CN206289295U - A kind of linear evaporation source - Google Patents
A kind of linear evaporation source Download PDFInfo
- Publication number
- CN206289295U CN206289295U CN201621305299.2U CN201621305299U CN206289295U CN 206289295 U CN206289295 U CN 206289295U CN 201621305299 U CN201621305299 U CN 201621305299U CN 206289295 U CN206289295 U CN 206289295U
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- China
- Prior art keywords
- crucible
- evaporation source
- flow distribution
- plate
- linear evaporation
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- 230000008020 evaporation Effects 0.000 title claims abstract description 42
- 238000001704 evaporation Methods 0.000 title claims abstract description 42
- 238000010438 heat treatment Methods 0.000 claims abstract description 21
- 239000011368 organic material Substances 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 238000007747 plating Methods 0.000 abstract description 6
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000011031 large-scale manufacturing process Methods 0.000 abstract description 3
- 229920001621 AMOLED Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 229910052571 earthenware Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model is related to evaporation source technical field, more particularly to a kind of linear evaporation source, including sealed crucible, nozzle and the mixed plate and flow distribution plate that are set in the crucible；The nozzle is connected with the crucible；The side of the mixed plate and flow distribution plate is tightly connected with the madial wall of the crucible；The passage of the connection heating chamber and hybrid chamber is offered in the center of the mixed plate；The through hole of the connection hybrid chamber and branch chamber is offered on the flow distribution plate.Goal of the invention of the present utility model is to provide a kind of plating film uniformity good linear evaporation source, the technical scheme lifting evaporation uniformity provided using the utility model, the utility model simple structure, device fabrication low cost is applicable to industrialize large-scale production and application.
Description
Technical field
The utility model is related to evaporation source technical field, more particularly to a kind of linear evaporation source.
Background technology
In large scale AMOLED (Active-matrix Organic Light-Emitting Diode, organic light emission two
Pole pipe) production in, it is necessary to carry out evaporation processing to AMOLED.Evaporation refers to that material to be filmed is placed in vacuum to be evaporated
Or distillation, it is allowed to the process separated out in workpiece or substrate surface.Evaporated device is main based on linear evaporation source evaporation, and its is main
Mode is to heat to heat up material in linear evaporation source in high vacuum conditions by heater strip, makes organic material from solid-state
Become gaseous state, ejected in the nozzle that gaseous state organic material passes through evaporation source, gaseous state organic material runs into normal above crucible
After warm substrate, sublimate to the cold in glass baseplate surface, complete evaporation processing.
The mode of heating of linear evaporation source is generally constant current heating, but because crucible diverse location resistance wire resistance has differences
Property, the heat of crucible diverse location and having differences property of temperature in crucible heating process, so that crucible diverse location distils
Organic gas molecular amounts and having differences property of temperature.The hot kinetic energy of organic molecule is inconsistent, so that diverse location nozzle sprays
The organic molecule evaporation rate for going out is different, causes plating film uniformity poor.
Utility model content
Goal of the invention of the present utility model is to provide a kind of plating film uniformity good linear evaporation source, new using this practicality
The heat and having differences property of temperature that the technical scheme that type is provided solves crucible diverse location cause organic point of nozzle ejection
The different technical problem of sub- evaporation rate.
In order to solve the above-mentioned technical problem, the utility model provides a kind of linear evaporation source, including for heating organic material
The sealed crucible of material, multiple nozzles for being arranged at the crucible upper shed and set in the crucible and sprayed with multiple
The parallel mixed plate and flow distribution plate of plane that mouth is formed；The nozzle is connected with the crucible；The mixed plate and flow distribution plate
Side be tightly connected with the madial wall of the crucible, and set gradually from the bottom of the crucible to upper shed, by the earthenware
Heating chamber, hybrid chamber and branch chamber are separated into crucible；The center of the mixed plate offer the connection heating chamber and
The passage of hybrid chamber；The uniform through hole for offering the connection hybrid chamber and branch chamber on the flow distribution plate.
Preferably, the shape of the mixed plate and flow distribution plate is consistent with the horizontal cross sectional geometry of the crucible.
Preferably, the mixed plate and flow distribution plate are shaped as rectangle.
Preferably, the bottom hollow out of the mixed plate, the passage is opened in the centre position on top；Or top is engraved
Sky, the passage is opened in the centre position of bottom.
Preferably, the size of the passage on the mixed plate is the 5%~30% of the mixed plate area of plane.
Preferably, one kind being shaped as in circular, oval and polygon of the passage.
Preferably, the bottom hollow out of the flow distribution plate, the through hole is distributed the bottom with the flow distribution plate, in intermediate symmetry
Distribution.
Preferably, the size of the through hole is 2mm~50mm.
Preferably, one or more be shaped as in circular, oval and polygon of the through hole.
Preferably, the mixed plate and flow distribution plate material are copper or titanium.
Therefore, using the technical scheme of the utility model embodiment, have the advantages that：The utility model is provided
Linear evaporation source offer passage in mixed plate center, evaporation gas reaches the different positions in equilibrium vaporization source by the passage
The effect of the temperature difference because of the uneven caused evaporation gas of heating is put, is consistent the organic steam temperature in hybrid chamber, so
Mixed organic steam is shunted by the flow distribution plate on top afterwards, make organic steam from nozzle discharge after, deposition it is organic thin
Evenly, lifting is deposited with uniformity to film；Plating film uniformity can reach within 2%；The utility model simple structure, device fabrication into
This is low, is applicable to industrialize large-scale production and application.
Brief description of the drawings
In order to illustrate more clearly of the utility model embodiment or technical scheme of the prior art, below will be to this practicality
The accompanying drawing to be used needed for new embodiment or description of the prior art is briefly described.Drawings in the following description are only
A part of embodiment of the present utility model, for those of ordinary skill in the art, is not paying the premise of creative work
Under, other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is the utility model embodiment sectional view.
Specific embodiment
Below in conjunction with the accompanying drawing in the utility model embodiment, the technical scheme in the utility model embodiment is carried out
It is explicitly described.
The mode of heating of linear evaporation source is generally constant current heating, the heat of crucible diverse location in crucible heating process
With having differences property of temperature so that crucible diverse location distillation organic gas molecular amounts and having differences property of temperature.Have
The hot kinetic energy of machine molecule is inconsistent, so that the organic molecule evaporation rate that diverse location nozzle sprays is different, causes plated film uniform
Property is poor.
Fig. 1 is referred to, in order to solve the above-mentioned technical problem, present embodiment discloses a kind of linear evaporation source, it includes earthenware
Crucible 10, nozzle 20, mixed plate 30 and flow distribution plate 40.
Bottom in crucible 10 is used to place and heat organic material, organic material is made from solid state sublimation into gaseous state, to keep away
Exempt from organic gas leakage, the crucible 10 need to be that sealing is set.
Nozzle 20 is arranged at the upper shed of crucible 10, and connect with crucible 10, and the quantity of nozzle 20 is multiple, and shape
Into a plane.
Mixed plate 30 and flow distribution plate 40 are arranged in crucible 10, and parallel with the plane that multiple nozzles 20 are formed, mixing
Plate 30 and flow distribution plate 40 set gradually from the bottom of crucible 10 to upper shed, will be separated into heating chamber 11, hybrid chamber in crucible 10
12 and branch chamber 13.
Due to the linear evaporation source in the course of the work, can be full of organic in heating chamber 11, hybrid chamber 12 and branch chamber 13
Gas, in order to avoid organic gas is leaked, the side of mixed plate 30 and flow distribution plate 40 is required to be sealed with the madial wall of crucible and connects
Connect.The shape of mixed plate 30 and flow distribution plate 40 is consistent with the horizontal cross sectional geometry of crucible 10.Crucible 10 is shaped as rectangle,
The shape of mixed plate 30 and flow distribution plate 40 is then corresponding rectangle.In order to avoid the high temperature in crucible 10 is to mixed plate 30
Impacted with flow distribution plate 40, mixed plate 30 and the material of flow distribution plate 40 can be the exotic materials such as copper or titanium.
The passage 31 of connection heating chamber 11 and hybrid chamber 12 is offered in the center of mixed plate 30；On flow distribution plate 40
The uniform through hole 41 for offering connection hybrid chamber 12 and branch chamber 13.
The size of the passage 31 wherein on mixed plate 30 is the 5%~30% of the area of plane of mixed plate 30, and its shape can
Think irregular shape, or regular shape, the one kind in such as circular, oval and polygon.Engrave the bottom of mixed plate 30
Sky, passage 31 is opened in the centre position on top；Or top hollow out, passage 31 is opened in the centre position of bottom.
The size of the through hole 41 on flow distribution plate 40 is 2mm~50mm, and its shape can be equally irregular shape, also may be used
Think regular shape, and unlike passage 31, the shape of the through hole 41 can exist simultaneously it is various, it is such as circular, oval and many
One or more in the shape of side.The bottom hollow out of flow distribution plate 40, the distribution of through hole 41 and the bottom of flow distribution plate 40, divide in intermediate symmetry
Cloth.
The linear evaporation source course of work that the present embodiment is provided is as follows, and solid organic materials are placed on into the bottom in crucible 10
Portion, i.e., in heating chamber 11, crucible 10 is heated to solid organic materials, organic material is become gaseous state from solid-state, organic
Gas is spread in whole heating chamber 11, due to the heat and having differences property of temperature of diverse location in crucible 10, causes heating
The hot kinetic energy of organic gas in chamber 11 is inconsistent, and the inconsistent organic gas of hot kinetic energy passes through from the passage 31 of mixed plate 30,
Tentatively mixed in passage 31, preliminary mixed organic gas further mixes after entering hybrid chamber 12, forms heat dynamic
Can consistent organic gas, then the through hole 41 for passing through flow distribution plate 40 so that the consistent organic gas of hot kinetic energy is evenly distributed on point
In stream chamber 13, the consistent organic gas of hot kinetic energy is sprayed by nozzle 20, synthesis speed identical organic gas beam so that evaporation
Speed is identical, improves plating film uniformity.
The linear evaporation source that the present embodiment is provided offers passage 31 in the center of mixed plate 30, and evaporation gas is by being somebody's turn to do
Passage 31 reaches equilibrium vaporization source diverse location because of the effect of the temperature difference of the uneven caused evaporation gas of heating, makes hybrid chamber 11
Interior organic steam temperature is consistent, and mixed organic steam is then shunted by the flow distribution plate 40 on top, is made organic
From after the discharge of nozzle 20, evenly, lifting is deposited with uniformity to the organic film of deposition to steam；Plating film uniformity can reach 2% with
It is interior；The utility model simple structure, device fabrication low cost is applicable to industrialize large-scale production and application.
Embodiments described above, does not constitute the restriction to the technical scheme protection domain.It is any in above-mentioned implementation
Modification, equivalent and improvement made within the spirit and principle of mode etc., should be included in the protection model of the technical scheme
Within enclosing.
Claims (10)
1. a kind of linear evaporation source, it is characterised in that：
The nozzle of the crucible upper shed is arranged at including the sealed crucible for heating organic material, multiple and described
Mixed plate and flow distribution plate set in crucible and parallel with the plane that multiple nozzles are formed；
The nozzle is connected with the crucible；
The side of the mixed plate and flow distribution plate is tightly connected with the madial wall of the crucible, and supreme from the bottom of the crucible
Opening sets gradually, and will be separated into heating chamber, hybrid chamber and branch chamber in the crucible；
The passage of the connection heating chamber and hybrid chamber is offered in the center of the mixed plate；
The uniform through hole for offering the connection hybrid chamber and branch chamber on the flow distribution plate.
2. a kind of linear evaporation source according to claim 1, it is characterised in that：
The shape of the mixed plate and flow distribution plate is consistent with the horizontal cross sectional geometry of the crucible.
3. a kind of linear evaporation source according to claim 2, it is characterised in that：
The mixed plate and flow distribution plate are shaped as rectangle.
4. a kind of linear evaporation source according to claim 1, it is characterised in that：
The bottom hollow out of the mixed plate, the passage is opened in the centre position on top；Or top hollow out, the passage opens
Located at the centre position of bottom.
5. a kind of linear evaporation source according to claim 4, it is characterised in that：
The size of the passage on the mixed plate is the 5%~30% of the mixed plate area of plane.
6. a kind of linear evaporation source according to claim 5, it is characterised in that：
One kind being shaped as in circle, oval and polygon of the passage.
7. a kind of linear evaporation source according to claim 1, it is characterised in that：
The bottom hollow out of the flow distribution plate, the through hole distribution and the bottom of the flow distribution plate, are distributed in intermediate symmetry.
8. a kind of linear evaporation source according to claim 7, it is characterised in that：
The size of the through hole is 2mm~50mm.
9. a kind of linear evaporation source according to claim 8, it is characterised in that：
One or more be shaped as in circle, oval and polygon of the through hole.
10. a kind of linear evaporation source according to claim 1, it is characterised in that：
The mixed plate and flow distribution plate material are copper or titanium.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621305299.2U CN206289295U (en) | 2016-11-30 | 2016-11-30 | A kind of linear evaporation source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201621305299.2U CN206289295U (en) | 2016-11-30 | 2016-11-30 | A kind of linear evaporation source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206289295U true CN206289295U (en) | 2017-06-30 |
Family
ID=59096200
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201621305299.2U Active CN206289295U (en) | 2016-11-30 | 2016-11-30 | A kind of linear evaporation source |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206289295U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111118452A (en) * | 2020-01-15 | 2020-05-08 | 鄂尔多斯市源盛光电有限责任公司 | Evaporation device and evaporation equipment |
| CN112575308A (en) * | 2019-09-29 | 2021-03-30 | 宝山钢铁股份有限公司 | Vacuum coating device capable of efficiently coating strip steel under vacuum |
| WO2021057921A1 (en) * | 2019-09-26 | 2021-04-01 | 宝山钢铁股份有限公司 | Vacuum plating device |
| CN113957392A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device adopting uniform mixing buffer structure to uniformly distribute metal steam |
| CN118222984A (en) * | 2024-01-15 | 2024-06-21 | 北京北方鸿瑞科技有限公司 | Linear evaporation source for downward evaporation |
-
2016
- 2016-11-30 CN CN201621305299.2U patent/CN206289295U/en active Active
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2021057921A1 (en) * | 2019-09-26 | 2021-04-01 | 宝山钢铁股份有限公司 | Vacuum plating device |
| CN112575308A (en) * | 2019-09-29 | 2021-03-30 | 宝山钢铁股份有限公司 | Vacuum coating device capable of efficiently coating strip steel under vacuum |
| WO2021057922A1 (en) * | 2019-09-29 | 2021-04-01 | 宝山钢铁股份有限公司 | Vacuum coating device |
| CN112575308B (en) * | 2019-09-29 | 2023-03-24 | 宝山钢铁股份有限公司 | Vacuum coating device capable of efficiently coating strip steel under vacuum |
| CN111118452A (en) * | 2020-01-15 | 2020-05-08 | 鄂尔多斯市源盛光电有限责任公司 | Evaporation device and evaporation equipment |
| CN111118452B (en) * | 2020-01-15 | 2022-04-08 | 鄂尔多斯市源盛光电有限责任公司 | Evaporation device and evaporation equipment |
| CN113957392A (en) * | 2020-07-21 | 2022-01-21 | 宝山钢铁股份有限公司 | Vacuum coating device adopting uniform mixing buffer structure to uniformly distribute metal steam |
| CN113957392B (en) * | 2020-07-21 | 2022-09-20 | 宝山钢铁股份有限公司 | Vacuum coating device adopting uniform mixing buffer structure to uniformly distribute metal steam |
| CN118222984A (en) * | 2024-01-15 | 2024-06-21 | 北京北方鸿瑞科技有限公司 | Linear evaporation source for downward evaporation |
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