CN111032901A - 经涂覆的金属基材 - Google Patents

经涂覆的金属基材 Download PDF

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Publication number
CN111032901A
CN111032901A CN201880054218.1A CN201880054218A CN111032901A CN 111032901 A CN111032901 A CN 111032901A CN 201880054218 A CN201880054218 A CN 201880054218A CN 111032901 A CN111032901 A CN 111032901A
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metal substrate
coating layer
coating
coated metal
substrate
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CN201880054218.1A
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CN111032901B (zh
Inventor
丹尼尔·沙莱
克里斯蒂安·阿勒利
埃里奇·西尔伯贝格
塞尔焦·帕切
卢切·加乌亚
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ArcelorMittal SA
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ArcelorMittal SA
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C23C2/06—Zinc or cadmium or alloys based thereon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/012—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of aluminium or an aluminium alloy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/017—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of aluminium or an aluminium alloy, another layer being formed of an alloy based on a non ferrous metal other than aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
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    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/043—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of metal
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    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/18—Layered products comprising a layer of metal comprising iron or steel
    • C—CHEMISTRY; METALLURGY
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
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    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
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    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
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Abstract

本发明涉及经涂覆的金属基材，所述经涂覆的金属基材包括由铝组成的至少第一涂层，这样的第一涂层具有1.0μm至4.5μm的厚度并且顶部被基于锌的第二涂层直接覆盖，这样的第二涂层的厚度为1.5μm至9.0μm，以及其中所述第一涂层相对于所述第二涂层的厚度比为0.2至1.2。

Description

经涂覆的金属基材
本发明涉及经涂覆的金属基材和用于制造这种经涂覆的金属基材的方法。本发明特别适用于汽车工业。
为了节省车辆的重量，已知通过添加具有诸如良好的耐腐蚀性、良好的磷化性(phosphability)等特性的金属涂层来减小钢板或钢面板的厚度。此外，低厚度允许更好的可焊接性。
通常使用基于锌的涂层，因为其由于屏障保护和阴极保护而允许抗腐蚀保护。屏障效应通过在钢表面上施加金属涂层而获得。因此，金属涂层防止钢与腐蚀性气氛之间的接触。另一方面，牺牲阴极保护基于这样的事实：锌是比钢贱的金属。因此，如果腐蚀发生，则锌优先于钢被消耗。阴极保护在钢直接暴露于腐蚀性气氛的区域(如，其中周围的锌将在钢之前被消耗的切割边缘)中是必不可少的。尽管锌涂层具有牺牲保护，但是屏障效应还不够充分，并因此抗腐蚀保护不够高。
此外，当对这样的经锌涂覆的钢板进行加热步骤例如模压淬火或焊接时，在钢中观察到从涂层扩展的裂纹。事实上，偶尔，由于在加热步骤后在经涂覆的钢板中存在裂纹而存在金属机械特性的下降。这些裂纹在以下条件下出现：高温；除应力外，还与具有低熔点的液态金属(例如锌)接触；熔融金属与基材晶粒体积和边界的异质扩散。这样的现象的名称是液态金属致脆(liquid metal embrittlement，LME)，也被称为液态金属辅助开裂(liquid metal assisted cracking，LMAC)。
因此，需要提供具有尽可能最低的厚度的良好保护的经涂覆的金属基材，低厚度允许更好的可焊接性。因此，本发明的目的是提供最薄的经涂覆的金属基材，其具有增强的抗腐蚀保护，即除了屏障保护之外的牺牲阴极保护，并且不具有LME问题。特别地，其旨在使得可获得易于实施的方法以获得这样的经涂覆的金属基材。
在牺牲保护腐蚀方面，电化学电位必须比金属基材的电位负至少50mV。例如，在钢基材的情况下，需要相对于饱和甘汞电极(SCE)的最大电位为-0.78V。优选的是不使值为-1.4V/SCE，甚至-1.25V/SCE的电位降低，这将涉及快速消耗并最终减少钢的保护期。
该目的通过提供根据权利要求1所述的经涂覆的金属基材来实现。经涂覆的金属基材还可以包括根据权利要求2至10所述的任何特征。
另一目的通过提供根据权利要求11所述的制造方法来实现。所述方法还可以包括根据权利要求12至14所述的任何特征。
此外，目的通过提供根据权利要求15所述的经涂覆的金属基材的用途来实现。
最后，目的通过提供根据权利要求20所述的用于在运行的金属基材上连续真空沉积涂层的设备来实现。所述设备还可以包括根据权利要求16至19所述的任何特征。
根据本发明的以下详细描述，本发明的其他特征和优点将变得明显。
为了说明本发明，将特别地参照下述附图对非限制性实例的多个实施方案和试验进行描述：
图1是用于LME测试的试样的图示。
在所有的图中，所表示的层的厚度仅用于说明的目的，并且不可以被视为是不同层按比例的表示。
将对下述术语进行定义：
-“重量％”意指重量百分比。
本发明涉及经涂覆的金属基材，其包括由铝组成的至少第一涂层，这样的第一涂层具有1.0μm至4.5μm的厚度并且顶部被基于锌的第二涂层直接覆盖，这样的第二涂层的厚度为1.5μm至9.0μm，其中第一涂层相对于第二涂层的厚度比为0.2至1.2。第一涂层由铝组成，即，第一涂层中铝的量高于99.0重量％。
不希望受任何理论束缚，认为上述经涂覆的金属基材具有高的抗腐蚀保护和尽可能最薄的厚度。实际上，看似具有上述特定厚度和厚度比的第一涂层和第二涂层的组合允许高屏障效应和高牺牲保护。
看似由铝组成的第一涂层的厚度为1.0μm至4.5μm，允许高耐腐蚀性，特别是高屏障效应。基于锌的第二涂层的厚度为3.0μm至9.0μm，允许高耐腐蚀性，特别是高牺牲保护。此外，发现要获得具有高耐腐蚀性的最薄的经涂覆的金属基材，第一涂层相对于第二涂层的厚度比必须为0.2至1.2。认为如果厚度比小于0.2，则存在耐腐蚀性不足的风险。如果厚度比大于1.2，则存在无法获得具有最高的屏障效应、最高的牺牲保护和良好的可焊接性行为的最薄厚度的经涂覆的金属基材的风险。
最后，具有第一层和第二层的经涂覆的金属基材对LME具有高抵抗性，这主要是由于存在上述特定厚度的铝。因此，利用根据本发明的特定的经涂覆的金属基材，可以获得除了对LME的抵抗性之外还具有高屏障效应(即高牺牲保护和高屏障效应)的最薄的经涂覆的金属基材。
优选地，第二涂层包含小于0.5重量％的镁。
有利地，第二涂层包含选自Si和Mg中的至少一种元素。
在另一个优选的实施方案中，第二涂层不包含以下元素中的至少一者：镁、铝、铜和硅。实际上，不希望受任何理论束缚，看似第二涂层中的镁的存在可能会由于形成镁氧化物而允许表面缺陷，铝的存在会削弱牺牲保护，以及硅的存在会削弱牺牲保护。
有利地，第二涂层由锌组成，即，第一涂层中锌的量高于99.0重量％。
优选地，第一涂层的厚度为2μm至4μm。
有利地，第二涂层的厚度为1.5μm至8.5μm。例如，第二涂层的厚度为1.5μm至4.5μm、或4.5μm至8.5μm。
优选地，第一涂层相对于第二涂层的比率为0.2至0.8，更优选为0.3至0.7。
优选地，在金属基材与第一涂层之间存在中间层，这样的中间层包含铁、镍、铬和任选的钛。不希望受任何理论束缚，看似中间涂层进一步改善了第一涂层在金属基材上的粘合性。
在一个优选的实施方案中，中间层包含至少8重量％的镍和至少10重量％的铬，剩余部分为铁。例如，金属涂层的层为包含16重量％至18重量％的Cr和10重量％至14重量％的Ni、余量为Fe的316不锈钢。
在另一个优选的实施方案中，中间层包含Fe、Ni、Cr和Ti，其中Ti的量大于或等于5重量％，以及其中满足以下方程式：8重量％<Cr+Ti<40重量％，余量为Fe和Ni，这样的中间涂层顶部被作为抗腐蚀金属涂层的涂层直接覆盖。
金属基材可以选自：铝基材、钢基材、不锈钢基材、铜基材、铁基材、铜合金基材、钛基材、钴基材或镍基材。
本发明还涉及用于制造根据本发明的经涂覆的金属基材的方法，其包括以下步骤：
A.提供金属基材；
B.任选地，金属基材的表面准备步骤；
C.沉积由铝组成的第一涂层，这样的第一涂层的厚度为1.0μm至4.5
μm；以及
D.沉积基于锌的第二涂层，这样的第二涂层的厚度为1.5μm至9.0
μm，以及
其中第一涂层相对于第二涂层的厚度比为0.2至1.2。
优选地，在进行步骤B)时，表面处理选自：喷丸、酸洗、蚀刻、抛光、喷砂、研磨、以及包含铁、镍、铬和任选的钛的中间层的沉积。优选地，表面处理在于在金属基材上沉积中间层。此外，中间层允许避免天然地存在于金属基材上的氧化物层的去除。
优选地，在步骤C)和D)中，第一涂层和第二涂层的沉积通过热浸涂、通过电沉积工艺或通过真空沉积来彼此独立地进行。例如，第一涂层通过热浸来沉积，以及第二涂层通过真空沉积来沉积。在另一个实例中，第一涂层和第二涂层通过真空沉积来沉积。
在步骤C)和D)中，当进行真空沉积时，第一涂层和第二涂层通过磁控管阴极粉碎工艺、射流气相沉积工艺、电磁悬浮蒸镀工艺或电子束物理气相沉积来彼此独立地沉积。例如，第一涂层通过磁控管阴极粉碎工艺来沉积，以及第二涂层通过射流气相沉积工艺来沉积。
本发明还涉及根据本发明的经涂覆的金属基材用于制造机动车辆的部件的用途。
最后，本发明涉及使用根据本发明的方法在运行的金属基材上连续真空沉积涂层以制造根据本发明的经涂覆的金属基材的设备，该设备按以下顺序包括：
A.任选地，包括磁控管阴极粉碎装置的中间部分；
B.包括电子束蒸镀装置的第一部分；和
C.包括射流气相蒸镀装置的第二部分。
优选地，当存在中间部分时，磁控管阴极粉碎装置包括真空沉积室以在金属基材上沉积中间层，所述真空沉积室包括等离子体源和由铁、铬、镍和任选的钛制成的一个靶，所述中间层包含铁、镍、铬和任选的钛。
在这种情况下，在10-5毫巴至10-9毫巴的压力下将惰性气体注入真空沉积室中。等离子体源产生使气体带电的等离子体。靶的表面原子通过在等离子体中产生的高能粒子(离子)的轰击而被物理射出。射出的原子沉积在金属基材上。
优选地，在第一部分中，电子束蒸镀装置包括真空沉积室以沉积厚度为1.0μm至4.5μm的第一涂层，所述真空沉积室包括包含由铝组成的金属的蒸镀坩埚、加热装置和电子枪。
优选地，在第二部分中，射流气相蒸镀装置包括真空沉积室，所述真空沉积室包括至少蒸镀坩埚、蒸气射流涂覆器和至少一个适于向蒸气射流涂覆器进给基于锌的蒸气的蒸镀坩埚。
优选地，蒸气射流涂覆器是声波蒸气射流涂覆器并且蒸镀坩埚包括感应加热器。
有利地，再装料炉放置在蒸镀坩埚下方并适于保持在大气压下。更优选地，再装料炉连接至金属锭进料装置。
在真空沉积室中，在金属基材的必须被涂覆的表面旁边存在蒸气射流涂覆器。该涂覆器适合将基于锌的金属合金蒸气喷洒到运行的基材上。
蒸气射流涂覆器安装在适合于向蒸气射流涂覆器进给基于锌的蒸气的蒸镀坩埚上。在一个优选的实施方案中，一个蒸镀坩埚适合于包括包含锌的金属浴，该金属浴产生待沉积在基材上的蒸气。在另一个优选的实施方案中，使用两个蒸镀坩埚，一个蒸镀坩埚包含另一种金属并且一个蒸镀坩埚包含锌，将两种金属蒸气的混合物沉积在基材上。优选地，至少蒸镀坩埚优选地位于沉积室中。
蒸镀坩埚可以设置有加热装置，该加热装置使得金属合金蒸气能够形成并进给至蒸气射流涂覆器。蒸镀坩埚有利地设置有感应加热器，该感应加热器具有使金属合金浴的搅拌和组成均匀更容易的优点。
蒸镀坩埚中的压力取决于浴温度和金属浴组成。其通常在10-3巴至10-1巴之间变化。因此，沉积室2中的压力保持为高于蒸镀坩埚中的压力。
至少蒸镀坩埚可以连接至适合于向蒸镀坩埚进给锌和/或另一种金属的再装料炉。再装料炉优选位于真空沉积室的外部。再装料炉优选位于蒸镀坩埚下方并适于保持在大气压下。由于蒸镀坩埚与再装料炉之间的高度以及它们之间产生的压力差，随着金属浴蒸镀，熔融的主要元素通过气压效应上升到蒸镀坩埚中。这确保了蒸镀坩埚的连续进料并且有助于保持蒸镀坩埚中的恒定液位，无论线速度如何。
现在将以仅供参考而进行的试验对本发明进行说明。这些试验不是限制性的。
实施例
对于所有样品，所使用的钢板的组成如下：0.2重量％的C、1.5重量％的Si、2重量％的Mn、0.04重量％的Al，余量为铁。
对于试验件1，通过电沉积在钢板上沉积Zn的涂层。
对于试验件2至4，通过磁控管阴极粉碎来沉积作为316不锈钢(包含16重量％至18重量％的Cr和10重量％至14重量％的Ni，余量为Fe)的中间层，通过电子束沉积来沉积铝的第一涂层，以及通过JVD来沉积锌的第二涂层。
对于试验件5，未在钢板上沉积涂层。
实施例1：LME测试
为了测量LME敏感度，在尽可能接近点焊条件的条件下进行高温拉伸测试。
拉伸试样示出于图1中。在头部中机械加工两个孔以插入销并因此确保在测试期间不滑动。
然后，在每个试样上施加1kN的预紧力。以约1000℃/秒的加热速率加热试样以达到750℃至950℃的温度。在达到所述温度时，向试样施加位移直到完全失效。测试期间使用的应变速率为3mm/秒。
确定并分析应力-应变曲线。计算该应力-应变曲线的导数并绘制。应变导数最小时的钢延伸率对应于试样的断裂。如果该断裂是由LME现象引起的，即，如果在裂纹中存在液态锌，则该延伸率定义为“临界LME延伸率值”。如果该断裂是延性断裂，则该延伸率定义为“临界延伸率值”。然后将该值作为拉伸测试的温度的函数绘图。
结果示于下表1中。0意指优异，换言之，在裂纹中没有液态锌，即断裂是延性的；1意指差，换言之，在对应于LME裂纹的裂纹中存在液态锌。
Figure BDA0002387824300000071
*根据本发明。
根据本发明的试验件2至4显示出与裸钢(即试验件5)相同水平的对LME的优异抵抗性。
实施例2：电化学行为测试：
准备试验件1、3和4并使其经历电化学电位测试。
实现了包括测量经涂覆的钢板表面的电化学电位的测试。将钢板和涂层分离并浸入pH 7下的包含5重量％的氯化钠的溶液中。将饱和甘汞电极(SCE)也浸入溶液中。随时间推移测量表面的耦合电位。结果示于下表2中：
Figure BDA0002387824300000072
*根据本发明。
与试验件1相比，根据本发明的试验件3和4具有更高的牺牲保护。试验件3和4的耦合电位根据需要低于-0.78V/SCE，即具有抗腐蚀牺牲保护的最小电化学电位。

Claims (19)

1.一种经涂覆的金属基材，包括由铝组成的至少第一涂层，这样的第一涂层具有1.0μm至4.5μm的厚度并且顶部被基于锌的第二涂层直接覆盖，这样的第二涂层的厚度为1.5μm至9.0μm，以及其中所述第一涂层相对于所述第二涂层的厚度比为0.2至1.2。
2.根据权利要求1所述的经涂覆的金属基材，其中所述第二涂层包含选自Si和Mg中的至少一种元素。
3.根据权利要求1或2所述的经涂覆的金属基材，其中所述第二涂层包含小于0.5重量％的镁。
4.根据权利要求1至3中任一项所述的经涂覆的金属基材，其中所述第二涂层不包含以下元素中的至少一者：镁、铝、铜和硅。
5.根据权利要求1至4中任一项所述的经涂覆的金属基材，其中所述第二涂层由锌组成。
6.根据权利要求1至5中任一项所述的经涂覆的金属基材，其中所述第一涂层的厚度为2μm至4μm。
7.根据权利要求1至6中任一项所述的经涂覆的金属基材，其中所述第二涂层的厚度为1.5μm至8.5μm。
8.根据权利要求1至7中任一项所述的经涂覆的金属基材，其中所述第一涂层相对于所述第二涂层的厚度比为0.2至0.8。
9.根据权利要求1至8中任一项所述的经涂覆的金属基材，在所述金属基材与所述第一涂层之间存在中间层，这样的中间层包含铁、镍、铬和任选的钛。
10.根据权利要求1至9中任一项所述的经涂覆的金属基材，其中所述金属基材选自：铝基材、钢基材、不锈钢基材、铜基材、铁基材、铜合金基材、钛基材、钴基材或镍基材。
11.一种用于制造根据权利要求1至10中任一项所述的经涂覆的金属基材的方法，包括以下步骤：
A.提供金属基材；
B.任选地，所述金属基材的表面准备步骤；
C.沉积由铝组成的第一涂层，这样的第一涂层的厚度为1.0μm至4.5μm；以及
D.沉积基于锌的第二涂层，这样的第二涂层的厚度为1.5μm至9.0μm，以及
其中所述第一涂层相对于所述第二涂层的厚度比为0.2至1.2。
12.根据权利要求11所述的方法，其中在进行步骤B)时，表面处理选自：喷丸、酸洗、蚀刻、抛光、喷砂、研磨、以及包含铁、镍、铬和任选的钛的中间层的沉积。
13.根据权利要求11或12所述的方法，其中在步骤C)和D)中，所述第一涂层和所述第二涂层的沉积通过热浸涂、通过电沉积工艺或通过真空沉积来彼此独立地进行。
14.根据权利要求13所述的方法，其中在步骤C)和D)中，在进行真空沉积时，所述第一涂层和所述第二涂层通过磁控管阴极粉碎工艺、射流气相沉积工艺、电磁悬浮蒸镀工艺或电子束物理气相沉积来彼此独立地沉积。
15.根据权利要求1至10中任一项所述的经涂覆的金属基材或者能够根据权利要求11至14所述的方法获得的经涂覆的金属基材用于制造机动车辆的部件的用途。
16.一种使用根据权利要求11至14中任一项所述的方法在运行的金属基材上连续真空沉积涂层以获得根据权利要求1至10中任一项所述的经涂覆的金属基材的设备，按以下顺序包括：
A.任选地，包括磁控管阴极粉碎装置的中间部分；
B.包括电子束蒸镀装置的第一部分；和
C.包括射流气相蒸镀装置的第二部分。
17.根据权利要求16所述的设备，其中当存在所述中间部分时，所述磁控管阴极粉碎装置包括真空沉积室以在所述金属基材上沉积中间层，所述真空沉积室包括等离子体源和由铁、铬、镍和任选的钛制成的一个靶，所述中间层包含铁、镍、铬和任选的钛。
18.根据权利要求16或17所述的设备，其中在所述第一部分中，所述电子束蒸镀装置包括真空沉积室，所述真空沉积室包括包含由铝组成的金属的蒸镀坩埚、加热装置和电子枪。
19.根据权利要求16至18中任一项所述的设备，其中在所述第二部分中，所述射流气相蒸镀装置包括真空沉积室，所述真空沉积室包括至少蒸镀坩埚、蒸气射流涂覆器和至少一个适于向所述蒸气射流涂覆器进给基于锌的蒸气的蒸镀坩埚。
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