CN103869601A - Mask plate with fixed auxiliary edge and manufacture method - Google Patents

Mask plate with fixed auxiliary edge and manufacture method Download PDF

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Publication number
CN103869601A
CN103869601A CN201210524484.0A CN201210524484A CN103869601A CN 103869601 A CN103869601 A CN 103869601A CN 201210524484 A CN201210524484 A CN 201210524484A CN 103869601 A CN103869601 A CN 103869601A
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CN
China
Prior art keywords
mask plate
auxiliary limit
main body
half groove
plate main
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CN201210524484.0A
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Chinese (zh)
Inventor
魏志凌
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Kunshan Power Stencil Co Ltd
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Kunshan Power Stencil Co Ltd
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Priority to CN201210524484.0A priority Critical patent/CN103869601A/en
Publication of CN103869601A publication Critical patent/CN103869601A/en
Pending legal-status Critical Current

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Abstract

The invention discloses a mask plate with a fixed auxiliary edge. The mask plate comprises a mask plate main body, the auxiliary edge and a semi-scribing region, and is characterized in that the auxiliary edge is arranged on the outer side of the mask plate main body, and is connected with the mask plate main body through the semi-scribing region. The invention also discloses a corresponding manufacture method. According to the invention, the auxiliary edge can be conveniently removed in an effort-saving manner, the influence on a silk screen on an existing mask plate in a shearing process of the prior art can be greatly alleviated, the edge warpage or even falling off of fixed points near a cut region of the mask plate in the prior art can be avoided, and the production efficiency can be greatly improved.

Description

A kind of mask plate with fixing auxiliary limit and preparation method thereof
Technical field
The present invention relates to a kind of mask plate, be specifically related to a kind of mask plate with fixing auxiliary limit and preparation method thereof, belong to OLED mask plate and manufacture field.
 
Background technology
OLED display screen is as the third generation display technique most after CRT, LCD with development potentiality, its development receives people's concern day by day, at present, a kind of core technology of preparing high-quality OLED screen is to adopt high-accuracy OLED mask plate evaporation R, G, B three primary colors on ito glass substrate to make.Can directly have influence on the quality of final OLED screen as the precision of the OLED mask plate of mask medium, therefore pay much attention in the industry each link that OLED mask plate is made.A complete OLED mask plate manufacture process comprises: the packaging with the fix → mask plate of the making → mask plate of patterns of openings mask plate.Wherein the fixing link of mask plate specifically stretches tight mask plate to even up after whole and is fixed on a housing by laser bonding or other connected modes, draw for the ease of stretching tight, a region of drawing for stretching tight can be left in the periphery of mask plate, after mask plate fixes, the region of drawing for stretching tight need to be cut out and be removed, conventionally cutting out the means of removing is by methods such as mechanical cuttings, so can cause that mask plate edge warped even makes near the point of fixity in clipping region come off, and affects end product quality.Therefore, industry is needed a kind of method that can solve this kind of defect in OLED mask plate manufacture process badly.
 
Summary of the invention
In view of this, need to overcome at least one in above-mentioned defect of the prior art.The invention provides a kind of mask plate with fixing auxiliary limit and preparation method thereof
The described mask plate with fixing auxiliary limit, comprises mask plate main body, auxiliary limit and half groove district, and described auxiliary limit is arranged on described mask plate main body outside and is connected with described mask plate main body by described half groove district.
According in this patent background technology to described in prior art, at present in technique, the fixing link of mask plate specifically stretches tight mask plate to even up after whole and is fixed on a housing by laser bonding or other connected modes, draw for the ease of stretching tight, a region of drawing for stretching tight can be left in the periphery of mask plate, after mask plate fixes, the region of drawing for stretching tight need to be cut out and be removed, conventionally cutting out the means of removing is by methods such as mechanical cuttings, so can cause that mask plate edge warped even makes near the point of fixity in clipping region come off, and affects end product quality; And the mask plate described in provided by the invention with fixing auxiliary limit have with traditional handicraft in functionally similar auxiliary limit, the described mask plate with fixing auxiliary limit connect and be fixed on housing after due to the existence in described half groove district, easily limit excision will be assisted in labour-saving, and greatly reduce the impact on silk screen on original mask plate in traditional handicraft shear history, also avoid the mask plate edge warped in traditional handicraft even to make near the point of fixity in clipping region come off, greatly improved production efficiency.
In addition, also there is following additional technical feature according to the mask plate with fixing auxiliary limit disclosed by the invention:
Alternatively, described auxiliary limit is arranged on the surrounding formation sealing housing of mask plate main body and is connected with described mask plate main body by described half groove district.
Alternatively, two opposite side that described auxiliary limit is arranged on mask plate main body form open housing and are connected with described mask plate main body by described half groove district.
Under normal circumstances, described mask plate main body is tetragonal silk screen, and described auxiliary limit can arrange the peripheral frame that forms a tetragonal sealing at four of a described mask plate main body periphery, and connects with described mask plate main body by described half groove; But in some cases, described auxiliary limit just arranges at two opposite side of described mask plate main body the peripheral frame that forms a parallel opening, only has the peripheral frame of two opposite side, connects by described half groove with described mask plate main body simultaneously.
Further, described half groove district is that thickness is less than described mask plate body thickness and is less than the long and narrow region of described auxiliary limit thickness.
Preferably, the housing geomery of described half groove and permanent mask plate main body adapts, and the outside shape that Ji Ban groove district forms and housing shape are consistent or are basically identical, is removing behind auxiliary limit, and mask plate main body outside can coincide with housing edge.
The existence in described auxiliary limit and described half groove district be for connect at described mask plate and be fixed on housing and cut after reduce cut process in impact on mask plate, therefore the half groove district that connects described mask plate main body and described auxiliary limit is described mask plate body thickness and the long and narrow region that is less than described auxiliary limit thickness, can will be fixedly connected with edge limitation in described half groove district so on the one hand, avoid cutting the impact on the described mask plate main body in described half groove district in process, simultaneously, greatly reduce the power of cutting, energy-conservation and efficient.
In actual applications, the thickness setting in described half groove district should be determined by following principle: half groove district 13 can bear the external world mask plate is strained to the flat horizontal pull that stretches tight (orientation shown in figure relatively) and do not ruptured, simultaneously also can be in the lower disconnection of relatively little shearing force (perpendicular to mask plate plate face).
Further, described half groove district is provided with through hole.
Preferably, described through hole is uniformly distributed.
Described through hole the further power of cutting that reduced is set, it is more even that equally distributed through hole can make to cut power, forms good otch section.
Alternatively, described half groove area edge is provided with large opening.
Preferably, described large opening is symmetrically distributed in described half groove edge.
Arranging of described large opening can provide the reference position cutting better, makes that initial to cut power less,
The present invention also provides the method for making of corresponding mask plate, and its feature comprises:
S1, overlays photosensitive dry film: in described mask plate Shang Daizhiban groove district with and both sides all overlay photosensitive dry film;
S2, exposure: described photosensitive dry film is exposed by exposure machine according to design configuration, make non-etching area exposure;
S3, removes unexposed dry film: the mask plate after exposure is removed to unexposed dry film district by development;
S4, etching: by after the described mask plate etching after developing, can form described half groove district.
Take off mask plate after film after cleaning, need tighten to even up by machinery and be fixed on housing, be pulled through in journey stretching tight, the machinery drawing device that stretches tight can be stretched tight and be drawn by fixed orifice 16, can also be stretched tight and be drawn by the auxiliary limit of direct clamping mask plate.The mask plate of tightening after evening up is fixed on mask plate main part on housing by laser bonding or the bonding mode of tackifier, after fixing, offer the shearing force of one, half groove district perpendicular to mask plate by craft or mechanical arm, auxiliary limit and mask plate main body are broken apart at half groove place, be about to assist limit and mask plate body portion from.After mask plate is fixing, remove the structural representation on auxiliary limit as shown in Figure 7, mask plate main body profile and housing profile adapt.
The present invention has following advantage: by the design in described half groove district, can more non-mask plate body region (being auxiliary limit of the present invention) be cut out and be removed, described mask plate main body and housing can be connected and fixed to the scuncheon that region limits forms in described half groove district, and can not cause the warped at mask plate main part edge, also can avoid the lax phenomenon such as come off of the caused solder joint of traditional mechanical cutting.
The aspect that the present invention is additional and advantage in the following description part provide, and part will become obviously from the following description, or recognize by practice of the present invention.
 
Brief description of the drawings
Above-mentioned and/or additional aspect of the present invention and advantage will become obviously and easily from the following description of the accompanying drawings of embodiments to be understood, wherein:
Figure 1 shows that a kind of mask plate schematic diagram of the present invention;
Figure 2 shows that the another kind of structural representation of mask plate of the present invention;
Fig. 3 is a kind of structure enlarged diagram of 15 parts in Fig. 1;
Figure 4 shows that a kind of cross sectional representation along A-A direction in Fig. 3;
Figure 5 shows that the another kind of cross sectional representation along A-A direction in Fig. 3
Figure 6 shows that the another kind of structure enlarged diagram for 15 parts in Fig. 1
Figure 7 shows that the floor map of removing auxiliary limit after mask plate main body is fixed on housing
Fig. 8 is that photosensitive dry film schematic diagram is pasted on mask plate two sides
Fig. 9 is exposure process structural representation;
Figure 10 is for removing unexposed dry film procedure structure schematic diagram;
Figure 11 is etching process structural representation;
In Fig. 1,11 is mask plate main body, and 12 is the auxiliary limit of sealing, and 13 for connecting the sealing half groove districts on mask plate main body 11 and auxiliary limit 12, and 14 is large opening, and 15 for treating magnification region, and 16 is the mask plate fixed orifice drawing that stretches tight;
In Fig. 2,22 is open auxiliary limit, and 23 is connection mask plate main body 11 and the opening half groove district on auxiliary limit 22;
In Fig. 3, A-A is for treating apparent direction;
In Fig. 6,60 for forming the through hole of half groove, and 61 for forming the attenuate piece of half groove;
In Fig. 7,71 is permanent mask plate main body, and 72 is the housing of permanent mask plate main body;
In Fig. 8,80 is that mask plate, 81,82 is photosensitive dry film;
In Fig. 9,90 is unexposed dry film district;
Embodiment
Describe embodiments of the invention below in detail, the example of described embodiment is shown in the drawings, and wherein same or similar label represents same or similar element or has the element of identical or similar functions from start to finish.Be exemplary below by the embodiment being described with reference to the drawings, only for explaining the present invention, and can not be interpreted as limitation of the present invention.
In description of the invention, it will be appreciated that, term " on ", orientation or the position relationship of the instruction such as D score, " end ", " top ", 'fornt', 'back', " interior ", " outward ", " horizontal stroke ", " erecting " be based on orientation shown in the drawings or position relationship, only the present invention for convenience of description and simplified characterization, instead of indicate or imply that the device of indication or element must have specific orientation, construct and operation with specific orientation, therefore can not be interpreted as limitation of the present invention.
In description of the invention, it should be noted that, unless otherwise clearly defined and limited, term " connection ", " connection ", " being connected ", " connection ", " cooperation " should be interpreted broadly, and for example, can be to be fixedly connected with, connecting integratedly, can be also to removably connect; It can be the connection of two element internals; Can be to be directly connected, also can indirectly be connected by intermediary; " cooperation " can be face and the coordinating of face, and can be also point and the coordinating of face or line and face, and also comprises the cooperation of hole axle, for the ordinary skill in the art, can concrete condition understand above-mentioned term concrete meaning in the present invention.
Inventive concept of the present invention is as follows, in traditional handicraft, by mask plate and housing is connected and fixed and mask plate and housing fixed area periphery are cut after, easily produce the lax phenomenon such as come off of the warped at mask plate main part edge and the caused solder joint of traditional mechanical cutting; And the mask plate with fixing auxiliary limit provided by the invention can be connected and fixed region separated by half groove district and cropped area (and auxiliary limit) by traditional, block and cut in process because machinery cuts the harmful effect that mask plate main body is caused, reduced cost thereby greatly improved production efficiency.
Describe below with reference to accompanying drawings the alignment device of steel bonding sheet of the present invention, wherein Figure 1 shows that a kind of mask plate schematic diagram of the present invention; Figure 2 shows that the another kind of structural representation of mask plate of the present invention; Figure 7 shows that the floor map of removing auxiliary limit after mask plate main body is fixed on housing; Fig. 8 is that photosensitive dry film schematic diagram is pasted on mask plate two sides; Fig. 9 is exposure process structural representation; Figure 10 is for removing unexposed dry film procedure structure schematic diagram; Figure 11 is etching process structural representation.
 
According to embodiments of the invention, a kind of mask plate with fixing auxiliary limit, comprise mask plate main body 11, auxiliary limit 12,22 and half groove district 13,23, it is characterized in that, described auxiliary limit 12,22 is arranged on described mask plate main body 11 outsides and is connected with described mask plate main body 11 by described half groove district 13,23, as shown in Figure 1, 2.
According to some embodiments of the present invention, the surrounding that described auxiliary limit 12 is arranged on mask plate main body 11 forms sealing housing and is connected with described mask plate main body 11 by described half groove district 13, as shown in Figure 1.
According to some embodiments of the present invention, two opposite side that described auxiliary limit 22 is arranged on mask plate main body 11 form open housing and are connected with described mask plate main body 11 by described half groove district 23, as shown in Figure 2.
According to embodiments of the invention, described half groove district 13,23 is described mask plate main body 11 thickness and be less than the long and narrow region of described auxiliary limit 12,22 thickness for thickness is less than, as shown in Fig. 3,4,5,6.
According to some embodiments of the present invention, described half groove district the 13, the 23rd, the weakened region that monolateral groove forms, as shown in Figure 4.
According to some embodiments of the present invention, described half groove district the 13, the 23rd, the weakened region that bilateral groove forms, as shown in Figure 5.
According to some embodiments of the present invention, described half groove district 13,23 is provided with through hole 60, and as shown in Figure 6, Ji Ban groove district 13,23 is by through hole 60 and attenuate piece 61 is staggered forms.
Preferably, described through hole 60 is uniformly distributed, as shown in Figure 6.
According to some embodiments of the present invention, 13,23 edges, described half groove district are provided with large opening 14, as shown in Figure 1.
Preferably, described large opening 14 is symmetrically distributed in described half groove edge, as shown in Figure 1.
It can be used as the follow-up treatment region that auxiliary limit 12 is removed from mask main body 11 (can pass through as starting point, mask main body 11 to be separated with auxiliary limit 12) herein, wherein, more reasonably design as one, the large position of opening 14 and the housing profile of size dimension and permanent mask plate adapt; In addition, on the auxiliary limit 12 of mask plate, be provided with fixed orifice 16, fixed orifice 16 can be used as the follow-up external tapping of evening up that mask plate is tightened.On the auxiliary limit 22 of the mask plate shown in Fig. 2, fixed orifice is not set, its tension flat process that stretches tight is that the auxiliary limit 22 that can directly clamp mask plate by extraneous chuck can be realized.
According to embodiments of the invention, a kind of method for making of the mask plate with fixing auxiliary limit, comprising:
S1, overlays photosensitive dry film: in described mask plate Shang Daizhiban groove district with and both sides all overlay photosensitive dry film, as shown in Figure 8, Fig. 8 is region sectional view shown in Fig. 4, has overlayed photosensitive dry film 81,82 on mask plate 80 two sides;
S2, exposure: described photosensitive dry film is exposed by exposure machine according to design configuration, make non-etching area exposure, in Fig. 9,, except 90 parts, other parts are exposure area;
S3, removes unexposed dry film: the mask plate after exposure is removed to unexposed dry film district by development, make the mask plate surface exposure in Dai Zhiban groove district, as shown in figure 10;
S4, etching: by after the described mask plate etching after developing, can form described half groove district, mask plate after developing can be formed to groove structure shown in Figure 11 in 90 regions by etching solution etching, in etching process, the parameter such as pressure, etched time of mask plate is controlled when controlling solution ratio, the etching of etching solution the etched thickness of mask plate.
Mask plate after etching, by taking off film by the dry film removal of exposure area before, can obtain mask plate structure shown in Fig. 4.
As another kind of embodiment of the present invention, in the process of the mask board to explosure to overlaying photosensitive dry film, can carry out exposing patterns design for dissimilar half groove plot structure (as shown in Figure 5, Figure 6 etc.).
Concrete member, structure or feature that any mentioning " embodiment ", " embodiment ", " illustrative examples " etc. mean to describe in conjunction with this embodiment are contained at least one embodiment of the present invention.Not necessarily refer to identical embodiment in this schematic statement everywhere of this instructions.And, in the time describing concrete member, structure or feature in conjunction with any embodiment, advocate, within realizing in conjunction with other embodiment the scope that such member, structure or feature all drop on those skilled in the art.
Although the specific embodiment of the present invention is described in detail with reference to multiple illustrative examples of the present invention, but it must be understood that, those skilled in the art can design multiple other improvement and embodiment, and these improve and within embodiment will drop on spirit and scope.Particularly, within the scope of aforementioned open, accompanying drawing and claim, can aspect the layout of parts and/or subordinate composite configuration, make rational modification and improvement, and can not depart from spirit of the present invention.Except modification and the improvement of parts and/or layout aspect, its scope is limited by claims and equivalent thereof.

Claims (9)

1. there is the mask plate on fixing auxiliary limit,, comprise mask plate main body, auxiliary limit and half groove district, it is characterized in that, described auxiliary limit is arranged on described mask plate main body outside and is connected with described mask plate main body by described half groove district.
2. the mask plate with fixing auxiliary limit according to claim 1, is characterized in that, the surrounding that described auxiliary limit is arranged on mask plate main body forms sealing housing and is connected with described mask plate main body by described half groove district.
3. the mask plate with fixing auxiliary limit according to claim 1, is characterized in that, two opposite side that described auxiliary limit is arranged on mask plate main body form open housing and are connected with described mask plate main body by described half groove district.
4. the mask plate with fixing auxiliary limit according to claim 1, is characterized in that, described half groove district is that thickness is less than described mask plate body thickness and is less than the long and narrow region of described auxiliary limit thickness.
5. the mask plate with fixing auxiliary limit according to claim 1, is characterized in that, described half groove district is provided with through hole.
6. the mask plate with fixing auxiliary limit according to claim 5, is characterized in that, described through hole is uniformly distributed.
7. the mask plate with fixing auxiliary limit according to claim 1, is characterized in that, described half groove area edge is provided with large opening.
8. the mask plate with fixing auxiliary limit according to claim 7, is characterized in that, described large opening is symmetrically distributed in described half groove edge.
9. a method for making with the mask plate on fixing auxiliary limit, is characterized in that, comprising:
S1, overlays photosensitive dry film: in described mask plate Shang Daizhiban groove district with and both sides all overlay photosensitive dry film;
S2, exposure: described photosensitive dry film is exposed by exposure machine according to design configuration, make non-etching area exposure;
S3, removes unexposed dry film: the mask plate after exposure is removed to unexposed dry film district by development;
S4, etching: by after the described mask plate etching after developing, can form described half groove district.
CN201210524484.0A 2012-12-10 2012-12-10 Mask plate with fixed auxiliary edge and manufacture method Pending CN103869601A (en)

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CN103869601A true CN103869601A (en) 2014-06-18

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106569394A (en) * 2015-10-08 2017-04-19 上海微电子装备有限公司 Mask trueing device
WO2021047356A1 (en) * 2019-09-10 2021-03-18 京东方科技集团股份有限公司 Alignment mask, metal mask assembly, and manufacturing method therefor

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506467A (en) * 1993-07-13 1996-04-09 Kabushiki Kaisha Toshiba Cathode-ray tube and method of manufacturing the same
CN1510971A (en) * 2002-11-29 2004-07-07 �����ձ������ƶ���ʾ��ʽ���� Evaporation mask and method for manufacturing organic electroluminescent device thereby
CN1556767A (en) * 2001-01-08 2004-12-22 Ucb Films, packaging and methods for making them
CN202530150U (en) * 2012-01-16 2012-11-14 昆山允升吉光电科技有限公司 Evaporation mask plate

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5506467A (en) * 1993-07-13 1996-04-09 Kabushiki Kaisha Toshiba Cathode-ray tube and method of manufacturing the same
CN1556767A (en) * 2001-01-08 2004-12-22 Ucb Films, packaging and methods for making them
CN1510971A (en) * 2002-11-29 2004-07-07 �����ձ������ƶ���ʾ��ʽ���� Evaporation mask and method for manufacturing organic electroluminescent device thereby
CN202530150U (en) * 2012-01-16 2012-11-14 昆山允升吉光电科技有限公司 Evaporation mask plate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106569394A (en) * 2015-10-08 2017-04-19 上海微电子装备有限公司 Mask trueing device
CN106569394B (en) * 2015-10-08 2018-06-26 上海微电子装备(集团)股份有限公司 Mask apparatus for shaping
WO2021047356A1 (en) * 2019-09-10 2021-03-18 京东方科技集团股份有限公司 Alignment mask, metal mask assembly, and manufacturing method therefor

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