CN112159424A - 三甲基硅乙炔合成工艺 - Google Patents
三甲基硅乙炔合成工艺 Download PDFInfo
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- trimethylsilylacetylene
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- 238000000034 method Methods 0.000 title claims abstract description 30
- CWMFRHBXRUITQE-UHFFFAOYSA-N trimethylsilylacetylene Chemical group C[Si](C)(C)C#C CWMFRHBXRUITQE-UHFFFAOYSA-N 0.000 title claims abstract description 19
- 230000015572 biosynthetic process Effects 0.000 title claims abstract description 11
- 238000003786 synthesis reaction Methods 0.000 title claims abstract description 11
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 claims abstract description 18
- INLLPKCGLOXCIV-UHFFFAOYSA-N bromoethene Chemical group BrC=C INLLPKCGLOXCIV-UHFFFAOYSA-N 0.000 claims abstract description 10
- -1 1-bromotrimethylchlorostyrene Chemical compound 0.000 claims abstract description 8
- 239000005051 trimethylchlorosilane Substances 0.000 claims abstract description 7
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 6
- 239000003513 alkali Substances 0.000 claims abstract description 4
- 238000006243 chemical reaction Methods 0.000 claims description 34
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 30
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 22
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 18
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 12
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 12
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 12
- 238000002360 preparation method Methods 0.000 claims description 12
- 238000010992 reflux Methods 0.000 claims description 11
- 150000007530 organic bases Chemical class 0.000 claims description 10
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 9
- 239000011777 magnesium Substances 0.000 claims description 9
- 229910052749 magnesium Inorganic materials 0.000 claims description 9
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 claims description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 8
- 239000011259 mixed solution Substances 0.000 claims description 8
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 6
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 6
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 claims description 6
- GCSJLQSCSDMKTP-UHFFFAOYSA-N ethenyl(trimethyl)silane Chemical group C[Si](C)(C)C=C GCSJLQSCSDMKTP-UHFFFAOYSA-N 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 239000000047 product Substances 0.000 claims description 6
- 239000000706 filtrate Substances 0.000 claims description 5
- 238000001914 filtration Methods 0.000 claims description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 5
- QPFMBZIOSGYJDE-UHFFFAOYSA-N 1,1,2,2-tetrachloroethane Chemical compound ClC(Cl)C(Cl)Cl QPFMBZIOSGYJDE-UHFFFAOYSA-N 0.000 claims description 4
- SCYULBFZEHDVBN-UHFFFAOYSA-N 1,1-Dichloroethane Chemical compound CC(Cl)Cl SCYULBFZEHDVBN-UHFFFAOYSA-N 0.000 claims description 4
- ITQTTZVARXURQS-UHFFFAOYSA-N 3-methylpyridine Chemical compound CC1=CC=CN=C1 ITQTTZVARXURQS-UHFFFAOYSA-N 0.000 claims description 4
- VHYFNPMBLIVWCW-UHFFFAOYSA-N 4-Dimethylaminopyridine Chemical compound CN(C)C1=CC=NC=C1 VHYFNPMBLIVWCW-UHFFFAOYSA-N 0.000 claims description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 4
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 claims description 4
- GSNUFIFRDBKVIE-UHFFFAOYSA-N DMF Natural products CC1=CC=C(C)O1 GSNUFIFRDBKVIE-UHFFFAOYSA-N 0.000 claims description 4
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 claims description 4
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 claims description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 claims description 4
- JGFZNNIVVJXRND-UHFFFAOYSA-N N,N-Diisopropylethylamine (DIPEA) Chemical compound CCN(C(C)C)C(C)C JGFZNNIVVJXRND-UHFFFAOYSA-N 0.000 claims description 4
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 claims description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 4
- 229910052783 alkali metal Inorganic materials 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 4
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 4
- ZCSHNCUQKCANBX-UHFFFAOYSA-N lithium diisopropylamide Chemical compound [Li+].CC(C)[N-]C(C)C ZCSHNCUQKCANBX-UHFFFAOYSA-N 0.000 claims description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- 239000012295 chemical reaction liquid Substances 0.000 claims description 3
- 238000012544 monitoring process Methods 0.000 claims description 3
- 239000002904 solvent Substances 0.000 claims description 3
- OCJBOOLMMGQPQU-UHFFFAOYSA-N 1,4-dichlorobenzene Chemical compound ClC1=CC=C(Cl)C=C1 OCJBOOLMMGQPQU-UHFFFAOYSA-N 0.000 claims description 2
- 229960000549 4-dimethylaminophenol Drugs 0.000 claims description 2
- MENYRYNFSIBDQN-UHFFFAOYSA-N 5,5-dibromoimidazolidine-2,4-dione Chemical compound BrC1(Br)NC(=O)NC1=O MENYRYNFSIBDQN-UHFFFAOYSA-N 0.000 claims description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 2
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 239000002585 base Substances 0.000 claims description 2
- FNXLCIKXHOPCKH-UHFFFAOYSA-N bromamine Chemical compound BrN FNXLCIKXHOPCKH-UHFFFAOYSA-N 0.000 claims description 2
- 229910052794 bromium Inorganic materials 0.000 claims description 2
- 229940117389 dichlorobenzene Drugs 0.000 claims description 2
- 229940043279 diisopropylamine Drugs 0.000 claims description 2
- 150000007529 inorganic bases Chemical class 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 2
- 229910052753 mercury Inorganic materials 0.000 claims description 2
- 229910001509 metal bromide Inorganic materials 0.000 claims description 2
- ICFJFFQQTFMIBG-UHFFFAOYSA-N phenformin Chemical compound NC(=N)NC(=N)NCCC1=CC=CC=C1 ICFJFFQQTFMIBG-UHFFFAOYSA-N 0.000 claims description 2
- NHKJPPKXDNZFBJ-UHFFFAOYSA-N phenyllithium Chemical compound [Li]C1=CC=CC=C1 NHKJPPKXDNZFBJ-UHFFFAOYSA-N 0.000 claims description 2
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 claims description 2
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 2
- 239000012264 purified product Substances 0.000 claims description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
- 150000003839 salts Chemical class 0.000 claims description 2
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 claims description 2
- 229940086542 triethylamine Drugs 0.000 claims description 2
- 239000008096 xylene Substances 0.000 claims description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 abstract description 7
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 abstract description 5
- 239000002994 raw material Substances 0.000 abstract description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 abstract 2
- NYAJZQXKGQEIGB-UHFFFAOYSA-N CC1=C(C(=C(C)Cl)C)C=CC=C1 Chemical compound CC1=C(C(=C(C)Cl)C)C=CC=C1 NYAJZQXKGQEIGB-UHFFFAOYSA-N 0.000 abstract 1
- 230000031709 bromination Effects 0.000 abstract 1
- 238000005893 bromination reaction Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 abstract 1
- 229910000042 hydrogen bromide Inorganic materials 0.000 abstract 1
- 238000009776 industrial production Methods 0.000 abstract 1
- 239000007818 Grignard reagent Substances 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- BRJHCBRLJLIXJJ-UHFFFAOYSA-N 1,2-dibromoethyl(trimethyl)silane Chemical compound C[Si](C)(C)C(Br)CBr BRJHCBRLJLIXJJ-UHFFFAOYSA-N 0.000 description 1
- VVDJVCJVVHHCIB-UHFFFAOYSA-N 1-bromoethenyl(trimethyl)silane Chemical group C[Si](C)(C)C(Br)=C VVDJVCJVVHHCIB-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- 238000006736 Huisgen cycloaddition reaction Methods 0.000 description 1
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical compound C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 1
- 150000001345 alkine derivatives Chemical class 0.000 description 1
- 238000005905 alkynylation reaction Methods 0.000 description 1
- CREMABGTGYGIQB-UHFFFAOYSA-N carbon carbon Chemical compound C.C CREMABGTGYGIQB-UHFFFAOYSA-N 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 150000004795 grignard reagents Chemical class 0.000 description 1
- 125000000623 heterocyclic group Chemical group 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 125000006239 protecting group Chemical group 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 235000013599 spices Nutrition 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
- C07F7/0827—Syntheses with formation of a Si-C bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0805—Compounds with Si-C or Si-Si linkages comprising only Si, C or H atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
- C07F7/083—Syntheses without formation of a Si-C bond
Abstract
本发明公开了一种三甲基硅乙炔合成工艺路线,该工艺路线中,先以溴乙烯和三甲基氯硅烷为起始原料,通过格氏法生成三甲基氯硅乙烯,再通过溴化试剂,在碱的作用下形成1‑溴三甲基氯硅乙烯,再在强碱的作用下脱去一分子溴化氢生成三甲基硅乙炔。本工艺路线较传统工艺,避免了气体乙炔的使用,降低了危险性,挺高了安全性,所使用的原料易得,易于操作,安全环保,可以实现工业化生产。
Description
技术领域
本发明涉及一种三甲基硅乙炔合成工艺路线,属于化学制药类。
背景技术
三甲基硅乙炔是一种重要的香料、医药中间体,是重要的具硅基础化工原料之一,也是重要的炔基化试剂,在各种单炔,多炔烃的制备中是必不可少的合成基元;另外,在杂环化学,碳-碳偶联,药物合成,催化化学和材料工业中有很多应用。
同时也作为硅基保护基,用于通过对乙炔二氮化合物的1,3-两极环加成合成吡唑,镍催化的和苄腈偶联反应的底物。
现有合成工艺路线是先将1-氯正丁烷制成格氏试剂,通入气体乙炔置换,形成乙炔格氏试剂,再与三甲基氯硅烷反应,然后通过蒸馏得到三甲基硅乙炔;该路线用到气体乙炔,反应过程有爆炸的危险,操作危险性大。2014年的中国专利《一种三甲基硅乙炔的生产工艺》(CN103896976A)中所述,中间产物1,2-二溴乙基三甲基硅烷在碱性条件下反应;该反应会生成大量副产,提纯难度大,得不到纯的产品三甲基硅乙炔。
本发明的合成工艺路线避免了乙炔的使用,降低了反应的危险性,操作简单,原料易得,反应条件温和,成本低,易于工业化。
发明内容
本发明的目的时提供了一种三甲基硅乙炔的合成工艺,其方法如下:
(1)三甲基硅乙烯的制备:将镁和四氢呋喃投入到反应瓶中,室温缓慢滴加溴乙烯和四氢呋喃混合液,升温直至回流,滴完回流1h,确保大部分镁反应完全,反应结束后滴加三甲基氯硅烷和四氢呋喃混合液,GC监测至反应完全;反应液精馏收集60~65℃的产品三甲基硅乙烯,其中摩尔比镁:溴乙烯:三甲基氯硅烷=1:0.8-1:0.8-1。
(2)1-溴三甲基硅乙烯的制备:将有机溶剂、三甲基硅乙烯和有机碱投入到反应瓶中,控制温度在-20到10℃,滴加溴化试剂,反应结束后过滤掉生成的盐,滤液减压精馏收集72-75(120mm汞柱)的纯化产品1-溴三甲基硅乙烯,其中摩尔比三甲基硅乙烯:溴化试剂:有机碱=1:1-5:1-10。
(3)三甲基硅乙炔的制备:将碱和溶剂投入反应瓶中,升温至40-110℃,滴加1-溴三甲基硅乙烯,回流4-10h后GC检测1-溴三甲基硅乙烯反应完毕,蒸馏得到纯品三甲基硅乙炔。
如权利要求1所述的合成工艺,第一步中镁:溴乙烯:三甲基氯硅烷的摩尔比为1:0.8-1:0.8-1,优选为1:0.91:0.9。
如权利要求1所述的合成工艺,第二步中三甲基硅乙烯:溴化试剂:有机碱的摩尔比为1:1-5:1-10,优选为1:1.2:2.5。
如权利要求1所述的合成工艺,第二步中有机溶剂为己烷,环己烷,乙醚,四氯化碳,二氯甲烷,四氯乙烷,二氯乙烷,四氢呋喃,乙酸乙酯,DMF中的一种或几种任意比例混合,优选二氯甲烷。
如权利要求1所述的合成工艺,第二步中滴加溴的温度为-20到10℃,优选-10~-5℃。
如权利要求1所述的合成工艺,第二步中有机碱为DBU,DIPEA,TWG,DMAP,二异丙胺,三乙胺,甲醇钠,乙醇钾,叔丁醇钾,丁基锂,苯基锂,二异丙基胺基锂,吡啶,甲胺,乙胺,二甲胺,3-甲基吡啶,吡咯,三甲胺中的一种或几种任意比例混合,优选三乙胺。
如权利要求1所述的合成工艺,第二步中溴化试剂为液溴,NBS,DBBA,DBI,二溴海因,TBAB,N-溴代酰胺类,金属溴化物中的一种或几种任意比例混合,优选液溴。
如权利要求1所述的合成工艺,第三步中反应温度为40~110℃,优选80~100℃。
如权利要求1所述的合成工艺,第三步中的碱为无机碱如碱金属、碱金属的醇盐、碱土金属,有机碱包括烷基锂,从安全和成本上考虑优选氢氧化钠或氢氧化钾。
如权利要求1所述的合成工艺,第三步中有机溶剂为己烷,环己烷,乙醚,二氯乙烷,四氢呋喃,乙酸乙酯,DMF,甲苯,二甲苯,氯苯,二氯苯,丙酮,DMSO,水中的一种或几种任意比例混合,优选水。
本发明与现有技术相比,其优点如下:
(1)避免了乙炔的使用,使反应体系更安全。
(2)更环保,反应所使用的溶剂均可回收,第二步中所生成的三乙胺盐可重新制成三乙胺套用,不产生三废。
具体实施方式
下面通过具体实例说明本发明,但不限定本发明。
【实施例1】三甲基硅烷乙烯的制备
将镁1.1mol和800mlTHF投入2L四口反应瓶中,室温缓慢滴加溴乙烯1mol和200mLTHF混合液,逐渐升温至引发反应,直至回流;滴完,回流1h;保持回流状态滴加三甲基氯硅烷1mol和100mL四氢呋喃混合液,GC监测至反应完全;反应液精馏收集60~65℃的馏分,得到95g(收率95%)三甲基硅烷乙烯。
【实施例2】1-溴三甲基硅乙烯的制备
将三甲基硅乙烯0.9mol,三乙胺2.25mol和400ml二氯甲烷投入1L四口反应瓶中,控制温度-10~-5℃,滴加液溴1.06mol,1h滴加完毕,反应2-4h,回流1-3h,GC检测三甲基硅乙烯反应完毕。冷却过滤,滤液减压精馏收集72~75℃的馏分,得到1-溴三甲基硅乙烯165g(92.2%)。
【实施例3】1-溴三甲基硅乙烯的制备
将三甲基硅乙烯0.9mol,三乙胺2.25mol和400ml二氯甲烷投入1L四口反应瓶中,控制温度5~10℃,滴加液溴1.06mol,1h滴加完毕,反应2-4h,回流1-3h,GC检测三甲基硅乙烯反应完毕,但是GC显示产品不纯,有73%的副产。
【实施例4】三甲基硅乙炔的制备
将0.9mol氢氧化钠和100g二甲基亚砜投入500mL四口反应瓶中,升温至40-110℃,滴加0.8mol一步产品,滴完反应2h,GC检测反应结束,过滤,滤液蒸馏得到134.6g三甲基硅乙炔,纯度99%,收率94%。
【实施例5】三甲基硅乙炔的制备
将0.9mol氢氧化钠和100g水投入500mL四口反应瓶中,升温至40-110℃,滴加0.8mol一步产品,滴完反应2h,GC检测反应结束,过滤,滤液蒸馏得到131.7g三甲基硅乙炔,纯度99%,收率92%。
Claims (10)
1.一种三甲基硅乙炔合成工艺,此工艺包括:
(1)三甲基硅乙烯的制备:将镁和四氢呋喃投入到反应瓶中,室温缓慢滴加溴乙烯和四氢呋喃混合液,升温直至回流,滴完回流1h,确保大部分镁反应完全,反应结束后滴加三甲基氯硅烷和四氢呋喃混合液,GC监测至反应完全;反应液精馏收集60~65℃的产品三甲基硅乙烯,其中摩尔比镁:溴乙烯:三甲基氯硅烷=1:0.8-1:0.8-1;
(2)1-溴三甲基硅乙烯的制备:将有机溶剂、溴三甲基硅乙烯和有机碱投入到反应瓶中,控制温度在-20到10℃,滴加溴化试剂,反应结束后过滤掉生成的盐,滤液减压精馏收集72-75(120mm汞柱)的纯化产品1-溴三甲基硅乙烯;其中摩尔比三甲基硅乙烯:溴化试剂:有机碱=1:1-5:1-10;
(3)三甲基硅乙炔的制备:将碱和溶剂投入反应瓶中,升温至40-110℃,滴加1-溴三甲基硅乙烯,回流4-10h后GC检测1-溴三甲基硅乙烯反应完毕,蒸馏得到纯品三甲基硅乙炔,路线如下图所示:
第一步:
第二步:
第三步:
2.如权利要求1所述的合成工艺,第一步中镁:溴乙烯:三甲基氯硅烷的摩尔比为1:0.8-1:0.8-1,优选为1:0.91:0.9。
3.如权利要求1所述的合成工艺,第二步中三甲基硅乙烯:溴化试剂:有机碱的摩尔比为1:1-5:1-10,优选为1:1.2:2.5。
4.如权利要求1所述的合成工艺,第二步中有机溶剂为己烷,环己烷,乙醚,四氯化碳,二氯甲烷,四氯乙烷,二氯乙烷,四氢呋喃,乙酸乙酯,DMF中的一种或几种任意比例混合,优选二氯甲烷。
5.如权利要求1所述的合成工艺,第二步中滴加溴的温度为-20到10℃,优选-10~-5℃。
6.如权利要求1所述的合成工艺,第二步中有机碱为DBU,DIPEA,TWG,DMAP,二异丙胺,三乙胺,甲醇钠,乙醇钾,叔丁醇钾,丁基锂,苯基锂,二异丙基胺基锂,吡啶,甲胺,乙胺,二甲胺,3-甲基吡啶,吡咯,三甲胺中的一种或几种任意比例混合,优选三乙胺。
7.如权利要求1所述的合成工艺,第二步中溴化试剂为液溴,NBS,DBBA,DBI,二溴海因,TBAB,N-溴代酰胺类,金属溴化物中的一种或几种任意比例混合,优选液溴。
8.如权利要求1所述的合成工艺,第三步中反应温度为40-110℃,优选80-100℃。
9.如权利要求1所述的合成工艺,第三步中的碱为无机碱如碱金属、碱金属的醇盐、碱土金属,有机碱包括烷基锂,从安全和成本上考虑优选氢氧化钠或氢氧化钾。
10.如权利要求1所述的合成工艺,第三步中有机溶剂为己烷,环己烷,乙醚,二氯乙烷,四氢呋喃,乙酸乙酯,DMF,甲苯,二甲苯,氯苯,二氯苯,丙酮,DMSO,水中的一种或几种任意比例混合,优选水。
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