CN111394698A - Method for uniformly coating film - Google Patents
Method for uniformly coating film Download PDFInfo
- Publication number
- CN111394698A CN111394698A CN202010372848.2A CN202010372848A CN111394698A CN 111394698 A CN111394698 A CN 111394698A CN 202010372848 A CN202010372848 A CN 202010372848A CN 111394698 A CN111394698 A CN 111394698A
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- CN
- China
- Prior art keywords
- reciprocating motion
- workpiece disc
- evaporation source
- product
- coating according
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention provides a method for uniformly coating a film, wherein a workpiece disc is arranged on a rotating device in a vacuum furnace chamber, an evaporation source is arranged on a reciprocating motion device, so that the evaporation source can radially move perpendicular to the extension line of the rotating axis of the workpiece disc, and the reciprocating motion device is fixed in the furnace chamber; after the product is fixed on the workpiece disc, the reciprocating motion device drives the evaporation source to do radial reciprocating motion while the rotating device drives the workpiece disc to rotate, so that the coating of the product is finished. The invention can better avoid the defects of the correction baffle and the planetary workpiece disc, and achieves better coating uniformity by combining the swing theory of optical precise single-side polishing.
Description
Technical Field
The invention relates to a method for uniformly coating a film.
Background
The film coating is to form a layer of film on the surface of a product by a physical or chemical method to improve the optical, mechanical and mechanical properties of the product surface, and is widely applied to the working life of human beings. The main methods of coating are physical deposition and chemical deposition, including thermal evaporation, electron gun, sputtering and the like. The technical indexes of the coating film generally comprise: thickness, absorption, reflectance, transmittance, polarization properties, color, firmness, coefficient of friction, strength, water droplet angle, and the like. The requirement of the coating uniformity is to ensure the stability and consistency of the whole furnace product in the coating process. Generally, uniformity tuning is an essential technique for tuning the production of a coating film. At present, the following two methods are mainly used to control the uniformity of the coating: 1. the correcting baffle plate is used for shielding the excessively thick position and compensating the excessively thin position by adjusting the shape and the position of the correcting baffle plate; 2. the planetary workpiece disc ensures the uniformity of products by revolving and rotating workpieces and adjusting the ratio of the revolving and rotating. The main modes above have respective advantages and disadvantages, the mode of correcting the baffle is simpler, the cost is lower, and the precision is still good, but because of the clean demand of the furnace chamber, the consistency of the installation position of the correction baffle can be influenced, and in addition, the possibility of deformation of the correction baffle is also existed, so that the uniformity is changed. The planet workpiece disc has the advantages of high precision, high cost, high maintenance cost, fixed product form, high technical requirement and high monitoring difficulty. There are also some techniques to improve the uniformity of the coating, such as adjusting the emission angle of the coating, maintaining the stability of the air exhaust, the uniformity of the gas distribution, the uniformity of the heating temperature, increasing the emission surface of the coating, etc. These auxiliary techniques, which are generally used as the two main means, can be used in combination with the above two means to improve the uniformity of the coating film.
However, the above methods have advantages and disadvantages in general, and the operation is obviously beneficial and disadvantageous in practice, which is not an optimal method.
Disclosure of Invention
In order to solve the above technical problems, the present invention provides a method for uniformly coating a film, which can complete a film coating operation in an extremely simple and relatively low-cost manner by rotating a product and reciprocating an evaporation source.
The invention is realized by the following technical scheme.
The invention provides a method for uniformly coating a film; a workpiece disc is arranged on a rotating device in the vacuum furnace chamber, an evaporation source is arranged on a reciprocating motion device, so that the evaporation source can move in a radial direction perpendicular to the extension line of the rotating axis of the workpiece disc, and the reciprocating motion device is fixed in the furnace chamber; after the product is fixed on the workpiece disc, the reciprocating motion device drives the evaporation source to do radial reciprocating motion while the rotating device drives the workpiece disc to rotate, so that the coating of the product is finished.
The rotating speed of the workpiece disc is 3-1000 RPM.
And the uniformity of the film layer is adjusted by adjusting the rotation rate of the rotating device, the moving speed of the reciprocating device and the moving frequency of the reciprocating device.
One surface of the workpiece disc, on which the product is fixed, is a plane, a spherical surface or a paraboloid.
The evaporation source is an electron gun, a thermal evaporator or a coating target.
The evaporation source moves along the guide rail on the reciprocating device.
The number of the evaporation sources and the reciprocating motion devices is one or more, and the evaporation sources correspond to the reciprocating motion devices one to one.
The invention has the beneficial effects that: by combining an optical precision polishing technology, the method can be applied as a third mode for controlling the uniformity of the coating; the defects of the correction baffle and the planetary workpiece disc can be well avoided, and the good coating uniformity is achieved by combining the swing mode of optical precision single-side polishing; in the optical precision single-side polishing neighborhood, if a better optical polishing surface is expected to be obtained, a product or a polishing die needs to swing, the removal rate of each area on the surface of the product is controlled through different swinging distances, the very precise optical polishing surface can be obtained, the control technology is combined with a coating technology, a certain swinging amplitude and frequency are set for an evaporation source, and the swinging amplitude and frequency are adjusted and controlled through an optical film thickness monitoring system, so that very good coating uniformity is achieved.
Detailed Description
The technical solution of the present invention is further described below, but the scope of the claimed invention is not limited to the described.
The invention provides a method for uniformly coating a film; a workpiece disc is arranged on a rotating device in the vacuum furnace chamber, an evaporation source is arranged on a reciprocating motion device, so that the evaporation source can move in a radial direction perpendicular to the extension line of the rotating axis of the workpiece disc, and the reciprocating motion device is fixed in the furnace chamber; after the product is fixed on the workpiece disc, the reciprocating motion device drives the evaporation source to do radial reciprocating motion while the rotating device drives the workpiece disc to rotate, so that the coating of the product is finished.
The rotating speed of the workpiece disk is 3-1000 RPM.
The uniformity of the film layer is adjusted by adjusting the rotation rate of the rotating device, the moving speed of the reciprocating device and the moving frequency of the reciprocating device.
The surface of the workpiece disc for fixing the product is a plane, a spherical surface or a paraboloid.
The evaporation source is an electron gun, a thermal evaporator or a coating target.
The evaporation source moves along the track on the reciprocating device.
The number of the evaporation sources and the reciprocating motion devices is more than one, and the evaporation sources correspond to the reciprocating motion devices one to one.
One method for realizing the scheme in practice is that a workpiece tray is hung at the top of a furnace chamber, and a product is installed on the workpiece tray and rotates at a certain speed; the evaporation source is located the below of workpiece tray, and the evaporation source is fixed on linear module, and the power cord passes through the fixed orifices of bellows and furnace chamber bottom to be connected, and sufficient extension length is reserved to the bellows, ensures can steady, the smooth removal in required stroke. If a plurality of film materials are needed, a plurality of evaporation sources can be installed, and the evaporation sources can be ensured to move below the workpiece smoothly. The reciprocating sliding of the evaporation source is controlled by programming to control the uniformity of the coating.
A typical installation and debugging operation of the present invention in practice is as follows:
1, selecting a vacuum furnace chamber, and installing a workpiece disc rotating system;
2, installing an evaporation source, wherein the evaporation source is installed on a module or a cylinder and other controllable devices which do reciprocating motion, and the devices are fixed on the furnace chamber;
3, connecting the required electric wires, including cooling water pipes and the like which are possibly required, with the furnace chamber wall in a corrugated pipe mode and the like, ensuring that enough allowance is reserved, and ensuring that the evaporation source can stably and smoothly reciprocate in a required range;
4, debugging, namely, through evaporating the film material, confirming the uniformity of the film layer on the product, and adjusting the operation amplitude and frequency;
5, online film thickness monitoring can be selected or uniformity can be confirmed through subsequent measurement;
6, after debugging, obtaining the relation between the running equation and the uniformity of the film material, and programming and modifying the running amplitude and frequency;
and 7, coating film confirmation is carried out after the program is modified, and small-batch trial production can be started after the requirement is met.
Claims (8)
1. A method for uniformly coating a film is characterized by comprising the following steps: a workpiece disc is arranged on a rotating device in the vacuum furnace chamber, an evaporation source is arranged on a reciprocating motion device, so that the evaporation source can move in the radial direction perpendicular to the extension line of the rotating axis of the workpiece disc, and the reciprocating motion device is fixed in the furnace chamber; after the product is fixed on the workpiece disc, the reciprocating motion device drives the evaporation source to do radial reciprocating motion while the rotating device drives the workpiece disc to rotate, so that the coating of the product is finished.
2. The method of uniform coating according to claim 1, wherein: the rotating speed of the workpiece disc is 3-1000 RPM.
3. The method of uniform coating according to claim 1, wherein: and the uniformity of the film layer is adjusted by adjusting the rotation rate of the rotating device, the moving speed of the reciprocating device and the moving frequency of the reciprocating device.
4. The method of uniform coating according to claim 1, wherein: one surface of the workpiece disc, on which the product is fixed, is a plane, a spherical surface or a paraboloid.
5. The method of uniform coating according to claim 1, wherein: the evaporation source is an electron gun, a thermal evaporator or a coating target.
6. The method of uniform coating according to claim 1, wherein: the evaporation source moves along the track on the reciprocating device.
7. The method of uniform coating according to claim 1, wherein: the workpiece disc moves at a constant speed.
8. The method of uniform coating according to claim 1, wherein: the number of the evaporation sources and the reciprocating motion devices is one or more, and the evaporation sources correspond to the reciprocating motion devices one to one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010372848.2A CN111394698A (en) | 2020-05-06 | 2020-05-06 | Method for uniformly coating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010372848.2A CN111394698A (en) | 2020-05-06 | 2020-05-06 | Method for uniformly coating film |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111394698A true CN111394698A (en) | 2020-07-10 |
Family
ID=71426779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010372848.2A Pending CN111394698A (en) | 2020-05-06 | 2020-05-06 | Method for uniformly coating film |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111394698A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112501562A (en) * | 2020-11-30 | 2021-03-16 | 深圳恒泰克科技有限公司 | Multi-source electron beam evaporation coating device and film thickness uniformity correction method |
| CN117721421A (en) * | 2024-02-07 | 2024-03-19 | 成都国泰真空设备有限公司 | Device and method for eliminating layering phenomenon of film-forming spectroscopic curve at low temperature |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938161A (en) * | 2014-04-29 | 2014-07-23 | 京东方科技集团股份有限公司 | Evaporating device and evaporating method of substrate |
| CN105695938A (en) * | 2016-04-08 | 2016-06-22 | 光驰科技(上海)有限公司 | Coating device adopting scanning type evaporation source and coating method of coating device |
| CN108677147A (en) * | 2018-06-13 | 2018-10-19 | 京东方科技集团股份有限公司 | Evaporation coating device and evaporation coating method |
| CN109518135A (en) * | 2019-01-24 | 2019-03-26 | 京东方科技集团股份有限公司 | A kind of evaporated device and evaporation coating method |
| CN110284109A (en) * | 2019-05-16 | 2019-09-27 | 兰州空间技术物理研究所 | Radial plasma jet pulsed vacuum arc evaporation source and film deposition apparatus |
| CN110541147A (en) * | 2018-05-28 | 2019-12-06 | 佳能特机株式会社 | Film forming apparatus |
-
2020
- 2020-05-06 CN CN202010372848.2A patent/CN111394698A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103938161A (en) * | 2014-04-29 | 2014-07-23 | 京东方科技集团股份有限公司 | Evaporating device and evaporating method of substrate |
| CN105695938A (en) * | 2016-04-08 | 2016-06-22 | 光驰科技(上海)有限公司 | Coating device adopting scanning type evaporation source and coating method of coating device |
| CN110541147A (en) * | 2018-05-28 | 2019-12-06 | 佳能特机株式会社 | Film forming apparatus |
| CN108677147A (en) * | 2018-06-13 | 2018-10-19 | 京东方科技集团股份有限公司 | Evaporation coating device and evaporation coating method |
| CN109518135A (en) * | 2019-01-24 | 2019-03-26 | 京东方科技集团股份有限公司 | A kind of evaporated device and evaporation coating method |
| CN110284109A (en) * | 2019-05-16 | 2019-09-27 | 兰州空间技术物理研究所 | Radial plasma jet pulsed vacuum arc evaporation source and film deposition apparatus |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112501562A (en) * | 2020-11-30 | 2021-03-16 | 深圳恒泰克科技有限公司 | Multi-source electron beam evaporation coating device and film thickness uniformity correction method |
| CN117721421A (en) * | 2024-02-07 | 2024-03-19 | 成都国泰真空设备有限公司 | Device and method for eliminating layering phenomenon of film-forming spectroscopic curve at low temperature |
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Application publication date: 20200710 |
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| RJ01 | Rejection of invention patent application after publication |