CN111225994B - 一种金属化薄膜 - Google Patents
一种金属化薄膜 Download PDFInfo
- Publication number
- CN111225994B CN111225994B CN201980004289.5A CN201980004289A CN111225994B CN 111225994 B CN111225994 B CN 111225994B CN 201980004289 A CN201980004289 A CN 201980004289A CN 111225994 B CN111225994 B CN 111225994B
- Authority
- CN
- China
- Prior art keywords
- metallized film
- film
- silicon
- metal
- metal layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 239000011104 metalized film Substances 0.000 title claims abstract description 117
- 229910052751 metal Inorganic materials 0.000 claims description 112
- 239000002184 metal Substances 0.000 claims description 112
- 239000011241 protective layer Substances 0.000 claims description 75
- 239000010410 layer Substances 0.000 claims description 69
- 239000010408 film Substances 0.000 claims description 64
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 57
- 229910052710 silicon Inorganic materials 0.000 claims description 56
- 239000010703 silicon Substances 0.000 claims description 56
- 239000011701 zinc Substances 0.000 claims description 49
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 47
- 229910052782 aluminium Inorganic materials 0.000 claims description 36
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 36
- 239000001301 oxygen Substances 0.000 claims description 36
- 229910052760 oxygen Inorganic materials 0.000 claims description 36
- -1 polypropylene Polymers 0.000 claims description 35
- 239000004743 Polypropylene Substances 0.000 claims description 32
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 30
- 229910052725 zinc Inorganic materials 0.000 claims description 28
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 22
- 239000011737 fluorine Substances 0.000 claims description 22
- 229910052731 fluorine Inorganic materials 0.000 claims description 22
- 229920001296 polysiloxane Polymers 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 21
- 239000000126 substance Substances 0.000 claims description 18
- 230000033558 biomineral tissue development Effects 0.000 claims description 13
- 239000010702 perfluoropolyether Substances 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 9
- 238000005011 time of flight secondary ion mass spectroscopy Methods 0.000 claims description 8
- 238000002042 time-of-flight secondary ion mass spectrometry Methods 0.000 claims description 8
- 229920001155 polypropylene Polymers 0.000 claims description 6
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 4
- 239000000758 substrate Substances 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 3
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 3
- 150000002736 metal compounds Chemical class 0.000 claims description 3
- 125000003396 thiol group Chemical class [H]S* 0.000 claims description 3
- 239000002033 PVDF binder Substances 0.000 claims description 2
- 239000004734 Polyphenylene sulfide Substances 0.000 claims description 2
- 239000004793 Polystyrene Substances 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920000728 polyester Polymers 0.000 claims description 2
- 229920000069 polyphenylene sulfide Polymers 0.000 claims description 2
- 229920002223 polystyrene Polymers 0.000 claims description 2
- 229920002981 polyvinylidene fluoride Polymers 0.000 claims description 2
- 239000004593 Epoxy Substances 0.000 claims 1
- 239000004698 Polyethylene Substances 0.000 claims 1
- 150000008065 acid anhydrides Chemical class 0.000 claims 1
- 229920000573 polyethylene Polymers 0.000 claims 1
- 239000003990 capacitor Substances 0.000 abstract description 62
- 230000002035 prolonged effect Effects 0.000 abstract description 2
- 230000007423 decrease Effects 0.000 abstract 1
- 238000000034 method Methods 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 17
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 16
- 239000002210 silicon-based material Substances 0.000 description 16
- 238000009832 plasma treatment Methods 0.000 description 15
- 238000012360 testing method Methods 0.000 description 14
- 239000007789 gas Substances 0.000 description 13
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 10
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 10
- 150000001875 compounds Chemical class 0.000 description 9
- 230000001590 oxidative effect Effects 0.000 description 9
- 238000007747 plating Methods 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 229910045601 alloy Inorganic materials 0.000 description 8
- 239000000956 alloy Substances 0.000 description 8
- 238000009826 distribution Methods 0.000 description 8
- 230000000694 effects Effects 0.000 description 8
- 150000003376 silicon Chemical class 0.000 description 8
- 238000010998 test method Methods 0.000 description 7
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 239000004411 aluminium Substances 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 230000006870 function Effects 0.000 description 5
- 150000002500 ions Chemical group 0.000 description 5
- 239000007788 liquid Chemical group 0.000 description 5
- 239000003921 oil Substances 0.000 description 5
- 238000005507 spraying Methods 0.000 description 5
- 238000005211 surface analysis Methods 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical group O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 4
- 229910001882 dioxygen Inorganic materials 0.000 description 4
- 238000000605 extraction Methods 0.000 description 4
- 238000009499 grossing Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 229920002545 silicone oil Polymers 0.000 description 4
- 238000004846 x-ray emission Methods 0.000 description 4
- 229910002703 Al K Inorganic materials 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 208000027418 Wounds and injury Diseases 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 230000006872 improvement Effects 0.000 description 3
- 238000004255 ion exchange chromatography Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229920005989 resin Polymers 0.000 description 3
- 239000011347 resin Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229910004530 SIMS 5 Inorganic materials 0.000 description 2
- 229910020489 SiO3 Inorganic materials 0.000 description 2
- 239000004098 Tetracycline Substances 0.000 description 2
- 125000004018 acid anhydride group Chemical group 0.000 description 2
- 238000005269 aluminizing Methods 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 238000004364 calculation method Methods 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 229910052681 coesite Inorganic materials 0.000 description 2
- 229910052906 cristobalite Inorganic materials 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000005246 galvanizing Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000007731 hot pressing Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052682 stishovite Inorganic materials 0.000 description 2
- 229910052905 tridymite Inorganic materials 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229920000134 Metallised film Polymers 0.000 description 1
- 229910018557 Si O Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical group [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910007570 Zn-Al Inorganic materials 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- OPNPQXLQERQBBV-UHFFFAOYSA-N carbromal Chemical group CCC(Br)(CC)C(=O)NC(N)=O OPNPQXLQERQBBV-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000007130 inorganic reaction Methods 0.000 description 1
- 229910021331 inorganic silicon compound Inorganic materials 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000001883 metal evaporation Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N naphthalene-acid Natural products C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 125000000962 organic group Chemical group 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012188 paraffin wax Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 description 1
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 1
- 229920003216 poly(methylphenylsiloxane) Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 239000011112 polyethylene naphthalate Substances 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000009993 protective function Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Inorganic materials [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000004441 surface measurement Methods 0.000 description 1
- 238000007751 thermal spraying Methods 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000004876 x-ray fluorescence Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN2018103920066 | 2018-04-27 | ||
CN201810392006 | 2018-04-27 | ||
PCT/CN2019/083601 WO2019206058A1 (zh) | 2018-04-27 | 2019-04-22 | 一种金属化薄膜 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111225994A CN111225994A (zh) | 2020-06-02 |
CN111225994B true CN111225994B (zh) | 2022-05-17 |
Family
ID=68294912
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201980004289.5A Active CN111225994B (zh) | 2018-04-27 | 2019-04-22 | 一种金属化薄膜 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP7465805B2 (ja) |
CN (1) | CN111225994B (ja) |
WO (1) | WO2019206058A1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112863868B (zh) * | 2021-01-13 | 2022-07-22 | 佛山易事达电容材料有限公司 | 一种耐高温高湿安全膜的制作方法 |
Citations (15)
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JPS5219247A (en) * | 1975-08-01 | 1977-02-14 | Nippon Electric Co | Method of making thinnfilm capacitors |
CN1112963A (zh) * | 1994-04-15 | 1995-12-06 | 东丽株式会社 | 金属化薄膜和包含该金属化薄膜的电容器 |
US5738926A (en) * | 1991-11-29 | 1998-04-14 | Diafoil Hoechst Company Limited | Metallized polyester film capacitor |
JP2003017355A (ja) * | 2001-06-28 | 2003-01-17 | Toray Ind Inc | コンデンサ用金属化フィルム及びコンデンサ |
JP2004039715A (ja) * | 2002-07-01 | 2004-02-05 | Toray Ind Inc | コンデンサ用フィルム及びそれを用いたコンデンサ |
JP2005159169A (ja) * | 2003-11-27 | 2005-06-16 | Kyocera Corp | 薄膜コンデンサ |
JP2006264317A (ja) * | 2005-02-22 | 2006-10-05 | Toray Ind Inc | 金属化フィルム、コンデンサ用フィルム及びそれを用いたフィルムコンデンサ |
JP2008263172A (ja) * | 2007-03-20 | 2008-10-30 | Toray Ind Inc | 金属化フィルム、およびそれを用いたコンデンサ |
CN101356604A (zh) * | 2006-01-13 | 2009-01-28 | 东丽株式会社 | 金属化电容器用薄膜和使用该薄膜的电容器 |
CN102265361A (zh) * | 2008-12-22 | 2011-11-30 | 大金工业株式会社 | 膜电容器用膜和膜电容器 |
CN102959656A (zh) * | 2010-06-29 | 2013-03-06 | 东丽株式会社 | 双轴取向聚丙烯膜、金属化膜和膜电容器 |
JP2016157755A (ja) * | 2015-02-24 | 2016-09-01 | パナソニックIpマネジメント株式会社 | 金属化フィルムコンデンサ |
CN106480406A (zh) * | 2016-10-17 | 2017-03-08 | 东丽薄膜加工(中山)有限公司 | 金属化薄膜及其制备方法和电容器 |
CN107731526A (zh) * | 2017-11-02 | 2018-02-23 | 江苏田字格新材料科技有限公司 | 抗氧化电容器薄膜 |
CN107887161A (zh) * | 2017-11-02 | 2018-04-06 | 江苏田字格新材料科技有限公司 | 抗衰减电容器薄膜 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3769842B2 (ja) * | 1996-11-05 | 2006-04-26 | 東レ株式会社 | 金属蒸着フィルム、その製造方法、およびそれを用いたコンデンサ |
JP2007109845A (ja) * | 2005-10-13 | 2007-04-26 | Toray Ind Inc | コンデンサ用金属蒸着フィルムおよびコンデンサ |
JP5501002B2 (ja) * | 2010-01-15 | 2014-05-21 | 株式会社アルバック | フィルムコンデンサ用金属化フィルムの製造方法 |
-
2019
- 2019-04-22 JP JP2020532931A patent/JP7465805B2/ja active Active
- 2019-04-22 WO PCT/CN2019/083601 patent/WO2019206058A1/zh active Application Filing
- 2019-04-22 CN CN201980004289.5A patent/CN111225994B/zh active Active
Patent Citations (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5219247A (en) * | 1975-08-01 | 1977-02-14 | Nippon Electric Co | Method of making thinnfilm capacitors |
US5738926A (en) * | 1991-11-29 | 1998-04-14 | Diafoil Hoechst Company Limited | Metallized polyester film capacitor |
CN1112963A (zh) * | 1994-04-15 | 1995-12-06 | 东丽株式会社 | 金属化薄膜和包含该金属化薄膜的电容器 |
JP2003017355A (ja) * | 2001-06-28 | 2003-01-17 | Toray Ind Inc | コンデンサ用金属化フィルム及びコンデンサ |
JP2004039715A (ja) * | 2002-07-01 | 2004-02-05 | Toray Ind Inc | コンデンサ用フィルム及びそれを用いたコンデンサ |
JP2005159169A (ja) * | 2003-11-27 | 2005-06-16 | Kyocera Corp | 薄膜コンデンサ |
JP2006264317A (ja) * | 2005-02-22 | 2006-10-05 | Toray Ind Inc | 金属化フィルム、コンデンサ用フィルム及びそれを用いたフィルムコンデンサ |
CN101356604A (zh) * | 2006-01-13 | 2009-01-28 | 东丽株式会社 | 金属化电容器用薄膜和使用该薄膜的电容器 |
JP2008263172A (ja) * | 2007-03-20 | 2008-10-30 | Toray Ind Inc | 金属化フィルム、およびそれを用いたコンデンサ |
CN102265361A (zh) * | 2008-12-22 | 2011-11-30 | 大金工业株式会社 | 膜电容器用膜和膜电容器 |
CN102959656A (zh) * | 2010-06-29 | 2013-03-06 | 东丽株式会社 | 双轴取向聚丙烯膜、金属化膜和膜电容器 |
JP2016157755A (ja) * | 2015-02-24 | 2016-09-01 | パナソニックIpマネジメント株式会社 | 金属化フィルムコンデンサ |
CN106480406A (zh) * | 2016-10-17 | 2017-03-08 | 东丽薄膜加工(中山)有限公司 | 金属化薄膜及其制备方法和电容器 |
CN107731526A (zh) * | 2017-11-02 | 2018-02-23 | 江苏田字格新材料科技有限公司 | 抗氧化电容器薄膜 |
CN107887161A (zh) * | 2017-11-02 | 2018-04-06 | 江苏田字格新材料科技有限公司 | 抗衰减电容器薄膜 |
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