CN110144564A - Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device - Google Patents
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device Download PDFInfo
- Publication number
- CN110144564A CN110144564A CN201910569572.4A CN201910569572A CN110144564A CN 110144564 A CN110144564 A CN 110144564A CN 201910569572 A CN201910569572 A CN 201910569572A CN 110144564 A CN110144564 A CN 110144564A
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- China
- Prior art keywords
- target
- cooling water
- testing stand
- connecting rod
- magnetic control
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000004544 sputter deposition Methods 0.000 title claims abstract description 44
- 230000001105 regulatory effect Effects 0.000 title claims abstract description 18
- 238000012360 testing method Methods 0.000 claims abstract description 41
- 239000011159 matrix material Substances 0.000 claims abstract description 23
- 239000000498 cooling water Substances 0.000 claims description 55
- 238000007789 sealing Methods 0.000 claims description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 18
- 239000008367 deionised water Substances 0.000 claims description 7
- 229910021641 deionized water Inorganic materials 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims description 2
- 239000000463 material Substances 0.000 claims description 2
- 230000000694 effects Effects 0.000 claims 1
- 230000009286 beneficial effect Effects 0.000 abstract description 2
- 238000013461 design Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 17
- 239000010409 thin film Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 244000144985 peep Species 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention discloses distance automatic regulating devices between a kind of target and base suitable for magnetic control sputtering device, it is characterized in that, including target testing stand and the testing stand apparatus for automatically lifting being arranged in below target testing stand, the testing stand apparatus for automatically lifting includes testing stand, specimen holder, matrix, linear motor, linear motor output shaft, first hinged seat, second hinged seat, first pin shaft, second pin shaft, second connecting rod, third connecting rod and the first idler wheel, the testing stand bottom is provided with first sliding groove, second hinged seat and first sliding groove are separately positioned on testing stand two sides of the bottom at end position, first idler wheel is equipped in first sliding groove, and it can be slided in first sliding groove；Structurally reasonable the beneficial effects of the present invention are: the self-checking device is ingenious in design, high degree of automation and easy to use is capable of the testing stand that automatic lifting carries matrix, adjusts the spacing of plated film.
Description
Technical field
The present invention relates to plated film fields, and in particular to spacing is adjusted automatically between a kind of target and base suitable for magnetic control sputtering device
Regulating device.
Background technique
The nano thin-film for having excellent mechanical performance is with a wide range of applications in fields such as petroleum, chemical industry, pharmacy.Magnetic
Control sputter is a kind of advanced, universal, mature plated film instrument, suitable for prepare metal strengthening film, semiconductor solar film,
Magnetic device film even ceramic membrane.By magnetron sputtering plating, film forming speed is fast, and film quality is high, film-base junction resultant force
By force, thin film composition, structure are uniform.For magnetic control sputtering device in plated film, target can seriously affect quality of forming film at a distance from matrix.
Currently, target can only be manually adjusted at a distance from matrix by handle, there is very big error, and testing stand is heavier, rotational handle
It is time-consuming and laborious.Therefore, how to develop the automatic lifting test platform suitable for magnetic control sputtering device, can accurately adjust matrix with
The spacing of target has become the key problem in high-quality thin-film research and development field.
Summary of the invention
For the above-mentioned problems in the prior art, the purpose of the present invention is to provide one kind to be suitable for magnetic control sputtering device
Target and base between distance automatic regulating device can be with the adjustment of automatic and accurate so that magnetic control sputtering device is in coating process
The spacing of matrix and target improves quality of forming film.
Technical scheme is as follows:
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that tested including target
Platform and the testing stand apparatus for automatically lifting being arranged in below target testing stand, the testing stand apparatus for automatically lifting include test
Platform, specimen holder, matrix, linear motor, linear motor output shaft, the first hinged seat, the second hinged seat, the first pin shaft, the second pin
Axis, second connecting rod, third connecting rod and the first idler wheel, the testing stand bottom are provided with first sliding groove, second hinged seat and
First sliding groove is separately positioned on testing stand two sides of the bottom at end position, and first idler wheel is equipped in first sliding groove
It is interior, and can be slided in first sliding groove；Described third connecting rod one end is flexibly connected with the first idler wheel, the other end and the first hinged seat
It is connected, one end of the second connecting rod is connected with the second hinged seat, and the other end passes through the first pin shaft and linear motor output shaft phase
Even, the second connecting rod is flexibly connected in the middle part of third connecting rod by the second pin shaft.
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that institute
Stating target testing stand includes cooling water tank, the target frame being arranged on cooling water tank, the target being arranged on target frame, the target
It is equipped with cooling water pipe inside material frame, and is connected by cooling water pipe with cooling water tank.
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that institute
Target testing stand is stated equipped with rotating device, the rotating device includes motor and the first company being arranged on the motor shaft of motor
Bar, the first connecting rod are fixedly connected with target testing stand.
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that institute
Cooling water tank lower end is stated equipped with discharge outlet, the discharge outlet is equipped with discharge outlet sealing cover, be equipped with above the cooling water tank into
The mouth of a river, the water inlet are equipped with inlet seal lid.
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that institute
It states target to set up there are two including the first target frame and the second target frame, the first target frame and the second target frame are symmetrical arranged
In cooling water tank bottom, the first target frame is internally provided with the first cooling water pipe, the first cooling water pipe and cooling water tank phase
Even, the first target is fixedly connected on the first target frame；The second target frame is internally provided with the second cooling water pipe, the
Two cooling water pipes are connected with cooling water tank, are fixedly connected with the second target above the second target frame.
Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that institute
The cooling medium in cooling water tank is stated using deionized water.
The beneficial effects of the present invention are:
1) self-checking device is ingenious in design, structurally reasonable, high degree of automation and easy to use, can automatic lifting carry
The testing stand of matrix adjusts the spacing of plated film.
2) cooling water tank is arranged on target testing stand, so that cooling water tank is placed in inside main chamber, can improve plated film
When vacuum degree, and improve cooling efficiency.
3) present apparatus plated film is applied in magnetic control sputtering device, easy to operate, automaticity is high, and stability is strong, prepares film
Film-substrate cohesion is strong, has excellent performance.
Detailed description of the invention
Fig. 1 is overall structure diagram of the invention；
In figure: the first hinged seat of 1-, the second hinged seat of 2-, 3- testing stand, the first specimen holder of 4-, the first matrix of 5-, 6- main chamber are seen
Examine hole, 7- glass baffle plate, the first target of 8-, 9- the first target frame, the first cooling water pipe of 10-, 11- cooling water tank, 12- magnetic control splashes
Penetrate instrument sealing flange, 13- first connecting rod, 14- magnetic control sputtering device sealing flange cover, 15- magnetic control sputtering device sealing cover, 16- motor,
17- inlet seal lid, 18- water inlet, 19- deionized water, 20- discharge outlet sealing cover, the second cooling water pipe of 21-, 22- second
Target frame, the second target of 23-, 24- magnetic control sputtering device main chamber, the second matrix of 25-, the second specimen holder of 26-, 27- first sliding groove,
28- linear motor, 29- linear motor output shaft, 30- sealing ring, the first idler wheel of 31-, the first pin shaft of 32-, 33- second connecting rod,
The second pin shaft of 34-, 35- third connecting rod.
Specific embodiment
Technical solution of the present invention is further described below in conjunction with Figure of description:
As shown in Figure 1, distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, including target testing stand
With testing stand apparatus for automatically lifting.
Cold target testing stand includes cooling water tank 11, discharge outlet sealing cover 20, inlet seal lid 17, water inlet 18,
23 groups of one cooling water pipe 10, the second cooling water pipe 21, the first target frame 9, the second target frame 22, the first target 8 and the second target
At；The decentralization of cooling water tank 11 is provided with discharge outlet, and dismountable discharge outlet sealing cover 20, cooling water are provided in discharge outlet
It is provided with water inlet 18 above case 11, dismountable cooling water inlet pipe sealing cover 17 is provided on water inlet 18.Cooling water tank
11 lower sections are fixedly connected with the first target frame 9, and the first target frame 9 is internally provided with the first cooling water pipe 10, the first cooling water pipe 10
It is fixedly connected with cooling water tank 11, the first target 8 is fixedly connected on the first target frame 9；Meanwhile it is fixed below cooling water tank 11
The second target frame 22 is connected, the second target frame 22 is internally provided with the second cooling water pipe 21, the second cooling water pipe 21 and cooling water
Case 11 is fixedly connected, and the second target 23 is fixedly connected with above the second target frame 21；Deionized water is provided in cooling water tank 11
19.In addition, the top of cooling water tank 11 is fixedly connected with first connecting rod 13, first connecting rod 13 and motor 15 are sequentially connected, water inlet
Mouth 18 is fixedly connected with magnetic control sputtering device sealing flange 12.
Testing stand apparatus for automatically lifting includes testing stand 3, the first specimen holder 4, the first matrix 5, the second matrix 25, the second sample
Product frame 26, linear motor 28, linear motor output shaft 29, the first hinged seat 1, the second hinged seat 2, the first pin shaft 32, second pin
Axis 34, second connecting rod 33, third connecting rod 35, sealing ring 30, the first idler wheel 31 are formed with first sliding groove 27；3 lower surface of testing stand
It is fixedly connected with first sliding groove 27 and the second hinged seat 2, be slidably matched the first idler wheel 31 of setting in first sliding groove 27.First idler wheel
31 are flexibly connected with one end of third connecting rod 35, and the other end of third connecting rod 35 is flexibly connected with the first hinged seat 1, and first is hinged
Seat 1 is fixedly connected with 24 bottom of magnetic control sputtering device main chamber；The second pin shaft 34 is fixedly connected in the middle part of the third connecting rod 35, the
Two pin shafts 34 are flexibly connected with the middle part of second connecting rod 33, and one end of second connecting rod 33 is flexibly connected with the second hinged seat 2, and second
The other end of connecting rod 33 is fixedly connected by the first pin shaft 32 with linear motor output shaft 29；Linear motor output shaft 29 it is another
End is fixedly connected with the mover seat of linear motor 28.Linear motor output shaft 29 is arranged in magnetic control sputtering device main chamber 24, and is wearing
If connecting portion is provided with sealing ring 30；The first specimen holder 4 and the second specimen holder 26, the first sample are provided with above testing stand 26
Frame 4, the second specimen holder 26 are fixedly connected with the first matrix 5, the second matrix 25 respectively.
Magnetic control sputtering device sealing flange 12 is arranged above magnetic control sputtering device main chamber 24, and magnetic control sputtering device sealing flange 12 pushes up
Portion is equipped with magnetic control sputtering device blind flange 14, and first connecting rod 13 is close equipped with magnetic control sputtering device with 14 junction of magnetic control sputtering device blind flange
Capping 15.
The course of work: firstly, magnetic control sputtering device sealing flange is lifted, 12, separate it with magnetic control sputtering device main chamber 24, it will
First matrix 5 and the second matrix 25 are sticked respectively on the first specimen holder 4 and the second specimen holder 26.Then, by the first target 8 and
Two targets 23 are respectively placed on the first target frame 9 and the second target frame 22.The linear motor output shaft 29 of motor 28 is adjusted again
It moves right, the first pin shaft 32 of dragging realizes that horizontal direction moves right to the left, to drive second connecting rod 33 and third connecting rod
35 rotate around the second pin shaft 34, and the first idler wheel 31 being flexibly connected with third connecting rod 35 can be transported horizontally to the right along first sliding groove 27
It is dynamic, and then move downward testing stand 3, so that the first target 8 and the second target 23 and the first matrix 5 and the second matrix 25 erect
Histogram increases to spacing, and to be tested 3 is reduced to extreme lower position, closes motor 28.Then by magnetic control sputtering device sealing flange 12
It is fixedly connected with magnetic control sputtering device main chamber 24, confirmation magnetic control sputtering device sealing cover 15 has been switched off, the pumping before then beginning to plated film
Vacuum work (magnetic control sputtering device original function, this patent pertain only to hoistable platform).After vacuumizing, pass through magnetic control sputtering device
The main chamber peep hole 6 being arranged in main chamber 24, is observed outside glass baffle plate 7, and opens first motor 16, and first motor 16 passes through the
One connecting rod 13 drives cooling water tank 11 to rotate, and the first target 8 and the second target 23 are finally separately adjusted to angularly the first matrix 5 and the
The position directly above of two matrixes 25.After ensuring that target is located at the position right above matrix, the linear motor of linear motor 28 is adjusted
Output shaft 29 moves downward, and the first pin shaft 32 of dragging realizes that horizontal direction moves downward to the left, to drive 33 He of second connecting rod
Third connecting rod 35 is rotated around the second pin shaft 34, and the first idler wheel 31 being flexibly connected with third connecting rod 35 can be along 27 water of first sliding groove
It is flat to move downward, and then testing stand 3 is moved upwards, so that the first target 8 and the second target 23 and the first matrix 5 and the second base
The vertical direction spacing of body 25 is reduced, and is reached optimal plating film location to target and matrix spacing, is closed linear motor 28.Then
Start the plated film work of magnetic control sputtering device.
The replacement of cooling water: lifting magnetic control sputtering device sealing flange 12, separates it with magnetic control sputtering device main chamber 24, needs more
Deionized water 19 is changed, openable discharge outlet sealing cover 20 is all discharged outside cooling water tank to deionized water 19, it is close to close discharge outlet
Capping 20.Then, inlet seal lid 17 is opened, deionized water 19 is poured into cooling water tank 11 by water inlet 18, to liquid
When face is in water inlet position, the replacement that inlet seal lid 17 completes cooling water is closed.
Claims (6)
1. distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device, which is characterized in that tried including target
The testing stand apparatus for automatically lifting testing platform and being arranged in below target testing stand, the testing stand apparatus for automatically lifting include test
Platform (3), specimen holder, matrix, linear motor (28), linear motor output shaft (29), the first hinged seat (1), the second hinged seat
(2), the first pin shaft (32), the second pin shaft (34), second connecting rod (33), third connecting rod (35) and the first idler wheel (31), the examination
It tests platform (3) bottom to be provided with first sliding groove (27), second hinged seat (2) and first sliding groove (27) are separately positioned on testing stand
(3) at end position, first idler wheel (31) is equipped in first sliding groove (27), and can be first for two sides of the bottom
Sliding in sliding slot (27)；Described third connecting rod (35) one end is flexibly connected with the first idler wheel (31), the other end and the first hinged seat
(1) it is connected, one end of the second connecting rod (33) is connected with the second hinged seat (2), and the other end passes through the first pin shaft (32) and straight
Line motor output shaft (29) is connected, in the middle part of the second connecting rod (33) and third connecting rod (35) even by the second pin shaft (34) activity
It connects.
2. distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device according to claim 1,
It is characterized in that, the target testing stand includes cooling water tank (11), the target frame being arranged on cooling water tank (11), is arranged in target
Target on material frame, the target frame inside is equipped with cooling water pipe, and is connected by cooling water pipe with cooling water tank (11).
3. distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device according to claim 1,
It is characterized in that, the target testing stand is equipped with rotating device, and the rotating device includes motor (16) and is arranged in motor
(16) first connecting rod (13) on motor shaft, the first connecting rod (13) are fixedly connected with target testing stand.
4. distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device according to claim 2,
It is characterized in that, cooling water tank (11) lower end is equipped with discharge outlet, and the discharge outlet is equipped with discharge outlet sealing cover (20), described
Water inlet (18) are equipped with above cooling water tank (11), the water inlet (18) is equipped with inlet seal lid (17).
5. distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device according to claim 1,
It is characterized in that, there are two include the first target frame (9) and the second target frame (22), the first target frame for the target erection
(9) and the second target frame (22) is symmetricly set on cooling water tank (11) bottom, and the first target frame (9) is internally provided with first
Cooling water pipe (10), the first cooling water pipe (10) are connected with cooling water tank (11), are fixedly connected on the first target frame (9)
First target (8)；The second target frame (22) is internally provided with the second cooling water pipe (21), the second cooling water pipe (21) with it is cold
But water tank (11) is connected, and is fixedly connected with the second target (23) above the second target frame (21).
6. distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device according to claim 1,
It is characterized in that, the cooling medium in the cooling water tank (11) uses deionized water (19).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910569572.4A CN110144564A (en) | 2019-06-27 | 2019-06-27 | Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910569572.4A CN110144564A (en) | 2019-06-27 | 2019-06-27 | Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110144564A true CN110144564A (en) | 2019-08-20 |
Family
ID=67596691
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910569572.4A Pending CN110144564A (en) | 2019-06-27 | 2019-06-27 | Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110144564A (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110266147A1 (en) * | 2010-04-29 | 2011-11-03 | Hon Hai Precision Industry Co., Ltd. | Sputtering device with rotatable targets |
| JP2013175670A (en) * | 2012-02-27 | 2013-09-05 | Nissin Ion Equipment Co Ltd | Substrate transport device and semiconductor manufacturing apparatus using the same |
| CN106756779A (en) * | 2017-01-03 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of magnetic control platform and magnetic control sputtering device |
| CN206980791U (en) * | 2017-07-25 | 2018-02-09 | 重庆工业职业技术学院 | Multifunction electronic electrician's integrated test stand |
| CN109047075A (en) * | 2018-08-30 | 2018-12-21 | 浙江工业大学 | A kind of seam flange auto-cleaner |
| CN210886202U (en) * | 2019-06-27 | 2020-06-30 | 浙江工业大学 | Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument |
-
2019
- 2019-06-27 CN CN201910569572.4A patent/CN110144564A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110266147A1 (en) * | 2010-04-29 | 2011-11-03 | Hon Hai Precision Industry Co., Ltd. | Sputtering device with rotatable targets |
| JP2013175670A (en) * | 2012-02-27 | 2013-09-05 | Nissin Ion Equipment Co Ltd | Substrate transport device and semiconductor manufacturing apparatus using the same |
| CN106756779A (en) * | 2017-01-03 | 2017-05-31 | 京东方科技集团股份有限公司 | A kind of magnetic control platform and magnetic control sputtering device |
| CN206980791U (en) * | 2017-07-25 | 2018-02-09 | 重庆工业职业技术学院 | Multifunction electronic electrician's integrated test stand |
| CN109047075A (en) * | 2018-08-30 | 2018-12-21 | 浙江工业大学 | A kind of seam flange auto-cleaner |
| CN210886202U (en) * | 2019-06-27 | 2020-06-30 | 浙江工业大学 | Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument |
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