CN104316104A - Photolithography projection objective lens internal chamber high-precision gas measuring device - Google Patents
Photolithography projection objective lens internal chamber high-precision gas measuring device Download PDFInfo
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- CN104316104A CN104316104A CN201410512413.8A CN201410512413A CN104316104A CN 104316104 A CN104316104 A CN 104316104A CN 201410512413 A CN201410512413 A CN 201410512413A CN 104316104 A CN104316104 A CN 104316104A
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Abstract
The invention relates to a photolithography projection objective lens internal chamber high-precision gas measuring device and belongs to the photolithography projection objective lens control field. With the photolithography projection objective lens internal chamber high-precision gas measuring device adopted, detection on the pressure and temperature of high-precision gas in the internal chamber of a lithographic projection objective lens can be realized. The photolithography projection objective lens internal chamber high-precision gas measuring device of the invention comprises temperature sensors, a relative pressure sensor, an absolute pressure sensor, a gas splitting block, a safety valve, an electric level conversion circuit and a VCR gas joint; a plurality of temperature sensors are distributed in the photolithography projection objective lens; a gas collection opening of the photolithography projection objective lens is connected with a gas inlet of the gas splitting block through a transmission pipeline; three gas outlets of the gas splitting block are respectively connected with the relative pressure sensor, the absolute pressure sensor and the safety valve; the gas exiting end of the safety valve is connected with the VCR gas joint through a gas pipe; and the electric level conversion circuit converts analog signals acquired by the temperature sensors, the relative pressure sensor and the absolute pressure sensor into digital signals, and transmits the digital signals to an environment control cabinet.
Description
Technical field
The invention belongs to photoetching projection objective lens control field, be specifically related to a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism.
Background technology
Photoetching projection objective lens is a kind of ultra-precise optical system, is the core component in litho machine, and it is the key affecting photolithography resolution and live width.Along with the raising of lithographic accuracy, to the requirement of environment as the requirement to environment temperature, air pressure, cleanliness factor etc., also more and more harsher.There is a large amount of thermals source and comprise various motor and excimer laser etc. in object lens inside, the change of temperature can cause object lens position of focal plane to change and affect the image quality of object lens, projection objective inside needs sealed chamber simultaneously, and be full of high-purity, clean nitrogen and prevent air from entering projection objective internal contamination optical mirror slip, and need the information such as temperature, pressure of monitoring object lens internal chamber nitrogen in real time.
The temperature environment of projection objective internal chamber is about 22 DEG C.At present, for 193nm LASER Light Source, by not having emulation experiment to the objective system hot dipping of 10 groups of varying environment temperature of environment temperature within the scope of 21.5 DEG C ~ 22.5 DEG C, draw when object lens internal chamber variation of ambient temperature about 0.01 DEG C, wave aberration maximum change 0.12nm, multiplying power maximum change 0.4ppm, distort maximum change 0.09nm.Therefore require that the absolute precision to object lens internal air temperature is measured reaches 0.01 DEG C ~ 0.05 DEG C, repeatable accuracy reaches 0.005 DEG C/5min;
The air pressure of projection objective internal chamber is about: 750mbar ~ 1050mbar.At present, for 193nm LASER Light Source, according to the result of optical design and simulation analysis, the relation of multiplying power and air pressure is about: air pressure change 100pa, air pressure change 76pa during multiplying power change 0.5ppm when multiplying power changes 0.64ppm.Multiplying power and air pressure are approximately linear relationship within the scope of this.And the degree of regulation of multiplying power is 0.1ppm (PV), therefore require that the absolute precision that pressure transducer is measured is better than 15pa (PV).
In order to temperature, the pressure information of Real-Time Monitoring projection objective internal chamber key point; meet high-precision measurement requirement; and provide closed loop environmental parameter feedback information to projection objective environmental control system, and when object lens internal chamber air pressure change is excessive, responds fast, overvoltage is protected.Therefore, a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism is needed.
Summary of the invention
The object of the invention is to propose a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism, realize the detection of the pressure and temperature to photoetching projection objective lens internal chamber high-precision gas.
For achieving the above object, a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism of the present invention comprises temperature sensor, relative pressure sensor, absolute pressure transducer, point air parcel, safety valve, level shifting circuit and VCR gas connection;
Multiple temperature sensor is distributed in photoetching projection objective lens inside, described photoetching projection objective lens gas production mouth is connected by the air intake opening of transfer conduit with described point of air parcel, three gas outlets of described point of air parcel are connected with relative pressure sensor, absolute pressure transducer and safety valve respectively, and described safety valve outlet side is connected with VCR gas connection by tracheae;
The simulating signal that temperature sensor, relative pressure sensor and absolute pressure transducer collect is converted into digital signal by described level shifting circuit, and by described digital data transmission to environmental Kuznets Curves cabinet.
Described multiple temperature sensor is at least 3, be arranged in photoetching projection objective lens upper, in and lower part.
Described temperature sensor is thermistor class temperature sensor, platinum resistance class temperature sensor or thermopair class temperature sensor.
Described photoetching projection objective lens gas production mouth to be connected with the air intake opening of described point of air parcel by transfer conduit and to be specially: the air intake opening end of described point of air parcel is connected with VCR gas connection by high-purity gas pipeline, and VCR gas connection is connected with gas production mouth on projection objective by tracheae.
The span of the length D of described tracheae is: 1m≤D≤3m.
The positive pressure side of described relative pressure sensor is connected by the gas outlet end of gas piping with point air parcel, and negative pressure end is communicated with atmospheric environment, and the electric output terminal of relative pressure sensor is connected with level shifting circuit by transmission cable.
Described absolute pressure transducer is connected by the gas outlet end of gas piping with point air parcel, and the electric output terminal of absolute pressure transducer is connected with level shifting circuit by transmission cable.
The span of the distance d of described level shifting circuit and environmental Kuznets Curves cabinet is: 10m≤d≤15m.
Beneficial effect of the present invention is: a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism of the present invention carries out high-acruracy survey for the temperature of photoetching projection objective lens internal gas, relative pressure, absolute pressure information respectively, and by level shifting circuit, level conversion is carried out to the information that part collects, the long-distance transmissions that the ambient parameter information of object lens internal gas can be can't harm, to environmental Kuznets Curves cabinet, provides closed loop environmental parameter feedback information to projection objective environmental control system; In addition, a gas outlet end of point air parcel is connected with safety valve, and the outlet side of described safety valve is connected with VCR gas connection by gas piping, once object lens internal pressure is too high, safety valve unlatching, by VCR gas connection by pressure vent to atmospheric environment.When object lens internal chamber air pressure change is excessive, responds fast, overvoltage is protected.
Accompanying drawing explanation
Fig. 1 is a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism structural representation of the present invention;
Wherein: 1, photoetching projection objective lens, 2, temperature sensor, 3, VCR gas connection, 4, point air parcel, 5, relative pressure sensor, 6, absolute pressure transducer, 7, safety valve, 8, level shifting circuit, 9, tracheae, 10, environmental Kuznets Curves cabinet.
Embodiment
Below in conjunction with accompanying drawing, embodiments of the present invention are described further.
See accompanying drawing 1, a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism of the present invention comprises temperature sensor 2, relative pressure sensor 5, absolute pressure transducer 6, point air parcel 4, safety valve 7, level shifting circuit 8 and VCR gas connection 3;
3 temperature sensors 2 are distributed in photoetching projection objective lens 1 inside, be arranged in photoetching projection objective lens 1 upper, in and lower part, for monitoring the gas temperature of object lens internal chamber different layers, described photoetching projection objective lens 1 gas production mouth is connected by the air intake opening of transfer conduit with described point of air parcel 4, three gas outlets of described point of air parcel 4 are connected with relative pressure sensor 5, absolute pressure transducer 6 and safety valve 7 respectively, and described safety valve 7 outlet side is connected with VCR gas connection 3 by tracheae 9;
The simulating signal that temperature sensor 2, relative pressure sensor 5 and absolute pressure transducer 6 collect is converted into digital signal by described level shifting circuit 8, and by described digital data transmission to environmental Kuznets Curves cabinet 10.
Described temperature sensor 2 is thermistor class temperature sensor, platinum resistance class temperature sensor or thermopair class temperature sensor.
Described photoetching projection objective lens 1 gas production mouth to be connected with the air intake opening of described point of air parcel 4 by transfer conduit and to be specially: the air intake opening end of described point of air parcel 4 is connected with VCR gas connection 3 by high-purity gas pipeline, and VCR gas connection 3 is connected with gas production mouth on projection objective 1 by tracheae 9.
The span of the length D of described tracheae 9 is: 1m≤D≤3m.
The positive pressure side of described relative pressure sensor 5 is connected by the gas outlet end of gas piping with point air parcel 4, and negative pressure end is communicated with atmospheric environment, and the electric output terminal of relative pressure sensor 5 is connected with level shifting circuit 8 by transmission cable.
Described absolute pressure transducer 6 is connected by the gas outlet end of gas piping with point air parcel 4, and the electric output terminal of absolute pressure transducer 6 is connected with level shifting circuit 8 by transmission cable.
Described level shifting circuit 8 with the span of the distance d of environmental Kuznets Curves cabinet 10 is: 10m≤d≤15m.
Be more than the specific embodiment of the present invention, but limitation of the present invention absolutely not.Persond having ordinary knowledge in the technical field of the present invention, without departing from the spirit and scope of the present invention, any change or simply replace, all belongs to protection scope of the present invention.
Claims (8)
1. a photoetching projection objective lens internal chamber high-precision gas measurement mechanism, it is characterized in that, comprise temperature sensor (2), relative pressure sensor (5), absolute pressure transducer (6), point air parcel (4), safety valve (7), level shifting circuit (8) and VCR gas connection (3);
It is inner that multiple temperature sensor (2) is distributed in photoetching projection objective lens (1), described photoetching projection objective lens (1) gas production mouth is connected by the air intake opening of transfer conduit with described point of air parcel (4), three gas outlets of described point of air parcel (4) are connected with relative pressure sensor (5), absolute pressure transducer (6) and safety valve (7) respectively, and described safety valve (7) outlet side is connected with VCR gas connection (3) by tracheae (9);
The simulating signal that temperature sensor (2), relative pressure sensor (5) and absolute pressure transducer (6) collect is converted into digital signal by described level shifting circuit (8), and by described digital data transmission to environmental Kuznets Curves cabinet (10).
2. a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism according to claim 1, it is characterized in that, described multiple temperature sensor (2) is at least 3, be arranged in photoetching projection objective lens (1) upper, in and lower part.
3. a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism according to claim 1 and 2, it is characterized in that, described temperature sensor (2) is thermistor class temperature sensor, platinum resistance class temperature sensor or thermopair class temperature sensor.
4. a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism according to claim 1, it is characterized in that, described photoetching projection objective lens (1) gas production mouth to be connected with the air intake opening of described point of air parcel (4) by transfer conduit and to be specially: the air intake opening end of described point of air parcel (4) is connected with VCR gas connection (3) by high-purity gas pipeline, and VCR gas connection (3) is gone up gas production mouth by tracheae (9) and photoetching projection objective lens (1) and is connected.
5. a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism according to claim 4, it is characterized in that, the span of the length D of described tracheae (9) is: 1m≤D≤3m.
6. a kind of photoetching projection objective lens (1) internal chamber high-precision gas measurement mechanism according to claim 1, it is characterized in that, the positive pressure side of described relative pressure sensor (5) is connected by the gas outlet end of gas piping with point air parcel (4), negative pressure end is communicated with atmospheric environment, and the electric output terminal of relative pressure sensor (5) is connected with level shifting circuit (8) by transmission cable.
7. a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism according to claim 1, it is characterized in that, described absolute pressure transducer (6) is connected by the gas outlet end of gas piping with point air parcel (4), and the electric output terminal of absolute pressure transducer (6) is connected with level shifting circuit (8) by transmission cable.
8. a kind of photoetching projection objective lens internal chamber high-precision gas measurement mechanism according to claim 1, it is characterized in that, described level shifting circuit (8) with the span of the distance d of environmental Kuznets Curves cabinet (10) is: 10m≤d≤15m.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201410512413.8A CN104316104A (en) | 2014-09-28 | 2014-09-28 | Photolithography projection objective lens internal chamber high-precision gas measuring device |
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| CN201410512413.8A CN104316104A (en) | 2014-09-28 | 2014-09-28 | Photolithography projection objective lens internal chamber high-precision gas measuring device |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN105137719A (en) * | 2015-09-21 | 2015-12-09 | 中国科学院长春光学精密机械与物理研究所 | Gas supply device and photoetching projection objective provided with same |
| CN105301956A (en) * | 2015-11-20 | 2016-02-03 | 中国科学院长春光学精密机械与物理研究所 | Control method of pneumatic optic deformable mirror system |
| WO2020173254A1 (en) * | 2019-02-28 | 2020-09-03 | 上海微电子装备（集团）股份有限公司 | Objective lens device |
| CN112578640A (en) * | 2019-09-29 | 2021-03-30 | 上海微电子装备（集团）股份有限公司 | Gas supply device and photoetching equipment |
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| CN112578640A (en) * | 2019-09-29 | 2021-03-30 | 上海微电子装备（集团）股份有限公司 | Gas supply device and photoetching equipment |
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Application publication date: 20150128 |