CN112063975A - 一种通过调制强流脉冲电弧制备ta-C涂层的方法 - Google Patents
一种通过调制强流脉冲电弧制备ta-C涂层的方法 Download PDFInfo
- Publication number
- CN112063975A CN112063975A CN202010737107.XA CN202010737107A CN112063975A CN 112063975 A CN112063975 A CN 112063975A CN 202010737107 A CN202010737107 A CN 202010737107A CN 112063975 A CN112063975 A CN 112063975A
- Authority
- CN
- China
- Prior art keywords
- arc
- current
- modulating
- coil
- target
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 54
- 238000000034 method Methods 0.000 title claims abstract description 44
- 239000011248 coating agent Substances 0.000 title claims abstract description 34
- 229910052751 metal Inorganic materials 0.000 claims abstract description 53
- 239000002184 metal Substances 0.000 claims abstract description 53
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 37
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 35
- 239000010439 graphite Substances 0.000 claims abstract description 35
- 238000000151 deposition Methods 0.000 claims abstract description 21
- 238000010891 electric arc Methods 0.000 claims abstract description 17
- 150000001875 compounds Chemical class 0.000 claims abstract description 15
- 230000000087 stabilizing effect Effects 0.000 claims abstract description 11
- 238000007733 ion plating Methods 0.000 claims abstract description 10
- 229910003481 amorphous carbon Inorganic materials 0.000 claims abstract description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 56
- 238000004140 cleaning Methods 0.000 claims description 43
- 239000007789 gas Substances 0.000 claims description 40
- 229910052786 argon Inorganic materials 0.000 claims description 38
- 230000008569 process Effects 0.000 claims description 27
- 239000000758 substrate Substances 0.000 claims description 20
- 238000004519 manufacturing process Methods 0.000 claims description 18
- 230000001965 increasing effect Effects 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 13
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 12
- 239000012495 reaction gas Substances 0.000 claims description 12
- 230000008859 change Effects 0.000 claims description 11
- 239000013077 target material Substances 0.000 claims description 10
- 238000005530 etching Methods 0.000 claims description 9
- 230000001276 controlling effect Effects 0.000 claims description 7
- -1 nitrogen hydrocarbon Chemical class 0.000 claims description 7
- 239000004215 Carbon black (E152) Substances 0.000 claims description 6
- 229930195733 hydrocarbon Natural products 0.000 claims description 6
- 229910052757 nitrogen Inorganic materials 0.000 claims description 6
- 230000001105 regulatory effect Effects 0.000 claims description 6
- 230000008878 coupling Effects 0.000 claims description 4
- 238000010168 coupling process Methods 0.000 claims description 4
- 238000005859 coupling reaction Methods 0.000 claims description 4
- 238000005137 deposition process Methods 0.000 claims description 4
- 230000003993 interaction Effects 0.000 claims description 4
- 229910045601 alloy Inorganic materials 0.000 claims description 3
- 239000000956 alloy Substances 0.000 claims description 3
- 150000002430 hydrocarbons Chemical class 0.000 claims description 3
- 230000007774 longterm Effects 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 claims description 3
- 238000007747 plating Methods 0.000 claims description 3
- 239000002245 particle Substances 0.000 abstract description 9
- 238000002360 preparation method Methods 0.000 abstract description 9
- 230000033001 locomotion Effects 0.000 abstract description 7
- 239000000463 material Substances 0.000 abstract description 5
- 238000001771 vacuum deposition Methods 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 51
- 210000002381 plasma Anatomy 0.000 description 24
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 10
- 150000002500 ions Chemical class 0.000 description 10
- 239000001257 hydrogen Substances 0.000 description 9
- 229910052739 hydrogen Inorganic materials 0.000 description 9
- 229910003460 diamond Inorganic materials 0.000 description 8
- 239000010432 diamond Substances 0.000 description 8
- 229910052799 carbon Inorganic materials 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 150000004767 nitrides Chemical class 0.000 description 4
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000000168 high power impulse magnetron sputter deposition Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 238000007667 floating Methods 0.000 description 2
- 239000008187 granular material Substances 0.000 description 2
- 238000007737 ion beam deposition Methods 0.000 description 2
- 238000001755 magnetron sputter deposition Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 238000005086 pumping Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910017150 AlTi Inorganic materials 0.000 description 1
- 229910010169 TiCr Inorganic materials 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000011086 high cleaning Methods 0.000 description 1
- 238000004050 hot filament vapor deposition Methods 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000004549 pulsed laser deposition Methods 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (10)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010737107.XA CN112063975B (zh) | 2020-07-28 | 2020-07-28 | 一种通过调制强流脉冲电弧制备ta-C涂层的方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010737107.XA CN112063975B (zh) | 2020-07-28 | 2020-07-28 | 一种通过调制强流脉冲电弧制备ta-C涂层的方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN112063975A true CN112063975A (zh) | 2020-12-11 |
CN112063975B CN112063975B (zh) | 2022-08-12 |
Family
ID=73656754
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010737107.XA Active CN112063975B (zh) | 2020-07-28 | 2020-07-28 | 一种通过调制强流脉冲电弧制备ta-C涂层的方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112063975B (zh) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112647040A (zh) * | 2021-01-04 | 2021-04-13 | 中国科学院兰州化学物理研究所 | 一种ta-c基多层耐磨刀具涂层及其制备方法 |
CN113957393A (zh) * | 2021-09-28 | 2022-01-21 | 西安交通大学 | 一种提高氮化物涂层刀具表面磨损性能和使用寿命的方法 |
CN115961243A (zh) * | 2022-12-29 | 2023-04-14 | 集美大学 | 一种高致密度的Ta-C涂层的制备方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080292812A1 (en) * | 2007-05-25 | 2008-11-27 | Juergen Ramm | Vacuum Treatment Installation and Vacuum Treatment Method |
WO2017136971A1 (zh) * | 2016-02-11 | 2017-08-17 | 广东工业大学 | (Ti,Al,Zr)N多组元复合涂层、具有该复合涂层的梯度超细硬质合金刀具及其制备方法 |
WO2018113053A1 (zh) * | 2016-12-20 | 2018-06-28 | 深圳先进技术研究院 | 一种具有类金刚石阵列的结构件及其制备方法 |
CN108385066A (zh) * | 2018-02-26 | 2018-08-10 | 温州职业技术学院 | 一种无氢金属掺杂类金刚石涂层制备方法及其制品 |
CN109778136A (zh) * | 2019-02-22 | 2019-05-21 | 苏州艾钛科纳米科技有限公司 | 采用热电子等离子体技术制备类金刚石涂层的方法 |
-
2020
- 2020-07-28 CN CN202010737107.XA patent/CN112063975B/zh active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20080292812A1 (en) * | 2007-05-25 | 2008-11-27 | Juergen Ramm | Vacuum Treatment Installation and Vacuum Treatment Method |
WO2017136971A1 (zh) * | 2016-02-11 | 2017-08-17 | 广东工业大学 | (Ti,Al,Zr)N多组元复合涂层、具有该复合涂层的梯度超细硬质合金刀具及其制备方法 |
WO2018113053A1 (zh) * | 2016-12-20 | 2018-06-28 | 深圳先进技术研究院 | 一种具有类金刚石阵列的结构件及其制备方法 |
CN108385066A (zh) * | 2018-02-26 | 2018-08-10 | 温州职业技术学院 | 一种无氢金属掺杂类金刚石涂层制备方法及其制品 |
CN109778136A (zh) * | 2019-02-22 | 2019-05-21 | 苏州艾钛科纳米科技有限公司 | 采用热电子等离子体技术制备类金刚石涂层的方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN112647040A (zh) * | 2021-01-04 | 2021-04-13 | 中国科学院兰州化学物理研究所 | 一种ta-c基多层耐磨刀具涂层及其制备方法 |
CN113957393A (zh) * | 2021-09-28 | 2022-01-21 | 西安交通大学 | 一种提高氮化物涂层刀具表面磨损性能和使用寿命的方法 |
CN115961243A (zh) * | 2022-12-29 | 2023-04-14 | 集美大学 | 一种高致密度的Ta-C涂层的制备方法 |
Also Published As
Publication number | Publication date |
---|---|
CN112063975B (zh) | 2022-08-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN112063975B (zh) | 一种通过调制强流脉冲电弧制备ta-C涂层的方法 | |
Deng et al. | Physical vapor deposition technology for coated cutting tools: A review | |
CA2103770C (en) | Plasma-enhanced magnetron-sputtered deposition of materials | |
CN112030127B (zh) | 一种采用增强辉光放电复合调制强流脉冲电弧制备的ta-C涂层及制备方法 | |
CA2411174C (en) | A process and apparatus for plasma activated deposition in a vacuum | |
CN109778136B (zh) | 采用热电子等离子体技术制备类金刚石涂层的方法 | |
US6045667A (en) | Process and system for the treatment of substrates using ions from a low-voltage arc discharge | |
Lindfors et al. | Cathodic arc deposition technology | |
CN104213076A (zh) | Pvd与hipims制备超硬dlc涂层方法及设备 | |
CN111455336A (zh) | 电磁场增强的磁控溅射装置及制备类金刚石涂层的方法 | |
CN111519151A (zh) | 一种多元硬质涂层及其电磁增强磁控溅射制备工艺 | |
CN109082647B (zh) | 铝合金表面dlc防护薄膜制备方法 | |
CN214361671U (zh) | 一种复合镀膜装置 | |
CN111748789A (zh) | 一种石墨阴极弧增强辉光放电沉积纯dlc的装置及其方法 | |
CN110205597A (zh) | 多段式双极性脉冲高功率脉冲磁控溅射方法 | |
CN103276362B (zh) | 多级磁场直管磁过滤与脉冲偏压复合的电弧离子镀方法 | |
CN114632909B (zh) | 一种压铸模具表面离子注入制备碳氧氮涂层的方法 | |
JP2007126754A (ja) | 真空アーク蒸着装置 | |
CN100395371C (zh) | 微波等离子体增强弧辉渗镀涂层的装置及工艺 | |
CN101403101A (zh) | 一种快速硬质陶瓷涂层离子镀装置 | |
KR102533881B1 (ko) | 단일 빔 플라즈마 소스 | |
CN1049688A (zh) | 带有固溶体涂镀层的工件及其生产方法、生产设备和应用 | |
CN111041429A (zh) | 一种多弧技术与磁控技术合而为一的香槟金调色技术 | |
CN113151797B (zh) | 一种基于硬质合金表面镀ta-C膜的离子清洗工艺 | |
CN114632910A (zh) | 一种压铸铝模具表面的纳米复合多元碳氧化物涂层的制备方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant | ||
TR01 | Transfer of patent right |
Effective date of registration: 20240606 Address after: 215000, 2nd Floor, Building 1, No. 19 Yong'an Road, High tech Zone, Suzhou City, Jiangsu Province Patentee after: Suzhou Puweidi Nanotechnology Co.,Ltd. Country or region after: China Address before: 325000 Wenzhou City National University Science Park incubator, No. 38 Dongfang South Road, Ouhai District, Wenzhou, Zhejiang Patentee before: WENZHOU VOCATIONAL & TECHNICAL College Country or region before: China |