CN103103486A - Magnetron sputtering system - Google Patents
Magnetron sputtering system Download PDFInfo
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- CN103103486A CN103103486A CN2011103582320A CN201110358232A CN103103486A CN 103103486 A CN103103486 A CN 103103486A CN 2011103582320 A CN2011103582320 A CN 2011103582320A CN 201110358232 A CN201110358232 A CN 201110358232A CN 103103486 A CN103103486 A CN 103103486A
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Abstract
The invention relates to a coating apparatus, amd specifically relates to a magnetron sputtering system. The magnetron sputtering system comprises a magnetron chamber, a substrate rotary table, a substrate rotary table driving motor, a transmission mechanism, a magnetron target, a machine frame, a vacuum pumping system and an electric lifting mechanism, wherein the magnetron chamber is arranged on the machine frame and is connected with the vacuum pumping system in the machine frame, a plurality of magnetron targets arranged on a lower flange of the magnetron chamber are uniformly distributed in the magnetron chamber, the substrate rotary table is rotatably arranged on the upper cover of the magnetron chamber, the loaded substrate is in the magnetron chamber and above each magnetron target, the substrate rotary table driving motor is arranged on the upper cover of the magnetron chamber, the substrate rotary table is driven to rotate by the driving motor through the transmission mechanism; and the electric lifting mechanism is arranged in the machine frame, and the output end of the electric lifting mechanism penetrates out from the machine frame and is connected with the upper cover of the magnetron chamber to drive the upper cover, the substrate rotary table on the upper cover and the substrate rotary table driving motor to lift. The magnetron sputtering system has the advantages of complete function, high automation degree, good interchangeability and reliability.
Description
Technical field
The present invention relates to filming equipment, specifically a kind of magnetic control sputtering system.
Background technology
At present, use the device of magnetron sputtering (high-speed low temperature sputter) principle, can prepare nano level individual layer and the multilayer functional membranes such as various hard films, metallic membrane, semiconductor film, deielectric-coating, ferromagnetic film and magneticthin film.Its feature is: the various materials that can be prepared into target all can be used as thin-film material, comprise various metals, semi-conductor, ferromagnetic material, and the materials such as the oxide compound, pottery, polymkeric substance of insulation, especially are fit to the deposition of material plated film of high-melting-point and low-steam pressure.Multicomponent target material cosputtering mode under proper condition can deposit mixture, the compound film of required component; Add oxygen, nitrogen or other reactive gas in the discharge atmosphere of sputter, but the compound film of formation of deposits target material and gas molecule.Existing magnetron sputtering equipment can only be single the vertical sputter that realizes single and polynary target or the cosputtering of polynary target.Yet, in Materials science research, often need to regulate content and the composition form of each component materials.
Summary of the invention
The object of the present invention is to provide a kind of magnetic control sputtering system.This magnetic control sputtering system can realize that the vertical sputter multilayer film of polynary target can realize again oblique target co-sputtering composite membrane.
The objective of the invention is to be achieved through the following technical solutions:
The present invention includes magnetic control chamber, substrate turntable, substrate turntable driving motor, transmission rig, magnetic controlling target, machine frame, vacuum-pumping system and electric hoisting mechanism, wherein the magnetic control chamber is arranged on machine frame, is connected with the vacuum-pumping system that is positioned at machine frame, at the indoor magnetic controlling target that is evenly equipped with on a plurality of lower flanges that are arranged on the magnetic control chamber of magnetic control; Described substrate turntable be rotatably installed in the magnetic control chamber on cover, contained substrate is positioned at that magnetic control is indoor, the top of each magnetic controlling target, cover on the magnetic control chamber substrate turntable driving motor also is installed, described substrate turntable drives rotation by transmission rig by the substrate turntable driving motor; In described machine frame, electric hoisting mechanism is installed, the output terminal of this electric hoisting mechanism is passed, is connected with the upper cover of magnetic control chamber by machine frame, drive upper cover and on the substrate turntable and the lifting of substrate turntable driving motor that cover.
Wherein: described magnetic controlling target has vertical substrate turntable or two working positions of inclination substrate turntable, be equipped with a magnetic controlling target baffle plate above each magnetic controlling target, this magnetic controlling target baffle plate is connected with the 3rd motor that is arranged on machine frame inside, by the 3rd motor driven switch magnetic controlling target baffle plate; The periphery of described each magnetic controlling target is equipped with the magnetic controlling target shielding cylinder on the lower flange that is arranged on the magnetic control chamber;
Described substrate turntable is substrate water-cooling heating revolution platform, and the one end is loaded with substrate, the insertion magnetic control is indoor, and the other end is positioned at the top of upper cover; Cover on described the first motor is installed, this first motor is connected, drives the substrate water-cooling heating revolution platform rotation with substrate water-cooling heating revolution platform with pulley assemblies by Timing Belt; Described magnetic control is indoor is rotatablely equipped with electronic substrate baffle plate, one end of this electronic substrate baffle plate is loaded with between an end and each magnetic controlling target sputter end of substrate at substrate water-cooling heating revolution platform, the other end of electronic substrate baffle plate is connected with the second motor in being arranged on machine frame, by the second electric motor driving rotation; Described electronic substrate baffle plate is positioned at the centre of each magnetic controlling target, and each magnetic controlling target is perpendicular to electronic substrate baffle plate; One end of this electronic substrate baffle plate is circular baffle plate, and the above has the circular hole that exposes by the plating substrate; The other end of described substrate water-cooling heating revolution platform is provided with the disk light beam encoder that is electrically connected to computer control system; Have six stations on described substrate water-cooling heating revolution platform, wherein be provided with process furnace above one or two stations, all the other station water flowings are cooling;
Described substrate turntable is single heating autorotation disk, and the one end is loaded with substrate, the insertion magnetic control is indoor, and the other end is positioned at the top of upper cover; Cover on described the 4th motor is installed, the rotation of the single heating of the 4th electric motor driving autorotation disk; Described single heating autorotation disk has a heating station, is in the centre of single heating autorotation disk, each magnetic controlling target be positioned at this list heat the autorotation disk heating station around; Be loaded with substrate on the heating station of single heating autorotation disk, be provided with manual substrate baffle plate assembly below this substrate; Described substrate turntable is single cooling autorotation disc, and the one end is loaded with substrate, the insertion magnetic control is indoor, and the other end is positioned at the top of upper cover; Cover on described the first motor is installed, this first motor is connected, drives the substrate water-cooling heating revolution platform rotation with substrate water-cooling heating revolution platform with pulley assemblies by Timing Belt; Described single cooling autorotation disc has a cooling station, is in the centre of single cooling autorotation disc, each magnetic controlling target be positioned at the cooling station of this list cooling autorotation disc around; Cooling station at single cooling autorotation disc has been uploaded substrate, is provided with manual substrate baffle plate assembly below this substrate.
Advantage of the present invention and positively effect are:
1. multiple functional.The present invention has the repertoire for preparing various simple substance films, multilayer film, blend films, compound film with magnetron sputtering.
2. level of automation is high.The present invention is by the switch of indoor each the magnetic controlling target baffle plate of rotation, magnetic control of the revolution of the rotation of indoor each substrate baffle plate of computer control magnetic control, substrate water-cooling heating revolution platform substrate and the temperature control of two process furnace subtegulums, single heating autorotation disk and single cooling autorotation disc substrate etc.; Under the program of having set, can prepare all kinds of nano level single or multiple lift functional membranes.
3. interchangeability is high.The substrate water-cooling heating revolution platform that covers on magnetic control of the present invention chamber can be replaced with single heating autorotation disk or single cooling autorotation disc as required; Several magnetic controlling targets on the lower flange of magnetic control chamber can freely select to install the common permanent magnetism target of sputter nonferromugnetic material, strong permanent magnetic target or the electromagnetism target of sputter ferromagnetic substance, but also can select according to the target size magnetic controlling target of φ 50mm, 2 inches of φ, φ 60mm or φ 75mm, but and magnetic controlling target head bending.
4. good reliability.The substrate water-cooling heating revolution platform that covers on magnetic control of the present invention chamber is realized the location by disk light beam encoder, reach accurate, the water flow alarm system is arranged, have circuit water alarm to cut off the function of corresponding power supply to molecular pump, magnetic controlling target, substrate water-cooling heating revolution platform etc.
Description of drawings
Fig. 1 is the structural representation of the embodiment of the present invention one;
Fig. 2 is the vertical view of Fig. 1;
Fig. 3 is the left view of Fig. 1;
Fig. 4 is the structural representation of the embodiment of the present invention two;
Fig. 5 is the vertical view of Fig. 4;
Fig. 6 is the structural representation of the embodiment of the present invention three;
Fig. 7 is the vertical view of Fig. 6;
wherein: 1 is the magnetic control chamber, 2 is upper cover, 3 is substrate water-cooling heating revolution platform, 4 is the first motor, 5 is electronic substrate baffle plate, 6 is magnetic controlling target, 7 is machine frame, 8 is the magnetic controlling target baffle plate, 9 is mechanical pump, 10 is push-pull valve, 11 is turbomolecular pump, 12 is Timing Belt and pulley assemblies, 13 is the magnetic controlling target shielding cylinder, 14 is electric hoisting mechanism, 15 is lower flange, 16 is disk light beam encoder, 17 is web plate, 18 is the second motor, 19 is the 3rd motor, 20 for taking out angle valve in the side, 21 are the air inlet stopping valve, 22 is the first speed reduction unit, 23 is the second speed reduction unit, 24 is single heating autorotation disk, 25 is manual substrate baffle plate assembly, 26 is the 4th motor, 27 is single cooling autorotation disc.
Embodiment
The invention will be further described below in conjunction with accompanying drawing.
The present invention includes magnetic control chamber 1, substrate turntable, substrate turntable driving motor, transmission rig, magnetic controlling target 6, machine frame 7, vacuum-pumping system and electric hoisting mechanism 14, wherein magnetic control chamber 1 is arranged on machine frame 7, is connected with the vacuum-pumping system that is positioned at machine frame 7, is evenly equipped with the magnetic controlling target 6 on the lower flange 15 that a plurality of (～four) be arranged on magnetic control chamber 1 in magnetic control chamber 1; Described substrate turntable is arranged on the upper cover 2 of magnetic control chamber 1 rotatably, contained substrate is positioned at the top of magnetic control chamber 1, each magnetic controlling target 6, on the upper cover 2 of magnetic control chamber 1, the substrate turntable driving motor is installed also, described substrate turntable drives rotation by transmission rig by the substrate turntable driving motor; In described machine frame 7, electric hoisting mechanism 14 is installed, the output terminal of this electric hoisting mechanism 14 is passed, is connected with the upper cover 2 of magnetic control chamber 1 by machine frame 7, drives substrate turntable and the lifting of substrate turntable driving motor on upper cover 2 and upper cover 2.
The present invention is single cell structure, can carry out the vertical sputter multilayer film of polynary target in magnetic control chamber 1, can carry out oblique target co-sputtering composite membrane again.
Embodiment one
The substrate turntable of the present embodiment is substrate water-cooling heating revolution platform 3.
As shown in Fig. 1～3, magnetic control chamber 1 is the round tube type vertical structure, is fixed on machine frame 7 by lower flange 15; Be welded with the flange-interface of all size on the circumferential surface of magnetic control chamber 1, comprise that view port, side are taken out angle valve interface, intake valve interface, contact conductor interface, regulated interface, the magnetron sputtering target interface, mainly take out molecular pump interface, substrate baffle plate interface, be reserved with auxiliary handing-over with mechanical manipulator interface, pretreatment chamber's interface and some backup flange interfaces, be convenient to Function Extension and use; This magnetic control chamber 1 is connected with vacuum-pumping system in being arranged on machine frame 7, vacuum-pumping system is to be connected connection with turbomolecular pump by push-pull valve 10, add the gas circuit that the mechanical pump 9 of top and bottom forms and realize main taking out, take out by the side gas circuit that angle valve 20 and mechanical pump 9 form and realize that bypass bleeds.
On lower flange 15 in magnetic control chamber 1, four magnetic controlling targets 6 are installed, vertically over against being contained in substrate on substrate water-cooling heating revolution platform 3, carrying out magnetron sputtering plating.Each magnetic controlling target 6 tops are equipped with a magnetic controlling target baffle plate 8, and this magnetic controlling target baffle plate 8 is connected with the 3rd motor 19 that is arranged on machine frame 7 inside, by the 3rd motor 19 driving switch magnetic controlling target baffle plates 8.Magnetic controlling target baffle plate 8 closing conditions be magnetic controlling target baffle plate 8 be positioned at magnetic controlling target 6 directly over, magnetic controlling target 6 is blocked; Go to a side and magnetic controlling target baffle plate 8 opened conditions are magnetic controlling target baffle plate 8, expose magnetic controlling target 6.The periphery of each magnetic controlling target 6 is equipped with the magnetic controlling target shielding cylinder 13 on the lower flange 15 that is arranged on magnetic control chamber 1, to avoid the crossed contamination between target.Magnetic controlling target 6 can freely select to install permanent magnetism target or electromagnetism target, and the radio-frequency sputtering of permanent magnetism target and d.c. sputtering are compatible, and water-cooled is arranged in target, comprise the common permanent magnetism target of sputter nonferromugnetic material, the strong permanent magnetic target of sputter ferromagnetic substance.
One end of substrate water-cooling heating revolution platform 3 is loaded with substrate, insert in magnetic control chamber 1, be positioned at the top of each magnetic controlling target 6 sputter ends, the other end of substrate water-cooling heating revolution platform 3 is positioned at the top of upper cover 2, is connected with the disk light beam encoder 16 that is electrically connected to computer control system; Computer control system of the present invention is prior art.The first motor 4 and the first speed reduction unit 22 are installed on upper cover 2, this first motor 4 be connected speed reduction unit 22 and be connected with pulley assemblies by Timing Belt and be connected, drive substrate water-cooling heating revolution platform 3 rotation with substrate water-cooling heating revolution platform 3; Rotating electronic substrate baffle plate 5 is installed in magnetic control chamber 1, one end of this electronic substrate baffle plate 5 is loaded with between an end and each magnetic controlling target 6 sputter ends of substrate at substrate water-cooling heating revolution platform 3, the other end of electronic substrate baffle plate 5 second speed reduction unit 22 and second motor 18 interior with being arranged on machine frame 7 is connected successively, drives its rotations by the second motor 18.
One end of electronic substrate baffle plate 5 is circular baffle plate, and the above has circular hole, exposes by the plating substrate, blocks all the other not by the substrate of sputter; Electronic substrate baffle plate 5 is positioned at the centre of each magnetic controlling target 6, the central axis conllinear of the circle that namely surrounds in the middle of the central axis of the circular baffle plate on electronic substrate baffle plate 5 tops and each magnetic controlling target 6, and each magnetic controlling target 6 is respectively perpendicular to electronic substrate baffle plate 5.Have six stations on substrate water-cooling heating revolution platform 3, can place six substrates, wherein be provided with process furnace above one or two stations, all the other station water flowings are cooling.Substrate heating temperature under process furnace is controlled by the thermopair closed loop feedback, substrate overall dimension φ 50mm.
The principle of work of the present embodiment is:
The present embodiment is equipped with substrate water-cooling heating revolution platform 3 on the upper cover 2 of magnetic control chamber 1, electronic substrate baffle plate 5 and magnetic controlling target shielding cylinder 13 are arranged on the lower flange 15 of magnetic control chamber 1, with the equal vertical substrate on the substrate water-cooling heating revolution platform 3 of the target head of magnetic controlling target 6, adjust the distance between target and sample, can be used for the vertical sputter of polynary target and be coated with multilayer film.Concrete operations are:
At first refine target, electronic substrate baffle plate 5 shelters from all samples, opens the magnetic controlling target baffle plate 8 of each magnetic controlling target 6 by the driving of the 3rd motor 8, each magnetic controlling target 6 build-ups of luminance are made the refining target and are used, when target is sputtered unsalted surface, namely refine target and complete, close each magnetic controlling target baffle plate.The first motor 4 work by the first speed reduction unit 22 and Timing Belt and pulley assemblies 12 drive substrate water-cooling heating revolution platform 3 rotations, and then forward substrate to the magnetic controlling target top that needs, and open this magnetic controlling target baffle plate, this magnetic controlling target build-up of luminance; The second motor 18 work drive electronic substrate baffle plate 5 rotations, and the circular hole on it is rotated to by the position of sputter substrate, expose by the substrate of sputter, carry out sputter coating; Until this place's rete be coated with complete after, close the magnetic controlling target baffle plate of this magnetic controlling target; Substrate is gone to next magnetic controlling target top, open this magnetic controlling target baffle plate, the magnetic controlling target build-up of luminance, the circular hole on rotary electric substrate baffle plate 5 carries out sputter and is coated with next rete to substrate position.In coating process, can carry out water-cooled to sample, but also design temperature and time are carried out heat treated to sample.
The substrate water-cooling heating revolution platform 3 of the present embodiment adds that by the first motor 4, the first speed reduction unit 22 Timing Belt and pulley assemblies 12 drive revolution, controls disk light beam encoder 16 by computer control system, realizes the accurate location of substrate.
Embodiment two
The substrate turntable of the present embodiment is single heating autorotation disk 24.
As Fig. 4, shown in Figure 5, magnetic control chamber 1 is the round tube type vertical structure, is fixed on machine frame 7 by lower flange 15; Be welded with the flange-interface of all size on the circumferential surface of magnetic control chamber 1, comprise that view port, side are taken out angle valve interface, intake valve interface, contact conductor interface, regulated interface, the magnetron sputtering target interface, mainly take out molecular pump interface, substrate baffle plate interface, be reserved with auxiliary handing-over with mechanical manipulator interface, pretreatment chamber's interface and some backup flange interfaces, be convenient to Function Extension and use; This magnetic control chamber 1 is connected with vacuum-pumping system in being arranged on machine frame 7, vacuum-pumping system is to be connected connection with turbomolecular pump by push-pull valve 10, add the gas circuit that the mechanical pump 9 of top and bottom forms and realize main taking out, take out by the side gas circuit that angle valve 20 and mechanical pump 9 form and realize that bypass bleeds.
On lower flange 15 in magnetic control chamber 1, four magnetic controlling targets 6 are installed, favour the substrate that is contained on single heating autorotation disk 24, carry out magnetron sputtering plating.Each magnetic controlling target 6 tops are equipped with a magnetic controlling target baffle plate 8, and this magnetic controlling target baffle plate 8 is connected with the 3rd motor 19 that is arranged on machine frame 7 inside, by the 3rd motor 19 driving switch magnetic controlling target baffle plates 8.Magnetic controlling target baffle plate 8 closing conditions are that magnetic controlling target baffle plate 8 blocks magnetic controlling target 6, go to a side and magnetic controlling target baffle plate 8 opened conditions are magnetic controlling target baffle plate 8, expose magnetic controlling target 6.Magnetic controlling target 6 can freely select to install permanent magnetism target or electromagnetism target, and the radio-frequency sputtering of permanent magnetism target and d.c. sputtering are compatible, and water-cooled is arranged in target, comprise the common permanent magnetism target of sputter nonferromugnetic material, the strong permanent magnetic target of sputter ferromagnetic substance.The target head of the magnetic controlling target 6 of the present embodiment can bend, and favours substrate.
One end of single heating autorotation disk 24 is loaded with substrate, insert in magnetic control chamber 1, be positioned at the top of each magnetic controlling target 6 sputter ends, the other end of single heating autorotation disk 24 is positioned at the top of upper cover 2, and single heating autorotation disk 24 drives rotation by the 4th motor 26 that is arranged on upper cover 2; Also be provided with manual substrate baffle plate assembly 25 on upper cover 2, this manual substrate baffle plate assembly 25 comprises rotating shaft and baffle plate, its shaft is installed in rotation on upper cover 2, and the lower end of rotating shaft is connected with baffle plate, and rotating shaft can block this baffle plate the substrate on single heating autorotation disk 24.Single heating autorotation disk 24 has a heating station, is in the centre of single heating autorotation disk 24, can place a slice substrate; Manually the baffle plate in substrate baffle plate assembly 25 be positioned at when blocking substrate substrate under, each magnetic controlling target 6 be positioned at these list heating autorotation disk 24 heating stations around, the central axis of the circles that each magnetic controlling target 6 centres surround and the central axis conllinear of substrate.Substrate heating is controlled by the thermopair closed loop feedback, can be to substrate heating to 800 ℃ ± 1 ℃; Substrate overall dimension Φ 50mm by the 4th motor 26 drive substrate continuous rotaries, to strengthen the homogeneity of film forming, can control coating process by computer control system.
The principle of work of the present embodiment is:
When pulling down substrate water-cooling heating revolution platform 3, electronic substrate baffle plate 5 and magnetic controlling target shielding cylinder 13, change single Heating rotary-disc 24 and manual substrate baffle plate assembly 25, with the target head bending of magnetic controlling target 6, jointly point to substrate on single Heating rotary-disc 24, the cosputtering of the multicomponent material in the time of can being used for substrate heating.
Under manual substrate baffle plate assembly 25 auxiliary, can carry out oblique target co-sputtering composite membrane by computer-controlled program.At first refine target, after the refining target is completed, open magnetic controlling target baffle plate 8, magnetic controlling target 6 build-ups of luminance are opened manual substrate baffle plate assembly 25, carry out sputter coating; Can carry out the sputter of single target list, the sputter in turn of many targets, More target sputtering together, and the power of magnetic controlling target 6 is adjustable.In coating process, in the sputtering system that disposes single Heating rotary-disc 24, but setting-up time and temperature are carried out heat treated to substrate.
The target head of the magnetic controlling target 6 of the present embodiment can bending, and target center can be regulated continuously to the spacing of substrate center, and the indication of positioning distance is arranged.
Embodiment three
The substrate turntable of the present embodiment is single cooling autorotation disc 27.
As Fig. 6, shown in Figure 7, magnetic control chamber 1 is the round tube type vertical structure, is fixed on machine frame 7 by lower flange 15; Be welded with the flange-interface of all size on the circumferential surface of magnetic control chamber 1, comprise that view port, side are taken out angle valve interface, intake valve interface, contact conductor interface, regulated interface, the magnetron sputtering target interface, mainly take out molecular pump interface, substrate baffle plate interface, be reserved with auxiliary handing-over with mechanical manipulator interface, pretreatment chamber's interface and some backup flange interfaces, be convenient to Function Extension and use; This magnetic control chamber 1 is connected with vacuum-pumping system in being arranged on machine frame 7, vacuum-pumping system is to be connected connection with turbomolecular pump by push-pull valve 10, add the gas circuit that the mechanical pump 9 of top and bottom forms and realize main taking out, take out by the side gas circuit that angle valve 20 and mechanical pump 9 form and realize that bypass bleeds.
On lower flange 15 in magnetic control chamber 1, four magnetic controlling targets 6 are installed, favour the substrate that is contained on single cooling autorotation disc 27, carry out magnetron sputtering plating.Each magnetic controlling target 6 tops are equipped with a magnetic controlling target baffle plate 8, and this magnetic controlling target baffle plate 8 is connected with the 3rd motor 19 that is arranged on machine frame 7 inside, by the 3rd motor 19 driving switch magnetic controlling target baffle plates 8.Magnetic controlling target baffle plate 8 closing conditions are that magnetic controlling target baffle plate 8 blocks magnetic controlling target 6, go to a side and magnetic controlling target baffle plate 8 opened conditions are magnetic controlling target baffle plate 8, expose magnetic controlling target 6.Magnetic controlling target 6 can freely select to install permanent magnetism target or electromagnetism target, and the radio-frequency sputtering of permanent magnetism target and d.c. sputtering are compatible, and water-cooled is arranged in target, comprise the common permanent magnetism target of sputter nonferromugnetic material, the strong permanent magnetic target of sputter ferromagnetic substance.The target head of the magnetic controlling target 6 of the present embodiment can bend, and favours substrate.
One end of single cooling autorotation disc 27 is loaded with substrate, insert in magnetic control chamber 1, is positioned at the top of each magnetic controlling target 6 sputter ends, and the other end of single cooling autorotation disc 27 is positioned at the top of upper cover 2.The first motor 4 and the first speed reduction unit 22 are installed on upper cover 2, this first motor 4 be connected speed reduction unit 22 and be connected with pulley assemblies by Timing Belt and be connected, drive 27 rotations of single cooling autorotation disc with single cooling autorotation disc 27.Also be provided with manual substrate baffle plate assembly 25 on upper cover 2, this manual substrate baffle plate assembly 25 comprises rotating shaft and baffle plate, its shaft is installed in rotation on upper cover 2, and the lower end of rotating shaft is connected with baffle plate, and rotating shaft can block this baffle plate the substrate on single cooling autorotation disc 27.Single cooling autorotation disc 27 has a cooling station, is in the centre of single cooling autorotation disc 27, can place a substrate; Manually the baffle plate in substrate baffle plate assembly 25 be positioned at when blocking substrate substrate under, each magnetic controlling target 6 be positioned at these list cooling autorotation disc 27 cooling stations around, the central axis of the circles that surround in the middle of each magnetic controlling target 6 and the central axis conllinear of substrate.But the substrate water flowing is cooling, also can lead to cooled with liquid nitrogen; Substrate overall dimension Φ 50mm by the substrate rotation that Timing Belt and pulley assemblies 12 drive on single cooling autorotation disc 27, can control coating process by the first motor 4, the first speed reduction unit 22 by computer control system.
The principle of work of the present embodiment is:
When pulling down substrate water-cooling heating revolution platform 3, electronic substrate baffle plate 5 and magnetic controlling target shielding cylinder 13, change single cooling rotary plate 27 and manual substrate baffle plate assembly 25, with the target head bending of magnetic controlling target 6, jointly point to substrate on single cooling rotary plate 27, the cosputtering of the multicomponent material in the time of can being used for substrate heating.
Under manual substrate baffle plate assembly 25 auxiliary, can carry out oblique target co-sputtering composite membrane by computer-controlled program.At first refine target, after the refining target is completed, open magnetic controlling target baffle plate 8, magnetic controlling target 6 build-ups of luminance are opened manual substrate baffle plate assembly 25, carry out sputter coating; Can carry out the sputter of single target list, the sputter in turn of many targets, More target sputtering together, and the power of magnetic controlling target 6 is adjustable.In coating process, in the sputtering system that disposes single cooling rotary plate 27, can carry out water-cooled to substrate.
The target head of the magnetic controlling target 6 of the present embodiment can bending, and target center can be regulated continuously to the spacing of substrate center, and the indication of positioning distance is arranged.
Each motor of the present invention can be electrically connected to computer control system respectively, is controlled by computer control system.The invention provides and a kind ofly can realize that vertical sputter can realize the magnetic control sputtering system of cosputtering again, magnetic control sputtering system is simple in structure, control is convenient, vacuum tightness high (6.6 * 10E-6Pa), can supply that laboratory, enterprise, R﹠D institution make, the various materials of research and character, various film and character thereof.
Claims (11)
1. magnetic control sputtering system, it is characterized in that: comprise magnetic control chamber (1), substrate turntable, substrate turntable driving motor, transmission rig, magnetic controlling target (6), machine frame (7), vacuum-pumping system and electric hoisting mechanism (14), wherein magnetic control chamber (1) be arranged on machine frame (7) upper, be connected with the vacuum-pumping system that is positioned at machine frame (7), be evenly equipped with the magnetic controlling target (6) on a plurality of lower flanges (15) that are arranged on magnetic control chamber (1) in magnetic control chamber (1); Described substrate turntable is rotatably installed on the upper cover (2) of magnetic control chamber (1), contained substrate is positioned at the top of magnetic control chamber (1), each magnetic controlling target (6), on the upper cover (2) of magnetic control chamber (1), the substrate turntable driving motor is installed also, described substrate turntable drives rotation by transmission rig by the substrate turntable driving motor; Electric hoisting mechanism (14) is installed in described machine frame (7), the output terminal of this electric hoisting mechanism (14) is passed, is connected with the upper cover (2) of magnetic control chamber (1) by machine frame (7), drives substrate turntable and the lifting of substrate turntable driving motor on upper cover (2) and upper cover (2).
2. by magnetic control sputtering system claimed in claim 1, it is characterized in that: described magnetic controlling target (6) has vertical substrate turntable or two working positions of inclination substrate turntable, each magnetic controlling target (6) top is equipped with a magnetic controlling target baffle plate (8), this magnetic controlling target baffle plate (8) three motor (19) inner with being arranged on machine frame (7) is connected, by the 3rd motor (19) driving switch magnetic controlling target baffle plate (8).
3. by magnetic control sputtering system claimed in claim 1, it is characterized in that: the periphery of described each magnetic controlling target (6) is equipped with the magnetic controlling target shielding cylinder (13) on the lower flange (15) that is arranged on magnetic control chamber (1).
4. by magnetic control sputtering system claimed in claim 1, it is characterized in that: described substrate turntable is substrate water-cooling heating revolution platform (3), and the one end is loaded with substrate, inserts in magnetic control chamber (1), and the other end is positioned at the top of upper cover (2); The first motor (4) is installed on described upper cover (2), and this first motor (4) is connected 12 by Timing Belt with pulley assemblies) be connected, drive substrate water-cooling heating revolution platform (3) rotation with substrate water-cooling heating revolution platform (3); Be rotatablely equipped with electronic substrate baffle plate (5) in described magnetic control chamber (1), one end of this electronic substrate baffle plate (5) is positioned between the end and each magnetic controlling target (6) sputter end that substrate water-cooling heating revolution platform (3) is loaded with substrate, the other end of electronic substrate baffle plate (5) second motor (18) interior with being arranged on machine frame (7) is connected, and drives rotation by the second motor (18).
5. by magnetic control sputtering system claimed in claim 4, it is characterized in that: described electronic substrate baffle plate (5) is positioned at the centre of each magnetic controlling target (6), and each magnetic controlling target (6) is perpendicular to electronic substrate baffle plate (5); One end of this electronic substrate baffle plate (5) is circular baffle plate, and the above has the circular hole that exposes by the plating substrate.
6. by magnetic control sputtering system claimed in claim 4, it is characterized in that: the other end of described substrate water-cooling heating revolution platform (3) is provided with the disk light beam encoder (16) that is electrically connected to computer control system.
7. by magnetic control sputtering system claimed in claim 4, it is characterized in that: have six stations on described substrate water-cooling heating revolution platform (3), wherein be provided with process furnace above one or two stations, all the other station water flowings are cooling.
8. by magnetic control sputtering system claimed in claim 1, it is characterized in that: described substrate turntable is single heating autorotation disk (24), and the one end is loaded with substrate, inserts in magnetic control chamber (1), and the other end is positioned at the top of upper cover (2); The 4th motor (26) is installed on described upper cover (2), and the 4th motor (26) drives single heating autorotation disk (24) rotation.
9. by magnetic control sputtering system claimed in claim 8, it is characterized in that: described single heating autorotation disk (24) has a heating station, is in the centre of single heating autorotation disk (24), each magnetic controlling target (6) be positioned at this list heat autorotation disk (24) heating station around; Be loaded with substrate on the heating station of single heating autorotation disk (24), be provided with manual substrate baffle plate assembly (25) below this substrate.
10. by magnetic control sputtering system claimed in claim 1, it is characterized in that: described substrate turntable is single cooling autorotation disc (27), and the one end is loaded with substrate, inserts in magnetic control chamber (1), and the other end is positioned at the top of upper cover (2); The first motor (4) is installed on described upper cover (2), and this first motor (4) is connected 12 by Timing Belt with pulley assemblies) be connected, drive substrate water-cooling heating revolution platform (3) rotation with substrate water-cooling heating revolution platform (3).
11. by magnetic control sputtering system claimed in claim 10, it is characterized in that: described single cooling autorotation disc (27) has a cooling station, is in the centre of single cooling autorotation disc (27), each magnetic controlling target (6) be positioned at the cooling station of this list cooling autorotation disc (24) around; Cooling station at single cooling autorotation disc (27) has been uploaded substrate, is provided with manual substrate baffle plate assembly (25) below this substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2011103582320A CN103103486A (en) | 2011-11-11 | 2011-11-11 | Magnetron sputtering system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
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| CN2011103582320A CN103103486A (en) | 2011-11-11 | 2011-11-11 | Magnetron sputtering system |
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| CN105112879A (en) * | 2015-09-11 | 2015-12-02 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering coating workpiece table |
| CN106978597A (en) * | 2017-04-11 | 2017-07-25 | 中国原子能科学研究院 | A kind of magnetron sputtering coating system and the method that high-purity target membrane is prepared using it |
| TWI827920B (en) * | 2020-03-31 | 2024-01-01 | 大陸商北京北方華創微電子裝備有限公司 | Magnetron rotation and lifting mechanism and magnetron sputtering equipment |
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| WO2010047235A1 (en) * | 2008-10-22 | 2010-04-29 | 国立大学法人東北大学 | Magnetron sputtering device |
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| CN105112879A (en) * | 2015-09-11 | 2015-12-02 | 中国电子科技集团公司第四十八研究所 | Magnetron sputtering coating workpiece table |
| CN106978597A (en) * | 2017-04-11 | 2017-07-25 | 中国原子能科学研究院 | A kind of magnetron sputtering coating system and the method that high-purity target membrane is prepared using it |
| TWI827920B (en) * | 2020-03-31 | 2024-01-01 | 大陸商北京北方華創微電子裝備有限公司 | Magnetron rotation and lifting mechanism and magnetron sputtering equipment |
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Application publication date: 20130515 |