CN111215398A - Cleaning system and cleaning method for mask plate - Google Patents
Cleaning system and cleaning method for mask plate Download PDFInfo
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- CN111215398A CN111215398A CN202010121194.6A CN202010121194A CN111215398A CN 111215398 A CN111215398 A CN 111215398A CN 202010121194 A CN202010121194 A CN 202010121194A CN 111215398 A CN111215398 A CN 111215398A
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- 238000004140 cleaning Methods 0.000 title claims abstract description 172
- 238000000034 method Methods 0.000 title claims abstract description 28
- 239000007788 liquid Substances 0.000 claims abstract description 52
- 239000003814 drug Substances 0.000 claims abstract description 37
- 238000007664 blowing Methods 0.000 claims abstract description 18
- 238000009210 therapy by ultrasound Methods 0.000 claims abstract description 8
- 238000001035 drying Methods 0.000 claims description 21
- 238000005507 spraying Methods 0.000 claims description 17
- 239000000126 substance Substances 0.000 claims description 13
- 238000010438 heat treatment Methods 0.000 claims description 6
- 230000000694 effects Effects 0.000 abstract description 31
- 239000002699 waste material Substances 0.000 abstract description 15
- 239000007789 gas Substances 0.000 description 97
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 45
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 18
- 238000010586 diagram Methods 0.000 description 16
- 239000000463 material Substances 0.000 description 14
- 238000004880 explosion Methods 0.000 description 13
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 10
- 239000002245 particle Substances 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 229940079593 drug Drugs 0.000 description 8
- 239000000725 suspension Substances 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 7
- 238000002791 soaking Methods 0.000 description 7
- 239000013078 crystal Substances 0.000 description 6
- 239000008367 deionised water Substances 0.000 description 6
- 229910021641 deionized water Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 6
- 230000009286 beneficial effect Effects 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000011160 research Methods 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000002457 bidirectional effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000004506 ultrasonic cleaning Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005019 vapor deposition process Methods 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000003670 easy-to-clean Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000008707 rearrangement Effects 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0007—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by explosions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
Abstract
The embodiment of the invention discloses a cleaning system and a cleaning method of a mask plate. The cleaning system of the mask plate comprises: the mask plate supporting device is used for supporting a mask plate; the cleaning equipment is used for blowing ultrasonic gas to the surface of the mask plate, and the ultrasonic gas is gas subjected to ultrasonic treatment; the flow velocity of the ultrasonic gas is higher than a preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean stains on the surface of the mask plate. Compared with the prior art, the embodiment of the invention reduces the dosage of liquid medicine, reduces the amount of waste liquid generated and reduces the danger on the basis of ensuring the cleaning effect on the mask plate.
Description
Technical Field
The embodiment of the invention relates to the technical field of display, in particular to a mask plate cleaning system and a mask plate cleaning method.
Background
With the continuous development of display technology, the application range of display panels is wider and wider, the requirements of people on the display panels are higher and higher, and the process requirements of display panel manufacturers on the display panels are also higher and higher.
The vapor deposition process is an important step of a panel manufacturing process, and the mask plate is a key component used in the vapor deposition process. With the progress of vapor deposition production, vapor deposition materials can remain on the surface of the mask plate to form stains and shield the opening of the mask plate. If the stains are not cleaned in time, the product yield of the display panel is affected. In the prior art, a water system cleaning mode is mostly adopted to clean the mask plate, however, the water system cleaning has the problems of large using amount of liquid medicine, more generated waste liquid and high danger.
Disclosure of Invention
The embodiment of the invention provides a mask plate cleaning system and a mask plate cleaning method, which aim to reduce the using amount of liquid medicine, reduce the amount of waste liquid generated and reduce the risk.
In order to achieve the technical purpose, the embodiment of the invention provides the following technical scheme:
a system for cleaning a reticle, comprising:
a mask plate supporting device for supporting a mask plate;
cleaning equipment, wherein the cleaning equipment is used for blowing ultrasonic gas to the surface of the mask plate, and the ultrasonic gas is gas subjected to ultrasonic treatment; the flow velocity of the ultrasonic gas is higher than a preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean stains on the surface of the mask plate.
According to the technical scheme, the embodiment of the invention creatively provides a novel mask plate cleaning system. The cleaning system is different from the prior art in that the cleaning equipment can blow ultrasonic gas to the surface of the mask plate, the flow rate of the ultrasonic gas is higher than the preset speed, cavitation bubbles formed on the surface of the mask plate expand rapidly to achieve the effect of micro explosion, the energy of the micro explosion is large, and stains on the surface of the mask plate can be separated from the mask plate and are in a suspension state so as to achieve the effect of cleaning the stains. Therefore, compared with the prior art, the mask plate does not need to be soaked and cleaned by adopting various liquid medicines, and the using amount of the liquid medicines and the generation of waste liquid are reduced. According to the embodiment of the invention, the template is not required to be dehydrated by IPA solution, so that the danger caused by the IPA solution is avoided. Therefore, the embodiment of the invention reduces the dosage of the liquid medicine, reduces the amount of the waste liquid and reduces the danger on the basis of ensuring the cleaning effect on the mask plate.
Further, the cleaning equipment comprises a pressure cavity, an ultrasonic amplifier, an exhaust channel and an exhaust device, wherein the pressure cavity is used for containing high-pressure gas; the ultrasonic amplifier is connected with the pressure cavity and used for generating high-pressure ultrasonic gas; the exhaust device is arranged at one end of the exhaust channel and is used for discharging the cleaned dirt through the exhaust channel. The cleaning equipment comprises a pressure cavity, an ultrasonic amplifier, an exhaust channel and an exhaust device, and is used for blowing ultrasonic gas to the mask plate.
Furthermore, the frequency range of the ultrasonic amplifier is 40 kHz-170 kHz. For example, the frequency of the ultrasonic amplifier can be selected to be 40kHz, 80kHz, 120kHz, 170kHz, etc. The inventor researches and discovers that the higher the frequency of the ultrasonic amplifier is, the higher the energy of micro explosion generated on the surface of the mask plate is, the smaller the dirt particles which can be cleaned are, and the cleaner the mask plate is cleaned.
Further, the exhaust means comprises a fan.
Furthermore, the pressure of the high-pressure gas in the pressure cavity is higher than the pressure of the gas on the surface of the mask plate, and the higher range is 12 kPa-28 kPa. By the arrangement, cavitation bubbles are easier to form by the ultrasonic gas generated by the high-pressure ultrasonic gas under the pressure difference, and the cleaning effect of the mask plate is enhanced.
Further, the ultrasonic amplifier is positioned inside the pressure chamber; the cleaning equipment further comprises a nozzle, wherein the nozzle is arranged at one end, close to the surface of the mask plate, of the pressure cavity and used for blowing out the ultrasonic gas. The nozzle can lead high-pressure ultrasonic gas out to the corresponding position of the mask plate, and accurate alignment of the cleaning position is facilitated.
Further, the distance between the nozzle and the mask plate is in the range of 0.3mm to 3mm, such as 0.3mm, 0.5mm, 0.8mm, 1mm, 1.5mm, 2mm, 2.5mm or 3 mm. The inventor researches and discovers that when the distance between the nozzle and the mask plate is less than 0.3mm, the number of cavitation bubbles formed by ultrasonic gas is small, and the cleaning of the mask plate is not facilitated; when the distance between the nozzle and the mask plate is more than 3mm, the position where the cavitation bubbles expand and burst is far away from the mask plate, so that the mask plate is not easy to clean; when the distance between the nozzle and the mask plate is 0.3mm to 3mm, the number of cavitation bubbles formed by ultrasonic gas is large, and the position where the cavitation bubbles expand and burst is close to the mask plate, so that the mask plate can be cleaned conveniently.
Further, the pressure chamber and the vent passage are disposed adjacent to each other; the end of the nozzle, which is far away from the pressure cavity, inclines towards the exhaust channel. The arrangement is that dirt particles can be quickly discharged out of the cleaning cavity through the exhaust channel after being separated from the mask plate and suspended, so that the cleaning effect of the mask plate can be enhanced.
Further, the cleaning apparatus includes a first pressure chamber, a second pressure chamber, a first nozzle, and a second nozzle, the gas discharge passage being provided between the first pressure chamber and the second pressure chamber; the first nozzle is arranged at one end of the first pressure cavity, and one end, far away from the first pressure cavity, of the first nozzle inclines towards the exhaust channel; the second nozzle is arranged at one end of the second pressure cavity, and one end, far away from the second pressure cavity, of the second nozzle inclines towards the exhaust channel. Therefore, the first nozzle and the second nozzle share the exhaust channel, the structure of the cleaning equipment is simplified on the basis of not influencing the cleaning effect of the mask plate, and the material cost of the exhaust channel and the exhaust device is saved.
Further, the cleaning equipment also comprises a first ultrasonic amplifier and a second ultrasonic amplifier; the first ultrasonic amplifier is arranged in the first pressure cavity; the second ultrasonic amplifier is arranged in the second pressure cavity.
Further, the cleaning system of the mask plate comprises at least two cleaning devices; at least two cleaning devices are respectively positioned on two sides of the mask plate supporting device. By the arrangement, the mask plate can be subjected to high-speed ultrasonic cleaning from two sides of the mask plate, stains on two sides of the mask plate can be cleaned in a bidirectional cleaning mode, and the cleaning effect of the mask plate is further improved.
Further, the cleaning system for the mask plate further comprises: and the spraying equipment is used for spraying liquid medicine to the mask plate, and the liquid medicine is used for dissolving stains on the surface of the mask plate. Wherein, the stains on the surface of the mask plate are generally evaporation materials (organic matters); alternatively, the chemical solution may include an NMP solution that can dissolve the evaporation material and form white crystals after drying. Compare in coating by vaporization material, white crystal separates from the mask plate under ultrasonic gas's effect more easily, consequently, sets up and sprays equipment and spray the cleaning performance that the liquid medicine further promoted mask plate to the mask plate.
Correspondingly, the invention also provides a cleaning method of the mask plate, which comprises the following steps:
placing a mask plate on mask plate supporting equipment;
blowing ultrasonic gas to the surface of the mask plate, wherein the ultrasonic gas is ultrasonically treated gas; the flow velocity of the ultrasonic gas is higher than a preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean stains on the surface of the mask plate.
Further, before blowing the ultrasonic gas to the surface of the mask plate, the method further comprises:
spraying liquid medicine to the mask plate, wherein the liquid medicine is used for dissolving stains on the surface of the mask plate;
drying the mask plate to form a crystalline substance on the surface of the mask plate;
further, the drying process is performed on the mask plate, and comprises the following steps:
standing the mask plate for a preset time; or,
blowing air to the mask plate by adopting an air knife; or,
and heating the mask plate.
The embodiment of the invention creatively provides a novel mask plate cleaning system. The cleaning system is different from the prior art in that the cleaning equipment can blow ultrasonic gas to the surface of the mask plate, the flow rate of the ultrasonic gas is higher than the preset speed, cavitation bubbles formed on the surface of the mask plate expand rapidly to achieve the effect of micro explosion, the energy of the micro explosion is large, and stains on the surface of the mask plate can be separated from the mask plate and are in a suspension state so as to achieve the effect of cleaning the stains. Therefore, compared with the prior art, the mask plate does not need to be soaked and cleaned by adopting various liquid medicines, and the using amount of the liquid medicines and the generation of waste liquid are reduced. According to the embodiment of the invention, the template is not required to be dehydrated by IPA solution, so that the danger caused by the IPA solution is avoided. Therefore, the embodiment of the invention reduces the dosage of the liquid medicine, reduces the amount of the waste liquid and reduces the danger on the basis of ensuring the cleaning effect on the mask plate.
Drawings
Fig. 1 is a schematic flow chart of a conventional method for cleaning a mask plate;
fig. 2 is a schematic structural diagram of a cleaning system for a mask blank according to an embodiment of the present invention;
fig. 3 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention;
fig. 4 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present disclosure;
fig. 5 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present disclosure;
fig. 6 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present disclosure;
fig. 7 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention;
fig. 8 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention;
fig. 9 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention;
fig. 10 is a schematic structural diagram of a cleaning system for a mask blank according to another embodiment of the present invention;
fig. 11 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present disclosure;
fig. 12 is a schematic flow chart of a method for cleaning a mask blank according to an embodiment of the present invention;
fig. 13 is a schematic flow chart of another method for cleaning a mask blank according to an embodiment of the present invention.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
As described in the background art, the conventional method for cleaning a mask plate has problems of large amount of chemicals, large amount of waste liquid and high risk, and the inventors have found the following reasons. Fig. 1 is a schematic flow chart of a conventional method for cleaning a mask plate. Referring to fig. 1, the cleaning method of the mask plate is water-based cleaning, which comprises the following steps:
s010, soaking a mask plate by adopting an NMP (N-methyl pyrrolidone) solution to remove residual organic matters on the mask plate;
s020, soaking a mask plate by adopting DIW (deionized water), and removing the residual NMP solution on the mask plate;
s030, soaking the mask plate by using a KOH (potassium hydroxide) solution, and removing inorganic matters remained on the mask plate;
s040, soaking the mask plate by using DIW (deionized water), and removing the KOH solution remained on the mask plate;
and S050, dehydrating the mask plate by using IPA (isopropyl alcohol) solution, and drying the mask plate.
As can be seen from the above steps, in the prior art, the cleaning method of the mask plate needs to use NMP solution, DIW, KOH solution, IPA solution, and other chemical solutions, and the chemical solution and the residual stains on the mask plate are chemically reacted by using a soaking manner, so as to remove the residual stains on the mask plate. Wherein, the adoption of the soaking mode needs more liquid medicine, and the dosage of the liquid medicine is large. The liquid medicine soaked in the mask plate becomes waste liquid after the cleaning is finished, so that more waste liquid is generated. In the liquid medicine used in the prior art, the IPA solution has the characteristics of flammability and explosiveness, and has dangerousness for storing and using the IPA solution. In summary, the existing cleaning method of the mask plate has the problems of large liquid medicine consumption, more generated waste liquid and high danger.
In view of this, embodiments of the present invention provide a system for cleaning a reticle, which is applicable to a cleaning chamber and disposed in the cleaning chamber. Fig. 2 is a schematic structural diagram of a cleaning system for a mask blank according to an embodiment of the present invention. Referring to fig. 2, the reticle cleaning system includes a reticle supporting apparatus 100 and a cleaning apparatus 200; the mask holding apparatus 100 is for holding a mask 300; the cleaning device 200 is used for blowing ultrasonic gas to the surface of the mask plate 300, wherein the ultrasonic gas is gas subjected to ultrasonic treatment; the flow rate of the ultrasonic gas is higher than a preset speed, so that cavitation bubbles are formed on the surface of the mask plate 300, and stains on the surface of the mask plate 300 are cleaned.
The preset speed is a speed at which cavitation bubbles can be formed on the surface of the mask plate 300 by the ultrasonic gas, and is illustratively greater than or equal to 20 m/s. Compared with the air flow speed of the fan, the flow speed of the ultrasonic gas is higher, so the ultrasonic gas can be called as high-speed ultrasonic gas, the high-speed ultrasonic gas refers to gas acted by high-speed air flow and ultrasonic waves, cavitation bubbles formed on the surface of the mask plate 300 can be rapidly expanded by the high-speed ultrasonic gas, the micro-explosion effect is achieved, and the energy of the micro-explosion can enable dirt on the surface of the mask plate 300 to be separated from the mask plate 300 and be in a suspension state; then the dirt is driven under the reflection action of the ultrasonic waves, so that the effect of cleaning the dirt is realized. Preferably, the flow rate of the high-speed ultrasonic gas is between 20m/s and 50m/s, so that the arrangement can effectively clean dirt on the surface of the mask plate 300 and ensure that the mask plate 300 is not damaged by the high-speed ultrasonic gas.
Illustratively, the use method of the cleaning system for the mask plate comprises the following steps: placing a reticle 300 on the reticle-holding apparatus 100; high-speed ultrasonic gas is blown to the surface of the mask plate 300 to clean stains on the surface of the mask plate 300.
In summary, the embodiment of the present invention provides a novel cleaning system for a mask plate. The cleaning system is different from the prior art in that the cleaning device 200 can blow ultrasonic gas to the surface of the mask plate 300, the flow rate of the ultrasonic gas is higher than a preset speed, so that cavitation bubbles formed on the surface of the mask plate 300 expand rapidly to achieve a micro explosion effect, the energy of the micro explosion is high, and dirt on the surface of the mask plate 300 can be separated from the mask plate 300 and is in a suspension state, so that the dirt cleaning effect is achieved. Therefore, compared with the prior art, the mask plate 300 does not need to be soaked and cleaned by adopting various liquid medicines, and the using amount of the liquid medicines and the generation of waste liquid are reduced. The embodiment of the invention also does not need to adopt IPA solution to dehydrate the mask plate 300, thereby avoiding the danger brought by the IPA solution. Therefore, the embodiment of the invention reduces the amount of the liquid medicine, reduces the amount of the waste liquid generated and reduces the danger on the basis of ensuring the cleaning effect on the mask plate 300.
Fig. 3 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention. Referring to fig. 3, in one embodiment of the present invention, optionally, the cleaning apparatus 200 includes a pressure chamber 210, an ultrasonic amplifier 220, a vent passage 230, and a vent 240. The pressure chamber 210 is for containing high pressure gas; the ultrasonic amplifier 220 is connected to the pressure chamber 210 for generating high-pressure ultrasonic gas; the exhaust device 240 is disposed at one end of the exhaust passage 230, and the exhaust device 240 is used for exhausting dirt washed off the mask plate 300 through the exhaust passage 230.
The high-pressure gas is a gas pressure inside the pressure chamber 210 that is higher than a gas pressure of a space (cleaning chamber) in which the mask plate 300 is located. The ultrasonic amplifier 220 is a device that can convert input electric power into ultrasonic waves, and can perform ultrasonic treatment on high-pressure gas to form high-pressure ultrasonic gas. The high-pressure ultrasonic gas is driven by the internal and external pressure difference to generate ultrasonic gas when being discharged, cavitation bubbles formed on the surface of the mask plate 300 by the ultrasonic gas are rapidly expanded to play a role of micro explosion, and stains on the surface of the mask plate 300 can be separated from the mask plate 300 and are in a suspension state.
The exhaust unit 240 is a unit capable of exhausting gas from the cleaning chamber, and the gas in the chamber is exhausted through the exhaust passage 230 and the exhaust unit 240. The suspended soil particles are exhausted simultaneously with the exhausting of the gas from the cleaning chamber. Optionally, the exhaust 240 exhausts the gas by entraining the gas flow of the cleaning chamber. For example, the exhaust device 240 includes a fan, when the fan blades of the fan rotate, the air at the upper part of the exhaust channel 230 is forced to "flow away", the position of the flowing air generates a negative pressure, and the air at the lower part of the exhaust channel 230 "flows into" the upper region under the action of the negative pressure, so as to form an air flow. In the embodiment of the present invention, the exhaust channel 230 and the exhaust device 240 are arranged to exhaust the dirt particles out of the cleaning chamber, so as to keep the cleaning of the cleaning chamber, and prevent the suspended dirt particles from generating secondary pollution on the mask plate 300.
As can be seen, the embodiment of the present invention provides that the cleaning apparatus 200 includes a pressure chamber 210, an ultrasonic amplifier 220, an exhaust passage 230, and an exhaust device 240, so as to realize that the cleaning apparatus 200 blows the ultrasonic gas toward the mask plate 300.
In an embodiment of the present invention, the gas injected into the pressure chamber 210 optionally includes a clean gas such as Compressed Dry Air (CDA) or high Purity Nitrogen (PN 2), so as to avoid contamination of the mask plate by impurities in the generated ultrasonic gas, which is beneficial to improving the cleaning effect of the mask plate 300.
In one embodiment of the present invention, the frequency range of the ultrasonic amplifier 220 is optionally 40kHz to 170kHz, i.e. the frequency of the ultrasonic amplifier 220 is adjustable. Optionally, the ultrasonic amplifier 220 is a complex frequency ultrasonic amplifier, and a plurality of frequencies of the complex frequency ultrasonic amplifier are selectable during operation, so that the frequency of the ultrasonic amplifier 220 is adjusted. For example, the frequency of the ultrasonic amplifier 220 may be selected from 40kHz, 80kHz, 120kHz, 170kHz, and the like. The inventors have found that, in the range of the frequency of the ultrasonic amplifier 220 from 40kHz to 170kHz, the higher the frequency of the ultrasonic amplifier 220, the greater the energy of the micro-explosion generated on the surface of the mask plate 300, the smaller the dirt particles that can be cleaned, and the cleaner the mask plate 300 is.
In addition to the above embodiments, the pressure of the high-pressure gas inside the pressure chamber 210 is optionally higher than the pressure of the gas on the surface of the mask plate 300, and the higher range is 12kPa to 28 kPa. With such an arrangement, cavitation bubbles are more easily formed in the ultrasonic gas generated by the high-pressure ultrasonic gas under the pressure difference, and the cleaning effect of the mask plate 300 is enhanced.
With continued reference to fig. 3, in one embodiment of the present invention, optionally, an ultrasonic amplifier 220 is located inside the pressure chamber 210 near the reticle-holding apparatus 100 to facilitate the blowing of high pressure ultrasonic gas out of the ultrasonic amplifier 200.
With continued reference to fig. 3, optionally, the pressure chamber 210 includes an inlet hole (not shown in fig. 3), and high pressure gas is injected into the pressure chamber through the inlet hole of the pressure chamber 210 and pressurized within the pressure chamber 210 to form high pressure gas. The ultrasonic amplifier 220 located in the pressure chamber 210 performs ultrasonic treatment on the high-pressure gas to form high-pressure ultrasonic gas, and the high-pressure ultrasonic gas is discharged to the surface of the mask plate through the gas outlet 2201 of the ultrasonic amplifier 220. Accordingly, since the ultrasonic amplifier 220 is located inside the pressure chamber 210, in order to blow out the high-pressure ultrasonic gas generated by the ultrasonic amplifier 220, the pressure chamber 210 is provided with an opening corresponding to the position of the air outlet 2201 of the ultrasonic amplifier 220.
It should be noted that fig. 3 exemplarily shows the relative positions of the ultrasonic amplifier 220 and the pressure chamber 210, and the ultrasonic amplifier 220 is located inside the pressure chamber 210, which is not a limitation of the present invention. Referring to fig. 4, in other embodiments, an ultrasonic amplifier 220 may be disposed outside the pressure chamber 210 near the reticle-holding device 100, and the ultrasonic amplifier 220 and the pressure chamber 210 transmit high-pressure gas through a pipe 260.
With continued reference to FIG. 4, the pressure chamber 210 optionally includes an inlet vent (not shown in FIG. 4) through which high pressure gas is injected into the pressure chamber 210 and pressurized within the pressure chamber 210 to form high pressure gas, and an outlet vent (not shown in FIG. 4). The air outlet of the pressure chamber 210 is connected to the pipeline 260, the high-pressure gas is injected into the ultrasonic amplifier 220 through the air outlet, the ultrasonic amplifier 220 performs ultrasonic treatment on the high-pressure gas to form high-pressure ultrasonic gas, and the high-pressure ultrasonic gas is discharged to the surface of the mask plate through the air outlet 2201 of the ultrasonic amplifier 220.
Fig. 5 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention. Referring to fig. 5, on the basis of the above embodiments, optionally, the ultrasonic amplifier 220 is located inside the pressure chamber 210, and the cleaning apparatus 200 further includes a nozzle 250, and the nozzle 250 is disposed at one end of the pressure chamber 210 close to the surface of the mask plate 300, and is used for blowing out the ultrasonic gas. The nozzle 250 can lead out the high-pressure ultrasonic gas to the corresponding position of the mask plate 300, and accurate alignment of the cleaning position is facilitated.
Alternatively, the nozzle 250 may be spaced from the mask plate 300 by a distance in the range of 0.3mm to 3mm, such as 0.3mm, 0.5mm, 0.8mm, 1mm, 1.5mm, 2mm, 2.5mm, or 3 mm. The inventor researches and finds that when the distance between the nozzle 250 and the mask plate 300 is less than 0.3mm, the number of cavitation bubbles formed by the ultrasonic gas is small, and the cleaning of the mask plate 300 is not facilitated; when the distance between the nozzle 250 and the mask plate 300 is more than 3mm, the position where the cavitation bubbles expand and burst is far away from the mask plate 300, which is not beneficial to cleaning the mask plate 300; when the distance between the nozzle 250 and the mask plate 300 is 0.3mm to 3mm, the number of cavitation bubbles formed by the ultrasonic gas is large, and the position where the cavitation bubbles expand and burst is close to the mask plate 300, which is beneficial to cleaning the mask plate 300.
With continued reference to FIG. 5, in addition to the various embodiments described above, the pressure chamber 210 and the vent passage 230 are optionally disposed adjacent to one another; an end of the nozzle 250 remote from the pressure chamber 210 is inclined toward the discharge passage 230. With this arrangement, after dirt particles are separated from the suspension on the mask plate 300, the dirt particles can be rapidly exhausted out of the cleaning chamber through the exhaust passage 230, thereby facilitating the enhancement of the cleaning effect of the mask plate 300.
Optionally, the side wall of the pressure chamber 210 is shared with the duct wall of the exhaust passage 230, thereby saving material costs of the cleaning apparatus 200.
It should be noted that fig. 3 to 5 exemplarily show that the cleaning apparatus 200 includes a pressure chamber 210 and a vent passage 230, which is not a limitation of the present invention. In other embodiments, two pressure chambers 210 may be provided that share a single vent passage 230.
Fig. 6 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention. Referring to fig. 6, in one embodiment of the present invention, optionally, the cleaning apparatus 200 includes a first pressure chamber 211, a second pressure chamber 212, a first nozzle 251, and a second nozzle 252, and a vent passage 230 is disposed between the first pressure chamber 211 and the second pressure chamber 212. The first nozzle 251 is disposed at one end of the first pressure chamber 211, and one end of the first nozzle 251 away from the first pressure chamber 211 is inclined toward the exhaust passage 230; the second nozzle 252 is disposed at one end of the second pressure chamber 212, and one end of the second nozzle 252 away from the second pressure chamber 212 is inclined toward the discharge passage 230.
The first nozzle 251 and the second nozzle 252 can simultaneously blow ultrasonic gas to the mask plate 300, so that the cleaning effect of the mask plate 300 is enhanced; the first nozzle 251 and the second nozzle 252 are inclined towards the exhaust channel 230, so that dirt particles can be quickly exhausted out of the cleaning chamber from the exhaust channel 230 after being separated from suspension on the mask plate 300, and the cleaning effect of the mask plate 300 is enhanced; the first nozzle 251 and the second nozzle 252 share the exhaust passage 230, so that the structure of the cleaning device 200 is simplified on the basis of not influencing the cleaning effect of the mask plate 300, and the material cost of the exhaust passage 230 and the exhaust device 240 is saved.
Optionally, the side wall of the first pressure chamber 211 and the side wall of the second pressure chamber 212 are both shared with the duct wall of the exhaust passage 230, further saving material costs of the cleaning device 200.
Correspondingly, the cleaning apparatus 200 further includes a first ultrasonic amplifier 221 and a second ultrasonic amplifier 222; the first ultrasonic amplifier 221 is disposed in the first pressure chamber 211; a second ultrasonic amplifier 222 is disposed within the second pressure chamber 212.
Fig. 7 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention. Referring to fig. 7, on the basis of the above embodiments, optionally, the cleaning system for the reticle includes at least two cleaning apparatuses 200 (two cleaning apparatuses 200 are exemplarily shown in fig. 7); at least two cleaning apparatuses 200 are respectively located on both sides of the reticle-holding apparatus 100. By the arrangement, the mask plate 300 can be subjected to high-speed ultrasonic cleaning from two sides of the mask plate 300, stains on two sides of the mask plate 300 can be cleaned in a bidirectional cleaning mode, and the cleaning effect of the mask plate 300 is further improved.
With continued reference to fig. 7, optionally, the cleaning apparatuses 200 located above the reticle holding apparatus 100 and below the cleaning apparatus 200 are staggered, that is, the cleaning apparatuses 200 located above and below the reticle holding apparatus 100 have no overlapping area in projection on the plane on which the reticles lie. This prevents the cleaning apparatus 200 located at the upper portion and the cleaning apparatus 200 located at the lower portion from interfering with each other.
It should be noted that fig. 3 to 7 exemplarily show one or two cleaning apparatuses 200, which is not a limitation of the present invention. In other embodiments, the number of cleaning apparatuses 200 may be set to be plural as needed to enhance the cleaning effect of the mask plate 300.
With reference to fig. 2 to 7, on the basis of the above embodiments, optionally, the reticle-holding device 100 includes a support stand 110 and a roller 120. The supporting frame 110 may support the mask plate 300, and the roller 120 may drive the mask plate 300 to move on the supporting frame 110, thereby facilitating the line production of the production line.
Fig. 8 is a schematic structural diagram of another cleaning system for a mask blank according to an embodiment of the present invention. Referring to fig. 8, on the basis of the above embodiments, optionally, the cleaning system further includes a spraying device 400, wherein the spraying device 400 is used for spraying a liquid medicine to the mask plate 300, and the liquid medicine is used for dissolving stains on the surface of the mask plate 300. Among them, the stains on the surface of the mask plate 300 are generally evaporation materials (organic matters); alternatively, the chemical solution may include an NMP solution that can dissolve the evaporation material and form white crystals after drying. Compared with evaporation materials, white crystals are easier to separate from the mask plate 300 under the action of ultrasonic gas, and therefore the cleaning effect of the mask plate 300 is further improved by spraying liquid medicine to the mask plate 300 through the spraying device 400.
Illustratively, the use method of the cleaning system for the mask plate comprises the following steps: placing a reticle 300 on the reticle-holding apparatus 100; spraying liquid medicine to the mask plate 300 to dissolve stains on the surface of the mask plate 300; drying the mask plate 300 by standing or the like to form a crystalline substance on the surface of the mask plate 300; ultrasonic gas is blown to the surface of the mask plate 300.
Table 1 shows comparative data of the amount of chemical used in the cleaning method using the conventional cleaning method and the cleaning system according to the embodiment of the present invention.
TABLE 1
As can be seen from Table 1, under the condition of realizing the same cleaning effect (20Particle @ ≧ 5um), the number of stains which are more than or equal to 5um is 20; the prior art needs 300L of NMP solution, 900L of DIW, 300L of KOH solution and 300L of IPA solution, but the proposal provided by the embodiment of the invention only needs 200L of NMP solution, no KOH solution and IPA solution, and because the spraying mode can reduce the dosage of NMP compared with the soaking mode, the embodiment of the invention reduces the dosage of the liquid medicine and has no danger.
It should be noted that fig. 8 exemplarily shows that the shower apparatus 400 and the cleaning apparatus 200 share one reticle supporting apparatus 100, and the present invention is not limited thereto. In other embodiments, optionally, the spraying device 400 and the cleaning device 200 are respectively corresponding to different reticle supporting devices 100, that is, the reticle 300 is arranged on one reticle supporting device and sprayed by the spraying device 400, and then the reticle 300 is transferred to another reticle supporting device and cleaned by the cleaning device 200; optionally, the spraying apparatus 400 and the cleaning apparatus 200 are provided in separate chambers.
On the basis of the foregoing embodiments, optionally, the cleaning system for the mask blank further includes a drying apparatus 500, and the drying apparatus 500 is configured to perform a drying process on the mask blank 300. As shown in fig. 9, the drying apparatus 500 may include an air knife 510, and the drying process for the mask plate 300 may be to blow air to the mask plate 300 by using the air knife 510; alternatively, as shown in fig. 10, the drying apparatus 500 may further include a heating wire 520, and the drying process for the mask plate 300 may be heating the mask plate 300 by using the heating wire 520; alternatively, as shown in fig. 11, the drying apparatus 500 may further include an air knife 510 and a heating wire 520, and the drying process for the mask plate 300 may be to blow hot air to the mask plate 300 by using the air knife 510. The drying device 500 is arranged in the embodiment of the invention, so that the drying time of the mask plate 300 is shortened, and the production efficiency is improved.
The embodiment of the invention also provides a cleaning method of the mask plate. The cleaning method of the mask plate can be applied to the cleaning system of the mask plate provided by any embodiment of the invention. Fig. 12 is a schematic flow chart of a method for cleaning a mask blank according to an embodiment of the present invention. Referring to fig. 12, the cleaning method of the mask plate includes the steps of:
and S110, placing the mask plate on mask plate supporting equipment.
S120, blowing ultrasonic gas to the surface of the mask plate, wherein the ultrasonic gas is ultrasonically treated; the flow velocity of the ultrasonic gas is higher than the preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean stains on the surface of the mask plate.
The embodiment of the invention creatively provides a novel cleaning method of a mask plate. The cleaning method is different from the prior art in that ultrasonic gas is blown to the surface of the mask plate, the flow rate of the ultrasonic gas is higher than a preset speed, so that cavitation bubbles formed on the surface of the mask plate expand rapidly to achieve the effect of micro explosion, the energy of the micro explosion is high, and stains on the surface of the mask plate can be separated from the mask plate and are in a suspension state, so that the effect of cleaning the stains is achieved. Therefore, compared with the prior art, the mask plate does not need to be soaked and cleaned by adopting various liquid medicines, and the using amount of the liquid medicines and the generation of waste liquid are reduced. According to the embodiment of the invention, the template is not required to be dehydrated by IPA solution, so that the danger caused by the IPA solution is avoided. Therefore, the embodiment of the invention reduces the dosage of the liquid medicine, reduces the amount of the waste liquid and reduces the danger on the basis of ensuring the cleaning effect on the mask plate. In addition, the method and the device have fewer steps and are beneficial to improving the production efficiency.
Fig. 13 is a schematic flow chart of another method for cleaning a mask blank according to an embodiment of the present invention. Referring to fig. 13, on the basis of the foregoing embodiments, optionally, the method for cleaning the mask plate includes the following steps:
s210, placing a mask plate on mask plate supporting equipment.
And S220, spraying a liquid medicine to the mask plate, wherein the liquid medicine is used for dissolving stains on the surface of the mask plate.
And S230, drying the mask plate to form a crystalline substance on the surface of the mask plate.
S240, blowing ultrasonic gas to the surface of the mask plate, wherein the ultrasonic gas is subjected to ultrasonic treatment; the flow velocity of the ultrasonic gas is higher than the preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean crystalline substances on the surface of the mask plate.
Wherein, the stains on the surface of the mask plate are generally evaporation materials (organic matters); alternatively, the chemical solution may include an NMP solution that can dissolve the evaporation material and form white crystals after drying. Compare in coating by vaporization material, white crystal separates from the mask plate under ultrasonic gas's effect more easily, consequently, before blowing ultrasonic gas to the surface of mask plate, sprays the liquid medicine and dry formation crystalline substance to the mask plate, has further promoted the cleaning performance of mask plate.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (10)
1. A system for cleaning a mask blank, comprising:
a mask plate supporting device for supporting a mask plate;
cleaning equipment, wherein the cleaning equipment is used for blowing ultrasonic gas to the surface of the mask plate, and the ultrasonic gas is gas subjected to ultrasonic treatment; the flow velocity of the ultrasonic gas is higher than a preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean stains on the surface of the mask plate.
2. The cleaning system of claim 1, wherein the cleaning apparatus comprises a pressure chamber for containing a high pressure gas, an ultrasonic booster, a vent passage, and a vent; the ultrasonic amplifier is connected with the pressure cavity and used for generating high-pressure ultrasonic gas; the exhaust device is arranged at one end of the exhaust channel and is used for exhausting the cleaned stains through the exhaust channel;
preferably, the frequency range of the ultrasonic amplifier is 40 kHz-170 kHz;
preferably, the exhaust means comprises a fan.
3. The cleaning system according to claim 2, wherein the pressure of the high-pressure gas inside the pressure chamber is higher than the pressure of the gas on the surface of the mask plate, and the higher range is 12kPa to 28 kPa.
4. The cleaning system of claim 2, wherein the ultrasonic amplifier is located inside the pressure chamber; the cleaning equipment further comprises a nozzle, the nozzle is arranged at one end of the pressure cavity close to the surface of the mask plate and used for blowing out the ultrasonic gas;
preferably, the distance between the nozzle and the mask plate ranges from 0.3mm to 3 mm.
5. The cleaning system of claim 4, wherein the pressure chamber and the vent passage are disposed adjacent to one another; the end of the nozzle, which is far away from the pressure cavity, inclines towards the exhaust channel.
6. The cleaning system of claim 4, wherein the cleaning apparatus includes a first pressure chamber, a second pressure chamber, a first nozzle, and a second nozzle, the vent passage being disposed between the first pressure chamber and the second pressure chamber;
the first nozzle is arranged at one end of the first pressure cavity, and one end, far away from the first pressure cavity, of the first nozzle inclines towards the exhaust channel; the second nozzle is arranged at one end of the second pressure cavity, and one end, far away from the second pressure cavity, of the second nozzle inclines towards the exhaust channel;
preferably, the cleaning apparatus further comprises a first ultrasonic amplifier and a second ultrasonic amplifier; the first ultrasonic amplifier is arranged in the first pressure cavity; the second ultrasonic amplifier is arranged in the second pressure cavity.
7. The cleaning system of claim 1, comprising at least two of the cleaning apparatuses;
at least two cleaning devices are respectively positioned on two sides of the mask plate supporting device.
8. The cleaning system of claim 1, further comprising: and the spraying equipment is used for spraying liquid medicine to the mask plate, and the liquid medicine is used for dissolving stains on the surface of the mask plate.
9. A method for cleaning a mask plate is characterized by comprising the following steps:
placing a mask plate on mask plate supporting equipment;
blowing ultrasonic gas to the surface of the mask plate, wherein the ultrasonic gas is ultrasonically treated gas; the flow velocity of the ultrasonic gas is higher than a preset velocity so as to form cavitation bubbles on the surface of the mask plate and clean stains on the surface of the mask plate.
10. The cleaning method according to claim 9, further comprising, before blowing the ultrasonic gas to the surface of the mask plate:
spraying liquid medicine to the mask plate, wherein the liquid medicine is used for dissolving stains on the surface of the mask plate;
drying the mask plate to form a crystalline substance on the surface of the mask plate;
preferably, the drying process is performed on the mask plate, and includes:
standing the mask plate for a preset time; or,
blowing air to the mask plate by adopting an air knife; or,
and heating the mask plate.
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| CN202010121194.6A CN111215398A (en) | 2020-02-26 | 2020-02-26 | Cleaning system and cleaning method for mask plate |
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| CN202010121194.6A CN111215398A (en) | 2020-02-26 | 2020-02-26 | Cleaning system and cleaning method for mask plate |
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