl cellulose, 0.02% -0.03% of EDTA disodium and 0.6% -0.8% of trehalose.

Further, the thickening agent is 0.12% -0.15% of carbomer, and the pH regulator is 0.12% -0.15% of triethanolamine.

Further, the first preservative is 0.1% of methylparaben, and the second preservative is 0.4% of phenoxyethanol.

Further, the chitosan deep-layer moisturizing and anti-saccharification mask comprises the following components in percentage by weight: 1.65% of humectant, 0.12% of first skin conditioner, 0.12% of thickener, 0.1% of first preservative, 0.715% of second skin conditioner, 0.12% of pH regulator, 0.4% of second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

Further, the chitosan deep-layer moisturizing and anti-saccharification mask comprises the following components in percentage by weight: the skin conditioner comprises, by mass, 2.12% of a humectant, 0.1% of a first skin conditioner, 0.14% of a thickening agent, 0.1% of a first preservative, 0.815% of a second skin conditioner, 0.14% of a pH regulator, 0.4% of a second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

Further, the chitosan deep-layer moisturizing and anti-saccharification mask comprises the following components in percentage by weight: the skin conditioner comprises, by mass, 2.6% of a humectant, 0.11% of a first skin conditioner, 0.15% of a thickener, 0.1% of a first preservative, 0.935% of a second skin conditioner, 0.14% of a pH regulator, 0.4% of a second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

The invention also provides a preparation method of the chitosan deep moisturizing and anti-saccharification mask, which comprises the following steps:

s1: adding glycerol, chitin, allantoin, hyaluronic acid, carbomer, hydroxyethyl cellulose, methylparaben, EDTA disodium and trehalose into a water pot, heating to 85-90 deg.C, homogenizing, stirring, dispersing, and keeping the temperature for 15-20 min;

s2: keeping the temperature for 15 minutes, then starting cooling water, cooling to 45 ℃, adding triethanolamine and stirring uniformly;

s3: cooling to 40 deg.C, adding essence and phenoxyethanol, and stirring.

The invention has the technical effects and advantages that:

1. the facial mask is used for quickly moisturizing the skin, particularly in autumn and winter, the skin of people can be dried very much, the skin is peeled, and when the skin is lack of moisture, if the moisturizing facial mask is applied to the skin at the moment, the skin can be quickly moisturized, and the original moisturizing state is recovered.

2. According to the invention, the facial mask has the whitening effect, and at the moment when the facial mask is uncovered, the skin of people can be found to be much whiter than before, so that the facial mask has the secondary benefit of helping people soften cutin and quickly fade acne marks on the face.

3. The facial mask is used for helping the skin of people to be cleaned, dirt on the skin of people can be removed, pores of people cannot be blocked, a series of skin problems such as acne and pox cannot be caused, dust is piled on the face of people after the face of people is cleaned by busy running of a day, and therefore the skin of people can be relaxed after the face of people is cleaned, and the skin can be deeply cleaned by applying the facial mask.

Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof.

Detailed Description

To make the objects, technical solutions and advantages of the embodiments of the present invention clearer and more complete, the technical solutions in the embodiments of the present invention are clearly and completely described, and it is obvious that the described embodiments are a part of the embodiments of the present invention, but not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.

The first embodiment is as follows:

the invention provides a chitosan deep moisturizing and anti-saccharification mask which comprises the following components in percentage by weight: 1.65% of humectant, 0.12% of first skin conditioner, 0.12% of thickener, 0.1% of first preservative, 0.715% of second skin conditioner, 0.12% of pH regulator, 0.4% of second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

s1: adding 1.5% of glycerol, 0.12% of chitin, 0.15% of allantoin, 0.055% of hyaluronic acid, 0.12% of carbomer, 0.03% of hydroxyethyl cellulose, 0.1% of methyl hydroxybenzoate, 0.03% of disodium EDTA and 0.6% of trehalose into a water pot, heating to 85-90 ℃, homogenizing, stirring and dispersing uniformly, and preserving heat for 15-20 minutes;

s2: after preserving heat for 15 minutes, starting cooling water, cooling to 45 ℃, adding 0.12 percent of triethanolamine, and stirring uniformly;

s3: cooling to 40 deg.C, adding essence 0.00004% and phenoxyethanol 0.4%, and stirring.

Example two:

the invention provides a chitosan deep moisturizing and anti-saccharification mask which comprises the following components in percentage by weight: the skin conditioner comprises, by mass, 2.12% of a humectant, 0.1% of a first skin conditioner, 0.14% of a thickening agent, 0.1% of a first preservative, 0.815% of a second skin conditioner, 0.14% of a pH regulator, 0.4% of a second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

s1: adding 2% of glycerol, 0.1% of chitin, 0.12% of allantoin, 0.065% of hyaluronic acid, 0.14% of carbomer, 0.03% of hydroxyethyl cellulose, 0.1% of methyl hydroxybenzoate, 0.02% of EDTA disodium and 0.7% of trehalose into a water pot, heating to 85-90 ℃, homogenizing, stirring, dispersing uniformly, and preserving heat for 15-20 minutes;

s2: after preserving heat for 15 minutes, starting cooling water, cooling to 45 ℃, adding 0.14 percent of triethanolamine, and stirring uniformly;

Example three:

the invention provides a chitosan deep moisturizing and anti-saccharification mask which comprises the following components in percentage by weight: the skin conditioner comprises, by mass, 2.6% of a humectant, 0.11% of a first skin conditioner, 0.15% of a thickener, 0.1% of a first preservative, 0.935% of a second skin conditioner, 0.14% of a pH regulator, 0.4% of a second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

s1: adding 2.5% of glycerol, 0.11% of chitin, 0.1% of allantoin, 0.075% of hyaluronic acid, 0.15% of carbomer, 0.035% of hydroxyethyl cellulose, 0.1% of methylparaben, 0.025% of disodium EDTA and 0.8% of trehalose into a water pot, heating to 85-90 ℃, homogenizing, stirring, dispersing uniformly, and preserving heat for 15-20 minutes;

s2: after preserving heat for 15 minutes, starting cooling water, cooling to 45 ℃, adding 0.15 percent of triethanolamine, and stirring uniformly;

Example four:

effect evaluation and performance detection:

the efficacy evaluation of examples 1 to 3 and the existing hydrating anti-glycation mask was carried out by the following specific test methods: 40 volunteers are selected from each experimental group, and the volunteers are 35-55 years old and have the phenomena of relaxation, roughness, dullness and wrinkle deepening; the facial mask is divided into four groups, and the facial mask prepared in the examples 1-3 and the existing moisturizing and anti-saccharification facial mask are respectively used, and the using method comprises the following steps: applying on face for 15 min, removing, cleaning, 1 night for 1 time, continuously trying for 12 weeks, photographing, and archiving;

the evaluation method comprises the following steps: (1) the efficacy is as follows: comparing the day 0 and week 12 photographs and asking the volunteers for a feeling of use wherein facial skin becomes significantly firmer, more elastic, less wrinkled is significant; the facial skin becomes remarkably tight, elastic, and wrinkle-reducing effective; the facial skin was not improved and was not effective; (2) feeling of use: more than 80% of people feel that the facial mask is very soft, skin-attached and breathable, the facial mask is rated as 'upper', 60% -80% is rated as 'middle', the facial mask below 60% is rated as 'lower', and the specific test results are as follows:

from the above table, it can be seen that: the facial mask can quickly moisturize the skin, particularly in autumn and winter, the skin can be dried very much, the skin is peeled off and lacks moisture, at the moment, if the moisturizing facial mask is applied on the skin, the skin can quickly moisturize and restore the original moisturized state, and the facial mask has the whitening effect, when the facial mask is taken off, the skin can be found to be much whiter than before, so that the facial mask has the second advantage of helping people soften cutin, quickly fade acne marks on the face and clear dirty matters on the skin, pores of people cannot be blocked, a series of skin problems such as acne and pimple cannot be caused, the face of people is filled with dust early after one day of running, and the skin of people can be relaxed after the face is cleaned, applying a facial mask to deeply clean the skin.

Although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.

Claims

1. A chitosan deep moisturizing anti-saccharification mask is characterized in that: the chitosan deep water-replenishing anti-saccharification mask comprises the following components in percentage by weight: 1.6 to 2.65 percent of humectant, 0.1 to 0.12 percent of first skin conditioner, 0.12 to 0.15 percent of thickening agent, 0.1 percent of first preservative, 0.705 to 0.94 percent of second skin conditioner, 0.12 to 0.15 percent of PH regulator, 0.4 percent of second preservative, 0.00004 percent of essence and water, wherein the sum of the mass percentages of all the components is 100 percent.

2. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the humectant comprises the following components in percentage by weight: allantoin 0.01-0.15% and glycerin 1.5-2.5%.

3. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the first skin conditioner is 0.1-0.12% of chitin, and the second skin conditioner comprises the following components in percentage by weight: 0.015% of first hyaluronic acid, 0.04% -0.06% of second hyaluronic acid, 0.03% -0.035% of hydroxyethyl cellulose, 0.02% -0.03% of EDTA disodium and 0.6% -0.8% of trehalose.

4. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the thickening agent is 0.12-0.15% of carbomer, and the pH regulator is 0.12-0.15% of triethanolamine.

5. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the first preservative is 0.1% of methylparaben, and the second preservative is 0.4% of phenoxyethanol.

6. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the chitosan deep water-replenishing anti-saccharification mask comprises the following components in percentage by weight: 1.65% of humectant, 0.12% of first skin conditioner, 0.12% of thickener, 0.1% of first preservative, 0.715% of second skin conditioner, 0.12% of pH regulator, 0.4% of second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

7. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the chitosan deep water-replenishing anti-saccharification mask comprises the following components in percentage by weight: the skin conditioner comprises, by mass, 2.12% of a humectant, 0.1% of a first skin conditioner, 0.14% of a thickening agent, 0.1% of a first preservative, 0.815% of a second skin conditioner, 0.14% of a pH regulator, 0.4% of a second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

8. The chitosan deep moisturizing and anti-glycation mask as claimed in claim 1, which is characterized in that: the chitosan deep water-replenishing anti-saccharification mask comprises the following components in percentage by weight: the skin conditioner comprises, by mass, 2.6% of a humectant, 0.11% of a first skin conditioner, 0.15% of a thickener, 0.1% of a first preservative, 0.935% of a second skin conditioner, 0.14% of a pH regulator, 0.4% of a second preservative, 0.00004% of essence and water, wherein the sum of the mass percentages of all the components is 100%.

9. A method for preparing the chitosan deep moisturizing anti-glycation mask as claimed in claims 1-8, which is characterized in that: the method comprises the following steps:

s3: cooling to 40 deg.C, adding essence and phenoxyethanol, and stirring.