CN111948907B - Mask plate temperature control device and mask exposure device - Google Patents
Mask plate temperature control device and mask exposure device Download PDFInfo
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- CN111948907B CN111948907B CN201910409932.4A CN201910409932A CN111948907B CN 111948907 B CN111948907 B CN 111948907B CN 201910409932 A CN201910409932 A CN 201910409932A CN 111948907 B CN111948907 B CN 111948907B
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- gas
- mask
- temperature control
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- temperature
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
Abstract
The invention discloses a mask plate temperature control device and a mask exposure device. The mask plate temperature control device comprises: the mask storage unit is used for storing a mask; the gas conveying unit is used for conveying gas bath gas to the mask storage unit, and the gas temperature control unit is used for adjusting the temperature change range of the gas bath gas transmitted to the mask storage unit by the gas conveying unit to a preset temperature range; the mask storage unit comprises a plate frame main body and partition plates, the partition plates are fixed in the plate frame main body, an accommodating space is formed between every two adjacent partition plates, and the accommodating space is used for accommodating mask plates. The technical scheme of the invention can reduce the difficulty of controlling the temperature of the mask plate.
Description
Technical Field
The embodiment of the invention relates to the technical field of photoetching equipment, in particular to a mask plate temperature control device and a mask exposure device.
Background
With the development of semiconductor technology and the development of high-tech devices toward small, compact and complex dimensions, higher requirements are imposed on the line width of integrated circuits, and therefore, a higher overlay resolution is required for a lithography machine, and the overlay resolution of the lithography machine is affected by mechanical, optical, temperature and cleanliness factors, and small changes of the above factors may affect the overlay resolution of the lithography machine.
In the whole structure of the photoetching machine, the mask transmission module is the only module which is used for realizing the switching of the mask plate from the mask storage unit to the mask unit in the photoetching machine, and the temperature precision of the upper plate directly influences the alignment resolution ratio, so that the arrangement of the mask plate temperature control unit in the mask transmission area is particularly important for ensuring the temperature of the upper plate. However, the mask plate is usually made of low-expansion quartz glass, and the heat conduction and heat exchange efficiency is low, so that the temperature control of the mask plate is difficult.
Disclosure of Invention
The invention provides a mask plate temperature control device and a mask exposure device, which are used for reducing the difficulty of mask plate temperature control.
An embodiment of the present invention provides a mask plate temperature control device, including: the mask storage unit is used for storing a mask;
the gas conveying unit is used for conveying gas bath gas to the mask storage unit, and the gas temperature control unit is used for adjusting the temperature change range of the gas bath gas transmitted to the mask storage unit by the gas conveying unit to a preset temperature range;
the mask storage unit comprises a plate frame main body and partition plates, the partition plates are fixed in the plate frame main body, an accommodating space is formed between every two adjacent partition plates, and the accommodating space is used for accommodating mask plates.
Further, the mask storage unit further comprises a mask support;
a plurality of mask supporting pieces are respectively arranged on the bearing surface of each partition plate;
the mask support is used for supporting a mask plate placed in the accommodating space and fixing the partition plate.
Further, the mask support includes a connector and a cylindrical support; the plate frame main body comprises an auxiliary fixing platform;
the first end of the connecting piece is fixedly connected with the auxiliary fixing platform, a fixed gap is arranged between the second end of the connecting piece and the table top of the auxiliary fixing platform, and the fixed gap is used for fixing the partition board;
one end of the cylindrical support body is arranged on one side, away from the auxiliary fixing platform fixed with the connecting piece, of the connecting piece, and the other end of the cylindrical support body is used for supporting the mask plate.
Further, the partition plate is of a straight plate structure;
the side of the clapboard is clamped and fixed by the fixed gap.
Further, the preset temperature threshold range is 22 +/-0.05 ℃.
Further, the gas temperature control unit includes a heat exchanger disposed in a transmission path of the gas delivery unit;
the heat exchanger is used for stabilizing the temperature of the gas delivered by the gas delivery unit to the first temperature threshold range.
Further, the mask plate temperature control device also comprises a temperature sensor; the temperature sensor is arranged in the gas conveying unit and is positioned between the gas temperature control unit and the gas outlet of the gas conveying unit, and/or the temperature sensor is arranged in the mask storage unit.
Further, the heat exchanger is a shell-and-tube heat exchanger;
the shell-and-tube heat exchanger is communicated with heat transfer fluid, and the flow direction of the heat transfer fluid is opposite to the conveying direction of the gas in the gas conveying unit.
Furthermore, the mask plate temperature control device also comprises a pressure flow regulating unit, wherein the pressure flow regulating unit is arranged at an air inlet of the gas conveying unit;
the pressure and flow regulating unit is used for regulating the pressure of the gas to a preset pressure threshold value and regulating the flow of the gas to a preset flow threshold value.
Further, the range of the preset pressure threshold is 1.7Bar-5 Bar;
the preset flow threshold value ranges from 200NL/min to 500 NL/min.
Further, the pressure-flow rate regulating unit includes a pressure regulating valve and a throttle valve;
the pressure regulating valve is used for regulating the pressure of the gas, and the throttle valve is used for regulating the flow of the gas.
Further, the gas conveying unit comprises a gas conveying pipeline and filter cloth;
the gas inlet of the gas transmission pipeline is the gas inlet of the gas transmission unit, the gas outlet of the gas transmission pipeline is the gas outlet of the gas transmission unit, the gas outlet of the gas transmission pipeline is connected with the mask storage unit, and the flowing direction of the gas bath gas is parallel to the plane where the partition plate is located;
the filter cloth is fixed at the gas outlet of the gas transmission pipeline.
Furthermore, the mesh number of the filter cloth ranges from 300 meshes to 500 meshes.
Furthermore, the gas transmission pipeline comprises a main pipeline and at least two branch pipelines, and the number of the mask storage units is at least two; the mask storage units are arranged in one-to-one correspondence with the branch pipelines.
Furthermore, the gas conveying unit also comprises a conversion joint, and the conversion joint is connected to the interface of the main pipeline and the at least two branch pipelines;
the adapter is used for transmitting the gas in the main pipeline to the at least two branch pipelines.
Further, the roughness of the inner side wall of the gas transmission pipeline is less than or equal to 0.3 μm.
The embodiment of the invention also provides a mask exposure device which comprises any one of the mask plate temperature control devices.
The mask plate temperature control device provided by the embodiment of the invention comprises a gas temperature control unit, a gas conveying unit and a mask storage unit; the gas conveying unit is used for conveying gas bath gas to the mask storage unit, and the gas temperature control unit is used for adjusting the temperature change range of the gas bath gas transmitted to the mask storage unit from the gas conveying unit to a preset temperature range; wherein, the mask is deposited the unit and is included shelf main part and baffle, the baffle is fixed in the shelf main part, form accommodation space in the middle of two adjacent baffles, accommodation space is used for placing mask plate, the accessible baffle divide into the multilayer with the space in the shelf main part, realize the mask and deposit the layering isolation design of each accommodation space in the unit, be favorable to the gas bath gas laminar flow to pass through mask plate to be favorable to improving mask plate temperature regulating device's temperature stabilization efficiency, be favorable to reducing the mask plate temperature control degree of difficulty.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, a brief description will be given below of the drawings required for the embodiments or the technical solutions in the prior art, and it is obvious that the drawings in the following description are some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a mask plate temperature control device according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of another mask plate temperature control device provided in an embodiment of the present invention;
fig. 3 is a schematic structural diagram of a mask storage unit of another mask blank temperature control device according to an embodiment of the present invention;
FIG. 4 is a schematic view of the separator of FIG. 3;
fig. 5 is a schematic structural diagram of another mask blank temperature control device according to an embodiment of the present invention;
FIG. 6 is a schematic structural view of the pressure-flow regulating unit of FIG. 5;
FIG. 7 is a schematic view of a portion of the gas delivery unit of FIG. 5;
fig. 8 is an operational schematic diagram of the reticle temperature control apparatus of fig. 5;
fig. 9 is a diagram showing simulation results of gas bath flow field distribution of the mask plate temperature control device provided in fig. 5.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Examples
Fig. 1 is a schematic structural diagram of a mask blank temperature control device according to an embodiment of the present invention. Referring to fig. 1, the mask temperature control apparatus 10 includes: a gas delivery unit 110, a gas temperature control unit 120, and a mask storage unit 130; the gas delivery unit 110 is used for delivering gas bath gas to the mask storage unit 130, and the gas temperature control unit 120 is used for adjusting the temperature variation range of the gas bath gas delivered from the gas delivery unit 110 to the mask storage unit 130 to a preset temperature range; the mask storage unit 130 includes a frame body 131 and partitions 132, the partitions 132 are fixed in the frame body 131, and an accommodation space is formed between two adjacent partitions 132 and is used for accommodating a mask plate.
Wherein, the gas delivery unit 110 delivers the gas bath gas to the mask storage unit from the gas supply end, and during the delivery of the gas bath gas in the gas delivery unit 110, the gas temperature control unit 120 adjusts the temperature of the gas bath gas and stabilizes the temperature thereof to a preset temperature range, and the gas bath gas with the stabilized temperature is delivered to the mask storage unit 130.
For example, the preset temperature range corresponds to a temperature range of the mask plate, and the temperature range of the mask plate can be a reference temperature plus or minus an allowable error temperature; the reference temperature is an ideal temperature value of the mask plate, and the mask plate can be printed when the temperature of the mask plate reaches the reference temperature; the allowable error temperature is in the range of the temperature of the mask plate which can fluctuate near the ideal temperature value, and the mask plate can be printed within the allowable error temperature range; under the condition, the influence of the temperature of the mask plate on the subsequent exposure process is within an acceptable range for monitoring the product quality.
For example, when the temperature range of the mask plate may be 22 ± 0.1 ℃, the temperature of the natural environment around the mask storage unit 130 may also have an influence on the temperature of the mask plate, so that the temperature fluctuation range of the mask plate is greater than the temperature fluctuation range of the preset temperature range, and therefore, the allowable error temperature of the preset temperature range may be set to be less than ± 0.05 ℃, that is, the preset temperature threshold range is 22 ± 0.05 ℃.
Therefore, the temperature of the mask plate can be stabilized at 22 +/-0.1 ℃ in a heat exchange mode by blowing gas bath gas to the surface of the mask plate.
It should be noted that the value of the preset temperature range may be set according to the actual requirement of the mask plate temperature control device, which is not limited in the embodiment of the present invention.
The reticle storage unit 130 includes a frame body 131 and partitions 132, and spaces surrounded by the frame body 131 are partitioned by the partitions 132 to form a plurality of accommodation spaces, each of which may be referred to as a reticle pod. Therefore, in the mask storage unit 130, the mask plate slots are isolated from each other by the partition plates 132, so that the mask plate slots without the mask plates can be prevented from causing airflow disorder due to reduction of air resistance, and the stability of the flow of the gas bath gas can be improved, thereby being beneficial to improving the stability of the heat exchange process of the gas bath gas and the mask plates and reducing the difficulty of temperature control of the mask plates; furthermore, the method is beneficial to improving the plate mounting time of the mask plate in the photoetching machine and improving the photoetching yield.
Note that the gas flow direction in the gas delivery unit 110 is shown by an arrow direction in fig. 1. Fig. 1 shows only two mask storage units 130 as an example, and the number of the partitions 132 in each mask storage unit 130 is 7, but the mask blank temperature control apparatus 10 according to the embodiment of the present invention is not limited thereto. In other embodiments, the number of the mask storage units 130 and the number of the partitions 132 in the mask storage units 130 may be set according to actual requirements of the mask blank temperature control device 10, which is not limited by the embodiment of the present invention.
Optionally, fig. 2 is a schematic structural diagram of another mask blank temperature control device provided in the embodiment of the present invention, and fig. 3 is a schematic structural diagram of a mask storage unit of yet another mask blank temperature control device provided in the embodiment of the present invention. Referring to fig. 1 to 2, the mask storage unit 130 further includes a mask support 133; a plurality of mask supporting members 133 are respectively disposed on the carrying surface of each spacer 132; the mask supporter 133 serves to support the mask plate 20 placed in the accommodating space and to fix the spacer 132.
With this arrangement, it is possible to make the mask holder 133 not only support the mask plate 20 placed in the accommodating space but also fix the spacer 132 only by setting the three-dimensional shape of the mask holder 133; therefore, an additional mechanism for fixing the partition 132 is not required, and an additional space is not required to be reserved for arranging the mechanism for fixing the partition 132, so that the internal structure of the mask storage unit 130 can be simplified, the fixing difficulty of the partition 132 is favorably reduced, the design and assembly difficulty of the mask storage unit 130 is favorably reduced, the overall design difficulty of the mask plate temperature control device 10 is favorably reduced, and the structure is favorably simplified.
Optionally, with continued reference to fig. 3, mask support 133 includes a connector 1331 and a cylindrical support 1332; the carriage body 131 includes an auxiliary fixing platform 1311; a first end 13311 of the connecting piece 1331 is fixedly connected with the auxiliary fixing platform 1311, and a fixing gap is arranged between a second end 13312 of the connecting piece 1331 and the table top of the auxiliary fixing platform 1311, and the fixing gap is used for fixing the partition 132; one end of the cylindrical support 1332 is disposed on a side of the connector 1331 away from the auxiliary fixing platform 1311 fixed thereto, and the other end of the cylindrical support 1332 is used for supporting the mask plate 20.
Illustratively, taking the case portion of the shelf body 131 as a rectangular parallelepiped, the shelf body 131 includes a bottom surface, a top surface, and side surfaces; the side surface is a surface into which gas bath gas is blown, and the flow direction of the gas bath gas after entering the mask storage unit 130 is parallel to the bottom surface and the top surface. The extending direction of the auxiliary fixing platforms 1311 is parallel to the bottom surface and the top surface of the frame body 131, a column may be disposed on one side of each auxiliary fixing platform 131 close to the top surface, the column may be used to support the connecting member 1311, and the shape and distribution of the column may be set according to the actual requirement of the mask plate temperature control device, which is not limited in the embodiment of the present invention.
For example, the auxiliary fixing platform 1311 and the housing portion of the frame body 131 may be integrally formed by using the same material, which is advantageous for reducing the number of process steps for manufacturing the mask storage unit 130 and simplifying the manufacturing process of the mask plate temperature control device.
Illustratively, the cylinder support 1332 also comprises a bottom surface and a top surface which are opposite to each other, and a side surface connected between the bottom surface and the top surface, and the bottom surface and the top surface of the cylinder support 1332 and the bottom surface and the top surface of the shell part of the plate frame main body 131 are all arranged in parallel, so that on one hand, laminar flow is facilitated when gas bath gas flows through the mask plate in the mask storage unit 130, the contact area between the gas bath gas with stable temperature and the mask plate 20 is facilitated to be increased, and therefore, the heat exchange efficiency between the gas bath gas and the mask plate 20 is improved, the temperature control difficulty is facilitated to be reduced, and the temperature control precision is improved; on the other hand, the top surface of the cylindrical support 1332 is used for supporting the mask plate, which is beneficial to reducing the contact area of the mask plate 20 and the cylindrical support 1332, thereby being beneficial to improving the temperature uniformity of the mask plate 20, meanwhile, the top surface of the cylindrical support 1332 is a plane, the mask plate 20 is supported by the plane, which is beneficial to ensuring the uniform stress of the contact part of the mask plate 20 and the mask support 133, thereby being beneficial to avoiding the damage of the mask plate 20.
For example, the connection part 1331 and the cylindrical support part 1332 in the mask support part 133 may also be integrally formed by using the same material, which is beneficial to reducing the process steps for manufacturing the mask support part 133 and simplifying the manufacturing process of the mask plate temperature control device.
First, it should be noted that fig. 2 only exemplarily shows that the number of the spacers 132 is 5, and fig. 3 only exemplarily shows that the number of the spacers 132 is 3, but do not constitute a limitation on the mask blank temperature control apparatus provided in the embodiment of the present invention. In other embodiments, the number of the partition plates 132 in the mask storage unit 130 may be set according to actual requirements of the mask plate temperature control device, which is not limited by the embodiment of the present invention.
Next, it should be noted that fig. 2 and 3 only exemplarily show a side structure of the mask storage unit 130 in the mask blank temperature control apparatus, only for showing a relative positional relationship between the partition 132 and the mask support 133 in the mask storage unit 130; the shape of the mask supporting member 133 may be set according to the actual requirement of the temperature control device, and the mask plate 20 and the fixed partition 132 may be supported at the same time.
Alternatively, fig. 4 is a schematic structural view of the separator in fig. 3, and fig. 3 and 4 show a side structure and a plane structure of the separator, respectively. Referring to fig. 3 and 4, the partition 132 has a straight plate structure; the side of the partition 132 is clamped and fixed by a fixing gap.
The partition plate 132 is a straight plate structure, and gas bath gas can form laminar flow when flowing through the mask plate, so that the heat exchange area is increased, and the heat exchange efficiency is high; the temperature control difficulty of the mask plate is favorably reduced, the time for stabilizing the temperature of the mask plate is favorably shortened, and the printing efficiency is favorably improved.
The partition 132 is clamped and fixed by a fixed gap formed by the auxiliary fixing platform 1311 and the connecting piece 1311, so that on one hand, the stability of the partition 132 can be improved, the flowing stability of gas bath gas in the mask plate temperature control process can be improved, and the temperature control difficulty of the mask plate can be reduced; on the other hand, compared with a structure of directly fixing the mask plate by using screws, the structure does not need to be additionally provided with a partition plate fixing structure, so that the difficulty in designing a mask storage unit for reserving space for the structure can be avoided, and the whole design and manufacturing difficulty of the mask plate temperature control device can be reduced.
Illustratively, the supporting points of the mask plate are disposed corresponding to the fixing points of the spacer. The mask plate is supported by four points, so that the heat exchange area between the gas bath gas and the mask plate is increased to the maximum extent, and the heat exchange time is effectively shortened when the same temperature is realized.
Illustratively, the separator 132 is a metal separator having a thickness of 0.8 mm.
It should be noted that fig. 4 only shows the fixing points 1321 as 4, which are located at two opposite edges of the partition 132, for example, but this does not constitute a limitation to the reticle temperature control apparatus provided in the embodiment of the present invention. In other embodiments, the fixing position may be set according to the actual requirement of the mask plate temperature control device, for example, the fixing gap may be set to be a strip shape by setting the shapes of the connecting piece 1331 and the auxiliary fixing platform 1311, and two opposite sides of the partition plate may be fixed by using the strip-shaped fixing gap; on the basis, the mask support piece can support the mask plate through the two narrow strip bulges, and the embodiment of the invention has no limitation on the baffle fixing mode and the mask plate supporting mode.
Optionally, fig. 5 is a schematic structural diagram of another mask blank temperature control device provided in the embodiment of the present invention. Referring to fig. 5, the gas temperature control unit 120 includes a heat exchanger disposed in a transfer path of the gas delivery unit 110; the heat exchanger is used to stabilize the temperature of the gas delivered by the gas delivery unit 110 to a first temperature threshold range.
Wherein, can let in high temperature precision recirculated cooling water (the temperature is 22 ℃) in the heat exchanger, when gaseous access heat exchanger of gas bath, the gaseous heat transfer that can carry out with high temperature precision recirculated cooling water of gas bath, realizes gaseous temperature stability of gas bath, improves gaseous temperature precision of gas bath. Illustratively, the temperature of the gas bath gas at the inlet (gas inlet) of the gas temperature control unit 120 is 22 ± 0.1 ℃, and the temperature of the gas bath gas is heat-exchanged to 22 ± 0.05 ℃ after the heat-exchange by the heat exchanger.
It should be noted that, according to the actual requirement of the mask plate temperature control device, for example, a heat exchanger meeting the heat exchange requirement can be calculated and selected according to the indexes of the flow rate, the pressure, the temperature and the like of the circulating cooling water and the gas bath gas, so as to have the cooling capacity required by the normal working condition under the technical scheme, and the embodiment of the invention is not limited to the specific model and the specification of the heat exchanger. In addition, the heat exchanger is a high purity heat exchanger to ensure that the gas bath gas is not contaminated, thereby ensuring that the cleanliness of the gas bath gas is not compromised.
Optionally, with continued reference to fig. 5, the reticle temperature control apparatus 10 further includes a temperature sensor 140; the temperature sensor 140 is disposed in the gas delivery unit 110 between the gas temperature control unit 110 and the gas outlet 1112 of the gas delivery unit 110, and/or the temperature sensor 140 is disposed in the mask storage unit 130.
Wherein the temperature sensor 140 is used to monitor the temperature of the gas bath gas after it has passed through the heat exchanger. In this manner, it is advantageous to ensure the temperature stability of the gas bath gas entering the mask storage unit 130.
It should be noted that fig. 5 only shows that the number of the temperature sensors 140 is 1, and the temperature sensors are disposed in the mask storage unit 130 to detect the temperature of the gas bath gas after entering the mask storage unit 130, which can also be understood as detecting the temperature of the intake air; however, the mask plate temperature control device provided in the embodiment of the present invention is not limited thereto. In other embodiments, the number of the temperature sensors 140 may also be 2 or more, and may be disposed between the gas temperature control unit 110 and the gas outlet 1112 of the gas delivery unit 110, which is not limited in this embodiment of the invention.
Optionally, the heat exchanger is a shell-and-tube heat exchanger; the shell-and-tube heat exchanger is flowed with a heat transfer fluid in a direction opposite to the direction of gas transport in the gas delivery unit.
For example, referring to fig. 1, the direction indicated by the arrow is the transport direction of the gas bath gas, and the flow direction of the heat transfer fluid is opposite to the direction indicated by the arrow.
For example, referring also to fig. 5, the gas delivery unit 110 includes a gas inlet 1111 and a gas outlet 1112, and the gas temperature control unit 120 (taking a heat exchanger as an example) includes a cooling water inlet 121 and a cooling water outlet 122; the gas of the gas bath in the gas delivery unit 110 is transported from the gas inlet 1111 to the gas outlet 1112 along the path of the gas delivery unit 110, and the flow direction of the heat transfer fluid (for example, circulating cooling water) in the gas temperature control unit 120 is directed from the cooling water inlet 121 to the cooling water outlet 122.
So, the both ends of heat exchanger let in the gaseous and high temperature precision recirculated cooling water of gas bath that the flow is opposite, carry out the heat transfer through recirculated cooling water and gas bath, control the gaseous temperature of gas bath, be favorable to improving the heat exchange efficiency of gas bath gas and heat-conducting fluid (promptly recirculated cooling water), shorten heat transfer time.
It should be noted that the heat exchanger may also be other types of heat exchangers known to those skilled in the art, and the embodiment of the present invention is not described or limited herein.
Optionally, with continued reference to fig. 5, the mask temperature control apparatus 10 further includes a pressure-flow adjusting unit 150, wherein the pressure-flow adjusting unit 150 is disposed at the gas inlet 1111 of the gas delivery unit 110; the pressure and flow rate adjusting unit 150 is configured to adjust the pressure of the gas to a preset pressure threshold, and adjust the flow rate of the gas to a preset flow rate threshold.
Therefore, the gas bath gas can reach preset pressure and flow indexes. The preset pressure threshold and the preset flow threshold can be set according to the actual requirements of the mask plate temperature control device, which is not limited in the embodiment of the invention.
Through pressure and flow control to the gas bath gas, be favorable to improving the flow stability of gas bath gas to be favorable to improving the heat transfer stability of gas bath gas and mask plate, be favorable to reducing the mask plate temperature control degree of difficulty, and be favorable to improving the temperature stability of mask plate.
Optionally, the preset pressure threshold is in a range of 1.7Bar-5Bar, and in the range, the smaller the fluctuation range of the pressure value of the gas in the gas bath, the more stable the pressure of the gas in the gas bath; when the fluctuation range is 0Bar, the pressure stability of the gas bath gas is optimal. The pressure value of the gas bath gas may be, for example, 1.7Bar, 1.9Bar or 2Bar or other pressure values within the above value range, which is not limited by the embodiment of the present invention.
Optionally, the preset flow threshold is 200NL/min to 500NL/min, and in this range, the smaller the fluctuation range of the flow value of the gas bath gas is, the more stable the fluidity of the gas bath gas is, and when the fluctuation range takes a value of 0NL/min, the best flow stability of the gas bath gas is. For example, the flow rate of the gas bath may be 200NL/min, 220NL/min, or 250NL/min or other flow rate values within the above range, which is not limited by the embodiments of the present invention.
Alternatively, fig. 6 is a schematic structural view of the pressure-flow rate adjusting unit in fig. 5. Referring to fig. 6, the pressure-flow rate regulating unit 150 includes a pressure regulating valve 151 and a throttle valve 152; the pressure regulating valve 151 regulates the pressure of the gas, and the throttle valve 152 regulates the flow rate of the gas.
For example, the pressure regulating valve 151 may be a high purity pressure reducing valve, and the throttle valve 152 may be a high purity throttle valve, so that the gas bath gas is prevented from being contaminated by the pressure flow regulating unit 150, thereby ensuring high cleanliness of the gas bath gas. Illustratively, the cleanliness may be ISO Class 1.
It should be noted that the model or specification of the pressure regulating valve 151 and the throttle valve 152 may be selected according to the actual requirement of the reticle temperature control device, and the model or specification may be known to those skilled in the art, which is not limited in the embodiment of the present invention.
Optionally, with continued reference to fig. 2 and 5, the gas delivery unit 110 comprises a gas delivery line 111 and a filter cloth 112; the gas inlet 1111 of the gas transmission pipeline 111 is a gas inlet of the gas transmission unit 110, the gas outlet 1112 of the gas transmission pipeline 111 is a gas outlet 1112 of the gas transmission unit 110, the gas outlet 1112 of the gas transmission pipeline 111 is connected with the mask storage unit 130, and the flowing direction of the gas bath gas is parallel to the plane of the partition 132; the filter cloth 112 is fixed to the gas outlet 1112 of the gas delivery pipe 111.
Wherein, the gas bath gas in the gas transmission pipeline 111 is uniformly blown to each mask plate slot of the mask storage unit 130 after passing through the filter cloth 112; after the gas bath gas contacts the mask plate, heat exchange is carried out on the mask plate, and temperature control of the mask plate is achieved. By arranging the filter cloth 112, the uniform air outlet of the gas bath gas to each mask plate groove is favorably ensured, the uniform temperature of each mask plate groove in the mask storage unit 130 is favorably realized, and the uniformity of the temperature stability of each mask plate is favorably realized.
Optionally, the mesh number of the filter cloth 112 ranges from 300 meshes to 500 meshes.
With this arrangement, the filter cloth 112 can be used to filter impurities that may be introduced when the gas bath gas is transported in the gas transport line 111, which is advantageous to ensure the cleanliness of the gas bath gas entering the mask storage unit 130. Illustratively, the cleanliness of the gas bath gas, ISO Class1, can be maintained intact.
It should be noted that the cleanliness class of the gas bath gas is shown only in ISO14644-1 (international standard), but does not limit the mask temperature control device provided in the embodiment of the present invention. In other embodiments, other cleanliness class classification criteria may be used to characterize the cleanliness class of the gas bath, which is not limited in the examples of the present invention.
Alternatively, fig. 7 is a partial structural schematic view of the gas delivery unit of fig. 5. Referring to fig. 1 and 7, the gas delivery line 111 includes a main line 1113 and at least two branch lines 1114, and the number of the mask storage units 130 is at least two; the mask storage units 130 are provided in one-to-one correspondence with the branch pipes 1114.
The temperature range of the gas bath in the main pipeline 1113 is the same as the temperature range of the gas bath in the two branch pipelines 1114, and the temperature sensor 140 can be further arranged in the branch pipelines 1114.
It should be noted that fig. 1 and 7 each only exemplarily show that the number of the mask storage units 130 is 2, but the present invention is not limited to the mask blank temperature control device according to the embodiment of the present invention. In other embodiments, the number of the mask storage units 130 and the number of the branch pipes 1114 may be set adaptively according to the actual requirement of the mask plate temperature control device, which is not limited by the embodiment of the invention.
Optionally, with continued reference to fig. 7, gas delivery unit 110 further includes crossover sub 113, crossover sub 113 being connected at an interface of main conduit 1113 and at least two branch conduits 1114; crossover fitting 113 is configured to transfer gas from main conduit 1113 to at least two branch conduits 1114.
Wherein, the crossover sub is high-purity product to ensure that the gas bath gas is not contaminated, guarantee that the cleanliness factor of gas bath gas is not destroyed.
Optionally, the roughness of the inner sidewall of the gas transmission pipeline 111 is less than or equal to 0.3 μm.
The arrangement is such as to ensure that the gas bath gas is not polluted, namely to ensure that the cleanliness of the gas bath gas is not damaged.
Illustratively, the gas delivery line 111 may be fabricated using an electropolishing process. In addition, the gas transmission pipeline may also be processed by a process known to those skilled in the art, and the embodiment of the present invention is not described and limited herein.
Fig. 8 is an operational schematic diagram of the mask temperature control apparatus of fig. 5. Referring to fig. 5 and 8, the piping in the reticle temperature control apparatus 10 may be divided into a water path (a water flow direction is shown by a dotted line with arrows in fig. 8) and a gas path (a gas flow direction is shown by a realization with arrows in fig. 8). The waterway provides circulating cooling water (with the temperature of 22 ℃) from the environment, and a leakage detection sensor 160 is arranged on the waterway path of the circulating cooling water so as to detect the leakage condition of the circulating cooling water in real time. Then the circulating cooling water enters the heat exchanger, and the cooling water flowing out of the heat exchanger returns to the environmental cooling water recovery port. The gas path has environment for providing gas bath gas, the temperature is 22 +/-0.1 ℃, and the cleanliness is ISO Class 1; the gas bath gas and the circulating cooling water flow in opposite directions to enter a heat exchanger, the gas bath gas flowing out of the heat exchanger is introduced into an electropolished gas transmission pipeline, the gas bath gas is transmitted to a mask plate groove in a mask storage unit through the gas transmission pipeline, the temperature of the gas bath gas is stable after heat exchange of the circulating cooling water (for example, 22 +/-0.05 ℃), and the gas bath gas with the stable temperature exchanges heat with a mask plate stored in the mask plate groove, so that the temperature of the mask plate is controlled to a required value (for example, 22 +/-0.1 ℃).
Wherein, a pressure regulating valve 151 and a throttle valve 152 can be arranged at the air inlet of the gas transmission pipeline to regulate the pressure and the flow of the gas bath gas; correspondingly, a pressure sensor 170 may also be provided in the gas delivery line to detect the pressure of the gas bath gas. The air inlet of the mask plate groove can be provided with a temperature sensor 140 to measure the air inlet temperature of the gas bath, and the air inlet of the mask plate groove can be provided with a gas bath gas sampling interface 180 to sample the gas bath gas and measure the parameters of cleanliness, pressure and the like.
Illustratively, fig. 9 is a graph of simulation results of gas bath flow field distribution of the reticle temperature control apparatus provided in fig. 5. Referring to fig. 9, the gas bath gas flows through the mask plate 20 in a substantially laminar flow, so that the gas bath gas has a good heat exchange effect with the mask plate 20.
In fig. 8, only the leakage detection sensor 160 is provided in the water inlet pipe 123, but the mask temperature control device according to the embodiment of the present invention is not limited thereto. In other embodiments, the leakage detection sensor 160 may also be disposed on the water outlet line 124, which is not limited by the embodiment of the present invention.
The embodiment of the invention also provides a mask exposure device which comprises any one of the mask plate temperature control devices. Therefore, the lithographic apparatus has the technical effects of the above mask plate temperature control apparatus, which can be understood with reference to the above description and will not be described in detail hereinafter.
Exemplarily, the lithographic apparatus may further comprise an illumination unit, a mask unit, a projection objective and a carrier unit; the illuminating unit is used for outputting light, the mask unit is used for bearing a mask plate with stable temperature, the bearing unit is used for bearing a sample to be exposed, and the projection objective projects the light onto the sample to be exposed so as to expose the poplars to be exposed. The mask plate is stored in the mask storage unit of the mask plate temperature control device, and as the control difficulty of the mask plate temperature is reduced, the mask plate temperature precision is improved, and the mask plate time is shortened, so that the photoetching resolution is improved, and the photoetching yield is improved.
It should be noted that the lithographic apparatus provided in the embodiments of the present invention may also include other components or parts known to those skilled in the art, which are not described or limited herein.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (14)
1. A mask plate temperature control apparatus, comprising: the mask storage unit is used for storing a mask;
the gas conveying unit is used for conveying gas bath gas to the mask storage unit, and the gas temperature control unit is used for adjusting the temperature change range of the gas bath gas transmitted to the mask storage unit by the gas conveying unit to a preset temperature range;
the mask storage unit comprises a plate frame main body and clapboards, wherein the clapboards are fixed in the plate frame main body, an accommodating space is formed between every two adjacent clapboards, and the accommodating space is used for accommodating a mask plate; the partition plate is of a straight plate structure;
the plate frame main body comprises a bottom surface, a top surface and a side surface; the side surface is a surface into which gas bath gas is blown, and the flowing direction of the gas bath gas after entering the mask storage unit is parallel to the bottom surface and the top surface;
the mask storage unit is only subjected to gas bath gas in one horizontal direction;
the gas temperature control unit comprises a heat exchanger which is arranged in a transmission path of the gas conveying unit;
the heat exchanger is used for stabilizing the temperature of the gas transmitted by the gas transmission unit to a first temperature threshold range;
the mask plate temperature control device also comprises a temperature sensor; the temperature sensor is arranged in the gas conveying unit and is positioned between the gas temperature control unit and a gas outlet of the gas conveying unit;
the heat exchanger is a shell-and-tube heat exchanger;
the shell-and-tube heat exchanger is communicated with heat transfer fluid, and the flow direction of the heat transfer fluid is opposite to the conveying direction of the gas in the gas conveying unit.
2. The mask blank temperature control apparatus according to claim 1, wherein the mask storage unit further includes a mask supporter;
a plurality of mask supporting pieces are respectively arranged on the bearing surface of each partition plate;
the mask support is used for supporting a mask plate placed in the accommodating space and fixing the partition plate.
3. The mask blank temperature control apparatus according to claim 2, wherein the mask support member includes a connector and a cylindrical support body; the plate frame main body comprises an auxiliary fixing platform;
the first end of the connecting piece is fixedly connected with the auxiliary fixing platform, a fixed gap is arranged between the second end of the connecting piece and the table top of the auxiliary fixing platform, and the fixed gap is used for fixing the partition board;
one end of the cylindrical support body is arranged on one side, away from the auxiliary fixing platform fixed with the connecting piece, of the connecting piece, and the other end of the cylindrical support body is used for supporting the mask plate.
4. The mask blank temperature control apparatus according to claim 3, wherein the side of the spacer is clamped and fixed by the fixing gap.
5. The mask blank temperature control apparatus according to claim 1, wherein the preset temperature threshold range is 22 ± 0.05 ℃.
6. The mask plate temperature control device according to claim 1, further comprising a pressure flow rate adjusting unit provided at an air inlet of the gas delivery unit;
the pressure and flow regulating unit is used for regulating the pressure of the gas to a preset pressure threshold value and regulating the flow of the gas to a preset flow threshold value.
7. The mask blank temperature control apparatus according to claim 6, characterized in that:
the range of the preset pressure threshold is 1.7Bar-5 Bar;
the preset flow threshold value ranges from 200NL/min to 500 NL/min.
8. The mask blank temperature control apparatus according to claim 6, wherein the pressure flow rate adjusting unit includes a pressure regulating valve and a throttle valve;
the pressure regulating valve is used for regulating the pressure of the gas, and the throttle valve is used for regulating the flow of the gas.
9. The mask plate temperature control device according to claim 1, wherein the gas delivery unit comprises a gas delivery line and a filter cloth;
the gas inlet of the gas transmission pipeline is the gas inlet of the gas transmission unit, the gas outlet of the gas transmission pipeline is the gas outlet of the gas transmission unit, the gas outlet of the gas transmission pipeline is connected with the mask storage unit, and the flowing direction of the gas bath gas is parallel to the plane where the partition plate is located;
the filter cloth is fixed at the gas outlet of the gas transmission pipeline.
10. The mask plate temperature control device according to claim 9, wherein the filter cloth has a mesh number in a range of 300-500 meshes.
11. The mask plate temperature control device according to claim 9, wherein the gas transmission pipeline comprises a main pipeline and at least two branch pipelines, and the number of the mask storage units is at least two; the mask storage units are arranged in one-to-one correspondence with the branch pipelines.
12. The mask plate temperature control device according to claim 11, wherein the gas conveying unit further comprises a crossover sub connected at an interface of the main pipeline and the at least two branch pipelines;
the adapter is used for transmitting the gas in the main pipeline to the at least two branch pipelines.
13. The reticle temperature control device of claim 11, wherein the roughness of the inner side walls of the gas delivery conduits is less than or equal to 0.3 μ ι η.
14. A mask exposure apparatus comprising the mask blank temperature control apparatus according to any one of claims 1 to 13.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910409932.4A CN111948907B (en) | 2019-05-16 | 2019-05-16 | Mask plate temperature control device and mask exposure device |
| TW109105198A TWI772750B (en) | 2019-05-16 | 2020-02-18 | Mask temperature control device and mask exposure device |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910409932.4A CN111948907B (en) | 2019-05-16 | 2019-05-16 | Mask plate temperature control device and mask exposure device |
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| CN111948907A CN111948907A (en) | 2020-11-17 |
| CN111948907B true CN111948907B (en) | 2022-01-28 |
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Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1424627A (en) * | 2001-12-06 | 2003-06-18 | 株式会社尼康 | Exposure method and device |
| JP3552600B2 (en) * | 1998-07-13 | 2004-08-11 | 東京エレクトロン株式会社 | Substrate processing equipment |
| KR100825967B1 (en) * | 2006-11-03 | 2008-04-29 | (주)리드 | Interface unit, substrates treating apparatus and substrates temperature control method using the same |
| CN101288157A (en) * | 2005-10-11 | 2008-10-15 | 东京毅力科创株式会社 | Substrate processing apparatus and substrate processing method |
| TW201141768A (en) * | 2010-05-19 | 2011-12-01 | He zhong shan | Method of reducing photomask pollution and photomask storage device thereof |
| CN104152847A (en) * | 2014-07-16 | 2014-11-19 | 上海和辉光电有限公司 | Method for improving temperature stability of metal mask in OLED evaporation process |
| CN107664263A (en) * | 2016-07-29 | 2018-02-06 | 上海微电子装备（集团）股份有限公司 | A kind of gas bath device and control method and application |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6916398B2 (en) * | 2001-10-26 | 2005-07-12 | Applied Materials, Inc. | Gas delivery apparatus and method for atomic layer deposition |
| US11637002B2 (en) * | 2014-11-26 | 2023-04-25 | Applied Materials, Inc. | Methods and systems to enhance process uniformity |
| US10147655B2 (en) * | 2016-03-22 | 2018-12-04 | Tokyo Electron Limited | System and method for temperature control in plasma processing system |
| KR102306567B1 (en) * | 2017-05-18 | 2021-09-30 | 어플라이드 머티어리얼스, 인코포레이티드 | Thermal chamber with improved thermal uniformity |
-
2019
- 2019-05-16 CN CN201910409932.4A patent/CN111948907B/en active Active
-
2020
- 2020-02-18 TW TW109105198A patent/TWI772750B/en active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3552600B2 (en) * | 1998-07-13 | 2004-08-11 | 東京エレクトロン株式会社 | Substrate processing equipment |
| CN1424627A (en) * | 2001-12-06 | 2003-06-18 | 株式会社尼康 | Exposure method and device |
| CN101288157A (en) * | 2005-10-11 | 2008-10-15 | 东京毅力科创株式会社 | Substrate processing apparatus and substrate processing method |
| KR100825967B1 (en) * | 2006-11-03 | 2008-04-29 | (주)리드 | Interface unit, substrates treating apparatus and substrates temperature control method using the same |
| TW201141768A (en) * | 2010-05-19 | 2011-12-01 | He zhong shan | Method of reducing photomask pollution and photomask storage device thereof |
| CN104152847A (en) * | 2014-07-16 | 2014-11-19 | 上海和辉光电有限公司 | Method for improving temperature stability of metal mask in OLED evaporation process |
| CN107664263A (en) * | 2016-07-29 | 2018-02-06 | 上海微电子装备（集团）股份有限公司 | A kind of gas bath device and control method and application |
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| Publication number | Publication date |
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| TW202043937A (en) | 2020-12-01 |
| TWI772750B (en) | 2022-08-01 |
| CN111948907A (en) | 2020-11-17 |
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