CN106569394B - Mask apparatus for shaping - Google Patents
Mask apparatus for shaping Download PDFInfo
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- CN106569394B CN106569394B CN201510647164.8A CN201510647164A CN106569394B CN 106569394 B CN106569394 B CN 106569394B CN 201510647164 A CN201510647164 A CN 201510647164A CN 106569394 B CN106569394 B CN 106569394B
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- mask
- shaping
- hollow structure
- gas circuit
- shaping frame
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Abstract
The present invention relates to a kind of mask apparatus for shaping, and including shaping frame, shaping glass, vacuum suction gas circuit and Isobarically Control gas circuit, shaping frame is located above mask edge, and connects mask platform by several elastomeric elements；Shaping frame mid portion is hollow structure, and the hollow structure is corresponding with mask；The fixation of shaping glass is covered on the hollow structure of shaping frame；Vacuum suction gas circuit is connected with the junction of shaping frame and mask platform, and by pumping and air inlet, control shaping frame is contacting and separating with mask；Shaping frame is contacted with mask so that hollow structure is sealed, and Isobarically Control gas circuit is connected with hollow structure, by the air pressure constant being evacuated in the hollow structure sealed with air inlet control, compensates deformation of the mask by dead weight generation.The fixation of mask apparatus for shaping of the present invention and the closed of hollow structure do not increase additional mechanical structure, reduce complete machine integration complexity by vacuum suction mode, avoid the particle contamination problems that phase mutual friction between structure is brought.
Description
Technical field
The present invention relates to lithographic equipment field more particularly to a kind of mask shaping dresses for being used to compensate mask deformation induced by gravity
It puts.
Background technology
With the increase of thin film transistor (TFT) (TFT, English full name Thin Film Transistor) substrate size, TFT light
Quarter, the size of machine mask plate also accordingly increased, and by 6 cun of initial mask plates, into 5.5 generation TFT light science and technology, mask board size is
It is even more to have reached surprising 1320mm × 1108mm to 8.5 generation mask board sizes up to 920mm × 800mm.So " huge " is covered
Template is adsorbed in mask platform, inevitably will be by its effect of weight, in vertical generation deformation (up to more than 40um), such as
Shown in Fig. 1.For 5.5 advanced lines TFT lithographic equipments more than generation, more camera lens splicings (such as Nikon) or ultra-large vision field are (such as
Canon) technology has been inexorable trend, wherein, the flexure of mask has exposure accuracy strong influence, and special extreme influence is thrown
The focal depth range of shadow object lens makes image quality be difficult to be guaranteed.
At present, have it is a kind of in object lens add in adjust object plane mechanism, to adapt to the deformation induced by gravity of mask plate, using as
Correct the mask holding meanss of mask flexure, but this undoubtedly can make objective lens design become sufficiently complex, while introduce it is excessive can
Dynamic element certainly will be unfavorable for the reliability of complete machine.
In addition, the device of mask deformation induced by gravity is compensated in also a kind of advanced lines TFT scan projection aligners, such as Fig. 2 institutes
Show, chuck 2, the plug hatch 4 of 1 top of mask and the manipulator 8 of both sides including carrying mask 1,4 lower section of plug hatch is set
There is rectangular seal 5, for the confined space formed between plug hatch 4 and mask 1, this scheme is mainly by pneumatic
Control system vacuumizes the confined space, forms certain negative pressure, so as to compensate 1 gravity deformation of mask.This shaping fills
It puts when being integrated into complete machine, plug hatch 4 is moved along Z-direction is (vertical) to facilitate 1 changing plate of mask in order to control, in mask platform
Upper there is provided lifting, fixing device and manipulators, this not only increases weight loading, and 1 top of mask in complete machine to mask platform
Space it is limited, manipulator 8 and the realization that lifting gear integrates are more difficult, these devices also can carry certain vibrations, influence
Image quality；In addition, hook 3 on chuck 2 and the vertical snap fastener 6 on plug hatch 4 and horizontal direction snap fastener 7
With reference to be using mechanical snap-in structure mode, as best shown in figures 3 a and 3b, hook 3 from opening or groove 9 with snap fastener
Engaging or when being detached from, certainly will there are certain frictions, it will particle is caused to generate, so as to be polluted to mask 1.
Invention content
The present invention provides a kind of mask apparatus for shaping, to solve above-mentioned technical problem.
In order to solve the above technical problems, the present invention provides a kind of mask apparatus for shaping, above mask platform, for mending
The deformation that mask is generated by dead weight is repaid, described device includes shaping frame, shaping glass, vacuum suction gas circuit and Isobarically Control gas
Road, wherein,
The shaping frame is located above the mask edge, and connects the mask platform by several elastomeric elements；
The shaping frame mid portion is hollow structure, and the hollow structure is corresponding with the mask；
The shaping glass fixation is covered on the hollow structure of the shaping frame, for light transmission；
The vacuum suction gas circuit is connected with the junction of the shaping frame and the mask platform, by pumping and into
Gas controls the shaping frame to be contacting and separating with the mask；
The shaping frame is contacted with the mask so that the hollow structure is sealed, the Isobarically Control gas circuit and institute
Hollow structure connection is stated, by the air pressure constant being evacuated in the hollow structure sealed with air inlet control, compensates the mask
The deformation generated by dead weight.
Preferably, the shaping frame is fixedly connected with the shaping glass by structure glue.
Preferably, the elastomeric element uses rubber.
Preferably, vacuum suction pipeline is equipped in the mask platform, the vacuum suction pipeline one end and the shaping frame
It is connected with the junction of the mask platform, the other end is connected with the vacuum suction gas circuit.
Preferably, the vacuum suction gas circuit includes first pressure sensor and the first solenoid valve, the first pressure passes
Sensor is set in the vacuum suction pipeline, and for detecting air pressure, first solenoid valve includes fixing end and two selections
End, the fixing end are connected with the vacuum suction pipeline, and two selection ends are respectively used to pumping and air inlet, described in two
Selection end is connected separately with the first pressure reducing valve, for controlling rate of air sucked in required and air inflow.
Preferably, being equipped with Isobarically Control pipeline in the mask platform, which passes through the shaping frame
Frame is connected with the hollow structure, and the other end is connected with the Isobarically Control gas circuit.
Preferably, the Isobarically Control gas circuit includes sequentially connected second pressure reducing valve, gas mass flow controller, the
Two solenoid valves and second pressure sensor, the second pressure sensor is set in the Isobarically Control pipeline, for visiting
Air pressure is surveyed, the second solenoid valve includes fixing end and two selection ends, and the fixing end is connected with the Isobarically Control pipeline,
Two selection ends are respectively used to pumping and air inlet, and second pressure reducing valve controls air inflow.
Preferably, the mask apparatus for shaping is also associated with transmission mechanism, it is whole which is used for transmission the mask
Shape dress is put and the mask.
Compared with prior art, a kind of mask apparatus for shaping provided by the invention has the following advantages that：
1st, the fixation of mask apparatus for shaping is by vacuum suction mode, this power is the internal force of mask platform, not to mask platform
Increase additional weight loading and other mechanical structures, while reduce complete machine integration complexity；
2nd, mask and shaping frame, shaping frame form confined space after being combined with shaping glass surface face, the confined space
It is to be formed by the adsorption capacity for contacting shaping frame with mask, without additional mechanism；
3rd, vacuum suction gas circuit and Isobarically Control gas circuit are introduced by mask platform, without pneumatic, electricity on mask apparatus for shaping
Cable etc., facilitates its transmission, and mask apparatus for shaping can share a set of transmission mechanism with mask；
4th, mask is combined with shaping frame surface face, and the adsorption capacity of fixed shaping frame is applied on mask, scanned
Additional fixed function is played in journey to mask；
5th, the integrated of mask apparatus for shaping is not applied to mechanical structure, there is no friction, therefore will not generate particle contamination
Problem；
6th, it is connected between shaping frame and mask platform by elastomeric element, meets the whole of mask there are thickness error
Shape.
Description of the drawings
Fig. 1 is the schematic diagram that mask is generated vertical deformation by effect of weight；
Fig. 2 is the structure diagram of existing mask apparatus for shaping；
Fig. 3 a and 3b are respectively the structure diagram that hook engages with snap fastener in existing mask apparatus for shaping；
Fig. 4 a are the structure diagram (original state) of the mask apparatus for shaping of an embodiment of the present invention；
Fig. 4 b are the structure diagram (adsorbed state) of the mask apparatus for shaping of an embodiment of the present invention；
Schematic diagrams of the Fig. 5 for vacuum suction gas circuit in the mask apparatus for shaping of an embodiment of the present invention；
Schematic diagrams of the Fig. 6 for Isobarically Control gas circuit in the mask apparatus for shaping of an embodiment of the present invention；
Fig. 7 a are the deformation induced by gravity emulation schematic diagram of TFT5.5 masks before shaping；
Fig. 7 b be using the present invention be masked it is deformation-compensated after deformation induced by gravity emulation schematic diagram.
In figure：1- masks, 2- chucks, 3- hooks, 4- plug hatch, 5- rectangular seals, the vertical snap fasteners of 6-, 7- water
It puts down to snap fastener, 8- manipulators, 9- grooves；
10- shapings frame, 20- shapings glass, 21- hollow structures, 30- mask platforms, 40- masks, 50- elastomeric elements, 61-
Vacuum suction pipeline, 62- Isobarically Control pipelines；
The first solenoid valves of 71-, 72- first pressure sensors, the first pressure reducing valves of 73-；
The second pressure reducing valves of 81-, 82- gas mass flow controllers, 83- second solenoid valves, 84- second pressures sensor,
85- capillaries.
Specific embodiment
In order to more state the technical solution of foregoing invention in detail, being exemplified below specific embodiment proves that technology is imitated
Fruit；It is emphasized that these embodiments are not limited to limit the scope of the invention for illustrating the present invention.
A kind of mask apparatus for shaping provided by the invention, above mask platform 30, for compensating mask 40 by conducting oneself with dignity
The deformation of generation, as shown in fig. 4 a, described device include shaping frame 10, shaping glass 20, vacuum suction gas circuit and constant pressure control
Gas circuit processed.The shaping frame 10 is located above 40 edge of mask, and is passed through several elastomeric elements 50 and connected the mask
Platform 30, specifically, the elastomeric element 50 in the present embodiment is rubber.10 middle part of the shaping frame is hollow structure 21, in this
Hollow structure 21 is corresponding with the mask 40.The shaping glass 20 fixes the hollow structure 21 for covering at the shaping frame 10
On, for light transmission, specifically, the illuminating bundle in exposure device is transmitted through the mask platform 30 from the shaping glass 20 and carries
Mask 40 on, and most mask 40 is imaged in work stage and substrate at last.
With continued reference to Fig. 4 a, the vacuum suction gas circuit connects with the junction of the shaping frame 10 and the mask platform 30
It is logical, by pumping and air inlet, the shaping frame 10 is controlled to be contacting and separating with the mask 40.Preferably, the mask platform
Vacuum suction pipeline 61,61 one end of vacuum suction pipeline and the shaping frame 10 and the company of the mask platform 30 are equipped in 30
Place's connection is connect, the other end is connected with the vacuum suction gas circuit.
Specifically, with reference to figure 4a, during original state between the upper surface of mask 40 and the lower surface of the shaping frame 10
Have a certain distance, the two does not contact, when vacuum suction gas circuit by vacuum suction pipeline 61 carry out pump drainage work, due to suction
Effect, 10 times elastic members of shaping frame 50 so that shaping frame 10 moves downward, and is connect with the upper surface of the mask 40
It touches, at this time the hollow structure 21 between the upper surface of the side of shaping frame 10, the lower surface of shaping glass 20 and mask 40
It is sealed, asks emphasis with reference to figure 4b.
With continued reference to Fig. 4 b, the hollow structure 21 is connected with the Isobarically Control gas circuit, and the Isobarically Control gas circuit is led to
The air pressure constant in the hollow structure 21 of pumping and air inlet control sealing is crossed, compensates the deformation that the mask 40 is generated by dead weight.
Preferably, Isobarically Control pipeline 62 is equipped in the mask platform 30, which passes through the shaping frame
10 connect with the hollow structure 21, and the other end is connected with the Isobarically Control gas circuit.It is adjusted using Isobarically Control gas circuit closed
Hollow structure 21 in pressure, you can realize the shaping to mask 40, and for the mask 40 of different size and weight, all
Problem on deformation caused by conducting oneself with dignity due to mask 40 can be avoided by adjusting the pressure value in hollow structure 21.
Preferably, the shaping frame 10 is fixedly connected with the shaping glass 20 by structure glue, by shaping frame 10
An entirety is fixed as with shaping glass 20；Simultaneously, additionally it is possible to realize sealing, it is ensured that the leakproofness of hollow structure 21.
Preferably, asking emphasis, with reference to figure 5, the vacuum suction gas circuit includes the first solenoid valve 71 and first pressure sensor
72, the first pressure sensor 72 is set in the vacuum suction pipeline 61, to detect mask platform 30 to shaping frame 10
Adsorption capacity, first solenoid valve 71 includes fixing end and two selection ends, the fixing end and the vacuum suction pipeline
61 connections, two selection ends are respectively used to pumping and air inlet, preferably, two selection ends are connected separately with the first pressure reducing valve
73, for controlling rate of air sucked in required and air inflow.Break-make by the selection end for controlling the first solenoid valve 71, controls vacuum suction gas circuit
It is that shaping frame 10 is adsorbed or discharged.
Preferably, asking emphasis, with reference to figure 6, the Isobarically Control gas circuit includes sequentially connected second pressure reducing valve 81, gas
Mass flow controller 82, second solenoid valve 83 and second pressure sensor 84, the second pressure sensor 84 are set to
In the Isobarically Control pipeline 62, atmospheric pressure value is detected, the second solenoid valve 83 includes fixing end and two selection ends, described solid
Fixed end is connected with the Isobarically Control pipeline 62, and two selection ends are respectively used to pumping and air inlet, second pressure reducing valve
81 control rates of air sucked in required are being needed the pressure control in the Isobarically Control pipeline 62 by the gas mass flow controller 82
The preset value wanted, it is preferable that capillary 85 is additionally provided on the Isobarically Control pipeline 62, for improving gas mass flow control
The pressure controling precision of device 82.The present embodiment carries out mask in TFT5.5 40 deformation-compensated, passes through the Isobarically Control gas circuit
Pressure in the hollow structure 21 of sealing is controlled in 1Pa, the deformation induced by gravity of mask 40 can be controlled within 1 μm, it is and whole
It compares mask deflection before shape to be reduced significantly, as illustrated in figs. 7 a and 7b.
Preferably, in complete machine exposure, mask 40 needs to be replaced frequently, and the size of mask 40 is there are certain tolerance,
Wherein, the compressible amount of elastomeric element 50 is related with the thickness of mask 40, and is implemented with larger impact to the present invention program.Tool
Body, 40 thickness of mask used in TFT5.5 is 10mm, and tolerance is +/- 0.2mm, in order to meet the compensation of all masks 40
Effect uses the elastomeric element 50 with certain degree of hardness, when the thickness of mask 40 between shaping frame 10 and mask platform 30<
10mm, when minimum is taken as 9.8mm, elastomeric element 50 by the pretightning force adsorbed, made after compression 0.1mm shaping frame 10 with
Mask 40 contacts, and is sealed hollow structure 21；When the thickness of mask 40>10mm, when being up to 10.2mm, 50 quilt of elastomeric element
Shaping frame 10 is made to be contacted with mask 40 after compression 0.5mm, therefore, the compressible amount of elastomeric element 50 should be greater than 0.5mm, with
This meets to the deformation-compensated of different-thickness mask 40.
In conclusion a kind of mask apparatus for shaping provided by the invention, utilizes vacuum suction gas circuit and Isobarically Control gas circuit
To its own gravity of the absorption dynamic balance of the application of mask 40, problem on deformation caused by gravity is avoided.Wherein, mask apparatus for shaping
Fixed and hollow structure 21 closed by vacuum suction mode, this power is the internal force of mask platform 30, not to mask platform 30
Increase additional weight loading and other mechanical structures, reduce complete machine integration complexity, while avoid the phase between structure
Mutual friction, therefore the particle contamination problems brought by friction will not be generated；Vacuum suction gas circuit is with Isobarically Control gas circuit by covering
The internal structure of die station 30 introduces, and without structures such as pneumatic, cables on mask apparatus for shaping, facilitates its transmission, and with better
Operability；Mask apparatus for shaping structure is similar to 40 structure design of mask, and quality size deviation is smaller, can be common with mask 40
With a set of transmission mechanism, efficiency of transmission is improved；Mask 40 is combined with 10 face face of shaping frame, the absorption of fixed shaping frame 10
Power is applied on mask 40, and additional fixed function is played to mask 40 in scanning process；Shaping frame 10 and mask
It is connected between platform 30 by elastomeric element 50, meets the shaping of the mask there are thickness error.
Obviously, those skilled in the art can carry out invention spirit of the various modification and variations without departing from the present invention
And range.If in this way, these modifications and changes of the present invention belong to the claims in the present invention and its equivalent technologies range it
Interior, then the present invention is also intended to including these modification and variations.
Claims (8)
1. a kind of mask apparatus for shaping, above mask platform, for compensating the deformation that mask is generated by dead weight, feature exists
In, described device includes shaping frame, shaping glass, vacuum suction gas circuit and Isobarically Control gas circuit, wherein,
The shaping frame is located above the mask edge, and connects the mask platform by several elastomeric elements；
The middle part of the shaping frame is hollow structure, and the hollow structure is corresponding with the mask；
The shaping glass fixation is covered on the hollow structure of the shaping frame, for light transmission；
The vacuum suction gas circuit is connected with the junction of the shaping frame and the mask platform, passes through pumping and air inlet, control
The shaping frame is made to be contacting and separating with the mask；
The shaping frame is contacted with the mask so that the hollow structure is sealed, the Isobarically Control gas circuit with it is described in
Hollow structure connection by the air pressure constant being evacuated in the hollow structure sealed with air inlet control, compensates the mask by certainly
The deformation generated again.
2. a kind of mask apparatus for shaping as described in claim 1, which is characterized in that the shaping frame and the shaping glass
It is fixedly connected by structure glue.
3. a kind of mask apparatus for shaping as described in claim 1, which is characterized in that the elastomeric element uses rubber.
4. a kind of mask apparatus for shaping as described in claim 1, which is characterized in that vacuum suction pipe is equipped in the mask platform
Road, the vacuum suction pipeline one end are connected with the junction of the shaping frame and the mask platform, the other end and the vacuum
Adsorb gas circuit connection.
5. a kind of mask apparatus for shaping as claimed in claim 4, which is characterized in that the vacuum suction gas circuit includes the first pressure
Force snesor and the first solenoid valve, the first pressure sensor is set in the vacuum suction pipeline, for detecting air pressure,
First solenoid valve includes fixing end and two selection ends, and the fixing end is connected with the vacuum suction pipeline, two institutes
It states selection end and is respectively used to pumping and air inlet, two selection ends are connected separately with the first pressure reducing valve, for controlling rate of air sucked in required
And air inflow.
6. a kind of mask apparatus for shaping as described in claim 1, which is characterized in that Isobarically Control pipe is equipped in the mask platform
Road, the Isobarically Control pipeline one end are connected across the shaping frame with the hollow structure, the other end and the Isobarically Control
Gas circuit connects.
7. a kind of mask apparatus for shaping as claimed in claim 6, which is characterized in that the Isobarically Control gas circuit includes connecting successively
The second pressure reducing valve, gas mass flow controller, second solenoid valve and the second pressure sensor connect, the second pressure pass
Sensor is set in the Isobarically Control pipeline, and for detecting air pressure, the second solenoid valve includes fixing end and two selections
End, the fixing end are connected with the Isobarically Control pipeline, and two selection ends are respectively used to be evacuated and air inlet, and described second
Pressure reducing valve controls air inflow.
8. a kind of mask apparatus for shaping as described in claim 1, which is characterized in that the mask apparatus for shaping is also associated with passing
Transfer mechanism, the transmission mechanism are used for transmission the mask apparatus for shaping and the mask.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510647164.8A CN106569394B (en) | 2015-10-08 | 2015-10-08 | Mask apparatus for shaping |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510647164.8A CN106569394B (en) | 2015-10-08 | 2015-10-08 | Mask apparatus for shaping |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106569394A CN106569394A (en) | 2017-04-19 |
| CN106569394B true CN106569394B (en) | 2018-06-26 |
Family
ID=58506680
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510647164.8A Active CN106569394B (en) | 2015-10-08 | 2015-10-08 | Mask apparatus for shaping |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106569394B (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110967923B (en) * | 2018-09-28 | 2021-06-08 | 上海微电子装备（集团）股份有限公司 | Mask plate sealing and shaping device |
| CN111624731B (en) * | 2019-02-28 | 2021-12-10 | 上海微电子装备（集团）股份有限公司 | Objective lens device |
| CN114609872B (en) * | 2022-03-16 | 2022-12-13 | 东莞市友辉光电科技有限公司 | Light shield bending-resistant method and large-size parallel light exposure machine |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101414578A (en) * | 2007-10-18 | 2009-04-22 | 东部高科股份有限公司 | Method for forming metal line in semiconductor device |
| CN103869601A (en) * | 2012-12-10 | 2014-06-18 | 昆山允升吉光电科技有限公司 | Mask plate with fixed auxiliary edge and manufacture method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7385673B2 (en) * | 2005-06-10 | 2008-06-10 | International Business Machines Corporation | Immersion lithography with equalized pressure on at least projection optics component and wafer |
| JP2009088253A (en) * | 2007-09-28 | 2009-04-23 | Toshiba Corp | Method and system for manufacturing microstructure |
-
2015
- 2015-10-08 CN CN201510647164.8A patent/CN106569394B/en active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101414578A (en) * | 2007-10-18 | 2009-04-22 | 东部高科股份有限公司 | Method for forming metal line in semiconductor device |
| CN103869601A (en) * | 2012-12-10 | 2014-06-18 | 昆山允升吉光电科技有限公司 | Mask plate with fixed auxiliary edge and manufacture method |
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| Publication number | Publication date |
|---|---|
| CN106569394A (en) | 2017-04-19 |
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Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Applicant after: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Applicant before: Shanghai Micro Electronics Equipment Co., Ltd. Applicant before: Shanghai Micro And High Precision Mechine Engineering Co., Ltd. |
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