CN111041429A - 一种多弧技术与磁控技术合而为一的香槟金调色技术 - Google Patents
一种多弧技术与磁控技术合而为一的香槟金调色技术 Download PDFInfo
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Abstract
本发明公开了一种多弧技术与磁控技术合而为一的香槟金调色技术,它涉及镀膜技术领域。其在基片上层依次通过多弧技术镀Ti多弧打底层,再通过真空磁控溅射的方法依次镀有第一TiN过渡层、第二TiN过渡层,最后使用多弧技术镀TiN多弧颜色层,达到最终稳定的表面涂层颜色。本发明将多弧技术与磁控技术合而为一,制备的每层膜都能起到不同的功能性与颜色过渡的作用,通过各个膜层的颜色递进能够大幅度提高工件的外观装饰性能,膜层硬度高,耐磨耐腐蚀,化学稳定性好,应用前景广阔。
Description
技术领域
本发明涉及的是镀膜技术领域,具体涉及一种多弧技术与磁控技术合而为一的香槟金调色技术。
背景技术
溅射镀膜是在真空中利用荷能粒子轰击靶表面,使被轰击出的粒子沉积在基片上的技术。通常,利用低压惰性气体辉光放电来产生入射离子,阴极靶由镀膜材料制成,基片作为阳极,真空室中通入0.1-10Pa的氩气或其它惰性气体,在阴极(靶)1-3KV直流负高压或13.56MHz的射频电压作用下产生辉光放电,电离出的氩离子轰击靶表面,使得靶原子溅出并沉积在基片上,形成薄膜。
多弧镀是在一定工艺气压下,引弧针与蒸发离子源短暂接触,断开,使气体放电,由于多弧镀的成因主要是借助于不断移动的弧斑,在蒸发源表面上连续形成熔池,使金属蒸发后,沉积在基体上而得到薄膜层。与磁控溅射相比,多弧镀不但具有靶材利用率高,更具有金属离子离化率高、薄膜与基体之间结合力强的优点。此外,多弧镀涂层颜色较为稳定,尤其是在做 TiN 涂层时,每一批次均容易得到相同稳定的金黄色,令磁控溅射法望尘莫及。多弧镀的一个不足之处在于:在用传统的 DC 电源做低温涂层条件下,当涂层厚度达到0.3μm 时,沉积率与反射率接近,成膜变得非常困难;而且,薄膜表面开始变朦。多弧镀另一个不足之处是:由于金属是熔后蒸发,因此沉积颗粒较大,致密度低,耐磨性比磁控溅射法成膜差。
可见,多弧镀膜与磁控溅射法镀膜各有优劣,为了尽可能地发挥它们各自的优越性,实现互补,将多弧技术与磁控技术合而为一的涂层,设计一种多弧技术与磁控技术合而为一的香槟金调色技术尤为必要。
发明内容
针对现有技术上存在的不足,本发明目的是在于提供一种多弧技术与磁控技术合而为一的香槟金调色技术,将多弧技术与磁控技术合而为一,制备的膜层硬度高,耐磨耐腐蚀,化学稳定性好,提高工件的外观装饰性能,易于推广使用。
为了实现上述目的,本发明是通过如下的技术方案来实现:一种多弧技术与磁控技术合而为一的香槟金调色技术,在基片上层依次通过多弧技术镀Ti多弧打底层,再通过真空磁控溅射的方法依次镀有第一TiN过渡层、第二TiN过渡层,最后使用多弧技术镀TiN多弧颜色层,达到最终稳定的表面涂层颜色,其工艺步骤如下:
①将基片经过CNC、抛光、超声波清洗,使得工件基体表面光滑、清洁,便于膜层的沉积以及最终成品的光亮;
②抽真空:真空抽至8.0×10-3Pa,刚开始是粗抽,从大气抽至5pa左右,再用分子泵进行细抽;
③轰击清洗:使用氩离子轰击清洗、钛轰击;
④通过多弧镀Ti多弧打底层:
真空度:通入高纯度氩气,真空度保持在2×10-2pa,脉冲偏压:200V,占空比50%,电弧电流:60-80a,引燃全部弧源,时间2-3min;
⑤通过真空磁控溅射的方法依次镀有第一TiN过渡层、第二TiN过渡层:
通入高纯度氮气使真空度保持在(3~5)×10-1Pa,点钛靶,使钛靶功率为8KW,然后再逐渐加大N2气体,随着N2气体量增大,色泽变化;
⑥多弧镀TiN多弧颜色层:
通入高纯度氮气使真空度保持在(3~5)×10-1Pa,然后再通入N2,生成颜色稳定的香槟金色,电弧电流:50-70A,脉冲偏压:150V,占空比60%,沉积温度:200℃左右;
⑦冷却:镀膜工序结束后,首先关闭电弧电源、靶电源、偏压电源,然后关闭气源、停转架,工件在真空镀膜室内冷却至80-100℃时,向镀膜室内充大气,取出工件。
作为优选,所述的步骤①中基片采用不锈钢或硬质合金基片。
作为优选,所述的步骤②中抽真空粗抽时,烘烤加热至150℃,伴随镀膜室温度的升高,器壁放气会使真空度降低,然后又回升,等到温度回升到6.6×10-3Pa时方可进行镀膜工作。
作为优选,所述的步骤③轰击清洗中的氩离子轰击清洗,其真空度:通入高纯度氩气(99.999%)真空度保持在2-3Pa,轰击电压:800-1000V,轰击时间:10min。此刻在真空镀膜室内发生辉光放电,放电产生的氩离子以较高的能量撞击工件表面,将工件表面吸附的气体、杂质和工件表面层原子溅射下来,露出材料的新鲜表面。
作为优选,所述的步骤③轰击清洗中的钛轰击,其真空度:通入高纯度氩气(99.999%)使真空度保持在2×10-2pa,脉冲偏压:400-500V,占空比20%,电弧电流:60-80A,轮换引燃电弧蒸发源,每个电弧蒸发源引燃1-2min。
本发明的有益效果:采用本技术制备的每层膜都能起到不同的功能性与颜色过渡的作用,通过各个膜层的颜色递进能够大幅度提高工件的外观装饰性能,该种膜层具有高硬度、高耐磨性、很好的耐腐蚀性和化学稳定性的特点,应用前景广阔。
附图说明
下面结合附图和具体实施方式来详细说明本发明;
图1为本发明制备的香槟金膜的结构示意图。
具体实施方式
为使本发明实现的技术手段、创作特征、达成目的与功效易于明白了解,下面结合具体实施方式,进一步阐述本发明。
参照图1,本具体实施方式采用以下技术方案:一种多弧技术与磁控技术合而为一的香槟金调色技术,在基片1上层依次通过多弧技术镀Ti多弧打底层2,再通过真空磁控溅射的方法依次镀有第一TiN过渡层3、第二TiN过渡层4,最后使用多弧技术镀TiN多弧颜色层5,达到最终稳定的表面涂层颜色,其工艺步骤如下:
①将基片1经过CNC、抛光、超声波清洗,使得工件基体表面光滑、清洁,便于膜层的沉积以及最终成品的光亮;所述基片1采用不锈钢或硬质合金基片;
②抽真空:真空抽至8.0×10-3Pa,刚开始是粗抽,从大气抽至5pa左右,再用分子泵进行细抽;粗抽时,烘烤加热至150℃,伴随镀膜室温度的升高,器壁放气会使真空度降低,然后又回升,等到温度回升到6.6×10-3Pa时方可进行镀膜工作。
③轰击清洗:
氩离子轰击清洗,真空度:通入高纯度氩气(99.999%)真空度保持在2-3Pa,轰击电压:800-1000V,轰击时间:10min。此刻在真空镀膜室内发生辉光放电,放电产生的氩离子以较高的能量撞击工件表面,将工件表面吸附的气体、杂质和工件表面层原子溅射下来,露出材料的新鲜表面。
钛轰击,真空度:通入高纯度(99.999%)氩气使真空度保持在2×10-2pa,脉冲偏压:400-500V,占空比20%,电弧电流:60-80A,轮换引燃电弧蒸发源,每个电弧蒸发源引燃1-2min。使用氩离子轰击清洗、钛轰击;
④通过多弧镀Ti多弧打底层2:
真空度:通入高纯度氩气,真空度保持在2×10-2pa,脉冲偏压:200V,占空比50%,电弧电流:60-80a,引燃全部弧源,时间2-3min;
⑤通过真空磁控溅射的方法依次镀有第一TiN过渡层3、第二TiN过渡层4:
通入高纯度氮气使真空度保持在(3~5)×10-1Pa,点钛靶,使钛靶功率为8KW,然后再逐渐加大N2气体,随着N2气体量增大,色泽变化;
⑥多弧镀TiN多弧颜色层5:
通入高纯度氮气使真空度保持在(3~5)×10-1Pa,然后再通入N2,生成颜色稳定的香槟金色,电弧电流:50-70A,脉冲偏压:150V,占空比60%,沉积温度:200℃左右;
⑦冷却:镀膜工序结束后,首先关闭电弧电源、靶电源、偏压电源,然后关闭气源、停转架,工件在真空镀膜室内冷却至80-100℃时,向镀膜室内充大气,取出工件。
本具体实施方式在工艺上使用了多弧镀打底,然后利用磁控溅射法增厚涂层,最后再利用多弧镀达到最终稳定的表面涂层颜色,其技术优势在于:
(1)Ti多弧打底层相较于电镀、喷涂,可有效防止膜层脱落,使膜层具有卓越的附着力和耐久力;
(2)磁控溅射镀的多层TiN过渡层膜层使膜层纯度高,致密性好,补充了多弧镀膜的耐磨性能,提升膜厚,使膜层具有高硬度、高耐磨性、很好的耐腐蚀性和化学稳定性等特点;
(3)多弧镀的TiN多弧颜色层重复性与稳定性高,整体颜色深韵、光亮,颜色均匀一致,在常规环境下,户内或者户外,都抗氧化,不褪色,不失去光泽且不留下痕迹,正常的使用情况下不会破损。
本具体实施方式将多弧与磁控技术合而为一进行香槟金调色,具有高硬度、高耐磨性,耐腐蚀性和化学稳定性优异,采用本技术制备的膜层在潮湿的大气和海水介质中工作,抗蚀性能优,对点蚀、酸蚀、应力腐蚀的抵抗力特别强,对碱、氯化物、氯的有机物品、硝酸、硫酸等有优良的抗腐蚀能力,同时每层膜都起到不同的功能性与颜色过渡的作用,提高工件外观装饰性能,具有广阔的市场应用前景。
以上显示和描述了本发明的基本原理和主要特征和本发明的优点。本行业的技术人员应该了解,本发明不受上述实施例的限制,上述实施例和说明书中描述的只是说明本发明的原理,在不脱离本发明精神和范围的前提下,本发明还会有各种变化和改进,这些变化和改进都落入要求保护的本发明范围内。本发明要求保护范围由所附的权利要求书及其等效物界定。
Claims (5)
1.一种多弧技术与磁控技术合而为一的香槟金调色技术,其特征在于,在基片(1)上层依次通过多弧技术镀Ti多弧打底层(2),再通过真空磁控溅射的方法依次镀有第一TiN过渡层(3)、第二TiN过渡层(4),最后使用多弧技术镀TiN多弧颜色层(5),达到最终稳定的表面涂层颜色,其工艺步骤如下:
①将基片(1)经过CNC、抛光、超声波清洗,使得工件基体表面光滑、清洁,便于膜层的沉积以及最终成品的光亮;
②抽真空:真空抽至8.0×10-3Pa,刚开始是粗抽,从大气抽至5pa,再用分子泵进行细抽;
③轰击清洗:使用氩离子轰击清洗、钛轰击;
④通过多弧镀Ti多弧打底层(2):
真空度:通入氩气,真空度保持在2×10-2pa,脉冲偏压:200V,占空比50%,电弧电流:60-80a,引燃全部弧源,时间2-3min;
⑤通过真空磁控溅射的方法依次镀有第一TiN过渡层(3)、第二TiN过渡层(4):
通入氮气使真空度保持在(3~5)×10-1Pa,点钛靶,使钛靶功率为8KW,然后再逐渐加大N2气体,随着N2气体量增大,色泽变化;
⑥多弧镀TiN多弧颜色层(5):
通入氮气使真空度保持在(3~5)×10-1Pa,然后再通入N2,生成颜色稳定的香槟金色,电弧电流:50-70A,脉冲偏压:150V,占空比60%,沉积温度:200℃;
⑦冷却:镀膜工序结束后,首先关闭电弧电源、靶电源、偏压电源,然后关闭气源、停转架,工件在真空镀膜室内冷却至80-100℃时,向镀膜室内充大气,取出工件。
2.根据权利要求1所述的一种多弧技术与磁控技术合而为一的香槟金调色技术,其特征在于,所述的步骤①中基片(1)采用不锈钢或硬质合金基片。
3.根据权利要求1所述的一种多弧技术与磁控技术合而为一的香槟金调色技术,其特征在于,所述的步骤②中抽真空粗抽时,烘烤加热至150℃,伴随镀膜室温度的升高,器壁放气会使真空度降低,然后又回升,等到温度回升到6.6×10-3Pa时方可进行镀膜工作。
4.根据权利要求1所述的一种多弧技术与磁控技术合而为一的香槟金调色技术,其特征在于,所述的步骤③轰击清洗中的氩离子轰击清洗,其真空度:通入99.999%纯度的氩气真空度保持在2-3Pa,轰击电压:800-1000V,轰击时间:10min。
5.根据权利要求1所述的一种多弧技术与磁控技术合而为一的香槟金调色技术,其特征在于,所述的步骤③轰击清洗中的钛轰击,其真空度:通入99.999%纯度的氩气使真空度保持在2×10-2pa,脉冲偏压:400-500V,占空比20%,电弧电流:60-80A,轮换引燃电弧蒸发源,每个电弧蒸发源引燃1-2min。
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