CN111354637B - Method for washing graphite boat by recycling hydrofluoric acid - Google Patents
Method for washing graphite boat by recycling hydrofluoric acid Download PDFInfo
- Publication number
- CN111354637B CN111354637B CN202010133589.8A CN202010133589A CN111354637B CN 111354637 B CN111354637 B CN 111354637B CN 202010133589 A CN202010133589 A CN 202010133589A CN 111354637 B CN111354637 B CN 111354637B
- Authority
- CN
- China
- Prior art keywords
- hydrofluoric acid
- graphite boat
- acid
- self
- old
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 title claims abstract description 244
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 56
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 56
- 239000010439 graphite Substances 0.000 title claims abstract description 56
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000004064 recycling Methods 0.000 title claims abstract description 18
- 238000005406 washing Methods 0.000 title claims description 15
- 238000003860 storage Methods 0.000 claims abstract description 93
- 239000002253 acid Substances 0.000 claims abstract description 61
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 59
- 238000004140 cleaning Methods 0.000 claims abstract description 44
- 239000002699 waste material Substances 0.000 claims abstract description 41
- 238000002791 soaking Methods 0.000 claims abstract description 7
- 238000005086 pumping Methods 0.000 claims abstract description 6
- 238000005304 joining Methods 0.000 claims description 8
- 238000007789 sealing Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 4
- 238000009826 distribution Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 5
- 239000007788 liquid Substances 0.000 description 9
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 238000010306 acid treatment Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic Table
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
- H01L21/31105—Etching inorganic layers
- H01L21/31111—Etching inorganic layers by chemical means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/547—Monocrystalline silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Battery Electrode And Active Subsutance (AREA)
Abstract
The invention relates to the technical field of solar cell production and manufacturing, in particular to a method for recycling hydrofluoric acid to wash a graphite boat, which is used for solving the problem of larger waste of hydrofluoric acid in the cleaning process of a cell in the prior art. The invention comprises the following steps: step 1: collecting and storing the used old hydrofluoric acid in a waste acid storage tank; step 2: pumping old hydrofluoric acid in the waste acid storage tank into a self-prepared storage tank; step 3: measuring the concentration of old hydrofluoric acid in the self-prepared storage tank; step 4: adding new hydrofluoric acid or clear water into the self-prepared storage pool according to the measured concentration of the old hydrofluoric acid in the self-prepared storage pool until the concentration of the old hydrofluoric acid in the self-prepared storage pool reaches the requirement; step 5: adding old hydrofluoric acid in the self-prepared storage pool into a graphite boat cleaning tank, and putting the flower basket with reworked pieces into the graphite boat cleaning tank for soaking. According to the method, a large amount of hydrofluoric acid can be saved.
Description
Technical Field
The invention relates to the technical field of solar cell production and manufacturing, in particular to a method for recycling hydrofluoric acid to wash a graphite boat.
Background
In the production of the battery, a large amount of hydrofluoric acid is required to be used, on one hand, the velvet making process is performed on the velvet making process, on the other hand, hydrofluoric acid is required to be used for removing an oxide layer on the surface of a silicon wafer, and the silicon nitride on the surface of the silicon wafer or the surface of a graphite boat is required to be cleaned by the hydrofluoric acid, and the oxide layer on the surface of the graphite boat is required to be cleaned, so that the consumption of the hydrofluoric acid is large, and the discharge amount is also large.
The reworked sheet cleaning machine after film plating in the prior art uses the peripheral concentrated acid supply liquid to carry out silicon nitride removal cleaning, hydrofluoric acid is pumped into the PE reworked sheet cleaning machine to carry out soaking cleaning and pure water rinsing, the hydrofluoric acid is directly discharged after being repeatedly used, and on the other hand, the hydrofluoric acid can be directly discharged after being used for a period of time in an acid tank of a texturing process and an etching process.
Therefore, the prior art has great waste of hydrofluoric acid in the cleaning process of the battery piece. Therefore, there is a strong need for a process that can save the amount of hydrofluoric acid used.
Disclosure of Invention
Based on the problems, the invention provides a method for recycling hydrofluoric acid to wash a graphite boat, which is used for solving the problem of larger waste of hydrofluoric acid in the cleaning process of battery pieces in the prior art. According to the invention, the old hydrofluoric acid is collected in the waste acid storage tank, and then the old hydrofluoric acid is blended again until reaching the required concentration, and then the waste hydrofluoric acid is used for cleaning the reworked sheet, so that the recycling of the old hydrofluoric acid is achieved, and a large amount of hydrofluoric acid can be saved.
The invention adopts the following technical scheme for realizing the purposes:
a method for recycling hydrofluoric acid to wash graphite boats comprises the following steps:
step 1: collecting and storing the used old hydrofluoric acid in a waste acid storage tank;
step 2: pumping old hydrofluoric acid in the waste acid storage tank into a self-prepared storage tank;
step 3: measuring the concentration of old hydrofluoric acid in the self-prepared storage tank;
step 4: adding new hydrofluoric acid or clear water into the self-prepared storage pool according to the measured concentration of the old hydrofluoric acid in the self-prepared storage pool until the concentration of the old hydrofluoric acid in the self-prepared storage pool reaches the requirement;
step 5: adding old hydrofluoric acid in the self-prepared storage pool into a graphite boat cleaning tank, and putting the flower basket with reworked pieces into the graphite boat cleaning tank for soaking.
Working principle: storing a large amount of old hydrofluoric acid used in a texturing process or other cleaning processes in a waste acid storage tank, pumping the old hydrofluoric acid in the waste acid storage tank into a self-prepared storage tank when a reworked piece is required to be cleaned, measuring the concentration of the old hydrofluoric acid, and adding clear water into the waste acid storage tank until the old hydrofluoric acid reaches the required concentration if the concentration of the old hydrofluoric acid is higher than the required concentration; if the concentration of the old hydrofluoric acid is lower than the required concentration, new hydrofluoric acid can be added into the waste acid storage tank, the concentration of the new hydrofluoric acid is required to be higher than that of the old hydrofluoric acid, the new hydrofluoric acid is stopped to be added into the waste acid storage tank after the old hydrofluoric acid reaches the required concentration, the blended old hydrofluoric acid is added into a graphite boat cleaning tank, and then the basket with the reworked piece is placed into the graphite boat cleaning tank for soaking, so that the old hydrofluoric acid can be reused, and a large amount of hydrofluoric acid can be saved.
As a preferred mode, graphite boat washing tank, spent acid holding tank, from joining in marriage the pond and pass through the catheter intercommunication in proper order, from joining in marriage between holding tank and the graphite boat washing tank through communicating pipe intercommunication, on the catheter between graphite boat washing tank and the spent acid holding tank, on the spent acid holding tank and from joining in marriage the catheter between the holding tank, from joining in marriage on the communicating pipe between holding tank and the graphite boat washing tank all install the water valve, the outlet pipe is still installed to the lower part of graphite boat washing tank, install the water valve on the outlet pipe.
As a preferable mode, the novel hydrofluoric acid is contained in a novel acid storage tank, the novel acid storage tank is communicated with a self-prepared storage tank through an acid adding pipe, and a water valve is arranged on the acid adding pipe.
As a preferable mode, the clean water is contained in a water tank, the water tank is communicated with the self-matched storage tank through a water adding pipe, and a water valve is arranged on the water adding pipe.
As a preferable mode, a filter cover capable of sealing the communicating pipe is arranged on the inner wall of the self-matched storage pool, and a plurality of filter holes are formed in the filter cover.
As a preferred mode, the concentration of the old hydrofluoric acid in the graphite boat cleaning tank is 15%.
As a preferred mode, the reworked sheet is immersed in a graphite boat wash tank for 1200 seconds.
The beneficial effects of the invention are as follows:
(1) According to the invention, the old hydrofluoric acid is collected in the waste acid storage tank, and then the old hydrofluoric acid is blended again until reaching the required concentration, and then the waste hydrofluoric acid is used for cleaning the reworked sheet, so that the recycling of the old hydrofluoric acid is achieved, and a large amount of hydrofluoric acid can be saved.
(2) According to the invention, the graphite boat cleaning tank, the waste acid storage tank and the self-matched storage tank are sequentially communicated with each other to form a closed loop, and circulation of old hydrofluoric acid in the graphite boat cleaning tank can be realized only by opening or closing a water valve between the graphite boat cleaning tank and the waste acid storage tank, and if the pressure is too low, a water pump can be arranged on a liquid guide pipe for increasing the corresponding pressure; the waste hydrofluoric acid used in the texturing process or other cleaning processes flows into the waste acid storage tank through the liquid guide pipe, then flows into the self-prepared storage tank through the liquid guide pipe, and flows into the graphite boat cleaning tank through the communicating pipe after the waste hydrofluoric acid in the self-prepared storage tank is mixed, and after the waste hydrofluoric acid in the graphite boat cleaning tank cannot be used any more, the waste hydrofluoric acid can be drained to a specified place through the outflow pipe, so that the recycling of the waste hydrofluoric acid is more convenient, and the efficiency is higher.
(3) In the invention, the new hydrofluoric acid is contained in the new acid storage tank, the new acid storage tank is communicated with the self-prepared storage tank through the acid adding pipe, the water valve is arranged on the acid adding pipe, and when the concentration of the old hydrofluoric acid is lower than the required concentration, the water valve on the acid adding pipe is opened, so that the acid in the new acid storage tank flows into the self-prepared storage tank, and the new hydrofluoric acid is conveniently added into the self-prepared storage tank.
(4) In the invention, clean water is contained in the water tank, the water tank is communicated with the self-matched storage tank through the water adding pipe, the water adding pipe is provided with the water valve, when the concentration of old hydrofluoric acid is higher than the required concentration, the water valve on the water adding pipe is opened, so that the clean water in the water tank flows into the self-matched storage tank, and the clean water is conveniently added into the self-matched storage tank.
(5) The inner wall of the self-matched storage pool is provided with the filter cover which can seal the communicating pipe, the filter cover is provided with a plurality of filter holes, and the filter cover can filter impurities in hydrofluoric acid and is used for reducing the impurity or sediment in old hydrofluoric acid.
Drawings
FIG. 1 is a schematic diagram of the structure of the present invention;
FIG. 2 is an enlarged schematic view of the invention at A in FIG. 1;
reference numerals: the waste acid treatment device comprises a liquid guide pipe 1, a self-matched storage tank 2, a neo-acid storage tank 3, an acid adding pipe 4, a water tank 5, a water adding pipe 6, a communicating pipe 7, a graphite boat cleaning tank 8, a water valve 9, a waste acid storage tank 10, an outflow pipe 11, a filtering cover 12 and a filtering hole 121.
Detailed Description
For a better understanding of the present invention, reference is made to the following description of the invention, taken in conjunction with the accompanying drawings and the following examples.
Example 1:
as shown in fig. 1, a method for recycling hydrofluoric acid to wash graphite boats comprises the following steps:
step 1: collecting and storing the used old hydrofluoric acid in the waste acid storage tank 10;
step 2: pumping old hydrofluoric acid in the waste acid storage tank 10 into the self-prepared storage tank 2;
step 3: measuring the concentration of old hydrofluoric acid in the self-prepared storage tank 2;
step 4: adding new hydrofluoric acid or clear water into the self-prepared storage tank 2 according to the measured concentration of the old hydrofluoric acid in the self-prepared storage tank 2 until the concentration of the old hydrofluoric acid in the self-prepared storage tank 2 meets the requirement;
step 5: adding old hydrofluoric acid in the self-prepared storage tank 2 into a graphite boat cleaning tank 8, and putting a flower basket with reworked sheets into the graphite boat cleaning tank 8 for soaking.
Working principle: storing a large amount of old hydrofluoric acid used in a texturing process or other cleaning processes in a waste acid storage tank 10, pumping the old hydrofluoric acid in the waste acid storage tank 10 into a self-prepared storage tank 2 when a reworked piece is required to be cleaned, measuring the concentration of the old hydrofluoric acid, adding clear water into the waste acid storage tank 10 when the concentration of the old hydrofluoric acid is higher than a required concentration, and stopping adding clear water into the waste acid storage tank 10 until the old hydrofluoric acid reaches the required concentration; if the concentration of the old hydrofluoric acid is lower than the required concentration, new hydrofluoric acid can be added into the waste acid storage tank 10, the concentration of the new hydrofluoric acid is required to be higher than that of the old hydrofluoric acid, the new hydrofluoric acid is stopped to be added into the waste acid storage tank 10 until the old hydrofluoric acid reaches the required concentration, then the blended old hydrofluoric acid is added into the graphite boat cleaning tank 8, and then the basket with reworked pieces is placed into the graphite boat cleaning tank 8 for soaking, so that the old hydrofluoric acid can be reused, and a large amount of hydrofluoric acid can be saved.
Notably, are: only the etching and cleaning processes in the conventional technology are used for a hydrofluoric acid washing tank, and if other processes appear later, hydrofluoric acid is used or the main component of waste acid is hydrofluoric acid, the process is also included in the patent.
Example 2:
as shown in fig. 1-2, on the basis of the above embodiment, this embodiment provides a preferred mode of recycling the old hydrofluoric acid, that is, the graphite boat cleaning tank 8, the waste acid storage tank 10 and the self-assembled storage tank 2 are sequentially communicated through the liquid guide tube 1, the self-assembled storage tank 2 is communicated with the graphite boat cleaning tank 8 through the communicating tube 7, the liquid guide tube 1 between the graphite boat cleaning tank 8 and the waste acid storage tank 10, the liquid guide tube 1 between the waste acid storage tank 10 and the self-assembled storage tank 2, the communicating tube 7 between the self-assembled storage tank 2 and the graphite boat cleaning tank 8 are all provided with water valves 9, the lower part of the graphite boat cleaning tank 8 is also provided with an outflow tube 11, and the outflow tube 11 is provided with the water valves 9.
Preferably, the new hydrofluoric acid is contained in the new acid storage tank 3, the new acid storage tank 3 is communicated with the self-assembled storage tank 2 through an acid adding pipe 4, a water valve 9 is arranged on the acid adding pipe 4, and when the concentration of the old hydrofluoric acid is lower than the required concentration, the water valve 9 on the acid adding pipe 4 is opened, so that the acid in the new acid storage tank 3 flows into the self-assembled storage tank 2, and the new hydrofluoric acid is conveniently added into the self-assembled storage tank 2.
Preferably, clean water is contained in the water tank 5, the water tank 5 is communicated with the self-prepared storage tank 2 through the water adding pipe 6, the water adding pipe 6 is provided with the water valve 9, when the concentration of old hydrofluoric acid is higher than the required concentration, the water valve 9 on the water adding pipe 6 is opened, so that the clean water in the water tank 5 flows into the self-prepared storage tank 2, and the clean water is conveniently added into the self-prepared storage tank 2.
Preferably, a filter cover 12 capable of sealing the communicating pipe 7 is mounted on the inner wall of the self-assembled storage tank 2, a plurality of filter holes 121 are formed in the filter cover 12, and the filter cover 12 can filter impurities in the hydrofluoric acid and is used for reducing the impurity or sediment in the old hydrofluoric acid.
Preferably, the concentration of the old hydrofluoric acid in the graphite boat cleaning tank 8 is 15%, and the reworked sheet is immersed in the graphite boat cleaning tank 8 for 1200 seconds, but the concentration and immersing time of the old hydrofluoric acid in the graphite boat cleaning tank 8 may be different depending on the kind of the immersed reworked sheet.
Based on the technical scheme, the method comprises the following steps: this patent is not directed to cleaning of reworked silicon nitride alone, but other cleaning with hydrofluoric acid, such as silicon nitride, silicon dioxide or other passivation layers, should be included in this patent; this patent is not only to hydrofluoric acid recycle, and other purer easily-separated and extracted waste liquids such as HCl, H2O2 or other chemical products should also be included in this patent.
The rest is the same as in example 1, and thus, a description thereof will be omitted.
The above is an embodiment of the present invention. The foregoing embodiments and the specific parameters of the embodiments are only for clarity of description of the invention and are not intended to limit the scope of the invention, which is defined by the appended claims, and all equivalent structural changes made in the description and drawings of the invention are intended to be included in the scope of the invention.
Claims (7)
1. The method for recycling the hydrofluoric acid to wash the graphite boat is characterized by comprising the following steps of:
step 1: collecting and storing the used old hydrofluoric acid in a waste acid storage tank (10);
step 2: pumping old hydrofluoric acid in a waste acid storage tank (10) into a self-prepared storage tank (2);
step 3: measuring the concentration of old hydrofluoric acid in the self-prepared storage tank (2);
step 4: adding new hydrofluoric acid or clear water into the self-prepared storage pool (2) according to the measured concentration of the old hydrofluoric acid in the self-prepared storage pool (2) until the concentration of the old hydrofluoric acid in the self-prepared storage pool (2) meets the requirement;
step 5: adding old hydrofluoric acid in the self-prepared storage tank (2) into a graphite boat cleaning tank (8), and putting a flower basket with reworked pieces into the graphite boat cleaning tank (8) for soaking.
2. The method for recycling hydrofluoric acid to wash graphite boat as claimed in claim 1, wherein: graphite boat washing tank (8), spent acid reservoir (10), from joining in marriage depositing reservoir (2) and pass through catheter (1) intercommunication in proper order, from joining in marriage depositing reservoir (2) and graphite boat washing tank (8) between through communicating pipe (7) intercommunication, on catheter (1) between graphite boat washing tank (8) and spent acid reservoir (10), spent acid reservoir (10) and from on catheter (1) between joining in marriage depositing reservoir (2), from on communicating pipe (7) between joining in marriage depositing reservoir (2) and graphite boat washing tank (8) all install water valve (9), outlet pipe (11) are still installed to the lower part of graphite boat washing tank (8), install water valve (9) on outlet pipe (11).
3. The method for recycling hydrofluoric acid to wash graphite boat as claimed in claim 2, wherein: the novel hydrofluoric acid is contained in a novel acid storage tank (3), the novel acid storage tank (3) is communicated with the self-assembled storage tank (2) through an acid adding pipe (4), and a water valve (9) is arranged on the acid adding pipe (4).
4. A method for recycling hydrofluoric acid for washing graphite boat according to claim 3, wherein: the clean water is contained in the water tank (5), the water tank (5) is communicated with the self-matched storage tank (2) through a water adding pipe (6), and a water valve (9) is arranged on the water adding pipe (6).
5. A method for recycling hydrofluoric acid for washing graphite boat according to any one of claims 2 to 4, wherein: the inner wall of the self-distribution storage pool (2) is provided with a filter cover (12) capable of sealing the communicating pipe (7), and the filter cover (12) is provided with a plurality of filter holes (121).
6. The method for recycling hydrofluoric acid to wash graphite boat as claimed in claim 1, wherein: the concentration of the old hydrofluoric acid in the graphite boat cleaning tank (8) is 15%.
7. The method for recycling hydrofluoric acid to wash graphite boat as defined in claim 6, wherein: the reworked sheet is soaked in a graphite boat cleaning tank (8) for 1200 seconds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010133589.8A CN111354637B (en) | 2020-02-28 | 2020-02-28 | Method for washing graphite boat by recycling hydrofluoric acid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010133589.8A CN111354637B (en) | 2020-02-28 | 2020-02-28 | Method for washing graphite boat by recycling hydrofluoric acid |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111354637A CN111354637A (en) | 2020-06-30 |
| CN111354637B true CN111354637B (en) | 2023-07-25 |
Family
ID=71197176
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010133589.8A Active CN111354637B (en) | 2020-02-28 | 2020-02-28 | Method for washing graphite boat by recycling hydrofluoric acid |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111354637B (en) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006111487A (en) * | 2004-10-14 | 2006-04-27 | Mitsubishi Chemical Engineering Corp | Method for recovering hydrofluoric acid |
| CN106952805A (en) * | 2017-04-11 | 2017-07-14 | 东方日升新能源股份有限公司 | A kind of graphite boat cleaning |
| CN107256842A (en) * | 2013-09-30 | 2017-10-17 | 芝浦机械电子装置股份有限公司 | Substrate processing method using same and substrate board treatment |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0737851A (en) * | 1993-07-20 | 1995-02-07 | Nippon Steel Corp | Cleaning device |
| JP3343776B2 (en) * | 1997-09-09 | 2002-11-11 | 東京エレクトロン株式会社 | Cleaning treatment apparatus and cleaning treatment method |
| JP4370737B2 (en) * | 2001-06-27 | 2009-11-25 | 三菱化学エンジニアリング株式会社 | Supplying hydrofluoric acid |
| JP4507271B2 (en) * | 2002-11-28 | 2010-07-21 | 栗田工業株式会社 | Method for recovering hydrofluoric acid |
| JP2006186065A (en) * | 2004-12-27 | 2006-07-13 | Matsushita Electric Ind Co Ltd | Washing device for electronic device and manufacturing method of electronic device |
| JP4412503B2 (en) * | 2007-02-14 | 2010-02-10 | セイコーエプソン株式会社 | PROCESSING DEVICE AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD |
| CN202601704U (en) * | 2012-05-11 | 2012-12-12 | 无锡德鑫太阳能电力有限公司 | Washing device capable of being used to recycle hydrofluoric acid |
| CN203812898U (en) * | 2014-04-25 | 2014-09-03 | 天津英利新能源有限公司 | Internal circulation type graphite boat cleaning device |
| JP2016081985A (en) * | 2014-10-14 | 2016-05-16 | ダイキン工業株式会社 | Method for reusing cleaning and/or etching waste liquid |
| JP6383254B2 (en) * | 2014-11-04 | 2018-08-29 | 株式会社東芝 | Processing apparatus and processing method |
| CN205104507U (en) * | 2015-03-31 | 2016-03-23 | 中建材浚鑫科技股份有限公司 | Polycrystalline silicon solar cell making herbs into wool concentration flow circulation meter device |
| CN105537186A (en) * | 2016-02-26 | 2016-05-04 | 天津英利新能源有限公司 | Automatic cleaning device and method for graphite boat |
| JP6903446B2 (en) * | 2016-03-07 | 2021-07-14 | 芝浦メカトロニクス株式会社 | Substrate processing equipment and substrate processing method |
| CN205797868U (en) * | 2016-07-12 | 2016-12-14 | 昊诚光电（太仓）有限公司 | A kind of graphite boat cleans device |
| CN108493295A (en) * | 2018-03-13 | 2018-09-04 | 苏州晶瑞化学股份有限公司 | A kind of circulation utilization method of solar silicon wafers making herbs into wool solution |
| CN208753278U (en) * | 2018-10-12 | 2019-04-16 | 德淮半导体有限公司 | Wafer etching apparatus |
| CN110010527A (en) * | 2019-03-27 | 2019-07-12 | 通威太阳能（成都）有限公司 | A kind of silk screen printing is done over again piece cleaning machine and its cleaning method |
-
2020
- 2020-02-28 CN CN202010133589.8A patent/CN111354637B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006111487A (en) * | 2004-10-14 | 2006-04-27 | Mitsubishi Chemical Engineering Corp | Method for recovering hydrofluoric acid |
| CN107256842A (en) * | 2013-09-30 | 2017-10-17 | 芝浦机械电子装置股份有限公司 | Substrate processing method using same and substrate board treatment |
| CN106952805A (en) * | 2017-04-11 | 2017-07-14 | 东方日升新能源股份有限公司 | A kind of graphite boat cleaning |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111354637A (en) | 2020-06-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| WO2020006795A1 (en) | Method and device for realizing etching and polishing of silicon wafer with alkaline system by using ozone | |
| KR20090017920A (en) | An apparatus for cleaning hollow fiber membrane and a method therefor | |
| CN111354637B (en) | Method for washing graphite boat by recycling hydrofluoric acid | |
| CN101722158B (en) | Liquid replenishing method used for groove-type cleaning machine | |
| CN208758278U (en) | A kind of silicon wafer cleaner | |
| JP3138901B2 (en) | Substrate immersion processing equipment | |
| CN204685622U (en) | A kind of silicon wafer cleaner pure water recovery system | |
| CN210684001U (en) | High-efficient single crystal texturing equipment | |
| CN103866397A (en) | Surface pretreatment device for polycrystalline silicon ingot and treatment method thereof | |
| CN103668268B (en) | A kind of waste acidity recovery reutilization system | |
| CN202290646U (en) | Silicon wafer cleaning machine | |
| CN219785759U (en) | Silicon wafer cleaning device | |
| CN214244625U (en) | Cleaning device for workpiece before galvanization | |
| CN210736892U (en) | Polishing acid liquor cyclic utilization device | |
| CN212190272U (en) | Polycrystalline silicon wafer surface leaching device | |
| CN212069846U (en) | Silicon wafer cleaning device | |
| CN210325829U (en) | PERC battery cleaning and texturing system | |
| CN206619515U (en) | A kind of efficient aluminium foil cleaning device | |
| CN206359602U (en) | A kind of ground continuous wash groove | |
| CN105999860A (en) | Water-cycle filter element cleaning machine | |
| JP2000058492A (en) | Immersion processing system for substrate | |
| CN202438486U (en) | Rinsing device of storage battery electrode plate | |
| CN113828584B (en) | Graphite boat cleaning method and equipment | |
| CN110947275A (en) | Pickling line acid mist washing system | |
| CN212625515U (en) | Alkaline etching polishing equipment for battery piece production |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |