CN111118452B

CN111118452B - Evaporation device and evaporation equipment

Info

Publication number: CN111118452B
Application number: CN202010041394.0A
Authority: CN
Inventors: 贾晓晨; 关立伟; 刘锦东; 张学政
Original assignee: BOE Technology Group Co Ltd; Ordos Yuansheng Optoelectronics Co Ltd
Current assignee: BOE Technology Group Co Ltd; Ordos Yuansheng Optoelectronics Co Ltd
Priority date: 2020-01-15
Filing date: 2020-01-15
Publication date: 2022-04-08
Anticipated expiration: 2040-01-15
Also published as: CN111118452A

Abstract

The invention provides an evaporation device and evaporation equipment, belongs to the technical field of evaporation, and can solve the problem that a main material and a doping material in the existing evaporation device are not uniformly doped. The evaporation apparatus of the present invention comprises: a housing, a plurality of crucibles in the housing, and a plurality of first nozzles; the crucible includes: the crucible cover is positioned on the crucible main body; the first nozzle is arranged on the crucible cover; the evaporation device further comprises: a plurality of baffles in spaced relation; a plurality of through holes are formed in the baffle, and the aperture of each through hole is smaller than that of the first nozzle; at least a portion of the first nozzle is defined between the baffle and the crucible cover with a distance from an adjacent baffle on the first nozzle.

Description

Evaporation device and evaporation equipment

Technical Field

The invention belongs to the technical field of evaporation, and particularly relates to an evaporation device and evaporation equipment.

Background

At present, an organic light emitting material layer in a display panel is generally formed by an evaporation method, and in order to improve the purity, efficiency and stability of a red material and a blue material, a host material is mainly doped to obtain the red material and the blue material with better purity, luminous efficiency and stability. In the evaporation equipment, a main material and a doping material are sprayed out through a nozzle after being gasified or sublimated, and then the spraying directions of the materials are adjusted and changed through an angle plate, so that the two materials are fully doped and then evaporated on a glass substrate.

The inventor finds that at least the following problems exist in the prior art: in the production process, the crucible nozzle is easy to block, and the like, so that the doping of the main material and the doping material is uneven, and the stability and the production efficiency of the product are reduced. In the production process, a crucible in the evaporation device is of a hollow structure, an external heating wire heats the crucible, the heating wire is easy to deform due to the fact that the traditional crucible is heated only by the heating wire, the temperature uniformity of the crucible is poor, the overall temperature uniformity is 10% -20%, and the uneven material sprayed by a nozzle causes uneven doping of a main material and a doping material.

Disclosure of Invention

The present invention is directed to at least one of the technical problems of the prior art, and provides an evaporation apparatus and an evaporation apparatus.

The technical scheme adopted for solving the technical problem of the invention is an evaporation device, which comprises: a housing, a plurality of crucibles in the housing, and a plurality of first nozzles; the crucible includes: the crucible cover is positioned on the crucible main body; the first nozzle is arranged on the crucible cover; the evaporation apparatus further includes: a plurality of baffles in spaced relation;

a plurality of through holes are formed in the baffle, and the aperture of each through hole is smaller than that of the first nozzle;

at least a portion of the first nozzle is defined between the baffle and the crucible cover with a distance from the baffle adjacent the first nozzle.

Optionally, the first nozzle penetrating part of the baffle is defined between two adjacent baffles and has a certain distance with the adjacent baffles on the first nozzle.

Optionally, the position of the baffle plate adjacent to the first nozzle, which corresponds to the first nozzle, is closed.

Optionally, the evaporation apparatus further comprises: the cover plate, the second nozzle and the angle plate;

the cover plate is positioned on the shell;

the second nozzle is arranged on the cover plate;

the angle plates are located on two sides of the second nozzle, and one end, far away from the cover plate, of each angle plate protrudes out of one end, far away from the cover plate, of the second nozzle.

Optionally, the evaporation apparatus further comprises a partition; the crucibles are positioned between the shell and the partition plate and between two adjacent partition plates; the shell and the partition plate are of hollow structures;

heating wires are arranged in the shell and the partition board;

solid salt is filled between the shell and the heating wires and between the partition board and the heating wires.

Optionally, the solid salt comprises: an inorganic salt or a mixture of inorganic salts.

Optionally, the solid salt comprises: 50 percent of potassium nitrate and 50 percent of sodium nitrite.

Optionally, the heating wire comprises: a metal wire and an insulating layer;

the insulating layer is coated outside the metal wire.

The technical scheme adopted for solving the technical problem of the invention is evaporation equipment which comprises a plurality of evaporation devices.

Optionally, the second nozzles of the plurality of evaporation devices are arranged linearly.

Drawings

FIG. 1 is a schematic side view of an evaporation apparatus according to the prior art;

FIG. 2 is a schematic side view of an evaporation apparatus according to an embodiment of the present invention;

fig. 3 is a schematic top view of an evaporation apparatus according to an embodiment of the present invention.

Wherein the reference numerals are: 10-glass substrate, 101-shell, 102-crucible, 1021-crucible body, 1022-crucible lid, 103-first nozzle, 104-angle plate, 105-heating wire, 106-baffle, 1061-through hole, 107-cover plate, 108-second nozzle, 109-baffle, and 110-solid salt.

Detailed Description

In order to make the technical solutions of the present invention better understood, the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.

Fig. 1 is a schematic side view of an evaporation apparatus in the prior art, as shown in fig. 1, the evaporation apparatus includes: a housing 101, a plurality of crucibles 102 and a plurality of first nozzles 103 located in the housing 101; the crucible 102 includes: a crucible main body 1021 and a crucible cover 1022 located on the crucible main body 1021; the first nozzle 103 is provided on the crucible cover 1022. In practical application, a main body material is contained in part of the crucible main body 1021, a doping material is contained in part of the crucible main body 1021, after heating, the main body material and the doping material are gasified or sublimated to form a main body material gas and a doping material gas, the main body material gas and the doping material gas are ejected out through the first nozzle 103 on the crucible cover 1022, the running directions of the main body material gas and the doping material gas are changed by the angle plate 104, and finally the main body material gas and the doping material gas are evaporated on the glass substrate 10 on the evaporation device, so that doping of the main body material and the doping material is realized. However, the first nozzle 103 is easily clogged during the production process, so that the host material and the dopant material are not uniformly doped, resulting in a decrease in product stability and production efficiency. In the production process, the crucible main body 1021 is of a hollow structure, the heating wire 105 is adopted to heat the crucible main body 1021 outside, the crucible main body 1021 is heated only by the heating wire 105, the heating wire 105 is easy to deform, the temperature uniformity of the crucible main body 1021 is poor, the overall temperature uniformity is 10% -20%, and therefore the main body material and the doping material are not uniformly doped due to the fact that the material sprayed out of the first nozzle 103 is not uniform. In order to solve the problem of uneven doping of a host material and a doping material in the prior art, the invention provides an evaporation device and evaporation equipment, and the evaporation device and the evaporation equipment provided by the invention are further described in detail with reference to the accompanying drawings and the specific embodiments.

Example one

Fig. 2 is a schematic side view of an evaporation apparatus according to an embodiment of the present invention, and as shown in fig. 2, the evaporation apparatus includes: a housing 101, a plurality of crucibles 102 and a plurality of first nozzles 103 located in the housing 101; the crucible 102 includes: a crucible main body 1021 and a crucible cover 1022 located on the crucible main body 1021; the first nozzle 103 is provided on the crucible cover 1022. The evaporation device further comprises: a plurality of spaced baffles 106. The baffle 106 is provided with a plurality of through holes 1061, and the aperture of the through holes 1061 is smaller than that of the first nozzle 103. At least a portion of the first nozzle 103 is defined between the baffle 106 and the crucible cover 1022 with a distance from the adjacent baffle 106 on the first nozzle 1022.

In practical applications, the number of crucibles 102 may be set appropriately according to the types and concentrations of the host material and the dopant material, and the relative positions between the crucibles 102 may be set arbitrarily. In the embodiment of the present invention, three crucibles 102 are taken as an example, wherein the crucible body 1021 of the middle crucible 102 contains doping material, the crucible bodies 1021 of the two crucibles 102 at two sides contain main material, and the number of the spaced baffles 106 is two.

In the evaporation apparatus according to the embodiment of the present invention, the host material and the dopant material in each crucible main body 1021 can be heated and then ejected from the corresponding first nozzle 103. Wherein a portion of the first nozzles 103 is defined between the baffle plates 106 and the plane of the crucible cover 1022, i.e., the end of the first nozzles 103 remote from the crucible cover 1022 is below the respective baffle plate 106. After the gas formed by vaporization or sublimation is ejected from the first nozzle 103, each baffle 106 can block the gas so that the gas ejected from the first nozzle 103 is blocked in the space formed by the baffles 106 and the plane of the crucible cover 1022, and is sufficiently mixed in the space. And a plurality of through holes 1061 are formed in the baffle 106, and the diameter of the through holes 1061 is smaller than that of the first nozzle 103, and a certain distance, which may be a small distance, is formed between the first nozzle 103 and the adjacent baffle 106 on the first nozzle 103, as long as it is ensured that the first nozzle 103 is not blocked by the adjacent baffle 106 thereon. The gas which is fully mixed in the space formed by the plane of the baffle plate 106 and the crucible cover 1022 is led out through the through holes 1061 on the baffle plate 106. It is understood that spaces for mixing the various gases may also be formed between adjacent baffles 106. In the embodiment of the present invention, the plurality of baffles 106 are arranged to block the gas ejected from each first nozzle 103, so that the gases are mixed for multiple times until the gases are uniformly mixed, and then the mixed gases are led out through the through holes 1061 of the baffles 106 and evaporated onto the glass substrate 10 or a substrate made of other materials on the evaporation apparatus, so as to form a vapor deposition film layer with uniform texture, thereby preventing uneven doping of the host material and the dopant material due to the blockage of the first nozzle 103, and further improving the product stability and the production efficiency.

Optionally, the first nozzle 103 extends through a portion of the baffle 106, is defined between two adjacent baffles 106, and is spaced apart from adjacent baffles 106 on the first nozzle 103.

It should be noted that, in a specific example, a first nozzle 103 in the middle of the three first nozzles 103 penetrates through the baffle 106 near the plane of the crucible cover 1022, and a certain distance is provided between the middle first nozzle 103 and the adjacent baffle 106, so that the first nozzle 103 is defined between the two baffles 106, and after the gas ejected from the two first nozzles 103 on the two sides is uniformly mixed, the gas is guided into the space formed between the two baffles 106 through the through holes 1061 on the baffles 106. At this time, the gas ejected from the middle first nozzle 103 and the gas ejected from the two first nozzles 103 on both sides are mixed in the space formed between the two baffle plates 106 until all the gases ejected from the three first nozzles 103 are uniformly mixed and are discharged from the through holes 1061 of the baffle plates 106. In this way, uniform mixing of multiple gases can be achieved.

Alternatively, the adjacent baffle 106 on the first nozzle 103 is closed at the position corresponding to the first nozzle 103.

Optionally, the baffle 106 adjacent to the first nozzle 103 may block the gas ejected from the first nozzle 103, in order to make the baffle 106 block the gas ejected from the first nozzle 103 more sufficiently, the position of the baffle 106 adjacent to the first nozzle 103, which corresponds to the first nozzle 103, may be set in a closed manner, so that the gas is led out from the through holes 1061 at other positions after being sufficiently mixed, and the multiple kinds of gas ejected from the first nozzle 103 are mixed more uniformly.

Optionally, the evaporation apparatus further comprises: a cover plate 107, a second nozzle 108, and an angle plate 104; the cover plate 107 is positioned on the housing 101; the second nozzle 108 is arranged on the cover plate 107; the angle plates 104 are disposed on two sides of the second nozzle 108, and an end of the angle plate 104 away from the cover plate 107 protrudes from an end of the second nozzle 108 away from the cover plate 107.

The various gases uniformly mixed and discharged through the through holes 1061 of the baffle plate 106 are collected in the space formed between the cover plate 107 and the baffle plate 106, and the gas uniformly mixed is discharged through the second nozzle 108 and deposited on the glass substrate 10 in the evaporation apparatus while maintaining a high gas pressure in the space. In practical application, the running angle of the ejected gas can be changed by adjusting the angle plates 104 on both sides of the second nozzle 108, so that the uniformly mixed gas is evaporated to a specified position on the glass substrate 10, and a desired display device film layer is formed.

Optionally, the evaporation apparatus further comprises a partition 109; the crucible 102 is positioned between the housing 101 and the partition plate 109 and between two adjacent partition plates 109; the housing 101 and the partition 109 are hollow structures; heating wires 105 are arranged in the casing 101 and the partition 109; solid salt 110 is filled between the outer casing 101 and the heating wire 105 and between the partition 109 and the heating wire 109.

It should be noted that, in practical applications, the crucible main body 1021 of the crucible 102 may be heated by the heating wire 109, the solid salt 110 may be melted by the heat generated by the heating wire 109, and the molten salt has a uniform heat conduction characteristic, so that each crucible main body 1021 is heated uniformly, and the main body material or the doping material contained in the crucible main body 1021 is gasified or sublimated. Meanwhile, the problem that the uniformity of heating of the crucible main body 1021 is poor due to deformation of the heating wire can be avoided.

Alternatively, solid salt 110 includes: an inorganic salt or a mixture of inorganic salts.

In the embodiment of the present invention, the solid salt 110 may be a pure inorganic salt, or a mixture of a plurality of inorganic salts. Some inorganic salt purities and various inorganic salt mixtures are given in table 1 as melting temperatures and use temperatures. The selection of the inorganic salt may be selected according to the vaporization temperature ranges of the host material and the dopant material. Specifically, the range of use of the selected inorganic salt needs to include the vaporization temperature ranges of the host material and the dopant material.

Table 1: component proportion and use temperature of common inorganic salt

Alternatively, solid salt 110 includes: 50 percent of potassium nitrate and 50 percent of sodium nitrite.

It should be noted that, in practical applications, an inorganic salt mixture composed of 50% by mass of potassium nitrate and 50% by mass of sodium nitrite may be selected, as can be seen from table 1, the use temperature of the inorganic salt mixture composed of 50% by mass of potassium nitrate and 50% by mass of sodium nitrite is 150 to 550 degrees celsius, the vaporization temperature of the organic luminescent material is generally 170 to 400 degrees celsius at present, and the use temperature of the inorganic salt mixture includes the vaporization temperature of the organic luminescent material, so that the inorganic salt mixture can meet the practical use requirements, and the uniform heating of the crucible main body 1021 can be ensured.

Optionally, the heating wire 105 comprises: a metal wire and an insulating layer; the insulating layer is coated outside the metal wire.

The metal wire and the inorganic salt can be isolated by the insulating layer, so that the inorganic salt is prevented from generating electrochemical reaction when the metal wire is electrified to denature and influence the heat conduction effect.

Example two

Based on the same inventive concept, the embodiment of the invention provides an evaporation device, which comprises a plurality of evaporation devices provided in the embodiment. Fig. 3 is a schematic view of a top view structure of an evaporation apparatus according to an embodiment of the present invention, and as shown in fig. 3, a plurality of second nozzles in the evaporation apparatus are linearly distributed, and the number and arrangement intervals of the second nozzles can be changed according to actual needs, so as to achieve evaporation of film layers with different line widths. It is understood that the arrangement of the second nozzles may also be changed according to actual needs, for example, the second nozzles are arranged in a non-linear manner to realize film layers with other shapes, which is not described in detail herein.

According to the evaporation equipment provided by the embodiment of the invention, the gas sprayed by each first nozzle can be blocked by arranging the plurality of baffles, so that various gases are mixed for multiple times until the gases are uniformly mixed, then are guided out through the through holes on the baffles and evaporated on the glass substrate on the evaporation device to form the evaporation film layer with uniform texture, and thus, the uneven doping of the main material and the doping material caused by the blockage of the first nozzles can be avoided, and the stability of the product and the production efficiency can be further improved. And, in practical application, can heat the crucible main part of crucible through giving the heater strip, the heat that the heater strip produced can melt solid-state salt to the melten state, and the salt of melten state has the characteristic of even heat conduction to make each crucible main part be heated evenly, do benefit to the gasification of the host material or the doping material who holds in the crucible main part or sublime. Meanwhile, the problem that the heating uniformity of the crucible body is poor due to the deformation of the heating wire can be avoided.

It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.

Claims

1. An evaporation apparatus comprising: a housing, a plurality of crucibles in the housing, and a plurality of first nozzles; the crucible includes: the crucible cover is positioned on the crucible main body; the first nozzle is arranged on the crucible cover; characterized in that, the evaporation plant still includes: a plurality of baffles in spaced relation;

the plurality of nozzles are different in height, a portion of the first nozzles are defined between the baffle plates and the crucible cover, and a portion of the first nozzles extend through a portion of the baffle plates, are defined between two adjacent baffle plates, and have a distance from the adjacent baffle plates on the first nozzles.

2. The evaporation apparatus as claimed in claim 1, wherein the adjacent baffle plate on the first nozzle is closed at a position corresponding to the first nozzle.

3. The evaporation apparatus of claim 1, further comprising: the cover plate, the second nozzle and the angle plate;

the cover plate is positioned on the shell;

the second nozzle is arranged on the cover plate;

4. The vaporization unit of claim 1, further comprising a baffle plate; the crucibles are positioned between the shell and the partition plate and between two adjacent partition plates; the shell and the partition plate are of hollow structures;

heating wires are arranged in the shell and the partition board;

5. The vaporization device of claim 4, wherein the solid salt comprises: an inorganic salt or a mixture of inorganic salts.

6. The vaporization device of claim 5, wherein the solid salt comprises: 50 percent of potassium nitrate and 50 percent of sodium nitrite.

7. The evaporation apparatus as claimed in claim 4, wherein the heating wire comprises: a metal wire and an insulating layer;

the insulating layer is coated outside the metal wire.

8. An evaporation apparatus comprising a plurality of evaporation devices according to any one of claims 1 to 7.

9. The vapor deposition apparatus according to claim 8, wherein the second nozzles of the plurality of evaporation devices are linearly arranged.