CN206069996U - A kind of small-sized magnetron sputtering Mo machines - Google Patents
A kind of small-sized magnetron sputtering Mo machines Download PDFInfo
- Publication number
- CN206069996U CN206069996U CN201620962923.XU CN201620962923U CN206069996U CN 206069996 U CN206069996 U CN 206069996U CN 201620962923 U CN201620962923 U CN 201620962923U CN 206069996 U CN206069996 U CN 206069996U
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- small
- machines
- magnetron sputtering
- cylinder vacuum
- upper lid
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Abstract
A kind of small-sized magnetron sputtering Mo machines, it is related to a kind of plating Mo machines, the plating Mo machines include the Cylinder vacuum room of cover-opening structure, heating specimen rotating holder, magnetic coupling, magnetic controlled sputtering target, turbomolecular pump, flapper valve, membrane pump, gamut rule, cooling water recirculation system, cabinet；Cylinder vacuum room top is supported by two atmospheric pressure poles, is locked by knob equipped with a upper lid, upper lid, and two magnetic control targets incline installation, center of its center extended line just to heating specimen rotating holder；Heating specimen rotating holder is located at the bottom of Cylinder vacuum room, is installed on magnetic coupling；Gamut rule are provided with above flapper valve, and are connected on turbomolecular pump.This utility model is controlled using PLC+ touch screens, and with Operation and Maintenance is simple, dress sample, sampling be convenient, combination is flexible, compact, thus carry, it is easy for installation, be particularly suitable for institute's teaching, scientific research and use.
Description
Technical field
This utility model is related to a kind of plating Mo machines, more particularly to a kind of small-sized magnetron sputtering Mo machines.
Background technology
Can be used to prepare single or multiple lift ferroelectric thin film, conductive film, alloy firm, quasiconductor using magnetron sputtering technique
Thin film, ceramic membrane, dielectric film, optical thin film, sull, ganoine thin film, polytetrafluoroethylene film etc..State at this stage
Interior same category of device is bulky, and operating process is complicated, and automatic controlling level is low, and operator needs to be specially trained just make
With this, for the very strong institute of mobility of people, is unfavorable.The machine and same kind of domestic equipment ratio, with Operation and Maintenance
Simply, fill sample, sampling is convenient, combination is flexible, good looking appearance.Main frame is controlled using PLC+ touch screens.Due to compact, so
Carry, it is easy for installation.It is particularly suitable for institute's teaching, scientific research to use.
The content of the invention
The purpose of this utility model is to provide a kind of small-sized magnetron sputtering Mo machines, and this utility model is touched using PLC+
Screen control, with Operation and Maintenance is simple, dress sample, sampling be convenient, combination is flexible, compact, so carry, it is easy for installation, it is special
It is not suitable for institute's teaching, scientific research to use.
The purpose of this utility model is achieved through the following technical solutions：
A kind of small-sized magnetron sputtering Mo machines, the plating Mo machines include the Cylinder vacuum room of cover-opening structure, heating rotation
Turn sample stage, magnetic coupling, magnetic controlled sputtering target, turbomolecular pump, flapper valve, membrane pump, gamut rule, cooling water circulation system
System, cabinet；Cylinder vacuum room top is supported by two atmospheric pressure poles, is locked by knob, two magnetic controls equipped with a upper lid, upper lid
Target is inclined to be installed, center of its center extended line just to heating specimen rotating holder；Heating specimen rotating holder is located at Cylinder vacuum
The bottom of room, is installed on magnetic coupling；Be provided with above flapper valve gamut rule, and be connected to turbomolecular pump it
On.
Described a kind of small-sized magnetron sputtering Mo machines, are sealed using O-ring between the upper lid and Cylinder vacuum room.
Described a kind of small-sized magnetron sputtering Mo machines, the upper lid are provided with two groups of interfaces for connecing magnetic control target.
Described a kind of small-sized magnetron sputtering Mo machines, the bottom surface of the Cylinder vacuum room are distributed with flange, behind set
Have flange, before be provided with observation window.
Described a kind of small-sized magnetron sputtering Mo machines, the Cylinder vacuum room are fixed by bolts on cabinet, cabinet
Front panel be provided with total power switch, temperature controller, molecule pump controller, master control touch screen.
Described a kind of small-sized magnetron sputtering Mo machines, the rear board of the main frame are provided with cooled water distributor, cooling
Water collector, inflatable interface auxiliary equipment.
Advantage of the present utility model with effect is：
This utility model has that Operation and Maintenance simple, dress sample, sampling be convenient, combination flexibly, good looking appearance.Main frame is adopted
PLC+ touch screens are controlled.Due to compact, thus carry, it is easy for installation.It is particularly suitable for institute's teaching, scientific research to use.
Description of the drawings
Fig. 1 is front view of the present utility model；
Fig. 2 is left view of the present utility model；
Fig. 3 is sectional view of the present utility model；
Fig. 4 is top view of the present utility model.
Label in figure：1 it is gamut rule, 2 be magnetic controlled sputtering target, 3 be knob, 4 be upper lid, 5 be atmospheric pressure pole, 6 is cylinder
Shape vacuum chamber, 7 be cabinet, 8 be main touch screen, 9 be temperature controller, 10 be nylon hose, 11 be molecule pump controller, 12 be
Total power switch, 13 be membrane pump, 14 be flapper valve, 15 be turbomolecular pump, 16 be cooled water distributor, 17 be cooling water
Catcher, observation window in 18,19 be quartz crystal film thickness detector, 20 be heating specimen rotating holder, 21 be electric guard board, 22 be
Magnetic coupling, 23 be KF16 interfaces, 24 be ferrule fitting.
Specific embodiment
This utility model is described in detail with reference to embodiment.
This utility model includes the Cylinder vacuum room of cover-opening structure, heating specimen rotating holder, magnetic controlled sputtering target, small-sized
Vacuum acquirement is constituted with measuring system, accurate gas handling system, cooling water recirculation system, cabinet.The Cylinder vacuum room
Sealed with O-ring between upper lid and Cylinder vacuum room main body, locked when upper lid is supported by atmospheric pressure pole when opening, upper lid is closed
Nut check.The bottom surface of Cylinder vacuum room is distributed with CF50 flanges, KF16 flanges, 1/4 bite type flange.The heating rotation
Sample stage is connected to the inner core of magnetic couple sealing device, and the inner core of magnetic couple sealing device is existed by magnetic attraction with outer core
It is synchronized with the movement together, the outer core of magnetic couple sealing device is connected to motor by Timing Belt, by PLC controls.Upper lid two
Side is tiltedly installed with two magnetic controlled sputtering targets, and an electric guard board is installed beside every magnetic controlled sputtering target.Cylinder vacuum room
One circular observation window is above installed, behind an ISO63 flange is installed.One CF35 is installed beside ISO63 flanges
Flange.Cylinder vacuum room is arranged on cabinet.A turbomolecular pump is also equipped with above cabinet, turbomolecular pump passes through one
Individual manual flapper valve connection gamut is advised and is connected to Cylinder vacuum room.Cabinet back is placed with a membrane pump.Membrane pump
Turbomolecular pump is connected to by a nylon hose.Manual flapper valve, turbomolecular pump, membrane pump, gamut rule and nylon
Flexible pipe collectively constitutes small size vacuum and obtains and measuring system.Described accurate gas handling system presses the demarcation of gas with various composition by two
Mass flowmenter, two electromagnet cut off valve, connected into Cylinder vacuum room by some stainless steel tubes and cutting ferrule.Cooling water system
System is by a temperature programmed control recirculated water cooling unit, by water knockout drum part to magnetic control target and the logical cooling water of calibrator, cold after circulation
But water flows back to circulating water machine by water collector.Mass flowmenter, electromagnet cut off valve, turbomolecular pump are installed in the cabinet
The parts such as power supply and controller.
Embodiment 1：
6 top of this utility model Cylinder vacuum room equipped with a upper lid 4, by two atmospheric pressure poles 5 when upper lid 4 is opened
Support, is locked by knob 3 during closing.Sealed using O-ring between upper lid 4 and Cylinder vacuum room 6.Upper lid 4 be provided with two groups it is close
Sealing-in mouth, magnetic controlled sputtering target 2 are just installed here by this two group interface.Electric guard board 21 is provided with before magnetic controlled sputtering target 2,
When shielding power supply works, electric guard board 21 is shut, sputter the initial stage material blocked by electric guard board 21, will not contaminated samples,
Meanwhile, the material that another target is sputtered also is blocked by electric guard board 21, prevents cross-contamination.When target exposes unsalted surface,
Electric guard board 21 is opened, and can normally sputter plating Mo.Magnetic controlled sputtering target 2 is inclined to be installed, and its center extended line is just to heating rotation
The center of sample stage 20.Heating specimen rotating holder 20 does dextrorotation with the speed for setting under the drive of magnetic coupling 22
Turn, to ensure the uniformity of film forming.The flange port below of Cylinder vacuum room 6 is connected with flapper valve 14, flapper valve 14 and connects above
Gamut rule 1 are connected to, gamut rule 1 are responsible for the vacuum of real-time detection Cylinder vacuum room 6, and its numerical value is in the face of controller 11
Show on plate.Flapper valve 14 is connected with turbomolecular pump 15, turbomolecular pump 15 below and is connected to by a nylon hose 10
Membrane pump 13.Membrane pump 13 is collectively responsible for obtaining vacuum with turbomolecular pump 15 as backing pump.Pacify on Cylinder vacuum room 6
There is quartz crystal film thickness detector 19, for detecting plating Mo thickness.The base plate of Cylinder vacuum room 6 is provided with KF16 interfaces 23,
It is responsible for destroying vacuum for connecting electric gas-filled valve.The base plate of Cylinder vacuum room 6 is provided with ferrule fitting 24, for connecting matter
Amount effusion meter, is passed through reacting gas.In order to get information about the situation inside Cylinder vacuum room 6, before Cylinder vacuum room 6
It is provided with observation window 18.Described Cylinder vacuum room 6 is bolted on cabinet 7 with 4, and the front panel of cabinet 7 is provided with always
On and off switch 12, for turning on/off main power.Temperature controller 9, for setting/showing the temperature of heating specimen rotating holder 20
Degree.Molecule pump controller 11 be used for open/termination of pumping group, show vacuum.Master control touch screen 8 is used for setting/and display quality effusion meter shows
Number.The miscellaneous functions such as the ON/OFF of electric guard board 21.The rear board of main frame 7 is provided with cooled water distributor 16, is responsible for magnetic control splashing
2, quartz crystal film thickness detector 19 of shooting at the target provides cooling water.Cooling water collector 17 is responsible for centralized recovery cooling water.Inflation connects
The auxiliary equipments such as mouth.
Claims (6)
1. a kind of small-sized magnetron sputtering Mo machines, it is characterised in that the plating Mo machines include the Cylinder vacuum of cover-opening structure
Room, heating specimen rotating holder, magnetic coupling, magnetic controlled sputtering target, turbomolecular pump, flapper valve, membrane pump, gamut rule, it is cold
But water circulation system, cabinet；Cylinder vacuum room top is supported by two atmospheric pressure poles, is locked by knob equipped with a upper lid, upper lid
Tightly, two magnetic control targets are inclined and are installed, center of its center extended line just to heating specimen rotating holder；Heating specimen rotating holder is located at
The bottom of Cylinder vacuum room, is installed on magnetic coupling；Gamut rule are provided with above flapper valve, and are connected to turbine
On molecular pump.
2. a kind of small-sized magnetron sputtering Mo machines according to claim 1, it is characterised in that the upper lid is true with column type
Sealed using O-ring between empty room.
3. a kind of small-sized magnetron sputtering Mo machines according to claim 2, it is characterised in that the upper lid is provided with two groups
Connect the interface of magnetic control target.
4. a kind of small-sized magnetron sputtering Mo machines according to claim 1, it is characterised in that the Cylinder vacuum room
Bottom surface is distributed with flange, behind be provided with flange, before be provided with observation window.
5. a kind of small-sized magnetron sputtering Mo machines according to claim 4, it is characterised in that use the Cylinder vacuum room
It is bolted on cabinet, the front panel of cabinet is provided with total power switch, temperature controller, molecule pump controller, master control and touches
Screen.
6. a kind of small-sized magnetron sputtering Mo machines according to claim 1, it is characterised in that on the rear board of the main frame
It is provided with cooled water distributor, cooling water collector, inflatable interface auxiliary equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620962923.XU CN206069996U (en) | 2016-08-29 | 2016-08-29 | A kind of small-sized magnetron sputtering Mo machines |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620962923.XU CN206069996U (en) | 2016-08-29 | 2016-08-29 | A kind of small-sized magnetron sputtering Mo machines |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206069996U true CN206069996U (en) | 2017-04-05 |
Family
ID=58434192
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620962923.XU Expired - Fee Related CN206069996U (en) | 2016-08-29 | 2016-08-29 | A kind of small-sized magnetron sputtering Mo machines |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN206069996U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107815658A (en) * | 2017-11-29 | 2018-03-20 | 沈阳鹏程真空技术有限责任公司 | A kind of target of small size vacuum magnetic control three sputtering plating Mo machines |
-
2016
- 2016-08-29 CN CN201620962923.XU patent/CN206069996U/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107815658A (en) * | 2017-11-29 | 2018-03-20 | 沈阳鹏程真空技术有限责任公司 | A kind of target of small size vacuum magnetic control three sputtering plating Mo machines |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20170405 Termination date: 20200829 |
|
| CF01 | Termination of patent right due to non-payment of annual fee |