CN110838455B - Heat treatment system and heat treatment device - Google Patents
Heat treatment system and heat treatment device Download PDFInfo
- Publication number
- CN110838455B CN110838455B CN201910748025.2A CN201910748025A CN110838455B CN 110838455 B CN110838455 B CN 110838455B CN 201910748025 A CN201910748025 A CN 201910748025A CN 110838455 B CN110838455 B CN 110838455B
- Authority
- CN
- China
- Prior art keywords
- heat treatment
- heater
- main body
- space
- heaters
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 195
- 238000003780 insertion Methods 0.000 claims description 53
- 230000037431 insertion Effects 0.000 claims description 53
- 239000000758 substrate Substances 0.000 claims description 27
- 238000012546 transfer Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 6
- 238000004904 shortening Methods 0.000 abstract description 5
- 238000012423 maintenance Methods 0.000 description 31
- 238000000034 method Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 230000008439 repair process Effects 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000003014 reinforcing effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Furnace Details (AREA)
- Furnace Charging Or Discharging (AREA)
Abstract
The invention discloses a heat treatment system and a heat treatment device. The heat treatment system and the heat treatment device of the invention can shorten the interval between the heat treatment devices by shortening the length of the heater, thereby improving the space utilization rate and the productivity.
Description
Technical Field
The present invention relates to a heat treatment system and a heat treatment apparatus. More particularly, the present invention relates to a heat treatment system and a heat treatment apparatus, which can improve space utilization and productivity by shortening the interval between heat treatment apparatuses by shortening the length of a heater.
Background
An annealing (annealing) device is a device responsible for the necessary heat treatment steps to perform crystallization, phase change, etc. processes for a fixed thin film deposited on a substrate such as a silicon wafer or glass.
Fig. 1 is a perspective view showing a conventional batch heat treatment apparatus. FIG. 2 is a prior art thermal processing system; fig. 2 (a) shows the configuration of the heaters 20, 30 in the heat treatment apparatus 1; fig. 2 (b) shows a system for heat treatment.
Referring to fig. 1, a conventional batch heat treatment apparatus 1 includes: a main body 10 having a heat treatment space 15, a door 11 for opening and closing an inlet and an outlet of the main body 10; the main heater 20 and the auxiliary heater 30. A plurality of substrates may be disposed in the heat treatment space 15. The plurality of substrates are spaced apart by a predetermined distance, respectively, and are supported by a substrate holder (not shown), or mounted on a boat (not shown), and may be placed in the heat treatment space 15.
The main heater 20 is a conventional stick-shaped heater with a delayed length, and both ends of the main heater 20 are coupled with connectors, and the heater 20 can be installed and fixed on the wall surface of the main body 10 while being powered off. The auxiliary heater 30 has the same structure as the main heater 20. However, in consideration of heat released from the heat treatment apparatus 1 to the outside, the auxiliary heater 30 is arranged in a direction perpendicular to the formation direction of the main heater 20 so as to be parallel to both side surfaces of the main body 10, thereby uniformly applying heat to all regions of the heat treatment space 1.
Referring to fig. 2 (a), the main heater 10 mainly performs heating of the region Z2 occupied by the substrate 5, and the auxiliary heater 39 performs heating of the outer side of the substrate 5, i.e., the corner portion of the heat treatment space 15 which is the region Z1Z3 unoccupied by the substrate 5. In order to prevent heat loss to the outside, the auxiliary heater 30 is arranged perpendicular to the main heater 20 so that the heating temperature in the Z1 and Z3 regions is higher than that in the Z2 region.
However, the conventional batch heat treatment apparatus 1 has a problem that the volume is unnecessarily large. Referring to fig. 2 (b), for example, in the heat treatment system S ' configured with two heat treatment apparatuses 1, a transfer robot TR that moves along a transfer path TP and loads/unloads a substrate 5 is rotatably provided in front or rear side spaces M3', M4', M7', M8' of a main body (10: 10a, 10 b). In the heat treatment system S ', the main heater 20 is provided at the main body (10:10a, 10 b), and in order to secure the paths P1', P2', P5', P6' for maintenance/management, at least the left side spaces M1', M2', M5', M6' of the main body (10:10a, 10 b) are required. Then, the auxiliary heater 30 is disposed at the main body 10, and at least front and rear side spaces M3', M4', M7', M8' of the main body (10:10 a, 10 b) are required in order to secure paths P3', P4', P7', P8' for maintenance/management. That is, the interval between the adjacent bodies 10a10b has to depend on the length of the main heater 20.
The lateral/vertical length or width of the left and right side spaces M1', M2', M5', M6' and the front and rear side spaces M3', M4', M7', M8' of the main body 10 depends on the width L1 (or one side length L1) of the main body 10 and the length (corresponding to L1) of the main heater 20/sub heater 30. Since the main body 10 is a space for performing substrate processing, it is difficult to adjust the width L1. The main heater 20/sub heater 30 also has a stick shape and needs to be provided on the wall surface of the main body 10, so it is difficult to adjust the length. As such, it is difficult to adjust the sizes of the outside spaces M1', M2', M3', M4', M5', M6', M7', M8' surrounding all the faces of the main body 10, but conversely the space occupied by the spaces in the heat treatment system is very large, so that there is a problem in that the overall size of the apparatus for maintenance/management becomes unnecessarily large and the productivity per unit area is lowered.
On the other hand, the conventional batch heat treatment apparatus 1 has a problem in that a large number of heaters 20 and 30 are provided according to the number of substrates, and the apparatus manufacturing time is increased in the process of coupling the connectors 26 to both ends of each heater 20 and 30. In addition, there is a problem that the maintenance/management time is increased during the process of removing the connector 26 when repairing and replacing the heaters 20 and 30. If a portion of the heaters 20, 30 fail during the heat treatment process, this delay in maintenance, replacement time can result in a significant number of process failures.
Disclosure of Invention
(problems to be solved)
The present invention has been made to solve the above-described problems of the prior art, and an object of the present invention is to provide a heat treatment system and a heat treatment apparatus, which can greatly reduce a space for installing a heater in a main body and a space for maintenance/management, and can improve a space utilization rate.
Further, an object of the present invention is to provide a heat treatment system and a heat treatment apparatus capable of improving productivity per unit area by improving space utilization.
Another object of the present invention is to provide a heat treatment system and a heat treatment apparatus as follows: when setting, maintaining, replacing, etc. the heater, the manufacture time and maintenance time are greatly shortened, and the number of operation processes can be further reduced.
(means for solving the problems)
The above object of the present invention can be achieved by a heat treatment system for heat-treating a substrate, comprising: a plurality of heat treatment apparatuses including a main body providing a heat treatment space of a substrate and a plurality of heaters disposed inside the main body and having a length smaller than a width of the main body; the interval between adjacent heat treatment devices is the same or greater than the length of the heater included in the heat treatment device and less than the width of the heat treatment device.
In addition, according to an embodiment of the present invention, the transfer robot loading/unloading the substrate at the heat treatment apparatus is further included; the transfer robot moves along a conveyance path formed at least at one side of the heat treatment apparatus, and is rotatably provided.
In addition, according to an embodiment of the present invention, the main body includes a plurality of insertion openings into which the heater is inserted at least at both sides facing each other; the portions of the pair of heaters disposed in the plurality of insertion ports disposed in the heat treatment space have the same length as each other, and the sum of the portions disposed in the heat treatment space may be the same or smaller than the width of the main body.
In addition, according to an embodiment of the present invention, the main body includes a plurality of insertion openings into which the heaters are inserted at least at both side surfaces facing each other; a pair of heaters provided in the plurality of insertion openings, a length of a portion of at least one of the heaters disposed in the heat treatment space being less than 1/2 of a width of the main body, and a length of a portion of the other of the heaters disposed in the heat treatment space being greater than 1/2 of the width of the main body; the sum of the portions of the heater disposed in the heat treatment space may be the same or smaller than the width of the main body.
In addition, according to an embodiment of the present invention, the heater is provided as a cantilever, one end portion is positioned in the heat treatment space unsupported, and at least a part of the other end portion or the outer periphery is supported by a supporting tool.
In addition, according to an embodiment of the present invention, the supporting means is one or a combination of a plurality of the following (1) to (3): (1) a sidewall of the body; (2) A support housing provided outside the side wall of the main body and having at least a part inserted into the insertion port; (3) Is disposed inside a side wall of the main body and supports a lower portion of the heater portion in the heat treatment space.
In addition, according to an embodiment of the present invention, an access opening of a useful door switch is formed at the front of the main body; a plurality of insertion openings are formed at both sides of the inlet and outlet; may include a plurality of heaters respectively inserted and disposed at the insertion ports.
The above object of the present invention is achieved by a heat treatment apparatus for heat-treating a substrate, comprising: a main body providing a heat treatment space for the substrate; a plurality of heaters inserted into the plurality of insertion openings, respectively, the plurality of insertion openings being formed at least on two sides of the main body facing each other; wherein a pair of heaters facing each other among the plurality of heaters is inserted as cantilevers disposed at a plurality of insertion ports facing each other in opposite directions, one end portion is positioned in the heat treatment space unsupported, and the other end portion or at least a part of the outer periphery is supported by a supporting tool.
In addition, according to an embodiment of the present invention, the length of the heater may be smaller than the width of the body.
In addition, according to an embodiment of the present invention, portions of the pair of heaters disposed in the plurality of insertion ports disposed in the heat treatment space have the same length as each other, and a sum of portions disposed in the heat treatment may be the same or smaller than a width of the main body.
In addition, according to an embodiment of the present invention, in a pair of heaters provided in the plurality of insertion ports, a length of a portion of any one of the heaters disposed in the heat treatment space is less than 1/2 of a width of the main body, and a length of a portion of another of the heaters disposed in the heat treatment space is greater than 1/2 of the width of the main body, and a sum of portions of the heaters disposed in the heat treatment space may be the same or less than the width of the main body.
In addition, according to an embodiment of the present invention, the supporting means may be one or a combination of a plurality of the following (1) to (3): (1) a sidewall of the body; (2) A support housing provided outside the side wall of the main body and having at least a part inserted into the insertion port; (3) Is disposed inside a side wall of the main body and supports a lower portion of the heater portion in the heat treatment space.
In addition, according to an embodiment of the present invention, an access opening of a useful door switch is formed at the front of the main body; a plurality of insertion openings are formed at both sides of the inlet and outlet; may include a plurality of heaters respectively inserted and disposed at the insertion ports.
(effects of the invention)
According to the present invention having the above-described configuration, the space for installing the heater in the main body and the space for maintenance are greatly reduced, and the space utilization can be improved.
In addition, according to the present invention, the productivity per unit area can be improved by increasing the space utilization.
In addition, according to the present invention, there are the following effects: when the heater is installed, maintained, replaced, etc., the manufacture time and maintenance time are greatly shortened, and the number of operation processes can be reduced.
Drawings
Fig. 1 is a perspective view showing a conventional batch heat treatment apparatus.
Fig. 2 (a) is a schematic plan view showing the arrangement shape of the heater in the heat treatment apparatus; fig. 2 (b) is a schematic plan view showing a space required for manufacturing, maintenance, repair of the heat treatment system.
Fig. 3 is a perspective view showing a heat treatment apparatus according to an embodiment of the present invention.
Fig. 4 is a schematic side view showing a portion B-B' of fig. 3, and is a diagram showing a shape in which a heater is provided in the heat treatment apparatus.
Fig. 5 is a schematic plan view showing the arrangement shape of a heater in the heat treatment apparatus according to the embodiment of the present invention.
Fig. 6 is a schematic plan view showing a space required for manufacturing, maintenance, and repair of the heat treatment system according to an embodiment of the present invention.
Fig. 7 is a schematic diagram showing the arrangement shape of a heater according to various embodiments of the present invention.
Fig. 8 to 9 are schematic side sectional views showing support shapes of heaters of various embodiments of the present invention.
(description of the reference numerals)
100: heat treatment device
105: heat treatment space
110: main body
111: insertion opening
130: door
200. 200a to 200f: heater
201: one end of the heater
205: another end of the heater
210: main heater
220: auxiliary heater
C: central portion
D: distance between heat treatment devices
L1: side length of heat treatment device
L2, L3: length of heater
M1 to M8: maintenance space for a thermal processing system
S: heat treatment system
P1 to P8: main maintenance (main) path for a thermal processing system
Z1 to Z3: heating zone
Detailed Description
For the following detailed description of the invention, reference is made to the accompanying drawings that show, by way of illustration, specific embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention. For the various embodiments of the invention, it should be understood that they are not necessarily mutually exclusive, although they are mutually different. For example, a particular shape, structure, and characteristic described herein may be associated with one embodiment and may be implemented by other embodiments without departing from the spirit and scope of the invention. In addition, the location or arrangement of individual elements within the separately disclosed embodiments should be understood as being changeable without departing from the spirit and scope of the invention. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of the present invention is defined only by the appended claims, along with the full scope of equivalents to which such claims are entitled, if appropriately presented. In the drawings, the same reference numerals refer to the same or similar functions in several aspects, and lengths, areas, thicknesses, etc. may also be exaggerated for convenience.
The heat treatment apparatus and the heat treatment system according to the embodiments of the present invention are described in detail below with reference to the drawings.
Fig. 3 is a perspective view showing a heat treatment apparatus according to an embodiment of the present invention; fig. 4 is a schematic side view showing a portion B-B' of fig. 3, and is a diagram showing a shape in which a heater is provided in the heat treatment apparatus.
Referring to fig. 3, the heat treatment apparatus 100 of the present invention includes: a main body 110 including a heat treatment space 105; a door 130 for opening and closing the inlet and outlet 106 of the main body 110, and a plurality of heaters 200.
The heat treatment apparatus 100 is formed in a substantially rectangular hexahedral shape, including a main body 110 constituting an external appearance; a space for processing the substrate 5 may be formed inside the main body 110. I.e. the heat treatment space 105. The body 110 may be formed not only in a rectangular hexahedral shape but also in various shapes according to the shape of the substrate 5, and the heat treatment space 105 may be formulated of a sealed space.
One or more substrates 5 may be disposed inside the heat treatment space 105. The plurality of substrates 5 are respectively arranged at predetermined distances and supported by a substrate holder (not shown), or mounted on a boat (not shown), may be arranged in the heat treatment space 105.
The body 110 may be formed with an insertion opening 111 penetrating a wall of the body 110, and the heater 200 may be slidably inserted. The insertion port 111 may be formed at least at both sides of the body 110 facing each other. For example, left and right sides; but may be formed at the front, rear, left side, right side, etc. of the body 110. Preferably, a plurality of insertion openings 111 are formed to correspond to the number of heaters 200. An insertion port 111 is formed in the wall of the main body 110, and a reinforcing tool (not shown) may be further provided for reinforcing the periphery of the insertion port 111.
Referring to fig. 4, the heater 200 is slidably inserted into the insertion port 111 from the outside of the main body 110, and a portion of the heater 200 is positioned in the heat treatment space 105, whereby heat can be supplied to the heat treatment space 105. To enable sliding of the heater 200, the inner diameter of the insertion opening 111 is preferably the same as the outer diameter of the heater 200, or at least greater than the outer diameter of the heater 200.
The heater 200 includes a main heater 210 and an auxiliary heater 220. The heater 200 is integrally elongated in a rod shape, and may be formed in a shape in which one end 201 is closed and input/output terminals are entirely formed at the other end 205. Accordingly, the heater 200 can be provided to the main body 110 by sliding insertion from the outside to the inside of the main body 110.
The main heater 210 may be provided in plurality, and the plurality of main heaters 210 are spaced apart by a predetermined distance in a direction perpendicular to a direction in which the substrate 5 is loaded through the inlet/outlet 106 in front of the main body 110. A pair of main heaters 210 are slidably inserted in opposite directions to each other in sides (left and right sides) of the body 110 facing each other in a shape that can be arranged facing each other, and a pair of main heaters 210 of such a shape facing each other can be provided in plurality and spaced apart a predetermined distance.
The auxiliary heater 220 may have the same structure as the main heater 210. However, in consideration of releasing heat from the heat treatment apparatus 100 to the outside, the auxiliary heater 220 may be also configured to uniformly apply heat to all areas of the heat treatment space 105. The auxiliary heater 220 is disposed in a direction perpendicular to the formation direction of the main heater 210 and parallel to both side surfaces of the main body 220. That is, the auxiliary heaters 220 are disposed on both sides of the front inlet/outlet 106, and may be disposed at the rear of the heat treatment apparatus 100 at positions corresponding thereto.
The heater 200 acts as a cantilever (cantilever) with one end 201 unsupported in the heat treatment space 105 and the other end 205 or at least a portion of the periphery may be supported by a support tool. As shown in fig. 4 or fig. 7 (a), the other end portion 205 of the heater 200 is supported by a supporting tool, and as shown in fig. 7 (b), a portion of the outer circumference may also be supported by a supporting tool (e.g., a side wall of the heat treatment apparatus 100) instead of supporting the other end portion 205.
The supporting tool is as follows: (1) a sidewall of the heat treatment apparatus 100; (2) A support case 410 (see fig. 8 and 9) provided outside the side wall of the heat treatment apparatus 100 and having at least a part inserted into the insertion port 111; (3) A convex supporting portion 460 (refer to fig. 9 (b)) provided inside the side wall of the heat treatment apparatus 100 and supporting the lower portion of the heater 100 portion in the heat treatment space 105, and the like.
The length L2, L3 of at least one of the pair of heaters 200-1, 200-2 provided in a state of being inserted into the insertion port 111 may be the same or less than 1/2 of the width L1 of the heat treatment apparatus 100 (or the main body 110). Referring back to fig. 4, the heater 200-1 on the left side of the pair of heaters 200-1, 200-2 facing each other may have a length L2 that is the same or less than 1/2 of the width L1 of the body 110. Alternatively, the right side heater 200-2 of the pair of heaters 200-1, 200-2 may have a length L3 that is the same or less than 1/2 of the width L1 of the body 110. Referring to fig. 7 (a). In another aspect, the heaters 200-1, 200-2 may include not only a length inserted into the heat treatment apparatus 100 but also a length extending to an outer side of an outer sidewall of the heat treatment apparatus 100, in which case the pair of heaters 200-1, 200-2 may be formed such that portions disposed in the heat treatment space 105 have the same lengths L4, L5 as each other. In this case, the sum of the portions (sum of L4, L5) disposed in the heat treatment space 105 may be the same or smaller than the width L1 of the heat treatment apparatus 100.
Alternatively, at least one of the pair of heaters 200-1, 200-2 facing each other may have the same length or less than 1/2 of the width L1 of the heat treatment apparatus 100, and the other may have the same length or greater than 1/2 of the width L1 of the heat treatment apparatus 100 [ refer to fig. 7 (b), (c) ]. In another aspect, the pair of heaters 200-1, 200-2 may be formed such that portions disposed in the heat treatment space 105 have mutually different lengths L4, L5. In this case, the length L4 of the portion disposed in the heat treatment space 105 of one heater 200-1 is less than 1/2 of the width L1 of the heat treatment apparatus 100, and the length L5 of the portion disposed in the heat treatment space 105 of the other heater 200-2 may be greater than 1/2 of the width L1 of the heat treatment apparatus 100.
The right one end 201 of the heater 200-1 is disposed in the heat treatment space 105, and the left other end 205 may be supported by the left side wall (peripheral side wall of the insertion port 111) of the heat treatment apparatus 100. Then, the left end 201 of the heater 200-2 is disposed in the heat treatment space 105, and the right other end 205 may be supported by the right side wall (peripheral side wall of the insertion port 111) of the heat treatment apparatus 100.
In another aspect, among the pair of heaters 200-1, 200-2 facing each other, the length of one heater 200-1, 200-2 disposed in the heat treatment space 105 may also be the same or less than 1/2 of the width L1 of the heat treatment apparatus 100.
Fig. 5 is a schematic plan view showing the configuration of the heater 200 in the heat treatment apparatus 100 according to the embodiment of the present invention. Fig. 6 is a schematic plan view showing a space required for manufacturing, maintenance, and repair of the heat treatment system S according to an embodiment of the present invention.
Referring to fig. 5, a plurality of heaters (200:210, 220) are inserted in the body 110, and the heat treatment space 105 may be heated. At this time, the heat treatment space 105 may be divided into a region Z2 occupied by the substrate 5 and regions Z1, Z3 unoccupied by the substrate 5.
Referring to fig. 6, the heat treatment system S may include a plurality of heat treatment apparatuses 100 and a peripheral space for maintaining/managing the heat treatment apparatuses 100. For ease of illustration, the heat treatment system S is illustrated as including two heat treatment apparatuses 100.
The heat treatment apparatus 100 may be disposed at a distance d. The spacing distance d may correspond to a minimum length for replacing/removing the heaters (200:210, 220) provided at the heat treatment apparatus 100, a minimum length for providing the heaters 200 at the bodies 110a, 110b of the heat treatment apparatus 100. In the prior art, the distance d is set to a size corresponding to the width L1 of the heat treatment apparatus 100, and thus the system S' is unnecessarily large [ see fig. 2 (b) ], and therefore the distance d should be smaller than the width L1 of the heat treatment apparatus 100. In view of this, in the heat treatment system S of the present invention, the spacing distance d of the adjacent pair of heat treatment apparatuses 100 is the same or greater than the lengths L2, L3 of the heaters 200 included in the heat treatment apparatuses 100 and smaller than the width L1 of the heat treatment apparatuses 100.
In order to provide the main heater 210 at the main bodies 110a, 110b and secure the paths P1, P2, P5, P6 for maintenance/management, at least the left and right side spaces M1, M2, M5, M6 of the main bodies 110a, 110b are required. Then, in order to provide the sub-heater 220 at the main body 110a, 110b and secure the paths P3, P4, P7, P8 for maintenance/management, at least the front and rear side spaces M3, M4, M7, M8 of the main body 110a, 110b are required. The paths P1 to P4, 5 to P8 may correspond to the lengths L2, L3 of the heater 200. A transfer robot TR is rotatably provided in the front or rear space M3, M4, M7, M8 of the heat treatment apparatus 100, the transfer robot TR being movable along the transfer path TP, and loading/unloading the substrate 5 in the heat treatment apparatus 100.
Referring to fig. 2 (b), in the conventional batch heat treatment apparatus 1, the length of the main heater 20/auxiliary heater 30 is substantially the same as the side length L1 of the heat treatment apparatus 1, so that the width of one maintenance space corresponds to L1XL1, and the sum of four maintenance spaces M1', M2', M3', M4', M5', M6', M7', M8' corresponds to 4XL 1. In addition, the minimum area that the heat treatment system S' should secure corresponds to 5L1 (lateral direction) X3L1 (vertical direction) =15l12.
Unlike the conventional batch heat treatment apparatus 1 shown in fig. 1 and 2, the heat treatment apparatus 100 of the present invention has a structure in which the lengths L2 and L3 of the heater 200 are shortened. Accordingly, in the present invention, the width of one maintenance space corresponds to L1XL2 or L1XL3; while the sum of the four maintenance spaces M1, M2, M3, M4, M5, M6, M7, M8 may be as follows: (1) 4XL1XL2 or 4XL1XL3 (case of 0.5L1> l2=l3); (2) (2 XL1XL 2) + (2 XL1XL 3) (case of l2+.l3, 0.5l1> l2 or 0.5l1> l3). Since 0.5l1> l2 and/or 0.5l1> l3, the total area of the maintenance spaces M1 to M4 and M5 to M8 of the present invention may be 50% or less of the total area of the maintenance spaces M1 'to M4' and M5 'to M6' of the conventional batch heat treatment apparatus 1 even in the cases of (1) and (2). In addition, the area of the heat treatment system S is constituted by the areas of the maintenance spaces M1 to M4, M5 to M8 and the heat treatment apparatus 100, and the minimum area that the heat treatment system S should ensure should correspond to 3.5L1 (lateral) X2L1 (vertical) =7l12. In this case, it was confirmed that the area of the heat treatment system S of the present invention was significantly reduced to about 46% compared to the area of the conventional heat treatment system S'.
As described above, the heat treatment system S of the present invention can greatly reduce the maintenance space and the occupation area of the heat treatment system S by shortening the length of the heater 200. Accordingly, the method has the following advantages: the space utilization can be remarkably improved, and the productivity per unit area can be improved by improving the space utilization.
In addition, the present invention can accomplish the configuration of the heater 200 by merely slidably inserting the heater 200 through the insertion port 111 formed on one side surface of the body 110. The user can perform maintenance such as maintenance and replacement of the heater 200 by sliding the heater 200 only through the maintenance paths P1 to P4 and P5 to P8 near the one side spaces M1 to M4 and M5 to M8 of the main body 110. In this way, the heater 200 can be inserted only into the insertion opening 111 on the side of the main body 110 in a sliding manner, and the heat treatment apparatus 100 can be manufactured, and maintenance of the heat treatment system can be performed only by inserting and extracting the heater 200, which has the advantage that the number of processes can be reduced.
Fig. 7 is a schematic diagram showing the arrangement shape of a heater according to various embodiments of the present invention. In fig. 7, the configuration shapes of the auxiliary heaters 220 are all the same, and thus the auxiliary heater 220 is omitted and only the main heater 210 is shown.
Referring to fig. 7 (a), the pair of main heaters 210 facing each other have the same length and can be slidably inserted into the heat treatment space 105 with the same length. At this time, a pair of main heaters 210 facing each other may generate a space partially spaced from the middle portion, and a central portion (C) which is a portion of the space needs thermal compensation. Of course, by controlling the amount of heat generated by the heater 210, the size of the heat treatment space 105, and the like, it is also unnecessary to compensate for the heat of the center portion (C).
Referring to fig. 7 (b), a pair of main heaters 210 may be slidably inserted with a displacement in order to thermally compensate for the central portion (C). The pair of main heaters 210 facing each other have the same length, and can be disposed in the heat treatment space 105 with different lengths from each other. Accordingly, one heater 210 insertion length corresponds to a length greater than 1/2 of the side length L1 of the heat treatment apparatus 100, and the remaining one heater 210 insertion length may correspond to a length less than 1/2 of the side length L1 of the heat treatment apparatus 100.
Referring to fig. 7 (C), a pair of main heaters 210 may be slidably inserted with a displacement in order to thermally compensate for the central portion C. At this time, the pair of main heaters 210 facing each other have different lengths, and can be disposed in the heat treatment space 105 with different lengths from each other. Accordingly, one heater 210 insertion length corresponds to a length greater than 1/2 of the side length L1 of the heat treatment apparatus 100, and the remaining one heater 210 insertion length may be less than 1/2 of the side length L1 of the heat treatment apparatus 100.
Fig. 8 to 9 are schematic side sectional views showing support shapes of the heater 200 of various embodiments of the present invention.
As described above, one end 201 of the heater 200 is disposed in the heat treatment space 105, and the other end 205 may be disposed outside the wall (main body wall) of the heat treatment apparatus 100. Then, at least a portion at the outer periphery of the heater 200 may be supported by a wall (main body wall) of the heat treatment apparatus 100. That is, the heater 200 may be supported as a cantilever through the insertion opening 111 of the wall of the body 110. In this case, the heater 200 may have a bar shape with an extended length, and thus if the heater 200 is not firmly supported at the other end 205, a problem may occur in that the one end 201 is lowered. Accordingly, the support tools (400:400 a-400 d) of fig. 8 (a) to 9 (b) are required.
Referring to fig. 8 (a) to 9 (b), a support insertion portion 112 may be formed at an outer sidewall of the insertion port 111, and the support insertion portion 112 may be formed in a stepped shape. Accordingly, the inner diameter of the support insertion portion 112 may be larger than the inner diameter of the insertion port 111.
Then, the support housing 410 may be inserted at the support insertion portion 112. The first support housing 411 is entirely inserted into the support insertion portion 112, and the second support housing 415 fastened to the first support housing 411 protrudes to the outside of the wall of the main body 110. A through hole having the same size as the insertion hole 111 is formed in the center portion of the support housing 410 to allow the heater 200 to be inserted. The spacer 420 is also inserted into the support insertion portion 112, and the insertion degree of the support housing 410 into the support insertion portion 112 can be adjusted.
Referring also to fig. 8 (a), a horizontal bolt 430 may be embedded on the outer side of the support housing 410 (or the second support housing 415). The horizontal bolts 430 may be inserted into the fastening holes 416 formed on the outer circumferential surface of the support housing 410 (or the second support housing 415), and thus the heater 200 may be firmly fixed. In particular, if the horizontal bolt 430 fixes the heater 200 at the upper portion, the one end 201 of the heater 200 can be further reinforced from being lowered by its own weight.
Referring also to fig. 8 (b), the support nut 440 may surround and support at least a portion of the outer circumferential surface of the support housing 410 (or the second support housing 415) and a portion of the other end 205 of the heater 200. The first inner circumferential surface 441 forming a step at the inner circumferential surface of the support nut 440 surrounds the support housing 410 (or the second support housing 415), and the heater 200 may be surrounded by the second inner circumferential surface 445. Accordingly, the support nut 440 can support the outer circumferential surface of the longer heater 200 while further extending the length of the support case 410, and thus can firmly fix the other end 205 of the heater 200.
Referring also to fig. 9 (a), a wedge-shaped spacer 450 is inserted into a space between the support housing 410 and the heater 200, and may clamp and support a portion of the other end 205 of the heater 200. One end of the wedge-shaped spacer 450 includes an inclined surface, so that the heater 200 can be firmly fixed the more the wedge-shaped spacer 450 is inserted into the space between the support housing 410 and the heater 200.
Referring also to fig. 9 (b), a convex supporting part 460 may be formed inside the wall of the main body 110 of the heat treatment apparatus 100. The convex supporting part 460 may support a part of the lower portion of the heater 200 in the heat treatment space 105. Thus, the same effect as the extension of the length of the support housing 410 toward the inside of the heat treatment space 105 can occur. A horizontal bolt 465 may be inserted into the protruding support 460. Pushing up the heater 200 from below by the horizontal bolt 465 can further strengthen the one end 201 of the heater 200 from lowering due to its own weight.
As described above, the present invention has an effect that the heater 200 is provided in the main body 110, and the space for maintenance/management is greatly reduced, thereby improving the space utilization. In addition, according to the present invention, there is an effect of improving productivity per unit area by improving space utilization.
In addition, the present invention provides the effects of greatly shortening the manufacturing time and maintenance time and reducing the number of processes by performing installation, maintenance, replacement, etc. of the heater 200 on one side of the main body 110.
The present invention has been shown and described in terms of the preferred embodiments described above, but is not limited to the above-described embodiments, and various modifications and changes may be made by those having ordinary skill in the art to which the present invention pertains without departing from the spirit of the invention. Such modifications and variations are intended to be included within the scope of the invention and the appended claims.
Claims (7)
1. A heat treatment system as a heat treatment system for heat treating a substrate, comprising:
a plurality of heat treatment apparatuses including a main body providing a heat treatment space of a substrate and a plurality of heaters disposed inside the main body and having a length smaller than a width of the main body;
the interval between adjacent heat treatment devices is the same or greater than the length of the heater included in the heat treatment device and less than the width of the heat treatment device.
2. The thermal processing system of claim 1, further comprising:
a transfer robot loading/unloading a substrate in the heat treatment apparatus;
the transfer robot moves along a conveyance path formed at least at one side of the heat treatment apparatus, and is rotatably provided.
3. The heat treatment system of claim 1, wherein the heat treatment system comprises a heat treatment chamber,
the main body includes a plurality of insertion openings into which the heater is inserted at least at two sides facing each other;
the portions of the pair of heaters disposed in the plurality of insertion ports disposed in the heat treatment space have the same length as each other, and the sum of the portions disposed in the heat treatment space is the same or smaller than the width of the main body.
4. The heat treatment system of claim 1, wherein the heat treatment system comprises a heat treatment chamber,
the main body comprises a plurality of insertion openings for inserting the heater at least on two opposite sides;
a pair of heaters provided in the plurality of insertion openings, a length of a portion of at least one of the heaters disposed in the heat treatment space being less than 1/2 of a width of the main body, and a length of a portion of the other of the heaters disposed in the heat treatment space being greater than 1/2 of the width of the main body;
the sum of the portions of the heater disposed in the heat treatment space is the same or smaller than the width of the main body.
5. A heat treatment system according to claim 3 or 4, wherein,
the heater acts as a cantilever with one end unsupported in the heat treatment space and the other end or at least a portion of the periphery supported by a support tool.
6. The heat treatment system of claim 5, wherein the heat treatment system comprises a heat treatment chamber,
the supporting tool is one or a combination of a plurality of the following (1) to (3):
(1) A sidewall of the body;
(2) A support housing provided outside the side wall of the main body and having at least a part inserted into the insertion port;
(3) Is disposed inside a side wall of the main body and supports a lower portion of the heater portion in the heat treatment space.
7. A heat treatment system according to claim 3 or 4, wherein,
an entrance for opening and closing a door is formed on the front surface of the main body;
a plurality of insertion openings are formed at both sides of the inlet and outlet;
comprises a plurality of heaters respectively inserted and arranged in the insertion holes.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20180095484 | 2018-08-16 | ||
| KR10-2018-0095484 | 2018-08-16 | ||
| KR1020190089529A KR102615293B1 (en) | 2018-08-16 | 2019-07-24 | Heating process system and heating process device |
| KR10-2019-0089529 | 2019-07-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110838455A CN110838455A (en) | 2020-02-25 |
| CN110838455B true CN110838455B (en) | 2024-01-09 |
Family
ID=69573987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910748025.2A Active CN110838455B (en) | 2018-08-16 | 2019-08-14 | Heat treatment system and heat treatment device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6826166B2 (en) |
| CN (1) | CN110838455B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008130356A (en) * | 2006-11-21 | 2008-06-05 | Ulvac Japan Ltd | Hot plate, and board processing device |
| CN103377970A (en) * | 2012-04-27 | 2013-10-30 | 泰拉半导体株式会社 | Substrate processing apparatus |
| KR20160022719A (en) * | 2014-08-20 | 2016-03-02 | 주식회사 제우스 | Substrate heat tretment apparatus |
| CN105556651A (en) * | 2013-09-10 | 2016-05-04 | 泰拉半导体株式会社 | Heat treatment device and heat treatment system comprising same |
-
2019
- 2019-08-07 JP JP2019145071A patent/JP6826166B2/en active Active
- 2019-08-14 CN CN201910748025.2A patent/CN110838455B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008130356A (en) * | 2006-11-21 | 2008-06-05 | Ulvac Japan Ltd | Hot plate, and board processing device |
| CN103377970A (en) * | 2012-04-27 | 2013-10-30 | 泰拉半导体株式会社 | Substrate processing apparatus |
| CN105556651A (en) * | 2013-09-10 | 2016-05-04 | 泰拉半导体株式会社 | Heat treatment device and heat treatment system comprising same |
| KR20160022719A (en) * | 2014-08-20 | 2016-03-02 | 주식회사 제우스 | Substrate heat tretment apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6826166B2 (en) | 2021-02-03 |
| CN110838455A (en) | 2020-02-25 |
| JP2020027943A (en) | 2020-02-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6949143B1 (en) | Dual substrate loadlock process equipment | |
| JP4237939B2 (en) | Vacuum processing equipment with improved substrate heating and cooling | |
| KR100445392B1 (en) | Support frame for substrates | |
| US20060169210A1 (en) | Chamber for uniform heating of large area substrates | |
| CN110838455B (en) | Heat treatment system and heat treatment device | |
| US8361549B2 (en) | Power loading substrates to reduce particle contamination | |
| CN104576445A (en) | Batch type apparatus for processing substrate | |
| KR102615293B1 (en) | Heating process system and heating process device | |
| KR101593536B1 (en) | Batch type apparatus for processing substrate | |
| CN104733353B (en) | Batch type substrate processing apparatus | |
| KR101659609B1 (en) | Chemical Reinforcement using Heater Assembly of Furnace | |
| KR20180118938A (en) | Apparatus for processing substrate | |
| US20160126096A1 (en) | Method of forming an epitaxial layer on a substrate, and apparatus and system for performing the same | |
| KR102423271B1 (en) | Heater module and apparatus for processing substrate | |
| JP7237112B2 (en) | Exhaust duct integrated heater unit for heat treatment oven | |
| KR101258621B1 (en) | In-line type heat treatment apparatus | |
| KR20150122885A (en) | Heat treatment apparatus for substrate | |
| KR101390510B1 (en) | Heating Structure for Heat Treatment Chamber of Substrates and Heat Treatment Chamber of Substrates Having the Same | |
| KR102243269B1 (en) | Heating process system | |
| KR101334191B1 (en) | Apparatus for processing substrate | |
| CN208173558U (en) | Substrate supporter and substrate board treatment | |
| KR20120022310A (en) | Substrate processing apparatus | |
| KR20240068364A (en) | Substrate processing apparatus | |
| KR20240018878A (en) | Atomic layer deposition apparatus | |
| KR101243949B1 (en) | In-line type heat treatment apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |