CN111624731A - Objective lens device - Google Patents
Objective lens device Download PDFInfo
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- CN111624731A CN111624731A CN201910150666.8A CN201910150666A CN111624731A CN 111624731 A CN111624731 A CN 111624731A CN 201910150666 A CN201910150666 A CN 201910150666A CN 111624731 A CN111624731 A CN 111624731A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70316—Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
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- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention discloses an objective lens device. The objective lens device includes: a light propagation unit, a gas supply unit and a control unit; the light propagation unit comprises a first lens group, a wavefront compensator and a second lens group which are sequentially arranged along the light propagation direction; a first pressure sensing unit is arranged in the first lens group and/or the second lens group, a second pressure sensing unit is arranged in the wavefront compensator, and the first pressure sensing unit and the second pressure sensing unit are respectively connected with the control unit; the gas supply unit is used for outputting gas with preset pressure stability and preset purity to the wave front compensator; the control unit is used for adjusting the gas output quantity of the gas supply unit according to a first pressure value detected by the first pressure sensing unit and a second pressure value detected by the second pressure sensing unit, so that the difference value between the first pressure value and the second pressure value is within a preset pressure difference threshold range. This improves the stability of the gas in the open environment, and is advantageous for improving the stability of the optical performance of the objective lens device.
Description
Technical Field
The embodiment of the invention relates to the technical field of optical systems, in particular to an objective lens device.
Background
The photolithography process directly determines the feature size of LSI, and is a key process for manufacturing LSI. Existing lithographic apparatus are based on optical lithography, using a projection system (comprising an objective lens arrangement from which projection light emerges) to accurately project and expose a pattern on a patterning unit onto a substrate (e.g. a silicon wafer) coated with a photoresist.
In a conventional objective lens device, air is used as a medium between a lens of a projection objective lens and a photoresist, and in order to increase flexibility of a setting position of an optical element in the projection objective lens and improve an exposure index (for example, the exposure index may be a characteristic size), a wavefront compensator may be inserted into the projection objective lens, and an open environment is formed at the wavefront compensator, so that stability of environmental pressure is poor, which results in large performance fluctuation of the objective lens device.
Disclosure of Invention
The invention provides an objective lens device to improve pressure stability in an open environment, thereby stabilizing performance of the objective lens device.
An embodiment of the present invention provides an objective lens apparatus, including: a light propagation unit, a gas supply unit and a control unit;
the light transmission unit comprises a first lens group, a wavefront compensator and a second lens group which are sequentially arranged along the light transmission direction, and light is emitted from the second lens group;
a first pressure sensing unit is arranged in the first lens group and/or the second lens group, a second pressure sensing unit is arranged in the wavefront compensator, and the first pressure sensing unit and the second pressure sensing unit are respectively connected with the control unit;
the gas supply unit is used for outputting gas with preset pressure stability and preset purity and supplying the gas to the wavefront compensator;
the control unit is used for adjusting the gas output quantity of the gas supply unit according to a first pressure value detected by the first pressure sensing unit and a second pressure value detected by the second pressure sensing unit, so that the difference value between the first pressure value and the second pressure value is within a preset pressure difference threshold range.
Further, the gas supply unit comprises a first pressure regulating subunit, a second pressure regulating subunit and a gas recovery subunit which are connected in sequence;
the first pressure regulating subunit is used for filtering gas and outputting the gas with initial preset pressure to the second pressure regulating subunit;
the second pressure regulating subunit is used for stabilizing the pressure of the gas within the initial preset pressure range, stabilizing the pressure of the gas within the preset pressure stability range, and supplying the gas with the preset pressure stability and the preset purity to the wavefront compensator;
the gas recovery subunit is used for recovering the gas flowing through the wavefront compensator.
Further, the first pressure regulating subunit comprises a mass flow controller and a purifier;
the mass flow controller is used for controlling the flow of the gas output by the first pressure regulating subunit;
the purifier is used for filtering gas.
Further, the purifier is arranged between the mass flow controller and the second pressure regulating subunit.
Further, the first pressure regulating subunit further comprises a pressure regulating valve;
the pressure regulating valve is connected to one end, far away from the second pressure regulating subunit, of the mass flow controller.
Further, the second pressure regulating subunit comprises an air inlet, a flow dividing block main body, a capillary tube, an air dividing port and a measuring port;
the gas inlet is connected with the gas output end of the first pressure regulating subunit, and the gas inlet, the gas distributing port and the measuring port are respectively arranged on one side of the flow distributing block main body;
the capillary tube is arranged on the side, opposite to the gas distribution port, of the flow distribution block main body, one end of the capillary tube is connected with the cavity surrounded by the flow distribution block main body, and the other end of the capillary tube is connected with the gas distribution port; the capillary tube is used for stabilizing the pressure of the gas to a preset pressure stability;
the gas distributing port is used for outputting gas;
the measuring port is used for measuring the pressure of the output gas.
Further, the number of the capillary tubes is multiple, and the number of the gas distribution ports is multiple; the capillary tubes are arranged in one-to-one correspondence with the gas distributing openings.
Furthermore, the objective lens device also comprises a third pressure sensing unit and a fourth pressure sensing unit, wherein the third pressure sensing unit and the fourth pressure sensing unit are respectively connected with the control unit;
the third pressure sensing unit is arranged in the first pressure regulating subunit, and the fourth pressure sensing unit is arranged in the second pressure regulating subunit; the third pressure sensing unit is used for transmitting a detected third pressure value of the gas output by the first pressure regulating subunit to the control unit, and the fourth pressure sensing unit is used for transmitting a detected fourth pressure value of the gas output by the second pressure regulating subunit to the control unit;
the control unit is configured to monitor the first pressure value, the second pressure value, the third pressure value, and the fourth pressure value.
Further, the first pressure sensing unit, the second pressure sensing unit, the third pressure sensing unit and the fourth pressure sensing unit are respectively pressure sensors.
Further, the preset pressure stability is +/-10 Pa, and the preset purity is 5N-6N.
The embodiment of the invention provides an objective lens device, which comprises a light ray transmission unit, a gas supply unit and a control unit; the light transmission unit comprises a first lens group, a wavefront compensator and a second lens group which are sequentially arranged along the light transmission direction, and light is emitted from the second lens group; a first pressure sensing unit is arranged in the first lens group and/or the second lens group, a second pressure sensing unit is arranged in the wavefront compensator, and the first pressure sensing unit and the second pressure sensing unit are respectively connected with the control unit; the gas supply unit is used for outputting gas with preset pressure stability and preset purity and supplying the gas to the wavefront compensator; the control unit is used for adjusting the gas output quantity of the gas supply unit according to a first pressure value detected by the first pressure sensing unit and a second pressure value detected by the second pressure sensing unit, so that the difference value between the first pressure value and the second pressure value is within a preset pressure difference threshold range, and therefore, the gas supply unit can be used for supplying gas to the wavefront compensator, and the control unit is used for controlling the difference value between the second pressure value at the position of the wavefront compensator and the first pressure value in the first lens group and/or the second lens group to be within the preset pressure difference threshold range, so that the second pressure value at the open environment (namely the position of the wavefront compensator) of the objective lens device and the first pressure value at the closed environment of the objective lens device are kept consistent within the preset pressure difference threshold range, and the environmental stability at the open environment of the objective lens device is higher, and therefore, the influence of the environment on the optical refractive index of the objective lens device is reduced, it is advantageous to improve the stability of the optical performance of the objective lens device. The problem that the performance fluctuation of the objective lens device is large due to the fact that an open environment is formed at the wavefront compensator and the stability of the environment pressure at the position is poor is solved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, a brief description will be given below of the drawings required for the embodiments or the technical solutions in the prior art, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an objective lens apparatus according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of another objective lens device provided in an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a first voltage regulating subunit according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of another first voltage regulating subunit according to the embodiment of the present invention;
fig. 5 is a schematic structural diagram of a second voltage regulating subunit according to an embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Examples
Fig. 1 is a schematic structural diagram of an objective lens device according to an embodiment of the present invention. Referring to fig. 1, the objective lens apparatus 00 includes: a light propagation unit 110, a gas supply unit 120, and a control unit 130; the light propagation unit 110 includes a first lens group 111, a wavefront compensator 112, and a second lens group 113 sequentially arranged along the light propagation direction, and light is emitted from the second lens group 113; a first pressure sensing unit 51 is disposed in the first lens group 111 and/or the second lens group 113 (fig. 1 exemplarily shows that the first pressure sensing unit 51 is disposed in the second lens group 113), a second pressure sensing unit 52 is disposed in the wavefront compensator 112, and the first pressure sensing unit 51 and the second pressure sensing unit 52 are respectively connected to the control unit 130; the gas supply unit 120 is configured to output a gas having a predetermined pressure stability and a predetermined purity, and supply the gas to the wavefront compensator 112; the control unit 130 is configured to adjust the gas output of the gas supply unit 120 according to a first pressure value detected by the first pressure sensing unit 51 and a second pressure value detected by the second pressure sensing unit 52, so that a difference between the first pressure value and the second pressure value is within a preset pressure difference threshold range.
The objective lens device 00 is suitable for a lithography device, and the lithography device further includes a light source unit (not shown in fig. 1), wherein light emitted from the light source unit passes through a light propagation unit in the objective lens device 00, is emitted by the second lens group 113, and irradiates the sample 10 to be lithographed. Illustratively, the light source unit may be an ultraviolet light source, a laser light source, or other types of light sources known to those skilled in the art.
The light transmission unit 110 is disposed on the light path between the light source unit and the sample 10 to be photoetched, and can be used to change the optical indexes such as the transmission direction, line type, and energy of the light. Illustratively, the light propagation unit 110 may further include a reflection unit, a light intensity monitoring unit, a patterning unit, and other elements or components known to those skilled in the art.
The objective device 00, which may also be referred to as a projection objective, enables the transfer of the pattern of the patterning unit onto the sample 10 to be lithographed. For example, the first lens group 111, the second lens group 113 and the wavefront compensator 112 in the objective lens device 00 may be respectively formed by stacking a plurality of optical lenses along the light propagation direction, and the specific structure thereof may be any structure known to those skilled in the art, and the embodiment of the present invention is not limited thereto.
The wavefront compensator 112 is inserted between the first lens group 111 and the second lens group 113 along the light propagation direction. The first lens group 111 and the second lens group 113 can be regarded as a closed environment, and the wavefront compensator 112 can be understood as an open environment. Illustratively, the wavefront compensator 112 is composed of a limited number of optical lenses, and by supplying gas to the position of the wavefront compensator 112 and controlling the pressure and temperature of the supplied gas, the refractive index of the whole range of the light propagation unit 110 can be improved, and when the objective lens device 00 is applied to a lithographic apparatus, it is advantageous to improve the exposure index, for example, the exposure resolution or the feature size.
In the following description, the specific structure of the gas supply unit 120 is described in detail, and the gas supply unit 120 can supply gas with a preset pressure stability and a preset purity (for example, a value may be 6N) to the wavefront compensator 112, so that the environment at the position of the wavefront compensator 112 can be stable and clean, and the problems of poor environmental stability and serious pollution caused by the open space at the position can be avoided, thereby being beneficial to improving the stability of the optical performance of the objective lens apparatus 00.
Wherein the control unit 130 is adapted to realize a self-feedback control of the objective lens arrangement 00.
Illustratively, the second lens group 113 is a closed environment, the internal pressure thereof is relatively stable, and the pressure index can be represented by the first pressure value. The control unit 130 may obtain a pressure fluctuation range according to the first pressure value; and controlling the second pressure value to fluctuate within the pressure fluctuation range, so that the difference value between the first pressure value and the second pressure value is within a preset pressure difference threshold range. Therefore, the second pressure value of the wavefront compensator 112 and the first pressure value in the second lens group 113 are kept consistent within the preset pressure difference threshold range, so that the interference of the large environmental fluctuation caused by the open environment of the wavefront compensator 112 on the optical refractive index of the objective lens is reduced, and the optical performance stability of the objective lens device 00 can be further improved.
Illustratively, the first pressure value is 500Pa, and the corresponding obtained pressure fluctuation range is 500 ± 25Pa, at this time, the preset pressure difference threshold range is ± 25Pa, that is, when the second pressure value is changed within a range of ± 25Pa relative to the first pressure value, it can be considered that the second pressure value of the wavefront compensator 112 is consistent with the first pressure value within the second lens group 113, and the pressure is stable.
It should be noted that the first pressure value, the second pressure value, and the preset pressure difference threshold range are only exemplarily shown in the above, but are not limiting for the objective lens device 00 provided by the embodiment of the present invention. In other embodiments, the first pressure value, the second pressure value and the preset pressure difference threshold range may be set according to actual requirements of the objective lens device 00, which is not limited in the embodiment of the present invention.
Next, it should be noted that, the above only exemplarily refers to the first pressure value in the second lens group 113, and the adjustable range of the second pressure value is described, but the adjustable range does not constitute a limitation on the objective lens device 00 provided in the embodiment of the present invention. In other embodiments, the pressure value in the first lens group 111 detected by the first pressure value may also be set according to the actual requirement of the objective lens device 00, or the first pressure value is set as an average value of the pressure value in the first lens group 111 and the pressure value in the second lens group 113, which is not limited in this embodiment of the present invention.
Next, the structure of the gas supply unit 120 is exemplarily described with reference to fig. 2 to 5.
Alternatively, fig. 2 is a schematic structural diagram of another objective lens device provided in an embodiment of the present invention. Referring to fig. 2, in the objective lens apparatus 00, the gas supply unit 120 includes a first pressure regulating subunit 20, a second pressure regulating subunit 30, and a gas recovery subunit 40 connected in sequence; the first pressure regulating subunit 20 is configured to filter the gas and output the gas having an initial preset pressure to the second pressure regulating subunit 30; the second pressure regulating subunit 30 is configured to stabilize the pressure of the gas within an initial preset pressure range, stabilize the pressure of the gas within a preset pressure stability range, and supply the gas having the preset pressure stability and the preset purity to the wavefront compensator 112; the gas recovery subunit 40 is used to recover the gas flowing through the wavefront compensator 112.
Wherein the gas input terminal of the first pressure regulating subunit 20 is connected to a gas source, which may be nitrogen (N), for example2)。
With such arrangement, the gas output from the gas source is roughly adjusted in pressure and purified by the first pressure regulating subunit 20, then is precisely adjusted in pressure by the second pressure regulating subunit 30, is converted into a gas with a preset pressure stability and a preset purity, and then flows through the wavefront compensator 112, and then is recovered and discharged by the gas recovery subunit 40.
Illustratively, in combination with the above, the first pressure value is 500Pa, and the corresponding obtained pressure fluctuation range is 500 ± 25Pa, at this time, the preset pressure difference threshold range is ± 25 Pa; thus, the initial preset pressure may be 500Pa + -30 Pa, and the preset pressure stability may be + -25 Pa, + -20 Pa, or + -15 Pa.
It should be noted that the above description only shows specific values of each pressure value or pressure range by way of example, but is not intended to limit the objective lens device 00 provided in the embodiment of the present invention. In other embodiments, the first pressure value, the preset differential pressure threshold range, the initial preset pressure and the preset pressure stability may be set according to actual requirements of the objective lens device 00, which is not limited in the embodiments of the present invention.
Optionally, fig. 3 is a schematic structural diagram of a first voltage regulating subunit provided in an embodiment of the present invention. Referring to fig. 3, the first pressure regulating subunit 20 includes a mass flow controller 22 and a purifier 24; the mass flow controller 22 is used for controlling the flow of the gas output by the first pressure regulating subunit 20; the purifier 24 is used to filter the gas.
When the size of the space is fixed, the flow rate of the gas corresponds to the pressure of the gas one to one, so that the pressure of the gas output by the first pressure regulating subunit 20 can be controlled by controlling the flow rate of the gas, and the gas with the initial preset pressure can be output. The purifier 24 filters the gas to provide the output gas with an initial predetermined purity. The initial predetermined purity may be higher than the predetermined purity, thereby compensating for gas contamination during gas transfer after the purifier 24.
So configured, the first pressure regulating subunit 20 can output the gas having the initial preset pressure and the initial preset purity to the second pressure regulating subunit 30.
It should be noted that the mass flow controller 22 and the purifier 24 may be any type or specification of mass flow controller and purifier known to those skilled in the art, and may be specifically configured according to the actual requirements of the objective lens device 00, which is not limited by the embodiment of the present invention.
Optionally, the purifier 24 is disposed between the mass flow controller 22 and the second pressure regulating subunit 30.
Thus, locating purifier 24 at the end of first pressure regulating subunit 20 (i.e., immediately adjacent to the gas output) is advantageous in ensuring that a higher purity level is maintained during subsequent gas delivery.
It should be noted that, when the cleanliness of the mass flow controller 22 and the related gas transmission line is high, the mass flow controller 24 may be further disposed between the purifier 24 and the second pressure regulating subunit 30, which is not limited in the embodiment of the present invention.
Optionally, fig. 4 is a schematic structural diagram of another first voltage regulating subunit provided in the embodiment of the present invention. Referring to fig. 3 and 4, the same parts are not repeated, and the difference is that the first pressure regulating subunit 20 shown in fig. 4 further includes a pressure regulating valve 21; the pressure regulating valve 21 is connected to the end of the mass flow controller 22 remote from the second pressure regulating subunit 30.
In the first pressure regulating subunit 20 shown in fig. 4, the pressure can be roughly regulated by the pressure regulating valve 21, and then the flow can be finely regulated by the mass flow controller 22, which is beneficial to reducing the damage of the mass flow controller 22 caused by the overlarge initial gas flow, thereby being beneficial to prolonging the service life of the mass flow controller 22 and reducing the operation and maintenance costs of the objective lens device 00.
Among them, the first pressure regulating subunit 20 shown in fig. 3 can regulate the gas pressure by using the mass flow controller 22, so that the structure of the objective lens apparatus 00 can be simplified, and the cost can be saved.
It should be noted that fig. 4 only shows an exemplary case where the pressure regulating valve 21, the mass flow controller 22, and the purifier 24 of the first pressure regulating subunit 20 are connected in sequence, but the present invention is not limited to the first pressure regulating subunit 20 of the objective lens apparatus 00 according to the embodiment of the present invention. In other embodiments, the connection sequence of the pressure regulating valve 21, the mass flow controller 22 and the purifier 24 in the first pressure regulating subunit 20 may be set according to the actual requirements of the objective lens device 00, which is not limited by the embodiment of the present invention.
Optionally, fig. 5 is a schematic structural diagram of a second voltage regulating subunit provided in the embodiment of the present invention. Referring to fig. 5, the second pressure regulating subunit 30 includes an air inlet 31, a flow dividing block body 32, a capillary tube 33, a gas dividing port 34, and a measurement port 35; the air inlet 31 is connected with the air output end of the first pressure regulating subunit 20, and the air inlet 31, the air distributing port 34 and the measuring port 35 are respectively arranged on one side of the flow dividing block main body 32; the capillary tube 33 is arranged on the side, opposite to the gas distributing port 34, of the flow dividing block main body 32, one end of the capillary tube 33 is connected with the chamber surrounded by the flow dividing block main body 32, and the other end of the capillary tube 33 is connected with the gas distributing port 34; the capillary 33 is used for stabilizing the pressure of the gas to a preset pressure stability; the gas separation port 34 is used for outputting gas; the measurement port 35 is used to measure the pressure of the output gas.
Illustratively, diverter block body 32 is shaped as a rectangular parallelepiped, which includes six sides, upper, lower, left, right, front, and rear, for example, in the orientation shown in fig. 5; the air inlet 31 is provided on the left side, the measurement port 35 is provided on the side, the capillary 33 is provided on the upper side, and the air distribution port 34 is provided on the lower side. This is merely an exemplary description of the second voltage-adjusting subunit 30 shown in fig. 5, but is not a limitation of the second voltage-adjusting subunit 30 in the objective lens apparatus 00 provided by the embodiment of the present invention. In other embodiments, the shapes of the structures in the second voltage regulating subunit 30 and the specific orientations thereof may be set according to the actual requirements of the objective lens device 00, which is not limited in the embodiments of the present invention.
With such an arrangement, the gas having the initial preset pressure and the initial preset purity, which is output by the first pressure regulating subunit 20, enters from the gas inlet 31, is divided into the capillaries 33 by the flow dividing block main body 32, the pressure of the gas is stabilized to the preset pressure stability by using the pressure stabilizing characteristic of the capillaries 33, and finally, the gas is output from the gas dividing port 34 and is supplied to the wavefront compensator 112.
It should be noted that fig. 5 only shows an exemplary manner of connecting the capillary 33 and the diversion block main body 32 by a screw fastening manner, which is simple and convenient for assembly and disassembly, but does not constitute a limitation on the second pressure regulating subunit 30 provided in the embodiment of the present invention. In other embodiments, the connection manner between the capillary 33 and the diversion block main body 32 may be set according to the actual requirements of the objective lens device 00, which is not limited in the embodiment of the present invention.
Optionally, with continued reference to fig. 5, the number of capillaries 33 is plural (exemplarily, the number of capillaries in fig. 5 is 8), the number of gas distribution ports 34 is plural (exemplarily, the number of gas distribution ports 34 in fig. 5 is 8, wherein, for reasons of illustration, 3 gas distribution ports 34 are blocked by the diverter block body 32); the capillary tubes 33 are provided in one-to-one correspondence with the gas distribution ports 34.
By such arrangement, the gas distributing openings 34 and the capillary tubes 33 can be utilized, and meanwhile, the pressure of the gas output by each gas distributing opening is kept consistent, so that the pressure of the output gas is conveniently monitored.
It should be noted that fig. 5 only shows 8 capillaries 33 and 8 gas distribution ports 34 corresponding to the capillaries, which is not intended to limit the second voltage regulating subunit 30 in the objective lens apparatus 00 according to the embodiment of the present invention. In other embodiments, the number of the capillary tubes 33 and the gas distribution ports 34 in the second pressure regulating subunit 30 may be set according to the actual requirement of the objective lens device 00, which is not limited in the embodiment of the present invention.
Optionally, with continued reference to fig. 2, the objective lens device 00 further includes a third pressure sensing unit 53 and a fourth pressure sensing unit 54, wherein the third pressure sensing unit 53 and the fourth pressure sensing unit 54 are respectively connected to the control unit 130; the third pressure sensing unit 53 is arranged in the first pressure regulating subunit 20, and the fourth pressure sensing unit 54 is arranged in the second pressure regulating subunit 30; the third pressure sensing unit 53 is configured to transmit a detected third pressure value of the gas output by the first pressure regulating subunit 20 to the control unit 130, and the fourth pressure sensing unit 54 is configured to transmit a detected fourth pressure value of the gas output by the second pressure regulating subunit 30 to the control unit 130; the control unit 130 is configured to monitor the first pressure value, the second pressure value, the third pressure value, and the fourth pressure value.
Wherein, in conjunction with fig. 2 and 5, a fourth pressure sensing unit 54 may be disposed in the measurement port 35.
The arrangement is that the third pressure sensing unit 53, the fourth pressure sensing unit 54, the second pressure sensing unit 52 and the first pressure sensing unit 51 are respectively arranged in the first pressure regulating subunit 20, the second pressure regulating subunit 30, the wavefront compensator 112 and the objective 111, so that the pressure states at corresponding positions can be respectively monitored by the pressure sensing units and fed back to the control unit 130, thereby realizing the self-feedback regulation of the pressure in the objective lens device 00.
Optionally, the first pressure sensing unit 51, the second pressure sensing unit 52, the third pressure sensing unit 53 and the fourth pressure sensing unit 54 are pressure sensors, respectively.
With this arrangement, the pressure sensing units can be simplified in structure, which is advantageous for simplifying the overall structure of the objective lens apparatus 00.
It should be noted that, each pressure sensing unit may also adopt other types of pressure sensing units known to those skilled in the art, and the embodiment of the present invention is not limited thereto.
Optionally, the preset pressure stability is ± 10Pa, and the preset purity is 5N-6N.
With such an arrangement, the pressure stability and purity of the gas supplied to the wavefront compensator 112 by the gas supply unit 120 are high, which is favorable for improving the pressure stability and purity of the gas at the position of the wavefront compensator 112, and is further favorable for improving the optical stability of the objective lens device 00, and when the objective lens device 00 is applied to a photolithography device, the exposure index of the photolithography device is favorably improved.
It should be noted that the objective lens device 00 may further include other fixing or supporting structures known to those skilled in the art, which are not described in detail nor limited herein.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (10)
1. An objective lens apparatus, comprising: a light propagation unit, a gas supply unit and a control unit;
the light transmission unit comprises a first lens group, a wavefront compensator and a second lens group which are sequentially arranged along the light transmission direction, and light is emitted from the second lens group;
a first pressure sensing unit is arranged in the first lens group and/or the second lens group, a second pressure sensing unit is arranged in the wavefront compensator, and the first pressure sensing unit and the second pressure sensing unit are respectively connected with the control unit;
the gas supply unit is used for outputting gas with preset pressure stability and preset purity and supplying the gas to the wavefront compensator;
the control unit is used for adjusting the gas output quantity of the gas supply unit according to a first pressure value detected by the first pressure sensing unit and a second pressure value detected by the second pressure sensing unit, so that the difference value between the first pressure value and the second pressure value is within a preset pressure difference threshold range.
2. An objective lens device as claimed in claim 1, wherein the gas supply unit includes a first pressure-regulating subunit, a second pressure-regulating subunit, and a gas recovery subunit, which are connected in series;
the first pressure regulating subunit is used for filtering gas and outputting the gas with initial preset pressure to the second pressure regulating subunit;
the second pressure regulating subunit is used for stabilizing the pressure of the gas within the initial preset pressure range, stabilizing the pressure of the gas within the preset pressure stability range, and supplying the gas with the preset pressure stability and the preset purity to the wavefront compensator;
the gas recovery subunit is used for recovering the gas flowing through the wavefront compensator.
3. An objective lens arrangement as claimed in claim 2, characterized in that the first pressure regulating subunit comprises a mass flow controller and a purifier;
the mass flow controller is used for controlling the flow of the gas output by the first pressure regulating subunit;
the purifier is used for filtering gas.
4. An objective lens arrangement as claimed in claim 3, wherein the purifier is arranged between the mass flow controller and the second pressure regulating subunit.
5. An objective lens device as recited in claim 3, wherein the first pressure regulating subunit further includes a pressure regulating valve;
the pressure regulating valve is connected to one end, far away from the second pressure regulating subunit, of the mass flow controller.
6. The objective lens device according to claim 2, wherein the second pressure-regulating subunit includes an air inlet, a flow-dividing block main body, a capillary tube, a gas-dividing port, and a measurement port;
the gas inlet is connected with the gas output end of the first pressure regulating subunit, and the gas inlet, the gas distributing port and the measuring port are respectively arranged on one side of the flow distributing block main body;
the capillary tube is arranged on the side, opposite to the gas distribution port, of the flow distribution block main body, one end of the capillary tube is connected with the cavity surrounded by the flow distribution block main body, and the other end of the capillary tube is connected with the gas distribution port; the capillary tube is used for stabilizing the pressure of the gas to a preset pressure stability;
the gas distributing port is used for outputting gas;
the measuring port is used for measuring the pressure of the output gas.
7. The objective lens device according to claim 6, wherein the number of the capillaries is plural, and the number of the gas separation ports is plural; the capillary tubes are arranged in one-to-one correspondence with the gas distributing openings.
8. The objective lens device according to claim 2, further comprising a third pressure sensing unit and a fourth pressure sensing unit, the third pressure sensing unit and the fourth pressure sensing unit being respectively connected to the control unit;
the third pressure sensing unit is arranged in the first pressure regulating subunit, and the fourth pressure sensing unit is arranged in the second pressure regulating subunit; the third pressure sensing unit is used for transmitting a detected third pressure value of the gas output by the first pressure regulating subunit to the control unit, and the fourth pressure sensing unit is used for transmitting a detected fourth pressure value of the gas output by the second pressure regulating subunit to the control unit;
the control unit is configured to monitor the first pressure value, the second pressure value, the third pressure value, and the fourth pressure value.
9. The objective lens device according to claim 8, wherein the first pressure sensing unit, the second pressure sensing unit, the third pressure sensing unit, and the fourth pressure sensing unit are pressure sensors, respectively.
10. An objective lens arrangement as claimed in claim 1, characterized in that the preset pressure stability is ± 10Pa and the preset purity is 5N-6N.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910150666.8A CN111624731B (en) | 2019-02-28 | 2019-02-28 | Objective lens device |
| PCT/CN2020/072820 WO2020173254A1 (en) | 2019-02-28 | 2020-01-17 | Objective lens device |
| TW109102033A TWI731560B (en) | 2019-02-28 | 2020-01-20 | Objective lens device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910150666.8A CN111624731B (en) | 2019-02-28 | 2019-02-28 | Objective lens device |
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| Publication Number | Publication Date |
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| CN111624731A true CN111624731A (en) | 2020-09-04 |
| CN111624731B CN111624731B (en) | 2021-12-10 |
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| CN201910150666.8A Active CN111624731B (en) | 2019-02-28 | 2019-02-28 | Objective lens device |
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| Country | Link |
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| CN (1) | CN111624731B (en) |
| TW (1) | TWI731560B (en) |
| WO (1) | WO2020173254A1 (en) |
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| TWI731560B (en) | 2021-06-21 |
| CN111624731B (en) | 2021-12-10 |
| TW202034095A (en) | 2020-09-16 |
| WO2020173254A1 (en) | 2020-09-03 |
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