CN203159696U - Mask plate with auxiliary openings - Google Patents
Mask plate with auxiliary openings Download PDFInfo
- Publication number
- CN203159696U CN203159696U CN 201320094230 CN201320094230U CN203159696U CN 203159696 U CN203159696 U CN 203159696U CN 201320094230 CN201320094230 CN 201320094230 CN 201320094230 U CN201320094230 U CN 201320094230U CN 203159696 U CN203159696 U CN 203159696U
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- mask
- assist openings
- mask plate
- openings
- pattern
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Abstract
The utility model discloses a mask plate with auxiliary openings. A mask plate main body is provided with mask patterns and auxiliary opening patterns; the mask patterns consist of mask openings; the auxiliary opening patterns consist of auxiliary openings; the auxiliary openings are formed in the mask plate main body and are distributed at two sides of the mask patterns; and the length directions of the auxiliary openings are parallel to the length directions of the mask openings. By forming the auxiliary openings, a mask area of the mask plate after a net is tightened is uniformly stressed, so that the defect that the openings are poor in precision due to the fact that metal wires droop down because of over-small stress among openings at the edges of the mask area after the net is tightened, is avoided, the opening precision is improved, and therefore the evaporation plating quality is improved.
Description
Technical field
The utility model relates to a kind of mask plate, is specifically related to a kind of mask plate with assist openings and preparation method thereof, belongs to the OLED mask plate and makes the field.
Background technology
OLED other display screen relatively has outstanding advantages such as visual range is wide, response is fast, power consumption is little, so the OLED technique of display is subjected to people's attention day by day.The evaporation operation is an important step of OLED technique of display, needs to use the mask plate that evaporation is used in the evaporation, and the organic vapor deposition material is deposited to the ito glass face by the opening evaporation of mask plate, and wherein the opening precision of mask plate can directly have influence on evaporating quality.Present a kind of mask apparatus commonly used, be a kind of mask plate with mask open as shown in Figure 1, among Fig. 1,11 is the mask plate main body, 12 is housing, 13 is masks area, 14 is solder joint, after mask plate is made, the net that it need be stretched tight makes plate face and masks area all be subjected to certain pulling force, its objective is that to make the plate face smooth and long and narrow wire between the masks area opening is tightened (guarantee the opening precision, prevent sagging), stretch tight net concrete operations normally: mask plate is fixed in the net mechanism of stretching tight → stretch tight and draw (make plate face smooth and wire is tightened) → laser welding (mask plate main body 11 is fixed on the housing 12, and solder joint is 14) → torn in half groove (not shown half groove) zone in addition along half groove by fixed orifices, has namely fixed mask plate.But the middle portion of fixing back masks area 13 is stressed evenly, both sides proximity mask plate metal part is stressed less, and the long and narrow wire between opening can be sagging, causes the opening precision on both sides not high, thereby influence evaporating quality, be necessary to propose a kind of mask plate structure head it off for this reason.
The utility model content
In view of this, need overcome in the above-mentioned defective of the prior art at least one.The utility model provides a kind of mask plate with assist openings and preparation method thereof.A kind of mask plate with assist openings comprises the mask plate main body, on the described mask plate main body mask pattern is arranged, and described mask pattern is made up of mask open; The assist openings pattern, described assist openings pattern is made of assist openings, and described assist openings is positioned on the described mask plate main body, and is distributed in described mask pattern both sides, and described assist openings length direction is parallel with said mask open length direction.
According to described to prior art in this patent background technology, as shown in Figure 1, mask plate is fixed to the net that stretches tight by fixed orifices to stretch tight in the mechanism and draws, make the plate face smooth and wire is tightened after carry out laser welding and (mask plate main body 11 be fixed on the housing 12, solder joint is 14) and torn in the zone beyond half groove along half groove, namely fixed mask plate.But the middle portion of fixing back masks area 13 is stressed evenly, both sides proximity mask plate metal part is stressed less, long and narrow wire between opening can be sagging, cause the opening precision on both sides not high, thereby influence evaporating quality, the mask plate with assist openings that the utility model provides then adds a supplementary structure, makes outer the moving on the assist openings in stressed less zone, thereby guaranteed that centre, mask pattern zone and both sides reach the opening precision of expection, guarantee evaporating quality.
In addition, also have a following additional technical feature according to the disclosed mask plate of the utility model:
Further, the quantity of described mask pattern is more than or equal to 1, and described assist openings pattern is 2:1 with described mask pattern quantity ratio.
Alternatively, when two described mask patterns form a line, one group of assist openings is arranged between described mask pattern, namely two mask patterns share one group of assist openings.
When two described mask patterns form a line, consideration based on mask plate and mask pattern global design, two groups of assist openings patterns between two described mask patterns can be merged into one group of assist openings pattern, make assist openings avoid the mask deposition zone simultaneously.
Preferably, the hatch frame of described mask open and described assist openings is identical and be through hole.
So, can make mask open consistent with the assist openings force-bearing situation, the evaporating quality after guaranteeing.
Alternatively, the opening shape of described assist openings and described mask open is identical but be closed pores.
The assist openings part only etches away certain thickness in the one side of mask plate, another side does not carry out etching, organic materials can not be deposited on the substrate by assist openings during evaporation, therefore arrange assist openings to mask open apart from the time needn't consider to avoid masks area, make it play the opening precision at raising masks area edge according to actual needs.
Further, described assist openings spacing and described mask open spacing are described assist openings width and described mask open width 2 times.
Further, the side that described assist openings pattern and described mask pattern close on and the distance of described mask pattern are more than 1 times of distance between the described mask open (comprising 1 times), certain distance can make assist openings can form better stressed distribution, make the better effects if of evaporation, avoid masks area simultaneously.
The side that described assist openings pattern and described mask pattern close on and the distance of described mask pattern will make assist openings can avoid the deposition mask zone fully, also will play booster action simultaneously.
Further, described assist openings spacing is identical with described mask open spacing, guarantees that the unanimity of distance can make that also stressed distribution is more balanced between the two, guarantees good evaporation effect.
Further, be 1-5 for the mask plate assist openings number of being made by indium watt alloy;
Preferably, mask plate assist openings number is 2-4;
Further preferably, described assist openings quantity is 3.
Wherein said mask plate opening number and the net tension force that stretches tight, etching parameter, mask plate quality are relevant, can be determined by experiment optimum value for different parameters and material.
The utility model also provides corresponding making method, and its feature comprises:
S1 overlays photosensitive dry film with the two sides that makes the substrate of mask plate;
S2 exposes to photosensitive dry film by exposure machine according to design configuration, makes non-etching area expose;
S3 removes unexposed dry film with the substrate after the exposure by technologies such as developments;
S4 can form described mask plate with assist openings and mask open with the substrate etching after developing.
The aspect that the utility model is additional and advantage part in the following description provide, and part will become obviously from the following description, or recognize by practice of the present utility model.
Description of drawings
Above-mentioned and/or additional aspect of the present utility model and advantage are from obviously and easily understanding becoming the description of embodiment below in conjunction with accompanying drawing, wherein:
Figure 1 shows that the mask plate overall schematic;
Figure 2 shows that the mask plate overall schematic with assist openings;
Figure 3 shows that 22 part enlarged diagrams among Fig. 2;
Figure 4 shows that among Fig. 3 a kind of schematic cross-section along the A-A direction;
Figure 5 shows that among Fig. 3 the another kind of schematic cross-section along the A-A direction;
Figure 6 shows that and paste the photosensory membrane schematic cross-section;
Figure 7 shows that exposure template schematic cross-section;
Figure 8 shows that the schematic cross-section of development rear pattern plate;
Figure 9 shows that mask plate schematic cross-section after the etching;
Figure 10 shows that an embodiment synoptic diagram of the present utility model;
Among Fig. 1,11 is the mask plate main body, and 13 is mask pattern, and 14 is fixed orifices, and 12 is housing;
Among Fig. 2,21 is the assist openings pattern, and 22 for treating magnification region;
Among Fig. 3,31 is mask open, and 32 is long and narrow wire between mask open, and A-A is for treating anatomical directions, and d1 is the width of opening, and d2 is the distance (being aperture pitch) between the opening, and d3 is the distance that assist openings arrives masks area, and 211 is assist openings;
Among Fig. 6,61,62 is photosensory membrane;
Among Fig. 7,61 is unexposed photosensory membrane, 71,72 photosensory membranes for exposure;
Embodiment
Describe embodiment of the present utility model below in detail, the example of described embodiment is shown in the drawings, and wherein identical or similar label is represented identical or similar elements or the element with identical or similar functions from start to finish.Be exemplary below by the embodiment that is described with reference to the drawings, only be used for explaining the utility model, and can not be interpreted as restriction of the present utility model.
In description of the present utility model, it will be appreciated that, term " on ", close the orientation of indications such as D score, " end ", " top ", " preceding ", " back ", " interior ", " outward ", " horizontal stroke ", " erecting " or position is based on orientation shown in the drawings or position relation, only be the utility model and simplification description for convenience of description, rather than indication or the hint device of indication or element must have specific orientation, with specific orientation structure and operation, therefore can not be interpreted as restriction of the present utility model.
In description of the present utility model, need to prove, unless clear and definite regulation and restriction are arranged in addition, term " connection ", " connection ", " linking to each other ", " connection ", " cooperation " should be done broad understanding, for example, can be fixedly connected, connecting integratedly, also can be to removably connect; It can be the connection of two element internals; Can be directly to link to each other, also can link to each other indirectly by intermediary; " cooperation " can be face and the cooperating of face, and also can be point and the cooperating of face or line and face, and also comprises the cooperation of hole axle, for the ordinary skill in the art, can particular case understand the concrete implication of above-mentioned term in the utility model.
Inventive concept of the present utility model is as follows, because mask plate is stressed evenly at the middle portion of fixing back masks area 13, both sides proximity mask plate metal part is stressed less, long and narrow wire between opening can be sagging, cause the opening precision on both sides not high, thereby influence evaporating quality, the mask plate with assist openings that the utility model provides then adds a component structure, make outer the moving on the assist openings in stressed less zone, thereby guaranteed that mask pattern intra-zone and both sides reach the opening precision of expection, guaranteed evaporating quality.
Describe the mask plate with assist openings of the present utility model below with reference to accompanying drawings, wherein Figure 1 shows that the mask plate overall schematic; Figure 2 shows that the mask plate overall schematic with assist openings; Figure 3 shows that 22 part enlarged diagrams among Fig. 2; Figure 4 shows that among Fig. 3 a kind of schematic cross-section along the A-A direction; Figure 5 shows that among Fig. 3 the another kind of schematic cross-section along the A-A direction.
According to embodiment of the present utility model, a kind of mask plate with assist openings as shown in Figure 2, comprises mask plate main body 11, on the described mask plate main body mask pattern 13 is arranged, and described mask pattern 13 is made up of mask open 31; Assist openings pattern 21, described assist openings pattern 21 is made of assist openings 211, described assist openings 211 is positioned on the described mask plate main body 11, and is distributed in described mask pattern 13 both sides, and described assist openings 211 length directions are parallel with described mask open 31 length directions.
According to embodiment more of the present utility model, the quantity of described mask pattern 13 is more than or equal to 1, and described assist openings pattern 21 is 2:1 with described mask pattern 13 quantity ratio, as shown in Figure 2.
According to embodiment more of the present utility model, when two described mask patterns 13 form a line, one group of assist openings 211 is arranged, as shown in figure 10 between described mask pattern 13.
When two described mask patterns 13 form a line, based on the consideration of mask plate and mask pattern 13 global designs, two groups of assist openings patterns 21 between two described mask patterns 13 can be merged into one group of assist openings pattern 21.
According to embodiment more of the present utility model, the hatch frame of described mask open 31 and described assist openings 211 is identical and be through hole, as shown in Figure 4.
So, can make mask open 31 consistent with assist openings 211 force-bearing situations, the evaporating quality after guaranteeing.
According to embodiment more of the present utility model, the opening shape of described assist openings 211 and described mask open 31 is identical but be closed pores, as shown in Figure 5.
According to embodiment more of the present utility model, described assist openings spacing and described mask open spacing be described assist openings width and described mask open width more than or equal to 1 integral multiple.
According to embodiment more of the present utility model, the side that described assist openings pattern and described mask pattern close on and the distance of described mask pattern are more than 3 times of distance between the described mask open (comprising 3 times), certain distance can make assist openings can form better stressed distribution, make the better effects if of evaporation, avoid the mask deposition zone simultaneously.
The side that described assist openings pattern and described mask pattern close on and the distance of described mask pattern will make assist openings can avoid the deposition mask zone fully, also will play booster action simultaneously.
According to embodiment more of the present utility model, described assist openings spacing is identical with described mask open spacing, guarantees that the unanimity of distance can make that also stressed distribution is more balanced between the two, guarantees good evaporation effect.
Further, be 1-5 for the mask plate assist openings number of being made by indium watt alloy;
Preferably, mask plate assist openings number is 2-4;
Further preferably, described assist openings quantity is 3.
A kind of making method with mask plate of assist openings, as an embodiment of the present utility model, the making method of the assist openings shown in Fig. 5 can be made (not considering under other graphic making situation) by following etch process:
S1, pad pasting: the two sides that will make the substrate of mask plate overlays photosensory membrane, and as shown in Figure 6,61,62 is photosensory membrane;
S2, exposure: photosensitive dry film is exposed by exposure machine according to design configuration, make and non-etching area exposure remove 61 parts among Fig. 7, other parts (71,72) are the exposure area;
S3, develop: the substrate after will expose is removed the dry film of unexposed dry film district 61 parts through developing process, and the substrate surface for the treatment of open area processed is exposed, as shown in Figure 8 (be a kind of assist openings shown in the figure, i.e. assist openings form shown in Fig. 5);
S4, etching: the mask plate after will developing can form groove structure shown in Figure 9 in 61 zones by the etching solution etching, in etching process, when solution ratio, etching by the control etching solution parameters such as the pressure of mask plate, etched time are controlled the etched thickness (degree of depth of etched opening) of mask plate;
Mask plate after the etching can obtain the schematic cross-section of mask plate assist openings structure shown in Figure 5 by taking off the film dry film removal of exposure area before.
According to a kind of embodiment of the present utility model, in overlaying the mask plate exposure process of photosensory membrane, can carry out corresponding exposing patterns setting at dissimilar assist openings structures as shown in Figure 4, obtain corresponding assist openings structure.
It only is structural representation shown in the accompanying drawing, the appearance that can not reflect various size relation and opening figure fully really of showing among the figure, wherein there is certain chamfering in the seamed edge at the mask open on the mask plate main body and assist openings place, and there is certain radian in its open surfaces.
Any mentioning " embodiment ", " embodiment ", " illustrative examples " etc. mean concrete member, structure or the characteristics described in conjunction with this embodiment and are contained among at least one embodiment of the present utility model.Not necessarily refer to identical embodiment in this schematic statement everywhere of this specification sheets.And when describing concrete member, structure or characteristics in conjunction with any embodiment, what advocate is, realizes that in conjunction with other embodiment such member, structure or characteristics all drop within those skilled in the art's the scope.
Although with reference to a plurality of illustrative examples of the present utility model embodiment of the present utility model is described in detail, but it must be understood that, those skilled in the art can design multiple other improvement and embodiment, and these improve and embodiment will drop within the spirit and scope of the utility model principle.Particularly, within the scope of aforementioned open, accompanying drawing and claim, can make rational modification and improvement aspect the layout of component and/or subordinate composite configuration, and can not break away from spirit of the present utility model.Except modification and the improvement of component and/or layout aspect, its scope is limited by claims and equivalent thereof.
Claims (9)
1. the mask plate with assist openings is characterized in that, comprising:
The mask plate main body has mask pattern on the described mask plate main body, and described mask pattern is made up of mask open;
The assist openings pattern, described assist openings pattern is made of assist openings, and described assist openings is positioned on the described mask plate main body, and is distributed in described mask pattern both sides, and described assist openings length direction is parallel with said mask open length direction.
2. the mask plate with assist openings according to claim 1 is characterized in that, the quantity of described mask pattern is more than or equal to 1, and described assist openings pattern is 2:1 with described mask pattern quantity ratio.
3. the mask plate with assist openings according to claim 1 is characterized in that, when two described mask patterns form a line, one group of mask open is arranged between described mask pattern.
4. the mask plate with assist openings according to claim 1 is characterized in that, the hatch frame of described assist openings and described mask open is identical and be through hole.
5. the mask plate with assist openings according to claim 1 is characterized in that, the opening shape of described assist openings and described mask open is identical but be closed pores.
6. the mask plate with assist openings according to claim 1, it is characterized in that, the side that described assist openings pattern and described mask pattern close on and the distance of described mask pattern are more than 1 times of distance between the described mask open (comprising 1 times), as being preferably 3 times.
7. the mask plate with assist openings according to claim 1 is characterized in that, described assist openings spacing is identical with described mask open spacing.
8. the mask plate with assist openings according to claim 1 is characterized in that, described assist openings quantity is 1-5.
9. the mask plate with assist openings according to claim 8 is characterized in that, described assist openings quantity is 2-4.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320094230 CN203159696U (en) | 2013-03-01 | 2013-03-01 | Mask plate with auxiliary openings |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 201320094230 CN203159696U (en) | 2013-03-01 | 2013-03-01 | Mask plate with auxiliary openings |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203159696U true CN203159696U (en) | 2013-08-28 |
Family
ID=49020895
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 201320094230 Expired - Fee Related CN203159696U (en) | 2013-03-01 | 2013-03-01 | Mask plate with auxiliary openings |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203159696U (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104018116A (en) * | 2013-03-01 | 2014-09-03 | 昆山允升吉光电科技有限公司 | Mask plate with auxiliary opening and manufacturing method thereof |
| CN106232857A (en) * | 2014-04-24 | 2016-12-14 | 株式会社V技术 | Film forming mask, the manufacture method of film forming mask and the manufacture method of touch panel |
| CN110923622A (en) * | 2015-04-24 | 2020-03-27 | Lg伊诺特有限公司 | Deposition mask |
-
2013
- 2013-03-01 CN CN 201320094230 patent/CN203159696U/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104018116A (en) * | 2013-03-01 | 2014-09-03 | 昆山允升吉光电科技有限公司 | Mask plate with auxiliary opening and manufacturing method thereof |
| CN106232857A (en) * | 2014-04-24 | 2016-12-14 | 株式会社V技术 | Film forming mask, the manufacture method of film forming mask and the manufacture method of touch panel |
| CN106232857B (en) * | 2014-04-24 | 2019-06-07 | 株式会社V技术 | Form a film exposure mask, the manufacturing method of exposure mask that forms a film and the manufacturing method of touch panel |
| CN110923622A (en) * | 2015-04-24 | 2020-03-27 | Lg伊诺特有限公司 | Deposition mask |
| CN110923622B (en) * | 2015-04-24 | 2021-12-03 | Lg伊诺特有限公司 | Deposition mask |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| PP01 | Preservation of patent right | ||
| PP01 | Preservation of patent right |
Effective date of registration: 20190808 Granted publication date: 20130828 |
|
| PD01 | Discharge of preservation of patent | ||
| PD01 | Discharge of preservation of patent |
Date of cancellation: 20220808 Granted publication date: 20130828 |
|
| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20130828 Termination date: 20200301 |