CN111168561B - 研磨头及晶圆研磨装置 - Google Patents
研磨头及晶圆研磨装置 Download PDFInfo
- Publication number
- CN111168561B CN111168561B CN201911369943.0A CN201911369943A CN111168561B CN 111168561 B CN111168561 B CN 111168561B CN 201911369943 A CN201911369943 A CN 201911369943A CN 111168561 B CN111168561 B CN 111168561B
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- CN
- China
- Prior art keywords
- wafer
- polishing
- ring
- pad
- grinding
- Prior art date
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/04—Lapping machines or devices; Accessories designed for working plane surfaces
- B24B37/07—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
- B24B37/10—Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for single side lapping
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
- B24B37/32—Retaining rings
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201911369943.0A CN111168561B (zh) | 2019-12-26 | 2019-12-26 | 研磨头及晶圆研磨装置 |
Applications Claiming Priority (1)
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CN201911369943.0A CN111168561B (zh) | 2019-12-26 | 2019-12-26 | 研磨头及晶圆研磨装置 |
Publications (2)
Publication Number | Publication Date |
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CN111168561A CN111168561A (zh) | 2020-05-19 |
CN111168561B true CN111168561B (zh) | 2022-05-13 |
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Family Applications (1)
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CN201911369943.0A Active CN111168561B (zh) | 2019-12-26 | 2019-12-26 | 研磨头及晶圆研磨装置 |
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CN (1) | CN111168561B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111823130A (zh) * | 2020-07-17 | 2020-10-27 | 中国科学院微电子研究所 | 一种抛光头及抛光装置 |
CN114851057A (zh) * | 2021-02-04 | 2022-08-05 | 中国科学院微电子研究所 | 晶圆抛光装置及抛光方法 |
CN116117686A (zh) * | 2021-11-15 | 2023-05-16 | 成都高真科技有限公司 | 晶圆抓取装置、抛光设备及应用 |
CN114434321B (zh) * | 2021-12-29 | 2023-03-31 | 蚌埠中光电科技有限公司 | 一种面研磨用可减轻研磨痕迹保护玻璃边缘的辅助边框 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60005270D1 (de) * | 1999-03-03 | 2003-10-23 | Mitsubishi Materials Corp | Trägervorrichtung für eine chemisch-mechanische poliervorrichtung, mit einem halterring und einer trägerplatte mit mehrzonaler drucksteuervorrichtung |
JP2011255464A (ja) * | 2010-06-09 | 2011-12-22 | Tokyo Seimitsu Co Ltd | テンプレート押圧ウェハ研磨方式 |
CN203622170U (zh) * | 2013-12-17 | 2014-06-04 | 中芯国际集成电路制造(北京)有限公司 | 一种化学机械研磨组件 |
JP2016049606A (ja) * | 2014-09-01 | 2016-04-11 | 株式会社ディスコ | 研磨装置 |
CN107538342A (zh) * | 2016-06-24 | 2018-01-05 | 上海新昇半导体科技有限公司 | 一种晶圆支持板组件、抛光装置及晶圆精抛光方法 |
CN107717719A (zh) * | 2016-08-10 | 2018-02-23 | 精工半导体有限公司 | 研磨头、cmp研磨装置、和半导体集成电路装置的制造方法 |
JP2018167358A (ja) * | 2017-03-30 | 2018-11-01 | 富士紡ホールディングス株式会社 | 保持具 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10230455A (ja) * | 1997-02-17 | 1998-09-02 | Nec Corp | 研磨装置 |
JP2008173741A (ja) * | 2007-01-22 | 2008-07-31 | Elpida Memory Inc | 研磨装置 |
-
2019
- 2019-12-26 CN CN201911369943.0A patent/CN111168561B/zh active Active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE60005270D1 (de) * | 1999-03-03 | 2003-10-23 | Mitsubishi Materials Corp | Trägervorrichtung für eine chemisch-mechanische poliervorrichtung, mit einem halterring und einer trägerplatte mit mehrzonaler drucksteuervorrichtung |
JP2011255464A (ja) * | 2010-06-09 | 2011-12-22 | Tokyo Seimitsu Co Ltd | テンプレート押圧ウェハ研磨方式 |
CN203622170U (zh) * | 2013-12-17 | 2014-06-04 | 中芯国际集成电路制造(北京)有限公司 | 一种化学机械研磨组件 |
JP2016049606A (ja) * | 2014-09-01 | 2016-04-11 | 株式会社ディスコ | 研磨装置 |
CN107538342A (zh) * | 2016-06-24 | 2018-01-05 | 上海新昇半导体科技有限公司 | 一种晶圆支持板组件、抛光装置及晶圆精抛光方法 |
CN107717719A (zh) * | 2016-08-10 | 2018-02-23 | 精工半导体有限公司 | 研磨头、cmp研磨装置、和半导体集成电路装置的制造方法 |
JP2018167358A (ja) * | 2017-03-30 | 2018-11-01 | 富士紡ホールディングス株式会社 | 保持具 |
Also Published As
Publication number | Publication date |
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CN111168561A (zh) | 2020-05-19 |
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Effective date of registration: 20210922 Address after: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Applicant after: Xi'an yisiwei Material Technology Co.,Ltd. Applicant after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: Room 1323, block a, city gate, No.1 Jinye Road, high tech Zone, Xi'an, Shaanxi 710065 Applicant before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
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Address after: Room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi 710065 Patentee after: Xi'an Yisiwei Material Technology Co.,Ltd. Patentee after: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. Address before: 710000 room 1-3-029, No. 1888, Xifeng South Road, high tech Zone, Xi'an, Shaanxi Province Patentee before: Xi'an yisiwei Material Technology Co.,Ltd. Patentee before: XI'AN ESWIN SILICON WAFER TECHNOLOGY Co.,Ltd. |
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CP03 | Change of name, title or address |