CN110299297B - Silicon wafer test bench - Google Patents
Silicon wafer test bench Download PDFInfo
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- CN110299297B CN110299297B CN201810247686.2A CN201810247686A CN110299297B CN 110299297 B CN110299297 B CN 110299297B CN 201810247686 A CN201810247686 A CN 201810247686A CN 110299297 B CN110299297 B CN 110299297B
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- silicon wafer
- transfer arm
- lifter
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The invention relates to a silicon wafer test bench which comprises a workbench, a calibrator and a transmitter, wherein the calibrator comprises a base, a base and a base; the calibrator is used for adjusting the angle of the silicon wafer to be detected on the workbench, and the workbench is used for detecting the minority carrier lifetime of the silicon wafer to be detected; the workstation includes stage body, lifter and fixed frame are installed on the stage body, the position of lifter is in the fixed frame, the lifter for the stage body with fixed frame reciprocates. Fixed frame on the workstation is arranged in the silicon chip of fixed detection, avoids the silicon chip slides in the testing process and leads to silicon chip surface damage has effectually been avoided the minority carrier lifetime of silicon chip reduces, the lifter is used for going up and down the silicon chip is convenient for place and take out the silicon chip.
Description
Technical Field
The invention relates to the technical field of semiconductors, in particular to a silicon wafer test bench.
Background
The minority carrier lifetime is one of important indexes for judging the perfection of the silicon wafer, so that the minority carrier lifetime of the silicon wafer is very important to test.
In the prior art, a silicon wafer test bench is usually used for testing the minority carrier lifetime, the quality and the like of a silicon wafer, but in the testing process, a component on the silicon wafer test bench can cause the silicon wafer to generate pollutants or damage the silicon wafer, so that the minority carrier lifetime of the silicon wafer is influenced, and the minority carrier lifetime of the silicon wafer is reduced.
Therefore, it is urgently needed to provide a silicon wafer testing platform to solve the problem that the silicon wafer is easily damaged and generates pollutants during the detection, so that the minority carrier lifetime is reduced.
Disclosure of Invention
The invention aims to provide a silicon wafer test bench to solve the problem that the minority carrier lifetime is reduced due to the fact that a silicon wafer is easily damaged and pollutants are generated during detection.
In order to achieve the above object, the present invention provides a silicon wafer testing table, comprising a worktable, a calibrator and a transmitter;
the calibrator is used for adjusting the position of the silicon wafer to be detected on the workbench, and the workbench is used for detecting the silicon wafer to be detected;
the workstation includes stage body, lifter and fixed frame are installed on the stage body, the lifter is located in the fixed frame, the lifter can for fixed frame reciprocates.
Optionally, in the silicon wafer test bench, be provided with threely in the fixed frame the lifter, the lifter has first end and second end, the first end embedding of lifter is in the stage body, the lifter with surface vertical on the stage body, three in the fixed frame the lifter is triangle-shaped and sets up.
Optionally, in the silicon wafer test bench, after the lifting rod is lifted, the second end of the lifting rod is higher than the fixed frame, and after the lifting rod is lowered, the second end of the lifting rod is flush with the bench body.
Optionally, in the silicon wafer testing platform, the calibrator includes an adjusting structure, and the adjusting structure is used to adjust the position of the silicon wafer to be tested.
Optionally, in the silicon wafer test bench, the calibrator further includes a detection structure, and the detection structure is configured to detect a position of the silicon wafer to be detected.
Optionally, in the silicon wafer testing table, the conveyor includes a base, a first conveying arm and a second conveying arm;
the first conveying arm is movably arranged on the base; the second transfer arm is movably mounted on the first transfer arm.
Optionally, in the silicon wafer testing table, the first transfer arm has a first end and a second end, the first end of the first transfer arm is rotatably connected to the base, and the second end of the first transfer arm is rotatably connected to the second transfer arm.
Optionally, in the silicon wafer testing table, the second transfer arm has a first end and a second end, the first end of the second transfer arm is rotatably connected to the second end of the first transfer arm, and the first end of the second transfer arm overlaps the second end of the first transfer arm; the second end of the second transfer arm is provided with a notch.
Optionally, in the silicon wafer testing table, a fixing device is disposed at the notch of the second transfer arm.
Optionally, in the silicon wafer testing table, a vacuum chuck is arranged on the second transfer arm.
In the silicon wafer test bench provided by the invention, the fixing frame on the workbench is used for fixing a silicon wafer in test, so that the silicon wafer surface damage caused by slippage in the test process is avoided; according to the invention, the silicon wafer is prevented from being fixed by installing the vacuum air hole on the workbench, so that the pollution caused by fixing the silicon wafer by the vacuum air hole is effectively reduced, the minority carrier lifetime of the silicon wafer cannot be influenced in the detection process, the lifting rod is used for lifting the silicon wafer, the silicon wafer is convenient to place and take out, and the silicon wafer cannot be damaged in the process of placing and taking out the silicon wafer.
Drawings
FIG. 1 is a schematic structural diagram of a silicon wafer test bench according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a workbench according to an embodiment of the present invention;
FIG. 3 is a schematic diagram of a transmitter according to an embodiment of the present invention;
wherein, 1-a workbench; 2-a conveyor; 3-a calibrator; 11-a fixed frame; 12-a lifting rod; 21-a base; 22-a first transfer arm; 23-a second transfer arm; 24-vacuum chuck; 25-a notch; 26-a connecting device; 27-fixing the device.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. Advantages and features of the present invention will become apparent from the following description and claims. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Referring to fig. 1, fig. 2 and fig. 3, fig. 1 is a schematic structural diagram of a silicon wafer testing platform according to an embodiment of the present invention; FIG. 2 is a schematic structural diagram of a workbench according to an embodiment of the present invention; fig. 3 is a schematic structural diagram of a transmitter according to an embodiment of the present invention.
The invention provides a silicon wafer test bench which comprises a workbench 1, a calibrator 3 and a transmitter 2; the conveyor 2 is used for picking up a silicon wafer to be detected and conveying the picked silicon wafer to be detected to the workbench 1, the calibrator 3 is used for adjusting the position of the silicon wafer to be detected on the workbench 1, and the workbench 1 is used for detecting the silicon wafer to be detected.
Generally, the silicon wafer test bench is used for detecting the quality, minority carrier lifetime and the like of a silicon wafer to be detected, for example, if the minority carrier lifetime of the silicon wafer is affected, a trace is left on a minority carrier lifetime map.
Preferably, the worktable 1 is provided with fixing frames 11 of different models, and the fixing frames 11 are used for fixing silicon wafers to be detected of different models and sizes, so that various silicon wafers do not slip in the detection process.
Referring to fig. 2, a fixed frame 11 on the worktable 1 protrudes the outline of the fixed frame 11 on the worktable 1, and the outline of the fixed frame 11 is slightly higher than that of the worktable 1. The size of the fixing frame 11 can be determined according to the sizes of silicon wafers of different models, so that the size of the fixing frame 11 can just accommodate the silicon wafer to be detected, the effect of fixing the silicon wafer to be detected is achieved, the silicon wafer to be detected cannot slide on the workbench 1, and the requirement that the surface of the silicon wafer to be detected is not damaged in the detection process is met.
In the silicon wafer testing table provided by the embodiment of the invention, three lifting rods 12 are arranged in the fixed frame 11, each lifting rod 12 has a first end and a second end, the first ends of the lifting rods 12 are embedded in the table body, the lifting rods 12 are perpendicular to the upper surface of the table body, and the three lifting rods 12 in the fixed frame 11 are arranged in a triangular shape.
Preferably, the lifting rod 12 is lifted in a manner similar to a pole of a retractable umbrella, and can be extended, wherein the lifting rod 12 is lifted when the lifting rod is extended, and can be shortened, and the lifting rod 12 is lowered when the lifting rod is shortened.
Further, after the lifting rod 12 is lifted, the second end of the lifting rod 12 is higher than the fixing frame 11, and after the lifting rod 12 is lowered, the second end of the lifting rod 12 is flush with the platform body. If the second end of the lifting rod 12 rises above the workbench 1, the conveyor 2 can place or take away the silicon wafer conveniently, and if the second end of the lifting rod 12 falls to be flush with the workbench 1, the silicon wafer to be detected can be detected more accurately.
In the silicon wafer test bench provided by the embodiment of the present invention, the calibrator 3 includes an adjusting structure, and the adjusting structure is used for adjusting the position of the silicon wafer to be tested. After the calibrator 3 determines the orientation of the silicon wafer to be detected, the position of the silicon wafer is adjusted according to the detection requirement, so that the detection accuracy of the silicon wafer is improved.
Further, the calibrator 3 further comprises a detection structure, and the detection structure is used for detecting the position of the silicon wafer to be detected. Specifically, the calibrator 3 emits X-rays to calibrate the position of the silicon wafer to be detected; at present, infrared rays are mostly used for irradiating and penetrating through the silicon wafer to be detected to position the silicon wafer to be detected, after the infrared rays penetrate through the silicon wafer to be detected, light rays irradiate into the outline of the fixing frame 11, the infrared rays in the fixing frame 11 are not easy to calibrate, after the X rays irradiate the silicon wafer to be detected, the light rays cannot penetrate through the silicon wafer to be detected, the X rays reflect out the X rays from the surface of the silicon wafer to be detected, the silicon wafer to be detected can be calibrated according to the included angle between the reflected X rays and the silicon wafer to be detected, and the silicon wafer to be detected is favorably and more accurately positioned.
Referring to fig. 3, the conveyor 2 includes a base 21, a first conveying arm 22 and a second conveying arm 23; the first transfer arm 22 is movably mounted on the base 21, and the first transfer arm 22 can move relative to the base 21; the second transfer arm 23 is movably mounted on the first transfer arm 22; the second transfer arm 23 is movable relative to the first transfer arm 22.
Preferably, the material of the two transfer arms and the base 21 can be metal or other chemical materials, the height of the base 21 is determined according to the height of the laboratory workbench 1, the thickness of the two transfer arms is also determined according to specific requirements, and the conveyor 2 can be set as a rotary folding device; such as the shape of the fan ribs of a foldable fan, the blades of a foldable fruit knife and the housing, may be superposed by means of a rotation by means of the intermediate connecting device 26. The conveyer 2 is designed in a rotary folding mode, the conveying range is wide, and occupied land is saved.
Further, in the silicon wafer testing table, two ends of the first transfer arm 22 are respectively a first end and a second end, the first end of the first transfer arm 22 is rotatably connected to the base 21 through a connecting device 26, and the second end of the first transfer arm 22 is rotatably connected to the second transfer arm 23 through a connecting device 26.
Preferably, the shape of the first transfer arm 22 may be an ellipse or a rectangle, etc., and the transfer arm may be as long as possible to make the transfer range wider. The first transfer arm 22 of the present invention can function to increase the transfer distance, and if the transfer distance required in the laboratory is shorter, the first transfer arm 22 can be eliminated, and if the transfer distance is longer, the number of the intermediate transfer arms can be increased according to the requirement.
Further, in the silicon wafer testing table, two ends of the second transfer arm 23 are respectively a first end and a second end, the first end of the second transfer arm 23 is rotatably connected to the second end of the first transfer arm 22 through a connection device 26, the first end of the second transfer arm 23 is overlapped on the second end of the first transfer arm 22, and the silicon wafer to be tested can be transferred to a destination by rotating around the connection device 26 when the silicon wafer to be tested is transferred.
Further, the conveyor 2 can rotationally move the second transfer arm 23 by rotating the connecting device 26 of the first transfer arm 22 and the second transfer arm 23; the conveyor 2 can move the two transfer arms in rotation by rotating the connecting device 26 of the first transfer arm 22 with the base 21. The position of the base 21 of the conveyor 2 in the present invention may be fixed or may be movable.
Preferably, the second end of the second transfer arm 23 is provided with a notch 25. The notch 25 can be configured as a circular-arc notch 25 with a larger amplitude, or can be configured as a rectangular notch 25; the silicon wafer taking device has the advantages that the silicon wafer taking device is more convenient to take out and place, and the surface of the silicon wafer cannot be damaged when the silicon wafer is taken out and placed.
In the silicon wafer testing station provided by the embodiment of the present invention, a fixing device 27 is disposed at the notch 25 of the second transfer arm 23. The conveyor 2, during the process of conveying the silicon wafer to be detected, is placed on the second conveying arm 23, and by providing a fixing device 27 at the notch 25, the silicon wafer to be detected is more stable on the second conveying arm 23. Preferably, a fixing frame 11 is used as the fixing device 27, and after the silicon wafer to be detected is taken out by the conveyor 2, the silicon wafer to be detected is fixed by the fixing device 27, so that slippage and sliding of the silicon wafer to be detected in the conveying process are avoided, and damage and pollution to the silicon wafer to be detected are avoided.
Preferably, a vacuum chuck 24 is disposed on the second transfer arm 23. Under the condition that the silicon wafer to be detected is small, the vacuum chuck 24 is adopted to adsorb the silicon wafer to be detected, so that the effect of fixing the silicon wafer to be detected is achieved.
In the silicon wafer test bench provided by the embodiment of the invention, the working process is as follows: the conveyor 2 takes out the silicon wafer to be detected from the silicon wafer box, fixes the silicon wafer on the conveyor 2, conveys the taken silicon wafer to be detected to the workbench 1, calibrates the position of the silicon wafer to be detected on the workbench 1 through the detection structure on the calibrator 3, adjusts the position of the silicon wafer to be detected by adopting the adjustment structure, and adjusts the position to a detection state, and the workbench 1 detects the silicon wafer to be detected.
In summary, in the silicon wafer test bench provided by the invention, the fixing frame on the workbench is used for fixing the silicon wafer in test, so that the silicon wafer surface damage caused by slippage in the test process is avoided; according to the invention, the silicon wafer is prevented from being fixed by installing the vacuum air hole on the workbench, so that the pollution caused by fixing the silicon wafer by the vacuum air hole is effectively reduced, the minority carrier lifetime of the silicon wafer cannot be influenced in the detection process, the lifting rod is used for lifting the silicon wafer, the silicon wafer is convenient to place and take out, and the silicon wafer cannot be damaged in the process of placing and taking out the silicon wafer.
The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (9)
1. The silicon wafer test bench is characterized by comprising a workbench, a calibrator and a transmitter; the calibrator is used for radiating X rays to the surface of the silicon wafer to be detected and adjusting the position of the silicon wafer to be detected on the workbench according to an included angle between the X rays reflected by the surface of the silicon wafer to be detected and the silicon wafer to be detected, and the workbench is used for detecting the silicon wafer to be detected; the workstation includes stage body, lifter and fixed frame, the stage body is used for bearing wait to detect the silicon chip, lifter and fixed frame are installed on the stage body, the lifter is located in the fixed frame, the lifter can for fixed frame reciprocates, wherein, be provided with threely in the fixed frame the lifter, the lifter has first end and second end, the first end embedding of lifter is in the stage body, the lifter with stage body upper surface is perpendicular, the lifter is retractable, works as the lifter rises the back, the second end of lifter is higher than fixed frame, the lifter falls the back, the second end of lifter with the stage body flushes.
2. The silicon wafer testing bench of claim 1, wherein three of said lift pins in said fixed frame are arranged in a triangular configuration.
3. The silicon wafer test bench of claim 1 wherein said aligner comprises adjustment structure for adjusting the position of said silicon wafer to be tested.
4. The silicon wafer test bench of claim 3 wherein said calibrator further comprises a sensing structure for sensing the position of said silicon wafer to be tested.
5. The wafer test stand of claim 1, wherein said conveyor comprises a base, a first transfer arm, and a second transfer arm; the first conveying arm is movably arranged on the base; the second transfer arm is movably mounted on the first transfer arm.
6. The silicon wafer test bench of claim 5 wherein said first transfer arm has a first end and a second end, said first end of said first transfer arm being pivotally connected to said base, said second end of said first transfer arm being pivotally connected to said second transfer arm.
7. The wafer test station of claim 6, wherein said second transfer arm has a first end and a second end, said first end of said second transfer arm being pivotally connected to said second end of said first transfer arm, said first end of said second transfer arm being superposed on said second end of said first transfer arm; the second end of the second transfer arm is provided with a notch.
8. The silicon wafer test bench of claim 7 wherein said second transfer arm is provided with a fixture at the notch.
9. The silicon wafer testing station of claim 7, wherein said second transfer arm is provided with a vacuum chuck.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810247686.2A CN110299297B (en) | 2018-03-23 | 2018-03-23 | Silicon wafer test bench |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810247686.2A CN110299297B (en) | 2018-03-23 | 2018-03-23 | Silicon wafer test bench |
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| CN110299297A CN110299297A (en) | 2019-10-01 |
| CN110299297B true CN110299297B (en) | 2022-02-15 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101677077A (en) * | 2008-09-18 | 2010-03-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Manipulator and wafer processing process |
| CN203746813U (en) * | 2014-03-07 | 2014-07-30 | 福建安特微电子有限公司 | Novel silicon wafer supporting tray of silicon wafer testing machine |
| CN104183515A (en) * | 2013-05-24 | 2014-12-03 | 标准科技股份有限公司 | Wafer testing machine stand |
| CN104275701A (en) * | 2013-07-08 | 2015-01-14 | 株式会社安川电机 | Suction structure, robot hand and robot |
| CN206931569U (en) * | 2017-06-22 | 2018-01-26 | 珠海市中芯集成电路有限公司 | Wafer sort platform |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100474124C (en) * | 2006-08-16 | 2009-04-01 | 上海华虹Nec电子有限公司 | Multi-platform photolithographic machine silicon chip horizontal control and automatic focusing system and implement method thereof |
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- 2018-03-23 CN CN201810247686.2A patent/CN110299297B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101677077A (en) * | 2008-09-18 | 2010-03-24 | 北京北方微电子基地设备工艺研究中心有限责任公司 | Manipulator and wafer processing process |
| CN104183515A (en) * | 2013-05-24 | 2014-12-03 | 标准科技股份有限公司 | Wafer testing machine stand |
| CN104275701A (en) * | 2013-07-08 | 2015-01-14 | 株式会社安川电机 | Suction structure, robot hand and robot |
| CN203746813U (en) * | 2014-03-07 | 2014-07-30 | 福建安特微电子有限公司 | Novel silicon wafer supporting tray of silicon wafer testing machine |
| CN206931569U (en) * | 2017-06-22 | 2018-01-26 | 珠海市中芯集成电路有限公司 | Wafer sort platform |
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| CN110299297A (en) | 2019-10-01 |
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