CN110234788A - Sedimentary origin and precipitation equipment with this sedimentary origin - Google Patents
Sedimentary origin and precipitation equipment with this sedimentary origin Download PDFInfo
- Publication number
- CN110234788A CN110234788A CN201880007893.9A CN201880007893A CN110234788A CN 110234788 A CN110234788 A CN 110234788A CN 201880007893 A CN201880007893 A CN 201880007893A CN 110234788 A CN110234788 A CN 110234788A
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- Prior art keywords
- sedimentary origin
- diffusion container
- diffusion
- container
- deposition materials
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- 238000001556 precipitation Methods 0.000 title claims description 35
- 239000000463 material Substances 0.000 claims abstract description 126
- 238000009792 diffusion process Methods 0.000 claims abstract description 114
- 230000008021 deposition Effects 0.000 claims abstract description 112
- 238000010438 heat treatment Methods 0.000 claims abstract description 90
- 239000000758 substrate Substances 0.000 claims abstract description 68
- 238000001704 evaporation Methods 0.000 claims abstract description 25
- 238000001816 cooling Methods 0.000 claims description 17
- 230000008020 evaporation Effects 0.000 claims description 9
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 239000011777 magnesium Substances 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 230000008878 coupling Effects 0.000 abstract description 9
- 238000010168 coupling process Methods 0.000 abstract description 9
- 238000005859 coupling reaction Methods 0.000 abstract description 9
- 238000009434 installation Methods 0.000 abstract description 3
- 238000000151 deposition Methods 0.000 description 97
- 238000003892 spreading Methods 0.000 description 9
- 238000000034 method Methods 0.000 description 7
- 238000012423 maintenance Methods 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 229910001026 inconel Inorganic materials 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/40—Thermal treatment, e.g. annealing in the presence of a solvent vapour
Abstract
It is arranged on according to the sedimentary origin of present disclosure inside the processing chamber for hydatogenesis material, deposition materials is deposited on substrate.Sedimentary origin includes: diffusion container, and the diffusion container has predetermined length and limits diffusion space wherein, and the deposition materials through evaporating are spread in the diffusion space；At least one opening, at least one opening are formed in the diffusion container；Nozzle segment, the nozzle segment is coupled to the opening of diffusion container and multiple nozzles including the longitudinal direction setting along diffusion container, to be infused in the deposition materials spread in diffusion container；And heating part, the heating part is mounted on the outside of the diffusion container and including heater and heat shielding part, the heater is configured to heat the deposition materials being contained in the diffusion container by heating the diffusion container, and the heat shielding is partially surrounded the heater installation and dissipated outward with the heat for preventing heater from generating.It is assumed that be bottom surface with the opposite surface in part of nozzle segment coupling in diffusion container, multiple nozzles are arranged into linearly to be spaced apart with the longitudinal centre line of the bottom surface of diffusion container.Therefore, utilization rate of the sedimentary origin in terms of the arrangement of deposition chamber can be improved, and the uniformity of film deposition can be improved.
Description
Technical field
This disclosure relates to for evaporating the sedimentary origin and packet that are used for the deposition materials of formation film on the surface of the substrate
Include the precipitation equipment of the sedimentary origin.
Background technique
Precipitation equipment refers to existing for example, by chemical vapor deposition (CVD), physical vapour deposition (PVD) (PVD) or vapor deposition
The table of substrate (chip, the substrate for manufacturing LCD or the substrate for manufacturing OLED that are such as used for producing the semiconductor devices)
The device of film is formed on face.
In addition, in the case where the substrate for manufacturing OLED, commonly using by being evaporated in the deposition of deposition materials
Organic substance, inorganic substances and metal etc. and the technique for forming film on a surface of a substrate.
The precipitation equipment that film is formed by hydatogenesis material includes the deposit cavity for wherein loading deposition target base plate
Room and the sedimentary origin that deposition materials are evaporated to substrate for heating deposition material.Precipitation equipment executes wherein hydatogenesis
Material to form the processing substrate of film on the surface of the substrate.
In addition, sedimentary origin used in precipitation equipment is component, the component is mounted on inside deposition chambers and by adding
Heat deposition material carrys out hydatogenesis material so that deposition materials are evaporated to substrate.Depending on method of evaporating and various structures, can adopt
Disclosed in Korean Patent Publication No. 10-2009-0015324 and 10-2004-0110718 etc. those.
Particularly, with productivity and the demand of larger panel, the substrate for manufacturing OLED has been expanded, has also expanded
Precipitation equipment.Therefore, it is necessary to a kind of structure of optimization, the structure of the optimization can be such that widened precipitation equipment executes for depositing
The depositing operation of uniform film.However, carrying out the depositing operation for deposit homogeneous film in the presence of existing structure is difficult with
Problem.
In addition, substrate is expanded when two or more deposition materials are mixed or are synthesized and are deposited on the surface of the substrate
Greatly and it is accordingly used in evaporating the increase of the interval between the source of corresponding deposition materials.Therefore, because two kinds cannot successfully be carried out
Or more deposition materials mixing or synthesis, thus exist be difficult to form the vapor-deposited film with required physical property
Problem.
In addition, there are the following problems in conventional precipitation equipment: when needing to safeguard after using precipitation equipment, leading to
Separation sedimentary origin is crossed to execute processing needed for maintenance and be difficult.
Summary of the invention
Technical problem
Present disclosure is proposed to solve the above-mentioned problems, and is to provide a kind of deposition dress in terms of present disclosure
It sets, the precipitation equipment includes sedimentary origin and is provided with multiple nozzles and is configured to provide for the deposition materials through evaporating
The diffusion container of diffusion space sinks so that can equably spread before injecting the deposition materials through evaporating from nozzle through what is evaporated
Product material.
The another aspect of present disclosure is to provide a kind of sedimentary origin, and the sedimentary origin is linear sources, wherein heavy in configuration
It is arranged to the center line from the bottom surface of linear sources by the nozzle linear arrangement for being used to inject deposition materials and by nozzle when product source
Side is deviated to, so that the utilization of sedimentary origin can be improved for the arrangement of the sedimentary origin in deposition chambers.
The another aspect of present disclosure is to provide a kind of precipitation equipment, and the precipitation equipment includes being configured to evaporation to sink
Product material is with a pair of of linear deposit source for being deposited on deposition materials on substrate and positioned at the center in the pair of linear deposit source
Multiple nozzles between line, to minimize the interval between the pair of sedimentary origin.
The another aspect of present disclosure is to provide a kind of precipitation equipment, wherein the deposition materials for heating deposition source
Heating part be configured at least two heating components, at least two heating component can wherein multiple nozzles through coupling so that
It can promote to be coupled to each other or separate on the direction for safeguarding sedimentary origin, it is heavy to reduce installation by separated heating component as needed
Maintenance cost needed for product device.
Technical solution
According to present disclosure, a kind of sedimentary origin 200 being arranged in inside processing chamber 100, the sedimentary origin are provided
200 are used for hydatogenesis material so that deposition materials are deposited on substrate S.Sedimentary origin includes: diffusion container 210, the diffusion
Container 210 has predetermined length and limits diffusion space wherein, and the deposition material through evaporating is spread in the diffusion space
Material；At least one opening., at least one opening, which is formed in, to spread in container 210；Nozzle segment 220, the nozzle segment
220 are coupled to the opening of diffusion container 210 and multiple nozzles including the longitudinal direction setting along diffusion container 210, with
Just the deposition materials spread in diffusion container 210 are infused in；And heating part, the heating part are mounted on diffusion container
210 outside and including heater 230 and heat shielding part 240, the heater 230 are configured to hold by heating diffusion
Device 210 come heat be contained in diffusion container 210 in deposition materials, 240 around the heater 230 of heat shielding part and install
To prevent heat caused by heater 230 from dissipating outward.It is assumed that the portion coupled in diffusion container 210 with nozzle segment 220
The surface of split-phase pair is bottom surface, and the center of multiple nozzles is spaced apart with the longitudinal centre line 1 of the bottom surface of diffusion container 210,
And multiple nozzles are arranged in face of substrate S.
Sedimentary origin 200 can further comprise deposition material supplying part 300, and the deposition material supplying part 300 is through matching
Be set to accommodate deposition materials and be coupled to diffusion container 210 side, so as to by deposition material supplying to spread container 210.
Heating part may be configured at least two heating components, and at least two heating component can be coupled in multiple nozzles
Direction on be coupled to each other or separate.
Heat shielding part 240 may include being arranged in outside heater 230 to expand with the heat direction that will be dissipated from heater 230
Dissipate the reflector 242 that container 210 reflects and the cooling segment 244 being arranged in outside reflector 242.
Diffusion container 210 can have with the perpendicular rectangular cross-sectional shape of longitudinal direction of the diffusion container 210 and
Any one of trapezoidal cross sectional shape.
Diffusion container 210 can have the trapezoidal cross sectional shape perpendicular with the longitudinal direction of the diffusion container 210, expand
Dissipating container 210 has relative to a side of the inclined bottom surface of the diffusion container 210 and perpendicular to the surplus of the bottom surface
Remaining side.
Heat shielding part 240 can have shape corresponding with the trapezoidal cross sectional shape for spreading container 210.
Heating part may include being mounted on bottom surface and perpendicular to the first heating group on the remaining side of the bottom surface
Part 250 and the second heating component 260 being mounted on other two surface, and the first heating component 250 can be along
Multiple nozzles are coupled to the direction of diffusion container 210 and are coupled to the second heating component 260 or divide with the second heating component 260
From.
According to present disclosure, a kind of precipitation equipment is provided, the precipitation equipment includes: processing chamber 100, the work
Skill chamber 100 is configured to provide the space that deposition materials are deposited on substrate S；And according to claim 1 to any one of 8
A pair of of sedimentary origin 200, the pair of sedimentary origin 200 is configured to hydatogenesis material, so that deposition materials deposit to
On substrate S.Multiple nozzles are located between the center line 1 of the pair of sedimentary origin 200, and the pair of sedimentary origin 200 can evaporate
Different deposition materials.
It can be silver by the deposition materials of the sedimentary origin evaporation in a pair of of sedimentary origin 200, and be steamed by remaining sedimentary origin
The deposition materials of hair can be magnesium.
Advantageous effect of the invention
According to present disclosure, precipitation equipment includes sedimentary origin and diffusion container, and the diffusion container is provided with multiple sprays
It mouth and is configured to provide diffusion space for the deposition materials through evaporating.Therefore, by injecting the deposition through evaporating from nozzle
The uniformity of film can be improved by equably spreading the deposition materials through evaporating before material.
According to present disclosure, sedimentary origin is linear sources, wherein when configuring sedimentary origin, for injecting the spray of deposition materials
Mouth is by linear array, and nozzle is set into from the center line of the bottom surface of linear sources and deviates to side.Therefore, with regard to deposition chambers
In sedimentary origin arrangement for, the utilization of sedimentary origin can be improved.
According to present disclosure, precipitation equipment includes: a pair of of linear deposit source, and the pair of linear deposit source is configured to
Hydatogenesis material, so that deposition materials are deposited on substrate；With multiple nozzles, the multiple nozzle is located at described to linear heavy
Between the center line in product source.Therefore, the interval between a pair of of sedimentary origin can be minimized.
In addition, the heating part of the deposition materials for heating deposition source is configured at least two according to present disclosure
A heating component, at least two heating component can be coupled to each other or separate on the direction that multiple nozzles couple, so that
It can promote the maintenance of sedimentary origin.Therefore, maintenance needed for installation precipitation equipment can be reduced by separated heating component as needed
Cost.
Brief description of the drawings
According to the specific descriptions hereafter in conjunction with attached drawing, the above and other aspects, features and advantages of present disclosure will
Become obvious, in which:
Fig. 1 is the vertical cross-section view according to the precipitation equipment of the embodiment of present disclosure；
Fig. 2 is the vertical cross-section view according to the precipitation equipment of another embodiment of present disclosure；
Fig. 3 is the vertical cross-section view of the sedimentary origin of the precipitation equipment of Fig. 1；
Fig. 4 is the cross-sectional view of the direction the I-I interception of the sedimentary origin of the precipitation equipment along Fig. 1；And
Fig. 5 is the cross-sectional view for showing a part of the configuration of sedimentary origin of Fig. 4.
Specific embodiment
Hereinafter, formula describes the embodiment of present disclosure with reference to the accompanying drawings.Fig. 1 is the implementation according to present disclosure
The vertical cross-section view of the precipitation equipment of example, Fig. 2 are the vertical cross according to the precipitation equipment of another embodiment of present disclosure
Sectional view, and Fig. 3 is the vertical cross-section view of the sedimentary origin 200 of the precipitation equipment of Fig. 1.Fig. 4 is the heavy of the precipitation equipment along Fig. 1
The cross-sectional view of the direction the I-I interception in product source 200, and Fig. 5 is the transversal of a part for the configuration of sedimentary origin 200 for showing Fig. 4
Face figure.
As shown in Figure 1, being for deposition materials to be deposited on substrate S according to the precipitation equipment of the embodiment of present disclosure
On device, but the precipitation equipment can configure in various ways.
According to one embodiment, precipitation equipment can include: processing chamber 100, the processing chamber 100 are configured to provide
Space for being deposited on deposition materials on substrate S；Sedimentary origin 200, the sedimentary origin 200 are mounted in processing chamber 100
And it is configured to hydatogenesis material, so that deposition materials are deposited on substrate S.
Substrate S to be processed is substrate S (such as oled substrate and LCD for needing to carry out processing substrate by vapor deposition
Substrate), and the substrate S to be processed can be configured in various ways.For example, substrate can be configured into individually transfer or sit
Transfer etc. in the state of falling on carrier 20.
Processing chamber 100 is to provide the component for being configured to the space being deposited on deposition materials on substrate S, and can be to institute
It states processing chamber 100 and carries out various configurations.
In one embodiment, processing chamber 100 may be configured with container, the container define scheduled inner space and
It is provided at least one door, so that substrate S can pass in and out the inner space by the door.
In addition, processing chamber 100 may include exhaust apparatus, so that the pressure in processing chamber 100 is maintained at predetermined water
It is flat.
On the other hand, substrate S being transported into and transporting and can be executed by robot (not shown) relative to processing chamber 100,
It can be executed in the state that substrate S is seated on carrier 20.
According to one embodiment, substrate S is transported into and is transported relative to processing chamber 100 when being executed by robot (not shown)
When out, support section (not shown) can be provided in processing chamber 100 with supporting substrate S.
According to another embodiment, substrate S can carried relative to being transported into and transporting for processing chamber 100 in substrate S setting
It is executed in the state of on body 20.
Carrier 20 is to be mounted to moveable component in the state that substrate S is disposed thereon and can have various configurations.
According to one embodiment, as shown in Figure 1, carrier 20 may include attract and the electrostatic chuck of fixed substrate S and to
The power applying portion (not shown) etc. of electrostatic chuck application DC power.
Electrostatic chuck is the component when substrate S is shifted by carrier through electrostatic gravitational attraction and fixed substrate S.Electrostatic chuck
Power is received from the power applying portion being arranged in the carrier 20 or external DC power supply to generate electrostatic force.
Meanwhile carrier 20 can be with various methods (such as move horizontally and vertically move) come transfer base substrate S.
At this point, processing chamber 100 may be provided with the shifting for supporting simultaneously mobile vehicle 20 according to the moving method of substrate S
Dynamic structure.
According to one embodiment, processing chamber 100 may be provided with moving structure, and the moving structure is relative to carrier 20
Moving direction its opposite side at support carrier 20 so that carrier 20 is also moved down in horizontality when substrate S is moved horizontally
It is dynamic.
It according to another embodiment,, can be by linearly moving when substrate S is vertically moved as shown in Figure 1 in processing chamber 100
Dynamic leader 410 and magnetic force generate part 430 and carry out transfer base substrate, and the linear movement leader 410 supports carrier 20
Lower part so that carrier 20 can linear movement, and the magnetic force generate part 430 by with magnetic that the top of carrier 20 is set
Reactive means 22 are in the magnetic force of contactless state to keep the vertical of the carrier 20 in processing chamber 100 and can linear movement shape
State.
Linear movement leader 410 be installed in processing chamber 100 in order to can linear movement, and the linear movement
Leader 410 can have various structures according to the method for the lower part of support carrier 20.
As an example, linear movement leader 410 may include support carrier 20 lower part multiple transferring rollers and
At least one transferring roller being coupled in multiple transferring rollers is to drive the driving motors 420 of multiple transferring rollers.
Specifically, linear movement leader 410 may be mounted so that at least one of multiple transferring rollers shift
The rotary shaft of roller is couple to driving motor 420 to drive multiple transferring rollers.
Herein, when magnetic response component 22 by include can the material of magnetized magnetic material is formed in magnetic field when, magnetic response
Component 22 is formed as various structures and shape.
Magnetic response component 22 may include the magnetic material with excellent hot properties.
In addition, magnetic response can be installed by being coupled in a transverse direction of carrier 20 support section 24 outstanding
Component 22.
At this point, magnetic response component 22 can be by being configured to maintain the supporting element 24 of the horizontal position of carrier 20 to support.
As long as support section 24 is mounted on the upside of carrier 20, so that magnetic response component 22 is able to maintain the horizontal position of carrier 20
It sets, then support section 24 can have various structures.
As an example, support section 24 can be protruded in a transverse direction of carrier 20 with 22 coupling of magnetic response component
It connects.
Sedimentary origin 200 is to be mounted in processing chamber 100 and hydatogenesis material is so that deposition materials are deposited on substrate S
Component.
Sedimentary origin 200, which can be configured into, carrys out hydatogenesis material to just moving in processing chamber 100 with stationary state
Substrate S carrys out hydatogenesis material while mobile relative to the fixed substrate S in processing chamber 100.
About rectangular substrate S, the direction for being parallel to side can be used as longitudinal direction to form sedimentary origin 200, it is described
Side is relative to substrate S and perpendicular to its moving direction.
As an example, sedimentary origin 200 is to be evaporated according to sedimentary condition including organic material, inorganic material and metal material
Material at least one of deposition materials component, and the sedimentary origin 200 may include wherein with deposition materials crucible with
And the heater 230 of the heating crucible.
According to one embodiment, sedimentary origin 200 is so-called linear sources, and the sedimentary origin 200 can include: is had predetermined
The diffusion container 210 of length, the diffusion container 210 include at least one opening and form the deposition materials through evaporating wherein
The diffusion space of diffusion；With the opening coupling in diffusion container 210 and including the more of the longitudinal direction setting along diffusion container 210
A nozzle spreads the nozzle segment 220 of the deposition materials spread in container 210 to be infused in；Heater 230, the heater
230 are mounted on the outside of diffusion container 210 to heat diffusion container 210, so that heating is contained in the deposition in diffusion container 210
Material；And the heating part 230 including heat shielding part 240, the heat shielding part 240 are mounted around heater 230
To prevent from the conduct heat away that heater 230 generates to outside.
Diffusion container 210 is the component with predetermined length, and the component is included therein at least one opening to be formed
And the space for the deposition materials that diffusion will be deposited on substrate S is provided and can be configured in various ways.
The material of diffusion container 210 is determined according to the physical property of deposition materials, and as long as material can bear high temperature
Any material can be used.
It is formed in addition, diffusion container 210 can have various shape (such as rectangular shape and cylindrical shape) and have
At least one opening on one side with nozzle segment 220 to couple.
Opening may be formed in diffusion container 210, to be coupled on the side towards substrate S with nozzle segment 220, so that
The deposition materials evaporated in diffusion container 210 are injected by nozzle.
Nozzle segment 220 is that injection is coupled and be set to the opening in diffusion container 210 to evaporate from diffusion container 210
Deposition materials component.
In addition, nozzle segment 220 may include multiple nozzles of the longitudinal direction setting along diffusion container 210.
Multiple nozzles are set along the longitudinal direction of diffusion container 210, and the multiple nozzle is configured to injection from expansion
The deposition materials that container 210 evaporates are dissipated, so that the deposition materials through evaporating are deposited on substrate S.
The material of nozzle can be any one of tantalum, stainless steel, titanium and inconel (inconel).
At this point, can be parallel to the side vertical with the moving direction of substrate S arranges multiple nozzles, the moving direction is phase
For rectangular substrate S.
Heating part is to be installed around diffusion container 210 to heat and evaporate the deposition being contained in diffusion container 210
The component of material, and the component can be configured in various manners.
According to one embodiment, container 210 is spread to heat in the outside that heating part can be mounted on to diffusion container 210,
To evaporation be contained in diffusion container 210 in deposition materials, or by the deposition materials through evaporating be maintained at predetermined temperature to
So that the deposition materials through evaporating will not be condensed into liquid.
Specifically, heating part can include: be mounted on the heater 230 outside diffusion container 210 and held with heating diffusion
Device 210, so that heating is contained in the deposition materials in diffusion container 210；And around the heat shielding part that heater 230 is installed
240, to prevent from the conduct heat away that heater 230 generates to outside.
Heater 230 includes the generating component of such as hot line etc to generate heat when supplying power from outside, and
The heater 230 is mounted on around diffusion container 210.However, various configurations can be carried out to heater 230.
Heat shielding part 240 is configured to prevent from the conduct heat away that heater 230 generates to outside, and can be to the heat
Shielded segment 240 carries out various configurations.
Other than heat shielding part 240 may be provided at the nozzle opening in addition to being formed in the nozzle segment 220 of diffusion container 210
Entire residual surface on.
As an example, heat shielding part 240 can include: the reflector 242 outside heater 230 is set, it will be from adding
The heat that hot device 230 exhales is reflected towards diffusion container 210；With the cooling segment 244 being arranged in outside reflector 242.
Reflector 242 is to be mounted on outside the hot line of heater 230 to surround hot line and reflect and give off from heater 230
Heat to prevent heat to be dissipated into external component, and the reflector 242 can be configured in various manners.
Reflector 242 may be configured with reflecting plate, and the reflecting plate is made of the metal of such as tantalum, A 1N, P B N or tungsten, but
It is without being limited thereto.
Certainly, reflector 242 is not present disclosure an indispensable part.
Cooling segment 244 is to be mounted on outside 210 outside of diffusion container or reflector 242 to prevent from producing from heater 230
Raw heat to external diverging to which the component that 210 side of container is cooled to predetermined temperature will be spread, and can be to the cooling segment
244 carry out various configurations.
The various cooling systems of such as air cooling system or water cooling system etc can be applied to cooling segment 244.
Cooling segment 244 can be used various configurations and (such as be built in cooling plate and coolant flows through the cold of its
But module), with the cooling heat generated by heater 230.
Meanwhile according to the sedimentary origin of present disclosure 200 can further comprise deposition materials accommodating portion, the deposition material
Material accommodating portion accommodates deposition materials and is coupled to the side of diffusion container 210 so that deposition materials are provided to diffusion container
210。
Deposition material supplying part 300 is configured to accommodate deposition materials wherein, and the deposition material supplying portion
Divide 300 sides other than with a surface of the nozzle segment coupling of diffusion container 210 for being coupled to diffusion container 210,
So that deposition material supplying is extremely spread container 210, and the deposition material supplying part 300 can be configured in various ways.
Deposition material supplying part 300 can be couple to diffusion container 210 in plumbness as shown in figures 1 and 3
Lower surface.
Deposition material supplying part 300 may include the heating part being arranged in around diffusion container 210.
Be arranged in the heating part around deposition material supplying part 300 can be mounted on diffusion container 210 in heating
Part is integrally formed or can be configured to individual components.
It can include the deposition materials in deposition material supplying part 300 by heating part evaporation, thus by the deposition
Material supply extremely diffusion container 210.
The instruction of reference label 302 being not described above is fixed and supports the supporting member of deposition material supplying part 300.
In the embodiments of the present disclosure, it has been described that will be deposited by individual deposition material supplying part 300
Material supply extremely spreads the structure of container 210.Alternatively, it can will be deposited in the case where no deposition material supplying part 300
It is contained in diffusion container 210, and its evaporation is made by heating part.
On the other hand, depositing operation is depended on, it may be necessary to two or more deposition materials be mixed and be deposited on base
On plate S.
For this purpose, processing chamber 100 may include two or more sedimentary origins, the two or more sedimentary origins are arranged
At corresponding to corresponding deposition materials.
According to one embodiment, precipitation equipment may include one for the different deposition materials in evaporation technology chamber 100
To sedimentary origin 200.
According to more specific embodiment, the deposition materials by the sedimentary origin evaporation in a pair of of sedimentary origin 200 are silver, and
The deposition materials evaporated by remaining sedimentary origin 200 can be magnesium.
On the other hand, in order to form good deposition film, it is necessary to equably mix two or more deposition materials, and
In such cases, it is expected that minimizing the interval between multiple sedimentary origins, the multiple sedimentary origin evaporates different depositions respectively
Material.
According to one embodiment, as the interval minimized between multiple sedimentary origins for evaporating different deposition materials respectively
Method, multiple nozzles in nozzle segment 220 can be located between the center line 1 of a pair of of sedimentary origin 200.
The knot being located between the center line 1 in a pair of of evaporator source 200 as multiple nozzles in wherein nozzle segment 220
Structure, when assuming that the surface towards the part coupled in diffusion container 210 with nozzle segment 220 is bottom surface, multiple nozzles can
It is arranged to be spaced apart with the longitudinal centre line 1 of the bottom surface of diffusion container 210.
According to specific embodiment, the distance between each nozzle segment 220 w can for 20mm (or bigger) and 200mm (or
It is smaller).
Meanwhile as shown in Figure 1 and Figure 4, diffusion container 210 can have the square vertical with the longitudinal direction for spreading container 210
Any one of shape shape and trapezoidal cross sectional shape.
According to the embodiment of Fig. 1, the trapezoidal cross vertical with the longitudinal direction for spreading container 210 can be had by spreading container 210
Cross sectional shape.In this case, a side surface for spreading container 210 is tilted relative to bottom surface, spreads the another of container 210
One side surface is perpendicular to bottom surface.In addition, forming opening in the surface opposite with bottom surface, and nozzle segment 220 couples
To opening.
When sedimentary origin 200 has above structure, the nozzle in the nozzle segment 220 between deposited adjacent source 200 can be made
Between interval minimize.
In addition, when the interval between the nozzle in the nozzle segment 220 between deposited adjacent source 200 minimizes, from each
The deposition materials of a sedimentary origin evaporation are sufficiently mixed each other, so that can be deposited on substrate S through mixed deposition materials, thus
Uniform deposition film is formed on substrate S.
Meanwhile when needing to safeguard in the sedimentary origin 200 described in the embodiment of present disclosure, sedimentary origin 200
Component needs are separated from each other.
Therefore, in the sedimentary origin 200 according to present disclosure, heating part may be configured at least two heating components,
Described two heating components can be coupled to each other or separate on the coupling direction of multiple nozzles.
Specifically, heating part may be configured with the first heating including primary heater 230a and the first heat shielding part
Component 250 and the second heating component 260 including secondary heater 230b and the second heat shielding part.
First heating component 250 can be configured to include primary heater 230a and the first shielded segment individual module.
First heat shielding part of the first heating component 250 may include the first reflector 242a and the first cooling segment
244a。
Similarly, the second heating component 260 may include individual module, the individual module include secondary heater 230b and
Second heat shielding part.
Second heat shielding part of the second heating component 260 may include the second reflector 242b and the second cooling segment
244b。
At this point, the first heating component 250 and the second heating component 260 can configure independently of one another, and may be connected to different
Power supply is to receive power.
As shown in figure 5, the interference of nozzle in order to prevent, the first heating component 250 and the second heating component 260 can spread
It is formed on the longitudinal direction of container 210, each other with the direction for the opening being coupled to along nozzle segment 220 in diffusion container 210
Coupling or separation.
In addition, heating part can have for example corresponding to expansion when spreading container 210 has such as trapezoidal cross sectional shape
Dissipate the trapezoidal shape of the trapezoidal shape of container 210.
When spreading container 210 has quadrangle (rectangle or trapezoidal) cross-sectional shape, the first heating component 250 and second
Longitudinal boundary between heating component 260 can be parallel to the longitudinal direction of diffusion container 210,250 He of the first heating component
It is the cross about diffusion container 210 that the boundary between second heating component 260, which can form (but not exclusively being formed),
The diagonal line in section.
That is, the boundary between the first heating component 250 and the second heating component 260 is formed as being parallel to diffusion container
The side of 210 cross section.
For example, when spreading container 210 has the trapezoidal cross sectional shape vertical with longitudinal direction, it can be by the first heating group
The bottom surface and diffusion container 210 that diffusion container 210 is arranged in part 250, and can perpendicular on the side surface of the bottom surface
Second heating component 260 is mounted on remaining two surfaces.
Therefore, the first heating component 250 can be coupled to the direction of diffusion container 210 along multiple nozzles and add to be couple to second
Hot component 260 is separated with the second heating component 260.
First heating component 250 and the second heating component 260 can be coupled to each other according to various coupling schemes.
As an example, the first heating component 250 and the second heating component 260, which can have, is formed in the first cooling segment 244a
And step structure 246,246a and 246b in the second boundary between cooling segment 244b, so that the first heating component 250
With the second heating component 260 (but present disclosure is without being limited thereto) coupled to each other.
Step structure 246,246a and the 246b of first heating component 250 and the second heating component 260 are formed as
Be coupled to each other on nozzle segment 220 and the direction that is coupled to each other of diffusion container 210 or be separated from each other.
It include multiple heating components 250 and 260, the multiple heating component 250 according to the sedimentary origin 200 of present disclosure
With 260 be coupled to each other on nozzle segment 220 and the direction that is coupled to each other of diffusion container 210 or be separated from each other.Therefore, can hold
It changes places the separation of heating component 250 and 260 without interfering other component, so as to be easy to carry out internal diffusion 210 He of container
The maintenance of nozzle segment 220.
Particularly, when substrate S is introduced into processing chamber 100 with plumbness, for sedimentary origin 200 to be isolated
The door of processing chamber 100 is also disposed on the side surface of processing chamber 100.In this case, due to the heating of sedimentary origin 200
Component 250 and 260 can be coupled to each other or separate on the direction that nozzle segment 220 and diffusion container 210 are coupled to each other, therefore have
Following advantages: the composability and work convenience of sedimentary origin 200 be can further improve.
Meanwhile although Fig. 1, which is shown, vertically moves substrate S's (that is, when substrate S is moved horizontally under upright state)
Embodiment, such as when moving substrate S makes the surface in the upper part that processing chamber 100 is arranged in face-down as shown in Figure 2,
But sedimentary origin can be mounted in the lower part of processing chamber 100.
At this point, the nozzle in nozzle segment 220 may be configured as towards substrate S (that is, deposition materials are evaporated upwards), and deposit
Material supply part 300 may be coupled to the apparent surface (lower surface) opposite with the surface of the coupling of nozzle segment 220, will deposit
Material supply extremely diffusion container 210.
Claims (12)
1. a kind of sedimentary origin, the sedimentary origin is arranged in processing chamber, the processing chamber for hydatogenesis material so as to
The deposition materials are deposited on substrate, the sedimentary origin includes:
Container is spread, the diffusion container has scheduled length and limits diffusion space in the diffusion container, in institute
It states and spreads the deposition materials through evaporating in diffusion space, at least one opening is formed in the diffusion container；And
Nozzle segment, the nozzle segment are coupled to the opening of the diffusion container and including along the diffusion containers
Longitudinal direction setting multiple nozzles, to be infused in the deposition materials that spread in the diffusion container,
Wherein assume that a part of opposite surface coupled with the nozzle segment in the diffusion container is bottom surface, it is described
The center of multiple nozzles is spaced apart with the longitudinal centre line of the bottom surface of the diffusion container, and the multiple nozzle quilt
It is arranged to face to the substrate.
2. sedimentary origin as described in claim 1, further comprises:
Deposition material supplying part, the deposition material supplying part are configured to accommodate the deposition materials and are coupled to institute
The side of diffusion container is stated, so as to by the deposition material supplying to the diffusion container.
3. sedimentary origin as described in claim 1, further comprises:
Heating part, the heating part are mounted on the outside of the diffusion container,
Wherein the heating part includes: heater, and the heater is configured to by heating the diffusion container to add
Heat is accommodated in the deposition materials in the diffusion container；And heat shielding part, the heat shielding part are installed as ring
Around the heater to prevent the heat generated from the heater from dissipating outward.
4. sedimentary origin as claimed in claim 3, wherein the heating part is configured at least two heating components, it is described at least
Two heating components can be coupled to each other or separate on the direction that the multiple nozzle couples.
5. sedimentary origin as claimed in claim 3, wherein the heat shielding part includes: reflector, the reflector setting exists
The outside of the heater from the heat that the heater dissipates towards the diffusion container will reflect；And cooling end
Point, the outside of the reflector is arranged in the cooling segment.
6. sedimentary origin as described in claim 1 hangs down wherein the diffusion container has with the longitudinal direction of the diffusion container
Any one of straight rectangular cross-sectional area shape and trapezoidal cross sectional shape.
7. sedimentary origin as claimed in claim 3, wherein the diffusion container has the longitudinal direction side with the diffusion container
To vertical trapezoidal cross sectional shape, the diffusion container has the inclined side of bottom surface relative to the diffusion container
Surface and another side surface vertical with the bottom surface.
8. sedimentary origin as claimed in claim 7, wherein the heat shielding part, which has, spreads the described trapezoidal of container with described
The corresponding shape of cross-sectional shape.
9. sedimentary origin as claimed in claim 7, wherein the heating part includes: the first heating component, first heating
Component is mounted on the bottom surface and perpendicular on another side surface of the bottom surface；And second heating component, it is described
Second heating component is mounted on remaining two surface, and
First heating component can be coupled to the direction of the diffusion container along multiple nozzles and be coupled to described second and add
Hot component is separated with second heating component.
10. a kind of precipitation equipment, comprising:
Processing chamber, the processing chamber are configurable to provide the space being deposited on deposition materials on substrate；And
A pair of sedimentary origin according to any one of claim 1 to 9, the pair of sedimentary origin are configured to evaporate described heavy
Product material, so that the deposition materials are deposited to the substrate,
Wherein the multiple nozzle is located between the center line of the pair of sedimentary origin.
11. precipitation equipment as claimed in claim 10, wherein the pair of sedimentary origin evaporates different deposition materials.
12. precipitation equipment as claimed in claim 10, wherein by the institute of the sedimentary origin evaporation in the pair of sedimentary origin
Stating deposition materials is silver, and is magnesium by the deposition materials that remaining sedimentary origin evaporates.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020170010482A KR20180086714A (en) | 2017-01-23 | 2017-01-23 | Deposition source and deposition apparatus having the same |
| KR10-2017-0010482 | 2017-01-23 | ||
| PCT/KR2018/000805 WO2018135858A1 (en) | 2017-01-23 | 2018-01-17 | Deposition source and deposition apparatus having the same |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110234788A true CN110234788A (en) | 2019-09-13 |
Family
ID=62908356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201880007893.9A Pending CN110234788A (en) | 2017-01-23 | 2018-01-17 | Sedimentary origin and precipitation equipment with this sedimentary origin |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR20180086714A (en) |
| CN (1) | CN110234788A (en) |
| TW (1) | TW201840876A (en) |
| WO (1) | WO2018135858A1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111118452A (en) * | 2020-01-15 | 2020-05-08 | 鄂尔多斯市源盛光电有限责任公司 | Evaporation device and evaporation equipment |
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| CN1320172A (en) * | 1998-11-12 | 2001-10-31 | 福来克斯产品公司 | Vapor source having linear aperture and coating process |
| KR100659762B1 (en) * | 2005-01-17 | 2006-12-19 | 삼성에스디아이 주식회사 | Vapor deposition source and evaporating apparatus and method for deposition using the same |
| KR20120124889A (en) * | 2011-05-06 | 2012-11-14 | 주식회사 에스에프에이 | Thin layers deposition apparatus and linear type evaporator using thereof |
| CN104099571A (en) * | 2013-04-01 | 2014-10-15 | 上海和辉光电有限公司 | Evaporation source component, film deposition device and film deposition method |
| KR20150034455A (en) * | 2013-09-26 | 2015-04-03 | 주식회사 선익시스템 | A Linear Type Evaporator for Large Area Substrates |
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Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20060060994A (en) * | 2004-12-01 | 2006-06-07 | 삼성에스디아이 주식회사 | Deposition source and deposition apparatus therewith |
| JP4440837B2 (en) * | 2005-01-31 | 2010-03-24 | 三星モバイルディスプレイ株式會社 | Evaporation source and vapor deposition apparatus employing the same |
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2017
- 2017-01-23 KR KR1020170010482A patent/KR20180086714A/en unknown
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2018
- 2018-01-17 WO PCT/KR2018/000805 patent/WO2018135858A1/en active Application Filing
- 2018-01-17 CN CN201880007893.9A patent/CN110234788A/en active Pending
- 2018-01-18 TW TW107101776A patent/TW201840876A/en unknown
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1320172A (en) * | 1998-11-12 | 2001-10-31 | 福来克斯产品公司 | Vapor source having linear aperture and coating process |
| KR100659762B1 (en) * | 2005-01-17 | 2006-12-19 | 삼성에스디아이 주식회사 | Vapor deposition source and evaporating apparatus and method for deposition using the same |
| KR20120124889A (en) * | 2011-05-06 | 2012-11-14 | 주식회사 에스에프에이 | Thin layers deposition apparatus and linear type evaporator using thereof |
| CN104099571A (en) * | 2013-04-01 | 2014-10-15 | 上海和辉光电有限公司 | Evaporation source component, film deposition device and film deposition method |
| KR20150034455A (en) * | 2013-09-26 | 2015-04-03 | 주식회사 선익시스템 | A Linear Type Evaporator for Large Area Substrates |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111118452A (en) * | 2020-01-15 | 2020-05-08 | 鄂尔多斯市源盛光电有限责任公司 | Evaporation device and evaporation equipment |
| CN111118452B (en) * | 2020-01-15 | 2022-04-08 | 鄂尔多斯市源盛光电有限责任公司 | Evaporation device and evaporation equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201840876A (en) | 2018-11-16 |
| WO2018135858A1 (en) | 2018-07-26 |
| KR20180086714A (en) | 2018-08-01 |
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