CN209428591U - A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device - Google Patents
A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device Download PDFInfo
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- CN209428591U CN209428591U CN201822134307.7U CN201822134307U CN209428591U CN 209428591 U CN209428591 U CN 209428591U CN 201822134307 U CN201822134307 U CN 201822134307U CN 209428591 U CN209428591 U CN 209428591U
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- motor
- screw shell
- fixing seat
- magnetic control
- control sputtering
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- 238000004544 sputter deposition Methods 0.000 title claims abstract description 52
- 238000000429 assembly Methods 0.000 claims description 4
- 230000000712 assembly Effects 0.000 claims description 4
- 230000005540 biological transmission Effects 0.000 claims description 3
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 2
- 239000011159 matrix material Substances 0.000 abstract description 3
- 238000013461 design Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 description 35
- 238000007789 sealing Methods 0.000 description 8
- 238000012360 testing method Methods 0.000 description 8
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- UQMRAFJOBWOFNS-UHFFFAOYSA-N butyl 2-(2,4-dichlorophenoxy)acetate Chemical compound CCCCOC(=O)COC1=CC=C(Cl)C=C1Cl UQMRAFJOBWOFNS-UHFFFAOYSA-N 0.000 description 3
- 230000005611 electricity Effects 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009661 fatigue test Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000035800 maturation Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000003208 petroleum Substances 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005728 strengthening Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
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Abstract
The utility model discloses a kind of pole sample high throughput plated film clamping devices suitable for magnetic control sputtering device, including the fixed device of sample table and pole sample holding device.The fixed device of sample table is made of the components such as fixed plate and screw；Pole sample holding device is made of the components such as motor and screw shell.The utility model smart structural design, it is easy to use, more pole sample plated films can be given automatically simultaneously.More pole sample plated films are given simultaneously using the present apparatus in magnetic control sputtering device, easy to operate, automaticity is high, and stability is strong, and the thickness of film is also relatively uniform, and has good binding force with matrix.
Description
Technical field
The utility model belongs to pole sample plated film field, and in particular to a kind of pole sample suitable for magnetic control sputtering device
High-throughput plated film clamping device.
Background technique
Currently, the miscellaneous film with outstanding mechanical property has extensively in production fields such as petroleum, chemical industry, pharmacy
General application prospect.Before laboratory prepares film and carries out Mechanics Performance Testing, film needs first to be plated in suitable matrix
On.Magnetic control sputtering device is a kind of highly advanced and technology maturation plated film instrument, suitable for preparing metal, inorganic matter even high score
Sub- film.It has been widely used in the neck such as metal strengthening film, semiconductor solar film, magnetic device film even ceramic membrane
Domain.By magnetron sputtering plating, film forming speed is fast, and film quality is high, and film-base junction resultant force is strong, and thin film composition, structure are uniform.But
It is that the included system of magnetic control sputtering device is generally only applicable to the plate-like matrix sample plated film with plane, for the pole of curved surface
Sample is simultaneously not suitable for, and since the film there are shadow effect, plated will be in uneven thickness, this can be to subsequent mechanical property test
Cause very serious influence.And justifies the advantages of bar samples are by its own and be widely used in high-temerature creep test, creep
In some mechanical property tests such as fatigue test, and plate-like sample is not particularly suited for these tests.In addition, in order to ensure data
Validity, under same experiment condition, creep test and creep fatigue test needs to prepare the more pole samples for having plated film.
Therefore, a kind of pole sample holding device suitable for magnetic control sputtering device how is developed, enables to magnetic control sputtering device uniform
To more pole samples, plated film has become the key problem that the film for influencing to have outstanding mechanical property researches and develops field simultaneously.
Utility model content
For the above-mentioned problems in the prior art, the purpose of this utility model is to provide one kind to splash suitable for magnetic control
The self-action pole sample coating apparatus of instrument is penetrated, so that magnetic control sputtering device can be plated to the pole sample with curved surface
Film.
To achieve the above object, the utility model uses following technical scheme:
A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device, including the fixed device of sample table and
Pole sample holding device；The pole sample holding device is fixedly connected on magnetic control sputtering device examination by the fixed device of sample table
The lower part of sample platform；The pole sample holding device includes the second motor, the second drive rod, the first driving wheel and the second transmission
Wheel；One end of second drive rod is fixedly connected with the output shaft of the second motor；Second drive rod is equipped with first and passes
Driving wheel and the second driving wheel；At least provided with two rotation clamp assemblies between first driving wheel and the second driving wheel.
A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device, the sample table are fixed
Device includes the first nut, the first fixed plate, the first screw, the second fixed plate, the second screw, third fixed plate, the second nut
And first connecting rod；One end of first fixed plate and the second fixed plate are solid by the threaded connection of the first screw and the first nut
Due on magnetic control sputtering device sample table；The other end and third fixed plate of first fixed plate pass through the second screw and the second spiral shell
Female threaded connection is fixed on magnetic control sputtering device sample table；Second motor is fixed by first connecting rod and the first fixed plate
Connection.
A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device, the rotation clamping group
Part includes fixing seat and motor；Described fixing seat one end is fixedly connected on the first driving wheel, and the other end is connected with screw thread
Sleeve；Described motor one end is fixedly connected on the second driving wheel, and the other end is fixedly connected with screw shell.
A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device, first driving wheel
Setting is uniformly distributed between the second driving wheel, and there are four rotate clamp assemblies.
A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device, the pole specimen holder
Holding device includes the first screw shell, the first fixing seat, the second fixing seat, the second screw shell, third screw shell, third electricity
Machine, the 4th screw shell, the 4th motor, the 5th motor, the 6th motor, the 5th screw shell, the 6th screw shell, the 7th screw thread
Sleeve, third fixing seat, the 8th screw shell and the 4th fixing seat；It is uniformly distributed that be provided with first solid on first driving wheel
Reservation, the second fixing seat, third fixing seat and the 4th fixing seat；First fixing seat, the second fixing seat, third fixing seat and
4th fixing seat is flexibly connected with the first screw shell, the second screw shell, the 7th screw shell and the 8th screw shell respectively；
It is uniformly distributed on second driving wheel and is provided with third motor, the 4th motor, the 5th motor and the 6th motor；The third electricity
Machine, the 4th motor, the 5th motor and the 6th motor output shaft respectively with third screw shell, the 4th screw shell, the 5th spiral shell
Line sleeve and the 6th screw shell are fixedly connected.
A kind of self-action pole sample coating apparatus suitable for magnetic control sputtering device, which is characterized in that described solid
Screw shell in reservation is corresponded to each other with the opening of the screw shell on the motor, and is twisted threaded pole with both ends and tried
Sample cooperates.
A kind of self-action pole sample coating apparatus suitable for magnetic control sputtering device, which is characterized in that described
The upper surface of one fixed plate and the lower surface of magnetic control sputtering device sample table fit closely.
Compared with prior art, structurally reasonable the utility model has the beneficial effects that the utility model is ingenious in design, automatically
Change degree is high, can carry out plated film to more pole samples simultaneously.It is plated using the present apparatus to pole sample in magnetic control sputtering device
Film, it is ensured that uniformity of the thickness of film on pole sample curved surface, while also can guarantee the film and pole of measurement
Sample has good binding force, while can also significantly improve efficiency prepared by sample to more pole sample plated films, to amorphous
The research field of film has great importance.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the utility model；
Fig. 2 is the structural schematic diagram of pole sample holding device；
In figure: 1- pole sample holding device, the first nut of 2-, the first fixed plate of 3-, the first screw of 4-, 5- second are fixed
Plate, 6- magnetic control sputtering device sample table, 7- magnetic control sputtering device sealing flange, 8- magnetic control sputtering device sealing cover, 9- first motor, 10-
First drive rod, the second screw of 11-, 12- third fixed plate, the second nut of 13-, 14- first connecting rod, the second motor of 15-, 16-
First target as sputter device, the first target of 17-, the second target of 18-, 19- the second target as sputter device, 20- magnetic control sputtering device chamber
Body, the second drive rod of 21-, the first driving wheel of 22-, the first screw shell of 23-, the first fixing seat of 24-, the second fixing seat of 25-,
The second screw shell of 26-, 27- the first pole sample, 28- third screw shell, 29- third motor, the second driving wheel of 30-, 31-
Second pole sample, the 4th screw shell of 32-, the 4th motor of 33-, the 5th motor of 34-, the 6th motor of 35-, the 5th screw thread of 36-
Sleeve, the 6th screw shell of 37-, 38- third pole sample, the 4th pole sample of 39-, the 7th screw shell of 40-, 41- third
Fixing seat, the 8th screw shell of 42-, the 4th fixing seat of 43-.
Specific embodiment
The technical solution of the utility model is further described below in conjunction with Figure of description:
As depicted in figs. 1 and 2, a kind of pole sample high throughput plated film suitable for magnetic control sputtering device of the utility model fills
It sets, including the fixed device of sample table and pole sample holding device.
The fixed device of sample table includes the first nut 2, the first fixed plate 3, the first screw 4, the second fixed plate 5, the second spiral shell
Nail 11, third fixed plate 12, the second nut 13 and first connecting rod 14.One end of first fixed plate 3 and the second fixed plate 5 pass through the
The threaded connection of one screw 4 and the first nut 2 is fixed on magnetic control sputtering device sample table 6；The other end of first fixed plate 3 and
Three fixed plates 12 are fixed on magnetic control sputtering device sample table 7 by the threaded connection of the second screw 11 and the second nut 13；First
3 lower surface of fixed plate is provided with first connecting rod 14, and 14 lower end of first connecting rod is fixedly connected with the second motor 15.
Pole sample holding device includes the second motor 15, the second drive rod 21, the first driving wheel 22, the first screw shell
23, the first fixing seat 24, the second fixing seat 25, the second screw shell 26, third screw shell 28, third motor 29, second pass
Driving wheel 30, the 4th screw shell 32, the 4th motor 33, the 5th motor 34, the 6th motor 35, the 5th screw shell 36, the 6th spiral shell
Line sleeve 37, the 7th screw shell 40, third fixing seat 41, the 8th screw shell 42 and the 4th fixing seat 43.Second drive rod
25 one end is fixedly connected with the output shaft of the second motor 15, and the second drive rod 25 is driven with the first driving wheel 22, second respectively
Wheel 30 is fixedly connected.It is uniformly distributed on first driving wheel 22 and is provided with the first fixing seat 24, the second fixing seat 25, third fixing seat
41 and the 4th fixing seat 43, the first fixing seat 24, the second fixing seat 25, third fixing seat 41 and the 4th fixing seat 43 are respectively with
One screw shell 23, the second screw shell 26, the 7th screw shell 40 and the 8th screw shell 42 are flexibly connected.Second driving wheel
It is uniformly distributed on 30 and is provided with third motor 29, the 4th motor 33, the 5th motor 34 and the 6th motor 35, third motor 29,
The output shaft of four motors 33, the 5th motor 34 and the 6th motor 35 respectively with third screw shell 28, the 4th screw shell 32,
Five screw shells 36 are fixedly connected with the 6th screw shell 37.One end of first pole sample 27 and 23 screw thread of the first screw shell
Connection, the other end are threadedly coupled with third thread bush 28；One end of second pole sample 31 and 26 screw thread of the second screw shell
Connection, the other end are threadedly coupled with the 4th thread bush 32；One end of third pole sample 38 and 40 screw thread of the 7th screw shell
Connection, the other end are threadedly coupled with the 5th thread bush 36；One end of 4th pole sample 39 and 42 screw thread of the 8th screw shell
Connection, the other end are threadedly coupled with the 6th thread bush 37.
The operation instruction of a kind of pole sample high throughput coating apparatus suitable for magnetic control sputtering device of the utility model: first
Magnetic control sputtering device sealing cover 8 and magnetic control sputtering device sealing flange 7 are first opened, by the both ends of the first pole sample 27 respectively with the
One screw shell 23, third thread bush 28 are threadedly coupled；Simultaneously by the both ends of the second pole sample 31 respectively with the second thread bush
The 26, the 4th thread bush 32 of cylinder is threadedly coupled；One end of third pole sample 38 is threadedly coupled with the 7th screw shell 40 simultaneously,
Its other end is threadedly coupled with the 5th thread bush 36；Simultaneously by the both ends of the 4th pole sample 39 respectively with the 8th screw shell
42, the 6th thread bush 37 is threadedly coupled.Then one end of the first fixed plate 3 and the second fixed plate 5 are passed through into the first screw 4 and the
The threaded connection of one nut 2 is fixed on magnetic control sputtering device sample table 6；The other end of the first fixed plate 3 is consolidated with third simultaneously
Fixed board 12 is fixed on magnetic control sputtering device sample table 6 by the threaded connection of the second screw 11 and the second nut 13, and guarantees the
The upper surface of one fixed plate 3 and the lower end surface of magnetic control sputtering device sample table 6 fit closely.Later, by the first target 17 and second
Target 18 is respectively placed in the groove of the first target as sputter device 16 and the second target as sputter device 19.Then, second is opened
The switch of motor 15, the rotation axis of first motor 15 drives the first driving wheel 22 and the second driving wheel 30 to rotate, to drive four
Root pole sample is around 30 uniform rotation of the second drive rod.Later, third motor 29, the 4th motor the 33, the 5th are opened respectively
The switch of motor 34 and the 6th motor 35, so that four pole samples are respectively around third motor 29, the 33, the 5th electricity of the 4th motor
The transmission shaft uniform rotation of machine 34, the 6th motor 35.Finally cover magnetic control sputtering device sealing flange 7 and magnetic control sputtering device sealing cover
8, vacuum pumping is carried out by the external control system and vacuum evacuation device of magnetic control sputtering device.First motor 9 is then turned on, the
The rotation axis of one motor 9 drives the rotation of the first drive rod 10, to drive magnetic control sputtering device sample table 6 around first motor 9
Rotation axis uniform rotation.Finally by the control system of magnetic control sputtering device, the first target as sputter device 16 and the second target are controlled
Sputtering equipment 19 carries out plated film to the equal diameter section of four pole samples.
After plated film, first motor 9 is closed, opens magnetic control sputtering device sealing cover 8 and magnetic control sputtering device sealing flange 7,
First nut 2 and the second nut 13 are unscrewed, the fixed device of sample table is removed, finally by four pole samples from pole specimen holder
Device 1 is held to remove.Four complete pole samples of plated film have essentially identical thin film mechanical performance, essentially identical thickness, base
This identical film and basal body binding force, it can carry out the mechanical property tests such as creep test, creep fatigue sample.
Claims (7)
1. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device, which is characterized in that including sample table
Fixed device and pole sample holding device；The pole sample holding device is fixedly connected on magnetic by the fixed device of sample table
Control the lower part of sputter sample table (6)；The pole sample holding device include the second motor (15), the second drive rod (21),
First driving wheel (22) and the second driving wheel (30)；One end of second drive rod and the output shaft of the second motor (15) are fixed
Connection；Second drive rod is equipped with the first driving wheel (22) and the second driving wheel (30)；First driving wheel (22) with
At least provided with two rotation clamp assemblies between second driving wheel (30).
2. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device according to claim 1,
It is characterized in that, the fixed device of the sample table is fixed including the first nut (2), the first fixed plate (3), the first screw (4), second
Plate (5), the second screw (11), third fixed plate (12), the second nut (13) and first connecting rod (14)；First fixed plate
(3) magnetron sputtering is fixed on by the threaded connection of the first screw (4) and the first nut (2) in one end and the second fixed plate (5)
On instrument sample table (6)；The other end of first fixed plate (3) and third fixed plate (12) pass through the second screw (11) and second
The threaded connection of nut (13) is fixed on magnetic control sputtering device sample table (6)；Second motor (15) passes through first connecting rod
(14) it is fixedly connected with the first fixed plate (3).
3. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device according to claim 1,
It is characterized in that, the rotation clamp assemblies include fixing seat and motor；Described fixing seat one end is fixedly connected on the first driving wheel
(22) on, the other end is connected with screw shell；Described motor one end is fixedly connected on the second driving wheel (30), the other end
It is fixedly connected with screw shell.
4. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device according to claim 3,
It is characterized in that, setting is uniformly distributed between first driving wheel (22) and the second driving wheel (30), and there are four rotate clamping group
Part.
5. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device according to claim 4,
It is characterized in that, the pole sample holding device includes the first screw shell (23), the first fixing seat (24), the second fixing seat
(25), the second screw shell (26), third screw shell (28), third motor (29), the 4th screw shell (32), the 4th motor
(33), the 5th motor (34), the 6th motor (35), the 5th screw shell (36), the 6th screw shell (37), the 7th screw shell
(40), third fixing seat (41), the 8th screw shell (42) and the 4th fixing seat (43)；On first driving wheel (22) uniformly
Distribution is provided with the first fixing seat (24), the second fixing seat (25), third fixing seat (41) and the 4th fixing seat (43)；Described
One fixing seat (24), the second fixing seat (25), third fixing seat (41) and the 4th fixing seat (43) respectively with the first screw shell
(23), the second screw shell (26), the 7th screw shell (40) and the 8th screw shell (42) are flexibly connected；Second transmission
It is uniformly distributed on wheel (30) and is provided with third motor (29), the 4th motor (33), the 5th motor (34) and the 6th motor (35)；Institute
State the output shaft of third motor (29), the 4th motor (33), the 5th motor (34) and the 6th motor (35) respectively with third screw thread
Sleeve (28), the 4th screw shell (32), the 5th screw shell (36) are fixedly connected with the 6th screw shell (37).
6. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device according to claim 3,
It is characterized in that, the screw shell in the fixing seat is corresponded to each other with the opening of the screw shell on the motor, and and both ends
Threaded pole sample is twisted to cooperate.
7. a kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device according to claim 2,
It is characterized in that, the upper surface of first fixed plate (3) and the lower surface of magnetic control sputtering device sample table (6) fit closely.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822134307.7U CN209428591U (en) | 2018-12-19 | 2018-12-19 | A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201822134307.7U CN209428591U (en) | 2018-12-19 | 2018-12-19 | A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device |
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| Publication Number | Publication Date |
|---|---|
| CN209428591U true CN209428591U (en) | 2019-09-24 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201822134307.7U Expired - Fee Related CN209428591U (en) | 2018-12-19 | 2018-12-19 | A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109306462A (en) * | 2018-12-19 | 2019-02-05 | 浙江工业大学 | A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device |
-
2018
- 2018-12-19 CN CN201822134307.7U patent/CN209428591U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109306462A (en) * | 2018-12-19 | 2019-02-05 | 浙江工业大学 | A kind of pole sample high throughput plated film clamping device suitable for magnetic control sputtering device |
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| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20190924 |