CN112028750B - 一种全氟烷基醚及其制备和应用 - Google Patents
一种全氟烷基醚及其制备和应用 Download PDFInfo
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- -1 Perfluoroalkyl ether Chemical compound 0.000 title claims abstract description 53
- RTZKZFJDLAIYFH-UHFFFAOYSA-N ether Substances CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 title claims abstract description 20
- 238000002360 preparation method Methods 0.000 title claims abstract description 14
- 238000006243 chemical reaction Methods 0.000 claims abstract description 56
- 150000001335 aliphatic alkanes Chemical class 0.000 claims abstract description 17
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 239000003054 catalyst Substances 0.000 claims abstract description 14
- 229910052751 metal Inorganic materials 0.000 claims abstract description 13
- 239000002184 metal Substances 0.000 claims abstract description 13
- 239000002994 raw material Substances 0.000 claims abstract description 8
- 229910001512 metal fluoride Chemical class 0.000 claims abstract description 7
- 150000004673 fluoride salts Chemical class 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 230000009471 action Effects 0.000 claims abstract description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical group CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 claims description 24
- 239000011698 potassium fluoride Substances 0.000 claims description 13
- 229910052794 bromium Inorganic materials 0.000 claims description 9
- 150000001875 compounds Chemical class 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- 229910021595 Copper(I) iodide Inorganic materials 0.000 claims description 8
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 8
- NROKBHXJSPEDAR-UHFFFAOYSA-M potassium fluoride Chemical group [F-].[K+] NROKBHXJSPEDAR-UHFFFAOYSA-M 0.000 claims description 8
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 claims description 7
- 239000011630 iodine Chemical group 0.000 claims description 7
- 229910052740 iodine Chemical group 0.000 claims description 7
- 125000001246 bromo group Chemical group Br* 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 239000007810 chemical reaction solvent Substances 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- LSXDOTMGLUJQCM-UHFFFAOYSA-M copper(i) iodide Chemical group I[Cu] LSXDOTMGLUJQCM-UHFFFAOYSA-M 0.000 claims description 4
- 235000003270 potassium fluoride Nutrition 0.000 claims description 4
- 125000001424 substituent group Chemical group 0.000 claims description 4
- 150000001350 alkyl halides Chemical class 0.000 claims description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 3
- 229910001507 metal halide Inorganic materials 0.000 claims description 3
- 150000005309 metal halides Chemical class 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 claims description 2
- 101150065749 Churc1 gene Proteins 0.000 claims description 2
- 102100038239 Protein Churchill Human genes 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 2
- 125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 claims description 2
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 claims description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 claims description 2
- 239000011261 inert gas Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 14
- 229920001774 Perfluoroether Polymers 0.000 abstract description 9
- 239000003153 chemical reaction reagent Substances 0.000 abstract description 6
- 230000015572 biosynthetic process Effects 0.000 abstract description 5
- 239000010702 perfluoropolyether Substances 0.000 abstract description 5
- 239000006116 anti-fingerprint coating Substances 0.000 abstract description 4
- 238000003786 synthesis reaction Methods 0.000 abstract description 4
- 230000008569 process Effects 0.000 abstract description 3
- 229910000077 silane Inorganic materials 0.000 abstract description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 28
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 27
- 238000000605 extraction Methods 0.000 description 17
- 238000001035 drying Methods 0.000 description 16
- 229910052786 argon Inorganic materials 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229910052731 fluorine Inorganic materials 0.000 description 10
- 238000000926 separation method Methods 0.000 description 9
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 8
- 238000001914 filtration Methods 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 239000012074 organic phase Substances 0.000 description 8
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011737 fluorine Substances 0.000 description 7
- HZQLUIZFUXNFHK-UHFFFAOYSA-N 1-(bromomethyl)-4-phenylbenzene Chemical compound C1=CC(CBr)=CC=C1C1=CC=CC=C1 HZQLUIZFUXNFHK-UHFFFAOYSA-N 0.000 description 6
- XATLHBQMSOZWBO-UHFFFAOYSA-N 2,2,3,3,4,4,5,5,6,6,6-undecafluorohexanoyl fluoride Chemical compound FC(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F XATLHBQMSOZWBO-UHFFFAOYSA-N 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 6
- HPALAKNZSZLMCH-UHFFFAOYSA-M sodium;chloride;hydrate Chemical class O.[Na+].[Cl-] HPALAKNZSZLMCH-UHFFFAOYSA-M 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 239000011248 coating agent Substances 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- 230000003666 anti-fingerprint Effects 0.000 description 4
- 238000004440 column chromatography Methods 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- DCAYPVUWAIABOU-UHFFFAOYSA-N hexadecane Chemical compound CCCCCCCCCCCCCCCC DCAYPVUWAIABOU-UHFFFAOYSA-N 0.000 description 4
- NLKNQRATVPKPDG-UHFFFAOYSA-M potassium iodide Chemical compound [K+].[I-] NLKNQRATVPKPDG-UHFFFAOYSA-M 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- XJHCXCQVJFPJIK-UHFFFAOYSA-M caesium fluoride Chemical compound [F-].[Cs+] XJHCXCQVJFPJIK-UHFFFAOYSA-M 0.000 description 3
- 125000001153 fluoro group Chemical group F* 0.000 description 3
- 125000004428 fluoroalkoxy group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 230000009257 reactivity Effects 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- BTHIGJGJAPYFSJ-UHFFFAOYSA-N 1-(bromomethyl)-3,5-dimethoxybenzene Chemical compound COC1=CC(CBr)=CC(OC)=C1 BTHIGJGJAPYFSJ-UHFFFAOYSA-N 0.000 description 2
- DCEPGADSNJKOJK-UHFFFAOYSA-N 2,2,2-trifluoroacetyl fluoride Chemical compound FC(=O)C(F)(F)F DCEPGADSNJKOJK-UHFFFAOYSA-N 0.000 description 2
- GLISZRPOUBOZDL-UHFFFAOYSA-N 3-bromopropyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)CCCBr GLISZRPOUBOZDL-UHFFFAOYSA-N 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical class [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000003373 anti-fouling effect Effects 0.000 description 2
- OKIIEJOIXGHUKX-UHFFFAOYSA-L cadmium iodide Chemical compound [Cd+2].[I-].[I-] OKIIEJOIXGHUKX-UHFFFAOYSA-L 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- HVTICUPFWKNHNG-UHFFFAOYSA-N iodoethane Chemical compound CCI HVTICUPFWKNHNG-UHFFFAOYSA-N 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 230000004060 metabolic process Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- KWVVTSALYXIJSS-UHFFFAOYSA-L silver(ii) fluoride Chemical compound [F-].[F-].[Ag+2] KWVVTSALYXIJSS-UHFFFAOYSA-L 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- 235000009518 sodium iodide Nutrition 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 2
- UAYWVJHJZHQCIE-UHFFFAOYSA-L zinc iodide Chemical compound I[Zn]I UAYWVJHJZHQCIE-UHFFFAOYSA-L 0.000 description 2
- CYNYIHKIEHGYOZ-UHFFFAOYSA-N 1-bromopropane Chemical compound CCCBr CYNYIHKIEHGYOZ-UHFFFAOYSA-N 0.000 description 1
- 101710134784 Agnoprotein Proteins 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910021589 Copper(I) bromide Inorganic materials 0.000 description 1
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 1
- 241000283070 Equus zebra Species 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 101150003085 Pdcl gene Proteins 0.000 description 1
- 239000003905 agrochemical Substances 0.000 description 1
- 125000004183 alkoxy alkyl group Chemical group 0.000 description 1
- BHELZAPQIKSEDF-UHFFFAOYSA-N allyl bromide Chemical compound BrCC=C BHELZAPQIKSEDF-UHFFFAOYSA-N 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 1
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 1
- AQNQQHJNRPDOQV-UHFFFAOYSA-N bromocyclohexane Chemical compound BrC1CCCCC1 AQNQQHJNRPDOQV-UHFFFAOYSA-N 0.000 description 1
- 229940075417 cadmium iodide Drugs 0.000 description 1
- RBHJBMIOOPYDBQ-UHFFFAOYSA-N carbon dioxide;propan-2-one Chemical compound O=C=O.CC(C)=O RBHJBMIOOPYDBQ-UHFFFAOYSA-N 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 239000003014 ion exchange membrane Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000002503 metabolic effect Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- VGGNVBNNVSIGKG-UHFFFAOYSA-N n,n,2-trimethylaziridine-1-carboxamide Chemical compound CC1CN1C(=O)N(C)C VGGNVBNNVSIGKG-UHFFFAOYSA-N 0.000 description 1
- 238000010534 nucleophilic substitution reaction Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000011056 performance test Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- VBKNTGMWIPUCRF-UHFFFAOYSA-M potassium;fluoride;hydrofluoride Chemical compound F.[F-].[K+] VBKNTGMWIPUCRF-UHFFFAOYSA-M 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 229940096017 silver fluoride Drugs 0.000 description 1
- REYHXKZHIMGNSE-UHFFFAOYSA-M silver monofluoride Chemical compound [F-].[Ag+] REYHXKZHIMGNSE-UHFFFAOYSA-M 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 238000010189 synthetic method Methods 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
- C07C43/14—Unsaturated ethers
- C07C43/17—Unsaturated ethers containing halogen
- C07C43/174—Unsaturated ethers containing halogen containing six-membered aromatic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C303/00—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides
- C07C303/02—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof
- C07C303/22—Preparation of esters or amides of sulfuric acids; Preparation of sulfonic acids or of their esters, halides, anhydrides or amides of sulfonic acids or halides thereof from sulfonic acids, by reactions not involving the formation of sulfo or halosulfonyl groups; from sulfonic halides by reactions not involving the formation of halosulfonyl groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/78—Halides of sulfonic acids
- C07C309/79—Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms
- C07C309/82—Halides of sulfonic acids having halosulfonyl groups bound to acyclic carbon atoms of a carbon skeleton substituted by singly-bound oxygen atoms
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C41/00—Preparation of ethers; Preparation of compounds having groups, groups or groups
- C07C41/01—Preparation of ethers
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- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/03—Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
- C07C43/14—Unsaturated ethers
- C07C43/17—Unsaturated ethers containing halogen
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C43/00—Ethers; Compounds having groups, groups or groups
- C07C43/02—Ethers
- C07C43/18—Ethers having an ether-oxygen atom bound to a carbon atom of a ring other than a six-membered aromatic ring
- C07C43/192—Ethers having an ether-oxygen atom bound to a carbon atom of a ring other than a six-membered aromatic ring containing halogen
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/58—Preparation of carboxylic acid halides
- C07C51/60—Preparation of carboxylic acid halides by conversion of carboxylic acids or their anhydrides or esters, lactones, salts into halides with the same carboxylic acid part
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
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- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
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- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/16—Antifouling paints; Underwater paints
- C09D5/1656—Antifouling paints; Underwater paints characterised by the film-forming substance
- C09D5/1662—Synthetic film-forming substance
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- C07C2601/00—Systems containing only non-condensed rings
- C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
- C07C2601/14—The ring being saturated
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Abstract
本发明涉及一种全氟烷基醚及其制备和应用,该制备方法具体为:以全氟烷基酰氟和氟化金属盐为原料,在卤化金属催化剂下,和卤代烷烃类底物反应,即得到目标产物全氟烷基醚类化合物。与现有技术相比,本发明合成工艺简单绿色,具有优良的选择性和较高产率,同时,所涉及的全氟烷氧基化试剂和原料廉价易得,反应条件温和,操作简单,成本低,容易推广,适合大批量生产,此外,利用本发明的方法,可以方便高效制备多种新的可应用于抗指纹涂料的全氟聚醚的烷氧基硅烷。
Description
技术领域
本发明属于全氟烷基醚制备技术领域,涉及一种全氟烷基醚及其制备和应用。
背景技术
氟原子位于元素周期表右上角的位置,具有最强的电负性,能够使分子的电子云分布发生偏移,从而影响分子的偶极矩和酸碱性。氟原子的引入能够增强分子的脂溶性,从而使得含氟化合物在生物体内的膜穿透力增强。C-F键具有与C-H键相似的键长,使得用氟原子代替分子中的氢原子后整个分子的体积变化不大。C-F键具有很高的键能,含氟化合物进入生物体后,代谢过程中很难以断裂C-H键的方式断裂C-F键,使得含氟化合物既能参与代谢过程又有明显的抗代谢性。含氟化合物的众多优点使得其在医药、农业化学品、功能材料等领域有着广泛的应用。
全氟烷基醚是一类非常重要的含氟化学物,在特种橡胶、导电离子交换膜、抗指纹剂、含氟涂料等领域有着广泛的用途。有机底物分子的全氟烷氧基化是最直接和重要的合成方法之一。例如,文献Inorg.Chem.2002,41,6118.中报道,以(Alk2N)3C+Me3SiF2 -盐和全氟烷基磺酰氟反应生成相应的全氟烷基氧负离子盐,再和相应的卤代烷烃反应,完成全氟烷氧基化得到目标全氟烷基醚。但是该方法所用的氟负离子源合成难度大,难以大规模应用。文献Angew.Chem.Int.Ed.2015,54,2945.中报道,以RfCF2OCH3为底物和叔胺反应,可以得到相应的全氟烷氧基负离子铵盐,它可以和相应的卤代烷烃反应,完成全氟烷氧基化得到目标全氟烷基醚。但是RfCF2OCH3的合成困难,也难以大规模应用。在中国专利CN 108516935 A中公布了一种全氟烷氧基化试剂RC(O)ORf的制备和应用,可以较好地对有机底物进行氟烷氧基化,但是试剂本身的合成较困难,不直接和不经济。因此,开发一种试剂和原料廉价易得,易于操作,反应体系简单的全氟烷氧基化方法来大规模制备全氟烷基醚类化合物有着重要实际意义和价值。
发明内容
本发明的目的就是为了提供一种全氟烷基醚的制备方法,其原料廉价易得,反应条件温和,操作简单,成本低,容易推广,适合大批量生产。
本发明的目的可以通过以下技术方案来实现:
一种全氟烷基醚的制备方法,以全氟烷基酰氟和氟化金属盐为原料,在卤化金属催化剂下,和卤代烷烃类底物反应,即得到目标产物全氟烷基醚类化合物。
其反应通式参考如下:
进一步的,该制备方法的具体过程为:
往反应容器中加入卤代烷烃类底物、氟化金属盐和卤化金属催化剂,然后在惰性气体保护下加入反应溶剂和全氟烷基酰氟,油浴加热反应,分离提纯后,即得到目标产物全氟烷基醚类化合物。
进一步的,所述的全氟烷基酰氟为具有以下任一结构通式的化合物中的其中一种或几种的混合:
(1)X(CF2)nC(O)F,其中,n=1-10,X=F,H,Cl或Br;
(2)FSO2CF2C(O)F;
(3)CF3CF2(CF2-O-CF(CF3))mC(O)F,其中,m=4-8。
进一步的,所述的氟化金属盐为氟化钾、氟化钠、氟化铯、氟氢化钾、氟化银或二氟化银中的任一种或几种的混合。优选为氟化钾。
进一步的,所述的卤代烷烃底物为具有以下任一结构通式的化合物中的其中一种或几种的混合:
1)ArCH2X,其中,Ar为带有不同取代基的苯基,X为溴或者碘;
2)CH2=CHCH2X,其中,X为溴或者碘;
3)RX,其中R为C1-C10的直链烷基、三甲氧基硅丙基、三甲氧基硅丁基、环戊基、环己基、环庚基或环辛基,X为溴或者碘。
更优选的,Ar上的取代基是指苯环上具有以下取代基中的一个或多个:甲基、甲氧基、氰基、苯基、氯、溴、碘、三氟甲基、三甲氧基硅基、硝基、二氟甲氧基、叔丁基、苯甲酰基。
进一步的,所述的卤化金属催化剂为碘化亚铜、碘化钠、碘化钾、碘化镉或碘化锌的任一种或几种的混合。优选的,为碘化亚铜。
进一步的,所述的全氟烷基酰氟为1-5当量,所述的氟化金属盐为卤代烷烃底物的1-8当量,所述的卤化金属催化剂为卤代烷烃底物的5-40mol%。
更进一步的,所述的全氟烷基酰氟为3当量,所述的氟化金属盐为卤代烷烃底物的5当量,所述的卤化金属催化剂为卤代烷烃底物的20mol%。
进一步的,所述的反应溶剂为N,N-二甲基甲酰胺,N,N-二甲基丙烯基脲或二乙二醇二甲醚等。
进一步的,加热反应的温度为20-80℃,加热时间为6-24h。优选的,温度为40℃,时间为12h。
全氟烷基酰氟和氟化钾反应形成氟烷氧基钾盐,在卤代金属催化剂的作用下,和卤代烷烃发生亲核取代反应,完成全氟烷氧基化,生成目标全氟烷基醚类化合物。通常全氟烷氧基负离子的稳定性不好,在低温下(比如,-20℃以下)才具有较好的稳定性,而在低温下往往又会影响它的反应活性。本发明中,使用卤代金属盐(比如,碘化亚铜)作为催化剂,能够较好地稳定氟烷氧基负离子,可以让反应在较高温度下进行(20-80℃),大大提高了反应的活性和效率。然而,反应采用太高的温度(>80℃),会造成氟烷氧基负离子的严重分解,从而降低反应的产率;反应温度太低(<20℃),虽然氟烷氧基的稳定性可以提高,又会大大降低它的反应活性,从而影响最终反应的效率。同时,碘离子又可以将原料(比如,溴代烷烃)中的溴替代为反应活性更好的碘,也有助于提高反应的效率。
本发明的制备全氟烷氧基醚类化合物的方法,可以用于方便高效制备多种新型可应用于抗指纹涂料的全氟聚醚烷氧基硅烷等。当所述的卤代烷烃底物为BrCH2CH2CH2Si(OMe)3或者BrCH2CH2CH2CH2Si(OMe)3,全氟烷基酰氟为CF3CF2(CF2-O-CF(CF3))nC(O)F,其中,n=4-8,制备得到的相应的全氟聚醚烷氧基烷基硅烷CF3CF2(CF2-O-CF(CF3))nCF2OCH2CH2CH2Si(OMe)3或CF3CF2(CF2-O-CF(CF3))nCF2OCH2CH2CH2CH2Si(OMe)3(n=4-8)可以作为一类新型的抗指纹涂料使用。
本方法制备的抗指纹剂具有良好的疏水疏油性、防污性能和指纹易去除性。典型的性能测试方法和数据如下。
抗指纹剂涂层的制备:取少量本方法制备的全氟聚醚烷氧基烷基硅烷CF3CF2(CF2-O-CF(CF3))6CF2OCH2CH2CH2Si(OMe)3用旭硝子公司产的AE-3000氢氟醚为稀释剂稀释到0.5%,制备抗指纹剂。将预先用浓硫酸处理的载玻片,通过浸涂的方法将抗指纹剂涂覆到载玻片表面,自然挥发除掉溶剂,将其在0.1N(当量浓度)的HCl溶液中浸泡1h,在120℃烘箱中烘干。
性能测试:(1)接触角测试,滴2μL测试液(水和正十六烷)在水平涂层样品表面测试接触角,静态水接触角为114°,正十六烷接触角为71°。表明具有良好的疏水疏油性。(2)防污油性笔测试,用Hi-Mckee(ZEBRA)油性笔画一条线在涂层样品上,然后仔细观察油墨痕迹变化,发现油污很快褪去。表明具有好的防污性能。(3)指纹易去除性测试,涂层样品上沾有手指指纹,然后用干的K-DAY的132-S的纸巾(Nippon Paper Crecia)擦去指纹,发现擦除2次内即可清除指纹,表明具有很好的指纹易去除性。
与现有技术相比,本发明所涉及的全氟烷氧基化试剂和原料廉价易得,反应条件温和,操作简单,成本低,容易推广,适合大批量生产。此外,利用本发明的方法,可以方便高效制备多种新的可应用于抗指纹涂料的全氟聚醚的烷氧基硅烷。
具体实施方式
下面结合具体实施例对本发明进行详细说明。本实施例以本发明技术方案为前提进行实施,给出了详细的实施方式和具体的操作过程,但本发明的保护范围不限于下述的实施例。
以下各实施例中,如无特别说明的原料或处理技术,则表明其均为本领域的常规市售原料或常规处理技术。
实施例1:
4-苯基苄溴的全氟己氧基化
取合适大小的圆底烧瓶放入磁子,称取KF(11.6g,200mmol)、CuI(1.52g,8mmol)和4-溴甲基联苯(9.89g,40mmol)放入圆底烧瓶,抽换氩气三次,氩气保护下,加入DMF(100mL),接着滴入全氟己酰氟(37.92g,120mmol),加热到40℃搅拌反应12小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水水洗1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过柱层析分离得到目标产物(15.67g,78%分离产率)。
HRMS(EI):calcd.for C19H11F13O(M+)502.0602,found 502.0603.Anal.Calcd.forC19H11F13O:C,45.44;H,2.21;F,49.17,found C,45.12;H,2.53;F,49.49.
实施例2:
3,5-二甲氧基苄溴的氟磺酰全氟乙氧基化
取合适大小的圆底烧瓶放入磁子,称取KF(11.6g,200mmol)、CuI(1.52g,8mmol)和3,5-二甲氧基苄溴(9.24g,40mmol)放入圆底烧瓶,抽换氩气三次,氩气保护下,加入DMF(100mL),接着滴入FSO2CF2C(O)F(37.92g,120mmol),加热到40℃搅拌反应12小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水水洗1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过柱层析分离得到目标产物(13.61g,70%分离产率)。
HRMS(EI):calcd.for C11H11F5O5S(M+)350.0247,found350.0253.Anal.Calcd.for C11H11F5O5S:C,37.72;H,3.17;F,27.12,found C,37.38;H,3.51;F,27.50.
实施例3:
乙基碘代物的全氟己氧基化
取合适大小的圆底烧瓶放入磁子,称取KF(11.6g,200mmol)和CuI(1.52g,8mmol)放入圆底烧瓶,抽换氩气三次,氩气保护下,加入DMF(100mL),接着滴入碘乙烷(6.24g,40mmol)和全氟己酰氟(37.92g,120mmol),加热到40℃搅拌反应12小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水水洗1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过蒸馏分离得到目标产物(4.37g,30%分离产率)。
HRMS(EI):calcd.for C8H5F13O(M+)364.0133,found 364.0138.Anal.Calcd.forC8H5F13O:C,26.39;H,1.38;F,67.83,found C,26.74;H,1.51;F,67.48.
实施例4:
丙基溴代物的全氟己氧基化
取合适大小的圆底烧瓶放入磁子,称取KF(11.6g,200mmol)和CuI(1.52g,8mmol)放入圆底烧瓶,抽换氩气三次,氩气保护下,加入DMF(100mL),接着滴入3-溴丙烯(4.84g,40mmol)和全氟己酰氟(37.92g,120mmol),加热到40℃搅拌反应12小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水水洗1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过减压蒸馏分离得到目标产物(11.29g,75%分离产率)。
HRMS(EI):calcd.for C9H5F13O(M+)376.0133,found 376.0136.Anal.Calcd.forC9H5F13O:C,28.74;H,1.34;F,65.67,found C,28.42;H,1.67;F,65.28.
实施例5:
从三氟乙酸出发制备三氟乙酰氟,再和环己基溴代烷发生五氟乙氧基化
取两个250mL的带抽气嘴的圆底烧瓶放入磁子,分别称取KF(7.66g,132mmol)放入圆底烧瓶(TubeⅠ),称取KF(11.6g,200mmol)和CuI(1.52g,8mmol)放入圆底烧瓶(TubeⅡ),氩气保护下,TubeⅠ中加入DMF(100mL),接着滴入三氟乙酸(13.68g,120mmol)和氯化亚砜(14.28g,120mmol),室温搅拌反应2小时。TubeⅡ中加入DMF(100mL),接着加入溴代环己烷(6.52g,40mmol),用干冰丙酮冷却到-78℃,用橡胶管连通TubeⅠ和TubeⅡ,TubeⅠ加热到40℃,反应生成的三氟乙酰氟会导入TubeⅡ,1h后封闭TubeⅡ并逐渐恢复到室温搅拌反应12小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水水洗1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过蒸馏分离得到目标产物(5.88g,68%分离产率)。
HRMS(EI):calcd.for C8H11F5O(M+)218.0730,found 218.0735.Anal.Calcd.forC8H11F5O:C,44.04;H,5.08;F,43.54,found C,44.41;H,5.42;F,43.91.
实施例6:
3-溴丙基三甲氧基硅烷的的全氟烷氧基化,相应产物可以用于抗指纹剂涂料
取合适大小的圆底烧瓶放入磁子,称取KF(11.6g,200mmol)和CuI(1.52g,8mmol,)放入圆底烧瓶,换氩气三次,氩气保护下,加入DMF(100mL),接着滴入3-溴丙基三甲氧基硅烷(9.73g,40mmol)和全氟烷基醚链酰氟(139.4g,120mmol),加热到40℃搅拌反应12小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水水洗1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过减压蒸馏分离得到目标产物(25.82g,48%分离产率)。
HRMS(EI):calcd.for C27H15F43O10Si(M+)1343.9748,found1343.9753.Anal.Calcd.for C27H15F43O10Si:C,24.12;H,1.12;F,60.76,found C,24.45;H,1.43;F,61.09.
实施例7:
4-苯基苄溴的全氟己氧基化,与实施例1相比,绝大部分都相同,除了本实施例中的反应温度变为60℃,搅拌试剂变为24h。
取合适大小的圆底烧瓶放入磁子,称取KF(11.6g,200mmol)、CuI(1.52g,8mmol)和4-溴甲基联苯(9.89g,40mmol)放入圆底烧瓶,抽换氩气三次,氩气保护下,加入DMF(100mL),接着滴入全氟己酰氟(37.92g,120mmol),加热到60℃搅拌反应24小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水萃取1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过柱层析分离得到目标产物(10.85g,54%分离产率)。
实施例8:
4-苯基苄溴的全氟己氧基化,与实施例1相比,绝大部分都相同,除了本实施例中用CsF代替KF。
取合适大小的圆底烧瓶放入磁子,称取CsF(30.4g,200mmol)、CuI(1.52g,8mmol)和4-溴甲基联苯(9.89g,40mmol)放入圆底烧瓶,抽换氩气三次,氩气保护下,加入DMF(100mL),接着滴入全氟己酰氟(37.92g,120mmol),加热到60℃搅拌反应24小时。反应结束后,向反应体系中加入水,然后加入乙酸乙酯萃取,按此操作萃取3次,用饱和食盐水萃取1次,合并有机相,无水硫酸钠干燥,过滤,旋干,最后通过柱层析分离得到目标产物(9.24g,46%分离产率)。
对比例1:
催化剂的影响考察。与实施例1相比,绝大部分都相同,除了本实施例中的卤代烷烃变为卞溴,反应的规模减小200倍,卤化金属催化剂被替换为NaI或KI或CdI2或CuCl2或CuBr2或NaBr或KBr或ZnBr2或ZnCl2或FeCl3或CoBr2或NiCl2或AgNO3或AgBF4或PdCl2,反应的产率以19F NMR来标定。具体结果见下表1。
表1
对比例2:
与实施例1相比,绝大部分都相同,除了本实施例中的全氟己酰氟的摩尔量改为240mmol。由于副反应增多,反应产率会有所降低到69%。
对比例3:
与实施例1相比,绝大部分都相同,除了本实施例中的加热温度为100℃。由于反应关键中间体氟烷氧基负离子发生严重分解,反应产率大大降低到12%。
对比例4:
与实施例1相比,绝大部分都相同,除了本实施例中的加热温度为-40℃。由于反应关键中间体氟烷氧基负离子的反应活性变低,反应产率降低到18%。
对比例5:
与实施例1相比,绝大部分都相同,除了本实施例中的搅拌时间变为2h。由于反应不完全,反应产率降低到25%。
对比例6:
与实施例1相比,绝大部分都相同,除了本实施例中的搅拌时间变为36h。由于反应早已完全,反应产率没有明显变化。
对比例7:
与实施例1相比,绝大部分都相同,除了本实施例中的反应溶剂替换为乙酸乙酯,或者二氯甲烷,或者乙腈。在这些溶剂中,均没有观察到目标产物的生成。
上述的对实施例的描述是为便于该技术领域的普通技术人员能理解和使用发明。熟悉本领域技术的人员显然可以容易地对这些实施例做出各种修改,并把在此说明的一般原理应用到其他实施例中而不必经过创造性的劳动。因此,本发明不限于上述实施例,本领域技术人员根据本发明的揭示,不脱离本发明范畴所做出的改进和修改都应该在本发明的保护范围之内。
Claims (4)
1.一种全氟烷基醚的制备方法,其特征在于,以全氟烷基酰氟和氟化金属盐为原料,在卤化金属催化剂下,和卤代烷烃类底物反应,即得到目标产物全氟烷基醚类化合物;
所述的卤化金属催化剂为碘化亚铜;
所述的氟化金属盐为氟化钾;
所述的全氟烷基酰氟为具有以下任一结构通式的化合物中的其中一种或几种的混合:
(1)F (CF2)nC(O)F,其中,n=1-10;
(2)FSO2CF2C(O)F;
(3)CF3CF2(CF2-O-CF(CF3))mC(O)F,其中,m=4-8;
所述的卤代烷烃底物为具有以下任一结构通式的化合物中的其中一种或几种的混合:
1)ArCH2X,其中,Ar为带有不同取代基的苯基,X为溴或者碘;
2)CH2=CHCH2X,其中,X为溴或者碘;
3)RX,其中R为C1-C10的直链烷基、三甲氧基硅丙基、三甲氧基硅丁基、环戊基、环己基、环庚基或环辛基,X为溴或者碘。
2.根据权利要求1所述的一种全氟烷基醚的制备方法,其特征在于,该制备方法的具体过程为:
往反应容器中加入卤代烷烃类底物、氟化金属盐和卤化金属催化剂,然后在惰性气体保护下加入反应溶剂和全氟烷基酰氟,油浴加热反应,分离提纯后,即得到目标产物全氟烷基醚类化合物。
3.根据权利要求1或2所述的一种全氟烷基醚的制备方法,其特征在于,所述的全氟烷基酰氟为1-5当量,所述的氟化金属盐为卤代烷烃底物的1-8当量,所述的卤化金属催化剂为卤代烷烃底物的5-40mol%。
4.根据权利要求2所述的一种全氟烷基醚的制备方法,其特征在于,所述的反应溶剂为N,N-二甲基甲酰胺,N,N-二甲基丙烯基脲或二乙二醇二甲醚;
加热反应的温度为20-80℃,加热时间为6-24h。
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