CN110465699A - Chamfer machining wheel and the chamfer processing method and device with chamfer machining wheel - Google Patents
Chamfer machining wheel and the chamfer processing method and device with chamfer machining wheel Download PDFInfo
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- CN110465699A CN110465699A CN201910144242.0A CN201910144242A CN110465699A CN 110465699 A CN110465699 A CN 110465699A CN 201910144242 A CN201910144242 A CN 201910144242A CN 110465699 A CN110465699 A CN 110465699A
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- rotating part
- chamfer machining
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- wheel
- rotating
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- 238000003754 machining Methods 0.000 title claims abstract description 116
- 238000003672 processing method Methods 0.000 title claims abstract description 18
- 238000009987 spinning Methods 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 239000000470 constituent Substances 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 description 21
- 102100036464 Activated RNA polymerase II transcriptional coactivator p15 Human genes 0.000 description 13
- 101000713904 Homo sapiens Activated RNA polymerase II transcriptional coactivator p15 Proteins 0.000 description 13
- 229910004444 SUB1 Inorganic materials 0.000 description 13
- 229910004438 SUB2 Inorganic materials 0.000 description 11
- 101100311330 Schizosaccharomyces pombe (strain 972 / ATCC 24843) uap56 gene Proteins 0.000 description 11
- 101150018444 sub2 gene Proteins 0.000 description 11
- 239000000203 mixture Substances 0.000 description 7
- 238000000034 method Methods 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 3
- 239000013256 coordination polymer Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000010802 sludge Substances 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23D—PLANING; SLOTTING; SHEARING; BROACHING; SAWING; FILING; SCRAPING; LIKE OPERATIONS FOR WORKING METAL BY REMOVING MATERIAL, NOT OTHERWISE PROVIDED FOR
- B23D79/00—Methods, machines, or devices not covered elsewhere, for working metal by removal of material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/10—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces
- B24B47/12—Drives or gearings; Equipment therefor for rotating or reciprocating working-spindles carrying grinding wheels or workpieces by mechanical gearing or electric power
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D99/00—Subject matter not provided for in other groups of this subclass
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
Abstract
The present invention in order to manufacture can be prevented during chamfer machining the chamfer machining being damaged take turns and with the chamfer machining take turns chamfer processing method and device, a kind of chamfer machining wheel with following constituent element and the chamfer processing method and device with chamfer machining wheel: the first rotating part are provided, the first radius with spinning central axis to lateral surface, the side of Pivot axle is known as top, when the other side of Pivot axle is known as lower part, face has the first main line vertically extended on the outside；Second rotating part, the second radius with spinning central axis to lateral surface, the second radius is greater than the first radius, and is located at the upper and lower part of the first rotating part；Third rotating part, connects the second rotating part and the first rotating part between the second rotating part and the first rotating part, and the radius of spinning central axis to lateral surface becomes larger with the part adjacent with the second rotating part is tended to from the part adjacent with the first rotating part.
Description
Technical field
The embodiment of the present invention is related to a kind of chamfer machining wheel and the chamfer processing method and device with chamfer machining wheel,
More particularly to it is a kind of can in chamfer machining atraumatic chamfering chamfer machining wheel and taken turns with the chamfer machining
Processing unit (plant).
Background technique
In general, there is display device display unit to be formed in the construction on substrate.Certainly, display unit is covered sometimes as needed
Upper substrate can be bonded on substrate.In order to make the corner of the substrate of such display device not have sharp form, In
It can be by the process of the corner of processing substrate in the manufacturing process of display device.
Summary of the invention
However, for previous for for processing the wheel of corner, have cannot be accurate according to being intended to by the corner of substrate
The problem of processing.
The present invention is proposed to solve to include the problems of the above problem, and its purpose is to provide one kind can
Atraumatic chamfer machining is used the chamfer processing method and device taken turns, with chamfer machining wheel and is utilized and is somebody's turn to do in chamfer machining
The manufacturing method of the display device of chamfer machining wheel.But such project is exemplary only, the scope of the present invention is not
It is limited to this.
A viewpoint according to the present invention provides a kind of chamfer machining wheel, comprising: the first rotating part has in spinning
The side of the Pivot axle is known as top, the other side of the Pivot axle to the first radius of lateral surface by mandrel
Referred to as lower part when, face has the first main line for vertically extending on the outside；Second rotating part is located at first rotation
The upper and lower part in portion, has the second radius from the Pivot axle to lateral surface, and second radius is greater than described the
Radius；Third rotating part connects second rotating part between second rotating part and first rotating part
With first rotating part, radius from the Pivot axle to lateral surface is with from the portion adjacent with first rotating part
Point tend to the adjacent part of the second rotating part and become larger.
Second rotating part superposed in second rotating part is known as the second top rotating part, positioned at the of lower part
When two rotating parts are known as the second lower part rotating part, the end in the second top rotating part direction of first main line and the is connected
The straight line of the end in the second lower part rotating part direction of one main line can be not parallel to the Pivot axle.
First main line can rotate at least 1 along the lateral surface of the first rotating part centered on Pivot axle
Week.
Second rotating part superposed in second rotating part is known as the second top rotating part, positioned at the of lower part
Two rotating parts are known as the second lower part rotating part, the third adjacent with second top rotating part rotation in the third rotating part
Portion is known as third top rotating part, and the third rotating part adjacent with second lower part rotating part is known as third lower part rotating part
When, the end in the third lower part rotating part direction of first main line can be located at first rotating part and described the
The boundary of three lower part rotating parts.
Third rotating part adjacent with second top rotating part in the third rotating part is known as the rotation of third top
Transfer part, when the third rotating part adjacent with second lower part rotating part is known as third lower part rotating part, the third top rotation
At least one of transfer part and third lower part rotating part can have the additional trenches vertically extended in face on the outside.
At this point, the additional trenches can be connected with first main line.
In addition, first rotating part, second rotating part and the third rotating part can be formed as one.
Second rotating part superposed in second rotating part is known as the second top rotating part, positioned at the of lower part
When two rotating parts are known as the second lower part rotating part, the chamfer machining wheel can also include the second additional rotating part, be located at institute
The top for stating the second top rotating part, the radius from the Pivot axle to lateral surface are identical as second radius；First
Additional rotating part, between the described second additional rotating part and second top rotating part, and from the Pivot axle
Radius to lateral surface is identical as first radius, and lateral surface has the second main line vertically extended；Third is attached
It puts english transfer part, between the described second additional rotating part and the first additional rotating part and the rotating part of second top
Between the described first additional rotating part, the described second additional rotating part and second top rotating part are connected to described
First additional rotating part, and the radius from the Pivot axle to lateral surface with from the described first additional rotating part phase
Adjacent part tends to the part adjacent with the described second additional rotating part or from the portion adjacent with the described first additional rotating part
Divide and tends to the adjacent part of second top rotating part and become larger.
Another viewpoint according to the present invention, provides a kind of chamfer processing method and device, comprising: appointing in aforementioned chamfer machining wheel
Meaning one；Motor can rotate the chamfer machining wheel；Position adjustment section, can make chamfer machining wheel relative to
Chamfering object moves along the vertical direction, or moves in the plane perpendicular to the up and down direction.
First rotating part, second rotating part and the third rotating part can be formed as one.
Other aspects, feature, advantage than that described above can be from the particular content below for carrying out an invention, right
Claim and attached drawing become clear.
Detailed description of the invention
Fig. 1 is the perspective view for roughly showing the chamfer machining wheel of an embodiment according to the present invention.
Fig. 2 and Fig. 3 is the concept map for roughly showing the chamfer machining wheel processing chamfering using Fig. 1.
Fig. 4 is roughly to show the side view taken turns according to the chamfer machining of comparative example.
Fig. 5 is the perspective view for roughly showing chamfer machining wheel according to another embodiment of the present invention.
Fig. 6 is the perspective view for roughly showing chamfer machining wheel according to still another embodiment of the invention.
Fig. 7 is the perspective view for roughly showing chamfer machining wheel according to still another embodiment of the invention.
Fig. 8 is the perspective view for roughly showing chamfer machining wheel according to still another embodiment of the invention.
Fig. 9 is the perspective view for roughly showing chamfer machining wheel according to still another embodiment of the invention.
Figure 10 is the concept map for roughly showing chamfer machining wheel according to still another embodiment of the invention.
Figure 11 is the concept map for roughly showing a part of chamfer processing method and device of an embodiment according to the present invention.
Figure 12 and Figure 13 is one of display device manufacturing method for roughly showing an embodiment according to the present invention
The perspective view of operation break-down.
Specific embodiment
The present invention can carry out a variety of transformation, and can have multiple embodiments, and specific embodiment is shown in the accompanying drawings, and
It is described in detail in a specific embodiment.The present invention can be then defined with reference to the embodiment of record detailed together with attached drawing
Effect and feature and reach the method for the effect and feature.However, the present invention is not limited to embodiments disclosed below,
It can be realized with various forms.
Hereinafter, will be explained in more detail with reference to the drawing the embodiment of the present invention, it is identical or corresponding when being described with reference to the accompanying drawings
Constituent element impart identical appended drawing reference and omit repeated explanation to it.
Referred in following embodiment the various constituent elements such as layer, film, region, plate be located at another constituent element " on " when,
It not only includes the case where " the adjacent top " that is located at another constituent element, further includes being folded with other compositions between
The case where element.In addition, for ease of description, the size of the constituent element in attached drawing can be exaggerated or reduce.For example, being
Convenient for explanation, the size and thickness of each composition shown in the accompanying drawings is shown with arbitrary size with thickness, therefore
The present invention is not necessarily limited to content shown in the accompanying drawings.
In following embodiment, x-axis, y-axis and z-axis are not limited to three axis in rectangular coordinate system, but can explain
It is the wider range of meaning for including it.For example, x-axis, y-axis and z-axis can intersect vertically, but it also may refer to out of plumb intersection
Different directions from each other.
Fig. 1 is the perspective view for roughly showing the chamfer machining wheel CW of an embodiment according to the present invention.Such as Fig. 1 institute
Show according to the chamfer machining of the present embodiment wheel CW there is the first rotating part 110, the second rotating part 210,220 and third to revolve
Transfer part 310,320.
First rotating part 110 can be rotated centered on the Pivot axle RA parallel with z-axis.First rotating part
110 the first radiuses with spinning central axis RA to lateral surface.Accordingly, as shown in Figure 1, the first rotating part 110 can have
Cylindrical shape or hollow cylindrical shape.At this point, as shown in Figure 1, the first rotating part 110 on the outside face have the first main line
112, (direction+z) side of Pivot axle RA is such as known as top and claims (direction-z) other side of Pivot axle RA
When for lower part, the first main line 112 can have the form vertically extended.
Second rotating part 210,220 can also be rotated centered on Pivot axle RA.Such second rotating part 210,
220 are respectively provided with spinning central axis RA to the second radius of lateral surface, rotate as shown in Figure 1, second radius is greater than first
First radius in portion 110.Second rotating part 210,220 is located under (direction+z) top and (direction-z) of the first rotating part 110
The second rotating part for being located at (+z-axis direction) top in second rotating part 210,220 can be known as the second top rotating part by portion
210, the second rotating part for being located at (- z-axis direction) lower part is known as the second lower part rotating part 220.
Third rotating part 310,320 can also be rotated centered on Pivot axle RA.Such third rotating part 310,
320 connect the rotation of the second rotating part 210,220 and first between the second rotating part 210,220 and the first rotating part 110
Portion 110.Third rotating part adjacent with the second top rotating part 210 in third rotating part 310,320 can be known as in third
The third rotating part adjacent with the second lower part rotating part 220 is known as third lower part rotating part 320 by portion's rotating part 310.At this point,
Radius from the Pivot axle RA of third top rotating part 310 to lateral surface is with from the portion adjacent with the first rotating part 110
Divide the part for tending to adjacent with the second top rotating part 210, i.e., as the direction trend+z increases.Similarly, it is rotated from third lower part
The radius of the Pivot axle RA in portion 320 to lateral surface tends to the second lower part with from the part adjacent with the first rotating part 110
The adjacent part of rotating part 220, i.e., as the direction trend-z increases.
As shown in Figure 1, such first rotating part 110, the second rotating part 210,220 and third rotating part 310,320
It can be formed as one.With such first rotating part 110, the second rotating part 210,220 and third rotating part 310,320
Chamfer machining for example can use grinding stone with wheel CW and realize.Certainly, the present invention is not limited thereto, chamfer machining wheel CW
It is also possible to the structural body for the shape for having as shown in Figure 1, and polishing particles are located at its surface.
Fig. 2 and Fig. 3 is the concept map for roughly showing the chamfer machining wheel CW processing chamfering using Fig. 1.Such as Fig. 2
Shown in a part, the lower basal plate SUB1 and upper substrate SUB2 of the display panel as chamfer machining object pass through sealing
Part SU connection can have display unit DU to be located at the composition on the surface in the direction upper substrate SUB2 of lower basal plate SUB1 at this time.
The corner of the lower basal plate SUB1 and upper substrate SUB2 of such display panel as chamfer machining object are respectively provided with
Sharp shape, at this time if by display panel (along the direction+y) side that is mobile and making display panel and with Pivot axle RA
Centered on the wheel CW contact of the chamfer machining that rotates, then as shown in figure 3, the side of display panel will take turns according to chamfer machining
The lateral surface shape of CW is processed.
Specifically, (direction+z) the top corner of the upper substrate SUB2 of display panel with centered on Pivot axle RA
The chamfer machining of rotation takes turns the outside face contact of the third top rotating part 310 of CW and is processed to chamfering, display panel
(direction-z) the lower part corner of lower basal plate SUB1 and the chamfer machining that is rotated centered on Pivot axle RA are with the of wheel CW
The outside face contact of three lower part rotating parts 320 and be processed to chamfering.Certainly, as needed, the top of display panel can be made
The part being located on the downside of (direction-z) in the end face of the chamfer machining wheel direction CW (direction+y) of substrate SUB2 adds with chamfering
The work outside face contact of the first rotating part 110 of wheel CW, can also make the chamfer machining of the lower basal plate SUB1 of display panel
With the first rotation of the part being located on the upside of (direction+z) in the end face of the wheel direction CW (direction+y) and chamfer machining wheel CW
The outside face contact in portion 110.As described above, a part as display panel, with chamfer machining the first rotating part of wheel CW
The part of 110 outside face contact, surface can be processed by the first rotating part 110.
In this way, the state contacted with wheel CW with display panel in the chamfer machining rotated centered on Pivot axle RA
Under, chamfer machining is moved relative to display panel along the direction+x or the direction-x with wheel CW, complete to the edge of display panel accordingly
Cheng Jinhang chamfer machining.
As described above, utilizing the side of the chamfer machining wheel CW processing display panel rotated centered on Pivot axle RA
When edge, it is possible to generate the foreign matters such as powder in lower basal plate SUB1 or upper substrate SUB2 etc..It is of course also possible to being fallen
The liquid of such as water etc is supplied chamfering object when angle processes, but in this case from lower basal plate SUB1 or top base
The powder and the liquid that plate SUB2 is fallen are likely to form purees (sludge).If when carrying out chamfer machining generation as
The upper foreign matter or purees are located at chamfer machining between wheel CW and chamfering object, then may cause chamfering object
It is bad or damage chamfer machining with wheel CW.
Fig. 4 is the side view roughly shown according to the chamfer machining of comparative example with wheel CW'.With according to Fig. 1 to Fig. 3
According to the chamfer machining of the present embodiment with wheel CW differently, it is main not have first according to the chamfer machining of comparative example wheel CW'
Groove 112.Therefore, when carrying out chamfer machining the foreign matter as described above of generation or a part of purees not to be discharged to
External state is located at chamfer machining between wheel CW and chamfering object, takes turns CW''s to use as shown in Figure 4 in chamfer machining
Centre generates the recessed portion CP of recess and damages chamfer machining wheel CW'.Also, if using recessed portion is so formed
The chamfer machining of CP being damaged wheel CW', then the edge front end surface of substrate as chamfering object etc. can be added
Work leads to the bad of display panel etc. at having protrusion corresponding with the shape of the recessed portion CP.
However, for using wheel CW according to the chamfer machining of the present embodiment, as previously mentioned, the first rotating part 110 is outside
Side has the first main line 112 of the shape vertically extended.Therefore, the foreign matter or pureed generated in chamfer machining
Object is discharged to the outside after being incorporated in first main line 112, so as to be effectively prevented or minimize due to
A part of foreign matter or purees is located at situation bad caused by chamfer machining is used between wheel CW and chamfering object.
Quilt as reference, while chamfer machining is rotated centered on Pivot axle RA with wheel CW with chamfering object
Processing department contact, therefore even if the lateral surface of the first rotating part 110 is formed with the first main line 112, such first main line
112 will not influence the shape in the processed portion of chamfering object itself.This is because the first main line 112 is not located at
Lateral surface one in the case where in the plane (for example, x/y plane) vertical with Pivot axle RA and around the first rotating part 110
The composition in week, so being added with chamfer machining with the wheel CW chamfering object contacted in chamfer machining wheel CW rotary course
The Ministry of worker does not have the part only contacted with first groove portion 112.Also, the foreign matter that is temporarily accommodated in the first main line 112 or
Person's purees at other directions of the first main line 112 towards non-chamfering object direction, by chamfer machining with wheel CW with
Rotated centered on Pivot axle RA and the centrifugal force that generates and be discharged to outside.
The first main line 112 that Fig. 1 to Fig. 3 shows chamfer machining wheel CW prolongs with (z-axis direction) along the vertical direction
The rectilinear form stretched.That is, Fig. 1 shows following situation into Fig. 3: will be formed in the first rotating part of chamfer machining wheel CW
The end 112a in 210 direction of the second top rotating part (direction+z) of 110 the first main line 112 and the first main line 112
The direction one that the straight line of the end 112b connection in 220 direction of the second lower part rotating part (direction-z) and the first main line 112 extend
It causes.But the present invention is not limited thereto.
For example, such as the figure of the perspective view as the chamfer machining wheel roughly shown according to another embodiment of the present invention
Shown in 5, the second top rotating part 210 of the first main line 112 of the first rotating part 110 of chamfer machining wheel CW will be formed in
The end in 220 direction of the second lower part rotating part (direction-z) of the end 112a and the first main line 112 in direction (direction+z)
The straight line of 112b connection can be not parallel to the Pivot axle RA of chamfer machining wheel CW.Furthermore, as general
It slightly shows shown in the Fig. 6 of chamfer machining with the perspective view of wheel CW according to still another embodiment of the invention, the first main line 112
It can be rotated 1 week centered on Pivot axle RA along the lateral surface of the first rotating part 110.Although at this point, will be formed in down
The end in angle processing 210 direction of the second top rotating part (direction+z) of the first main line 112 of the first rotating part 110 of wheel CW
The straight line that connect with the end 112b in 220 direction of the second lower part rotating part (direction-z) of the first main line 112 of end 112a can be with
It is parallel with Pivot axle RA, but the extending direction of the first main line 112 is then different from the straight line.Certainly, the first main line
112 can not be along the composition of the lateral surface rotation 1 week of the first rotating part 110 centered on Pivot axle RA, but such as
The composition etc. of rotation 3 weeks, various modifications obviously can be carried out to this shown in Fig. 7.
For taking turns CW as described previously for using as shown in Fig. 5 to Fig. 7 according to the chamfer machining of the present embodiment, by chamfering
The foreign matter or purees generated in processing is discharged to the outside after being accommodated in the first main line 112, so as to be effectively prevented
It either minimizes since foreign matter or purees are located at chamfer machining with undesirable caused by taking turns between CW and chamfering object
Situation.
As previously mentioned, quilt while chamfer machining is rotated centered on Pivot axle RA with wheel CW with chamfering object
Processing department contact, therefore even if the lateral surface of the first rotating part 110 is formed with the first main line 112, first main line 112
Nor affect on the shape in the processed portion of chamfering object itself.Also, be temporarily accommodated in the first main line 112 foreign matter or
Purees is at other directions of the first main line 112 towards non-chamfering object direction, by chamfer machining wheel CW to revolve
Turn to rotate centered on central axis RA and the centrifugal force that generates and be discharged to outside.
In addition, as shown in Fig. 1 to Fig. 3 and Fig. 5 to Fig. 7,320 direction of third lower part rotating part of the first main line 112
End 112b can be located at the boundary of the first rotating part 110 with third lower part rotating part 320.As previously mentioned, main using first
Groove 112 can be effectively prevented or be minimized since foreign matter or purees are located at chamfer machining wheel CW and chamfering object
Bad situation caused by between object.At this point, the foreign matter or purees because of gravity, have along below (direction-z)
Mobile tendency, accordingly, there exist rotate in the center from the first about 110 rotating part to the first rotating part 110 with third lower part
The foreign matter of the part until boundary between portion 320 or the amount of purees, compared to being present in from the first about 110 rotating part
Center to the boundary between the first rotating part 110 and third top rotating part 310 part foreign matter or purees amount more
It is more.Therefore, by making the end 112b in 320 direction of third lower part rotating part of the first main line 112 be located at the first rotating part 110
With the boundary of third lower part rotating part 320, so as to so that be present in from the center of the first about 110 rotating part to first rotation
The foreign matter or purees of the part on the boundary between portion 110 and third lower part rotating part 320 are effectively accommodated in the first tap drain
It is discharged after slot 112 to outside.
Certainly, as shown in Fig. 1 to Fig. 3 and Fig. 5 to Fig. 7, the third top rotating part of the first main line 112 can be made
The end 112a in 310 directions is located at the boundary of the first rotating part 110 and third top rotating part 310.In addition, as needed, it can
Using shown in Fig. 8 of the perspective view as taken turns as the chamfer machining that roughly shows according to still another embodiment of the invention, the
The end 112a and third in 310 direction of third top rotating part for the first main line 112 that the lateral surface of one rotating part 110 is formed
The end 112b in 320 direction of lower part rotating part can be less than reaching between the first rotating part 110 and third top rotating part 310
Boundary between boundary or the first rotating part 110 and third lower part rotating part 320, but be located in the first rotating part 110.
Fig. 9 is the perspective view for roughly showing chamfer machining wheel CW according to still another embodiment of the invention.Such as Fig. 9 institute
Show, the lateral surface in third top rotating part 310 also can have along upper and lower with wheel CW according to the chamfer machining of the present embodiment
Direction extend the first additional trenches 312 and third lower part rotating part 320 lateral surface extend along up and down direction second
Additional trenches 322.It is of course also possible to only with any one in the first additional trenches 312 and the second additional trenches 322.
Such as the explanation that top is carried out with reference to Fig. 2 and Fig. 3, the machined surface of chamfering object not only uses wheel CW with chamfer machining
The first rotating part 110 outside face contact, can also be rotated with the lateral surface of third top rotating part 310 and third lower part
The outside face contact in portion 320 is simultaneously processed.Therefore the foreign matter as described above of generation or purees when carrying out chamfer machining
A part in the case where not being discharged to outside, positioned in third between the lateral surface of rotating part 310 and chamfering object and/
It is bad so as to cause occurring or between the lateral surface and chamfering object of third lower part rotating part 320.Therefore, it sends out in order to prevent
Life is described bad, and chamfer machining wheel CW can be made to have the first additional trenches 312 as described above and/or the second additional trenches
322。
With above referring to figs. 1 to Fig. 3 and the description that carries out to the shape of the first main line 112 of Fig. 5 to Fig. 8 is similar
The shape of ground, the first additional trenches 312 and/or the second additional trenches 322 can carry out various deformation.Also, as shown in figure 9,
Such first additional trenches 312 and/or the second additional trenches 322 can connect in the first main line 112 as needed.That is,
The end 312b in 110 direction of the first rotating part of the first additional trenches 312 can be rotated with the third top of the first main line 112
The end 112a in 310 direction of portion is consistent.Certainly, the end 322a in 110 direction of the first rotating part of the second additional trenches 322 can be with
It is consistent with the end 112b in 320 direction of third lower part rotating part of the first main line 112.
As reference, the end 312a in 210 direction of the second top rotating part of the first additional trenches 312 can be made to be located at the
Boundary between three top rotating parts 310 and the second top rotating part 210.Similarly, the second of the second additional trenches 322 can be made
The end 322b in 220 direction of lower part rotating part is located at the side between third lower part rotating part 320 and the second lower part rotating part 220
Boundary.
Figure 10 is the concept map for roughly showing chamfer machining wheel CW according to still another embodiment of the invention.Such as Figure 10
It is shown, it is taken turns with wheel CW compared to according to the chamfer machining of reference Fig. 5 embodiment above-mentioned according to the chamfer machining of the present embodiment
CW, also has the second additional rotating part 210', and the first additional rotating part 110' and third add rotating part 310', 320'.
Second additional rotating part 210' is located at (direction+z) top of the second top rotating part 210, and spinning center
The radius of axis RA to lateral surface is identical as the second radius of the second top rotating part 210.First additional rotating part 110' is located at the
Between two additional rotating part 210' and the second top rotating part 210, and spinning central axis RA is to the radius of lateral surface and
First radius of one top rotating part 110 is identical.In addition, the first additional rotating part 110' on the outside face have vertically prolong
The the second main line 112' stretched.The shape of second main line 112' can be identical as the shape of the first main line 112.Certainly, such as
Above for the description that the shape of the first main line 112 carries out, the shape of the second main line 112' can carry out various deformation.
It may include that third adds top rotating part 310' and the additional lower part rotation of third that third, which adds rotating part 310', 320',
Transfer part 320'.Third add top rotating part 310' be located at the second additional additional rotating part 110' of rotating part 210' and first it
Between, so that the second additional rotating part 210' is connected to the first additional rotating part 110'.At this point, adding top rotating part from third
The radius of the Pivot axle RA of 310' to lateral surface tends to and the with from the part adjacent with the first additional rotating part 110'
The two additional adjacent parts rotating part 210' and become larger.Third adds lower part rotating part 320' and is located at the second top rotating part 210
Between the first additional rotating part 110', so that the second top rotating part 210 is connected to the first additional rotating part 110'.This
When, from third add the Pivot axle RA of lower part rotating part 320' to lateral surface radius with from the first additional rotating part
The adjacent part 110' tend to the second adjacent part of top rotating part 210 and become larger.
For using wheel CW according to the chamfer machining of such the present embodiment, the first rotating part 110, the second rotating part
210, the additional rotation of 220, the additional rotating part 110' of third rotating part 310,320, first, the second additional rotating part 210' and third
Transfer part 310', 320' can be formed as one as shown in Figure 10.
As previously mentioned, chamfer machining touches chamfering object while rotation centered on Pivot axle RA with wheel CW
Machined surface and processed.Therefore with using, the lateral surface of chamfer machining wheel CW may be damaged.In this situation
Under it is necessary to replace chamfer machining wheel CW.
For using wheel CW according to the chamfer machining of the present embodiment, the first rotating part 110 and third rotating part are utilized
310, during 320 processing chamfering objects, if at least one in the first rotating part 110 and third rotating part 310,320
It is a to be damaged, then it can use the first additional rotating part 110' and third add rotating part 310', 320' processing chamfering object
Object.Therefore, because not having to replace entire chamfer machining wheel CW, can be improved efficiency significantly in processing operation.
It shows third rotating part 310,320 in Figure 10 and does not have the first additional trenches 312 in outer side (with reference to Fig. 9)
And/or second additional trenches 322 (referring to Fig. 9), but the present invention is not limited thereto.That is, third rotating part 310,320 can be outside
Side has the first additional trenches 312 (referring to Fig. 9) and/or the second additional trenches 322 (referring to Fig. 9).Rotation additional for third
For transfer part 310', 320', can also on the outside face have additional trenches, shape be such as directed to the first additional trenches 312 and/or
Various deformation can be carried out as second additional trenches 322 are aforementioned.
Figure 11 is the concept map for roughly showing a part of chamfer processing method and device of an embodiment according to the present invention.Such as
Shown in Figure 11, according to the chamfer processing method and device of the present embodiment there is the chamfer machining as being described with reference to Figure 10 to take turns
The connecting component of CW and such as crank CR etc, and can have the motor MT that can rotate chamfer machining wheel CW.Also, chamfering
Processing unit (plant) can have can make chamfer machining wheel CW relative to chamfering object (along z-axis) towards up and down direction it is mobile or
The position adjustment section (not shown) moved in the plane (x/y plane) perpendicular to up and down direction.Such position adjustment section can be with
Using the composition of the adjustment section of the upper and lower position with generally known xy workbench and the adjustable xy workbench.
Certainly, as shown in figure 11, chamfer processing method and device can have the chamfering object for fixed display panel etc
Upper clamp CL1 and lower clamp CL2, wherein the display panel has is formed with the lower basal plate of display unit DU on one side
The SUB1 and upper substrate SUB2 that lower basal plate SUB1 is connected to using seal member SU.At this time below upper clamp CL1
The first elastic portion RU1 configured with the softness such as rubber is also configured with the second bullet of the softness such as rubber in the upper surface of lower clamp CL2
Property portion RU2, to can also be prevented even if fixing the position of chamfering object using upper clamp CL1 and lower clamp CL2
Chamfering object is damaged by upper clamp CL1 and lower clamp CL2.
As previously mentioned, making chamfer machining take turns CW to rotate by motor MT after the position of chamfering object is fixed
It is rotated centered on central axis RA and it is made to touch chamfering object while change for the relative position of chamfering object
Object, it is possible thereby to be processed.
Although Figure 11, which shows chamfer processing method and device, has the situation with reference to Figure 10 chamfer machining wheel CW above-mentioned, this
Invention is not limited to this.That is, chamfer processing method and device can have according to the chamfer machining of various embodiments above-mentioned in wheel CW
Any one, this is obvious.
So far, although to chamfer machining with wheel CW or with the chamfer machining with wheel CW chamfer processing method and device into
Explanation is gone, however, the present invention is not limited thereto.Display dress is manufactured with wheel CW or chamfer processing method and device using such chamfer machining
The display device manufacturing method set also belongs to the present invention.
Figure 12 and Figure 13 is the display device manufacture roughly shown according to an embodiment present invention as described above
The perspective view of a part of process of method.As shown in figure 12, multiple display unit DU are formed on the first mother substrate SUB1'.Then,
As shown in figure 13, the second mother substrate SUB2' is arranged on the first mother substrate SUB1' to cover multiple display unit DU, and with sealing
Component (not shown) connects the first mother substrate SUB1' and the second mother substrate SUB2'.Then, according to cutting line as shown in fig. 13 that
CL cuts the first mother substrate SUB1' and the second mother substrate SUB2' around each of multiple display unit DU, thus to obtain more
A display panel.Hereafter, using chamfer processing method and device as shown in figure 11 or according to its variation, to multiple display panels
The side of each carries out chamfer machining, can manufacture multiple display units accordingly.
As described above, the present invention is described for the embodiment for having referred to shown in attached drawing, but it is merely illustrative,
But all personnel for having basic knowledge in technical field of the invention, it will be able to which multiplicity can be realized based on the present invention by understanding
Deformation and the embodiment being equal with this.Therefore really technical protection scope should be based on the skill of claims by the present invention
Art thought determines.
Claims (10)
1. a kind of chamfer machining wheel, wherein include
First rotating part has spinning central axis to the first radius of lateral surface, the side of the Pivot axle is known as
When the other side on top, the Pivot axle is known as lower part, face has the first main line vertically extended on the outside；
Second rotating part has positioned at the upper and lower part of first rotating part from the Pivot axle to lateral surface
Second radius, second radius are greater than first radius；And
Third rotating part connects second rotating part and institute between second rotating part and first rotating part
The first rotating part is stated, the radius from the Pivot axle to lateral surface becomes with from the part adjacent with first rotating part
Become larger to the adjacent part of the second rotating part.
2. chamfer machining wheel as described in claim 1, wherein
Second rotating part superposed in second rotating part is known as the second top rotating part, the second rotation positioned at lower part
When transfer part is known as the second lower part rotating part, end and the institute in the second top rotating part direction of first main line are connected
The straight line for stating the end in the second lower part rotating part direction of the first main line is not parallel to the Pivot axle.
3. chamfer machining wheel as described in claim 1, wherein
First main line rotates at least 1 along the lateral surface of first rotating part centered on the Pivot axle
Week.
4. chamfer machining wheel as described in claim 1, wherein
Second rotating part superposed in second rotating part is known as the second top rotating part, the second rotation positioned at lower part
Transfer part is known as the second lower part rotating part, and the third rotating part adjacent with second top rotating part claims in the third rotating part
For third top rotating part, when the third rotating part adjacent with second lower part rotating part is known as third lower part rotating part, institute
The end for stating the third lower part rotating part direction of the first main line is located at first rotating part and the third lower part is revolved
The boundary of transfer part.
5. chamfer machining wheel as described in claim 1, wherein
Second rotating part superposed in second rotating part is known as the second top rotating part, the second rotation positioned at lower part
Transfer part is known as the second lower part rotating part, and the third rotating part adjacent with second top rotating part claims in the third rotating part
For third top rotating part, when the third rotating part adjacent with second lower part rotating part is known as third lower part rotating part, institute
Stating at least one of third top rotating part and third lower part rotating part, face has and vertically extends on the outside
Additional trenches.
6. chamfer machining wheel as claimed in claim 5, wherein
The additional trenches are connected with first main line.
7. the chamfer machining as described in any one in claim 1 to 6 is taken turns, wherein
First rotating part, second rotating part and the third rotating part are formed as one.
8. the chamfer machining as described in any one in claim 1 to 6 is taken turns, wherein
Second rotating part superposed in second rotating part is known as the second top rotating part, the second rotation positioned at lower part
When transfer part is known as the second lower part rotating part, also include
Second additional rotating part, positioned at the top of second top rotating part, and from the Pivot axle to lateral surface
Radius is identical as second radius；
First additional rotating part, between the described second additional rotating part and second top rotating part, and from the rotation
Turn that central axis is identical as first radius to the radius of lateral surface, lateral surface has the second tap drain vertically extended
Slot；And
Third adds rotating part, between the described second additional rotating part and the first additional rotating part and described second
Between top rotating part and the first additional rotating part, by the described second additional rotating part and second top rotating part
Be connected to the described first additional rotating part, and the radius from the Pivot axle to lateral surface with from it is described first attached
The adjacent part trend in transfer part of the putting english part adjacent with the described second additional rotating part adds rotation from described first
The adjacent part in portion tends to the part adjacent with second top rotating part and becomes larger.
9. a kind of chamfer processing method and device, wherein include
Chamfer machining wheel as described in any one in claim 1 to 6；
Motor can rotate the chamfer machining wheel；And
Position adjustment section can be such that the chamfer machining is moved along the vertical direction with wheel relative to chamfering object, or hang down
Directly moved in the plane of the up and down direction.
10. chamfer processing method and device as claimed in claim 9, wherein
First rotating part, second rotating part and the third rotating part are formed as one.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020180053661A KR102586040B1 (en) | 2018-05-10 | 2018-05-10 | Chamfering wheel, chamfering apparatus comprising the same, and method of manufacturing display apparatus using the same |
| KR10-2018-0053661 | 2018-05-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110465699A true CN110465699A (en) | 2019-11-19 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910144242.0A Pending CN110465699A (en) | 2018-05-10 | 2019-02-27 | Chamfer machining wheel and the chamfer processing method and device with chamfer machining wheel |
Country Status (2)
| Country | Link |
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| KR (1) | KR102586040B1 (en) |
| CN (1) | CN110465699A (en) |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11320363A (en) * | 1998-05-18 | 1999-11-24 | Tokyo Seimitsu Co Ltd | Wafer chamferring device |
| JP2000000744A (en) * | 1998-06-12 | 2000-01-07 | Tokyo Seimitsu Co Ltd | Wafer chamfering device |
| JP2000107999A (en) * | 1998-10-07 | 2000-04-18 | Tokyo Seimitsu Co Ltd | Wafer chamfering method |
| KR200327852Y1 (en) * | 2003-06-18 | 2003-09-26 | 권옥련 | A shaved exhausting device of interior angle cutting machine |
| JP2003291071A (en) * | 2002-04-02 | 2003-10-14 | Jaburo Kogyo Kk | Polishing tool made from non-woven cloth |
| KR20110137470A (en) * | 2010-06-17 | 2011-12-23 | 이승렬 | Cutting machine for boundary stone |
| JP2015127079A (en) * | 2013-12-27 | 2015-07-09 | 旭硝子株式会社 | Grindstone, grinding device, grinding method, and manufacturing method of glass substrate |
| CN204604129U (en) * | 2014-01-29 | 2015-09-02 | 中村留精密工业株式会社 | The periphery processing grinding tool of sheet material and facing attachment |
| CN105345653A (en) * | 2015-12-01 | 2016-02-24 | 佛山市顺德区高力威机械有限公司 | Coarse grinding head structure of glass edge grinding machine and edge grinding technology of coarse grinding head structure |
| CN106891063A (en) * | 2015-12-21 | 2017-06-27 | 南京路博利尔精密机械有限公司 | A kind of deburring chamfering integrated cutter |
| CN206732217U (en) * | 2017-04-10 | 2017-12-12 | 杭州磐诺电子技术有限公司 | A kind of Double-side rounding process tool structure |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101290778B1 (en) * | 2010-11-03 | 2013-07-29 | 주식회사 세한텍 | Polishing Wheel for grinding of sheet glass edge and its manufacturing method |
-
2018
- 2018-05-10 KR KR1020180053661A patent/KR102586040B1/en active IP Right Grant
-
2019
- 2019-02-27 CN CN201910144242.0A patent/CN110465699A/en active Pending
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11320363A (en) * | 1998-05-18 | 1999-11-24 | Tokyo Seimitsu Co Ltd | Wafer chamferring device |
| JP2000000744A (en) * | 1998-06-12 | 2000-01-07 | Tokyo Seimitsu Co Ltd | Wafer chamfering device |
| JP2000107999A (en) * | 1998-10-07 | 2000-04-18 | Tokyo Seimitsu Co Ltd | Wafer chamfering method |
| JP2003291071A (en) * | 2002-04-02 | 2003-10-14 | Jaburo Kogyo Kk | Polishing tool made from non-woven cloth |
| KR200327852Y1 (en) * | 2003-06-18 | 2003-09-26 | 권옥련 | A shaved exhausting device of interior angle cutting machine |
| KR20110137470A (en) * | 2010-06-17 | 2011-12-23 | 이승렬 | Cutting machine for boundary stone |
| JP2015127079A (en) * | 2013-12-27 | 2015-07-09 | 旭硝子株式会社 | Grindstone, grinding device, grinding method, and manufacturing method of glass substrate |
| CN204604129U (en) * | 2014-01-29 | 2015-09-02 | 中村留精密工业株式会社 | The periphery processing grinding tool of sheet material and facing attachment |
| CN105345653A (en) * | 2015-12-01 | 2016-02-24 | 佛山市顺德区高力威机械有限公司 | Coarse grinding head structure of glass edge grinding machine and edge grinding technology of coarse grinding head structure |
| CN106891063A (en) * | 2015-12-21 | 2017-06-27 | 南京路博利尔精密机械有限公司 | A kind of deburring chamfering integrated cutter |
| CN206732217U (en) * | 2017-04-10 | 2017-12-12 | 杭州磐诺电子技术有限公司 | A kind of Double-side rounding process tool structure |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102586040B1 (en) | 2023-10-10 |
| KR20190130090A (en) | 2019-11-21 |
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