CN110838455A - Heat treatment system and heat treatment apparatus - Google Patents
Heat treatment system and heat treatment apparatus Download PDFInfo
- Publication number
- CN110838455A CN110838455A CN201910748025.2A CN201910748025A CN110838455A CN 110838455 A CN110838455 A CN 110838455A CN 201910748025 A CN201910748025 A CN 201910748025A CN 110838455 A CN110838455 A CN 110838455A
- Authority
- CN
- China
- Prior art keywords
- heat treatment
- heater
- heaters
- main body
- disposed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010438 heat treatment Methods 0.000 title claims abstract description 185
- 238000003780 insertion Methods 0.000 claims description 54
- 230000037431 insertion Effects 0.000 claims description 54
- 239000000758 substrate Substances 0.000 claims description 29
- 238000012545 processing Methods 0.000 claims description 25
- 238000012546 transfer Methods 0.000 claims description 6
- 238000004904 shortening Methods 0.000 abstract description 3
- 238000012423 maintenance Methods 0.000 description 30
- 238000000034 method Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 6
- 230000008439 repair process Effects 0.000 description 4
- 125000006850 spacer group Chemical group 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 3
- 238000000137 annealing Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Furnace Details (AREA)
- Furnace Charging Or Discharging (AREA)
Abstract
The invention discloses a heat treatment system and a heat treatment device. The heat treatment system and the heat treatment device of the invention can shorten the interval between the heat treatment devices by shortening the length of the heater, thereby improving the space utilization rate and the productivity.
Description
Technical Field
The present invention relates to a heat treatment system and a heat treatment apparatus. More particularly, to a heat treatment system and a heat treatment apparatus capable of improving space efficiency and productivity by shortening the length of a heater to shorten the interval between heat treatment apparatuses.
Background
An annealing (annealing) device is a device responsible for necessary heat treatment steps to perform processes of crystallization, phase transition, etc. on a fixed thin film deposited on a substrate such as a silicon wafer or glass.
Fig. 1 is a perspective view showing a conventional batch heat treatment apparatus. FIG. 2 is a prior art thermal processing system; fig. 2 (a) shows the arrangement shape of the heaters 20 and 30 in the heat treatment apparatus 1; fig. 2(b) shows a system for heat treatment.
Referring to fig. 1, a conventional batch heat treatment apparatus 1 includes: a main body 10 having a heat treatment space 15, a door 11 for opening and closing an entrance of the main body 10; a main heater 20 and an auxiliary heater 30. A plurality of substrates may be disposed in the heat processing space 15. A plurality of substrates are spaced apart by a predetermined distance, respectively, and supported by a substrate holder (not shown) or mounted on a boat (not shown) to be placed in the heat treatment space 15.
The main heater 20 is a conventional rod-shaped heater having a long delay, and both ends of the main heater 20 are connected to connectors, so that the heater 20 can be installed and fixed on the wall surface of the main body 10 while the power is cut off. The auxiliary heater 30 has the same structure as the main heater 20. In consideration of heat released from the heat treatment apparatus 1 to the outside, the auxiliary heater 30 is disposed in a direction perpendicular to the forming direction of the main heater 20 to be parallel to both side surfaces of the main body 10, and further uniformly applies heat to all regions of the heat treatment space 1.
Referring to (a) of fig. 2, the main heater 10 mainly performs heating on the zone Z2 occupying the substrate 5, and the sub-heater 39 performs heating on the outside of the substrate 5, i.e., the corner portion of the heat treatment space 15 as the zone Z1Z3 not occupying the substrate 5. In order to prevent heat loss to the outside, the auxiliary heater 30 is disposed perpendicular to the main heater 20 so that the heating temperature in the Z1 and Z3 regions is higher than that in the Z2 region.
However, the conventional batch heat processing apparatus 1 has a problem that the volume becomes unnecessarily large. Referring to fig. 2(b), in the heat treatment system S ' configured with two heat treatment apparatuses 1, for example, a transfer robot TR that moves along the transport path TP and loads/unloads the substrates 5 is rotatably provided in the front or rear spaces M3', M4', M7', M8' of the main body (10: 10a, 10 b). In the heat treatment system S ', the main heater 20 is disposed at the main body (10: 10a, 10b), and at least left side spaces M1', M2', M5', M6' of the main body (10: 10a, 10b) are required for securing the paths P1', P2', P5', P6' for maintenance/management. Then, the auxiliary heater 30 is provided at the main body 10, and in order to secure the paths P3', P4', P7', P8' for maintenance/management, at least the front and rear side spaces M3', M4', M7', M8' of the main body (10: 10a, 10b) are required. That is, the interval between the adjacent bodies 10a10b has to depend on the length of the main heater 20.
The lateral/vertical lengths or widths of the left and right side spaces M1', M2', M5', M6' and the front and rear side spaces M3', M4', M7', M8' of the body 10 depend on the width L1 (or one-side length L1) of the body 10 and the lengths (corresponding to L1) of the main heater 20/the auxiliary heater 30. Since the main body 10 is a space where substrate processing is performed, it is difficult to adjust the width L1. The main heater 20/the supplementary heater 30 also have a stick shape and are installed on the wall surface of the body 10, so that it is difficult to adjust the length. As such, it is difficult to adjust the size of the outside spaces M1', M2', M3', M4', M5', M6', M7', M8' around all the faces of the main body 10, but on the contrary, the space occupied by the spaces in the heat treatment system is very large, and therefore there is a problem that the overall size of the apparatus for maintenance/management becomes unnecessarily large and the productivity per unit area is reduced.
On the other hand, the conventional batch heat processing apparatus 1 has a problem that the number of heaters 20 and 30 is large depending on the number of substrates, and the time required for manufacturing the apparatus increases in the process of connecting the connectors 26 to both ends of each of the heaters 20 and 30. In addition, there is a problem that maintenance/management time is increased in the process of detaching the connector 26 when the heaters 20 and 30 are repaired or replaced. Such a delay in repair and replacement time may cause a large number of process failures if a portion of the heaters 20, 30 malfunctions during the heat treatment process.
Disclosure of Invention
(problem to be solved)
The present invention has been made to solve the above-described problems of the prior art, and an object of the present invention is to provide a heat treatment system and a heat treatment apparatus that can significantly reduce a space for installing a heater in a main body and a space for maintenance and management, and can improve space utilization.
In addition, the present invention aims to provide a heat treatment system and a heat treatment apparatus which can improve productivity per unit area by improving space utilization.
Another object of the present invention is to provide a heat treatment system and a heat treatment apparatus, including: when the installation, maintenance, replacement, etc. of the heater are carried out, the manufacturing time and the maintenance time are greatly shortened, and the number of operation processes can be further reduced.
(means for solving the problems)
The above object of the present invention can be achieved by a heat treatment system for heat-treating a substrate, comprising: a plurality of heat treatment apparatuses including a body providing a heat treatment space for a substrate and a plurality of heaters disposed inside the body and having a length smaller than a width of the body; the interval between the adjacent heat treatment devices is the same or greater than the length of the heater included in the heat treatment device and less than the width of the heat treatment device.
In addition, according to an embodiment of the present invention, the heat treatment apparatus further includes a transfer robot that loads/unloads the substrate on/from the heat treatment apparatus; the transfer robot moves along a conveying path formed at least on one side of the heat treatment apparatus, and is rotatably provided.
Further, according to an embodiment of the present invention, the body includes a plurality of insertion ports into which the heater is inserted at least at both side surfaces facing each other; the portions of the pair of heaters disposed at the plurality of insertion ports, which are disposed in the heat treatment space, have the same length as each other, and the sum of the portions disposed in the heat treatment space may be the same or less than the width of the main body.
Further, according to an embodiment of the present invention, the body includes a plurality of insertion ports into which the heater is inserted at least at both side surfaces facing each other; 1/2 wherein a part of at least one of the heaters disposed in the heat treatment space has a length smaller than the width of the main body and 1/2 wherein a part of the other of the heaters disposed in the heat treatment space has a length larger than the width of the main body; the sum of the portions of the heater disposed in the heat treatment space may be the same or less than the width of the body.
Further, according to an embodiment of the present invention, the heater is cantilevered, one end portion is unsupported in the heat treatment space, and the other end portion or at least a part of the outer periphery is supported by a supporting tool.
In addition, according to an embodiment of the present invention, the supporting means is one or a combination of a plurality of the following (1) to (3): (1) a sidewall of the body; (2) a supporting shell which is arranged outside the side wall of the main body and at least a part of which is inserted into the insertion opening; (3) is disposed inside the sidewall of the main body and supports the lower portion of the heater part in the heat treatment space.
In addition, according to an embodiment of the present invention, an entrance for opening and closing a door is formed in a front surface of the main body; a plurality of insertion openings are formed at both sides of the inlet and outlet; a plurality of heaters respectively inserted into the insertion ports may be included.
The above object of the present invention is achieved by a heat treatment apparatus for heat-treating a substrate, comprising: a main body providing a thermal processing space to the substrate; a plurality of heaters inserted into a plurality of insertion ports formed at least on both side surfaces of the main body facing each other; wherein a pair of heaters facing each other among the plurality of heaters are inserted in opposite directions to each other into cantilevers provided at a plurality of insertion ports facing each other, one end portion is located in the heat treatment space without support, and the other end portion or at least a part of the outer circumference is supported by a supporting tool.
In addition, according to an embodiment of the present invention, the heater may have a length smaller than a width of the body.
In addition, according to an embodiment of the present invention, portions of the pair of heaters disposed at the plurality of insertion ports, which are disposed in the heat treatment space, have the same length as each other, and the sum of the portions disposed in the heat treatment may be the same or smaller than the width of the main body.
In addition, according to an embodiment of the present invention, in the pair of heaters provided in the plurality of insertion ports, a length of a portion of any one of the heaters disposed in the heat treatment space is less than 1/2 of the width of the main body, and a length of a portion of the other each heater disposed in the heat treatment space is greater than 1/2 of the width of the main body, and a sum total of the portions of the heaters disposed in the heat treatment space may be the same or less than the width of the main body.
In addition, according to an embodiment of the present invention, the supporting means may be one or a combination of a plurality of the following (1) to (3): (1) a sidewall of the body; (2) a supporting shell which is arranged outside the side wall of the main body and at least a part of which is inserted into the insertion opening; (3) is disposed inside the sidewall of the main body and supports the lower portion of the heater part in the heat treatment space.
In addition, according to an embodiment of the present invention, an entrance for opening and closing a door is formed in a front surface of the main body; a plurality of insertion openings are formed at both sides of the inlet and outlet; a plurality of heaters respectively inserted into the insertion ports may be included.
(Effect of the invention)
According to the present invention having the above-described configuration, a space for installing the heater in the main body and a space for maintenance are significantly reduced, and the space utilization rate can be improved.
In addition, according to the present invention, productivity per unit area can be improved by increasing space utilization.
In addition, according to the present invention, the following effects are obtained: when the heater is arranged, maintained, replaced, etc., the manufacturing time and the maintenance time are greatly shortened, and the number of operation processes is reduced.
Drawings
Fig. 1 is a perspective view showing a conventional batch heat treatment apparatus.
FIG. 2 (a) is a schematic plan view showing the arrangement of heaters in a heat treatment apparatus; fig. 2(b) is a schematic plan view showing a space required for manufacturing, maintenance, and repair of the heat treatment system.
Fig. 3 is a perspective view showing a heat treatment apparatus according to an embodiment of the present invention.
Fig. 4 is a schematic side view showing a portion B-B' of fig. 3, and is a view showing a shape in which a heater is provided in a heat treatment apparatus.
Fig. 5 is a schematic plan view showing the arrangement shape of heaters in the heat processing apparatus according to the embodiment of the present invention.
Fig. 6 is a schematic plan view showing a space required for manufacturing, maintenance, and repair of the heat treatment system according to the embodiment of the present invention.
Fig. 7 is a schematic diagram showing the arrangement shape of the heater according to various embodiments of the present invention.
Fig. 8 to 9 are schematic side sectional views showing a support shape of a heater according to various embodiments of the present invention.
(description of reference numerals)
100: heat treatment apparatus
105: heat treatment space
110: main body
111: insertion opening
130: door with a door panel
200. 200a to 200 f: heating device
201: one end part of the heater
205: the other end of the heater
210: main heater
220: auxiliary heater
C: center part
D: the distance between the heat treatment devices
L1: length of one side of heat treatment device
L2, L3: length of heater
M1-M8: maintenance space of heat treatment system
S: heat treatment system
P1-P8: main maintenance (maintence) path for thermal processing system
Z1-Z3: heating zone
Detailed Description
For a detailed description of the invention to be described later, reference is made to the accompanying drawings that show, by way of illustration, specific embodiments in which the invention may be practiced. These embodiments will be described in detail so that those skilled in the art can fully practice the invention. It is to be understood that the various embodiments of the invention, although different, are not necessarily mutually exclusive. For example, the particular shapes, structures and characteristics described herein are related to one embodiment and may be implemented by other embodiments without departing from the spirit and scope of the present invention. In addition, the position or arrangement of the individual constituent elements in the respectively disclosed embodiments should be understood as being changeable without departing from the spirit and scope of the present invention. The following detailed description is, therefore, not to be taken in a limiting sense, and the scope of the present invention is defined only by the appended claims, along with the full scope of equivalents to which such claims are entitled, if appropriately interpreted. In the drawings, the same reference numerals refer to the same or similar functions in several respects, and lengths, areas, thicknesses, and the like may be exaggerated for convenience.
Hereinafter, a heat treatment apparatus and a heat treatment system according to an embodiment of the present invention will be described in detail with reference to the drawings.
Fig. 3 is a perspective view showing a heat treatment apparatus according to an embodiment of the present invention; fig. 4 is a schematic side view showing a portion B-B' of fig. 3, and is a view showing a shape in which a heater is provided in a heat treatment apparatus.
Referring to fig. 3, the heat treatment apparatus 100 of the present invention includes: a body 110 including a heat treatment space 105; a door 130 for opening and closing the entrance 106 of the main body 110, and a plurality of heaters 200.
The heat treatment apparatus 100 is formed substantially in a rectangular hexahedral shape, and includes a main body 110 constituting an external appearance; a space for processing the substrate 5 may be formed inside the body 110. I.e. the heat treatment space 105. The body 110 may be formed in not only a rectangular hexahedral shape but also various shapes according to the shape of the substrate 5, and the heat treatment space 105 may be configured of a sealed space.
One or more substrates 5 may be disposed within the thermal processing volume 105. The plurality of substrates 5 are disposed at predetermined intervals, respectively, and supported by a substrate holder (not shown) or mounted on a boat (not shown), and may be disposed in the heat treatment space 105.
The body 110 may be formed with an insertion hole 111 penetrating the wall of the body 110 to slidably insert the heater 200. The insertion port 111 may be formed at least at both side surfaces of the main body 110 facing each other. For example, left and right sides; but also may be formed at the front, rear, left side, right side, etc. of the body 110. Preferably, a plurality of insertion ports 111 are formed to correspond to the number of heaters 200. An insertion opening 111 is formed in a wall of the main body 110, and a reinforcement tool (not shown) may be further provided for reinforcing the periphery of the insertion opening 111.
Referring to fig. 4, the heater 200 is slidably inserted into the insertion port 111 from the outside of the body 110, and a portion of the heater 200 is positioned in the heat treatment space 105, thereby supplying heat to the heat treatment space 105. To enable the heater 200 to slide, the inner diameter of the insertion port 111 is preferably the same as the outer diameter of the heater 200, or at least larger than the outer diameter of the heater 200.
The heater 200 includes a main heater 210 and a sub-heater 220. The heater 200 is elongated in a rod shape as a whole, and may be formed in a shape in which one end portion 201 is closed and input/output terminals are all formed at the other end portion 205. Accordingly, the heater 200 can be installed on the body 110 by being slidably inserted from the outside to the inside of the body 110.
The plurality of main heaters 210 may be disposed, and the plurality of main heaters 210 are spaced apart by a predetermined distance in a direction perpendicular to a direction in which the substrate 5 is loaded through the inlet and outlet 106 in front of the main body 110. The pair of main heaters 210 slidably inserted in opposite directions to each other in the sides (left side, right side) of the body 110 facing each other may be configured in a shape facing each other, and the pair of main heaters 210 of such a facing shape may be provided in plurality and spaced apart by a predetermined distance.
The auxiliary heater 220 may have the same structure as the main heater 210. However, in consideration of heat release from the heat treatment apparatus 100 to the outside, the auxiliary heater 220 may be further configured to uniformly apply heat to all regions of the heat treatment space 105. The auxiliary heater 220 is disposed in a direction perpendicular to the forming direction of the main heater 210 and in parallel to both side surfaces of the main body 220. That is, the auxiliary heaters 220 are disposed on both sides of the front doorway 106 and are disposed behind the heat treatment apparatus 100 at positions corresponding thereto.
The heater 200 acts as a cantilever (cantilever), with one end 201 unsupported in the heat treatment space 105 and the other end 205 or at least a portion of the outer periphery can be supported by a support tool. As shown in fig. 4 or fig. 7(a), the other end 205 of the heater 200 is supported by the supporting tool, and as shown in fig. 7(b), a part of the outer circumference may be supported by the supporting tool (e.g., the side wall of the heat treatment apparatus 100) instead of supporting the other end 205.
The support tool is as follows: (1) sidewalls of the thermal processing apparatus 100; (2) a support case 410 (see fig. 8 and 9) provided outside the side wall of the heat treatment apparatus 100 and at least partially inserted into the insertion port 111; (3) a protruding support 460 [ refer to, fig. 9 (b) ] provided inside the sidewall of the heat treatment apparatus 100 and supporting a lower portion of the heater 100 portion in the heat treatment space 105, and the like.
The length L2, L3 of at least one of the pair of heaters 200-1, 200-2 provided in a state of being inserted into the insertion port 111 may be the same as or smaller than 1/2 of the width L1 of the heat treatment apparatus 100 (or the main body 110). Referring back to fig. 4, the left heater 200-1 of the pair of heaters 200-1, 200-2 facing each other may have a length L2 of 1/2 that is the same as or less than the width L1 of the body 110. Alternatively, the right heater 200-2 of the pair of heaters 200-1, 200-2 may have a length L3 that is the same as or less than 1/2 of the width L1 of the body 110. [ REFERENCE, FIG. 7(a) ]. In another aspect, the heaters 200-1, 200-2 may include not only a length inserted into the heat treatment apparatus 100 but also a length extending to an outer side of an outer sidewall of the heat treatment apparatus 100, and in this case, the pair of heaters 200-1, 200-2 may be formed such that portions disposed in the heat treatment space 105 have mutually the same lengths L4, L5. In this case, the sum of the portions disposed in the heat treatment space 105 (the sum of L4, L5) may be the same or less than the width L1 of the heat treatment apparatus 100.
Alternatively, at least one of the pair of heaters 200-1, 200-2 facing each other may have the same length or less than 1/2 of the width L1 of the heat treatment apparatus 100, and the other may have the same length or more than 1/2 of the width L1 of the heat treatment apparatus 100 [ refer to fig. 7(b), (c) ]. In another aspect, the pair of heaters 200-1, 200-2 may be formed such that the portions disposed in the heat treatment space 105 have lengths L4, L5 different from each other. In this case, the length L4 of the portion disposed in the heat treatment space 105 of one heater 200-1 may be less than 1/2 of the width L1 of the heat treatment apparatus 100, and the length L5 of the portion disposed in the heat treatment space 105 of the other heater 200-2 may be greater than 1/2 of the width L1 of the heat treatment apparatus 100.
The right one end portion 201 of the heater 200-1 is disposed in the heat treatment space 105, and the left other end portion 205 may be supported by the left side wall (the peripheral side wall of the insertion port 111) of the heat treatment apparatus 100. Then, the left one end portion 201 of the heater 200-2 is disposed in the heat treatment space 105, and the right other end portion 205 may be supported by the right side wall (the peripheral side wall of the insertion port 111) of the heat treatment apparatus 100.
In another aspect, in the pair of heaters 200-1 and 200-2 facing each other, the length of one of the heaters 200-1 and 200-2 disposed in the heat treatment space 105 may be the same as or less than 1/2 of the width L1 of the heat treatment apparatus 100.
Fig. 5 is a schematic plan view showing the arrangement shape of the heater 200 in the heat processing apparatus 100 according to the embodiment of the present invention. Fig. 6 is a schematic plan view showing a space required for manufacturing, maintenance, and repair of the heat treatment system S according to the embodiment of the present invention.
Referring to fig. 5, a plurality of heaters (200:210, 220) are inserted into the body 110, and may heat the heat treatment space 105. At this time, the heat treatment space 105 may be divided into a region Z2 occupied by the substrate 5 and regions Z1, Z3 not occupied by the substrate 5.
Referring to fig. 6, the heat treatment system S may include a peripheral space for maintaining/managing a plurality of heat treatment apparatuses 100 and the heat treatment apparatuses 100. For convenience of illustration, the heat treatment system S is illustrated as including two heat treatment apparatuses 100.
The thermal processing apparatus 100 may be disposed at a distance d. The spacing distance d may correspond to a minimum length for replacing/detaching the heaters (200:210, 220) provided at the heat treatment apparatus 100, a minimum length for providing the heaters 200 at the main bodies 110a, 110b of the heat treatment apparatus 100. In addition, the spacing distance d is formed to be about the size corresponding to the width L1 of the heat treatment apparatus 100 in the related art, whereby there arises a problem that the system S' is unnecessarily large [ refer to (b) of fig. 2 ], and thus the spacing distance d should be smaller than the width L1 of the heat treatment apparatus 100. In view of this, in the heat treatment system S of the present invention, the spaced distance d of the adjacent pair of heat treatment apparatuses 100 is the same or greater than the lengths L2, L3 of the heaters 200 included in the heat treatment apparatuses 100 and less than the width L1 of the heat treatment apparatuses 100.
In order to dispose the main heaters 210 at the bodies 110a, 110b and secure the paths P1, P2, P5, P6 for maintenance/management, at least left and right side spaces M1, M2, M5, M6 of the bodies 110a, 110b are required. Then, in order to dispose the auxiliary heater 220 at the main bodies 110a, 110b and secure the paths P3, P4, P7, P8 for maintenance/management, at least the front and rear side spaces M3, M4, M7, M8 of the main bodies 110a, 110b are required. The paths P1-P4, 5-P8 may correspond to the lengths L2, L3 of the heater 200. A transfer robot TR is rotatably provided at the front or rear spaces M3, M4, M7, M8 of the heat treatment apparatus 100, is movable along the transport path TP, and loads/unloads the substrates 5 on/from the heat treatment apparatus 100.
Referring to fig. 2(b), in the conventional batch heat treatment apparatus 1, the length of the main heater 20/the sub-heater 30 is substantially the same as the side length L1 of the heat treatment apparatus 1, and thus the width of one maintenance space corresponds to L1XL1, and the sum of the four maintenance spaces M1', M2', M3', M4', M5', M6', M7', and M8' corresponds to 4XL1XL 1. In addition, the minimum area that the heat treatment system S' should secure corresponds to 5L1 (horizontal) X3L1 (vertical) 15L 12.
Unlike the conventional batch heat treatment apparatus 1 shown in fig. 1 and 2, the heat treatment apparatus 100 of the present invention has a structure in which the lengths L2 and L3 of the heaters 200 are shortened. Accordingly, the width of one maintenance space in the present invention is equivalent to L1XL2 or L1XL 3; and the sum of the four maintenance spaces M1, M2, M3, M4, M5, M6, M7, M8 may be as follows: (1)4XL1XL2 or 4XL1XL3 (in the case of 0.5L1> L2 ═ L3); (2) (2XL1XL2) + (2XL1XL3) (in the case of L2 ≠ L3, 0.5L1> L2, or 0.5L1> L3). Since 0.5L1> L2 and/or 0.5L1> L3, the total area of the maintenance spaces M1 to M4 and M5 to M8 of the present invention may be 50% or less of the total area of the maintenance spaces M1 'to M4' and M5 'to M6' of the conventional batch heat processing apparatus 1, even in either of the above-described cases (1) and (2). The area of the heat treatment system S is defined by the areas of the maintenance spaces M1 to M4, M5 to M8, and the heat treatment apparatus 100, and the minimum area that the heat treatment system S should ensure is 3.5L1 (horizontal direction) X2L1 (vertical direction) 7L 12. In this case, it was confirmed that the area of the heat treatment system S of the present invention was significantly reduced to about 46% as compared with the area of the conventional heat treatment system S'.
As described above, the heat treatment system S of the present invention can greatly reduce the maintenance space and the occupied area of the heat treatment system S by shortening the length of the heater 200. Therefore, the method has the following advantages: the space utilization rate can be remarkably improved, and the productivity per unit area can be improved by improving the space utilization rate.
In addition, the present invention can complete the disposition of the heater 200 only by inserting the heater 200 in a sliding manner through the insertion hole 111 formed on one side surface of the body 110. The user can perform maintenance such as maintenance and replacement of the heater 200 by sliding the heater 200 out only through the maintenance paths P1 to P4 and P5 to P8 that are close to the spaces M1 to M4 and M5 to M8 on one side of the main body 110. In this way, the heat treatment apparatus 100 can be manufactured by slidably inserting the heater 200 only into the insertion port 111 on the side of the main body 110, and the heat treatment system can be maintained by inserting and removing the heater 200 only, thereby reducing the number of processes.
Fig. 7 is a schematic diagram showing the arrangement shape of the heater according to various embodiments of the present invention. In fig. 7, the auxiliary heaters 220 are all arranged in the same shape, and therefore, the auxiliary heaters 220 are omitted and only the main heater 210 is shown.
Referring to fig. 7(a), a pair of main heaters 210 facing each other have the same length and can be slidably inserted into the heat treatment space 105 by the same length. At this time, the pair of main heaters 210 facing each other may generate a space partially spaced from the middle portion, and the center portion (C) as the spaced portion needs thermal compensation. Of course, the heat of the central portion (C) may not be compensated by controlling the amount of heat generated by the heater 210, the size of the heat treatment space 105, and the like.
Referring to fig. 7(b), the pair of main heaters 210 may be slidably inserted with a shift in order to compensate for heat in the center portion (C). The pair of main heaters 210 facing each other have the same length and can be arranged in the heat treatment space 105 at different lengths from each other. Accordingly, one heater 210 insertion length corresponds to a length of 1/2 greater than the side length L1 of the heat treatment apparatus 100, and the remaining one heater 210 insertion length may correspond to a length of 1/2 less than the side length L1 of the heat treatment apparatus 100.
Referring to fig. 7 (C), the pair of main heaters 210 may be slidably inserted in a shifted manner to compensate for heat in the center portion C. At this time, the pair of main heaters 210 facing each other have different lengths, and can be arranged in the heat treatment space 105 at different lengths from each other. Accordingly, one heater 210 may be inserted by a length corresponding to 1/2 greater than the side length L1 of the heat treatment apparatus 100, and the remaining one heater 210 may be inserted by a length less than 1/2 of the side length L1 of the heat treatment apparatus 100.
Fig. 8 to 9 are schematic side sectional views showing a support shape of the heater 200 of various embodiments of the present invention.
As described above, the one end portion 201 of the heater 200 is disposed in the heat treatment space 105, and the other end portion 205 is disposed outside the wall (main body wall) of the heat treatment apparatus 100. Then, at least a part of the outer circumference of the heater 200 may be supported by the wall (body wall) of the heat treatment apparatus 100. That is, the heater 200 may support the heater 200 through the insertion port 111 of the wall of the main body 110 as a cantilever. In this case, since the heater 200 may have a rod shape with an extended length, if the heater 200 is not firmly supported by the other end 205, the one end 201 may be lowered. Accordingly, the supporting tools (400:400a to 400d) of fig. 8 (a) to 9 (b) are required.
Referring to fig. 8 (a) to 9 (b), a support insertion part 112 may be formed at an outer sidewall of the insertion port 111, and the support insertion part 112 is formed in a stepped shape. Accordingly, the inner diameter of the support insertion part 112 may be larger than the inner diameter of the insertion port 111.
Then, the support housing 410 may be inserted at the support insertion part 112. The first support housing 411 is entirely inserted into the support insertion part 112, and the second support housing 415 fastened to the first support housing 411 protrudes to the outside of the wall of the main body 110. A through hole is formed in the center portion of the support case 410, into which the heater 200 can be inserted, wherein the through hole has the same size as the insertion port 111. The spacer 420 is also inserted into the support insertion part 112, and the degree of insertion of the support case 410 into the support insertion part 112 can be adjusted.
Referring also to fig. 8 (a), a horizontal bolt 430 may be embedded on an outer side surface of the support housing 410 (or the second support housing 415). The horizontal bolt 430 may be fitted into the fastening hole 416 formed on the outer circumferential surface of the support case 410 (or the second support case 415), and thus the heater 200 may be firmly fixed. In particular, if the heater 200 is fixed to the upper portion of the horizontal bolt 430, the one end portion 201 of the heater 200 can be further reinforced so as not to be lowered by its own weight.
Referring also to fig. 8 (b), the support nut 440 may surround and support at least a portion of the outer circumferential surface of the support housing 410 (or the second support housing 415) and a portion of the other end 205 of the heater 200. The support housing 410 (or the second support housing 415) is surrounded by a first inner circumferential surface 441 forming a step at an inner circumferential surface of the support nut 440, and the heater 200 may be surrounded by a second inner circumferential surface 445. Accordingly, the support nut 440 may support the outer circumferential surface of the heater 200, which is longer, while further extending the length of the support case 410, and thus may firmly fix the other end 205 of the heater 200.
Referring also to fig. 9 (a), embedding the wedge-shaped spacer 450 in the space between the support case 410 and the heater 200 may clamp and support a portion of the other end 205 of the heater 200. One end of the wedge-shaped spacer 450 includes an inclined surface, so that the heater 200 can be firmly fixed the more the wedge-shaped spacer 450 is inserted into the space between the support case 410 and the heater 200.
Referring also to (b) of fig. 9, a protruding support 460 may be formed inside the wall of the main body 110 of the heat treatment apparatus 100. The protruding support 460 may support a portion of the lower portion of the heater 200 in the heat treatment space 105. Thereby, the same effect as the length of the support case 410 extending to the inside of the heat treatment space 105 may occur. A horizontal bolt 465 may be inserted into the protruding support 460. The horizontal bolt 465 pushing up the heater 200 from below can further reinforce the one end portion 201 of the heater 200 from falling down by its own weight.
As described above, the present invention has an effect that the heater 200 is installed in the main body 110, and the space for maintenance/management is greatly reduced, thereby improving the space utilization. In addition, according to the present invention, there is an effect of improving productivity per unit area by improving space utilization.
In addition, the present invention performs installation, maintenance, replacement, etc. of the heater 200 on one surface of the body 110, which has the effects of greatly reducing the manufacturing time and the number of working processes due to the maintenance time.
The present invention shows and describes the preferred embodiments described above, but is not limited to the above-described embodiments, and various modifications and changes can be made by those having ordinary knowledge in the art to which the present invention pertains within a scope not departing from the gist of the present invention. Such variations and modifications are to be considered as included within the scope of the invention and the appended claims.
Claims (13)
1. A heat treatment system for heat-treating a substrate, comprising:
a plurality of heat treatment apparatuses including a body providing a heat treatment space for a substrate and a plurality of heaters disposed inside the body and having a length smaller than a width of the body;
the interval between the adjacent heat treatment devices is the same or greater than the length of the heater included in the heat treatment device and less than the width of the heat treatment device.
2. The thermal processing system of claim 1, further comprising:
a transfer robot for loading/unloading the substrate in the heat treatment apparatus;
the transfer robot moves along a conveying path formed at least on one side of the heat treatment apparatus, and is rotatably provided.
3. The thermal processing system of claim 1,
the body includes a plurality of insertion ports into which the heater is inserted at least at two mutually facing side surfaces;
the portions of the pair of heaters disposed at the plurality of insertion ports, which are disposed in the heat treatment space, have the same length as each other, and the sum of the portions disposed in the heat treatment space is the same or smaller than the width of the main body.
4. The thermal processing system of claim 1,
the body includes a plurality of insertion ports into which the heaters are inserted at least at both side surfaces facing each other;
1/2 wherein a part of at least one of the heaters disposed in the heat treatment space has a length smaller than the width of the main body and 1/2 wherein a part of the other of the heaters disposed in the heat treatment space has a length larger than the width of the main body;
the sum of the portions of the heater disposed in the heat treatment space is the same or less than the width of the body.
5. The thermal processing system of claim 3 or 4,
the heater is cantilevered with one end unsupported in the heat treatment space and the other end or at least a portion of the outer periphery supported by a support tool.
6. The thermal processing system of claim 5,
the supporting tool is one or a combination of a plurality of the following (1) to (3):
(1) a sidewall of the body;
(2) a supporting shell which is arranged outside the side wall of the main body and at least a part of which is inserted into the insertion opening;
(3) is disposed inside the sidewall of the main body and supports the lower portion of the heater part in the heat treatment space.
7. The thermal processing system of claim 3 or 4,
an entrance with a door switch formed on the front of the main body;
a plurality of insertion openings are formed at both sides of the inlet and outlet;
comprises a plurality of heaters respectively inserted into the insertion openings.
8. A heat treatment apparatus for heat-treating a substrate, comprising:
a main body providing a thermal processing space to the substrate;
a plurality of heaters inserted into a plurality of insertion ports formed at least on both side surfaces of the main body facing each other;
wherein a pair of heaters facing each other among the plurality of heaters are inserted in opposite directions to each other into cantilevers provided at a plurality of insertion ports facing each other, one end portion is located in the heat treatment space without support, and the other end portion or at least a part of the outer circumference is supported by a supporting tool.
9. The thermal processing device of claim 8,
the length of the heater is less than the width of the body.
10. The thermal processing device of claim 9,
the portions of the pair of heaters disposed at the plurality of insertion ports, which are disposed in the heat treatment space, have the same length as each other, and the sum of the portions disposed in the heat treatment is the same or smaller than the width of the main body.
11. The thermal processing device of claim 9,
a pair of heaters provided in the plurality of insertion ports, a length of a portion of any one of the heaters disposed in the heat treatment space is less than 1/2 of the width of the main body, and a length of a portion of the other heater disposed in the heat treatment space is greater than 1/2 of the width of the main body,
the sum of the portions of the heater disposed in the heat treatment space is the same or less than the width of the body.
12. The thermal processing device of claim 8,
the supporting tool is one or a combination of a plurality of the following (1) to (3):
(1) a sidewall of the body;
(2) a supporting shell which is arranged outside the side wall of the main body and at least a part of which is inserted into the insertion opening;
(3) is disposed inside the sidewall of the main body and supports the lower portion of the heater part in the heat treatment space.
13. Heat treatment apparatus according to claim 10 or 11,
an entrance with a door switch formed on the front of the main body;
a plurality of insertion openings are formed at both sides of the inlet and outlet;
comprises a plurality of heaters respectively inserted into the insertion openings.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR20180095484 | 2018-08-16 | ||
| KR10-2018-0095484 | 2018-08-16 | ||
| KR1020190089529A KR102615293B1 (en) | 2018-08-16 | 2019-07-24 | Heating process system and heating process device |
| KR10-2019-0089529 | 2019-07-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN110838455A true CN110838455A (en) | 2020-02-25 |
| CN110838455B CN110838455B (en) | 2024-01-09 |
Family
ID=69573987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910748025.2A Active CN110838455B (en) | 2018-08-16 | 2019-08-14 | Heat treatment system and heat treatment device |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP6826166B2 (en) |
| CN (1) | CN110838455B (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008130356A (en) * | 2006-11-21 | 2008-06-05 | Ulvac Japan Ltd | Hot plate, and board processing device |
| CN103377970A (en) * | 2012-04-27 | 2013-10-30 | 泰拉半导体株式会社 | Substrate processing apparatus |
| KR20160022719A (en) * | 2014-08-20 | 2016-03-02 | 주식회사 제우스 | Substrate heat tretment apparatus |
| CN105556651A (en) * | 2013-09-10 | 2016-05-04 | 泰拉半导体株式会社 | Heat treatment device and heat treatment system comprising same |
-
2019
- 2019-08-07 JP JP2019145071A patent/JP6826166B2/en active Active
- 2019-08-14 CN CN201910748025.2A patent/CN110838455B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008130356A (en) * | 2006-11-21 | 2008-06-05 | Ulvac Japan Ltd | Hot plate, and board processing device |
| CN103377970A (en) * | 2012-04-27 | 2013-10-30 | 泰拉半导体株式会社 | Substrate processing apparatus |
| CN105556651A (en) * | 2013-09-10 | 2016-05-04 | 泰拉半导体株式会社 | Heat treatment device and heat treatment system comprising same |
| KR20160022719A (en) * | 2014-08-20 | 2016-03-02 | 주식회사 제우스 | Substrate heat tretment apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JP6826166B2 (en) | 2021-02-03 |
| CN110838455B (en) | 2024-01-09 |
| JP2020027943A (en) | 2020-02-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0996765B1 (en) | Substrate processing apparatus having a substrate transport with a front end extension and an internal substrate buffer | |
| US7886808B2 (en) | Heating and cooling apparatus, and vacuum processing apparatus equipped with this apparatus | |
| KR100445392B1 (en) | Support frame for substrates | |
| US7442900B2 (en) | Chamber for uniform heating of large area substrates | |
| KR20160006630A (en) | Apparatus and method for pre-baking substrate upstream of process chamber | |
| CN110838455B (en) | Heat treatment system and heat treatment device | |
| CN104576445A (en) | Batch type apparatus for processing substrate | |
| US8075952B2 (en) | Power loading substrates to reduce particle contamination | |
| KR102615293B1 (en) | Heating process system and heating process device | |
| JP7237112B2 (en) | Exhaust duct integrated heater unit for heat treatment oven | |
| KR101066979B1 (en) | Apparatus to Sputter | |
| US9589795B2 (en) | Method of forming an epitaxial layer on a substrate, and apparatus and system for performing the same | |
| KR101464662B1 (en) | Improved Boat, and Heat Treatment Chamber and Apparatus of Substrate Having the Same | |
| KR102423271B1 (en) | Heater module and apparatus for processing substrate | |
| KR101404069B1 (en) | Heat Treatment Chamber and Method of Substrate with Easy Maintenance, and Heat Treatment Apparatus of Substrate Having the Same | |
| KR20120113970A (en) | Substrate processing system and tray therefor | |
| KR101420705B1 (en) | Sealing Device and Method Between Chamber Housing and Plate Housing, and Heat Treatment Chamber and Heat Treatment Apparatus of Substrate Having the Same | |
| KR101258621B1 (en) | In-line type heat treatment apparatus | |
| KR20150122885A (en) | Heat treatment apparatus for substrate | |
| KR20120022310A (en) | Substrate processing apparatus | |
| KR101334191B1 (en) | Apparatus for processing substrate | |
| KR20240018878A (en) | Atomic layer deposition apparatus | |
| KR20240068364A (en) | Substrate processing apparatus | |
| KR101370037B1 (en) | Device and method of heating h2o gas, and heat treatment chamber and heat treatment apparatus of substrate having the same | |
| KR20110009704U (en) | Boat |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |