CN110998442A - 正型放射线敏感性树脂组合物 - Google Patents

正型放射线敏感性树脂组合物 Download PDF

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Publication number
CN110998442A
CN110998442A CN201880054622.9A CN201880054622A CN110998442A CN 110998442 A CN110998442 A CN 110998442A CN 201880054622 A CN201880054622 A CN 201880054622A CN 110998442 A CN110998442 A CN 110998442A
Authority
CN
China
Prior art keywords
resin composition
radiation
sensitive resin
positive
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201880054622.9A
Other languages
English (en)
Chinese (zh)
Inventor
樱井隆觉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Zeon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeon Corp filed Critical Zeon Corp
Publication of CN110998442A publication Critical patent/CN110998442A/zh
Pending legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Measurement Of Radiation (AREA)
  • Liquid Crystal (AREA)
  • Electroluminescent Light Sources (AREA)
CN201880054622.9A 2017-09-29 2018-09-13 正型放射线敏感性树脂组合物 Pending CN110998442A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2017190288 2017-09-29
JP2017-190288 2017-09-29
PCT/JP2018/033932 WO2019065262A1 (ja) 2017-09-29 2018-09-13 ポジ型感放射線性樹脂組成物

Publications (1)

Publication Number Publication Date
CN110998442A true CN110998442A (zh) 2020-04-10

Family

ID=65901804

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201880054622.9A Pending CN110998442A (zh) 2017-09-29 2018-09-13 正型放射线敏感性树脂组合物

Country Status (4)

Country Link
JP (1) JP7192775B2 (ja)
CN (1) CN110998442A (ja)
TW (1) TWI776957B (ja)
WO (1) WO2019065262A1 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115427891A (zh) * 2020-03-30 2022-12-02 日产化学株式会社 抗蚀剂下层膜形成用组合物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008309885A (ja) * 2007-06-12 2008-12-25 Hitachi Chem Co Ltd ポジ型感光性樹脂組成物、レジストパターンの製造方法及び電子デバイス
JP2009251538A (ja) * 2008-04-11 2009-10-29 Nippon Zeon Co Ltd 感放射線樹脂組成物
JP2013167781A (ja) * 2012-02-16 2013-08-29 Fujifilm Corp 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
TW201431940A (zh) * 2013-02-08 2014-08-16 Fujifilm Corp 圖案形成方法、感光化射線性樹脂組成物、感放射線性樹脂組成物、抗蝕劑膜、電子元件的製造方法及電子元件
CN106432574A (zh) * 2015-08-05 2017-02-22 信越化学工业株式会社 高分子化合物、正型抗蚀剂组合物、层叠体及抗蚀剂图案形成方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008309885A (ja) * 2007-06-12 2008-12-25 Hitachi Chem Co Ltd ポジ型感光性樹脂組成物、レジストパターンの製造方法及び電子デバイス
JP2009251538A (ja) * 2008-04-11 2009-10-29 Nippon Zeon Co Ltd 感放射線樹脂組成物
JP2013167781A (ja) * 2012-02-16 2013-08-29 Fujifilm Corp 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機ｅｌ表示装置および液晶表示装置
TW201335714A (zh) * 2012-02-16 2013-09-01 Fujifilm Corp 感光性樹脂組成物、硬化膜的製造方法、硬化膜、有機ｅｌ顯示裝置以及液晶顯示裝置
TW201431940A (zh) * 2013-02-08 2014-08-16 Fujifilm Corp 圖案形成方法、感光化射線性樹脂組成物、感放射線性樹脂組成物、抗蝕劑膜、電子元件的製造方法及電子元件
CN106432574A (zh) * 2015-08-05 2017-02-22 信越化学工业株式会社 高分子化合物、正型抗蚀剂组合物、层叠体及抗蚀剂图案形成方法

Also Published As

Publication number Publication date
TW201915043A (zh) 2019-04-16
KR20200060366A (ko) 2020-05-29
JPWO2019065262A1 (ja) 2020-09-10
WO2019065262A1 (ja) 2019-04-04
TWI776957B (zh) 2022-09-11
JP7192775B2 (ja) 2022-12-20

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