CN112030103A - Mask device and mask manufacturing method - Google Patents
Mask device and mask manufacturing method Download PDFInfo
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- CN112030103A CN112030103A CN202010959690.9A CN202010959690A CN112030103A CN 112030103 A CN112030103 A CN 112030103A CN 202010959690 A CN202010959690 A CN 202010959690A CN 112030103 A CN112030103 A CN 112030103A
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- mask
- sheet
- mask sheet
- alignment
- frame
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Abstract
To provide a mask manufacturing apparatus and a mask manufacturing method using the mask manufacturing apparatus, which can manufacture: the mask pattern opening is not deformed, and the occurrence of dimensional deviation between the longitudinal direction and the transverse direction of the mask pattern opening can be suppressed. [ MEANS FOR SOLVING PROBLEMS ] A mask manufacturing apparatus (20) and a mask manufacturing method according to the present invention are provided with: a mask sheet holding portion 25 which is disposed in the mask opening portion 8, has a magnetic chuck 53, and can be switched between an attracting state in which the outer edge portion 2a of the mask pattern forming region 6 is magnetically attracted and a non-attracting state; an alignment camera 27 for detecting the amount of displacement of the plurality of alignment holes 7 provided on each mask sheet 2 with respect to the plurality of alignment marks 63 provided on the glass mother sheet 26; a coarse movement stage 51 and a fine movement stage 52 for correcting the offset by moving the mask sheet holding portion 25; and welding robots 28A and 28B as bonding means for bonding the outer edge 2a of the mask pattern formation region 6 to the outer edge 3a of the mask opening 8.
Description
Technical Field
The present invention relates to a mask manufacturing apparatus and a mask manufacturing method using the mask manufacturing apparatus.
Background
In recent years, organic el (organic Electro luminescence) has been receiving attention as a thin Display device (Display device). The organic EL display device has advantages of high contrast, a wide viewing range, and the like because it can emit light by itself. Such an organic EL display device is generally manufactured by a vacuum evaporation method using a Mask (Mask) having a Pattern opening corresponding to a Pattern (Pattern) of a light emitting layer or the like. In recent years, the size of organic EL display devices has become larger and larger due to industrial demands, and along with this, the size of masks has also become larger, which has raised a problem that the masks are easily bent.
Patent document 1 discloses a mask made of: a magnetic metal Mask sheet (Mask sheet) having a Mask pattern forming region; and a Mask frame (Mask frame) having magnetized flat portions for attracting Mask sheets having Mask openings corresponding to the Mask pattern forming regions, wherein the Mask is configured by magnetically attracting Mask sheets onto the flat portions of the Mask frame.
In recent years, masks for organic EL display devices have been increasing in size while realizing 6G (6 th generation product) or 6Ghalf (6 th generation semi-product). In order to cope with such a trend toward larger sizes, a technique has been proposed in which a mask sheet is divided into a plurality of small mask sheets (also referred to as unit mask sheets), and the plurality of small mask sheets are aligned and fixed at predetermined positions of a single mask frame to thereby realize larger sizes. Patent document 3 discloses a mask manufacturing method in which a plurality of elongated mask pieces having pattern openings are arranged, and then a mask frame is used to apply a tension in the longitudinal direction to the mask pieces, thereby forming a mask structure.
[ Prior Art document ]
[ patent document 1 ] Japanese patent application laid-open No. 2006-221911
[ patent document 2 ] Japanese patent laid-open No. 2015-1012
[ patent document 3 ] Japanese patent application laid-open No. 2003-217850
The mask described in patent document 1 is a method of eliminating the warpage of the mask sheet by magnetically attracting the mask sheet to the mask frame, and performing vacuum evaporation of the light-emitting layer by the mask after the mask sheet is magnetically attracted to the mask frame, however, in this type of mask, since the mask sheet and the mask frame are not mechanically fixed, there is a problem that when a large-sized mask is manufactured by arranging a plurality of mask sheets, the relative positions of the plurality of mask sheets are easily shifted.
In patent documents 2 and 3, a method is also adopted in which a mask sheet is fixed to a mask frame by applying a tensile force in one direction to the mask sheet, thereby preventing the mask sheet from being bent. However, it is very difficult to correct the dimensional deviation, which is caused by the deformation of the mask pattern opening due to the application of the tension in one direction to the mask sheet, and the dimensional deviation between the longitudinal direction and the lateral direction of the mask pattern opening.
Therefore, in order to solve the above problems, an object of the present invention is to provide a mask manufacturing apparatus and a mask manufacturing method using the mask manufacturing apparatus, which can manufacture: the mask pattern openings are not deformed, dimensional deviation between the longitudinal direction and the transverse direction of the mask pattern openings can be suppressed, and relative position deviation among a plurality of mask sheets is small, so that the mask is suitable for large-sized masks.
Disclosure of Invention
【1】 A mask manufacturing apparatus according to the present invention is a mask manufacturing apparatus that superimposes and bonds one or more mask sheets, which have mask pattern forming regions including mask pattern opening portions and are formed of a magnetic metal, on a mask frame having mask opening portions that have the same width as the mask pattern forming regions at positions corresponding to the mask pattern forming regions and are the same or less in number as the mask sheets, the mask manufacturing apparatus including: a mask sheet holding portion which is disposed on the inner lower side of the disposition position of the mask opening portion when viewed from the plane, has a Magnetic chuck (Magnetic chuck), and can be switched between an adsorption state in which the mask sheet is magnetically adsorbed and a non-adsorption state; a plate-shaped transparent Glass master (Glass master) which is arranged above the arrangement position of the mask sheet and is provided with a plurality of alignment marks; the alignment camera is used for detecting the offset of a plurality of alignment holes arranged on the mask relative to the plurality of alignment marks; an alignment Stage (Stage) for moving the mask sheet holding part; and a bonding device bonding an outer edge portion of the mask pattern forming region to an outer edge portion of the mask opening portion.
According to the mask manufacturing apparatus of the present invention, the mask sheet is magnetically adsorbed, and the amount of displacement (position and orientation) of the mask sheet alignment mark is detected in the state of the magnetic adsorption, and the amount of displacement of the mask sheet with respect to the alignment mark is corrected based on the amount of displacement, and the mask sheet is joined to the mask frame in the state where the mask sheet holding portion holds the mask sheet in the adsorbed state. Thus, the mask manufacturing apparatus provided by the present invention can manufacture: the mask pattern openings are not deformed, dimensional deviation between the longitudinal direction and the transverse direction of the mask pattern openings can be suppressed, and relative position deviation among a plurality of mask sheets is small, so that the mask is suitable for large-sized masks. The mask pattern opening refers to, for example: a hole for vacuum evaporation of a light emitting layer in an organic EL display device.
【2】 In the mask manufacturing apparatus of the present invention, it is desirable that: the magnetic chuck has: a lid portion of a nonmagnetic material having a reference surface for supporting the mask sheet when the mask sheet is attracted; and a first magnet disposed inside the lid and capable of moving up and down independently of the lid, wherein the reference surface is separated from the mask when the first magnet is switched from an attracted state to a non-attracted state of the mask.
When the first magnet is separated from the mask sheet, the mask sheet is pulled down by the attraction force of the first magnet and then bent during the period of time when the first magnet is switched from the attraction state to the non-attraction state. Therefore, if the first magnet is switched to the non-attracting state when the mask sheet is supported by the lid portion, the mask sheet is prevented from being bent by the attracting force of the first magnet by the support of the lid portion, and the mask pattern openings are prevented from being deformed by the bending of the mask sheet.
【3】 In the mask manufacturing apparatus of the present invention, it is desirable that: the mask sheet holding part includes: and a magnetic adsorption unit which adsorbs the mask sheet and makes the mask sheet closely attached to the mask frame at least near the joint starting position of the joint device when the mask sheet is jointed to the mask frame.
The mask sheet is attracted by the magnetic attraction means at the joining start position and is joined after being brought into close contact with the mask frame, so that the joining can be performed reliably while maintaining the position and posture of the mask sheet corrected for the amount of displacement.
【4】 In the mask manufacturing apparatus of the present invention, it is desirable that: the mask frame has a plurality of mask openings provided corresponding to a bonding array of the plurality of mask sheets, and the alignment stage has: a rough movement stage for moving the mask sheet holding part from the position where one of the mask openings is arranged to the position where the other mask opening is arranged; and the fine movement platform is used for correcting the offset of the mask relative to the plurality of alignment marks according to the offset.
When the mask sheet holding portion is moved between the plurality of mask openings on the mask frame, the mask sheet holding portion is moved by the coarse movement stage, and when the amount of deviation is compensated, the position, the posture, and the height of the mask sheet holding portion are finely adjusted by the fine movement stage. With this configuration, even when a plurality of mask sheets need to be bonded, it is possible to cope with this by only one mask sheet holding portion.
【5】 In the mask manufacturing apparatus of the present invention, it is desirable that: a support plate (Backup plate) for supporting the mask sheet flatly when the mask sheet holding portion sucks the mask sheet is disposed in a space surrounded by the plurality of magnetic attraction plates of the mask sheet holding portion.
The thickness of the mask pattern formation region on the mask sheet is from twenty μm to several hundred μm, and the mask pattern formation region tends to bend (i.e., sag) due to its own weight when the mask sheet is increased in size. Therefore, when the mask sheet is sucked, the lower end surface side of the mask pattern forming region is supported by the support plate, and the mask sheet can be sucked in a flattened state, and positional displacement due to warping and deformation of the mask pattern opening can be suppressed.
【6】 In the mask manufacturing apparatus of the present invention, it is desirable that: and a second magnet capable of lifting is arranged below the side of the supporting plate opposite to the mask sheet.
The mask sheet may sometimes be warped in the opposite direction (i.e., upwardly curved) in addition to the above-described bending due to its own weight. By attracting the mask sheet by the second magnet, the mask sheet that is warped can be flattened along the support plate lugs, and positional displacement of the mask sheet and deformation of the mask pattern openings due to warping can be suppressed.
【7】 In the mask manufacturing apparatus of the present invention, it is desirable that: the welding device is a welding robot with a mechanical arm provided with a laser emitting head, and the welding robot can move along a guide rail.
Since the robot arm has a high degree of freedom in operation and can be operated with high precision, it is possible to easily cope with various arrangements, sizes, and shapes of the mask sheet by providing the laser emitting head on the robot arm. In addition, the bonding area can be expanded by moving the welding robot along the guide rail, and the mask manufacturing method can cope with the large-size mask manufacturing having a plurality of mask sheets.
【8】 In the mask manufacturing apparatus of the present invention, it is desirable that: the welding robot is configured in a plurality of stages.
In this way, bonding can be started simultaneously at two locations in the planar direction, and for example, by simultaneously bonding at separate positions such as diagonal positions on one mask sheet, bending and positional deviation that occur when bonding is performed at a single position can be suppressed.
【9】 A mask manufacturing method of the present invention is a mask manufacturing method of overlapping and joining one or more mask sheets, which have mask pattern forming regions including mask pattern opening portions and are formed of a magnetic metal, and a mask frame, which has mask opening portions having the same width as the mask pattern forming regions at positions corresponding to the mask pattern forming regions and the same or less in number as the mask sheets, the mask manufacturing method including: a conveying and holding step of conveying and holding the mask frame to a predetermined position of a mask frame stage; a mask sheet adsorption step of conveying the mask sheet to a predetermined position above the mask frame and magnetically adsorbing the mask sheet by a mask sheet holding portion; an offset detecting step of detecting an offset of the alignment hole on the mask sheet with respect to the alignment mark on the glass mother substrate in a state where the mask sheet is adsorbed; an alignment step of correcting the offset amount of the mask sheet with respect to the plurality of alignment marks based on the offset amount; and a bonding step of bonding the mask sheet and the mask frame in a state where the mask sheet is adsorbed by the mask sheet holding portion after the alignment step.
According to the mask manufacturing method of the present invention, the mask sheet is magnetically adsorbed by the mask sheet holding portion, and the amount of deviation from the alignment mark as the reference mark is corrected based on the amount of deviation (position and orientation) of the mask sheet from the alignment mark detected in the state of magnetic adsorption, and the mask sheet is joined to the mask frame in the state where the mask sheet holding portion holds the mask sheet in adsorption. Thus, the mask manufacturing method provided by the invention can manufacture: the mask pattern openings are not deformed, dimensional deviation between the longitudinal direction and the transverse direction of the mask pattern openings can be suppressed, and relative position deviation among a plurality of mask sheets is small, so that the mask is suitable for large-sized masks.
【10】 In the mask manufacturing method of the present invention, it is desirable that: the alignment step is performed with a gap in the thickness direction between the mask sheet and the mask frame, and the bonding step is performed after a portion of the outer edge of the mask pattern formation region on the mask sheet is brought into close contact with a portion of the outer edge of the opening of the mask frame.
In the alignment process, since a gap is left between the mask sheet and the mask frame, friction can be reduced, and fine adjustment of the position and the posture can be easily performed. In addition, in the bonding step, the mask sheet and the mask frame are bonded after being brought into close contact with each other, so that the mask sheet is prevented from floating upward and the bonding can be performed reliably.
【11】 In the mask manufacturing method of the present invention, it is desirable that: the mask frame has a plurality of mask openings at positions corresponding to the mask pattern forming regions of the plurality of mask sheets, and after one mask sheet is bonded to one of the mask openings of the mask frame, the mask sheet holding portion is lowered to be in a non-adsorption state, the mask sheet holding portion is moved to the other mask openings, and after the other mask sheets are adsorbed by the mask sheet holding portion, the offset amount detection step, the alignment step, and the bonding step are repeated in accordance with the number of mask sheets.
The mask is composed of a single mask frame, and the single mask frame is provided with a plurality of mask sheets and mask opening parts corresponding to the mask sheets. The single mask sheet is engaged with the mask frame in a state of being magnetically adsorbed by the mask sheet holding portion. After the mask sheet holding portion is moved to the position of the next mask opening, the amount of deviation from the alignment mark is corrected, and the mask sheet is bonded to the mask frame. By repeating these steps in the number of mask sheets, a large-sized mask having a small relative positional shift between a plurality of mask sheets can be manufactured.
【12】 In the mask manufacturing method of the present invention, it is desirable that: the mask sheet holding portion is moved from one of the mask opening portions to the other mask opening portion by the coarse movement stage, and the alignment process is performed by the fine movement stage.
In a large-sized mask in which a plurality of mask sheets are arranged, when the mask sheet holding portion is moved between a plurality of mask openings of a mask frame, the mask sheet holding portion is moved quickly by a coarse movement stage, and when offset amount compensation is performed, the position, the posture, and the height are finely adjusted by a fine movement stage. In this way, even when a plurality of mask sheets need to be bonded, it is possible to cope with this by only one mask sheet holding portion.
【13】 In the mask manufacturing method of the present invention, it is desirable that: in the bonding step, the bonding is performed by laser welding using a plurality of welding robots, and the bonding is simultaneously started at least two positions on the opposite side position or the diagonal position on the outer side of the arrangement position of the alignment holes.
As described above, by simultaneously starting the bonding of the mask sheet and the mask frame at two positions spaced from each other, such as the opposite-side position or the diagonal position of the mask sheet, it is possible to suppress the warpage and the positional deviation caused when the bonding is performed at one position and then the bonding is performed at the other position. Further, by starting the bonding at the positions spaced from each other, it is possible to prevent the temperature from being excessively high due to excessive concentration of heat generated at the time of bonding, and thus it is possible to suppress the occurrence of thermal deformation of the mask sheet and prevent the influence of temperature change on the mask manufacturing apparatus.
Drawings
Fig. 1 is an exploded view of an example of a mask manufacturing apparatus 20 according to an embodiment and a mask 1 manufactured by a mask manufacturing method.
Fig. 2 is a schematic configuration diagram of an example of the mask manufacturing apparatus 20 according to the embodiment and the mask 1 manufactured by the mask manufacturing method.
Fig. 3 is a plan view of a general configuration of the mask manufacturing apparatus 20 according to the embodiment.
Fig. 4 is a partial sectional view of the mask assembling portion 21 in the mask manufacturing apparatus 20.
Fig. 5 is a plan view showing the arrangement structure of the alignment marks 63 on the mother glass sheet 26 in the mask manufacturing apparatus 20.
Fig. 6 is a perspective view of the mask sheet holding portion 25 in the mask manufacturing apparatus 20.
Fig. 7 is an enlarged sectional view of the structure of the magnetic chuck 53 in the mask manufacturing apparatus 20.
Fig. 8 is a flowchart of main processes of a mask manufacturing method according to the embodiment.
Fig. 9 is a diagram illustrating main steps of the mask manufacturing method according to the embodiment.
Fig. 10 is an explanatory diagram showing an example of the welding operation of the welding robots 28A and 28B in the mask manufacturing method according to the embodiment.
Detailed Description
Hereinafter, a mask manufacturing apparatus 20 and a mask manufacturing method according to an embodiment of the present invention will be described with reference to the drawings. In the drawings for explanation below, the dimensions of each member and portion are appropriately changed so that each member has a high degree of visibility in terms of the dimensions.
[ constitution of mask 1 ]
First, a configuration example of the mask manufacturing apparatus 20 according to the embodiment and the mask 1 manufactured by using the mask manufacturing method will be described.
Fig. 1 is an exploded view of an example of a mask manufacturing apparatus 20 according to an embodiment and a mask 1 manufactured by a mask manufacturing method. In the configuration example shown in fig. 1, the mask 1 is composed of eight mask sheets 2 and one mask frame 3. The mask sheet 2 is a magnetic body, and the thickness of the mask frame portion (outer edge portion 2a) other than the mask pattern forming region 6 is larger than the thickness of the mask pattern forming region 6, and is formed of a metal material having an extremely small thermal expansion coefficient (for example, Fe — Ni 36% or the like). The mask pattern forming region 6 is a sheet-like member having a thickness of twenty μm to several hundred μm. The mask pattern forming region 6 has a plurality of mask pattern openings 4 arranged in the center.
The mask pattern opening 4 is, for example, a hole for vacuum evaporation of a light emitting layer in an organic EL display device, and although not shown, a large number of holes are actually formed. Although fig. 1 shows an example in which eighteen mask pattern openings 4 are arranged, the number, arrangement, shape, and the like of the mask pattern openings 4 are freely set. At two corners of the mask sheet 2 at opposite corners, alignment holes 7 are provided. In addition, the alignment holes 7 may be provided at diagonal positions different from those shown. The number of the alignment holes 7 is not limited to two, and may be three or four. The alignment hole 7 is an alignment reference for positioning when the mask sheet 2 is bonded to the mask frame 3, and the alignment hole 7 and the mask pattern opening portion 4 are managed so as to be in a correct positional relationship with each other.
The mask frame 3 is a plate-like member that is the same as the mask sheet 2 or is formed of a metal material having a similar thermal expansion coefficient. The mask openings 8 are arranged corresponding to the positions and the number of the mask sheets 2. In addition, there is also a mask structure in which a plurality of mask sheets 2 are arranged in a single mask opening 8. The mask opening portion 8 has the same area as or a larger area than the mask pattern forming region 6 of the mask sheet 2. The size of the mask opening 8 can be set smaller than the mask pattern forming region 6 in a range that does not prevent the passage of vapor during vacuum evaporation. The peripheral region of the mask opening 8 is indicated as an outer edge 3 a.
The light guide holes 9 are arranged at the same plane positions as the alignment holes 7 of the mask sheet 2 on the mask frame 3. The diameter of the light guide hole 9 is set larger than the diameter of the alignment hole 7. Welding support holes 11 are also arranged outside the light guide holes 9 on the mask frame 3. The functions of light guide hole 9 and weld support hole 11 will be described later with reference to fig. 9. The light guide hole 9 and the welding support hole 11 are disposed together on the outer edge portion 3 a. In addition, the light guide hole 9 and the welding support hole 11 may be connected long holes.
The eight mask pieces 2 are arranged on the upper end surface of the mask opening 8 of the mask frame 3, and the mask pieces 2 are overlapped with the mask frame 3 and then bonded. The mask sheet 2 is bonded with reference to the alignment mark 63 (see fig. 5). At this time, the mask pattern forming region 6 is disposed in the mask opening 8. In other words, all the mask pattern openings 4 are disposed in the mask openings 8. The mask frame 3 is a reinforcing member of the mask sheet 2.
Fig. 2 is a schematic view showing an example of the structure of the mask 1. In which fig. 2(a) is a plan view and fig. 2(b) is a sectional view cut along the line a-a. As shown in fig. 2(a) and (b), the mask 1 is an integrated structure in which eight mask pieces 2 are stacked on one mask frame 3 and then joined. In fig. 2(a), the mask pattern formation region 6 is represented by hatching.
The mask 1 illustrated in fig. 2 is a configuration example corresponding to a substrate having a size of about 1.6m × 1.1m, which is called a sixth generation half, and eight mask sheets 2 are arranged in a four-vertical-two-horizontal manner to cope with an increase in size. The number of mask sheets 2 may also be one, two, four or more than eight.
Since the light guide hole 9 is disposed to guide light emitted from the backlight (not shown) to the alignment hole 7, the diameter of the light guide hole 9 is larger than the diameter of the alignment hole 7. The positions marked by the chain line in fig. 2(a) and the triangle in fig. 2(b) respectively indicate the welding locus and the welding position of the laser welding as a means for joining the mask sheet 2 and the mask frame 3. The welding support hole 11 is arranged in the vicinity of a bonding (welding) start position.
[ constitution of mask manufacturing apparatus 20 ]
Fig. 3 is a plan view of a general configuration of the mask manufacturing apparatus 20 according to the embodiment. In the following description, the left-right direction shown in fig. 3 is referred to as the X-axis, a direction parallel to the paper plane and perpendicular to the X-axis is referred to as the Y-axis, and a direction perpendicular to the XY-plane is referred to as the Z-axis. The mask manufacturing apparatus 20 includes: a mask assembling portion 21 as a region for joining the mask sheet 2 and the mask frame 3 on the almost central portion of the XY plane; and a mask conveying section 22 that conveys the mask sheet 2 to the mask assembling section 21. The mask assembling unit 21 and the mask conveying unit 22 are stored in a hot chamber 24 provided with an air conditioner 23, and perform internal temperature management in accordance with a predetermined temperature range (for example, within ± 0.1 degree celsius of a set temperature).
The mask assembling unit 21 includes: a mask sheet holding portion 25 disposed below the mask frame 3 to be conveyed and held; a glass mother substrate 26 disposed above the disposition position of the mask frame 3 (the disposition position of the mask sheet 2); an alignment camera 27 as a positional deviation detecting device; and two welding robots 28A, 28B as joining means. In addition, the number of welding robots is not limited to two, and two or more welding robots may be arranged. The structures of the mask sheet holding portion 25 and the glass mother substrate 26 will be described later with reference to fig. 4 and 5, respectively. The alignment camera 27 is movable in the Y-axis direction along a Y-axis guide rail 29 disposed on the X (-) side of the glass mother substrate 26. A pair of X-axis rails 30, 30 are disposed on opposite sides of the mother glass sheet 26, and the Y-axis rail 29 is movable along the X-axis rails 30, 30. That is, the alignment camera 27 can be moved to the positions of the alignment holes 7 of the eight mask pieces 2 by being freely moved in the X-axis direction and the Y-axis direction. The alignment camera 27 is, for example, a CCD camera.
The welding robots 28A, 28B each have a robot arm 32 mounted with a laser emitting head 31 for emitting laser light. The laser emitting heads 31 and 31 are movable in the XY plane and the Z axis direction within the movable range of the robot arm 32. The welding robot 28A can reciprocate along the X-axis guide rail 33A, and the welding robot 28B can reciprocate along the X-axis guide rail 33B. The bonding ranges of the eight mask sheets 2 are captured by the welding robots 28A and 28B. The two welding robots 28A and 28B can move in synchronization with each other or independently of each other to perform a joining (welding) operation. Although not shown, the welding robots 28A and 28B have a common laser emission source, and can branch the laser beam with a light guide and emit the branched laser beam from the laser emission heads 31 and 31.
A mask frame supplying portion 35 for supplying the mask frame 3 to the mask assembling portion 21 is disposed outside the mask assembling portion 21 in the X (-) direction, and the mask frame 3 is conveyed onto a mask frame stage 59 (see fig. 4) and magnetically adsorbed at a predetermined position. The mask frame supplying portion 35 is also a position for removing the mask 1.
The mask conveying unit 22 is disposed in the X (+) direction of the mask assembling unit 21. The mask transfer part 22 has a mask stocker 40, a mask loading robot 41, and a pre-alignment unit 42. Fig. 3 shows the arrangement of the respective devices constituting the mask transfer unit 22 in a simplified manner. The mask blanks 2 stored in the mask blank stocker 40 are transported one by one to the pre-alignment unit 42 by the mask blank loading robot 41. When the mask sheet 2 is conveyed to the mask assembling portion 21 in the prealignment unit 42, the mask sheet 2 is conveyed to the mask assembling portion 21 one by the extraction tool 90 (see fig. 9 a) while performing position adjustment so that at least a predetermined alignment mark 63 (see fig. 9 c) is positioned in a predetermined alignment hole 7.
Fig. 4 is a partial sectional view of the mask assembling portion 21 in the mask manufacturing apparatus 20. Fig. 4 is also an explanatory view showing the constituent members in a simplified manner. As shown in fig. 4, the mask sheet holding portion 25 is movable by a coarse movement stage 51 disposed on the support stage 50 and a fine movement stage 52 disposed on the coarse movement stage 51. The coarse motion stage 51 has the functions of: the mask piece holding portion 25 is moved in the X-axis direction and the Y-axis direction together with the fine movement stage 52, and the mask piece holding portion 25 is moved to each of the eight mask openings 8 (see fig. 1 and 2 (a)). The fine movement stage 52 finely adjusts the posture (angle θ) of the mask sheet holding portion 25 in the X-axis direction, the Y-axis direction, and the Y-axis or Y-axis. The fine movement stage 52 further has: the function of finely adjusting the position of the mask piece holding portion 25 in the mask opening 8, in other words, the position, posture and height of the mask piece 2 magnetically attracted by the mask piece holding portion 25, by moving up and down along the Z axis.
The mask sheet holding portion 25 is a structure having a quadrangular cylindrical shape in plan view (see fig. 6), and includes: and a magnetic chuck 53 which penetrates the mask opening 8 along the Z-axis direction on four sides of the mask opening in plan view and magnetically adsorbs the mask sheet 2. A back plate 54 is fixed to the bottom of the mask sheet holding portion 25, and a Z-axis table 55 is disposed in a space surrounded by the magnetic chucks 53 on four sides. A second magnet (permanent magnet) 56 and a support plate 57 are attached to the upper end of the Z-axis stage 55 on the mask sheet 2 side in this order from below. The support plate 57 functions to support the lower end surface of the mask sheet 2, and the second magnet 56 suppresses warping of the mask sheet 2 by attracting the mask sheet 2. The Z-axis stage 55 adjusts the height of the support plate 57 with respect to the mask sheet 2 by raising and lowering the support plate, and thereby flattens the mask sheet 2, that is, maintains the height of the mask sheet 2 to be equal to the reference surface 75 (see fig. 6) which is the upper end surface of the magnetic chuck 53. The detailed structure of the magnetic attraction disc 53 will be described later with reference to fig. 7.
The mask sheet 2 is conveyed to above the mask opening 8 of the mask frame 3, and is attracted by the magnetic chuck 53. The mask sheet holding portion 25 moves to the adjacent mask opening portion 8 by the rough movement table 51 after lowering the magnetic chuck 53 from the intersection region with the mask opening portion 8 to the lower side (indicated by the solid arrow in fig. 4). The mask sheet 2 is provided with alignment holes 7, and the mask frame 3 is provided with light guide holes 9 at the same plane positions as the alignment holes 7, so that light emitted from a backlight not shown passes through the light guide holes 9 and the alignment holes 7 and then is incident on the upper side of the mask sheet 2.
A plate-shaped transparent mother glass plate 26 provided with a plurality of alignment marks 63 is disposed above the mask sheet 2 (in the Z axis (+) direction). The mother glass sheet 26 is bonded and fixed to the lower end surface side of the bezel 60, and a reinforcing glass 61 is bonded and fixed to the upper end surface side of the bezel 60. Since the mother glass sheet 26 has a large size corresponding to six or half generations and is thus easily bent, the mother glass sheet 26 is reinforced and is suppressed from being bent by setting the space 65 between the mother glass sheet 26 and the reinforcing glass sheet 61 to a negative pressure while the reinforcing glass sheet 61 is provided. An alignment mark 63 as a reference mark is formed on the lower end surface of the mother glass sheet 26. The alignment mark 63 is provided at a position corresponding to the alignment hole 7. The arrangement of the alignment marks 63 will be described later with reference to fig. 5. The glass frame 60 (mother glass plate 26) is supported by four Guide posts (Guide posts) 62 and is movable up and down in the Z-axis direction, and the mask sheet 2 is moved onto the mask frame 3 and then lowered to a position where it does not contact the mask sheet 2 (indicated by a chain line in fig. 4). In a period other than the offset amount detection step and the alignment step described later, the glass mother substrate 26 is raised in advance to a height position at which the other steps are not hindered.
As shown by the chain line in fig. 4, in a state where the mother glass sheet 26 has been lowered to a position closely above the mask sheet 2, the alignment camera 27 is moved onto the alignment mark 63 (mother glass sheet 26) along the X-axis rails 30, 30 or the Y-axis rail 29, and the amount of displacement of the alignment hole 7 with respect to the alignment mark 63 is detected. The alignment camera 27 detects the amount of displacement of the alignment hole 7 in one mask sheet 2 with respect to the alignment mark 63, and then corrects the amount of displacement of the mask sheet 2 with respect to the alignment mark 63 based on a reference amount of displacement obtained by averaging the amounts of displacement at two positions, for example.
Fig. 5 is a plan view showing the arrangement structure of the alignment marks 63 on the mother glass sheet 26 in the mask manufacturing apparatus 20. The glass master 26 covers the entire eight mask sheets 2 after the bonding arrangement in the outer shape, and alignment marks 63 are provided at positions where the alignment holes 7 are arranged in each mask sheet 2. The alignment mark 63 is a reference mark for positioning the mask sheet 2. In the example shown in fig. 5, the alignment marks 63 are provided at two positions on the opposite corners of the mask sheet 2, but three or four alignment marks 63 may be provided, and the number of the alignment marks may be increased or decreased depending on the number of the alignment holes 7.
Next, the configuration of the mask sheet holding portion 25 will be described with reference to fig. 6. In fig. 6, illustration of the Z-axis table 55, the second magnet 56, and the support plate 57 is omitted.
Fig. 6 is a perspective view of the mask sheet holding portion 25 in the mask manufacturing apparatus 20. The mask sheet holder 25 is a frame-shaped structure having a rectangular shape in plan view as a whole, and the magnetic chuck units 70A, 70B, 70C, and 70D are disposed on four sides thereof, respectively. The opposed magnetic chuck units 70A, 70B have the same configuration, and the opposed magnetic chuck units 70C, 70D have the same configuration. The magnetic chuck units 70A and 70B are each constituted by a magnetic chuck sub-unit 71 in which four magnetic chucks 53 are arranged in series, and the magnetic chuck units 70C and 70D have the same configuration as the magnetic chuck sub-unit 71. The following description will be given taking one magnetic-chuck sub-unit 71 as a representative example.
In the magnetic-disk sub-unit 71, four magnetic disks 53 are fixed in series to a magnet support plate portion 72 extending in the X-axis direction. The upper end surfaces of the four magnetic attraction plates 53 are at the same height and serve as reference surfaces 75 when the mask sheet 2 is attracted (see also fig. 7). The island-like elevating plate portion 73 protruding from the magnet support plate portion 72 is connected to an Actuator (Actuator) (e.g., air cylinder) 74 as elevating means, and the four magnetic chucks 53 can be simultaneously elevated and lowered by the Actuator 74. By the synchronous driving of the actuators 74, all the magnetic attraction disks 53 included in the magnetic attraction disk units 70A to 70D are flush with the reference surface 75.
A unit drive unit 76 is disposed at the center in the X axis direction of each of the magnetic chuck units 70A and 70B. The unit driving portion 76 drives the magnetic chuck units 70A, 70B to move in the X-axis direction and the Y-axis direction independently of each other, and adjusts the position of the magnet portion 78 in the vicinity of the joining start position (welding start position). This point will be described later with reference to fig. 10.
Fig. 7 is an enlarged sectional view of the structure of the magnetic chuck 53 in the mask manufacturing apparatus 20. The magnetic attraction plate 53 has: the mask sheet 2-side end portion of the support frame 85 is fitted in the nonmagnetic cover portion 86, and the first magnet 88 housed in the magnet holding frame 87 and the magnet lifting mechanism portion 89 for lifting and lowering the first magnet 88 are provided inside the support frame 85 and the nonmagnetic cover portion 85. The first magnet 88 is a permanent magnet. The surface of the lid portion 86 in contact with the mask sheet 2 is the reference surface 75. The lid portion 86 and the magnet lifting mechanism portion 89 can be lifted and lowered (indicated by a thick arrow) in synchronization with the lifting and lowering plate portion 73, and at this time, the first magnet 88 is also lifted and lowered together with the lid portion 86. However, since the first magnet 88 includes the magnet lifting mechanism portion 89, it is also possible to independently lift and lower the cover portion 86 (indicated by thin arrows). That is, the driving timings of the cover 86 and the first magnet 88 may be shifted from each other. Although the first magnet 88 may be an electromagnetic magnet as the adsorption function member, a permanent magnet is preferably used in consideration of heat generation due to the electromagnetic method and reduction in bonding accuracy of the mask sheet 2 due to the heat and thermal expansion of the mask manufacturing apparatus 20. This is also true for the second magnet 56.
The mask manufacturing apparatus 20 described above is a mask manufacturing apparatus in which one or more mask sheets 2 are overlapped and bonded to a mask frame 3, wherein the one or more mask sheets 2 have mask pattern forming regions 6 including mask pattern openings 4 and are formed of a magnetic metal, and the mask frame 3 has mask openings 8 having the same width as the mask pattern forming regions 6 at positions corresponding to the mask pattern forming regions 6 and the same or less in number as the mask sheets 2. The mask manufacturing apparatus 20 includes: a mask sheet holding portion 25 which is disposed on the lower inner side of the position where the mask opening portion 8 is disposed when viewed from the plane, has a magnetic chuck 53, and can be switched between an attraction state in which the mask sheet 2 is magnetically attracted and a non-attraction state; a plate-shaped transparent glass mother plate 26 disposed above the position where the mask sheet 2 is disposed and provided with a plurality of alignment marks 63; an alignment camera 27 for detecting the amount of displacement of the plurality of alignment holes 7 provided in the mask sheet 2 with respect to the plurality of alignment marks 63; an alignment stage (coarse movement stage 51 and fine movement stage 52) for moving the mask sheet holding portion 25; and welding robots 28A and 28B as bonding means for bonding the outer edge 2a of the mask pattern formation region 6 to the outer edge 3a of the mask opening 8.
According to the mask manufacturing apparatus 20 of the present invention, the mask sheet 2 is magnetically adsorbed, the amount of displacement of the mask sheet 2 with respect to the alignment mark 63 is detected in the state of the magnetic adsorption, the amount of displacement of the mask sheet 2 with respect to the alignment mark 63 is corrected based on the amount of displacement (position and orientation), and the mask sheet is joined to the mask frame 3 in the state where the mask sheet holding portion 25 holds the mask sheet 2 in the adsorbed state. By doing so, it is possible to provide: the mask manufacturing apparatus 20 is capable of manufacturing a mask 1 which is suitable for large-sized masks, in which the mask pattern openings 4 are not deformed, the occurrence of dimensional variations between the vertical direction and the horizontal direction of the mask pattern openings 4 can be suppressed, and the relative positional shifts between the eight mask pieces 2 are small.
Further, the magnetic chuck 53 has: a lid portion 86 made of a nonmagnetic material for supporting the reference surface 75 of the mask sheet 2 when the mask sheet 2 is attracted; and a first magnet 88 disposed inside the lid portion 86 and capable of moving up and down independently of the lid portion 86, wherein the reference surface 75 is separated from the mask sheet 2 after the first magnet 88 is switched from the attracted state to the non-attracted state of the mask sheet 2.
After the mask sheet 2 is bonded to the mask frame 3, the mask sheet holding portion 25 is lowered with respect to the mask sheet 2 to be in a non-adsorbing state, and the mask 1 is removed. When the state is changed to the non-attracting state, the mask sheet 2 may be pulled down and bent while the first magnet 88 is separated from the mask sheet 2. Therefore, when the mask sheet 2 is supported by the reference surface 75 of the lid portion 86, the first magnet 88 is separated from the mask sheet to be in the non-attracting state, and then the lid portion 86 is lowered by one, so that the mask sheet 2 is prevented from being bent by the attracting force of the first magnet 86, and the mask pattern opening 4 is prevented from being deformed by the bending of the mask sheet 2.
The mask sheet holding portion 25 includes: and a magnetic adsorption unit 77 for adsorbing the mask sheet 2 and closely adhering the mask sheet to the mask frame 3 in the vicinity of the joining start positions 91 and 92 at which the welding robots 28A and 28B as joining devices start joining when joining the mask sheet 2 to the mask frame 3.
If the magnetic attraction means 77 is provided to attract the mask sheet 2 in a state where the mask sheet holding portion 25 attracts the mask sheet 2, and further, to attract the mask sheet 2 in the vicinity of the bonding start positions 91 and 92 and to bring the mask sheet 2 into close contact with the mask frame 3, the mask sheet 2 can be bonded reliably while maintaining the position and posture of the mask sheet 2 after the offset amount correction.
The mask frame 3 has a plurality of mask openings 8 provided corresponding to the bonding array of the plurality of mask sheets 2, and the alignment stage has: a coarse movement stage 51 for moving the mask sheet holding portion 25 from the arrangement position of one mask opening 8 to the arrangement position of the other mask opening 8; and a fine movement stage 52 for correcting the offset amount of the mask sheet 2 with respect to the plurality of alignment marks 63 based on the offset amount.
When the mask piece holding portion 25 is moved between the plurality of mask openings 8 in the mask frame 3, the mask piece holding portion 25 is moved by the coarse movement stage 51, and when the amount of displacement is compensated, the position, the posture, and the height of the mask piece holding portion 25 to which the mask piece 2 is attached are finely adjusted by the fine movement stage 52. With this configuration, even when a plurality of mask sheets need to be bonded, it is possible to cope with this by only one mask sheet holding portion.
In the mask manufacturing apparatus 20, a support plate 57 for flatly supporting the mask sheet 2 when the mask sheet holding portion 25 sucks the mask sheet 2 is disposed in a space surrounded by the plurality of magnetic attraction plates 53 of the mask sheet holding portion 25.
When the mask pattern forming region 6 is made larger, it is likely to bend due to its own weight. Therefore, by supporting the lower end surface side of the mask pattern forming region 6 by the support plate 57, the mask sheet 2 can be sucked in a flattened state, and positional displacement due to warping and deformation of the mask pattern opening 4 can be suppressed.
The joining devices are welding robots 28A and 28B having a robot arm 32 on which a laser emitting head 31 is mounted, and the welding robots 28A and 28B are movable along rails (X-axis rails 33A and 33B).
Since the robot arm 32 has a high degree of freedom of operation and can be operated with high precision, it is possible to easily cope with various arrangements, sizes, and shapes of the mask sheet 2 by providing the laser emitting head 31 on the robot arm 32. Further, by allowing the welding robots 28A and 28B to move along the X-axis guide rails 33A and 33B, the bonding possible area can be expanded, and the mask manufacturing with a large size having a plurality of mask sheets 2 can be handled.
Two welding robots 28A and 28B are disposed in the mask manufacturing apparatus 20. Although two welding robots 28A and 28B are provided in the embodiment, more welding robots may be provided if three or four welding robots 28A and 28B can be provided. In this way, bonding at a plurality of positions in the planar direction can be performed simultaneously by a plurality of welding robots, and for example, bonding at diagonal positions or opposing point-to-point positions on one mask sheet 2 can be performed simultaneously, thereby avoiding bending and positional deviation that would be caused when bonding is performed for only one position at a time.
Next, a method for manufacturing the mask 1 using the mask manufacturing apparatus 20 will be described with reference to fig. 8 and 9.
[ MASK MANUFACTURING METHOD ]
Fig. 8 is a flowchart of main processes of a mask manufacturing method according to the embodiment. Fig. 9 is a diagram illustrating main steps of the mask manufacturing method according to the embodiment. Fig. 9(a) is a mask sheet suction process demonstration diagram, fig. 9(b) and (c) are alignment process demonstration diagrams, and fig. 9(d) is a bonding process demonstration diagram. First, as shown in fig. 9(a), the mask sheet holding portion 25 is arranged in advance inside and below the mask opening 8 which is the part to be bonded of the mask frame 3, and when the mask sheet holding portion 25 is arranged at the position of the other mask opening 8, the mask sheet holding portion 25 is moved to the position of the mask opening 8 which is the bonding object by the coarse movement stage 51. At this time, the magnetic chuck 53 is lowered to a height position where the mask sheet holding portion 25 is movable. Subsequently, the mask frame 3 is conveyed to the mask frame table 59 and held and adsorbed at a predetermined position (conveying and holding step: step S1). Next, one mask sheet 2 is sucked by the extracting tool 90 at the prealignment unit 42, is conveyed to above the predetermined mask opening 8 of the mask frame 3, is lifted by the fine movement stage 52, and is magnetically sucked by the magnetic chuck 53 through the mask sheet holding portion 25 (mask sheet sucking step: step S2). In this step, a gap t is provided between the mask sheet 2 and the mask frame 3 to such an extent that the both do not come into contact with each other. The mother glass plate 26 is raised to a position where it does not interfere with the mask sheet 2 and the mask frame 3.
Next, as shown in fig. 9 b, the glass master plate 26 is lowered to be close to the upper side of the mask sheet 2, and in a state where the mask sheet 2 is sucked by the mask sheet holding portion 25, the alignment camera 27 detects the amount of displacement of the alignment hole 7 provided in the mask sheet 2 with respect to the alignment mark 63 provided in the glass master plate 26 (displacement amount detecting step: step S3). Subsequently, the amount of displacement of the mask sheet 2 relative to the alignment mark 63 is corrected by the fine movement stage 52 (alignment step: step S4). In this alignment step, the support plate 57 supports the lower end surface of the mask sheet 2 to maintain the mask sheet 2 flat. In each of the two alignment holes 7 of the mask sheet 2, the (offset amount detection process: step S3) and (alignment process: step S4) processes are performed. In (offset amount detection step: step S3), as shown in fig. 9(c), the alignment camera 27 takes an image of the passage or shielding of the light that is incident from the light guide hole 9 and emitted from the glass mother substrate 26 after passing through the alignment hole 7, and detects the offset amount of the alignment hole 7 on the mask sheet 2 with respect to the alignment mark 63 on the glass mother substrate 26 by image processing.
After the alignment step (step S4) is performed, as shown in fig. 9(d), the glass master 26 is raised to the position shown in fig. 9(a), and the mask sheet 2 is bonded to the mask frame 3 by the welding robots 28A and 28B (bonding step: step S5). In fig. 9(d), the illustration of the mother glass sheet 26 is omitted. The magnet portion 78 of the magnetic adsorption unit 77 adsorbs the mask sheet 2 after penetrating the welding support hole 11 near the joining start position, and tightly joins the mask sheet 2 to the mask frame 3 near the joining start position. The vicinity of the joining start position refers to the joining start position and its surrounding area. When the magnetic attraction unit 77 attracts the mask sheet 2, the mask sheet holding portion 25 maintains the state of attraction to the mask sheet 2 in the alignment step (step S4) in order to eliminate the fine positional shift in the planar direction caused by lowering the mask sheet holding portion 25.
Fig. 10 is an explanatory diagram showing an example of the welding operation of the welding robots 28A and 28B. Fig. 10 shows an example in which one mask sheet 2 is bonded to the mask frame 3 by two welding robots 28A and 28B. The engagement start positions are specifically divided into: a bonding start position 91 where bonding is performed by the welding robot 28A, and a bonding start position 92 where bonding is performed by the welding robot 28B in the diagonal direction. At the joining start positions 91, 92, the welding is started almost at the same time, and it is preferable that the respective welding robots 28A, 28B are moved in synchronization in the arrow direction in the solid line direction or the broken line direction along a predetermined welding locus 93 indicated by the chain line of the laser emitting head 31 (see fig. 3). When welding is started at the joining start positions 91, 92, a part of the outer edge portion 2a of the mask pattern forming region 6 on the mask sheet 2 is attracted and joined to the mask frame 3 by the magnetic attraction unit 77 at the positions corresponding to the joining start positions 91, 92, and the mask sheet 2 is joined to the mask frame 3 at least at two diagonal positions, and then the laser emission head 31 is moved along the welding locus 93. When two or more welding robots are provided, if the intersection point of the welding locus 93 and the extension line of the lamp pin interval (for example, when four welding robots are provided) from the gravity center position (center of figure position) of the mask sheet 2 is set as the joining start position, the positional deviation of the mask sheet 2 and the unevenness of the heat generation distribution due to welding can be suppressed without causing the joining start position to deviate.
After the bonding step (step S5), the mask 1, which is a structure in which the mask sheet 2 and the mask frame 3 are bonded, is removed (removing step S6). In the unloading, first, the second magnet 56 is lowered to the non-attracting position of the mask sheet 2 by the Z-axis table 55, and then, the mask sheet holding portion 25 is lowered by the fine movement table 52 to turn the mask sheet 2 into the non-attracting state, and then the unloading is performed. The mask sheets 2 have eight structures, and after the first sheet is bonded, the mask sheet holding portion 25 is lowered to the non-suction position, the mask sheet holding portion 25 is moved to the position of the mask opening 8 to be bonded next (the position indicated by the chain line in fig. 9 d) by the rough movement table 51, the second mask sheet 2 is conveyed to the position, and the steps S2 to S5 are repeated for the number of mask sheets 2, and then the unloading is performed. Before the material is removed, the deviation of the alignment hole 7 relative to the alignment mark 63 after the alignment camera 27 is engaged can be detected again, so that the product which is out of specification can be distinguished.
The operations of attracting and non-attracting the mask sheet 2 by the magnetic chuck 53 will be described with reference to fig. 7. When the mask sheet 2 is attracted, the lid portion 86 is raised to a position where it can come into contact with the mask sheet 2 in a state where the first magnet 88 is lowered to the lower side of the lid portion 86, and then the first magnet 88 raises the mask sheet 2 to a position where it can be attracted by the magnet raising and lowering mechanism portion 89. On the other hand, when the mask sheet is in the non-attracting state, the first magnet 88 is lowered to the non-attracting position, and then the lid 86 is lowered to a position away from the mask sheet 2. By doing so, when the mask sheet 2 is switched to the adsorbing state or the non-adsorbing state, the mask sheet 2 is not bent.
In the mask manufacturing method described above, one or more mask sheets 2 are overlapped and bonded to a mask frame 3, wherein the one or more mask sheets 2 have mask pattern forming regions 6 including mask pattern openings 4 and are formed of a magnetic metal, and the mask frame 3 has mask openings 8 having the same width as the mask pattern forming regions 6 at positions corresponding to the mask pattern forming regions 6 and the same or less in number as the mask sheets 2. The mask manufacturing method comprises the following steps: a conveyance holding step of conveying the mask frame 3 onto the mask frame table 59; a mask sheet adsorption step of conveying the mask sheet 2 to a predetermined position above the mask frame 3 and magnetically adsorbing the mask sheet 2 by the mask sheet holding portion 25; a shift amount detection step of detecting a shift amount of the alignment hole 7 in the mask sheet 2 with respect to the alignment mark 63 on the glass mother substrate 26 in a state where the mask sheet 2 is adsorbed; an alignment step of correcting the offset amount of the mask sheet 2 with respect to the plurality of alignment marks 63 based on the offset amount; and a bonding step of bonding the mask sheet 2 and the mask frame 3 in a state where the mask sheet 2 is attracted by the mask sheet holding portion 25 after the alignment step.
According to the mask manufacturing method described above, the mask sheet 2 is magnetically attracted by the mask sheet holding portion 25, and the amount of offset with respect to the alignment mark 63 as the reference mark is corrected based on the amount of offset (position and orientation) detected by the alignment camera 27 in the state of magnetic attraction. Thus, it is possible to manufacture: the mask pattern openings 4 are not deformed, dimensional variations between the longitudinal direction and the lateral direction of the mask pattern openings 4 can be suppressed, and a shift in relative positions between the plurality of mask sheets 2 is small, which is suitable for a large-sized mask.
In the mask manufacturing method, the alignment step (step S4) is performed with the gap t in the thickness direction between the mask sheet 2 and the mask frame 3 left, and the bonding step is performed after the outer edge portion of the mask pattern formation region 6 on the mask sheet 2 and the outer edge portion of the opening of the mask frame 3 are brought into close contact with each other. In the alignment process, since the gap t is left between the mask sheet 2 and the mask frame 3, friction can be reduced and fine adjustment of the position and the orientation can be easily performed. In the bonding step, the mask sheet 2 and the mask frame 3 are bonded after being brought into close contact with each other, so that the mask sheet can be prevented from floating upward and can be bonded reliably.
In the mask manufacturing method, the mask frame 3 has eight mask openings 8 at positions corresponding to the mask pattern forming regions 6 of the eight mask pieces 2, and after one mask piece 2 is bonded to one of the eight mask openings 8, the mask piece holding portion 25 is lowered to be in a non-suction state, the mask piece holding portion 25 is moved to the other mask opening 8, and after the other mask pieces 2 are sucked by the mask piece holding portion 25, the shift amount detecting step (step S3), the aligning step (step S4), and the bonding step (step S5) are repeated for the number of mask pieces 2.
The single mask sheet 2 is engaged with the mask frame 3 in a state magnetically attracted by the mask sheet holding portion 25. After the mask sheet holding portion 25 is moved to the position of the next mask opening 8, the amount of deviation from the alignment mark 63 is corrected, and the mask sheet 2 is joined to the mask frame 3. By repeating these steps in the number of mask sheets 2, a large-sized mask 1 with a small relative positional shift between a plurality of mask sheets 2 can be manufactured.
In the mask manufacturing method, the rough movement stage 51 moves the mask piece holding portion 25 from one mask opening 8 to another mask opening 8, and the fine movement stage 52 performs the alignment process (step S4).
In a large-sized mask in which a plurality of mask sheets 2 are arranged, when the mask sheet holding portion 25 is moved between the mask openings 8 of the mask frame 3, the coarse movement stage 51 moves quickly, and when offset amount correction is performed, the fine movement stage 52 finely adjusts the position, orientation, and height. In this way, even when a plurality of mask sheets 2 need to be bonded, it is possible to deal with this by only one mask sheet holding portion 25.
In the mask manufacturing method, in the bonding step (step S5), the bonding is performed by laser welding using the welding robots 28A and 28B, and the bonding is simultaneously started at least two positions on the opposite side position or the diagonal position outside the position where the alignment hole 7 is arranged.
By simultaneously starting the joining of the mask sheet 2 and the mask frame 3 at two positions spaced from each other, such as the opposite side positions or the diagonal positions of the mask sheet 2, it is possible to suppress the bending and the positional deviation caused when the joining is performed at one position and then at the other position after the joining at the one position is completed. Further, by starting the bonding at the positions spaced apart from each other, it is possible to prevent the temperature from being excessively high due to excessive concentration of heat generated at the time of bonding, and thus it is possible to suppress the occurrence of thermal deformation of the mask sheet 2 and prevent the influence of temperature change on the mask manufacturing apparatus 20. When two or more welding robots are arranged, for example, four welding robots are arranged, four corners of the mask sheet 2 may be set as the bonding start positions.
The present invention is not limited to the above-described embodiments, and modifications, improvements, and the like that can achieve the object of the present invention are included in the present invention. For example, in the mask manufacturing apparatus 20, the mask piece holding portion 25 is moved before the plurality of mask openings 8, but the mask piece holding portions 25 may be prepared in accordance with the number of mask openings 8 (mask pieces 2) and the mask piece holding portions 25 may be individually finely adjusted, or the magnetic chuck units 70A to 70D corresponding to the number of mask openings 8 may be provided in a single mask piece holding portion 25 and may be moved up and down in synchronization with each other.
Further, although the above joining method is laser welding, other welding methods such as spot welding may be used, and mechanical fixing may be performed by using an adhesive or a fixing pin.
In the alignment step in the above embodiment, the alignment hole 7 is provided in the mask sheet 2, but instead of the glass mother substrate 26, a mark for alignment may be provided by printing on the surface of the mask sheet 2 on the glass mother substrate 26 side by means of a stamp, or may be detected by means of a laser.
Description of the symbols
1 … mask; 2 … mask sheet; 2a … outer edge portions of the masking sheet; 3 … mask frame; 3a … the outer edge part of the mask frame; 6 … mask pattern forming area; 7 … aligning the holes; 8 … mask opening; 20 … mask making device; 25 … mask sheet holding part; 26 … mother glass sheet; 27 … aligning the camera; 28A, 28B … welding robot (joining device); 31 … laser emitting head; a 32 … robotic arm; 33A, 33B … X-axis guide rails (guide rails); 51 … coarse motion stage (alignment stage); 52 … fine movement platform (alignment platform); 53 … magnetic disc; 56 … a second magnet; 57 … supporting plates; 59 … mask frame stage; 63 … fiducial marks; 86 … cover portion; 88 … a first magnet; 91. 92 … engagement start position
Claims (15)
1. A mask manufacturing apparatus that joins a plurality of mask sheets that have mask pattern forming regions including mask pattern opening portions and are formed of a magnetic metal after overlapping the mask sheets with a mask frame that has mask opening portions having the same width as the mask pattern forming regions at positions corresponding to the mask pattern forming regions and the same or less in number as the mask sheets, comprising:
a mask sheet holding portion which is disposed on the inner lower side of the disposition position of the mask opening portion when viewed from the plane, has a magnetic chuck, and is capable of switching between an adsorption state in which the mask sheet is magnetically adsorbed and a non-adsorption state;
a plate-shaped transparent glass mother plate which is arranged above the arrangement position of the mask sheet and is provided with a plurality of alignment marks;
the alignment camera is used for detecting the offset of a plurality of alignment holes arranged on the mask relative to the plurality of alignment marks;
an alignment stage for moving the mask sheet holding part; and
and a bonding device for bonding an outer edge portion of the mask pattern forming region to an outer edge portion of the mask opening.
2. A mask manufacturing apparatus that superimposes and bonds one or more mask sheets that have mask pattern formation regions including mask pattern opening portions and are formed of a magnetic metal, and a mask frame that has mask opening portions having the same width as the mask pattern formation regions at positions corresponding to the mask pattern formation regions and the same or less in number as the mask sheets, comprising:
a mask sheet holding portion which is disposed on the inner lower side of the disposition position of the mask opening portion when viewed from the plane, has a magnetic chuck, and can be switched between an adsorption state in which the mask sheet itself is magnetically adsorbed and a non-adsorption state;
a plate-shaped transparent glass mother plate which is arranged above the arrangement position of the mask sheet and is provided with a plurality of alignment marks;
the alignment camera is used for detecting the offset of a plurality of alignment holes arranged on the mask relative to the plurality of alignment marks;
an alignment stage for moving the mask sheet holding part; and
and a bonding device for bonding an outer edge portion of the mask pattern forming region to an outer edge portion of the mask opening.
3. Mask manufacturing apparatus according to claim 1 or 2, characterized in that:
wherein the magnetic chuck has: a lid portion of a nonmagnetic material having a reference surface for supporting the mask sheet when the mask sheet is attracted; and a first magnet which is arranged inside the cover part and can be lifted and lowered independently of the cover part,
the reference surface is separated from the mask sheet after the first magnet is switched from the attracted state to the non-attracted state of the mask sheet.
4. Mask manufacturing apparatus according to claim 1 or 2, characterized in that:
wherein the mask sheet holding portion has: and a magnetic adsorption unit which adsorbs the mask sheet and makes the mask sheet closely attached to the mask frame at least near the joint starting position of the joint device when the mask sheet is jointed to the mask frame.
5. Mask manufacturing apparatus according to claim 1 or 2, characterized in that:
wherein the mask frame has a plurality of mask opening portions provided corresponding to a bonding arrangement of the plurality of mask sheets,
the alignment stage has: a rough movement stage for moving the mask sheet holding part from the position where one of the mask openings is arranged to the position where the other mask opening is arranged; and the fine movement platform is used for correcting the offset of the mask relative to the plurality of alignment marks according to the offset.
6. Mask manufacturing apparatus according to claim 1 or 2, characterized in that:
wherein a support plate for flatly supporting the mask sheet when the mask sheet holding portion sucks the mask sheet is disposed in a space surrounded by the plurality of magnetic attraction plates of the mask sheet holding portion.
7. The mask manufacturing apparatus according to claim 6, wherein:
and the lower side of the supporting plate opposite to the mask sheet is provided with a second magnet capable of ascending and descending.
8. Mask manufacturing apparatus according to claim 1 or 2, characterized in that:
wherein, the welding device is a welding robot with a mechanical arm provided with a laser emitting head, and the welding robot can move along a guide rail.
9. The mask manufacturing apparatus according to claim 8, wherein:
wherein the welding robot is configured with a plurality of welding robots.
10. A mask manufacturing method of joining a plurality of mask sheets, which have mask pattern forming regions including mask pattern opening portions and are formed of a magnetic metal, after overlapping with a mask frame having mask opening portions having the same width as the mask pattern forming regions at positions corresponding to the mask pattern forming regions and the same or less in number as the mask sheets, comprising:
a conveying and holding step of conveying and holding the mask frame to a predetermined position of a mask frame stage;
a mask sheet adsorption step of conveying the mask sheet to a predetermined position above the mask frame and magnetically adsorbing the mask sheet by a mask sheet holding portion;
an offset detecting step of detecting an offset of the alignment hole on the mask sheet with respect to the alignment mark on the glass mother substrate in a state where the mask sheet is adsorbed;
an alignment step of correcting the offset amount of the mask sheet with respect to the plurality of alignment marks based on the offset amount; and
and a bonding step of bonding the mask sheet to the mask frame in a state where the mask sheet is sucked by the mask sheet holding portion after the alignment step.
11. A mask manufacturing method of joining one or more mask sheets, which have mask pattern forming regions including mask pattern opening portions and are formed of a magnetic metal, after overlapping with a mask frame having mask opening portions having the same width as the mask pattern forming regions at positions corresponding to the mask pattern forming regions and the same or less in number as the mask sheets, characterized by comprising:
a conveying and holding step of conveying and holding the mask frame to a predetermined position of a mask frame stage;
a mask sheet adsorption step of conveying the mask sheet to a predetermined position above the mask frame and magnetically adsorbing the mask sheet by a mask sheet holding portion;
an offset detecting step of detecting an offset of the alignment hole on the mask sheet with respect to the alignment mark on the glass mother substrate in a state where the mask sheet is adsorbed;
an alignment step of correcting the offset amount of the mask sheet with respect to the plurality of alignment marks based on the offset amount; and
and a bonding step of bonding the mask sheet to the mask frame in a state where the mask sheet is sucked by the mask sheet holding portion after the alignment step.
12. A mask manufacturing method according to claim 10 or 11, wherein:
wherein the alignment process is performed with a gap in a thickness direction between the mask sheet and the mask frame,
the bonding step is performed after a part of an outer edge of the mask pattern forming region on the mask sheet is brought into close contact with a part of an outer edge of the opening of the mask frame.
13. A mask manufacturing method according to claim 10 or 11, wherein:
wherein the mask frame has a plurality of mask openings at positions corresponding to the mask pattern forming regions of the plurality of mask sheets, and after one mask sheet is bonded to one of the mask openings of the mask frame, the mask sheet holding portion is lowered to be in a non-adsorption state, the mask sheet holding portion is moved to the other mask openings, and after the other mask sheets are adsorbed by the mask sheet holding portion, the offset amount detecting step, the aligning step, and the bonding step are repeated in accordance with the number of mask sheets.
14. A mask manufacturing method according to claim 13, wherein:
wherein the mask sheet holding portion is moved from one of the mask opening portions to the other mask opening portion by the coarse movement stage, and the alignment process is performed by the fine movement stage.
15. A mask manufacturing method according to claim 10 or 11, wherein:
wherein in the bonding step, the bonding is performed by laser welding using a plurality of welding robots,
and simultaneously starting to join at least two positions on the opposite side position or the diagonal position more outside than the arrangement position of the alignment holes.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017-153835 | 2017-08-09 | ||
| JP2017153835A JP6919145B2 (en) | 2017-08-09 | 2017-08-09 | Mask manufacturing equipment and mask manufacturing method |
| CN201810877613.1A CN109385601B (en) | 2017-08-09 | 2018-08-03 | Mask manufacturing apparatus and mask manufacturing method |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810877613.1A Division CN109385601B (en) | 2017-08-09 | 2018-08-03 | Mask manufacturing apparatus and mask manufacturing method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112030103A true CN112030103A (en) | 2020-12-04 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201810877613.1A Active CN109385601B (en) | 2017-08-09 | 2018-08-03 | Mask manufacturing apparatus and mask manufacturing method |
| CN202010959690.9A Pending CN112030103A (en) | 2017-08-09 | 2018-08-03 | Mask device and mask manufacturing method |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
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| CN201810877613.1A Active CN109385601B (en) | 2017-08-09 | 2018-08-03 | Mask manufacturing apparatus and mask manufacturing method |
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| JP (1) | JP6919145B2 (en) |
| CN (2) | CN109385601B (en) |
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| CN113957384A (en) * | 2021-10-21 | 2022-01-21 | 江苏集萃有机光电技术研究所有限公司 | Mask plate group, evaporation device and method for monitoring thickness of functional layer of light-emitting device |
| CN116121711A (en) * | 2023-03-30 | 2023-05-16 | 京东方科技集团股份有限公司 | Auxiliary evaporation device and evaporation crucible |
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Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0293538A (en) * | 1988-09-30 | 1990-04-04 | Canon Inc | Mask cassette |
| CN1378408A (en) * | 2001-01-31 | 2002-11-06 | 东丽株式会社 | Combined mask, method and equipment for producing organic electroluminescent device using said mask |
| JP2006111941A (en) * | 2004-10-15 | 2006-04-27 | Dainippon Printing Co Ltd | Metal mask position alignment method and device |
| JP2006152411A (en) * | 2004-12-01 | 2006-06-15 | Dainippon Printing Co Ltd | Setting metal mask set method and apparatus |
| JP2009301789A (en) * | 2008-06-11 | 2009-12-24 | Hitachi Displays Ltd | Method of manufacturing organic electroluminescent display device |
| CN101910448A (en) * | 2008-01-16 | 2010-12-08 | 特机株式会社 | Film-forming apparatus |
| CN102132216A (en) * | 2009-11-09 | 2011-07-20 | 日本精工株式会社 | Mask holding mechanism |
| CN206279261U (en) * | 2016-12-28 | 2017-06-27 | 京东方科技集团股份有限公司 | A kind of mask integrated framework and evaporation coating device |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100947442B1 (en) * | 2007-11-20 | 2010-03-12 | 삼성모바일디스플레이주식회사 | Apparatus for fabricating mask of vertical deposition and Fabrication Method for making a mask of vertical deposition |
| KR102270080B1 (en) * | 2013-10-30 | 2021-06-29 | 삼성디스플레이 주식회사 | Thin film depositing apparatus |
| CN203807547U (en) * | 2014-04-30 | 2014-09-03 | 京东方科技集团股份有限公司 | Evaporation device |
| CN205856592U (en) * | 2016-08-08 | 2017-01-04 | 合肥鑫晟光电科技有限公司 | Mask plate and evaporation coating device |
| CN106399936B (en) * | 2016-12-09 | 2018-12-21 | 京东方科技集团股份有限公司 | A kind of evaporated device and evaporation coating method |
-
2017
- 2017-08-09 JP JP2017153835A patent/JP6919145B2/en active Active
-
2018
- 2018-08-03 CN CN201810877613.1A patent/CN109385601B/en active Active
- 2018-08-03 CN CN202010959690.9A patent/CN112030103A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0293538A (en) * | 1988-09-30 | 1990-04-04 | Canon Inc | Mask cassette |
| CN1378408A (en) * | 2001-01-31 | 2002-11-06 | 东丽株式会社 | Combined mask, method and equipment for producing organic electroluminescent device using said mask |
| JP2006111941A (en) * | 2004-10-15 | 2006-04-27 | Dainippon Printing Co Ltd | Metal mask position alignment method and device |
| JP2006152411A (en) * | 2004-12-01 | 2006-06-15 | Dainippon Printing Co Ltd | Setting metal mask set method and apparatus |
| CN101910448A (en) * | 2008-01-16 | 2010-12-08 | 特机株式会社 | Film-forming apparatus |
| JP2009301789A (en) * | 2008-06-11 | 2009-12-24 | Hitachi Displays Ltd | Method of manufacturing organic electroluminescent display device |
| CN102132216A (en) * | 2009-11-09 | 2011-07-20 | 日本精工株式会社 | Mask holding mechanism |
| CN206279261U (en) * | 2016-12-28 | 2017-06-27 | 京东方科技集团股份有限公司 | A kind of mask integrated framework and evaporation coating device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113957384A (en) * | 2021-10-21 | 2022-01-21 | 江苏集萃有机光电技术研究所有限公司 | Mask plate group, evaporation device and method for monitoring thickness of functional layer of light-emitting device |
| CN113957384B (en) * | 2021-10-21 | 2023-06-02 | 江苏集萃有机光电技术研究所有限公司 | Mask set, evaporation device and monitoring method for thickness of functional layer of light-emitting device |
| CN116121711A (en) * | 2023-03-30 | 2023-05-16 | 京东方科技集团股份有限公司 | Auxiliary evaporation device and evaporation crucible |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2019031720A (en) | 2019-02-28 |
| JP6919145B2 (en) | 2021-08-18 |
| CN109385601B (en) | 2021-07-09 |
| CN109385601A (en) | 2019-02-26 |
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