CN210886202U - Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument - Google Patents
Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument Download PDFInfo
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- CN210886202U CN210886202U CN201920984915.9U CN201920984915U CN210886202U CN 210886202 U CN210886202 U CN 210886202U CN 201920984915 U CN201920984915 U CN 201920984915U CN 210886202 U CN210886202 U CN 210886202U
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- target
- cooling water
- connecting rod
- magnetron sputtering
- water tank
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- 238000001755 magnetron sputter deposition Methods 0.000 title claims abstract description 47
- 239000000758 substrate Substances 0.000 title claims description 28
- 238000012360 testing method Methods 0.000 claims abstract description 39
- 239000000498 cooling water Substances 0.000 claims description 55
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 33
- 239000013077 target material Substances 0.000 claims description 30
- 238000007789 sealing Methods 0.000 claims description 29
- 239000008367 deionised water Substances 0.000 claims description 7
- 229910021641 deionized water Inorganic materials 0.000 claims description 7
- 239000002826 coolant Substances 0.000 claims description 2
- 238000004154 testing of material Methods 0.000 claims 2
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 238000013461 design Methods 0.000 abstract description 2
- 230000003028 elevating effect Effects 0.000 abstract 2
- 239000007888 film coating Substances 0.000 description 2
- 238000009501 film coating Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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Abstract
The utility model discloses an automatic adjusting device of interval between target and base suitable for magnetron sputtering appearance, a serial communication port, including target test bench and set up the automatic elevating gear of test bench below the target test bench, the automatic elevating gear of test bench includes test bench, sample frame, base member, linear electric motor output shaft, first articulated seat, second articulated seat, first round pin axle, second connecting rod, third connecting rod and first gyro wheel, the test bench bottom is provided with first spout, second articulated seat and first spout set up respectively near tip position department in test bench bottom both sides, first gyro wheel cooperation sets up in first spout, and can slide in first spout; the utility model has the advantages that: the automatic adjusting device is ingenious in design, reasonable in structure, high in automation degree and convenient to use, and can automatically lift the test bed carrying the base body to adjust the distance of the coating film.
Description
Technical Field
The utility model relates to a coating film field, concretely relates to automatic adjusting device of interval between target and the base suitable for magnetron sputtering appearance.
Background
The nano film with excellent mechanical properties has wide application prospect in the fields of petroleum, chemical industry, pharmacy and the like. The magnetron sputtering instrument is an advanced, popular and mature coating instrument, and is suitable for preparing metal reinforced films, semiconductor solar films, magnetic device films and even ceramic films. The film is formed by magnetron sputtering, the film forming speed is high, the film quality is high, the film-base binding force is strong, and the film has uniform components and structure. When the magnetron sputtering instrument is used for coating, the distance between the target and the substrate can seriously influence the film-forming quality. At present, the distance between the target and the substrate can only be manually adjusted through a handle, so that great errors are caused, the test bed is heavy, and the handle is rotated to waste time and labor. Therefore, how to develop an automatic lifting test platform suitable for a magnetron sputtering instrument can accurately adjust the distance between the substrate and the target material, and becomes a key problem in the field of high-quality film research and development.
SUMMERY OF THE UTILITY MODEL
To the above-mentioned problem that exists among the prior art, the utility model aims to provide an interval automatic regulating apparatus between target and the base suitable for magnetron sputtering appearance to make magnetron sputtering appearance in coating film process, the interval of adjustment base member and target that can be automatic accurate improves film forming quality.
The technical scheme of the utility model as follows:
an automatic adjusting device for the distance between a target and a base suitable for a magnetron sputtering instrument is characterized by comprising a target material test bed and an automatic test bed lifting device arranged below the target material test bed, wherein the automatic test bed lifting device comprises a test bed, a sample frame, a base body, a linear motor output shaft, a first hinge seat, a second hinge seat, a first pin shaft, a second connecting rod, a third connecting rod and a first roller; one end of the third connecting rod is movably connected with the first idler wheel, the other end of the third connecting rod is connected with the first hinged seat, one end of the second connecting rod is connected with the second hinged seat, the other end of the second connecting rod is connected with the output shaft of the linear motor through the first pin shaft, and the middle of the second connecting rod is movably connected with the middle of the third connecting rod through the second pin shaft.
The automatic adjusting device for the distance between the target and the substrate suitable for the magnetron sputtering instrument is characterized in that the target material test bed comprises a cooling water tank, a target material frame arranged on the cooling water tank and a target material arranged on the target material frame, wherein a cooling water pipe is arranged in the target material frame and is communicated with the cooling water tank through the cooling water pipe.
The automatic adjusting device for the distance between the target and the substrate suitable for the magnetron sputtering instrument is characterized in that a rotating device is arranged on the target material test bed, the rotating device comprises a motor and a first connecting rod arranged on a motor shaft of the motor, and the first connecting rod is fixedly connected with the target material test bed.
The automatic adjusting device for the distance between the target and the substrate suitable for the magnetron sputtering instrument is characterized in that a water outlet is formed in the lower end of the cooling water tank, a water outlet sealing cover is arranged on the water outlet, a water inlet is formed in the upper portion of the cooling water tank, and a water inlet sealing cover is arranged on the water inlet.
The automatic adjusting device for the distance between the target and the substrate suitable for the magnetron sputtering instrument is characterized in that the target frame is provided with two target frames, the two target frames comprise a first target frame and a second target frame, the first target frame and the second target frame are symmetrically arranged at the bottom of a cooling water tank, a first cooling water pipe is arranged inside the first target frame, the first cooling water pipe is connected with the cooling water tank, and the first target frame is fixedly connected with a first target; and a second cooling water pipe is arranged in the second target frame and connected with a cooling water tank, and a second target is fixedly connected above the second target frame.
The automatic adjusting device for the distance between the target and the substrate suitable for the magnetron sputtering instrument is characterized in that a cooling medium in the cooling water tank adopts deionized water.
The utility model has the advantages that:
1) the automatic adjusting device is ingenious in design, reasonable in structure, high in automation degree and convenient to use, and can automatically lift the test bed carrying the base body to adjust the distance of the coating film.
2) The cooling water tank is arranged on the target material test bed, so that the cooling water tank is arranged in the main cavity, the vacuum degree during film coating can be improved, and the cooling efficiency is improved.
3) The device is applied to film plating in a magnetron sputtering instrument, and has the advantages of simple operation, high automation, strong stability, strong film-substrate binding force for preparing the film and excellent performance.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention;
in the figure: 1-a first hinged seat, 2-a second hinged seat, 3-a test bench, 4-a first sample holder, 5-a first substrate, 6-a main cavity observation hole, 7-a glass baffle, 8-a first target, 9-a first target holder, 10-a first cooling water pipe, 11-a cooling water tank, 12-a magnetron sputtering instrument sealing flange, 13-a first connecting rod, 14-a magnetron sputtering instrument sealing flange cover, 15-a magnetron sputtering instrument sealing cover, 16-a motor, 17-a water inlet sealing cover, 18-a water inlet, 19-deionized water, 20-a water outlet sealing cover, 21-a second cooling water pipe, 22-a second target holder, 23-a second target, 24-a magnetron sputtering instrument main cavity, 25-a second substrate, 26-a second sample holder, 27-a first chute, 28-a linear motor, 29-a linear motor output shaft, 30-a sealing ring, 31-a first roller, 32-a first pin shaft, 33-a second connecting rod, 34-a second pin shaft and 35-a third connecting rod.
Detailed Description
The technical scheme of the utility model is further described with the accompanying drawings of the specification as follows:
as shown in FIG. 1, an automatic adjusting device for the distance between a target and a substrate, which is suitable for a magnetron sputtering apparatus, comprises a target material test bed and an automatic test bed lifting device.
The cold target material test bed comprises a cooling water tank 11, a water outlet sealing cover 20, a water inlet sealing cover 17, a water inlet 18, a first cooling water pipe 10, a second cooling water pipe 21, a first target material frame 9, a second target material frame 22, a first target material 8 and a second target material 23; a water outlet is arranged below the cooling water tank 11, a detachable water outlet sealing cover 20 is arranged on the water outlet, a water inlet 18 is arranged above the cooling water tank 11, and a detachable cooling water inlet pipe sealing cover 17 is arranged on the water inlet 18. A first target frame 9 is fixedly connected below the cooling water tank 11, a first cooling water pipe 10 is arranged inside the first target frame 9, the first cooling water pipe 10 is fixedly connected with the cooling water tank 11, and a first target 8 is fixedly connected on the first target frame 9; meanwhile, a second target frame 22 is fixedly connected below the cooling water tank 11, a second cooling water pipe 21 is arranged inside the second target frame 22, the second cooling water pipe 21 is fixedly connected with the cooling water tank 11, and a second target 23 is fixedly connected above the second target frame 22; deionized water 19 is provided in the cooling water tank 11. In addition, the upper part of the cooling water tank 11 is fixedly connected with a first connecting rod 13, the first connecting rod 13 is in transmission connection with a motor 15, and a water inlet 18 is fixedly connected with a sealing flange 12 of the magnetron sputtering instrument.
The automatic lifting device of the test bed comprises a test bed 3, a first sample frame 4, a first base body 5, a second base body 25, a second sample frame 26, a linear motor 28, a linear motor output shaft 29, a first hinged seat 1, a second hinged seat 2, a first pin shaft 32, a second pin shaft 34, a second connecting rod 33, a third connecting rod 35, a sealing ring 30, a first roller 31 and a first chute 27; the lower surface of the test bed 3 is fixedly connected with a first chute 27 and a second hinged seat 2, and a first roller 31 is arranged on the first chute 27 in a sliding fit manner. The first roller 31 is movably connected with one end of a third connecting rod 35, the other end of the third connecting rod 35 is movably connected with a first hinged seat 1, and the first hinged seat 1 is fixedly connected with the bottom of the magnetron sputtering instrument main cavity 24; a second pin shaft 34 is fixedly connected to the middle of the third connecting rod 35, the second pin shaft 34 is movably connected to the middle of the second connecting rod 33, one end of the second connecting rod 33 is movably connected to the second hinge base 2, and the other end of the second connecting rod 33 is fixedly connected to the linear motor output shaft 29 through a first pin shaft 32; the other end of the linear motor output shaft 29 is fixedly connected with a rotor base of the linear motor 28. The linear motor output shaft 29 is arranged in the main cavity 24 of the magnetron sputtering instrument in a penetrating way, and a sealing ring 30 is arranged at the penetrating connection part; the first sample holder 4 and the second sample holder 26 are arranged above the test bed 26, and the first sample holder 4 and the second sample holder 26 are fixedly connected with the first base body 5 and the second base body 25 respectively.
The magnetron sputtering instrument sealing flange 12 is arranged above the magnetron sputtering instrument main cavity 24, the magnetron sputtering instrument flange cover 14 is arranged at the top of the magnetron sputtering instrument sealing flange 12, and the magnetron sputtering instrument sealing cover 15 is arranged at the joint of the first connecting rod 13 and the magnetron sputtering instrument flange cover 14.
The working process is as follows: first, the sealing flange 12 of the magnetron sputtering apparatus is lifted to be separated from the main chamber 24 of the magnetron sputtering apparatus, and the first substrate 5 and the second substrate 25 are respectively adhered to the first sample holder 4 and the second sample holder 26. Subsequently, the first target 8 and the second target 23 are placed on the first target holder 9 and the second target holder 22, respectively. Then, the output shaft 29 of the linear motor of the motor 28 is adjusted to move rightwards, the first pin shaft 32 is dragged rightwards to realize the movement rightwards in the horizontal direction, so that the second connecting rod 33 and the third connecting rod 35 are driven to rotate around the second pin shaft 34, the first roller 31 movably connected with the third connecting rod 35 can horizontally move rightwards along the first sliding groove 27, the test bed 3 is further driven to move downwards, the vertical direction distance between the first target material 8 and the second target material 23 and between the first base body 5 and the second base body 25 is increased, the test bed 3 is lowered to the lowest position, and the motor 28 is closed. And then fixedly connecting the sealing flange 12 of the magnetron sputtering instrument with the main cavity 24 of the magnetron sputtering instrument, confirming that the sealing cover 15 of the magnetron sputtering instrument is closed, and then starting vacuumizing work before coating (the original function of the magnetron sputtering instrument, and the patent only relates to a lifting platform). After the vacuum pumping is finished, the glass baffle 7 is observed through a main cavity observation hole 6 arranged on a main cavity 24 of the magnetron sputtering instrument, the first motor 16 is started, the first motor 16 drives the cooling water tank 11 to rotate through the first connecting rod 13, and finally the first target material 8 and the second target material 23 are respectively adjusted to positions right above the first substrate 5 and the second substrate 25. After the target is located at the position right above the substrate, the output shaft 29 of the linear motor 28 is adjusted to move leftwards, the first pin shaft 32 is dragged leftwards to realize horizontal leftward movement, so that the second connecting rod 33 and the third connecting rod 35 are driven to rotate around the second pin shaft 34, the first roller 31 movably connected with the third connecting rod 35 can horizontally move leftwards along the first sliding groove 27, the test bed 3 is further driven to move upwards, the vertical distance between the first target 8 and the second target 23 and between the first substrate 5 and the second substrate 25 is reduced, and when the distance between the targets and the substrate reaches the optimal film coating position, the linear motor 28 is closed. Then, the coating work of the magnetron sputtering instrument is started.
Replacement of cooling water: lifting up the sealing flange 12 of the magnetron sputtering instrument to separate the sealing flange from the main cavity 24 of the magnetron sputtering instrument, needing to replace the deionized water 19, opening the sealing cover 20 of the water outlet, and closing the sealing cover 20 of the water outlet when the deionized water 19 is completely discharged out of the cooling water tank. Subsequently, the water inlet sealing cap 17 is opened, deionized water 19 is poured into the cooling water tank 11 through the water inlet 18, and when the liquid level is at the water inlet position, the water inlet sealing cap 17 is closed to complete the replacement of the cooling water.
Claims (6)
1. An automatic adjusting device for the distance between a target and a substrate suitable for a magnetron sputtering instrument is characterized by comprising a target material test bed and a test bed automatic lifting device arranged below the target material test bed, the automatic lifting device of the test bed comprises a test bed (3), a sample frame, a base body, a linear motor (28), a linear motor output shaft (29), a first hinged seat (1), a second hinged seat (2), a first pin shaft (32), a second pin shaft (34), a second connecting rod (33), a third connecting rod (35) and a first roller (31), the bottom of the test bed (3) is provided with a first sliding chute (27), the second hinged seat (2) and the first sliding chute (27) are respectively arranged at the positions close to the end parts of the two sides of the bottom of the test bed (3), the first roller (31) is arranged in the first sliding chute (27) in a matching way and can slide in the first sliding chute (27); third connecting rod (35) one end and first gyro wheel (31) swing joint, the other end links to each other with first articulated seat (1), the one end and the articulated seat of second (2) of second connecting rod (33) link to each other, and the other end links to each other with linear electric motor output shaft (29) through first round pin axle (32), second connecting rod (33) and third connecting rod (35) middle part are through second round pin axle (34) swing joint.
2. The device for automatically adjusting the distance between the target and the substrate suitable for the magnetron sputtering apparatus according to claim 1, wherein the target material test stand comprises a cooling water tank (11), a target material rack arranged on the cooling water tank (11), and a target material arranged on the target material rack, and a cooling water pipe is arranged inside the target material rack and is communicated with the cooling water tank (11) through the cooling water pipe.
3. The device for automatically adjusting the distance between the target and the substrate suitable for the magnetron sputtering apparatus according to claim 1, wherein a rotating device is provided on the target material testing platform, the rotating device comprises a motor (16) and a first connecting rod (13) provided on a motor shaft of the motor (16), and the first connecting rod (13) is fixedly connected with the target material testing platform.
4. The device for automatically adjusting the distance between the target and the substrate suitable for the magnetron sputtering apparatus according to claim 2, wherein a drain port is arranged at the lower end of the cooling water tank (11), a drain port sealing cover (20) is arranged on the drain port, a water inlet (18) is arranged above the cooling water tank (11), and a water inlet sealing cover (17) is arranged on the water inlet (18).
5. The automatic adjusting device for the distance between the target and the substrate suitable for the magnetron sputtering apparatus according to claim 2, wherein the target holder is provided with two target holders (9) and two target holders (22), the first target holder (9) and the second target holder (22) are symmetrically arranged at the bottom of the cooling water tank (11), the first cooling water pipe (10) is arranged inside the first target holder (9), the first cooling water pipe (10) is connected with the cooling water tank (11), and the first target (8) is fixedly connected to the first target holder (9); and a second cooling water pipe (21) is arranged in the second target frame (22), the second cooling water pipe (21) is connected with the cooling water tank (11), and a second target (23) is fixedly connected above the second target frame (22).
6. The device for automatically adjusting the distance between the target and the substrate suitable for the magnetron sputtering instrument according to claim 4, wherein the cooling medium in the cooling water tank (11) adopts deionized water (19).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920984915.9U CN210886202U (en) | 2019-06-27 | 2019-06-27 | Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201920984915.9U CN210886202U (en) | 2019-06-27 | 2019-06-27 | Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN210886202U true CN210886202U (en) | 2020-06-30 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201920984915.9U Expired - Fee Related CN210886202U (en) | 2019-06-27 | 2019-06-27 | Automatic target-substrate distance adjusting device suitable for magnetron sputtering instrument |
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| CN (1) | CN210886202U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110144564A (en) * | 2019-06-27 | 2019-08-20 | 浙江工业大学 | Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device |
-
2019
- 2019-06-27 CN CN201920984915.9U patent/CN210886202U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110144564A (en) * | 2019-06-27 | 2019-08-20 | 浙江工业大学 | Distance automatic regulating device between a kind of target and base suitable for magnetic control sputtering device |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20200630 |