CN110031964A - Drawing apparatus - Google Patents
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- CN110031964A CN110031964A CN201910171295.1A CN201910171295A CN110031964A CN 110031964 A CN110031964 A CN 110031964A CN 201910171295 A CN201910171295 A CN 201910171295A CN 110031964 A CN110031964 A CN 110031964A
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0875—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more refracting elements
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/12—Scanning systems using multifaceted mirrors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706835—Metrology information management or control
- G03F7/706837—Data analysis, e.g. filtering, weighting, flyer removal, fingerprints or root cause analysis
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/706843—Metrology apparatus
- G03F7/706849—Irradiation branch, e.g. optical system details, illumination mode or polarisation control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Toxicology (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Data Mining & Analysis (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Lenses (AREA)
- Seal Device For Vehicle (AREA)
- Confectionery (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Abstract
As in the one-dimensionally scanning element (Un) of the light-beam scanner of scanning light beam (LBn) on substrate (P), has the 1st cylindrical lens (CY1) that there is focusing force in a direction, the light beam (LBn) through the 1st cylindrical lens (CY1) is biased to carry out the polygonal mirror (PM) of one-dimensional scanning, the light beam (LBn) being biased to the state of telecentricity is projected to the f θ lens system (FT) of substrate (P), and incidence penetrates the light beam (LBn) of f θ lens system (FT) and has the 2nd cylindrical lens (CY2) of focusing force in a direction, 1st cylindrical lens (CY1) has focusing force in mutually orthogonal directions with the 2nd cylindrical lens (CY2), the scanning element (Un) has in turn is set to the 1st cylindrical lens (CY1) and polygonal mirror (P M the lens system (G10) between).
Description
The application is divisional application, original bill application No. is 201780027995.2 (PCT/JP2017/016274), applications
Day is on 04 25th, 2017, entitled " light-beam scanner and drawing apparatus ".
Technical field
The present invention describe specific pattern in substrate about a kind of and along the light beam of main scanning direction one-dimensionally scanning light beam
Scanning means and the drawing apparatus for describing specific pattern using the light-beam scanner.
Background technique
It is known that can scan to constant speed by using f θ lens system and polygonal mirror (polygonal rotating mirror) and be projected to photosensitive material
Light beam on material.Each reflecting surface of general polygonal mirror is and the surfaces of revolution (plane comprising direction of rotation) that is orthogonal to polygonal mirror
Direction be formed parallel to, but actual reflecting surface just like relative to the direction orthogonal with the surfaces of revolution of polygonal mirror with slightly inclining
Oblique error, i.e., so-called face tilt (inclination) error.The error is different because of each reflecting surface, therefore by f θ lens system in photosensitive
The image position (launching position of light beam) for the luminous point being imaged on material, has offset in each reflecting surface.
For the offset for preventing the launching position, in following Japanese Patent Laid-Open 8-297255 bulletins, in polygonal mirror
Front and f θ lens system after this at 2, configured with only in deviation direction (scanning direction, polygonal mirror relative to polygonal mirror
Direction of rotation) orthogonal direction has refractive cylindrical lens.That is, configuration is parallel with the scanning direction of light beam just like bus
2 cylindrical lenses.It, can as a result, on the direction (sub-scanning direction) orthogonal with the scanning direction of light beam (main scanning direction)
Make to become conjugate relation with the plane of illumination of photosensitive material on the reflecting surface of polygonal mirror, even if face slope error is anti-because of polygonal mirror
It penetrates face and different, also light beam can be made to fix in the launching position on photosensitive material in sub-scanning direction.
However, the 1st cylinder in front of polygonal mirror will be configured at as described in Japanese Patent Laid-Open 8-297255 bulletin
Lens and the 2nd cylindrical lens being configured at after f θ lens system (being made of multi-disc spherical lens) it is each by simple lens
When constituting, and making the bus of the 1st cylindrical lens situation parallel with the bus of the 2nd cylindrical lens, exists and be difficult to carry out to general
The optical design (lens error correction) etc. that the aberration as caused by cylindrical lens (such as spherical aberration of light beam) reduces well is asked
Topic.
Summary of the invention
The light-beam scanner of 1st embodiment of the invention, be one side by the light beam from light supply apparatus be projected to by
Irradiation body, on one side in one-dimensionally scanning above-mentioned light beam on above-mentioned irradiated body, have: the 1st optical component, by above-mentioned light beam
It is concentrated on the 1st direction of corresponding above-mentioned one-dimensional square；Light beam is biased to component, makes the above-mentioned light by above-mentioned 1st optical component
Beam enters, and so that above-mentioned light beam is partial to above-mentioned 1st direction to carry out above-mentioned one-dimensional scanning；Scanning use optical system, make with
Above-mentioned light beam is biased to the above-mentioned light beam that component is biased to and is injected, and projects to above-mentioned irradiated body；2nd optical component makes to pass through
The above-mentioned light beam of above-mentioned scanning optical system is injected, and by above-mentioned beam condenser in 2nd side orthogonal with above-mentioned 1st direction
To；And lens system, it is set to above-mentioned 1st optical component and above-mentioned light beam is biased between component, above-mentioned 1st optics will be passed through
The above-mentioned light beam of component is concentrated on above-mentioned 2nd direction in the position that above-mentioned light beam is biased to component.
The drawing apparatus of 2nd embodiment of the invention, be one side on irradiated body main scanning direction scanning come from
The light beam of light supply apparatus relatively moves above-mentioned irradiated body and above-mentioned light beam in sub-scanning direction, to be shone in above-mentioned
Beam depicting pattern, has: it is movably biased to component, to scan above-mentioned light beam in above-mentioned main scanning direction, and above-mentioned light beam
It injects and makes it in the one-dimensional deviation of above-mentioned main scanning direction；Scanning optical system, makes one-dimensional with above-mentioned movable deviation component
The above-mentioned light beam being biased to is injected, and above-mentioned beam condenser is projected on above-mentioned irradiated body；1st optical component, with different
The refracting power of tropism will converge on above-mentioned main scanning direction towards the above-mentioned movable above-mentioned light beam for being biased to component；2nd optics structure
Part, the refracting power with anisotropy, by from above-mentioned scanning with optical system project and towards the above-mentioned light of above-mentioned irradiated body
Beam convergence is in above-mentioned sub-scanning direction；And the 3rd optical component, it is set to above-mentioned 1st optical component and above-mentioned movable deviation structure
Between part, and there is the above-mentioned light beam for making to converge on above-mentioned main scanning direction to inject, and convert it in above-mentioned subscan side
To pinching light beam and make its towards it is above-mentioned it is movable be biased to component project iso refracting power.
The drawing apparatus of 3rd embodiment of the invention is the light that one side will be partial to the 1st direction by movably deviation component
Beam, it is one-dimensional in being carried out on above-mentioned irradiated body along above-mentioned 1st direction on one side with scanning in optics system projects to irradiated body
Scanning, to have in above-mentioned irradiated body depicting pattern: the 1st adjustment optical system, it includes the 1st lens component, the 1st
Lens component has to make to be projected to the above-mentioned movable above-mentioned light beam for being biased to component in 2nd side orthogonal with above-mentioned 1st direction
To convergent anisotropy refracting power；And the 2nd adjustment optical system, it includes the 2nd lens component, the 2nd lens component, which has, to be used
So that the above-mentioned light beam from above-mentioned scanning optical system towards above-mentioned irradiated body is in the convergent anisotropy folding in above-mentioned 2nd direction
Penetrate power；The wavelength of above-mentioned light beam is set as λ, numerical value of the above-mentioned light beam in above-mentioned 1st direction of above-mentioned irradiated body will be projected to
Aperture is set as NAy, NA will be set as in the numerical aperture in above-mentioned 2nd directionx, the above-mentioned light beam for being projected to above-mentioned irradiated body is existed
The spherical aberration in above-mentioned 1st direction is set as S1, S will be set as in the spherical aberration in above-mentioned 2nd direction2When, above-mentioned 1st lens component
With above-mentioned 2nd lens component, it is set to meet two following conditions any one: S1< λ/NAy 2And S2< λ/NAx 2And |
S1- S2| < λ/NAy 2And | S1- S2| < λ/NAx 2。
The drawing apparatus of 4th embodiment of the invention is the main scanning direction one-dimensional scanning pattern on irradiated body
The light beam of description, and make above-mentioned irradiated body with above-mentioned light beam in the sub-scanning direction phase intersected with above-mentioned main scanning direction
To movement, to have in above-mentioned irradiated body depicting pattern: beam generated device, to generate above-mentioned light beam；Beam expander,
Above-mentioned light beam from above-mentioned beam generated device is converted to collimated light beam made of expanding beam diameter by it；Light beam is biased to
Component makes it to direction one corresponding with above-mentioned main scanning direction after injecting the above-mentioned light beam after above-mentioned beam expander is converted
Dimension is biased to；Scanning optical system, the above-mentioned light beam after making above-mentioned one-dimensional deviation is injected, and the luminous point of above-mentioned light beam is concentrated on
On above-mentioned irradiated body；1st optical system, it includes the 1st optical element, the 1st optical element be set to above-mentioned beam expander with
Above-mentioned light beam is biased between component, is had inject the above-mentioned light beam after above-mentioned beam expander is converted, and make to be projected to
The above-mentioned light beam on light beam deviation component is stated in the convergent anisotropy refracting power in direction corresponding with above-mentioned sub-scanning direction；2nd
Optical system, it includes the 2nd optical element, the 2nd optical element has to make from the injection of above-mentioned scanning optical system, court
To above-mentioned irradiated body above-mentioned light beam in the convergent anisotropy refracting power of above-mentioned sub-scanning direction；And offset optical component,
In its optical path for being set to above-mentioned beam expander, make the past direction offset corresponding with above-mentioned sub-scanning direction of the optical path of above-mentioned light beam.
Detailed description of the invention
Fig. 1 be show embodiment comprising to substrate implement exposure-processed exposure device device manufacturing system it is general
The figure slightly constituted.
Fig. 2 is to show light beam switching part shown in FIG. 1 and describe the schematic configuration of head and indicate to describe each scanning of head
The scan line of unit is in the figure of the configuration relation on substrate.
Fig. 3 is the specific composition shown around the selection optical element and incident mirror of light beam switching part shown in Fig. 2
Figure.
Fig. 4 is the figure for showing the specific composition of scanning element shown in Fig. 2, and is oneself and the scanning direction comprising light beam
The plane (XZ plane) that the plane (plane parallel with X/Y plane) of (being biased to direction) is orthogonal observes resulting figure.
Fig. 5 is shown in Fig. 4 from the planar observation parallel with the plane in deviation direction (main scanning direction) comprising light beam
Aperture diaphragm to substrate light beam skeleton diagram.
Fig. 6 is the lens data figure shown in the optical design example of comparative example 1.
Fig. 7 is compared with observing in the face parallel with the plane in the deviation direction (main scanning direction of luminous point) comprising light beam
Beam expander in example 1 to substrate (image planes) light beam state skeleton diagram.
Fig. 8 is the reflection from the planar observation shown in Fig. 7 beam expander orthogonal with the main scanning direction of light beam to polygonal mirror
The skeleton diagram of the state of the light beam in face.
Fig. 9 is from the reflecting surface of the planar observation shown in Fig. 7 polygonal mirror orthogonal with the main scanning direction of light beam to substrate
The skeleton diagram of the state of the light beam of (image planes).
Figure 10 is by the spherical aberration on from f θ lens system projects to the main scanning direction of the light beam of substrate (image planes)
Generation state exaggerates and the figure that is illustrated.
Figure 11 is by the spherical aberration on from f θ lens system projects to the sub-scanning direction of the light beam of substrate (image planes)
Generation state exaggerates and the figure that is illustrated.
Figure 12 is main scanning direction and the subscan for emulating the light beam by generating and by the optical design example of comparative example 1
The resulting curve graph of spherical aberration characteristic in direction.
Figure 13 is the difference of the spherical aberration for showing the main scanning direction in comparative example 1 and the spherical aberration of sub-scanning direction
Spherical aberration characteristic curve graph.
Figure 14 is the figure for showing the lens data in the optical design example of embodiment 1.
Figure 15 is real in observing in the face parallel with the plane in deviation direction (main scanning direction of luminous point) comprising light beam
Apply beam expander in example 1 to substrate (image planes) light beam state skeleton diagram.
Figure 16 is anti-to polygonal mirror in observing beam expander shown in figure 15 in the face orthogonal with the main scanning direction of light beam
Penetrate the skeleton diagram of the state of the light beam in face.
Figure 17 is in observing the reflecting surface of polygonal mirror shown in figure 15 in the face orthogonal with the main scanning direction of light beam to base
The skeleton diagram of the state of the light beam of plate (image planes).
Figure 18 is the main scanning direction and sub-scanning direction for emulating the light beam generated by the optical design example of embodiment 1
The resulting curve graph of spherical aberration characteristic.
Figure 19 is the difference of the spherical aberration for showing the main scanning direction in embodiment 1 and the spherical aberration of sub-scanning direction
Spherical aberration characteristic curve graph.
Figure 20 A is display parallel-plate in state diagram not inclined in the face XZ, and Figure 20 B is to indicate that parallel-plate inclines relative to the face YZ
The state diagram of rake angle η.
Specific embodiment
About the light-beam scanner and drawing apparatus of embodiments of the present invention, preferable embodiment, and one are disclosed
Face is described in detail in following on one side referring to the attached drawing of accompanying.Furthermore embodiments of the present invention are not limited to those realities
Mode is applied, also includes embodiment made of adding various changes or improvement.That is, including industry in constituent element documented by following
Person can be easy imagination, substantially the same embodiment, and following documented constituent element can be appropriately combined.Also, can be in not
It is detached from various omissions, displacement or the change that constituent element is carried out in the range of purport of the invention.
[the 1st embodiment]
Fig. 1 is the exposure device EX comprising implementing exposure-processed to substrate (irradiated body) P for showing the 1st embodiment
The schematic configuration diagram of device manufacturing system 10.Furthermore in following explanation, as long as no special instructions, just set with gravity direction
It unites for the XYZ orthogonal coordinate system of Z-direction, and arrow as illustrated, X-direction, Y-direction and Z-direction is illustrated.
Device manufacturing system 10 is the system implemented particular procedure (exposure-processed etc.) to substrate P and manufacture electronic component
(substrate board treatment).Device manufacturing system 10 is, for example, the flexible display, membranaceous for constructing manufacture as electronic component
Touch panel, liquid crystal display panel the production lines such as membranaceous colored filter, flexible wiring or flexible transducer manufacture
System.Hereinafter, being illustrated premised on flexible display as electronic component.As flexible display, such as there are organic
EL display, liquid crystal display etc..Device manufacturing system 10 has the construction of so-called roll-to-roll (Roll To Roll) mode,
That is: substrate P is sent out from the supply roller of the diagram for plate shape substrates (sheet substrate) P for being wound with flexible (pliability) in the form of a roll,
And various processing are continuously implemented to the substrate P sent out, various treated bases are then batched by recycling roll (not shown)
Plate P.Therefore, various treated substrate Ps become the multiple element state connected in the conveyance direction of substrate P, and become fall
The substrate at angle.The substrate P sent out from above-mentioned supply roller sequentially passes through processing unit (plant) PR1, exposure device EX and processing unit (plant)
PR2 is subjected to various processing, and is taken up by above-mentioned recycling roll.Substrate P has the moving direction (conveyance direction) of substrate P
As longitudinal direction (long size) and width direction becomes the band-like shape of short side direction (short size).
In 1 embodiment of Yu Ben, X-direction is in the horizontal plane orthogonal with Z-direction, and substrate P automatically supplies roller direction and returns
Receive the direction of roller.Y-direction is in direction orthogonal with X-direction in the horizontal plane orthogonal with Z-direction, and is the width side of substrate P
To (short dimensional directions).Furthermore -Z direction is set as the direction (gravity direction) that gravity works, by the conveying side of substrate P
To being set as +X direction.
Resin film or the foil (foil) being made of metal or alloy such as stainless steels etc. for example can be used in substrate P.As tree
The material of adipose membrane, such as can be used includes polyvinyl resin, acrylic resin, polyester resin, ethylene-vinyl ester copolymer tree
Rouge, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene resin,
And material more than at least one of vinyl acetate resin.Also, thickness and the rigidity (young's modulus) of substrate P are as long as in such as
When passing through the transport path of device manufacturing system 10, substrate P will not generate the gauffer of folding line caused by buckling and irreversibility
In range.As the base material of substrate P, with a thickness of 25 μm~200 μm or so of PET (polyethylene terephthalate) and
The films such as PEN (polyethylene naphthalate) are the typical cases of preferable sheet substrate.
Substrate P has the situation being heated in reason everywhere in being carried out in device manufacturing system 10, therefore preferably selected
The substrate P of the less big material of thermal expansion coefficient.For example, can be by by inhibiting heat swollen and inorganic filler is mixed in resin film
Swollen coefficient.Inorganic filler may be, for example, titanium oxide, zinc oxide, aluminium oxide or silica etc..Also, substrate P may be either to pass through floating
Method etc. and the individual layers with a thickness of 100 μm or so of very thin glass manufactured, can also be in the very thin above-mentioned resin of glass gluing
Laminate made of film, foil etc..
And say, the pliability (flexibility) of so-called substrate P even if refer to substrate P apply self weight degree power its
The property that will not be wrecked or be broken and the substrate P can be curved.Also, also including by the property of the power buckling of self weight degree
In pliability.Also, flexible degree can be according to the material of substrate P, size, thickness, film forming in the layer construction in substrate P, temperature
Degree or the environment such as humidity etc. and change.As long as in short, in by substrate P certainly wound on the member for being set to this 1st embodiment
When the situation of the conveyance direction conversion component such as various conveying rollers, rotating cylinder in the transport path in part manufacture system 10
Buckling can not occur and cause folding line or damaged (occur broken or crack) occurs smooth conveying substrate P, just can be known as
Flexible range.
Processing unit (plant) (processing unit) PR1 one side will automatically supply substrate P that roller is sent to exposure device EX with specific speed
In conveyance direction (+X direction) conveying along long dimension direction, one in face of being sent to step before the substrate P of exposure device EX carries out
Processing.By the processing of the preceding step, the substrate P for being sent to exposure device EX, which becomes, is formed with photonasty functional layer in its surface
The substrate (sensitive substrate) of (photosensitive layer).
The photonasty functional layer is to be coated in substrate P and be dried in the form of a solution, thus becomes layer (film).It is photosensitive
The typical case of sexual function layer is photoresist (liquid or dry film shape), but as the material for being not necessarily to development treatment, is had by ultraviolet light
The photonasty silane coupling agent (SAM) or aobvious in the part being irradiated with ultraviolet radiation that the close liquid repellency of the part of irradiation is upgraded
Reveal the photonasty reducing agent etc. of plating also former base.When using situation of the photonasty silane coupling agent as photonasty functional layer,
It is lyophily that the pattern part exposed in substrate P by ultraviolet light is modified from liquid repellency.It therefore, can be by as lyophily
Part on selection coating contain electric conductivity ink (ink containing silver or the conductive nanometers particle such as copper) or semiconductor material
Liquid etc., and the electrode for constituting thin film transistor (TFT) (TFT) etc., semiconductor, insulation or the wiring of connection will be become by being formed
Pattern layer.When using situation of the photonasty reducing agent as photonasty functional layer, in what is exposed in substrate P by ultraviolet light
Pattern part appears plating also former base.Therefore, after exposure, substrate P is impregnated in the plating liquid containing palladium ion etc. immediately solid
It fixes time, the pattern layer that (precipitation) is made of palladium is consequently formed.Such plating is addition (additive) processing procedure, furthermore
It also can be using premised on as the etching process for subtracting into (subtractive) processing procedure.When the situation, it is sent to the base of exposure device EX
Plate P can be by base material to be set as PET or PEN and in its surface whole face or selectively the metallicity such as AM aluminum metallization (Al) or copper (Cu) are thin
Film, so thereon lamination photoresist layer and formed.
Exposure device (processing unit) EX be one side by from the substrate P that processing unit (plant) PR1 is moved to processing unit (plant) PR2 with
Specific speed is transported in conveyance direction (+X direction), one is exposed the processing unit of processing in face of substrate P.Exposure device EX to
Surface (surface of photonasty functional layer, the i.e. photosurface) irradiation of substrate P and the pattern of electronic component are (for example, constitute electronics
The patterns such as the electrode or wiring of the TFT of element) corresponding light pattern.It is formed and above-mentioned pattern pair in photonasty functional layer as a result,
The latent image (modification portion) answered.
In 1 embodiment of Yu Ben, exposure device EX is the exposure device i.e. institute without using the direct imaging mode of mask
Call the exposure device (drawing apparatus) of grating scanning mode.Exposure device EX one side transports substrate in +X direction (sub-scanning direction)
P, on one side by the luminous point SP of the light beam LB (pulsed light beam) of the pulse type of exposure in edge on the plane of illumination (photosurface) of substrate P
Set scanning direction (Y-direction) one-dimensionally scans (main scanning), and the intensity of luminous point SP (is described number according to pattern data
According to, pattern-information) modulation (on/off) at high speed.Describe exposure and electronic component, electricity in the plane of illumination of substrate P as a result,
The corresponding light pattern of specific pattern of road or wiring etc..That is, by the subscan of substrate P and the main scanning of luminous point SP, in substrate
Relativity ground two-dimensional scanning luminous point SP on the plane of illumination (surface of photonasty functional layer) of P, and the plane of illumination in substrate P is retouched
Draw exposure specific pattern.Also, since substrate P is transported along conveyance direction (+X direction), so by by exposure device EX quilt
The exposure area of exposing patterns is to separate specific interval along the long dimension direction of substrate P and be provided with multiple.Due to being in the exposure
Light region forms electronic component, so exposure area is also element-forming region.
Processing unit (plant) (processing unit) PR2 one side is by the substrate P sent from exposure device EX to recycling roll with specific speed
In conveyance direction (+X direction) conveying along long dimension direction, a substrate P after exposed device EX exposure-processed is carried out
The processing (such as plating or development, etching process etc.) of subsequent step.By the processing of the subsequent step, and in substrate P
The upper pattern layer for forming element.
Secondly, also to exposure device EX and then being described in detail referring to Fig. 2~Fig. 5.Exposure device EX such as Fig. 1 institute
Show and is accommodated in tempering room ECV.Inside is remained specific temperature, specified moisture by tempering room ECV, thus inhibits to remove in inside
The substrate P sent is because of the change in shape caused by temperature, and the electrostatic for inhibiting the hygroscopicity of substrate P and generating with conveying
Electrification etc..Tempering room ECV is configured at the setting face E of manufacturing works via antivibration cell S U1, SU2 being passively or actively.Antivibration
Cell S U1, SU2 reduces the vibration from setting face E.Setting face E may be either ground of factory itself, can also be exclusively to set
Face on setting base station (pedestal) to produce horizontal plane is placed on ground.Exposure device EX at least has substrate transport mechanism
12, light supply apparatus 14, light beam switching part BDU, description head 16 and control device 18.Control device 18 is control exposure device EX
Each portion device.The control device 18 includes the record media etc. that computer and record have programming, executes volume by the computer
Journey, and the control device 18 as this 1st embodiment functions.
Substrate transport mechanism 12 is a part for constituting the base board delivery device of device manufacturing system 10, will be from processing unit (plant)
The substrate P of PR1 conveying is sent to processing unit (plant) PR2 after transporting in exposure device EX with specific speed with specific speed.Substrate
The upstream side (-X direction side) of the conveyance direction of 12 self-reference substrate P of transport mechanism sequentially has marginal position controller EPC, driving
Roller R1, tension adjustment roller RT1, rotating cylinder (cylinder rotating cylinder) DR, tension adjustment roller RT2, driving roller R2 and driving rolling
Cylinder R3.By marginal position controller EPC, driving roller R1~R3, tension tune that substrate P is set up in substrate transport mechanism 12
Whole roller RT1, RT2 and rotating cylinder (cylinder rotating cylinder) DR, and it is specified in the transport path of the substrate P transported in exposure device EX.
Marginal position controller EPC adjusts width direction (Y-direction and the substrate P from the processing unit (plant) PR1 substrate P transported
Short dimensional directions) on position.That is, marginal position controller EPC is in the base for the state conveying for being applied specific tensile
The position of the end (edge) of the width direction of plate P is in the range relative to target position ± more than ten μm~tens μm or so
It is mobile in width direction to make substrate P for the mode of (permissible range), and adjusts the position in the width direction of substrate P.Marginal position
It is in the state roller set up for being applied specific tensile and the width direction of detection substrate P that controller EPC, which has substrate P,
The edge sensor (not shown) (end test section) of the position of end (edge).Marginal position controller EPC is based on above-mentioned side
It is mobile in Y-direction to make the above-mentioned roller of marginal position controller EPC for detection signal detected by edge sensor, and adjusts base
Position in the width direction of plate P.Driving roller (clamping roller) R1 keeps the base transported from marginal position controller EPC on one side
The both sides of plate P, rotate on one side, and substrate P is transported to rotating cylinder DR.Furthermore marginal position controller EPC can also be rolled up
It is around in the long dimension direction of the substrate P of the rotating cylinder DR mode orthogonal always relative to the central axis AXo of rotating cylinder DR, it is appropriate to adjust
Position in the width direction of whole substrate P, and in a manner of the slope error on the direction of travel for correcting substrate P, it is appropriate to adjust
The rotary shaft of the above-mentioned roller for the treatment of selvedge edge positioner EPC and the depth of parallelism of Y-axis.
Rotating cylinder DR has the central axis for extending along Y-direction and extending along the direction intersected with the direction that gravity works
AXo and with central axis AXo at a distance of the cylindric outer peripheral surface of radii fixus.Rotating cylinder DR follows its outer peripheral surface (circumference on one side
Face) so that a part of substrate P is supported (holding) with bending to cylinder planar in long dimension direction, on one side with central axis AXo
Centered on rotate and in +X direction (long dimension direction) transport substrate P.Rotating cylinder DR is to be projected to come from the support of its outer peripheral surface
Describe the region (part) in the substrate P of the light beam LB (luminous point SP) of head 16.Rotating cylinder DR from for formed electronic component
Face (side for being formed with photosurface), which is that the face (back side) of opposite side is collateral, holds (contiguity is kept) substrate P.In the side Y of rotating cylinder DR
To two sides, be provided with the axis Sft that is supported by cricoid bearing in such a way that rotating cylinder DR is around central axis AXo rotation.Rotating cylinder
DR is by assigning the rotary driving source (not shown) controlled come free control device 18 (for example, motor or speed reducer to axis Sft
Structure etc.) torque, and around central axis AXo with fix rotation speed rotation.Furthermore for convenience, will comprising central axis AXo and
The plane parallel with YZ plane is known as median plane Poc.
Driving roller (clamp roller) R2, R3 is to separate specific interval along the conveyance direction (+X direction) of substrate P and configure,
Set slackness (nargin) is assigned to the substrate P after exposure.It drives roller R2, R3 in the same manner as driving roller R1, keeps on one side
The both sides of substrate P, rotate on one side, and substrate P is transported to processing unit (plant) PR2.Tension adjustment roller RT1, RT2 is to-Z
Direction is energized, assigns specific tensile in long dimension direction to the substrate P for being wound to rotating cylinder DR and being supported.As a result,
Make to assign to the tension stability of the long dimension direction for the substrate P for hanging around rotating cylinder DR and turn in particular range.Control device 18
By controlling rotary driving source (for example, motor or deceleration mechanism etc.) (not shown), and make to drive roller R1~R3 rotation.Again
Person drives the central axis AXo of the rotary shaft of roller R1~R3 and the rotary shaft of tension adjustment roller RT1, RT2 and rotating cylinder DR
In parallel.
Light supply apparatus 14 generates and projects light beam (pulsed light beam, pulsed light, laser) LB of pulse type.Light beam LB in
370nm wavelength band below has the ultraviolet of peak wavelength, by luminous frequency (frequency of oscillation, specific frequency of light beam LB
Rate) it is set as Fa.Light beam LB emitted by light supply apparatus 14 is incident to via light beam switching part BDU describes head 16.Light supply apparatus
14 according to control device 18 control, with luminous frequency Fa issue and outgoing beam LB.The light supply apparatus 14 can also be for by generating
The other semiconductor lasers element of the pulsed light of infrared wavelength region, fiber amplifier and by the arteries and veins of amplified infrared wavelength region
It washes off and is converted to the fiber amplifier that Wavelength changing element (harmonic wave generating element) of the pulsed light of ultraviolet wavelength region etc. is constituted
Device laser light source.By constituting light supply apparatus 14 by this method, the hair that frequency of oscillation Fa is hundreds of MHz and 1 pulsed light can get
It is the pulsed light of the ultraviolet light of the high brightness of several picoseconds or so between light time.Furthermore project what window projected from light supply apparatus 14
It is 1mm or so or 1mm thinner collimated light beam below that light beam LB, which becomes its beam diameter,.
About light beam switching part BDU, referring to Fig. 2 in being described in detail below, with multiple optical switching members
Part, those multiple switching elements so that light beam LB timesharing be incident to constitute describe head 16 multiple scanning element Un (furthermore n=
1,2 ..., 6) in the mode of any one scanning element Un switch over.Multiple switching elements are among scanning element U1~U6
Sequentially switch the scanning element Un for light beam LB incidence.For example, light beam switching part BDU implement repeatedly with U1 → U2 → U3 → U4 →
Movement of the sequence switching of U5 → U6 for the scanning element Un of light beam LB incidence.Furthermore it sometimes will be via light beam switching part BDU
And be incident to scanning element Un, the light beam LB from light supply apparatus 14 be expressed as LBn.Moreover, indicating incident sometimes with LB1
To the light beam LBn of scanning element U1, and each light beam for being incident to scanning element U2~U6 is similarly indicated with LB2~LB6
LBn。
As shown in Fig. 2, being provided with the light beam LB1~LB6's incident to main scanning in each scanning element U1~U6
Polygonal mirror PM.In 1 embodiment of Yu Ben, each polygonal mirror PM of each scanning element Un is on one side with identical rotation speed essence
The mode for the rotation angular phase that thickly rotation, one side are kept fixed each other obtains synchronously control.It as a result, can will be from each scanning
Unit U1~U6 is projected to the timing (during the main scanning of luminous point SP) of the main scanning of respective light beam LB1~LB6 of substrate P with not
The mode to overlap each other is set.Therefore, light beam switching part BDU can be supplied to scanning element Un's with switching light beam LB
Any one is so that light beam LB is incident to any one for carrying out the scanning element Un of scanning of luminous point SP, i.e. timesharing ground dispensing light beam
LB.Furthermore carry out luminous point SP main scanning scanning element Un (for the scanning element Un of light beam LBn incidence) be with U1 → U2 →
U3 → U4 → U5 → U6 → U1 ... reiteration.About so by the light beam LB timesharing dispensing from light supply apparatus 14 at most
A scanning element Un each composition is disclosed in No. 2015/166910 bulletin of International Publication No..
As shown in Fig. 2, describing head 16 as institute made of arranging multiple scanning element Un (U1~U6) of identical composition
Call the description head of Multibeam.Describe a part for the substrate P that head 16 is supported in the outer peripheral surface (periphery) by rotating cylinder DR, leads to
Cross multiple scanning element Un (U1~U6) and depicting pattern.Each scanning element Un (U1~U6) will come from light beam switching part on one side
The light beam LBn of BDU is projected in substrate P (on the plane of illumination of substrate P), on one side in substrate P by light beam LBn optically focused (receive
It is poly-).The light beam LBn (LB1~LB6) being projected in substrate P as a result, becomes luminous point SP.Also, by each scanning element Un (U1~
U6 the rotation of polygonal mirror PM), and the light beam LBn (LB1~LB6) being projected in substrate P is scanned in main scanning direction (Y-direction)
Luminous point SP.By the scanning of luminous point SP, and the linear description line in the pattern for providing out to describe 1 row in substrate P (is swept
Retouch line) SLn (furthermore n=1,2 ..., 6).Indicate the luminous point SP of light beam LBn in the scanning rail in substrate P that is, describing line SLn
Mark.
Scanning element U1 is along line SL1 scanning point SP is described, and similarly, scanning element U2~U6 is along description line SL2~SL6
Scanning point SP.As shown in Fig. 2, the description line SLn (SL1~SL6) of multiple scanning element Un (U1~U6) is across median plane Poc
(referring to Fig.1) it is configured in the circumferencial direction of rotating cylinder DR in 2 rows with Heterogeneous Permutation.Odd number describes line SL1, SL3, SL5
It is located relative on the plane of illumination of the substrate P of the upstream side (-X direction side) for the conveyance direction that median plane Poc is substrate P, and
Specific interval, which is separated, along Y-direction is configured to 1 row.It is base that even number, which describes line SL2, SL4, SL6 to be located relative to median plane Poc,
On the plane of illumination of the substrate P in the downstream side (+X direction side) of the conveyance direction of plate P, and specific interval configuration is separated along Y-direction
At 1 row.
Therefore, multiple scanning element Un (U1~U6) also across median plane Poc in substrate P conveyance direction in 2 rows with mistake
Position arranges and configures.That is, odd number scanning element U1, U3, U5 relative to median plane Poc substrate P conveyance direction it is upper
Trip side (-X direction side) separates specific interval along Y-direction and is configured to 1 row.Even number scanning element U2, U4, U6 relative to
Median plane Poc separates specific interval along Y-direction for the downstream side (+X direction side) of the conveyance direction of substrate P and is configured to 1 row.Surprise
Relative to Poc pairs of median plane when number scanning element U1, U3, U5 and even number scanning element U2, U4, U6 is from XZ planar observation
Claim and is arranged.
Odd number describes line SL1, SL3, SL5 and is separated with even number description line SL2, SL4, SL6, but in the side Y
It is not separated from each other and connects in (width direction of substrate P, main scanning direction).Describe the width of line SL1~SL6 and substrate P
Direction, i.e. the central axis AXo of rotating cylinder DR are substantially parallel.Furthermore it is so-called make describe line SLn in Y-direction connecting be to instigate description
The end of line SLn in Y-direction each other in abutting or partly overlap.When the situation for making the end for describing line SLn overlap each other, example
It can such as make it including for each length for describing line SLn comprising description starting point or description end point in Y-direction hundred
Overlapping in/several following ranges.
In this way, the integral way of the width direction of exposure area is all covered with multiple scanning element Un (U1~U6), by
Each scanning element Un (U1~U6) shares scanning area.Each scanning element Un (U1~U6) can be in the width side along substrate P as a result,
To each depicting pattern for being split to form multiple regions (describing range).For example, if by the Y-direction of 1 scanning element Un
Sweep length (length for describing line SLn) is set as 20~60mm or so, then is swept by configuring this 3 odd numbers in Y-direction
It retouches unit U1, U3, U5 and this 3 even number scanning elements U2, U4, U6 and amounts to 6 scanning element Un, and by describable Y
The width expansion in direction is to 120~360mm or so.Each length (length for describing range) for describing line SLn (SL1~SL6) is former
It is set as on then identical.That is, the scanning distance principle of the luminous point SP along each and scanning light beam LBn of description line SL1~SL6
On be set as identical.
When the situation of 1 embodiment of Yu Ben, the light beam LB from light supply apparatus 14 is pulsed light, so in the main scanning phase
Between be projected to describe line SLn on luminous point SP according to the frequency of oscillation Fa (for example, 400MHz) of light beam LB and become discreteness.Cause
This, need to make the luminous point SP projected by 1 pulsed light of light beam LB the and luminous point SP that is projected by next 1 pulsed light in
Main scanning direction overlapping.The amount of the overlapping is the scanning speed (speed of main scanning) of size φ according to luminous point SP, luminous point SP
The frequency of oscillation Fa of Vs and light beam LB and set.Effective size (diameter) φ of luminous point SP is approximate in the intensity distribution of luminous point SP
When the situation of Gaussian Profile, by the 1/e of the peak strength as luminous point SP2The width dimensions of the intensity of (or 1/2) are determined.
In 1 embodiment of Yu Ben, in such a way that luminous point SP is relative to effective size (size) φ overlapping φ × 1/2 or so, and set
The scan velocity V s (rotation speed of polygonal mirror PM) and frequency of oscillation Fa of luminous point SP.Therefore, the luminous point SP of pulse type is swept along master
The projection interval for retouching direction becomes φ/2.Therefore, also more satisfactory on sub-scanning direction (with the orthogonal direction line SLn is described)
For between 1 scanning and scanning next time along the luminous point SP for describing line SLn, substrate P is with effective size φ's of luminous point SP
The mobile mode of substantially 1/2 distance is set.In turn, make to connect in the adjacent description line SLn of Y-direction in main scanning direction
It is more satisfactory to be overlapped φ/2 to wait it when the situation connect.In 1 embodiment of Yu Ben, size (size) φ of luminous point SP is set
It is set to 3 μm or so.
Each scanning element Un (U1~U6) at least XZ plane with each light beam LBn towards the central axis AXo of rotating cylinder DR
The mode of traveling irradiates each light beam LBn to substrate P.The light advanced as a result, from each scanning element Un (U1~U6) towards substrate P
The optical path (beam center axis) of beam LBn is in the normal parallel in XZ plane with the plane of illumination of substrate P.At this point, in XZ plane, if
The direction of travel of the light beam LB projected from odd number scanning element U1, U3, U5 to substrate P (will be described into line SL1, SL3, SL5
The direction being connect with central axis AXo) with the angle of median plane Poc be set as-θ 1, then from even number scanning element U2, U4, U6
The direction of travel (direction of line SL2, SL4, SL6 and central axis AXo connection will be described) of the light beam LB projected to substrate P and center
The angle of face Poc becomes+θ 1.That is, in XZ plane, light beam LB from odd number scanning element U1, U3, U5 to substrate P that projected from
Direction of travel with the direction of travel of light beam from even number scanning element U2, U4, U6 to substrate P that projected from relative to median plane
Poc and it is symmetrical.Also, each scanning element Un (U1~U6) is to expose to the light beam LBn for describing line SLn (SL1~SL6) in flat with YZ
The mode vertical relative to the plane of illumination of substrate P in the parallel face in face, to substrate P illumination beam LBn.That is, in plane of illumination
On luminous point SP main scanning direction on, it is scanned with the state of telecentricity to be projected to the light beam LBn (LB1~LB6) of substrate P.
In turn, using Fig. 2 to light beam switching part BDU and describe head 16 scanning element Un (U1~U6) composition simply
It is illustrated.Light beam switching part BDU has multiple selections as switching element optical element AOMn (AOM1~AOM6), more
A reflecting mirror M1~M12, multiple incidence mirror IMn (IM1~IM6) and absorber TR.Selection optical element AOMn (AOM1~
AOM6) there is permeability, and the acousto-optic varying element (AOM:Acousto-Optic driven by ultrasonic signals to light beam LB
Modulator).Multiple selection is corresponding with optical element AOMn (AOM1~AOM6) and multiple incidence mirror IMn (IM1~IM6)
It is arranged in multiple scanning element Un (U1~U6).For example, selection optical element AOM1 and incidence mirror IM1 corresponds to scanning list
First U1 and be arranged, similarly, selection with optical element AOM2~AOM6 and incidence mirror IM2~IM6 corresponding to scanning element U2~
U6 and be arranged.
Light beam LB makes its optical path curve tortuous path shape from light supply apparatus 14 by reflecting mirror M1~M12, and is directed to
To absorber TR.Hereinafter, with optical element AOMn (AOM1~AOM6) being that off-state (does not apply ultrasonic signals with selection
State) situation be described in detail.Furthermore though the illustration is omitted in Fig. 2, in reflecting mirror M1 to the light of absorber TR
It is provided with multiple lens in beam optical path, by light beam LB from collimated light beam pinching, or the light beam LB dissipated after pinching is reverted to
Collimated light beam.Fig. 3 will be used in hereafter describing about its composition.
In Fig. 2, light beam LB and X-axis from light supply apparatus 14 advance in -X direction in parallel and are incident to reflecting mirror
M1.Reflecting mirror M2 is incident to towards the light beam LB that -Y direction reflects in reflecting mirror M1.In the light beam that reflecting mirror M2 is reflected towards +X direction
LB penetrates selection optical element AOM5 as the crow flies and reaches reflecting mirror M3.In the light beam LB that reflecting mirror M3 is reflected towards -Y direction
It is incident to reflecting mirror M4.Towards the light beam LB that -X direction reflects penetrate selection optical element AOM6 as the crow flies in reflecting mirror M4 and
Reach reflecting mirror M5.Reflecting mirror M6 is incident to towards the light beam LB that -Y direction reflects in reflecting mirror M5.In reflecting mirror M6 towards +X direction
The light beam LB of reflection penetrates selection optical element AOM3 as the crow flies and reaches reflecting mirror M7.It is anti-towards -Y direction in reflecting mirror M7
The light beam LB penetrated is incident to reflecting mirror M8.Selection optics is penetrated as the crow flies towards the light beam LB that -X direction reflects in reflecting mirror M8
Element AOM4 and reach reflecting mirror M9.Reflecting mirror M10 is incident to towards the light beam LB that -Y direction reflects in reflecting mirror M9.In reflection
Mirror M10 penetrates selection optical element AOM1 towards the light beam LB that +X direction reflects as the crow flies and reaches reflecting mirror M11.In reflecting mirror
M11 is incident to reflecting mirror M12 towards the light beam LB that -Y direction reflects.It is straight in the light beam LB that reflecting mirror M12 is reflected towards -X direction
Ground is led to absorber TR through selection optical element AOM2.Absorber TR is to absorb light beam LB to inhibit light beam LB
To the ligh trap of external spill and leakage.
If each selection optical element AOMn is applied ultrasonic signals (high-frequency signal), generation makes incident light beam
(0 light) LB is using 1 diffraction light made of diffraction angle diffraction corresponding with the frequency of high frequency as outgoing beam (light beam LBn).
Therefore, it learns the light beam that element AOM1 is projected as 1 diffraction light and becomes LB1 from selecting to use up, similarly, use up from selection
The light beam that element AOM2~AOM6 is projected as 1 diffraction light becomes LB2~LB6.In this way, each selection optical element AOMn
(AOM1~AOM6) plays the function of being biased to the optical path of the light beam LB from light supply apparatus 14.But actual acousto-optic varying element
1 diffraction light generation efficiency be 0 light 80% or so, therefore by it is each selection with optical element AOMn (AOM1~
AOM6 the strength reduction of light beam LBn (LB1~LB6) that is each and being biased to) more original light beam LB.Also, in selection optics
When any one of element AOMn (AOM1~AOM6) is on-state, the 0 light remaining 20% that straight line is advanced without diffraction is left
The right side, but it is finally also absorbed body TR absorption.
It is multiple to select to use each of optical element AOMn (AOM1~AOM6) to be so that as 1 diffraction light after deviation
Light beam LBn (LB1~LB6) is arranged relative to wanting incident light beam LB towards the mode that -Z direction is biased to.Member is used up from selection
Each deviation of part AOMn (AOM1~AOM6) and the light beam LBn (LB1~LB6) projected is projected to and is set to and selection optics
The incident mirror IMn (IM1~IM6) of each position at a distance of specific range of element AOMn (AOM1~AOM6).Each incidence mirror IMn
(IM1~IM6) by the way that incident light beam LBn (LB1~LB6) is reflected to -Z direction, and by light beam LBn (LB1~LB6)
It is directed to corresponding scanning element Un (U1~U6).Furthermore each of incident mirror IMn is to make that light beam LBn's is each to -Z direction
It falls and penetrates, use mirror so also referred to as falling to penetrate.
Respectively select the member that can also be used composition, function, effect etc. mutually the same with optical element AOMn (AOM1~AOM6)
Part.Multiple selections are with optical element AOMn (AOM1~AOM6) according to the driving signal (high-frequency signal) for carrying out self-control device 18
On/off, and turn on/off the generation for making diffraction light made of incident light beam LB diffraction.For example, selection optics member
Part AOM5 carrys out the driving signal (high-frequency signal) of self-control device 18 in being not applied to when being off-state, makes incident to come
From the light beam LB of light supply apparatus 14 not diffraction and penetrate.Therefore, it is incident to instead through selection with the light beam LB of optical element AOM5
Penetrate mirror M3.On the other hand, selection optical element AOM5 is in the driving signal (high-frequency signal) for being applied to self-control device 18
And when being on-state, make incident light beam LB diffraction and towards incident mirror IM5.That is, making to select by the driving signal
Switched with optical element AOM6.By switching each selection optical element AOMn by this method, light beam LBn can be directed to any
Scanning element Un, and the changeable scanning element Un for light beam LBn incidence.
Control device 18 shown in FIG. 1 is based on pattern data (describing the data) corresponding with the pattern to be described, and with 1
The on/off of the light beam LB for the pulse type that unit pulse control is projected from light supply apparatus 14.It is set about by light supply apparatus 14
When being set to the situation of fiber amplifier laser light source, (modulation) is turned on/off based on pattern data from light supply apparatus 14
The composition of the light beam LB of pulse type also has in No. 2015/166910 bulletin of Yu Shangshu International Publication No. disclosed.Herein, to figure
Case data are simply illustrated.Pattern data (describing the data, design information) be for each scanning element Un and be arranged, and
The pixel for the size that the pattern described using each scanning element Un is set according to the size according to luminous point SP is split,
Each by multiple pixels is indicated with logical message (pixel data) corresponding with the pattern to be described.That is, the pattern data
It is by column direction will be set as along the direction of the main scanning direction of luminous point SP (Y-direction) and will be along the sub-scanning direction (X of substrate P
Direction) direction be set as the dot matrix diagram data that the mode of line direction is constituted by the logical message of multiple pixels of two-dimensional decomposition.
The logical message of the pixel is 1 data of " 0 " or " 1 ".The logical message of " 0 " means the luminous point for making to expose to substrate P
The intensity of SP is low level (non-description), and the logical message of " 1 " means to make to expose to that the intensity of the luminous point SP in substrate P is high
Level (description).
The logical message of 1 row pixel of pattern data corresponds to 1 description line SLn (SL1~SL6).Therefore, 1 row pixel
Quantity be the size of pixel on plane of illumination according to substrate P and describe the length of line SLn and determine.The ruler of 1 pixel
Very little Pxy be set as with it is more than the size φ equal extent of luminous point SP or its, for example, in the effective size φ of luminous point SP be 3 μm
When situation, the size Pxy of 1 pixel is set as 3 μm of square degree or more.According to the logical message of 1 row pixel, and modulation is along 1
Describe the intensity that line SLn (SL1~SL6) is projected to the luminous point SP of substrate P.In light supply apparatus 14 be fiber amplifier laser light source
Situation when, as disclosed in No. 2015/166910 bulletin of International Publication, be incident to the infrared wavelength region of fiber amplifier
Pulse type the pixel of pattern data sent according to self-control device 18 of kind light (luminous frequency Fa) logical message " 1 ", "
0 ", and it is switched to any one of the big and very fast pulsed light of peak strength and the low slow pulsed light of peak strength at high speed.
Furthermore selection is when the diameter for the light beam LB for being incident to selection optical element AOMn becomes smaller with optical element AOMn
When diffraction efficiency and responsiveness get higher.Therefore, in making the light beam LB collimated light beam for being incident to selection optical element AOMn
When situation, it may also set up as the diameter for the light beam LB for being incident to selection optical element AOMn is reduced with the state of collimated light beam
Beam-shaping optical system.In 1 embodiment of Yu Ben, it is 1mm that the light beam LB projected from light supply apparatus 14, which is set as diameter,
Collimated light beam below, therefore can be directly with this state transmission selection optical element AOMn.
In the composition of above Fig. 2, Fig. 3, light supply apparatus 14 and light beam switching part BDU are constituted to each of scanning element Un
The light beam feed unit (beam generated device) of the light beam LBn of a supply description.If body more closely defining, relative to Fig. 2
In the light beam feed unit of scanning element U5 be by light supply apparatus 14, mirror M1, M2, selection optical element AOM5 and incidence
Mirror IM5 is constituted, and the light beam feed unit relative to scanning element U6 is by light supply apparatus 14, mirror M1~M4, selection optics
Element AOM5, AOM6 and incidence mirror IM6 are constituted, the light beam feed unit relative to scanning element U3 be by light supply apparatus 14,
Mirror M1~M6, selection optical element AOM5, AOM6, AOM3 and incidence mirror IM3 are constituted, the light relative to scanning element U4
Beam feed unit is by light supply apparatus 14, mirror M1~M8, selection optical element AOM5, AOM6, AOM3, AOM4 and incident mirror
IM4 is constituted, and the light beam feed unit relative to scanning element U1 is by light supply apparatus 14, mirror M1~M10, selection optics member
Part AOM5, AOM6, AOM3, AOM4, AOM1 and incidence mirror IM1 are constituted, moreover, the light beam relative to scanning element U2 supplies
Unit is by light supply apparatus 14, mirror M1~M12, selection optical element AOM5, AOM6, AOM3, AOM4, AOM1, AOM2 and to enter
Mirror IM2 is penetrated to be constituted.
Secondly, being illustrated to the composition of scanning element (light-beam scanner) Un.Each scanning element Un (U1~U6) shape
Scanning element U1 is simply illustrated as identical composition, therefore only.Scanning element U1 at least have reflecting mirror M20~
M24, polygonal mirror PM and f θ lens system FT.Furthermore it though not illustrated in Fig. 2, is seen from the direction of travel of light beam LB1
It examines, is configured with the 1st cylindrical lens CY1 in the front of polygonal mirror PM, the 2nd cylindrical lens is provided with after f θ lens system FT
CY2.It will be described in detail in below with reference to Fig. 4 about the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2.
It is incident to reflecting mirror M20 to the light beam LB1 after -Z direction reflection by incident mirror IM1, is reflected in reflecting mirror M20
Light beam LB1 afterwards advances in -X direction and is incident to reflecting mirror M21.Light beam after being reflected by from reflecting mirror M21 to -Z direction
LB1 is incident to reflecting mirror M22, and the light beam LB1 after reflecting mirror M22 reflection advances in +X direction and is incident to reflecting mirror M23.Instead
It penetrates mirror M23 and reflects incident light beam LB1 to the reflecting surface RP of polygonal mirror PM.
Polygonal mirror PM is by incident light beam LB1 towards f θ lens system FT and to +X direction lateral reflection.Polygonal mirror PM is
In the luminous point SP of scanning light beam LB1 on the plane of illumination of substrate P, and make incident light beam LB1 in parallel with X/Y plane
One-dimensionally (reflection) is biased in face.Specifically, polygonal mirror (polygonal rotating mirror is movably biased to component) PM has along Z-direction
The rotary shaft AXp of extension and the multiple reflecting surface RP being formed in around rotary shaft AXp are (by reflecting surface in 1 embodiment of Yu Ben
The quantity Np of RP is set as polygonal rotating mirror 8).By making polygonal mirror PM centered on rotary shaft AXp along set direction of rotation
Rotation, can be such that the angle of reflection of the light beam LB1 for the pulse type for exposing to reflecting surface RP continuously changes.It can be reflected as a result, by 1
Face RP is biased to light beam LB1, and exposes to being shone for substrate P along main scanning direction (width direction, the Y-direction of substrate P) scanning
Penetrate the luminous point SP of the light beam LB1 on face.That is, can be by 1 reflecting surface RP, and along the luminous point of main scanning direction scanning light beam LB1
SP.Therefore, maximum in the quantity of the description line SL1 of scanning point SP on the plane of illumination of substrate P in 1 rotation of polygonal mirror PM
It is 8 identical with the quantity of reflecting surface RP.Polygonal mirror PM is under the control of control device 18, with not shown rotation driving
The speed of source (for example, Digital motor etc.) instruction accurately rotates.
F θ lens system (scanning system lens, scanning optical system) FT is the light after being reflected by polygonal mirror PM
Beam LB1 is projected to the scanning lens of the telecentric system of reflecting mirror M24.Through f θ lens system FT light beam LB1 via reflecting mirror
M24 becomes luminous point SP and is projected in substrate P.At this point, reflecting mirror M24 is in XZ plane, with light beam LB1 towards rotating cylinder DR
Central axis AXo advance mode, by light beam LB1 to substrate P reflect.The incidence angle θ of light beam LB1 towards f θ lens system FT is
Changed according to the rotation angle (θ/2) of polygonal mirror PM.F θ lens system FT via reflecting mirror M24, and by light beam LB1 be projected to
Image height position on the plane of illumination of the directly proportional substrate P of its incidence angle θ.If focal length is set as fo, image height position is set as yo,
Then f θ lens system FT is designed in a manner of meeting the relationship of yo=fo × θ (distortion aberration).Therefore, pass through the f θ lens
System FT, can be in Y-direction accurately with constant-speed scanning light beam LB1.Furthermore the light beam LB1 that be incident to f θ lens system FT is logical
The face face as the optical axis AXf comprising f θ lens system FT (parallel with the face XY) crossing polygonal mirror PM and being one-dimensionally biased to.
Fig. 3 is the specific composition figure indicated around selection optical element AOMn and incident mirror IMn.Furthermore selection is used up
The composition learned around element AOMn and incident mirror IMn is identical each other, so herein only with selection optical element AOM1 and incidence
Composition around mirror IM1 is illustrated for representative.
It is to be used up as shown in Figure 2 by the selection of leading portion to selection optical element AOM1 incident beam LB, light beam LB
After learning element AOM4, reflecting mirror M9, M10, become the collimated light beam of such as diameter 1mm small diameter (the 1st diameter) below.
During the driving signal for not being enter as high-frequency signal (ultrasonic signals) (driving signal disconnection), optical element is used in selection
AOM1 does not make incident light beam LB diffraction and is directed through it.The light beam LB penetrated, which is penetrated, is set to it along optical axis AXa
Collector lens G1 and collimation lens G2a in optical path, and it is incident to the selection optical element AOM2 of back segment.Pass through selection at this time
Passed through with the central axis for the light beam LB for passing through collector lens G1 and collimation lens G2a after optical element AOM1 on optical axis AXa.It is poly-
Optical lens G1 is so that the light beam LB (collimated light beam) through selection optical element AOM1 is being located at collector lens G1 and collimation
The position of face p1 between lens G2a becomes the mode of beam waist for light beam LB optically focused.Collimation lens G2a makes in passing through optically focused
The light beam LB dissipated after lens G1 optically focused becomes collimated light beam.Become the straight of the light beam LB of collimated light beam by collimation lens G2a
Diameter becomes the 1st diameter.The rear side focus of collector lens G1 and the front side focus of collimation lens G2a are in one in set permissible range
Cause, the front side focus of collector lens G1 and selection are with the Diffraction Point in optical element AOM1 in consistent in set permissible range.It should
Collector lens G1 and collimation lens G2a constitutes relay lens system.
On the other hand, during the driving signal of Yu Zuowei high-frequency signal is applied to selection optical element AOM1, selection is used
Optical element AOM1 generation makes light beam LB1 (diffraction light) made of incident light beam LB diffraction.With the frequency with high-frequency signal
The light beam LB1 (collimated light beam) that the corresponding angular -Z direction of diffraction is biased to penetrates collector lens G1, and is incident to and is set to face p1
On incident mirror IM6.Collector lens G1 is optically focused (pinching) light beam LB1 as follows: with the light beam being biased to -Z direction
The central axis AXb and light beam LB of LB1 by the parallel mode of optical axis AXa reflect light beam LB1, and make light beam LB1 in incidence
On the reflecting surface of mirror IM1 or it nearby becomes beam waist.By relative to through selection with the light beam LB's of optical element AOM1
Optical path is by -Z direction side and the incident mirror IM6 that is arranged, light beam LB1 are able to reflect to -Z direction, and via collimation lens G2b and
It is incident to scanning element U1.Collimation lens G2b makes to become saturating with collimation by collector lens G1 pinching/diverging light beam LB1
The collimated light beam of the light shaft coaxle of mirror G2b.It is straight to become the 1st by the diameter that collimation lens G2b becomes the light beam LB1 of collimated light beam
Diameter.The rear side focus of collector lens G1 and the front side focus of collimation lens G2b are in consistent in set permissible range.The collector lens
G1 and collimation lens G2b constitutes relay lens system.Furthermore collector lens G1, collimation lens G2a, G2b of Fig. 3 be also with
The identical condition of Fig. 3 be configured at other selection optical elements AOM2~AOM6 shown in Fig. 2 it is each after optical path on.
And say, in scanning element U1 shown in Fig. 2, keeps the optical axis of f θ lens system FT parallel with the face XY and illustrate, therefore
And with self-scanning unit U1 be projected to substrate P light beam LB1 central axis (chief ray) towards rotating cylinder DR central axis AXo
Mode configures the plane of reflection of the reflecting mirror M24 of front end relative to the face XY with the angle tilt other than 45 degree.However, in f
The optical axis of θ lens system FT relative to the face XY and inclined mode makes each whole tilted in the face XZ of scanning element U1~U6
Situation when, may be alternatively formed to the compositions that the optical axis such as f θ lens system FT is bent by reflecting mirror M24 in 90 degree.
Fig. 4 is the specific composition figure for indicating scanning element U1, and is oneself and scanning direction (the deviation side comprising light beam LB1
To) plane (plane parallel with X/Y plane) it is orthogonal plane (XZ plane) observation gained figure.Furthermore in Fig. 4, f θ is saturating
The optical axis AXf of mirror system FT is parallel with the face XY and configures that the reflecting mirror M24 of front end is so that optical axis AXf is bent in 90 degree
Mode configures.In in scanning element U1, the light beam LB1 along incoming position to the plane of illumination (substrate P) of light beam LB1 send optical path
Diameter is provided with reflecting mirror M20, beam expander BE, the parallel-plate HVP of angle of inclination, aperture diaphragm PA, reflecting mirror M21, the 1st column
Face lens CY1, spherical lens G10a, reflecting mirror M22, spherical lens G10b, reflecting mirror M23, polygonal mirror PM, f θ lens system
FT, reflecting mirror M24 and the 2nd cylindrical lens CY2.
By incidence mirror IM1 shown in Fig. 3 to -Z direction reflection after collimated light beam light beam LB1 be incident to relative to
X/Y plane tilts 45 degree of reflecting mirror M20.Reflecting mirror M20 is by incident light beam LB1 towards self-reflection mirror M20 to the side-X
It is reflected to separate reflecting mirror M21 toward -X direction.Light beam LB1 after reflecting mirror M20 reflection penetrates beam expander BE and aperture light
Late PA and be incident to reflecting mirror M21.Beam expander BE makes the enlarged-diameter of penetrated light beam LB1.Beam expander BE has optically focused saturating
Mirror Be1 and make to become the collimation lens Be2 of collimated light beam in the light beam LB1 by dissipating after collector lens Be1 pinching.Pass through
Beam expander BE is easy to expose to light beam LB6 the opening portion of aperture diaphragm PA.Furthermore it is saturating in collector lens Be1 and collimation
Between mirror Be2, for the parallel-plate HVP configured with quartz as offset optical component, parallel-plate HVP can pass through drive (not shown)
The tilt angle of the change relative to light beam LBn in the face parallel with the face XZ such as dynamic motor.By changing inclining for parallel-plate HVP
Oblique angle, can make in the scanning track of the luminous point SP scanned in substrate P describe line SLn in sub-scanning direction with pettiness amount (for example,
Several times~more than ten times or so of the effective diameter φ of luminous point SP) offset.It will be in hereafter being described in detail about the function.
Reflecting mirror M21 is to tilt 45 degree relative to YZ plane and configure, by incident light beam LB1 towards self-reflection mirror
M21 is reflected to the separate reflecting mirror M22 of -Z direction toward -Z direction.Light beam after being reflected by from reflecting mirror M21 to -Z direction
After LB1 is through the 1st cylindrical lens CY1 (the 1st optical component) and spherical lens G10a, reflecting mirror M22 is reached.Reflecting mirror M22 is
45 degree are tilted relative to X/Y plane and is configured, and incident light beam LB1 is reflected towards reflecting mirror M23 toward +X direction.In anti-
Light beam LB1 after penetrating mirror M22 reflection is incident to reflecting mirror M23 via spherical lens G10b.Reflecting mirror M23 makes incident light
Beam LB1 is towards polygonal mirror (polygonal rotating mirror is movably biased to component) PM, in the face inner bending parallel with the face XY.The 1 of polygonal mirror PM
Incident light beam LB1 direction is had the past side+X f θ lens system FT of the optical axis AXf extended along the x axis by a reflecting surface RP
To reflection.Spherical lens G10a and spherical lens G10b constitutes lens system (the 3rd optical component) G10.Spherical lens G10a,
G10b has iso refracting power.
1st cylindrical lens CY1 of the plano-convex being made of simple lens is that have the saturating of refracting power (focusing force) in a direction
Mirror, the refracting power with anisotropy.Fig. 5 be the optical path of the light beam LB of aperture diaphragm PA to substrate P is unfolded on the face XY, and from
The skeleton diagram that the plane parallel with the plane in deviation direction (main scanning direction) comprising light beam LB is observed.As shown in figure 5,
1st cylindrical lens CY1 is (vertical with the rotary shaft AXp of polygonal mirror PM in the deviation direction of the light beam LB1 based on polygonal mirror PM
Main scanning direction, direction of rotation in face) on so that incident light beam LB1 positioned at polygonal mirror PM front face p2 at
For the mode of beam waist, one-dimensionally optically focused (pinching) light beam LB1.By the spot position in the front of polygonal mirror PM (face p2's
Position) it is set as the 1st position.1st position is the position in the front of lens system G10 (spherical lens G10a, 10b).Also, the
1 cylindrical lens CY1 is in the direction (subscan orthogonal with deviation direction (main scanning direction) of light beam LB1 based on polygonal mirror PM
Direction) on, do not make incident light beam LB1 optically focused and makes it directly in the form of collimated light beam through (referring to Fig. 4).In this way,
1st cylindrical lens CY1 has the bus extended along the direction (sub-scanning direction) parallel with X-direction, so that saturating through the 1st cylinder
The light beam LB1 of mirror CY1 is in being biased on the orthogonal direction (sub-scanning direction) in direction not optically focused with polygonal mirror PM.
In the deviation direction of the light beam LB1 based on polygonal mirror PM, (master sweeps lens system G10 (spherical lens G10a, G10b)
Retouch direction, direction of rotation) on, make to become substantially parallel light beam in the light beam LB1 by dissipating after the 1st cylindrical lens CY1 optically focused
(referring to Fig. 5).Also, lens system G10 (spherical lens G10a, G10b) in the deviation direction of the light beam LB1 with polygonal mirror PM just
On the direction (sub-scanning direction) of friendship, make the light beam LB1 through the collimated light beam of the 1st cylindrical lens CY1 in the anti-of polygonal mirror PM
Penetrate optically focused (pinching) on the RP of face (referring to Fig. 4).To be projected to as a result, the light beam LB1 of polygonal mirror PM in pinching on reflecting surface RP at
The strip (long ellipticity) extended in the face parallel with X/Y plane.In this way, passing through the 1st cylindrical lens CY1 and lens system
G10 and following 2nd cylindrical lens CY2, even if having reflecting surface RP relative to Z-direction inclined situation (reflecting surface RP relative to
The inclination of the normal of X/Y plane), it also can inhibit its influence.For example, can inhibit the light beam on the plane of illumination for exposing to substrate P
The irradiation position of LB1 (describing line SL1) is due to each reflecting surface RP of polygonal mirror PM respective small slope error (face inclination) in X
Direction offset, that is, the face tilt correction of each reflecting surface RP can be carried out.Furthermore the light beam LB1 after reflecting surface RP reflection is being based on
On the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 of polygonal mirror PM, directly entered in the form of substantially parallel light beam
Be incident upon f θ lens system FT, be biased on the orthogonal direction (sub-scanning direction) in direction in the light beam LB1 of polygonal mirror PM, with
F θ lens system FT is incident in the state of the diverging of predetermined value aperture (NA).
Furthermore the refraction on the deviation direction (main scanning direction of luminous point SP) with polygonal mirror PM of the 1st cylindrical lens CY1
The corresponding rear side focus of power and the front side focus of lens system G10 be set as in set permissible range on the p2 of face it is consistent.Thoroughly
The rear side focus of mirror system G10 and the front side focus of f θ lens system FT be set as in set permissible range polygonal mirror PM's
It is consistent to be biased to position (on reflecting surface RP).
F θ lens system FT on the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 based on polygonal mirror PM,
As shown in figure 5, making the light beam LB1 of the substantially parallel light beam after reflecting surface RP reflects in pinching in substrate P (optically focused).In turn, f
θ lens system FT as shown in figure 4, be biased on the orthogonal direction (sub-scanning direction) in direction in the light beam LB1 of polygonal mirror PM,
So that the light beam LB1 dissipated after reflecting surface RP reflects is become substantially parallel light beam, and it is projected to the 2nd cylindrical lens CY2.
The 2nd cylindrical lens (the 2nd optical component) CY2 for the plano-convex being made of simple lens be in Y-direction (main scanning side
To) parallel direction holds the saturating of the refracting power of the anisotropy with focusing force with bus and in a direction (sub-scanning direction)
Mirror.2nd cylindrical lens CY2 makes on the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 based on polygonal mirror PM
Incident light beam LB1 be directed through as it is.Therefore, as shown in figure 5, through the 2nd cylindrical lens CY2 light beam LB1 in base
In on the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 of polygonal mirror PM, pass through the refracting power of f θ lens system FT
In in substrate P by become beam waist in a manner of optically focused.On the other hand, the 2nd cylindrical lens CY2 with the light beam based on polygonal mirror PM
On the orthogonal direction (sub-scanning direction) in the deviation direction (main scanning direction) of LB1, as shown in figure 4, making incident substantially flat
The light beam LB1 of row light beam in substrate P by become beam waist in a manner of optically focused (pinching).Therefore, the light beam of substrate P is projected to
LB1 is in becoming generally circular luminous point SP (for example, diameter be 3 μm) in substrate P.As described above, the 1st cylindrical lens CY1 and the 2nd
Cylindrical lens CY2 is and the side orthogonal with bus by such a way that mutually orthogonal directions have focusing force (refracting power)
Formula configuration.The 1st cylindrical lens CY1 makes light beam LBn on main scanning direction as a result, with the face p2 in the front of lens system G10
One-dimensionally after pinching, in make on the reflecting surface RP of polygonal mirror PM light beam LBn in one-dimensionally the mode of pinching is sent out on sub-scanning direction
Wave function, the 2nd cylindrical lens CY2 so that light beam LBn after f θ lens system FT in one-dimensionally pinching on sub-scanning direction
Mode functions.
In this way, being provided with the 1st cylindrical lens CY1 and the 2nd column being made of simple lens in the orthogonal mode of bus
Face lens CY2, so the deviation direction that by lens system G10, can correct well the light beam LBn based on polygonal mirror PM is (main
Scanning direction) and the light beam LBn in the sub-scanning direction orthogonal with main scanning direction this both direction spherical aberration.Therefore,
It can inhibit the deterioration of the imaging performance in substrate P.Also, by setting the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2, it can also
Inhibition is carried out similarly because retouching caused by the respective small slope error (face inclination) of the reflecting surface RP of polygonal mirror PM with existing
Offset of the line drawing SLn to X-direction (sub-scanning direction), i.e. progress face tilt correction.
Furthermore the spot position (best focus position) of the luminous point SP for the light beam LBn that be projected in substrate P is in master
Scanning direction (be biased to direction) and the sub-scanning direction orthogonal with main scanning direction in mode consistent in set permissible range into
Row optical design.Also, the numerical aperture NA on the main scanning direction for the light beam LBn (luminous point SP) that be projected in substrate PyAnd
Numerical aperture NA on the sub-scanning direction orthogonal with main scanning directionxIt is in (consistent) side equal in set permissible range
Formula is designed.Furthermore in 1 embodiment of Yu Ben, numerical aperture NAx≒ numerical aperture NAy, so sometimes also only with NA table
Show the numerical aperture of the light beam LBn of substrate P to be projected to.The spherical aberration of light beam LBn is indicated with following relative deviation,
The relative deviation is the central axis (key light relative to light beam LBn when making the optimum focusing face pinching in light beam LBn direction design
Line) inclination angle (to the incident angle in optimum focusing face) β different light each optically focused position focus direction it is opposite
Deviation.The light of central axis (chief ray) inclined angle beta vertical with optimum focusing face relative to light beam LBn is by sin β
And the numerical aperture Na β calculated is indicated.The maximum numerical aperture NA of light beam LBn is wavelength X according to light beam LBn, luminous point SP
Effective diameter φ and f θ lens system FT focal length and substantially determine.
Secondly, respective to the 1st cylindrical lens CY1, the 2nd cylindrical lens CY2, lens system G10 and f θ lens system FT
The determining method of the expansion multiplying power of focal length, the aperture diaphragm diameter of aperture diaphragm PA and beam expander BE is illustrated.Furthermore
With fC1The focal length of the 1st cylindrical lens CY1 is indicated, with fC2The focal length of the 2nd cylindrical lens CY2 is indicated, with fGIndicate lens system G10
Focal length, the focal length of f θ lens system FT is indicated with f θ.Also, the aperture diaphragm diameter of aperture diaphragm PA is set as φa。
Focal length fC1、fC2、fG, f θ have it is following shown in formula (1) relationship.Based on the formula (1), the 1st cylindrical lens is determined
CY1, the 2nd cylindrical lens CY2, the respective focal length of lens system G10 and f θ lens system FT, thus can make substrate P to be projected to
Light beam LBn numerical aperture NAxWith numerical aperture NAyIt is equal.
fG 2/fC1=f θ2/fC2…(1)
Also, aperture diaphragm diameter phi a and numerical aperture NA (=NAx≒NAy) relationship with formula (2) shown in following.
φ a=2 × NA (f θ × fC1/fG)=2 × NA × (fG×fC2/fθ)…(2)
By determining aperture diaphragm diameter φ based on the formula (2)a, can get desired numerical aperture.Also, beam expander BE
Expansion multiplying power it is bigger, become more by the aperture diaphragm PA light quantity blocked, therefore light quantity loss becomes bigger.On the other hand,
The expansion multiplying power of beam expander BE is smaller, becomes smaller in the effective numerical aperture of image planes (in substrate P), therefore resolution (light
The fine degree of the diameter phi of point SP) it reduces.Therefore, more satisfactory is to set optimal expansion in view of light quantity and the balance of resolution
The expansion multiplying power of beam device BE.
Also, in the 1st cylindrical lens CY1, the 2nd cylindrical lens CY2 and f θ lens system FT etc. each optical specification substantially
When fixed situation, with the spherical aberration S on the main scanning direction (being biased to direction) of light beam LBn1And the main scanning with light beam LBn
Spherical aberration S on the orthogonal sub-scanning direction in direction2At least meet it is following shown in any of formula (3)~(6) conditions
Mode sets the optical specification of lens system G10 (spherical lens G10a, 10b).Also, the optics in only f θ lens system FT is advised
When the substantially fixed situation of lattice, in a manner of meeting any of formula (3)~(6) condition, (spherical surface is saturating by setting lens system G10
Mirror G10a, 10b) optical specification and the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 each optical specification.
|S1- S2| < SC1×fθ2/fG 2- SC2…(3)
S1< SC1×fθ2/fG 2, and S2< SC2…(4)
|S1- S2| < λ/NAy 2, and | S1- S2| < λ/NAx 2…(5)
S1< λ/NAy 2, and S2< λ/NAx 2…(6)
Wherein, | S1- S2| indicate spherical aberration S1With spherical aberration S2Absolute value of the difference, SC1It indicates saturating by the 1st cylinder
Spherical aberration caused by mirror CY1 monomer, SC2Indicate the spherical aberration as caused by the 2nd cylindrical lens CY2 monomer, λ indicates light
The wavelength of beam LBn.Furthermore spherical aberration S1With spherical aberration S2Absolute value of the difference | S1- S2| if | S2- S1| it is also identical.
Also, being illustrated for enumerating scanning element U1, optics is similarly carried out certainly for other scanning elements U2~U6 and is set
Meter.
Herein, in existing way, that is, make the extending direction of each bus of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2
When the situation set in parallel with main scanning direction (Y-direction), focal length fC1、fC2, f θ have it is following shown in formula (7)
Relationship.When the situation, only the 1st cylindrical lens CY1 parallel with Y-direction by the extending direction of bus, will be projected to more
The light beam LBn of the reflecting surface RP of face mirror PM on reflecting surface RP just by pinching at along direction (the main scanning side parallel with X/Y plane
To) extend strip (long ellipticity), there is no need to lens system G10.
fC1×fC2=f θ2…(7)
Also, the diameter phi a and numerical aperture NA of the circular open of aperture diaphragm PA have it is following shown in formula (8) pass
System.
φ a=2 × NA × θ=2 f × NA × (fC1×fC2/fθ)…(8)
[embodiment]
The face tilt correction of the face tilt correction of this 1st embodiment and existing way is compared.Because needing to the greatest extent may be used
The two can be compared under the same terms, thus numerical aperture NA and to be incident to scanning element Un light beam LBn specification
It is identical each other.Light beam LBn be the monochromatic light that wavelength is 354.7nm and in optical axis center (beam center line) at a distance of 0.25mm
Position intensity become 1/e2Non-polarized Gaussian beam.Numerical aperture NA divides to include main scanning direction (being biased to direction)
Numerical aperture NA in plane (YZ plane)yAnd plane (the XZ comprising the direction (sub-scanning direction) orthogonal with main scanning direction
Plane) in numerical aperture NAxAnd it handles, and NAy=NAx=0.06.Also, for f θ lens system FT and the 2nd cylindrical lens
CY2, also for this 1st embodiment in existing way using identical person.By the focal length f θ of f θ lens system FT be set as f θ=
100mm, by the focal length f of the 2nd cylindrical lens CY2 of the plano-convex being made of simple lensC2It is set as fC2=14.5mm.Furthermore being can
Only assess the influence of the spherical aberration as caused by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2, f θ lens system FT setting
For the lens with the ideal f- θ characteristic that will not generate aberration.Firstly, by comparing example 1 to the scanning element of existing way
The specific design example of the optical system of the face tilt correction of Un is illustrated, and then passes through 1 pair of the 1st embodiment of sheet of embodiment
The specific design example of optical system of face tilt correction of scanning element Un be illustrated.Furthermore 1 embodiment of Yu Ben
In existing way, said to the common identical symbol of component mark of common component or function is constituted each other
It is bright.Also, for the sake of simplicity, each of reflecting mirror M21, M22, M23 is omitted in design example (lens data).
(comparative example 1)
In comparative example 1, the bus of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 is set in main scanning direction
(Y-direction), and not set lens system G10.Fig. 6 indicates the optics of the beam expander BE to the 2nd cylindrical lens CY2 in comparative example 1
Design the lens data of example.Fig. 7 is in parallel with the plane in deviation direction (scanning direction of luminous point SP) comprising light beam LBn
The skeleton diagram of the state of the light beam LBn of the beam expander BE to substrate (image planes) P in comparative example 1 is indicated in face.Fig. 8 is oneself and light beam
The orthogonal plane (face comprising sub-scanning direction) in the deviation direction (main scanning direction) of LBn observes beam expander BE shown in Fig. 7
To the skeleton diagram of the state of the light beam LBn of the reflecting surface RP of polygonal mirror PM.Fig. 9 is from the deviation direction (main scanning with light beam LBn
Direction) orthogonal planar observation polygonal mirror PM shown in Fig. 7 light beam LBn of the reflecting surface RP to substrate (image planes) P state
Skeleton diagram.Furthermore in Fig. 6, after polygonal mirror PM reflection, the sign symbol of face interval and radius of curvature is exchanged and is indicated.Fig. 7
~Fig. 9 is indicated to follow each optics of beam expander BE~substrate P in the diminution proportional arrangement comparative example 1 of the numerical example of Fig. 6
The figure of the case where component (the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 etc.).
The light beam LBn (effective beam diameter φ is set as 0.5mm) of the collimated light beam of scanning element Un is incident in turning
It is changed to using after the widened collimated light beam of beam expander BE being made of 5 spherical lens LG1~LG5, passes through aperture diaphragm PA
And it is shaped as the light beam of the circular section of special diameter.The aperture diaphragm diameter phi a of aperture diaphragm PA is to be based on above-mentioned formula (8),
And it is set as 12mm.Also, becoming the 1/e on axis with intensity2Position become aperture diaphragm diameter phiaThe side radius, that is, 6mm
The expansion multiplying power of beam expander BE is set as 24 times by formula.At this point, the ratio of light quantity loss caused by aperture diaphragm PA becomes about
13.5%.
Be configured at the rear of beam expander BE and the 1st cylindrical lens CY1 of plano-convex that is made of simple lens with based on more
On the orthogonal direction in the deviation direction (main scanning direction) of the light beam LBn of face mirror PM, incident light beam LBn is concentrated on multi-panel
(referring to Fig. 8) on the reflecting surface RP of mirror PM.The focal length f of 1st cylindrical lens CY1C1It is to be based on above-mentioned formula (7), and be set as fC1=
693.1mm.The reflecting surface RP of polygonal mirror PM is located at the rear side focus of the 1st cylindrical lens CY1.Furthermore based on polygonal mirror PM's
On the deviation direction (main scanning direction) of light beam LBn, through the light beam LBn keeping parallelism light state (ginseng of the 1st cylindrical lens CY1
According to Fig. 7).Therefore, the light beam LBn that be projected to polygonal mirror PM is biased to the strip that direction extends at edge in pinching on reflecting surface RP
(long ellipticity).
Light beam LBn after the reflecting surface RP reflection of polygonal mirror PM with angle corresponding with the rotation angle of polygonal mirror PM,
It is incident to the f θ lens system FT that focal length f θ is 100mm.The reflecting surface RP of polygonal mirror PM be to reach f θ lens system FT before
The mode of the position of side focus configures.Therefore, f θ lens system FT is (main in the deviation direction of the light beam LBn based on polygonal mirror PM
Scanning direction) on, the light beam LBn after the reflecting surface RP of polygonal mirror PM reflection is concentrated on to the quilt of substrate P with the state of telecentricity
(referring to Fig. 7) on shadow surface (image planes).On the other hand, f θ lens system FT is in the deviation with the light beam LBn based on polygonal mirror PM
On the orthogonal sub-scanning direction in direction (main scanning direction), make the light beam LBn for reflecting and dissipating in the reflecting surface RP of polygonal mirror PM
As directional light (referring to Fig. 9).
Through f θ lens system FT light beam LBn by being configured at rear and the focal length f of f θ lens system FTC2For 14.5mm
The 2nd cylindrical lens CY2, the plane of illumination of substrate P is also concentrated on the sub-scanning direction of the light beam LBn based on polygonal mirror PM
(referring to Fig. 9) in (image planes).The position of 2nd cylindrical lens CY2 is with the main scanning direction of the light beam LBn based on polygonal mirror PM
On spot position and sub-scanning direction on spot position in consistent mode is true in set permissible range in focus direction
It is fixed, and it is set as plane of illumination (image planes) of the spot position as substrate P.
In this way, in the optical path brought up via the 1st cylindrical lens CY1, f θ lens system FT and the 2nd cylindrical lens CY2,
And light beam LBn can be generated into the spot position such as light beam LBn in main scanning side when optically focused in substrate P is the situation of luminous point SP
To the aberration to differ widely with sub-scanning direction.Its cause is generated spherical aberration when light beam LBn pinching is luminous point.Figure
10, Figure 11 is the figure being illustrated to the state of the spherical aberration of the light beam LBn towards substrate P, and Figure 10 indicates the master of light beam LBn
The state of spherical aberration on scanning direction, Figure 11 indicate the state of the spherical aberration on the sub-scanning direction of light beam LBn.
As shown in Figure 10, light beam LBn is incident to f θ in becoming the collimated light beam with certain rugosity on main scanning direction
It is (poly- to be mainly concentrated on the set Z location on chief ray (beam center line) Lpr by f θ lens system FT by lens system FT
Burnt position).At this point, the 2nd cylindrical lens CY2 is purely by way of parallel-plate and plays a role.The light beam projected from f θ lens system FT
Maximum numerical aperture NA on the main scanning direction of LBnyIt is based on the light LLa towards focal point relative to chief ray Lpr
Inclination angle (incidence angle) β a press NAy=sin β a and determine.It is less than the incident angle β a of light LLa in light beam LBn comprising incidence angle
The light LLc of incident angle β b of light LLb (incidence angle is set as β b), incidence angle less than light LLb (incidence angle is set as β
C) etc..Herein, if the focal point of the light LLa of incident angle β a is the focal position Zma of Z-direction, the light of incident angle β b
The focal position Zmb of the focal point of LLb, the focal point of the light LLc of incident angle β c focal position Zmc both with respect to focusing position
Zma is set to deviate in Z-direction.Such offset is spherical aberration.
Also, as shown in figure 11, light beam LBn is incident to f θ lens system FT in becoming divergent beams on sub-scanning direction,
After being converted to collimated light beam by f θ lens system FT, by the refraction action of the 2nd cylindrical lens CY2, and it is concentrated on key light
Set Z location (focal position) on line (beam center line) Lpr.The pair of the light beam LBn projected from the 2nd cylindrical lens CY2 is swept
Retouch the maximum numerical aperture NA on directionxIt is set as and the maximum numerical aperture NA on main scanning directionyUnanimously.Therefore, in
On sub-scanning direction, by NAx(the focal position Zsa of incident angle β a) optically focused, incidence angle are small by=sin β a and the light LLa determined
It is less than the light of incident angle β b in the focal position Zsb of light LLb (incidence angle is set as β b) optically focused of incident angle β a, incidence angle
The focal position Zsc's of LLc (incidence angle is set as β c) optically focused is each also inclined in Z-direction (focus direction) due to spherical aberration
It moves.Furthermore it in Figure 10, Tu11Zhong, is said by such a way that the optical path of f θ lens system FT to substrate P generates spherical aberration
It is bright, reach the light that generated actual spherical aberration is projected by the light supply apparatus 14 for being provided from Fig. 2 in the light beam LBn of substrate P
The influence for the various optical components (lens, AOM, reflecting mirror) that beam passes through.
Figure 12 and Figure 13 is the lens data based on comparative example 1 shown in fig. 6, by the maximum numerical aperture of light beam LBn
NA (=NAy≒NAx) be set as the 0.06 spherical aberration characteristic for simulate resulting light beam LBn, horizontal axis indicate by design most
Good focal position is set as the focal position (μm) of zero point, and longitudinal axis expression will be corresponding with the maximum numerical aperture NA of light beam LBn
The maximum incident angle β a (NAa=sin β a) of light LLa is standardized as the incident angle β of 1.0 (β max).Therefore, in Figure 12, Figure 13
In, such as incident angle β is the angle of 0.5 half for meaning maximum incident angle β a.In turn, the characteristic shown in solid in Figure 12
It (A) is the spherical aberration characteristic being projected on the main scanning direction of the light beam LBn of substrate P, characteristic (B) shown in dotted line is projection
Spherical aberration characteristic to the sub-scanning direction of the light beam LBn of substrate P.Characteristic shown in Figure 13 (C) is indicated in Figure 12
Characteristic (A) and characteristic (B) difference ((B)-(A)) caused by spherical aberration characteristic, be projected to according to as luminous point SP
The incident angle β of light beam LBn in substrate P, best focus position offset, and generate tens μm of spherical aberration.
Herein, the characteristic in Figure 12 (A) is the spherical aberration as caused by beam expander BE and f θ lens system FT, Tu12Zhong
Characteristic (B) be by the synthesis system of beam expander BE, the 1st cylindrical lens CY1, f θ lens system FT and the 2nd cylindrical lens CY2
Generated spherical aberration.Therefore, the characteristic (C) of the difference of characteristic (A) and characteristic (B) mainly with by the 1st cylindrical lens CY1 and
Spherical aberration characteristic caused by 2nd cylindrical lens CY2 is corresponding.
(embodiment 1)
In embodiment 1, as described above, the extending direction of the bus of the 1st cylindrical lens CY1 is set as sub-scanning direction
The extending direction of the bus of 2nd cylindrical lens CY2 is set as main scanning direction (Y-direction) by (X-direction), and saturating in the 1st cylinder
Lens system G10 is provided between mirror CY1 and polygonal mirror PM.Figure 14 indicates the beam expander BE in embodiment 1 to the 2nd cylindrical lens
The lens data of the optical design of CY2.Also, Figure 15 be in deviation direction (the scanning side of luminous point SP comprising light beam LBn
To) the parallel face of plane in observe light beam LBn of the beam expander BE to substrate (image planes) P in embodiment 1 state outline
Figure.Figure 16 is in sight (in the face comprising sub-scanning direction) in the face orthogonal with deviation direction (main scanning direction) of light beam LBn
Examine the skeleton diagram of the state of the light beam LBn of the reflecting surface RP of beam expander BE shown in figure 15 to polygonal mirror PM.Figure 17 is Yu Yuguang
Observation multi-panel shown in figure 15 (in the face comprising sub-scanning direction) in the orthogonal face in the deviation direction (main scanning direction) of beam LBn
The skeleton diagram of the light beam LBn of the reflecting surface RP of mirror PM to substrate (image planes) P.It, will after polygonal mirror PM reflection furthermore in Figure 14
The sign symbol of face interval and radius of curvature is exchanged and is indicated.Figure 15~Figure 17 is indicated to follow the practical contracting of the numerical example of Figure 14
Small scale configures beam expander BE~substrate P each optical component (the 1st cylindrical lens CY1 and the 2nd cylindrical lens in embodiment 1
CY2 etc.) the case where.
In embodiment 1, with the distance (optical path length) of the 1st cylindrical lens CY1 to image planes (plane of illumination of substrate P) with
Mode of the comparative example 1 compared to short 300mm or so, is based on above-mentioned formula (1), by the focal length f of lens system G10GIt is set as fG=
201.2mm, by the focal length f of the 1st cylindrical lens CY1C1It is set as fC1=58mm.As a result, in the present embodiment 1, with comparative example 1
Design example compare, it can be achieved that section space-efficient optical system.In turn, the shell of scanning element Un can also be reduced, therefore can also
Seek lightweight.
Light beam LBn (effective diameter 0.5mm) Yu Liyong for being incident to the collimated light beam of scanning element Un is saturating by 4 spherical surfaces
After the beam expander BE that mirror LGa~LGd is constituted expands, set beam diameter is shaped as by aperture diaphragm PA.Aperture diaphragm
The aperture diaphragm diameter phi a of PA is to be based on above-mentioned formula (2), and be set as 3.5mm.Light beam after being expanded by beam expander BE
In, at a distance of the position half, that is, 1.75mm of aperture diaphragm diameter phi a, intensity becomes the 1/e on axis with center2Side
The expansion multiplying power of beam expander BE is set as 7 times by formula.In this way, the expansion multiplying power of beam expander BE becomes smaller compared with comparative example 1, because
This is easy to carry out the design of beam expander BE, can also reduce the spherical aberration generated by beam expander BE.
It is configured at the rear of beam expander BE, is made of simple lens and focal length fC1For the 1st cylindrical lens of the plano-convex of 58mm
CY1 is concentrated on the 1st on the deviation direction (main scanning direction) of the light beam LBn based on polygonal mirror PM, by incident light beam LBn
The face p2 (the 1st position) (referring to Fig.1 5) of the rear side focus of cylindrical lens CY1.The face position p2 be located at the 1st cylindrical lens CY1 with
It is configured between the lens system G10 of the rear side of the 1st cylindrical lens CY1.Furthermore with the light beam LBn based on polygonal mirror PM
The orthogonal sub-scanning direction in deviation direction (main scanning direction) on, through the light beam LBn keeping parallelism of the 1st cylindrical lens CY1
Light state (referring to Fig.1 6).
Lens system G10 (the focal length f being made of 2 spherical lenses G10a, G10bG=201.2mm) it is with lens system
Consistent side in position (face p2) Yu Jiding permissible range of the front side focus of G10 of uniting and the rear side focus of the 1st cylindrical lens CY1
Formula configuration.Therefore, through the light beam LBn of lens system G10 in the state on the main scanning direction of light beam LBn being collimated light beam
(referring to Fig.1 5), in the reflecting surface RP for being concentrated on polygonal mirror PM on the sub-scanning direction orthogonal with the main scanning direction of light beam LBn
Upper (referring to Fig.1 6).The reflecting surface RP of polygonal mirror PM is set in a manner of the position for reaching the rear side focus of lens system G10.
Therefore, the light beam LBn that be projected to polygonal mirror PM is biased to direction (main scanning direction) extension at edge in pinching on reflecting surface RP
Strip (long ellipticity).
Light beam LBn after the reflecting surface RP reflection of polygonal mirror PM is entered with angle corresponding with the rotation angle of polygonal mirror PM
It is incident upon the f θ lens system FT of focal length f θ=100mm.F θ lens system FT is to reach f θ lens with the reflecting surface RP of polygonal mirror PM
The mode of the position of the front side focus of system FT configures.Therefore, f θ lens system FT is in the inclined of the light beam LBn based on polygonal mirror PM
To on direction (main scanning direction), by the light beam LBn after the reflecting surface RP of polygonal mirror PM reflection with the state (light beam of telecentricity
The optical axis AXf of chief ray Lpr and f θ the lens system FT of LBn parallel always state) be concentrated on substrate P plane of illumination (as
Face) on (referring to Fig.1 5).On the other hand, on the sub-scanning direction orthogonal with main scanning direction, f θ lens system FT will be in more
The light beam LBn that the reflecting surface RP of face mirror PM reflects and becomes divergent beams is converted to collimated light beam (referring to Fig.1 7).
Finally, through f θ lens system FT light beam LBn by being configured at rear and the focal length f of f θ lens system FTC2=
The 2nd cylindrical lens CY2 of 14.5mm, orthogonal with deviation direction (main scanning direction) of light beam LBn based on polygonal mirror PM
On sub-scanning direction, also by become luminous point SP in a manner of be concentrated on substrate P plane of illumination (image planes) on (referring to Fig.1 7).This
The position of 2 cylindrical lens CY2 be on the main scanning direction of the light beam LBn based on polygonal mirror PM spot position and subscan side
Upward spot position in consistent mode determines in set permissible range in focus direction, and be set as the spot position at
For the plane of illumination (image planes) of substrate P.In the composition of above Figure 14~Figure 17 (and Fig. 4, Fig. 5), beam expander BE, aperture light
Optical system until late PA, reflecting mirror M21, the 1st cylindrical lens CY1, reflecting mirror M22, lens system G10, reflecting mirror M23 is made
It is functioned for the 1st adjustment optical system comprising the 1st optical element or the 1st lens component (the 1st cylindrical lens CY1), it should
1st optical element or the 1st lens component (the 1st cylindrical lens CY1) have to make polygonal mirror PM to be projected to (movably be biased to structure
Part) light beam LBn in the refracting power of the anisotropy of pinching on the sub-scanning direction orthogonal with main scanning direction.In turn, in Figure 14
Reflecting mirror M24 and the 2nd column in the composition of~Figure 17 (and Fig. 4, Fig. 5), after f θ lens system FT (scanning optical system)
Face lens CY2 as comprising the 2nd optical element or the 2nd lens component (the 2nd cylindrical lens CY2) the 2nd adjustment optical system and
It functions, the 2nd optical element or the 2nd lens component (the 2nd cylindrical lens CY2) have to make from f θ lens system FT court
To substrate P light beam LBn in the refracting power of the anisotropy of pinching on sub-scanning direction.
Figure 18 and Figure 19 is the lens data based on embodiment 1 shown in Figure 14 by the maximum numerical aperture of light beam LBn
NAa is set as the 0.06 spherical aberration characteristic for simulate resulting light beam LBn, and horizontal axis is indicated the best focus position in design
It is set as the focal position (μm) of zero point, the longitudinal axis indicates the standardized incident angle β in the same manner as fig. 12 above, Figure 13.In Figure 18
Characteristic (A) shown in solid be the spherical aberration characteristic being projected on the main scanning direction of the light beam LBn of substrate P, dotted line institute
The characteristic (B) shown is the spherical aberration characteristic being projected on the sub-scanning direction of the light beam LBn of substrate P.Also, shown in Figure 19
Characteristic (C) is spherical aberration characteristic caused by indicating the difference ((B)-(A)) of characteristic (A) and characteristic (B) in Figure 18.This
Locate, the characteristic (A) in Figure 18 is by the conjunction of beam expander BE, the 1st cylindrical lens CY1, lens system G10 and f θ lens system FT
At spherical aberration caused by system, the characteristic (B) in Figure 18 be by beam expander BE, lens system G10, f θ lens system FT,
And the 2nd cylindrical lens CY2 synthesis system caused by spherical aberration.Therefore, the characteristic of characteristic (A) and the difference of characteristic (B)
(C) mainly corresponding with the spherical aberration characteristic as caused by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2.
Simulation as a result, compared with the characteristic (A) of the spherical aberration of the comparative example 1 shown in the fig. 12 above, (B), Yu Shi
The absolute value of aberration point reduces 1 digit or so when applying the situation of example 1.Such as by the characteristic (A) in Figure 18 it is found that passing through lens system
G10 and correct the spherical aberration as caused by the 1st cylindrical lens CY1, therefore will not occur to be projected to as luminous point SP substantially
The offset of light beam LBn best focus position corresponding with incident angle β in substrate P.Offset, that is, the spherical aberration meets above-mentioned
Formula (4), the condition of (6).Similarly, such as by the characteristic (B) in Figure 18 it is found that being corrected by lens system G10 by the 2nd cylinder
Spherical aberration caused by lens CY2, thus will not occur substantially as luminous point SP and be projected to the light beam LBn in substrate P with
The offset of the corresponding best focus position of incident angle β.Offset, that is, the spherical aberration meets above-mentioned formula (4), the condition of (6).And
And such as by the characteristic of Figure 19 (C) it is found that being corrected by lens system G10 by the 1st cylindrical lens CY1 and the 2nd cylindrical lens
Spherical aberration caused by CY2, therefore will not occur to be projected to the light beam LBn in substrate P and incidence as luminous point SP substantially
The difference of the corresponding best focus position of angle beta.Difference, that is, spherical aberration difference of the best focus position meets above-mentioned formula
(3), the condition of (5).It is projected to the spherical aberration of the light beam of substrate P in this way, reducing in advance and reduces the figure that can describe in turn
The minimum feature (high-resolution) of case is corresponding, for for reduce the effective diameter of luminous point SP being projected in substrate P and by light
The situation that the maximum numerical aperture NAa of beam LBn increases to 0.07 or more is effective.
As described above, scanning element Un in this 1st embodiment is in order to which one side is by the light beam LBn from light supply apparatus 14
Be projected to substrate P, on one side in one-dimensionally scanning light beam LBn in substrate P, and have: the 1st cylindrical lens CY1 has in a direction
There is focusing force；Polygonal mirror PM, incidence penetrate the light beam LBn of the 1st cylindrical lens CY1, make above-mentioned light to carry out one-dimensional scanning
Beam LBn is biased to；F θ lens system FT, the light beam LBn that is biased to by polygonal mirror PM of incidence, and with the state of telecentricity by light beam
LBn is projected to substrate P；And the 2nd cylindrical lens CY2, incidence penetrates the light beam LBn of f θ lens system FT, and has in a direction
There is focusing force；Moreover, by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 there is focusing force (folding in mutually orthogonal directions
Penetrate power) mode configure, and then be provided between the 1st cylindrical lens CY1 and polygonal mirror PM to correct aberration (sphere mapping
Difference) lens system G10.
It as a result, can the inclination of face caused by each reflecting surface of modifying factor polygonal mirror PM and the launching position of light beam LBn that generates
Offset, and the sphere mapping as caused by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 can be corrected with a simple configuration
Difference.Therefore, it can inhibit the deterioration of the imaging performance of luminous point SP, so that raising is (fine in the resolution for the pattern described in substrate P
Degree).Also, the focal length f of the 1st cylindrical lens CY1 can be madeC1And the 2nd cylindrical lens CY2 focal length fC2Respectively less than f θ lens system FT
Focal length f θ, therefore can realize section space-efficient optical system (referring to Fig. 7~Fig. 9 and Figure 15~Figure 17), scanning can also be reduced
The shell of unit Un, so lightweight can also be sought.
Incident light beam LBn is concentrated on polygonal mirror PM on the deviation direction of polygonal mirror PM by the 1st cylindrical lens CY1
Front, lens system G10 is on above-mentioned deviation direction, making the light beam LBn after dissipating by the 1st cylindrical lens CY1 optically focused
As directional light, and on the sub-scanning direction orthogonal with above-mentioned deviation direction, incident light beam LBn is concentrated on polygonal mirror
On the reflecting surface RP of PM.The light beam LBn that can will be projected to polygonal mirror PM as a result, is biased to direction at edge in pinching on reflecting surface RP
The strip (long ellipticity) of extension.Moreover, f θ lens system FT gathers incident light beam LBn on above-mentioned deviation direction
Light makes through lens system G10 in substrate P, and on the direction orthogonal with above-mentioned deviation direction in optically focused on reflecting surface RP
And the light beam LB after dissipating becomes directional light, the 2nd cylindrical lens CY2 will be entered on the direction orthogonal with above-mentioned deviation direction
The light beam LBn penetrated is concentrated in substrate P.Even if having as a result, reflecting surface RP relative to Z-direction inclined situation (reflecting surface RP
The inclination of normal relative to X/Y plane), since reflecting surface RP and substrate P are in being in that conjugate relation (close by imaging on sub-scanning direction
System), so the launching position that also can inhibit the respective light beam LBn of reflecting surface RP is deviated in sub-scanning direction.
(variation 1)
According to this 1st embodiment, the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2's is each such as embodiment 1 (Figure 14)
Shown, the face of light beam incident side is formed as in the barrel surface on sub-scanning direction with fixed radius of curvature, light beam emitting side
Face be formed as plane, and be made of lens.However, each cylinder of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2
Face may be alternatively formed to (cut open the flexure plane that the slightly different multiple faces of radius of curvature are smoothly formed by connecting in vertical with bus
It is aspherical in the shape of face).Also, each planar side of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 can also be processed into
There is the cylinder planar of set radius of curvature (finite value other than ∞) in main scanning direction or sub-scanning direction.Also, wanting incident
Wavelength X to each light beam LBn (outgoing beam of light supply apparatus 14) of scanning element Un is not limited to embodiment 1 and compares
The wavelength 354.7nm of set ultraviolet region, can also be other wavelength (light of visibility region, infrared region) in example 1.Also,
If carrying out achromatism by lens system G10, multiple light beams that wavelength can be made different coaxial (or parallel) it is incident to multi-panel
Mirror PM, so as to the surface of the different multiple luminous point SP scanning substrate P of wavelength.Alternatively, passing through the colour killing of lens system G10
Difference can also be such that light beam LBn becomes relative to central wavelength in the broadband light of distribution intensity in fixed wave-length coverage.Also, light
Beam LBn can both have polarized component without non-polarized ingredient, can also be the intensity distribution in beam profile and non-gaussian point
Cloth but uniform intensity distribution (substantially rectangular or trapezoidal distribution).
(variation 2)
In the first embodiment described above, it is biased to light beam LBn using polygonal mirror PM, but the inspection that can be swung can also be used
Flowmeter mirror (being movably biased to component, swinging mirror) is biased to light beam LBn.The light when situation, after the reflection of galvanometer mirror
Beam LBn is also projected to substrate P (plane of illumination) via f θ lens system FT, so in needing to the reflecting surface of galvanometer mirror
When modified situation is implemented in face inclination, as long as the 1st cylindrical lens CY1 and lens system is similarly arranged in the front of galvanometer mirror
G10, and the 2nd cylindrical lens CY2 is set after f θ lens system FT.Also, lens system G10 is by 2 spherical lenses
G10a, G10b are constituted, but can also be made of the lens of single lens or 3 or more.Also, constituting the ball of lens system G10
Lens G10a, G10b can also be made of non-spherical lens in face.In turn, use cylindrical lens as the 1st optical component CY1 and
2 optical component CY2, but as long as be a direction refracting power for the refracting power in the direction orthogonal with the direction relatively
Big lens.For example, toric lens or anamorphote can also be used as the 1st optical component CY1 and the 2nd optical component
CY2。
(variation 3)
According to this 1st embodiment, the 1st cylindrical lens CY1 and each of the 2nd cylindrical lens CY2 are by simple lens institute structure
At.The production and assembling (adjustment) of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 becomes simply, to can inhibit cost as a result,.
However, particularly the 2nd cylindrical lens CY2 can also be constituted with multi-disc lens to implement the amendment of the spherical aberration of light beam LBn.In
When being constituted the situation of the 2nd cylindrical lens CY2 with multi-disc (such as 2) lens, need to carry out to make the bus between multi-disc lens
The accurately consistent adjustment operation of mutual gyrobearing.Furthermore it is saturating in being constituted the 2nd cylinder with multi-disc (such as 2) lens
When the situation of mirror CY2, the direction that the bus of the 1st cylindrical lens CY1 can be made to extend is parallel with main scanning direction such as comparative example 1,
Even if omitting lens system G10, the spherical aberration for being projected to the light beam LBn of substrate P can also be corrected well.But in the situation
When, as shown in comparative example 1, need to make the focal length f of the 1st cylindrical lens CY1C1It is longer than the focal length f θ of f θ lens system FT, therefore sweeps
The overall length for retouching the optical path of unit Un is elongated.However, sometimes also by the focal length f of the 2nd cylindrical lens CY2C2It is set as saturating relative to f θ
The focal length f θ of mirror system FT is smaller, and inhibits smaller by spherical aberration.
In the variation 3 or embodiment 1 (Figure 14~Figure 17), it can get a kind of light-beam scanner and (or describe dress
Set), in the luminous point SP of substrate P (irradiated body) one-dimensionally scanning light beam LBn, and it is provided with the 1st cylindrical lens CY1 the (the 1st
Optical component), to the reflecting surface RP to the polygonal mirror PM (light beam deviation component) for being biased to light beam LBn, projection
In the light beam LBn of pinching on sub-scanning direction；F θ lens system FT (scanning optical system), to incidence through polygonal mirror PM
The light beam LBn of deviation, and it is projected to substrate P, and in carrying out one-dimensional scanning in substrate P；And the 2nd cylindrical lens CY2 the (the 2nd
Optical component), it is configured between substrate P and f θ lens system FT, by the light beam LBn that will be projected from f θ lens system FT in pair
The simple lens or multi-disc lens of scanning direction pinching are constituted；By the focal length f θ and the 2nd cylindrical lens that make f θ lens system FT
The focal length f of CY2C2Relationship be f θ > fC2, and reduce the ball that the light beam LBn of substrate P is projected to predetermined value aperture
Surface aberration.
[the 2nd embodiment]
It is also simply illustrated in fig. 4 above, in the lens system for constituting beam expander BE in scanning element Un
In optical path between Be1, Be2, to make to describe line SLn in sub-scanning direction (X-direction) minor shifts, and it is provided with as software
With optical component being capable of inclined parallel-plate HVP.Figure 20 A, Figure 20 B are inclined to line SLn is described because of the inclination of parallel-plate HVP
The figure that the case where shifting is illustrated, Figure 20 A are to indicate the plane of incidence and outgoing plane parallel to each other of parallel-plate HVP relative to light beam
The center line (chief ray) of LBn is in the figure of 90 degree of state, i.e. expression parallel-plate HVP is in state diagram not inclined in the face XZ.Figure
20B is the center line (chief ray) that indicates the plane of incidence and outgoing plane parallel to each other of parallel-plate HVP relative to light beam LBn from 90
When spending inclined situation, i.e. parallel-plate HVP is relative to the inclined state diagram with angle η of the face YZ.
In turn, in Figure 20 A, Figure 20 B, at not inclined state (angle η=0 degree) parallel-plate HVP, lens system
The optical axis Axe of Be1, Be2 are set as the center of the circular open by aperture diaphragm PA, to be incident to the light beam of beam expander BE
The adjusting of centerline of LBn is coaxial with optical axis AXe.Also, the position of the rear side focus of lens system Be2 is configured to and aperture diaphragm
The position consistency of the circular open of PA.The position of aperture diaphragm PA is set as, and passes through the 1st cylindrical lens shown in fig. 16 above
CY1 and lens system G10 (spherical lens G10a, 10b), on sub-scanning direction from the position of the reflecting surface RP of polygonal mirror PM
When (or position of the front side focus of f θ lens system FT) is observed, become the position of substantially pupil.On the other hand, in main scanning side
Upwards, aperture diaphragm PA is configured to the position optical conjugate with the i.e. entrance pupil in position of the front side focus of f θ lens system FT.
Therefore, when making parallel-plate HVP with angle η and inclined situation, the light beam of lens system Be2 is incident to through parallel-plate HVP
The center line of LBn (being herein divergent beams) is minutely moved in parallel relative to optical axis Axe to -Z direction, from lens system Be2
The light beam LBn of injection is converted to collimated light beam, and the center line of light beam LBn is slightly slanted relative to optical axis Axe.
Because the position of the rear side focus of lens system Be2 is configured to the position consistency with the circular open of aperture diaphragm PA,
Therefore from the light beam LBn (collimated light beam) that lens system Be2 is obliquely projected will not on aperture diaphragm PA to Z-direction deviate, and
Continue to be projected to circular open.Therefore, by the light beam LBn of the circular open of aperture diaphragm PA in the 1/e in intensity distribution2's
In the state that the intensity of flat zone is accurately weakened, slightly to incline in the face XZ in sub-scanning direction relative to optical axis Axe
Oblique angle, the 1st cylindrical lens CY1 of directive back segment.Aperture diaphragm PA on sub-scanning direction from the reflecting surface of polygonal mirror PM
When RP is observed, correspond to pupil location, according on the sub-scanning direction of the light beam LBn of the circular open by aperture diaphragm PA
Inclination angle will be incident to the light beam LBn (in pinching on sub-scanning direction) of the reflecting surface RP of polygonal mirror PM in the position on reflecting surface
It sets and slightly deviates.Therefore, the light beam LBn after the reflecting surface RP reflection of polygonal mirror PM is also with relative to including f θ shown in Fig. 4
The state that the optical axis AXf of lens system FT and the face parallel with the face XY are deviated gently towards Z-direction is incident to f θ lens system FT.
As a result, to be incident to the light beam LBn of the 2nd cylindrical lens CY2 in subscan when the situation of the optical path shown in fig. 17 above
Direction is slightly slanted, and the position of the luminous point SP for the light beam LBn that be projected in substrate P is slightly deviated to sub-scanning direction.Furthermore
In Fig. 4, Tu20Zhong, it is set as having the spherical surface of positive refracting power saturating the two for constituting lens system Be1, Be2 of beam expander BE
Mirror (convex lens), but the lens system Be1 of the incident side of light beam LBn can also be set as the spherical lens with negative refractive power
(concavees lens).When the situation, from lens system Be1 project light beam LBn not pinching and become divergent beams be incident to
Mirror system Be2, and beam diameter is converted to through widened collimated light beam by lens system Be2.
In such as comparative example 1 above, the bus of the bus and the 2nd cylindrical lens CY2 that make the 1st cylindrical lens CY1 is each other
When configuring in parallel, and being constituted the situation of the 2nd cylindrical lens CY2 with simple lens, as shown in Figure 12 and Figure 13, the biggish ball of remaining
Surface aberration.It therefore, can be because if being set in the beam expander BE (Fig. 7, Fig. 8) of comparative example 1 and making its inclination for parallel-plate HVP
It is incident to the position of the light beam LBn of the 2nd cylindrical lens CY2 or favours sub-scanning direction and slightly change, and generate bigger
Spherical aberration.On the other hand, in such as embodiment 1, by the mother of the bus of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2
Line is configured with orthogonal relationship, and when being provided with the situation of lens system G10, or as illustrated in variation 3
As when being constituted the situation of the 2nd cylindrical lens CY2 with multi-disc lens, sphere mapping difference can be repaired well as shown in Figure 18, Figure 19
Just to effective size (diameter) φ or less of luminous point SP.Therefore, saturating because to be incident to the 2nd cylinder when tilting parallel-plate HVP
The position of the light beam LBn of mirror CY2 favours the increment of sphere mapping difference that sub-scanning direction slightly changes and generates and is also pressed down
It is made smaller.
Because parallel-plate HVP shown in Fig. 4 (Figure 20) is set to each of scanning element Un, therefore scanning element Un can be made respectively
The tilt angle rl of parallel-plate HVP continuously change, thus can make in the office of the sub-scanning direction for the pattern described in substrate P
Portion part is flexible with small ratio.Therefore, even if there is long dimension direction (sub-scanning direction) upper substrate portion P in substrate P
Flexible situation can also be well maintained the 2nd layer of pattern relative to base pattern (the 1st layer of figure having been formed in substrate P
Case) overlapping exposures (description) when overlapping accuracy.The part of the long dimension direction (sub-scanning direction) of substrate P is flexible can for example to be led to
Following method is crossed to predict before each implementation pattern plotter of scanning element Un: will in long dimension direction with constant spacing (such as
The alignment mark for 10mm) being formed in the width direction two sides of substrate P is expanded using aligming microscope, and sequentially using photographing element
It is shot, image analysis is carried out to the variation (spacing variation of label etc.) of the long dimension direction of mark position.Alignment mark
Configuration and an example of configuration etc. of aligming microscope be disclosed in such as No. 2015/152218 bulletin of International Publication No..
Claims (12)
1. a kind of drawing apparatus, the light beam of the main scanning direction one-dimensional scanning pattern plotter on irradiated body, and make
It states irradiated body and above-mentioned light beam to relatively move in the sub-scanning direction intersected with above-mentioned main scanning direction, in above-mentioned illuminated
Body depicting pattern, has:
Beam generated device, to generate above-mentioned light beam；
Above-mentioned light beam from above-mentioned beam generated device is converted to directional light made of expanding beam diameter by beam expander
Beam；
Light beam be biased to component, make through above-mentioned beam expander convert after above-mentioned light beam inject after, make its to above-mentioned main scanning direction
The corresponding one-dimensional deviation in direction；
Scanning optical system, the above-mentioned light beam after making above-mentioned one-dimensional deviation is injected, and the luminous point of above-mentioned light beam is concentrated on
It states on irradiated body；
1st optical system, it includes the 1st optical element, the 1st optical element is set to above-mentioned beam expander and above-mentioned light beam is biased to
Between component, have inject the above-mentioned light beam after above-mentioned beam expander is converted, and makes to be projected to above-mentioned light beam deviation structure
Above-mentioned light beam on part is in the convergent anisotropy refracting power in direction corresponding with above-mentioned sub-scanning direction；
2nd optical system, it includes the 2nd optical element, the 2nd optical element has to make from above-mentioned scanning optical system
Project, towards above-mentioned irradiated body above-mentioned light beam in the convergent anisotropy refracting power of above-mentioned sub-scanning direction；And
Offset optical component, is set in the optical path of above-mentioned beam expander, keeps the optical path of above-mentioned light beam past and above-mentioned subscan
The corresponding direction offset in direction.
2. drawing apparatus as described in claim 1, wherein above-mentioned beam expander includes to make from the upper of above-mentioned beam generated device
It states the 1st lens system of light beam injection and the 2nd saturating of collimated light beam will be converted to by the above-mentioned light beam of the 1st lens system
Mirror system；
Above-mentioned offset optical component, be angle of inclination be configured at above-mentioned 1st lens system and above-mentioned 2nd lens system it
Between parallel-plate.
3. drawing apparatus as claimed in claim 2, is further equipped with aperture diaphragm, which is configured at above-mentioned expand
The position of the rear side focus of above-mentioned 2nd lens system of device, by the intensity distribution of the above-mentioned light beam after the expansion of above-mentioned beam expander
On flat zone remitted its fury.
4. drawing apparatus as claimed in claim 3, wherein above-mentioned light beam, which is biased to component, has reflecting surface, and the reflecting surface is in the future
It is reflected towards above-mentioned scanning optical system from the above-mentioned light beam of above-mentioned beam expander, and in the deflection of the above-mentioned main scanning direction of correspondence
Degree can change；
The above-mentioned reflecting surface of above-mentioned light beam deviation component is by above-mentioned scanning in direction corresponding with above-mentioned sub-scanning direction
With optical system and above-mentioned 2nd optical system configurations at above-mentioned irradiated body at optical conjugate, with above-mentioned main scanning direction
Corresponding direction, the then position for the front side focus configured in above-mentioned scanning optical system.
5. drawing apparatus as claimed in claim 4, wherein component is biased to from above-mentioned light beam in the position of above-mentioned aperture diaphragm
When above-mentioned reflecting surface is observed, the substantially pupil of above-mentioned 1st optical system is set in direction corresponding with above-mentioned sub-scanning direction
Position, be then set as being biased to by above-mentioned 1st optical system and above-mentioned light beam in direction corresponding with above-mentioned main scanning direction
The position of the front side focus of the position of the above-mentioned reflecting surface of component or above-mentioned scanning optical system is at optical conjugate.
6. drawing apparatus as claimed in claim 5, wherein above-mentioned 1st optical element of above-mentioned 1st optical system only with it is upper
The corresponding direction of main scanning direction is stated with refracting power and makes the 1st cylinder injected by the above-mentioned light beam of above-mentioned aperture diaphragm
Lens；
Above-mentioned 2nd optical element of above-mentioned 2nd optical system only has refracting power in direction corresponding with above-mentioned sub-scanning direction
The 2nd cylindrical lens.
7. drawing apparatus as claimed in claim 6, wherein above-mentioned 1st optical system includes spherical surface or aspherical lens system
System, after the spherical surface or aspherical lens system have and make to inject by the above-mentioned light beam of above-mentioned 1st cylindrical lens, towards above-mentioned
Light beam be biased to component above-mentioned reflecting surface project etc. tropisms refracting power.
8. drawing apparatus as claimed in claim 7, wherein in order to make the above-mentioned light beam for being projected to above-mentioned irradiated body above-mentioned
The numerical aperture NA of main scanning directionyWith the numerical aperture NA in above-mentioned sub-scanning directionxIt is equal in set permissible range,
It is set as the focal length of above-mentioned 1st cylindrical lens being set as fC1, the focal length of above-mentioned 2nd cylindrical lens is set as fC2, will be upper
The focal length for stating spherical surface or aspherical lens system is set as fGAnd when the focal length of above-mentioned scanning optical system is set as f θ,
With following relationship:
fG 2/fC1=f θ2/fC2。
9. drawing apparatus as claimed in claim 8, wherein
Above-mentioned aperture diaphragm has the circular section that will inject into that the above-mentioned beam shaping of above-mentioned 1st cylindrical lens is diameter phi a
The opening of light beam,
It is set as the numerical aperture for being projected to the above-mentioned light beam of above-mentioned irradiated body being set as NA (=NAx≒NAy) when, it is above-mentioned
The diameter phi a of aperture diaphragm becomes following relationship:
φ a=2 × NA (f θ × fC1/fG)=2 × NA × (fG×fC2/fθ)。
10. the drawing apparatus as described in any one of claims 1 to 5, wherein by the above-mentioned 1st of above-mentioned 1st optical system the
The focal length of optical element is set as fC1, the focal length of above-mentioned 2nd optical element of above-mentioned 2nd optical system is set as fC2, swept above-mentioned
It retouches when being set as f θ with the focal length of optical system,
By above-mentioned focal length fC1It is set as more above-mentioned focal length f θ long, and by above-mentioned focal length fC2It is set as small compared with above-mentioned focal length f θ.
11. the drawing apparatus as described in any one of claim 7 to 9, wherein set by the focal length of above-mentioned 1st cylindrical lens
For fC1, the focal length of above-mentioned 2nd cylindrical lens is set as fC2, when the focal length of above-mentioned scanning optical system is set as f θ,
By the way that above-mentioned spherical surface or aspherical lens system is arranged, by above-mentioned focal length fC1With above-mentioned focal length fC2It is set as jointly more above-mentioned
Focal length f θ is small.
12. the drawing apparatus as described in any one of claims 1 to 5, wherein above-mentioned 1st optical element and above-mentioned 2nd optics
Element includes that the cylinder different from the refracting power of mutually orthogonal directions in the vertical face of the optical path that above-mentioned light beam is advanced is saturating
Mirror, toric lens and anamorphote it is any.
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016093180 | 2016-05-06 | ||
| JP2016-093180 | 2016-05-06 | ||
| CN201780027995.2A CN109196423B (en) | 2016-05-06 | 2017-04-25 | Light beam scanning device |
| PCT/JP2017/016274 WO2017191777A1 (en) | 2016-05-06 | 2017-04-25 | Beam scanning device and drawing device |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780027995.2A Division CN109196423B (en) | 2016-05-06 | 2017-04-25 | Light beam scanning device |
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| CN110031964A true CN110031964A (en) | 2019-07-19 |
| CN110031964B CN110031964B (en) | 2022-06-10 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910171295.1A Active CN110031964B (en) | 2016-05-06 | 2017-04-25 | Drawing device |
| CN201910171306.6A Active CN110031965B (en) | 2016-05-06 | 2017-04-25 | Drawing device |
| CN201780027995.2A Active CN109196423B (en) | 2016-05-06 | 2017-04-25 | Light beam scanning device |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201910171306.6A Active CN110031965B (en) | 2016-05-06 | 2017-04-25 | Drawing device |
| CN201780027995.2A Active CN109196423B (en) | 2016-05-06 | 2017-04-25 | Light beam scanning device |
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| Country | Link |
|---|---|
| JP (3) | JP6954274B2 (en) |
| KR (2) | KR102389080B1 (en) |
| CN (3) | CN110031964B (en) |
| HK (1) | HK1258865A1 (en) |
| TW (2) | TWI811646B (en) |
| WO (1) | WO2017191777A1 (en) |
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| CN111279244B (en) | 2017-10-25 | 2022-03-18 | 株式会社尼康 | Pattern drawing device |
| JP6998488B1 (en) * | 2021-07-07 | 2022-01-18 | 川崎重工業株式会社 | Laser scanning device and laser scanning method |
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Also Published As
| Publication number | Publication date |
|---|---|
| TW201804212A (en) | 2018-02-01 |
| CN110031964B (en) | 2022-06-10 |
| KR20220053054A (en) | 2022-04-28 |
| CN110031965A (en) | 2019-07-19 |
| HK1258865A1 (en) | 2019-11-22 |
| KR102389080B1 (en) | 2022-04-22 |
| JP6954274B2 (en) | 2021-10-27 |
| JP6888700B2 (en) | 2021-06-16 |
| JP7226499B2 (en) | 2023-02-21 |
| TWI811646B (en) | 2023-08-11 |
| JP2022008529A (en) | 2022-01-13 |
| WO2017191777A1 (en) | 2017-11-09 |
| JPWO2017191777A1 (en) | 2019-03-07 |
| TW202127096A (en) | 2021-07-16 |
| KR20190003748A (en) | 2019-01-09 |
| CN109196423A (en) | 2019-01-11 |
| JP2020101808A (en) | 2020-07-02 |
| KR102496906B1 (en) | 2023-02-08 |
| CN110031965B (en) | 2021-09-10 |
| CN109196423B (en) | 2021-08-27 |
| TWI724165B (en) | 2021-04-11 |
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