JP2003291071A - Polishing tool made from non-woven cloth - Google Patents
Polishing tool made from non-woven clothInfo
- Publication number
- JP2003291071A JP2003291071A JP2002100328A JP2002100328A JP2003291071A JP 2003291071 A JP2003291071 A JP 2003291071A JP 2002100328 A JP2002100328 A JP 2002100328A JP 2002100328 A JP2002100328 A JP 2002100328A JP 2003291071 A JP2003291071 A JP 2003291071A
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- polishing roll
- roll
- polishing tool
- groove
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は不織布製の研磨ロー
ルを備えた研磨具に関するものである。具体的には、銅
・アルミニウム・樹脂といった各種素材からなる板状材
料やプリント基板等の表面研磨に適した研磨具に関する
ものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a polishing tool provided with a polishing roll made of non-woven fabric. Specifically, the present invention relates to a polishing tool suitable for polishing the surface of a plate-shaped material made of various materials such as copper, aluminum and resin, a printed circuit board or the like.
【0002】[0002]
【従来の技術】プリント基板の製造工程においては、メ
ッキやエッチングによる配線パターンの形成前後にその
表面を研磨して整面する必要がある。また、スルーホー
ルや凹部に樹脂を充填して穴埋めを行った場合もダレや
バリを除去するための研磨が必要である。また、プリン
ト基板以外の板状材料も必要に応じて表面研磨が行われ
る。従来、このような研磨を行う研磨具の一例として図
6に示す研磨具がある。この研磨具は、円筒状の心材A
の外周に不織布製の研磨ロールBを設けたものであり、
研磨ロールBを被研磨物の表面に押し付けながら回転さ
せると、研磨ロールBに含有固着されている砥粒によっ
て同表面が研磨されるものである。2. Description of the Related Art In the process of manufacturing a printed circuit board, it is necessary to polish the surface before and after forming a wiring pattern by plating or etching. Further, even when the through holes and the recesses are filled with the resin to fill the holes, polishing for removing the sag and burrs is necessary. In addition, plate-shaped materials other than the printed circuit board are surface-polished as necessary. Conventionally, as an example of a polishing tool for performing such polishing, there is a polishing tool shown in FIG. This polishing tool has a cylindrical core material A.
A non-woven polishing roll B is provided on the outer periphery of
When the polishing roll B is rotated while being pressed against the surface of the object to be polished, the surface is polished by the abrasive grains contained and fixed in the polishing roll B.
【0003】[0003]
【発明が解決しようとする課題】今日、プリント基板は
OA機器、家電製品その他に広く使用されており、その用
途は今後も益々拡大することが予想される。この用途の
拡大に呼応してプリント基板の更なる性能向上が求めら
れ、配線の高密度化、軽薄化、多層化等が必要不可欠と
なっている。このような高密度化、軽薄化、多層化が図
られたプリント基板を前記図6に示す研磨具で研磨する
ことに次のような課題があった。
(1)研磨屑やバフ屑が排出されずにプリント基板と研
磨ロールの間に残存するため、スクラッチ(番手以上の
深さの研磨目)が発生する。酷い場合には、パターンが
引き伸ばされて隣接するパターン同士が接触してしまっ
たり、パターンが断線してしまったり、剥離してしまっ
たりする。
(2)凹凸に十分に追従できず、プリント基板にスルー
ホールや凹凸が存在する場合、それらの内面や底面に研
磨残りが発生する。
(3)配線パターンの接触や断線等はプリント基板に特
有の問題であるが、それ以外のスクラッチや研磨残りの
問題はプリント基板以外の被研磨物にも共通する課題で
ある。Today, printed circuit boards are
It is widely used in OA equipment, home appliances, and other applications, and its applications are expected to continue to expand. In response to the expansion of this application, further improvement of the performance of the printed circuit board is required, and it is indispensable to make the wiring high-density, light-weight, and multi-layer. There are the following problems in polishing the printed circuit board having such a high density, thinness and multilayer structure with the polishing tool shown in FIG. (1) Since polishing scraps and buff scraps are not discharged and remain between the printed circuit board and the polishing roll, scratches (polishing stitches having a depth of a count or more) are generated. In severe cases, the patterns are stretched so that adjacent patterns come into contact with each other, the patterns are broken, or peeled off. (2) When the unevenness cannot be sufficiently followed and the printed board has through holes and unevenness, polishing residue occurs on the inner surface and the bottom surface thereof. (3) The contact and disconnection of the wiring pattern are problems peculiar to the printed circuit board, but other problems such as scratches and polishing residue are problems common to the objects to be polished other than the printed circuit board.
【0004】[0004]
【課題を解決するための手段】本発明の不織布製研磨具
の一つは、心材の外周に不織布製の研磨ロールを設け、
その研磨ロールの外周面に複数本の直線又は曲線又は螺
旋の溝を形成したものである。One of the non-woven fabric polishing tools of the present invention is to provide a non-woven fabric polishing roll on the outer periphery of a core material,
A plurality of straight, curved or spiral grooves are formed on the outer peripheral surface of the polishing roll.
【0005】本発明の不織布製研磨具の他の一つは、溝
の一端又は両端を研磨ロールの軸方向端面に開口させた
ものである。Another non-woven fabric polishing tool of the present invention is one in which one end or both ends of a groove are opened to an axial end face of a polishing roll.
【0006】[0006]
【発明の実施の形態】(実施の形態1)本発明の不織布
製研磨具の実施形態の一例を図1及び図2に基づいて説
明する。この不織布製研磨具は、図1に示すように、円
筒状の心材1の外周に不織布製の研磨ロール2を設け、
その研磨ロール2の外周面に螺旋の溝3(以下螺旋溝
3)を2本以上形成したものである。BEST MODE FOR CARRYING OUT THE INVENTION (Embodiment 1) An example of an embodiment of a non-woven fabric polishing tool of the present invention will be described with reference to FIGS. 1 and 2. As shown in FIG. 1, this non-woven cloth polishing tool is provided with a non-woven cloth polishing roll 2 on the outer periphery of a cylindrical core 1.
Two or more spiral grooves 3 (hereinafter referred to as spiral grooves 3) are formed on the outer peripheral surface of the polishing roll 2.
【0007】前記研磨ロール2は、心材1の外周面上で
砥粒(シリコンカーバイト)と短繊維(長さ数mm〜数十
mm)をバインダー樹脂によって固着させたものであり、
その成形と同時に心材1と一体化されたものである。こ
こで、心材1の長さは610mm、研磨ロール2の外径は
150mmである。尚、砥粒の種類や粒径に限定はなく、
公知又は新規の砥粒のうちから適宜選択することができ
る。また、短繊維の種類や長さにも特に限定はない。但
し、短繊維が短過ぎると、互いの短繊維同士の絡み合い
が弱くなって研磨ロール2の強度や耐久性が劣る。一
方、短繊維が長過ぎるとバインダー樹脂との混合が不十
分となって均質性が損なわれる。従って、以上の点を考
慮して短繊維の種類や長さを決定するのが望ましい。The polishing roll 2 has abrasive grains (silicon carbide) and short fibers (length several mm to several tens) on the outer peripheral surface of the core material 1.
mm) fixed by a binder resin,
Simultaneously with the molding, it is integrated with the core material 1. Here, the core material 1 has a length of 610 mm and the polishing roll 2 has an outer diameter of 150 mm. There is no limitation on the type or particle size of the abrasive grains,
It can be appropriately selected from known or new abrasive grains. Also, there is no particular limitation on the type or length of the short fibers. However, if the short fibers are too short, the entanglement of the short fibers with each other is weakened and the strength and durability of the polishing roll 2 are deteriorated. On the other hand, if the short fibers are too long, the mixing with the binder resin will be insufficient and the homogeneity will be impaired. Therefore, it is desirable to determine the type and length of the short fibers in consideration of the above points.
【0008】前記螺旋溝3は、幅4mm、深さ10mmの溝
であり、図1に示すように、一定ピッチで研磨ロール2
の外周面に形成されている。また、図2(a)(b)に
示すように、夫々の螺旋溝3はその一端4が研磨ロール
2の軸方向一方端面5に開口し、他端6が研磨ロール2
の軸方向他方端面7に開口している。かかる螺旋溝3を
研磨ロール2の外周面に複数形成することによって、同
研磨ロール2の表層部は螺旋溝3によって分断され、同
表層部に多数本の凸条8が形成されている。The spiral groove 3 is a groove having a width of 4 mm and a depth of 10 mm, and as shown in FIG. 1, the polishing roll 2 has a constant pitch.
Is formed on the outer peripheral surface of the. Further, as shown in FIGS. 2A and 2B, one end 4 of each spiral groove 3 is open to one end face 5 in the axial direction of the polishing roll 2, and the other end 6 is the polishing roll 2.
Is open at the other end face 7 in the axial direction. By forming a plurality of such spiral grooves 3 on the outer peripheral surface of the polishing roll 2, the surface layer portion of the polishing roll 2 is divided by the spiral groove 3, and a large number of ridges 8 are formed on the surface layer portion.
【0009】尚、前記心材1の長さ及び研磨ロール2の
外径は一例であり、適宜変更することができる。また、
前記螺旋溝3の幅及び深さも一例であり、適宜変更する
ことができる。さらに、螺旋溝3の角度(研磨ロール2
の軸線に対する角度)も適宜変更することができる。The length of the core material 1 and the outer diameter of the polishing roll 2 are merely examples, and can be appropriately changed. Also,
The width and depth of the spiral groove 3 are also examples and can be changed as appropriate. Further, the angle of the spiral groove 3 (polishing roll 2
The angle with respect to the axis) can be changed as appropriate.
【0010】(実施の形態2)本発明の不織布製研磨具
の実施形態の他例を図3及び図4に基づいて説明する。
図3に示す不織布製研磨具の基本構成は前記実施形態1
に示すものと同一である。異なるのは、研磨ロール2の
外周面に形成される溝3を螺旋溝に代えて直線の溝とし
たことである。図3に示す溝3も一定ピッチで研磨ロー
ル2の外周面に形成され、その一端4が研磨ロール2の
軸方向一方端面5に開口し、他端6が研磨ロール2の軸
方向他方端面(図示しない)に開口している。尚、図3
に示す直線の溝3は研磨ロール2の軸線と平行に形成さ
れているが、同軸線と斜交するように形成してもよい。(Second Embodiment) Another embodiment of the nonwoven fabric polishing tool of the present invention will be described with reference to FIGS. 3 and 4.
The basic structure of the non-woven fabric polishing tool shown in FIG.
Is the same as that shown in. The difference is that the groove 3 formed on the outer peripheral surface of the polishing roll 2 is replaced with a spiral groove and is a linear groove. Grooves 3 shown in FIG. 3 are also formed at a constant pitch on the outer peripheral surface of the polishing roll 2, one end 4 of which is open at one axial end surface 5 of the polishing roll 2 and the other end 6 is the other axial end surface of the polishing roll 2 ( (Not shown). Incidentally, FIG.
Although the linear groove 3 shown in is formed parallel to the axis of the polishing roll 2, it may be formed so as to cross the coaxial line.
【0011】図4に示す不織布製研磨具の基本構成も前
記実施形態1に示すものと同一である。異なるのは、研
磨ロール2の外周面に形成される溝3を螺旋溝に代えて
曲線の溝としたことである。図4に示す溝3も一定ピッ
チで研磨ロール2の外周面に形成され、その一端4が研
磨ロール2の軸方向一方端面5に開口し、他端6が研磨
ロール2の軸方向他方端面(図示しない)に開口してい
る。The basic structure of the nonwoven fabric polishing tool shown in FIG. 4 is also the same as that shown in the first embodiment. The difference is that the groove 3 formed on the outer peripheral surface of the polishing roll 2 is a curved groove instead of the spiral groove. The grooves 3 shown in FIG. 4 are also formed on the outer peripheral surface of the polishing roll 2 at a constant pitch, one end 4 of which is open to one end face 5 in the axial direction of the polishing roll 2 and the other end 6 is the other end face in the axial direction of the polishing roll 2 ( (Not shown).
【0012】[0012]
【発明の効果】請求項1記載の不織布製研磨具は、研磨
ロールの外周面に複数本の直線又は曲線又は螺旋の溝が
形成されている。従って、次のような効果を有する。According to the non-woven fabric polishing tool of the first aspect, a plurality of straight, curved or spiral grooves are formed on the outer peripheral surface of the polishing roll. Therefore, it has the following effects.
【0013】研磨ロールが適度な弾性を有し、被研磨物
表面の凹凸に対する追従性が向上する。具体的には図5
に示すように、研磨ロール2を被研磨物10の表面11
に適度な力で押し付けながら回転させると、前記溝3を
形成することによって研磨ロール2の表層部に発生した
多数の凸条8が被研磨物10の表面11に存在する凹凸
12に応じて捩れ、凹凸12を通過すると反発して元に
戻る。この捩れと復元の繰り返しによって追従性が向上
し、被研磨物表面に存在する凹凸やスルーホールの側面
や内面がむらなく研磨される。The polishing roll has an appropriate elasticity, and the followability to irregularities on the surface of the object to be polished is improved. Specifically, FIG.
As shown in FIG.
When pressed and rotated with an appropriate force, the large number of ridges 8 generated in the surface layer portion of the polishing roll 2 due to the formation of the groove 3 are twisted in accordance with the unevenness 12 present on the surface 11 of the object to be polished 10. , When it passes through the unevenness 12, it repels and returns to its original state. By repeating the twisting and restoring, the followability is improved, and the unevenness existing on the surface of the object to be polished and the side surface and the inner surface of the through hole are evenly polished.
【0014】請求項2記載の不織布製研磨具は、溝の一
端又は両端が研磨ロールの軸方向端面に開口している。
従って、次のような効果を有する。In the non-woven fabric polishing tool according to a second aspect of the present invention, one end or both ends of the groove are open to the axial end face of the polishing roll.
Therefore, it has the following effects.
【0015】研磨屑やバフ屑が溝の一端から排出され、
被研磨部表面と研磨ロールの間に研磨屑やバフ屑が残存
することがない。従って、研磨屑やバフ屑に起因するス
クラッチが発生しない。特に、被研磨物がプリント基板
である場合には、配線パターンが引き伸ばされて隣接す
るパターン同士が接触してしまったり、パターンが断線
してしまったり、剥離してしまったりするといった不具
合が解消される。尚、溝の両端の何れから研磨屑やバフ
屑が排出されるかは、研磨ロールの回転方向によって決
定される。Polishing dust and buff dust are discharged from one end of the groove,
No polishing dust or buff dust remains between the surface of the portion to be polished and the polishing roll. Therefore, scratches caused by polishing dust and buff dust do not occur. In particular, when the object to be polished is a printed circuit board, the problem that the wiring pattern is stretched and adjacent patterns are in contact with each other, the pattern is broken, or peeled off is solved. It Which of the both ends of the groove the polishing dust or the buff dust is discharged is determined by the rotation direction of the polishing roll.
【図1】本発明の不織布製研磨具の実施形態の一例を示
す斜視図。FIG. 1 is a perspective view showing an example of an embodiment of a non-woven fabric polishing tool of the present invention.
【図2】(a)は図1に示す不織布製研磨具の左側面
図、(b)は同右側面図。2A is a left side view of the nonwoven fabric polishing tool shown in FIG. 1, and FIG. 2B is a right side view thereof.
【図3】本発明の不織布製研磨具の実施形態の他例を示
す斜視図。FIG. 3 is a perspective view showing another example of the embodiment of the nonwoven fabric polishing tool of the present invention.
【図4】本発明の不織布製研磨具の実施形態のさらに他
例を示す斜視図。FIG. 4 is a perspective view showing still another example of the embodiment of the nonwoven fabric polishing tool of the present invention.
【図5】本発明の不織布製研磨具による研磨状態を示す
説明図。FIG. 5 is an explanatory view showing a polishing state by the nonwoven fabric polishing tool of the present invention.
【図6】従来の研磨具の一例を示す斜視図。FIG. 6 is a perspective view showing an example of a conventional polishing tool.
1 心材 2 研磨ロール 3 溝 4 溝の一端 5 研磨ロールの軸方向一方端面 6 溝の他端 7 研磨ロールの軸方向他方端面 8 凸条 10 被研磨物 11 被研磨物の表面 12 被研磨物表面の凹凸 1 heartwood 2 polishing roll 3 grooves 4 One end of groove 5 One end face in the axial direction of the polishing roll The other end of 6 groove 7 Polishing roll's other axial end surface 8 convex stripes 10 Object to be polished 11 Surface of the object to be polished 12 Unevenness on the surface of the object to be polished
Claims (2)
られ、研磨ロールの外周面に複数本の直線又は曲線又は
螺旋の溝が形成されたことを特徴とする不織布製研磨
具。1. A non-woven fabric polishing tool comprising a non-woven fabric polishing roll provided on the outer periphery of a core member, and a plurality of straight, curved or spiral grooves formed on the outer peripheral face of the polishing roll.
面に開口していることを特徴とする請求項1記載の不織
布製研磨具。2. The non-woven fabric polishing tool according to claim 1, wherein one end or both ends of the groove are open to an axial end face of the polishing roll.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002100328A JP2003291071A (en) | 2002-04-02 | 2002-04-02 | Polishing tool made from non-woven cloth |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002100328A JP2003291071A (en) | 2002-04-02 | 2002-04-02 | Polishing tool made from non-woven cloth |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2003291071A true JP2003291071A (en) | 2003-10-14 |
Family
ID=29241326
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002100328A Pending JP2003291071A (en) | 2002-04-02 | 2002-04-02 | Polishing tool made from non-woven cloth |
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Country | Link |
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JP (1) | JP2003291071A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007030153A (en) * | 2005-07-27 | 2007-02-08 | Kowa Co Ltd | Roll |
JP2008093786A (en) * | 2006-10-12 | 2008-04-24 | Jtekt Corp | Method for releasing dynamic pressure of grinding liquid in grinding, grinding method using the method, and grinding wheel used in the grinding method |
CN102365152A (en) * | 2009-05-25 | 2012-02-29 | 工程株式会社 | Plier |
KR101192157B1 (en) * | 2010-12-07 | 2012-10-17 | 지앤피테크놀로지 주식회사 | Polishing roller apparatus for display panel, semiconductor substrate, etc. |
KR101290778B1 (en) * | 2010-11-03 | 2013-07-29 | 주식회사 세한텍 | Polishing Wheel for grinding of sheet glass edge and its manufacturing method |
CN110465699A (en) * | 2018-05-10 | 2019-11-19 | 三星显示有限公司 | Chamfer machining wheel and the chamfer processing method and device with chamfer machining wheel |
-
2002
- 2002-04-02 JP JP2002100328A patent/JP2003291071A/en active Pending
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007030153A (en) * | 2005-07-27 | 2007-02-08 | Kowa Co Ltd | Roll |
JP2008093786A (en) * | 2006-10-12 | 2008-04-24 | Jtekt Corp | Method for releasing dynamic pressure of grinding liquid in grinding, grinding method using the method, and grinding wheel used in the grinding method |
US8197305B2 (en) | 2006-10-12 | 2012-06-12 | Jtekt Corporation | Dynamic pressure releasing method of grinding liquid in grinding operation, grinding method using the releasing method, and grinding stone for use in the grinding method |
CN102365152A (en) * | 2009-05-25 | 2012-02-29 | 工程株式会社 | Plier |
KR101290778B1 (en) * | 2010-11-03 | 2013-07-29 | 주식회사 세한텍 | Polishing Wheel for grinding of sheet glass edge and its manufacturing method |
KR101192157B1 (en) * | 2010-12-07 | 2012-10-17 | 지앤피테크놀로지 주식회사 | Polishing roller apparatus for display panel, semiconductor substrate, etc. |
CN110465699A (en) * | 2018-05-10 | 2019-11-19 | 三星显示有限公司 | Chamfer machining wheel and the chamfer processing method and device with chamfer machining wheel |
KR20190130090A (en) * | 2018-05-10 | 2019-11-21 | 삼성디스플레이 주식회사 | Chamfering wheel, chamfering apparatus comprising the same, and method of manufacturing display apparatus using the same |
KR102586040B1 (en) * | 2018-05-10 | 2023-10-10 | 삼성디스플레이 주식회사 | Chamfering wheel, chamfering apparatus comprising the same, and method of manufacturing display apparatus using the same |
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