CN110031965A - Drawing apparatus - Google Patents

Abstract

As in the one-dimensionally scanning element (Un) of the light-beam scanner of scanning light beam (LBn) on substrate (P), has the 1st cylindrical lens (CY1) that there is focusing force in a direction, the light beam (LBn) through the 1st cylindrical lens (CY1) is biased to carry out the polygonal mirror (PM) of one-dimensional scanning, the light beam (LBn) being biased to the state of telecentricity is projected to the f θ lens system (FT) of substrate (P), and incidence penetrates the light beam (LBn) of f θ lens system (FT) and has the 2nd cylindrical lens (CY2) of focusing force in a direction, 1st cylindrical lens (CY1) has focusing force in mutually orthogonal directions with the 2nd cylindrical lens (CY2), the scanning element (Un) has in turn is set to the 1st cylindrical lens (CY1) and polygonal mirror (P M the lens system (G10) between).

Description

Drawing apparatus

The application is divisional application, original bill application No. is 201780027995.2 (PCT/JP2017/016274), applications Day is on 04 25th, 2017, entitled " light-beam scanner and drawing apparatus ".

Technical field

The present invention describe specific pattern in substrate about a kind of and along the light beam of main scanning direction one-dimensionally scanning light beam Scanning means and the drawing apparatus for describing specific pattern using the light-beam scanner.

Background technique

It is known that can scan to constant speed by using f θ lens system and polygonal mirror (polygonal rotating mirror) and be projected to photosensitive material Light beam on material.Each reflecting surface of general polygonal mirror is and the surfaces of revolution (plane comprising direction of rotation) that is orthogonal to polygonal mirror Direction be formed parallel to, but actual reflecting surface just like relative to the direction orthogonal with the surfaces of revolution of polygonal mirror with slightly inclining Oblique error, i.e., so-called face tilt (inclination) error.The error is different because of each reflecting surface, therefore by f θ lens system in photosensitive The image position (launching position of light beam) for the luminous point being imaged on material, has offset in each reflecting surface.

For the offset for preventing the launching position, in following Japanese Patent Laid-Open 8-297255 bulletins, in polygonal mirror Front and f θ lens system after this at 2, configured with only in deviation direction (scanning direction, polygonal mirror relative to polygonal mirror Direction of rotation) orthogonal direction has refractive cylindrical lens.That is, configuration is parallel with the scanning direction of light beam just like bus 2 cylindrical lenses.It, can as a result, on the direction (sub-scanning direction) orthogonal with the scanning direction of light beam (main scanning direction) Make to become conjugate relation with the plane of illumination of photosensitive material on the reflecting surface of polygonal mirror, even if face slope error is anti-because of polygonal mirror It penetrates face and different, also light beam can be made to fix in the launching position on photosensitive material in sub-scanning direction.

However, the 1st cylinder in front of polygonal mirror will be configured at as described in Japanese Patent Laid-Open 8-297255 bulletin Lens and the 2nd cylindrical lens being configured at after f θ lens system (being made of multi-disc spherical lens) it is each by simple lens When constituting, and making the bus of the 1st cylindrical lens situation parallel with the bus of the 2nd cylindrical lens, exists and be difficult to carry out to general The optical design (lens error correction) etc. that the aberration as caused by cylindrical lens (such as spherical aberration of light beam) reduces well is asked Topic.

Summary of the invention

The light-beam scanner of 1st embodiment of the invention, be one side by the light beam from light supply apparatus be projected to by Irradiation body, on one side in one-dimensionally scanning above-mentioned light beam on above-mentioned irradiated body, have: the 1st optical component, by above-mentioned light beam It is concentrated on the 1st direction of corresponding above-mentioned one-dimensional square；Light beam is biased to component, makes the above-mentioned light by above-mentioned 1st optical component Beam enters, and so that above-mentioned light beam is partial to above-mentioned 1st direction to carry out above-mentioned one-dimensional scanning；Scanning use optical system, make with Above-mentioned light beam is biased to the above-mentioned light beam that component is biased to and is injected, and projects to above-mentioned irradiated body；2nd optical component makes to pass through The above-mentioned light beam of above-mentioned scanning optical system is injected, and by above-mentioned beam condenser in 2nd side orthogonal with above-mentioned 1st direction To；And lens system, it is set to above-mentioned 1st optical component and above-mentioned light beam is biased between component, above-mentioned 1st optics will be passed through The above-mentioned light beam of component is concentrated on above-mentioned 2nd direction in the position that above-mentioned light beam is biased to component.

The drawing apparatus of 2nd embodiment of the invention, be one side on irradiated body main scanning direction scanning come from The light beam of light supply apparatus relatively moves above-mentioned irradiated body and above-mentioned light beam in sub-scanning direction, to be shone in above-mentioned Beam depicting pattern, has: it is movably biased to component, to scan above-mentioned light beam in above-mentioned main scanning direction, and above-mentioned light beam It injects and makes it in the one-dimensional deviation of above-mentioned main scanning direction；Scanning optical system, makes one-dimensional with above-mentioned movable deviation component The above-mentioned light beam being biased to is injected, and above-mentioned beam condenser is projected on above-mentioned irradiated body；1st optical component, with different The refracting power of tropism will converge on above-mentioned main scanning direction towards the above-mentioned movable above-mentioned light beam for being biased to component；2nd optics structure Part, the refracting power with anisotropy, by from above-mentioned scanning with optical system project and towards the above-mentioned light of above-mentioned irradiated body Beam convergence is in above-mentioned sub-scanning direction；And the 3rd optical component, it is set to above-mentioned 1st optical component and above-mentioned movable deviation structure Between part, and there is the above-mentioned light beam for making to converge on above-mentioned main scanning direction to inject, and convert it in above-mentioned subscan side To pinching light beam and make its towards it is above-mentioned it is movable be biased to component project iso refracting power.

The drawing apparatus of 3rd embodiment of the invention is the light that one side will be partial to the 1st direction by movably deviation component Beam, it is one-dimensional in being carried out on above-mentioned irradiated body along above-mentioned 1st direction on one side with scanning in optics system projects to irradiated body Scanning, to have in above-mentioned irradiated body depicting pattern: the 1st adjustment optical system, it includes the 1st lens component, the 1st Lens component has to make to be projected to the above-mentioned movable above-mentioned light beam for being biased to component in 2nd side orthogonal with above-mentioned 1st direction To convergent anisotropy refracting power；And the 2nd adjustment optical system, it includes the 2nd lens component, the 2nd lens component, which has, to be used So that the above-mentioned light beam from above-mentioned scanning optical system towards above-mentioned irradiated body is in the convergent anisotropy folding in above-mentioned 2nd direction Penetrate power；The wavelength of above-mentioned light beam is set as λ, numerical value of the above-mentioned light beam in above-mentioned 1st direction of above-mentioned irradiated body will be projected to Aperture is set as NA_y, NA will be set as in the numerical aperture in above-mentioned 2nd direction_x, the above-mentioned light beam for being projected to above-mentioned irradiated body is existed The spherical aberration in above-mentioned 1st direction is set as S₁, S will be set as in the spherical aberration in above-mentioned 2nd direction₂When, above-mentioned 1st lens component With above-mentioned 2nd lens component, it is set to meet two following conditions any one: S₁< λ/NA_y ²And S₂< λ/NA_x ²And | S₁- S₂| < λ/NA_y ²And | S₁- S₂| < λ/NA_x ²。

The drawing apparatus of 4th embodiment of the invention is the main scanning direction one-dimensional scanning pattern on irradiated body The light beam of description, and make above-mentioned irradiated body with above-mentioned light beam in the sub-scanning direction phase intersected with above-mentioned main scanning direction To movement, to have in above-mentioned irradiated body depicting pattern: beam generated device, to generate above-mentioned light beam；Beam expander, Above-mentioned light beam from above-mentioned beam generated device is converted to collimated light beam made of expanding beam diameter by it；Light beam is biased to Component makes it to direction one corresponding with above-mentioned main scanning direction after injecting the above-mentioned light beam after above-mentioned beam expander is converted Dimension is biased to；Scanning optical system, the above-mentioned light beam after making above-mentioned one-dimensional deviation is injected, and the luminous point of above-mentioned light beam is concentrated on On above-mentioned irradiated body；1st optical system, it includes the 1st optical element, the 1st optical element be set to above-mentioned beam expander with Above-mentioned light beam is biased between component, is had inject the above-mentioned light beam after above-mentioned beam expander is converted, and make to be projected to The above-mentioned light beam on light beam deviation component is stated in the convergent anisotropy refracting power in direction corresponding with above-mentioned sub-scanning direction；2nd Optical system, it includes the 2nd optical element, the 2nd optical element has to make from the injection of above-mentioned scanning optical system, court To above-mentioned irradiated body above-mentioned light beam in the convergent anisotropy refracting power of above-mentioned sub-scanning direction；And offset optical component, In its optical path for being set to above-mentioned beam expander, make the past direction offset corresponding with above-mentioned sub-scanning direction of the optical path of above-mentioned light beam.

Detailed description of the invention

Fig. 1 be show embodiment comprising to substrate implement exposure-processed exposure device device manufacturing system it is general The figure slightly constituted.

Fig. 2 is to show light beam switching part shown in FIG. 1 and describe the schematic configuration of head and indicate to describe each scanning of head The scan line of unit is in the figure of the configuration relation on substrate.

Fig. 3 is the specific composition shown around the selection optical element and incident mirror of light beam switching part shown in Fig. 2 Figure.

Fig. 4 is the figure for showing the specific composition of scanning element shown in Fig. 2, and is oneself and the scanning direction comprising light beam The plane (XZ plane) that the plane (plane parallel with X/Y plane) of (being biased to direction) is orthogonal observes resulting figure.

Fig. 5 is shown in Fig. 4 from the planar observation parallel with the plane in deviation direction (main scanning direction) comprising light beam Aperture diaphragm to substrate light beam skeleton diagram.

Fig. 6 is the lens data figure shown in the optical design example of comparative example 1.

Fig. 7 is compared with observing in the face parallel with the plane in the deviation direction (main scanning direction of luminous point) comprising light beam Beam expander in example 1 to substrate (image planes) light beam state skeleton diagram.

Fig. 8 is the reflection from the planar observation shown in Fig. 7 beam expander orthogonal with the main scanning direction of light beam to polygonal mirror The skeleton diagram of the state of the light beam in face.

Fig. 9 is from the reflecting surface of the planar observation shown in Fig. 7 polygonal mirror orthogonal with the main scanning direction of light beam to substrate The skeleton diagram of the state of the light beam of (image planes).

Figure 10 is by the spherical aberration on from f θ lens system projects to the main scanning direction of the light beam of substrate (image planes) Generation state exaggerates and the figure that is illustrated.

Figure 11 is by the spherical aberration on from f θ lens system projects to the sub-scanning direction of the light beam of substrate (image planes) Generation state exaggerates and the figure that is illustrated.

Figure 12 is main scanning direction and the subscan for emulating the light beam by generating and by the optical design example of comparative example 1 The resulting curve graph of spherical aberration characteristic in direction.

Figure 13 is the difference of the spherical aberration for showing the main scanning direction in comparative example 1 and the spherical aberration of sub-scanning direction Spherical aberration characteristic curve graph.

Figure 14 is the figure for showing the lens data in the optical design example of embodiment 1.

Figure 15 is real in observing in the face parallel with the plane in deviation direction (main scanning direction of luminous point) comprising light beam Apply beam expander in example 1 to substrate (image planes) light beam state skeleton diagram.

Figure 16 is anti-to polygonal mirror in observing beam expander shown in figure 15 in the face orthogonal with the main scanning direction of light beam Penetrate the skeleton diagram of the state of the light beam in face.

Figure 17 is in observing the reflecting surface of polygonal mirror shown in figure 15 in the face orthogonal with the main scanning direction of light beam to base The skeleton diagram of the state of the light beam of plate (image planes).

Figure 18 is the main scanning direction and sub-scanning direction for emulating the light beam generated by the optical design example of embodiment 1 The resulting curve graph of spherical aberration characteristic.

Figure 19 is the difference of the spherical aberration for showing the main scanning direction in embodiment 1 and the spherical aberration of sub-scanning direction Spherical aberration characteristic curve graph.

Figure 20 A is display parallel-plate in state diagram not inclined in the face XZ, and Figure 20 B is to indicate that parallel-plate inclines relative to the face YZ The state diagram of rake angle η.

Specific embodiment

About the light-beam scanner and drawing apparatus of embodiments of the present invention, preferable embodiment, and one are disclosed Face is described in detail in following on one side referring to the attached drawing of accompanying.Furthermore embodiments of the present invention are not limited to those realities Mode is applied, also includes embodiment made of adding various changes or improvement.That is, including industry in constituent element documented by following Person can be easy imagination, substantially the same embodiment, and following documented constituent element can be appropriately combined.Also, can be in not It is detached from various omissions, displacement or the change that constituent element is carried out in the range of purport of the invention.

[the 1st embodiment]

Fig. 1 is the exposure device EX comprising implementing exposure-processed to substrate (irradiated body) P for showing the 1st embodiment The schematic configuration diagram of device manufacturing system 10.Furthermore in following explanation, as long as no special instructions, just set with gravity direction It unites for the XYZ orthogonal coordinate system of Z-direction, and arrow as illustrated, X-direction, Y-direction and Z-direction is illustrated.

Device manufacturing system 10 is the system implemented particular procedure (exposure-processed etc.) to substrate P and manufacture electronic component (substrate board treatment).Device manufacturing system 10 is, for example, the flexible display, membranaceous for constructing manufacture as electronic component Touch panel, liquid crystal display panel the production lines such as membranaceous colored filter, flexible wiring or flexible transducer manufacture System.Hereinafter, being illustrated premised on flexible display as electronic component.As flexible display, such as there are organic EL display, liquid crystal display etc..Device manufacturing system 10 has the construction of so-called roll-to-roll (Roll To Roll) mode, That is: substrate P is sent out from the supply roller of the diagram for plate shape substrates (sheet substrate) P for being wound with flexible (pliability) in the form of a roll, And various processing are continuously implemented to the substrate P sent out, various treated bases are then batched by recycling roll (not shown) Plate P.Therefore, various treated substrate Ps become the multiple element state connected in the conveyance direction of substrate P, and become fall The substrate at angle.The substrate P sent out from above-mentioned supply roller sequentially passes through processing unit (plant) PR1, exposure device EX and processing unit (plant) PR2 is subjected to various processing, and is taken up by above-mentioned recycling roll.Substrate P has the moving direction (conveyance direction) of substrate P As longitudinal direction (long size) and width direction becomes the band-like shape of short side direction (short size).

In 1 embodiment of Yu Ben, X-direction is in the horizontal plane orthogonal with Z-direction, and substrate P automatically supplies roller direction and returns Receive the direction of roller.Y-direction is in direction orthogonal with X-direction in the horizontal plane orthogonal with Z-direction, and is the width side of substrate P To (short dimensional directions).Furthermore -Z direction is set as the direction (gravity direction) that gravity works, by the conveying side of substrate P To being set as +X direction.

Resin film or the foil (foil) being made of metal or alloy such as stainless steels etc. for example can be used in substrate P.As tree The material of adipose membrane, such as can be used includes polyvinyl resin, acrylic resin, polyester resin, ethylene-vinyl ester copolymer tree Rouge, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene resin, And material more than at least one of vinyl acetate resin.Also, thickness and the rigidity (young's modulus) of substrate P are as long as in such as When passing through the transport path of device manufacturing system 10, substrate P will not generate the gauffer of folding line caused by buckling and irreversibility In range.As the base material of substrate P, with a thickness of 25 μm~200 μm or so of PET (polyethylene terephthalate) and The films such as PEN (polyethylene naphthalate) are the typical cases of preferable sheet substrate.

Substrate P has the situation being heated in reason everywhere in being carried out in device manufacturing system 10, therefore preferably selected The substrate P of the less big material of thermal expansion coefficient.For example, can be by by inhibiting heat swollen and inorganic filler is mixed in resin film Swollen coefficient.Inorganic filler may be, for example, titanium oxide, zinc oxide, aluminium oxide or silica etc..Also, substrate P may be either to pass through floating Method etc. and the individual layers with a thickness of 100 μm or so of very thin glass manufactured, can also be in the very thin above-mentioned resin of glass gluing Laminate made of film, foil etc..

And say, the pliability (flexibility) of so-called substrate P even if refer to substrate P apply self weight degree power its The property that will not be wrecked or be broken and the substrate P can be curved.Also, also including by the property of the power buckling of self weight degree In pliability.Also, flexible degree can be according to the material of substrate P, size, thickness, film forming in the layer construction in substrate P, temperature Degree or the environment such as humidity etc. and change.As long as in short, in by substrate P certainly wound on the member for being set to this 1st embodiment When the situation of the conveyance direction conversion component such as various conveying rollers, rotating cylinder in the transport path in part manufacture system 10 Buckling can not occur and cause folding line or damaged (occur broken or crack) occurs smooth conveying substrate P, just can be known as Flexible range.

Processing unit (plant) (processing unit) PR1 one side will automatically supply substrate P that roller is sent to exposure device EX with specific speed In conveyance direction (+X direction) conveying along long dimension direction, one in face of being sent to step before the substrate P of exposure device EX carries out Processing.By the processing of the preceding step, the substrate P for being sent to exposure device EX, which becomes, is formed with photonasty functional layer in its surface The substrate (sensitive substrate) of (photosensitive layer).

The photonasty functional layer is to be coated in substrate P and be dried in the form of a solution, thus becomes layer (film).It is photosensitive The typical case of sexual function layer is photoresist (liquid or dry film shape), but as the material for being not necessarily to development treatment, is had by ultraviolet light The photonasty silane coupling agent (SAM) or aobvious in the part being irradiated with ultraviolet radiation that the close liquid repellency of the part of irradiation is upgraded Reveal the photonasty reducing agent etc. of plating also former base.When using situation of the photonasty silane coupling agent as photonasty functional layer, It is lyophily that the pattern part exposed in substrate P by ultraviolet light is modified from liquid repellency.It therefore, can be by as lyophily Part on selection coating contain electric conductivity ink (ink containing silver or the conductive nanometers particle such as copper) or semiconductor material Liquid etc., and the electrode for constituting thin film transistor (TFT) (TFT) etc., semiconductor, insulation or the wiring of connection will be become by being formed Pattern layer.When using situation of the photonasty reducing agent as photonasty functional layer, in what is exposed in substrate P by ultraviolet light Pattern part appears plating also former base.Therefore, after exposure, substrate P is impregnated in the plating liquid containing palladium ion etc. immediately solid It fixes time, the pattern layer that (precipitation) is made of palladium is consequently formed.Such plating is addition (additive) processing procedure, furthermore It also can be using premised on as the etching process for subtracting into (subtractive) processing procedure.When the situation, it is sent to the base of exposure device EX Plate P can be by base material to be set as PET or PEN and in its surface whole face or selectively the metallicity such as AM aluminum metallization (Al) or copper (Cu) are thin Film, so thereon lamination photoresist layer and formed.

Exposure device (processing unit) EX be one side by from the substrate P that processing unit (plant) PR1 is moved to processing unit (plant) PR2 with Specific speed is transported in conveyance direction (+X direction), one is exposed the processing unit of processing in face of substrate P.Exposure device EX to Surface (surface of photonasty functional layer, the i.e. photosurface) irradiation of substrate P and the pattern of electronic component are (for example, constitute electronics The patterns such as the electrode or wiring of the TFT of element) corresponding light pattern.It is formed and above-mentioned pattern pair in photonasty functional layer as a result, The latent image (modification portion) answered.

In 1 embodiment of Yu Ben, exposure device EX is the exposure device i.e. institute without using the direct imaging mode of mask Call the exposure device (drawing apparatus) of grating scanning mode.Exposure device EX one side transports substrate in +X direction (sub-scanning direction) P, on one side by the luminous point SP of the light beam LB (pulsed light beam) of the pulse type of exposure in edge on the plane of illumination (photosurface) of substrate P Set scanning direction (Y-direction) one-dimensionally scans (main scanning), and the intensity of luminous point SP (is described number according to pattern data According to, pattern-information) modulation (on/off) at high speed.Describe exposure and electronic component, electricity in the plane of illumination of substrate P as a result, The corresponding light pattern of specific pattern of road or wiring etc..That is, by the subscan of substrate P and the main scanning of luminous point SP, in substrate Relativity ground two-dimensional scanning luminous point SP on the plane of illumination (surface of photonasty functional layer) of P, and the plane of illumination in substrate P is retouched Draw exposure specific pattern.Also, since substrate P is transported along conveyance direction (+X direction), so by by exposure device EX quilt The exposure area of exposing patterns is to separate specific interval along the long dimension direction of substrate P and be provided with multiple.Due to being in the exposure Light region forms electronic component, so exposure area is also element-forming region.

Processing unit (plant) (processing unit) PR2 one side is by the substrate P sent from exposure device EX to recycling roll with specific speed In conveyance direction (+X direction) conveying along long dimension direction, a substrate P after exposed device EX exposure-processed is carried out The processing (such as plating or development, etching process etc.) of subsequent step.By the processing of the subsequent step, and in substrate P The upper pattern layer for forming element.

Secondly, also to exposure device EX and then being described in detail referring to Fig. 2~Fig. 5.Exposure device EX such as Fig. 1 institute Show and is accommodated in tempering room ECV.Inside is remained specific temperature, specified moisture by tempering room ECV, thus inhibits to remove in inside The substrate P sent is because of the change in shape caused by temperature, and the electrostatic for inhibiting the hygroscopicity of substrate P and generating with conveying Electrification etc..Tempering room ECV is configured at the setting face E of manufacturing works via antivibration cell S U1, SU2 being passively or actively.Antivibration Cell S U1, SU2 reduces the vibration from setting face E.Setting face E may be either ground of factory itself, can also be exclusively to set Face on setting base station (pedestal) to produce horizontal plane is placed on ground.Exposure device EX at least has substrate transport mechanism 12, light supply apparatus 14, light beam switching part BDU, description head 16 and control device 18.Control device 18 is control exposure device EX Each portion device.The control device 18 includes the record media etc. that computer and record have programming, executes volume by the computer Journey, and the control device 18 as this 1st embodiment functions.

Substrate transport mechanism 12 is a part for constituting the base board delivery device of device manufacturing system 10, will be from processing unit (plant) The substrate P of PR1 conveying is sent to processing unit (plant) PR2 after transporting in exposure device EX with specific speed with specific speed.Substrate The upstream side (-X direction side) of the conveyance direction of 12 self-reference substrate P of transport mechanism sequentially has marginal position controller EPC, driving Roller R1, tension adjustment roller RT1, rotating cylinder (cylinder rotating cylinder) DR, tension adjustment roller RT2, driving roller R2 and driving rolling Cylinder R3.By marginal position controller EPC, driving roller R1~R3, tension tune that substrate P is set up in substrate transport mechanism 12 Whole roller RT1, RT2 and rotating cylinder (cylinder rotating cylinder) DR, and it is specified in the transport path of the substrate P transported in exposure device EX.

Marginal position controller EPC adjusts width direction (Y-direction and the substrate P from the processing unit (plant) PR1 substrate P transported Short dimensional directions) on position.That is, marginal position controller EPC is in the base for the state conveying for being applied specific tensile The position of the end (edge) of the width direction of plate P is in the range relative to target position ± more than ten μm~tens μm or so It is mobile in width direction to make substrate P for the mode of (permissible range), and adjusts the position in the width direction of substrate P.Marginal position It is in the state roller set up for being applied specific tensile and the width direction of detection substrate P that controller EPC, which has substrate P, The edge sensor (not shown) (end test section) of the position of end (edge).Marginal position controller EPC is based on above-mentioned side It is mobile in Y-direction to make the above-mentioned roller of marginal position controller EPC for detection signal detected by edge sensor, and adjusts base Position in the width direction of plate P.Driving roller (clamping roller) R1 keeps the base transported from marginal position controller EPC on one side The both sides of plate P, rotate on one side, and substrate P is transported to rotating cylinder DR.Furthermore marginal position controller EPC can also be rolled up It is around in the long dimension direction of the substrate P of the rotating cylinder DR mode orthogonal always relative to the central axis AXo of rotating cylinder DR, it is appropriate to adjust Position in the width direction of whole substrate P, and in a manner of the slope error on the direction of travel for correcting substrate P, it is appropriate to adjust The rotary shaft of the above-mentioned roller for the treatment of selvedge edge positioner EPC and the depth of parallelism of Y-axis.

Rotating cylinder DR has the central axis for extending along Y-direction and extending along the direction intersected with the direction that gravity works AXo and with central axis AXo at a distance of the cylindric outer peripheral surface of radii fixus.Rotating cylinder DR follows its outer peripheral surface (circumference on one side Face) so that a part of substrate P is supported (holding) with bending to cylinder planar in long dimension direction, on one side with central axis AXo Centered on rotate and in +X direction (long dimension direction) transport substrate P.Rotating cylinder DR is to be projected to come from the support of its outer peripheral surface Describe the region (part) in the substrate P of the light beam LB (luminous point SP) of head 16.Rotating cylinder DR from for formed electronic component Face (side for being formed with photosurface), which is that the face (back side) of opposite side is collateral, holds (contiguity is kept) substrate P.In the side Y of rotating cylinder DR To two sides, be provided with the axis Sft that is supported by cricoid bearing in such a way that rotating cylinder DR is around central axis AXo rotation.Rotating cylinder DR is by assigning the rotary driving source (not shown) controlled come free control device 18 (for example, motor or speed reducer to axis Sft Structure etc.) torque, and around central axis AXo with fix rotation speed rotation.Furthermore for convenience, will comprising central axis AXo and The plane parallel with YZ plane is known as median plane Poc.

Driving roller (clamp roller) R2, R3 is to separate specific interval along the conveyance direction (+X direction) of substrate P and configure, Set slackness (nargin) is assigned to the substrate P after exposure.It drives roller R2, R3 in the same manner as driving roller R1, keeps on one side The both sides of substrate P, rotate on one side, and substrate P is transported to processing unit (plant) PR2.Tension adjustment roller RT1, RT2 is to-Z Direction is energized, assigns specific tensile in long dimension direction to the substrate P for being wound to rotating cylinder DR and being supported.As a result, Make to assign to the tension stability of the long dimension direction for the substrate P for hanging around rotating cylinder DR and turn in particular range.Control device 18 By controlling rotary driving source (for example, motor or deceleration mechanism etc.) (not shown), and make to drive roller R1~R3 rotation.Again Person drives the central axis AXo of the rotary shaft of roller R1~R3 and the rotary shaft of tension adjustment roller RT1, RT2 and rotating cylinder DR In parallel.

Light supply apparatus 14 generates and projects light beam (pulsed light beam, pulsed light, laser) LB of pulse type.Light beam LB in 370nm wavelength band below has the ultraviolet of peak wavelength, by luminous frequency (frequency of oscillation, specific frequency of light beam LB Rate) it is set as Fa.Light beam LB emitted by light supply apparatus 14 is incident to via light beam switching part BDU describes head 16.Light supply apparatus 14 according to control device 18 control, with luminous frequency Fa issue and outgoing beam LB.The light supply apparatus 14 can also be for by generating The other semiconductor lasers element of the pulsed light of infrared wavelength region, fiber amplifier and by the arteries and veins of amplified infrared wavelength region It washes off and is converted to the fiber amplifier that Wavelength changing element (harmonic wave generating element) of the pulsed light of ultraviolet wavelength region etc. is constituted Device laser light source.By constituting light supply apparatus 14 by this method, the hair that frequency of oscillation Fa is hundreds of MHz and 1 pulsed light can get It is the pulsed light of the ultraviolet light of the high brightness of several picoseconds or so between light time.Furthermore project what window projected from light supply apparatus 14 It is 1mm or so or 1mm thinner collimated light beam below that light beam LB, which becomes its beam diameter,.

About light beam switching part BDU, referring to Fig. 2 in being described in detail below, with multiple optical switching members Part, those multiple switching elements so that light beam LB timesharing be incident to constitute describe head 16 multiple scanning element Un (furthermore n= 1,2 ..., 6) in the mode of any one scanning element Un switch over.Multiple switching elements are among scanning element U1~U6 Sequentially switch the scanning element Un for light beam LB incidence.For example, light beam switching part BDU implement repeatedly with U1 → U2 → U3 → U4 → Movement of the sequence switching of U5 → U6 for the scanning element Un of light beam LB incidence.Furthermore it sometimes will be via light beam switching part BDU And be incident to scanning element Un, the light beam LB from light supply apparatus 14 be expressed as LBn.Moreover, indicating incident sometimes with LB1 To the light beam LBn of scanning element U1, and each light beam for being incident to scanning element U2~U6 is similarly indicated with LB2~LB6 LBn。

As shown in Fig. 2, being provided with the light beam LB1~LB6's incident to main scanning in each scanning element U1~U6 Polygonal mirror PM.In 1 embodiment of Yu Ben, each polygonal mirror PM of each scanning element Un is on one side with identical rotation speed essence The mode for the rotation angular phase that thickly rotation, one side are kept fixed each other obtains synchronously control.It as a result, can will be from each scanning Unit U1~U6 is projected to the timing (during the main scanning of luminous point SP) of the main scanning of respective light beam LB1~LB6 of substrate P with not The mode to overlap each other is set.Therefore, light beam switching part BDU can be supplied to scanning element Un's with switching light beam LB Any one is so that light beam LB is incident to any one for carrying out the scanning element Un of scanning of luminous point SP, i.e. timesharing ground dispensing light beam LB.Furthermore carry out luminous point SP main scanning scanning element Un (for the scanning element Un of light beam LBn incidence) be with U1 → U2 → U3 → U4 → U5 → U6 → U1 ... reiteration.About so by the light beam LB timesharing dispensing from light supply apparatus 14 at most A scanning element Un each composition is disclosed in No. 2015/166910 bulletin of International Publication No..

As shown in Fig. 2, describing head 16 as institute made of arranging multiple scanning element Un (U1~U6) of identical composition Call the description head of Multibeam.Describe a part for the substrate P that head 16 is supported in the outer peripheral surface (periphery) by rotating cylinder DR, leads to Cross multiple scanning element Un (U1~U6) and depicting pattern.Each scanning element Un (U1~U6) will come from light beam switching part on one side The light beam LBn of BDU is projected in substrate P (on the plane of illumination of substrate P), on one side in substrate P by light beam LBn optically focused (receive It is poly-).The light beam LBn (LB1~LB6) being projected in substrate P as a result, becomes luminous point SP.Also, by each scanning element Un (U1~ U6 the rotation of polygonal mirror PM), and the light beam LBn (LB1~LB6) being projected in substrate P is scanned in main scanning direction (Y-direction) Luminous point SP.By the scanning of luminous point SP, and the linear description line in the pattern for providing out to describe 1 row in substrate P (is swept Retouch line) SLn (furthermore n=1,2 ..., 6).Indicate the luminous point SP of light beam LBn in the scanning rail in substrate P that is, describing line SLn Mark.

Scanning element U1 is along line SL1 scanning point SP is described, and similarly, scanning element U2~U6 is along description line SL2~SL6 Scanning point SP.As shown in Fig. 2, the description line SLn (SL1~SL6) of multiple scanning element Un (U1~U6) is across median plane Poc (referring to Fig.1) it is configured in the circumferencial direction of rotating cylinder DR in 2 rows with Heterogeneous Permutation.Odd number describes line SL1, SL3, SL5 It is located relative on the plane of illumination of the substrate P of the upstream side (-X direction side) for the conveyance direction that median plane Poc is substrate P, and Specific interval, which is separated, along Y-direction is configured to 1 row.It is base that even number, which describes line SL2, SL4, SL6 to be located relative to median plane Poc, On the plane of illumination of the substrate P in the downstream side (+X direction side) of the conveyance direction of plate P, and specific interval configuration is separated along Y-direction At 1 row.

Therefore, multiple scanning element Un (U1~U6) also across median plane Poc in substrate P conveyance direction in 2 rows with mistake Position arranges and configures.That is, odd number scanning element U1, U3, U5 relative to median plane Poc substrate P conveyance direction it is upper Trip side (-X direction side) separates specific interval along Y-direction and is configured to 1 row.Even number scanning element U2, U4, U6 relative to Median plane Poc separates specific interval along Y-direction for the downstream side (+X direction side) of the conveyance direction of substrate P and is configured to 1 row.Surprise Relative to Poc pairs of median plane when number scanning element U1, U3, U5 and even number scanning element U2, U4, U6 is from XZ planar observation Claim and is arranged.

Odd number describes line SL1, SL3, SL5 and is separated with even number description line SL2, SL4, SL6, but in the side Y It is not separated from each other and connects in (width direction of substrate P, main scanning direction).Describe the width of line SL1~SL6 and substrate P Direction, i.e. the central axis AXo of rotating cylinder DR are substantially parallel.Furthermore it is so-called make describe line SLn in Y-direction connecting be to instigate description The end of line SLn in Y-direction each other in abutting or partly overlap.When the situation for making the end for describing line SLn overlap each other, example It can such as make it including for each length for describing line SLn comprising description starting point or description end point in Y-direction hundred Overlapping in/several following ranges.

In this way, the integral way of the width direction of exposure area is all covered with multiple scanning element Un (U1~U6), by Each scanning element Un (U1~U6) shares scanning area.Each scanning element Un (U1~U6) can be in the width side along substrate P as a result, To each depicting pattern for being split to form multiple regions (describing range).For example, if by the Y-direction of 1 scanning element Un Sweep length (length for describing line SLn) is set as 20~60mm or so, then is swept by configuring this 3 odd numbers in Y-direction It retouches unit U1, U3, U5 and this 3 even number scanning elements U2, U4, U6 and amounts to 6 scanning element Un, and by describable Y The width expansion in direction is to 120~360mm or so.Each length (length for describing range) for describing line SLn (SL1~SL6) is former It is set as on then identical.That is, the scanning distance principle of the luminous point SP along each and scanning light beam LBn of description line SL1~SL6 On be set as identical.

When the situation of 1 embodiment of Yu Ben, the light beam LB from light supply apparatus 14 is pulsed light, so in the main scanning phase Between be projected to describe line SLn on luminous point SP according to the frequency of oscillation Fa (for example, 400MHz) of light beam LB and become discreteness.Cause This, need to make the luminous point SP projected by 1 pulsed light of light beam LB the and luminous point SP that is projected by next 1 pulsed light in Main scanning direction overlapping.The amount of the overlapping is the scanning speed (speed of main scanning) of size φ according to luminous point SP, luminous point SP The frequency of oscillation Fa of Vs and light beam LB and set.Effective size (diameter) φ of luminous point SP is approximate in the intensity distribution of luminous point SP When the situation of Gaussian Profile, by the 1/e of the peak strength as luminous point SP²The width dimensions of the intensity of (or 1/2) are determined. In 1 embodiment of Yu Ben, in such a way that luminous point SP is relative to effective size (size) φ overlapping φ × 1/2 or so, and set The scan velocity V s (rotation speed of polygonal mirror PM) and frequency of oscillation Fa of luminous point SP.Therefore, the luminous point SP of pulse type is swept along master The projection interval for retouching direction becomes φ/2.Therefore, also more satisfactory on sub-scanning direction (with the orthogonal direction line SLn is described) For between 1 scanning and scanning next time along the luminous point SP for describing line SLn, substrate P is with effective size φ's of luminous point SP The mobile mode of substantially 1/2 distance is set.In turn, make to connect in the adjacent description line SLn of Y-direction in main scanning direction It is more satisfactory to be overlapped φ/2 to wait it when the situation connect.In 1 embodiment of Yu Ben, size (size) φ of luminous point SP is set It is set to 3 μm or so.

Each scanning element Un (U1~U6) at least XZ plane with each light beam LBn towards the central axis AXo of rotating cylinder DR The mode of traveling irradiates each light beam LBn to substrate P.The light advanced as a result, from each scanning element Un (U1~U6) towards substrate P The optical path (beam center axis) of beam LBn is in the normal parallel in XZ plane with the plane of illumination of substrate P.At this point, in XZ plane, if The direction of travel of the light beam LB projected from odd number scanning element U1, U3, U5 to substrate P (will be described into line SL1, SL3, SL5 The direction being connect with central axis AXo) with the angle of median plane Poc be set as-θ 1, then from even number scanning element U2, U4, U6 The direction of travel (direction of line SL2, SL4, SL6 and central axis AXo connection will be described) of the light beam LB projected to substrate P and center The angle of face Poc becomes+θ 1.That is, in XZ plane, light beam LB from odd number scanning element U1, U3, U5 to substrate P that projected from Direction of travel with the direction of travel of light beam from even number scanning element U2, U4, U6 to substrate P that projected from relative to median plane Poc and it is symmetrical.Also, each scanning element Un (U1~U6) is to expose to the light beam LBn for describing line SLn (SL1~SL6) in flat with YZ The mode vertical relative to the plane of illumination of substrate P in the parallel face in face, to substrate P illumination beam LBn.That is, in plane of illumination On luminous point SP main scanning direction on, it is scanned with the state of telecentricity to be projected to the light beam LBn (LB1~LB6) of substrate P.

In turn, using Fig. 2 to light beam switching part BDU and describe head 16 scanning element Un (U1~U6) composition simply It is illustrated.Light beam switching part BDU has multiple selections as switching element optical element AOMn (AOM1~AOM6), more A reflecting mirror M1~M12, multiple incidence mirror IMn (IM1~IM6) and absorber TR.Selection optical element AOMn (AOM1~ AOM6) there is permeability, and the acousto-optic varying element (AOM:Acousto-Optic driven by ultrasonic signals to light beam LB Modulator).Multiple selection is corresponding with optical element AOMn (AOM1~AOM6) and multiple incidence mirror IMn (IM1~IM6) It is arranged in multiple scanning element Un (U1~U6).For example, selection optical element AOM1 and incidence mirror IM1 corresponds to scanning list First U1 and be arranged, similarly, selection with optical element AOM2~AOM6 and incidence mirror IM2~IM6 corresponding to scanning element U2~ U6 and be arranged.

Light beam LB makes its optical path curve tortuous path shape from light supply apparatus 14 by reflecting mirror M1~M12, and is directed to To absorber TR.Hereinafter, with optical element AOMn (AOM1~AOM6) being that off-state (does not apply ultrasonic signals with selection State) situation be described in detail.Furthermore though the illustration is omitted in Fig. 2, in reflecting mirror M1 to the light of absorber TR It is provided with multiple lens in beam optical path, by light beam LB from collimated light beam pinching, or the light beam LB dissipated after pinching is reverted to Collimated light beam.Fig. 3 will be used in hereafter describing about its composition.

In Fig. 2, light beam LB and X-axis from light supply apparatus 14 advance in -X direction in parallel and are incident to reflecting mirror M1.Reflecting mirror M2 is incident to towards the light beam LB that -Y direction reflects in reflecting mirror M1.In the light beam that reflecting mirror M2 is reflected towards +X direction LB penetrates selection optical element AOM5 as the crow flies and reaches reflecting mirror M3.In the light beam LB that reflecting mirror M3 is reflected towards -Y direction It is incident to reflecting mirror M4.Towards the light beam LB that -X direction reflects penetrate selection optical element AOM6 as the crow flies in reflecting mirror M4 and Reach reflecting mirror M5.Reflecting mirror M6 is incident to towards the light beam LB that -Y direction reflects in reflecting mirror M5.In reflecting mirror M6 towards +X direction The light beam LB of reflection penetrates selection optical element AOM3 as the crow flies and reaches reflecting mirror M7.It is anti-towards -Y direction in reflecting mirror M7 The light beam LB penetrated is incident to reflecting mirror M8.Selection optics is penetrated as the crow flies towards the light beam LB that -X direction reflects in reflecting mirror M8 Element AOM4 and reach reflecting mirror M9.Reflecting mirror M10 is incident to towards the light beam LB that -Y direction reflects in reflecting mirror M9.In reflection Mirror M10 penetrates selection optical element AOM1 towards the light beam LB that +X direction reflects as the crow flies and reaches reflecting mirror M11.In reflecting mirror M11 is incident to reflecting mirror M12 towards the light beam LB that -Y direction reflects.It is straight in the light beam LB that reflecting mirror M12 is reflected towards -X direction Ground is led to absorber TR through selection optical element AOM2.Absorber TR is to absorb light beam LB to inhibit light beam LB To the ligh trap of external spill and leakage.

If each selection optical element AOMn is applied ultrasonic signals (high-frequency signal), generation makes incident light beam (0 light) LB is using 1 diffraction light made of diffraction angle diffraction corresponding with the frequency of high frequency as outgoing beam (light beam LBn). Therefore, it learns the light beam that element AOM1 is projected as 1 diffraction light and becomes LB1 from selecting to use up, similarly, use up from selection The light beam that element AOM2~AOM6 is projected as 1 diffraction light becomes LB2~LB6.In this way, each selection optical element AOMn (AOM1~AOM6) plays the function of being biased to the optical path of the light beam LB from light supply apparatus 14.But actual acousto-optic varying element 1 diffraction light generation efficiency be 0 light 80% or so, therefore by it is each selection with optical element AOMn (AOM1~ AOM6 the strength reduction of light beam LBn (LB1~LB6) that is each and being biased to) more original light beam LB.Also, in selection optics When any one of element AOMn (AOM1~AOM6) is on-state, the 0 light remaining 20% that straight line is advanced without diffraction is left The right side, but it is finally also absorbed body TR absorption.

It is multiple to select to use each of optical element AOMn (AOM1~AOM6) to be so that as 1 diffraction light after deviation Light beam LBn (LB1~LB6) is arranged relative to wanting incident light beam LB towards the mode that -Z direction is biased to.Member is used up from selection Each deviation of part AOMn (AOM1~AOM6) and the light beam LBn (LB1~LB6) projected is projected to and is set to and selection optics The incident mirror IMn (IM1~IM6) of each position at a distance of specific range of element AOMn (AOM1~AOM6).Each incidence mirror IMn (IM1~IM6) by the way that incident light beam LBn (LB1~LB6) is reflected to -Z direction, and by light beam LBn (LB1~LB6) It is directed to corresponding scanning element Un (U1~U6).Furthermore each of incident mirror IMn is to make that light beam LBn's is each to -Z direction It falls and penetrates, use mirror so also referred to as falling to penetrate.

Respectively select the member that can also be used composition, function, effect etc. mutually the same with optical element AOMn (AOM1~AOM6) Part.Multiple selections are with optical element AOMn (AOM1~AOM6) according to the driving signal (high-frequency signal) for carrying out self-control device 18 On/off, and turn on/off the generation for making diffraction light made of incident light beam LB diffraction.For example, selection optics member Part AOM5 carrys out the driving signal (high-frequency signal) of self-control device 18 in being not applied to when being off-state, makes incident to come From the light beam LB of light supply apparatus 14 not diffraction and penetrate.Therefore, it is incident to instead through selection with the light beam LB of optical element AOM5 Penetrate mirror M3.On the other hand, selection optical element AOM5 is in the driving signal (high-frequency signal) for being applied to self-control device 18 And when being on-state, make incident light beam LB diffraction and towards incident mirror IM5.That is, making to select by the driving signal Switched with optical element AOM6.By switching each selection optical element AOMn by this method, light beam LBn can be directed to any Scanning element Un, and the changeable scanning element Un for light beam LBn incidence.

Control device 18 shown in FIG. 1 is based on pattern data (describing the data) corresponding with the pattern to be described, and with 1 The on/off of the light beam LB for the pulse type that unit pulse control is projected from light supply apparatus 14.It is set about by light supply apparatus 14 When being set to the situation of fiber amplifier laser light source, (modulation) is turned on/off based on pattern data from light supply apparatus 14 The composition of the light beam LB of pulse type also has in No. 2015/166910 bulletin of Yu Shangshu International Publication No. disclosed.Herein, to figure Case data are simply illustrated.Pattern data (describing the data, design information) be for each scanning element Un and be arranged, and The pixel for the size that the pattern described using each scanning element Un is set according to the size according to luminous point SP is split, Each by multiple pixels is indicated with logical message (pixel data) corresponding with the pattern to be described.That is, the pattern data It is by column direction will be set as along the direction of the main scanning direction of luminous point SP (Y-direction) and will be along the sub-scanning direction (X of substrate P Direction) direction be set as the dot matrix diagram data that the mode of line direction is constituted by the logical message of multiple pixels of two-dimensional decomposition. The logical message of the pixel is 1 data of " 0 " or " 1 ".The logical message of " 0 " means the luminous point for making to expose to substrate P The intensity of SP is low level (non-description), and the logical message of " 1 " means to make to expose to that the intensity of the luminous point SP in substrate P is high Level (description).

The logical message of 1 row pixel of pattern data corresponds to 1 description line SLn (SL1~SL6).Therefore, 1 row pixel Quantity be the size of pixel on plane of illumination according to substrate P and describe the length of line SLn and determine.The ruler of 1 pixel Very little Pxy be set as with it is more than the size φ equal extent of luminous point SP or its, for example, in the effective size φ of luminous point SP be 3 μm When situation, the size Pxy of 1 pixel is set as 3 μm of square degree or more.According to the logical message of 1 row pixel, and modulation is along 1 Describe the intensity that line SLn (SL1~SL6) is projected to the luminous point SP of substrate P.In light supply apparatus 14 be fiber amplifier laser light source Situation when, as disclosed in No. 2015/166910 bulletin of International Publication, be incident to the infrared wavelength region of fiber amplifier Pulse type the pixel of pattern data sent according to self-control device 18 of kind light (luminous frequency Fa) logical message " 1 ", " 0 ", and it is switched to any one of the big and very fast pulsed light of peak strength and the low slow pulsed light of peak strength at high speed.

Furthermore selection is when the diameter for the light beam LB for being incident to selection optical element AOMn becomes smaller with optical element AOMn When diffraction efficiency and responsiveness get higher.Therefore, in making the light beam LB collimated light beam for being incident to selection optical element AOMn When situation, it may also set up as the diameter for the light beam LB for being incident to selection optical element AOMn is reduced with the state of collimated light beam Beam-shaping optical system.In 1 embodiment of Yu Ben, it is 1mm that the light beam LB projected from light supply apparatus 14, which is set as diameter, Collimated light beam below, therefore can be directly with this state transmission selection optical element AOMn.

In the composition of above Fig. 2, Fig. 3, light supply apparatus 14 and light beam switching part BDU are constituted to each of scanning element Un The light beam feed unit (beam generated device) of the light beam LBn of a supply description.If body more closely defining, relative to Fig. 2 In the light beam feed unit of scanning element U5 be by light supply apparatus 14, mirror M1, M2, selection optical element AOM5 and incidence Mirror IM5 is constituted, and the light beam feed unit relative to scanning element U6 is by light supply apparatus 14, mirror M1~M4, selection optics Element AOM5, AOM6 and incidence mirror IM6 are constituted, the light beam feed unit relative to scanning element U3 be by light supply apparatus 14, Mirror M1~M6, selection optical element AOM5, AOM6, AOM3 and incidence mirror IM3 are constituted, the light relative to scanning element U4 Beam feed unit is by light supply apparatus 14, mirror M1~M8, selection optical element AOM5, AOM6, AOM3, AOM4 and incident mirror IM4 is constituted, and the light beam feed unit relative to scanning element U1 is by light supply apparatus 14, mirror M1~M10, selection optics member Part AOM5, AOM6, AOM3, AOM4, AOM1 and incidence mirror IM1 are constituted, moreover, the light beam relative to scanning element U2 supplies Unit is by light supply apparatus 14, mirror M1~M12, selection optical element AOM5, AOM6, AOM3, AOM4, AOM1, AOM2 and to enter Mirror IM2 is penetrated to be constituted.

Secondly, being illustrated to the composition of scanning element (light-beam scanner) Un.Each scanning element Un (U1~U6) shape Scanning element U1 is simply illustrated as identical composition, therefore only.Scanning element U1 at least have reflecting mirror M20~ M24, polygonal mirror PM and f θ lens system FT.Furthermore it though not illustrated in Fig. 2, is seen from the direction of travel of light beam LB1 It examines, is configured with the 1st cylindrical lens CY1 in the front of polygonal mirror PM, the 2nd cylindrical lens is provided with after f θ lens system FT CY2.It will be described in detail in below with reference to Fig. 4 about the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2.

It is incident to reflecting mirror M20 to the light beam LB1 after -Z direction reflection by incident mirror IM1, is reflected in reflecting mirror M20 Light beam LB1 afterwards advances in -X direction and is incident to reflecting mirror M21.Light beam after being reflected by from reflecting mirror M21 to -Z direction LB1 is incident to reflecting mirror M22, and the light beam LB1 after reflecting mirror M22 reflection advances in +X direction and is incident to reflecting mirror M23.Instead It penetrates mirror M23 and reflects incident light beam LB1 to the reflecting surface RP of polygonal mirror PM.

Polygonal mirror PM is by incident light beam LB1 towards f θ lens system FT and to +X direction lateral reflection.Polygonal mirror PM is In the luminous point SP of scanning light beam LB1 on the plane of illumination of substrate P, and make incident light beam LB1 in parallel with X/Y plane One-dimensionally (reflection) is biased in face.Specifically, polygonal mirror (polygonal rotating mirror is movably biased to component) PM has along Z-direction The rotary shaft AXp of extension and the multiple reflecting surface RP being formed in around rotary shaft AXp are (by reflecting surface in 1 embodiment of Yu Ben The quantity Np of RP is set as polygonal rotating mirror 8).By making polygonal mirror PM centered on rotary shaft AXp along set direction of rotation Rotation, can be such that the angle of reflection of the light beam LB1 for the pulse type for exposing to reflecting surface RP continuously changes.It can be reflected as a result, by 1 Face RP is biased to light beam LB1, and exposes to being shone for substrate P along main scanning direction (width direction, the Y-direction of substrate P) scanning Penetrate the luminous point SP of the light beam LB1 on face.That is, can be by 1 reflecting surface RP, and along the luminous point of main scanning direction scanning light beam LB1 SP.Therefore, maximum in the quantity of the description line SL1 of scanning point SP on the plane of illumination of substrate P in 1 rotation of polygonal mirror PM It is 8 identical with the quantity of reflecting surface RP.Polygonal mirror PM is under the control of control device 18, with not shown rotation driving The speed of source (for example, Digital motor etc.) instruction accurately rotates.

F θ lens system (scanning system lens, scanning optical system) FT is the light after being reflected by polygonal mirror PM Beam LB1 is projected to the scanning lens of the telecentric system of reflecting mirror M24.Through f θ lens system FT light beam LB1 via reflecting mirror M24 becomes luminous point SP and is projected in substrate P.At this point, reflecting mirror M24 is in XZ plane, with light beam LB1 towards rotating cylinder DR Central axis AXo advance mode, by light beam LB1 to substrate P reflect.The incidence angle θ of light beam LB1 towards f θ lens system FT is Changed according to the rotation angle (θ/2) of polygonal mirror PM.F θ lens system FT via reflecting mirror M24, and by light beam LB1 be projected to Image height position on the plane of illumination of the directly proportional substrate P of its incidence angle θ.If focal length is set as fo, image height position is set as yo, Then f θ lens system FT is designed in a manner of meeting the relationship of yo=fo × θ (distortion aberration).Therefore, pass through the f θ lens System FT, can be in Y-direction accurately with constant-speed scanning light beam LB1.Furthermore the light beam LB1 that be incident to f θ lens system FT is logical The face face as the optical axis AXf comprising f θ lens system FT (parallel with the face XY) crossing polygonal mirror PM and being one-dimensionally biased to.

Fig. 3 is the specific composition figure indicated around selection optical element AOMn and incident mirror IMn.Furthermore selection is used up The composition learned around element AOMn and incident mirror IMn is identical each other, so herein only with selection optical element AOM1 and incidence Composition around mirror IM1 is illustrated for representative.

It is to be used up as shown in Figure 2 by the selection of leading portion to selection optical element AOM1 incident beam LB, light beam LB After learning element AOM4, reflecting mirror M9, M10, become the collimated light beam of such as diameter 1mm small diameter (the 1st diameter) below. During the driving signal for not being enter as high-frequency signal (ultrasonic signals) (driving signal disconnection), optical element is used in selection AOM1 does not make incident light beam LB diffraction and is directed through it.The light beam LB penetrated, which is penetrated, is set to it along optical axis AXa Collector lens G1 and collimation lens G2a in optical path, and it is incident to the selection optical element AOM2 of back segment.Pass through selection at this time Passed through with the central axis for the light beam LB for passing through collector lens G1 and collimation lens G2a after optical element AOM1 on optical axis AXa.It is poly- Optical lens G1 is so that the light beam LB (collimated light beam) through selection optical element AOM1 is being located at collector lens G1 and collimation The position of face p1 between lens G2a becomes the mode of beam waist for light beam LB optically focused.Collimation lens G2a makes in passing through optically focused The light beam LB dissipated after lens G1 optically focused becomes collimated light beam.Become the straight of the light beam LB of collimated light beam by collimation lens G2a Diameter becomes the 1st diameter.The rear side focus of collector lens G1 and the front side focus of collimation lens G2a are in one in set permissible range Cause, the front side focus of collector lens G1 and selection are with the Diffraction Point in optical element AOM1 in consistent in set permissible range.It should Collector lens G1 and collimation lens G2a constitutes relay lens system.

On the other hand, during the driving signal of Yu Zuowei high-frequency signal is applied to selection optical element AOM1, selection is used Optical element AOM1 generation makes light beam LB1 (diffraction light) made of incident light beam LB diffraction.With the frequency with high-frequency signal The light beam LB1 (collimated light beam) that the corresponding angular -Z direction of diffraction is biased to penetrates collector lens G1, and is incident to and is set to face p1 On incident mirror IM6.Collector lens G1 is optically focused (pinching) light beam LB1 as follows: with the light beam being biased to -Z direction The central axis AXb and light beam LB of LB1 by the parallel mode of optical axis AXa reflect light beam LB1, and make light beam LB1 in incidence On the reflecting surface of mirror IM1 or it nearby becomes beam waist.By relative to through selection with the light beam LB's of optical element AOM1 Optical path is by -Z direction side and the incident mirror IM6 that is arranged, light beam LB1 are able to reflect to -Z direction, and via collimation lens G2b and It is incident to scanning element U1.Collimation lens G2b makes to become saturating with collimation by collector lens G1 pinching/diverging light beam LB1 The collimated light beam of the light shaft coaxle of mirror G2b.It is straight to become the 1st by the diameter that collimation lens G2b becomes the light beam LB1 of collimated light beam Diameter.The rear side focus of collector lens G1 and the front side focus of collimation lens G2b are in consistent in set permissible range.The collector lens G1 and collimation lens G2b constitutes relay lens system.Furthermore collector lens G1, collimation lens G2a, G2b of Fig. 3 be also with The identical condition of Fig. 3 be configured at other selection optical elements AOM2~AOM6 shown in Fig. 2 it is each after optical path on.

And say, in scanning element U1 shown in Fig. 2, keeps the optical axis of f θ lens system FT parallel with the face XY and illustrate, therefore And with self-scanning unit U1 be projected to substrate P light beam LB1 central axis (chief ray) towards rotating cylinder DR central axis AXo Mode configures the plane of reflection of the reflecting mirror M24 of front end relative to the face XY with the angle tilt other than 45 degree.However, in f The optical axis of θ lens system FT relative to the face XY and inclined mode makes each whole tilted in the face XZ of scanning element U1~U6 Situation when, may be alternatively formed to the compositions that the optical axis such as f θ lens system FT is bent by reflecting mirror M24 in 90 degree.

Fig. 4 is the specific composition figure for indicating scanning element U1, and is oneself and scanning direction (the deviation side comprising light beam LB1 To) plane (plane parallel with X/Y plane) it is orthogonal plane (XZ plane) observation gained figure.Furthermore in Fig. 4, f θ is saturating The optical axis AXf of mirror system FT is parallel with the face XY and configures that the reflecting mirror M24 of front end is so that optical axis AXf is bent in 90 degree Mode configures.In in scanning element U1, the light beam LB1 along incoming position to the plane of illumination (substrate P) of light beam LB1 send optical path Diameter is provided with reflecting mirror M20, beam expander BE, the parallel-plate HVP of angle of inclination, aperture diaphragm PA, reflecting mirror M21, the 1st column Face lens CY1, spherical lens G10a, reflecting mirror M22, spherical lens G10b, reflecting mirror M23, polygonal mirror PM, f θ lens system FT, reflecting mirror M24 and the 2nd cylindrical lens CY2.

By incidence mirror IM1 shown in Fig. 3 to -Z direction reflection after collimated light beam light beam LB1 be incident to relative to X/Y plane tilts 45 degree of reflecting mirror M20.Reflecting mirror M20 is by incident light beam LB1 towards self-reflection mirror M20 to the side-X It is reflected to separate reflecting mirror M21 toward -X direction.Light beam LB1 after reflecting mirror M20 reflection penetrates beam expander BE and aperture light Late PA and be incident to reflecting mirror M21.Beam expander BE makes the enlarged-diameter of penetrated light beam LB1.Beam expander BE has optically focused saturating Mirror Be1 and make to become the collimation lens Be2 of collimated light beam in the light beam LB1 by dissipating after collector lens Be1 pinching.Pass through Beam expander BE is easy to expose to light beam LB6 the opening portion of aperture diaphragm PA.Furthermore it is saturating in collector lens Be1 and collimation Between mirror Be2, for the parallel-plate HVP configured with quartz as offset optical component, parallel-plate HVP can pass through drive (not shown) The tilt angle of the change relative to light beam LBn in the face parallel with the face XZ such as dynamic motor.By changing inclining for parallel-plate HVP Oblique angle, can make in the scanning track of the luminous point SP scanned in substrate P describe line SLn in sub-scanning direction with pettiness amount (for example, Several times~more than ten times or so of the effective diameter φ of luminous point SP) offset.It will be in hereafter being described in detail about the function.

Reflecting mirror M21 is to tilt 45 degree relative to YZ plane and configure, by incident light beam LB1 towards self-reflection mirror M21 is reflected to the separate reflecting mirror M22 of -Z direction toward -Z direction.Light beam after being reflected by from reflecting mirror M21 to -Z direction After LB1 is through the 1st cylindrical lens CY1 (the 1st optical component) and spherical lens G10a, reflecting mirror M22 is reached.Reflecting mirror M22 is 45 degree are tilted relative to X/Y plane and is configured, and incident light beam LB1 is reflected towards reflecting mirror M23 toward +X direction.In anti- Light beam LB1 after penetrating mirror M22 reflection is incident to reflecting mirror M23 via spherical lens G10b.Reflecting mirror M23 makes incident light Beam LB1 is towards polygonal mirror (polygonal rotating mirror is movably biased to component) PM, in the face inner bending parallel with the face XY.The 1 of polygonal mirror PM Incident light beam LB1 direction is had the past side+X f θ lens system FT of the optical axis AXf extended along the x axis by a reflecting surface RP To reflection.Spherical lens G10a and spherical lens G10b constitutes lens system (the 3rd optical component) G10.Spherical lens G10a, G10b has iso refracting power.

1st cylindrical lens CY1 of the plano-convex being made of simple lens is that have the saturating of refracting power (focusing force) in a direction Mirror, the refracting power with anisotropy.Fig. 5 be the optical path of the light beam LB of aperture diaphragm PA to substrate P is unfolded on the face XY, and from The skeleton diagram that the plane parallel with the plane in deviation direction (main scanning direction) comprising light beam LB is observed.As shown in figure 5, 1st cylindrical lens CY1 is (vertical with the rotary shaft AXp of polygonal mirror PM in the deviation direction of the light beam LB1 based on polygonal mirror PM Main scanning direction, direction of rotation in face) on so that incident light beam LB1 positioned at polygonal mirror PM front face p2 at For the mode of beam waist, one-dimensionally optically focused (pinching) light beam LB1.By the spot position in the front of polygonal mirror PM (face p2's Position) it is set as the 1st position.1st position is the position in the front of lens system G10 (spherical lens G10a, 10b).Also, the 1 cylindrical lens CY1 is in the direction (subscan orthogonal with deviation direction (main scanning direction) of light beam LB1 based on polygonal mirror PM Direction) on, do not make incident light beam LB1 optically focused and makes it directly in the form of collimated light beam through (referring to Fig. 4).In this way, 1st cylindrical lens CY1 has the bus extended along the direction (sub-scanning direction) parallel with X-direction, so that saturating through the 1st cylinder The light beam LB1 of mirror CY1 is in being biased on the orthogonal direction (sub-scanning direction) in direction not optically focused with polygonal mirror PM.

In the deviation direction of the light beam LB1 based on polygonal mirror PM, (master sweeps lens system G10 (spherical lens G10a, G10b) Retouch direction, direction of rotation) on, make to become substantially parallel light beam in the light beam LB1 by dissipating after the 1st cylindrical lens CY1 optically focused (referring to Fig. 5).Also, lens system G10 (spherical lens G10a, G10b) in the deviation direction of the light beam LB1 with polygonal mirror PM just On the direction (sub-scanning direction) of friendship, make the light beam LB1 through the collimated light beam of the 1st cylindrical lens CY1 in the anti-of polygonal mirror PM Penetrate optically focused (pinching) on the RP of face (referring to Fig. 4).To be projected to as a result, the light beam LB1 of polygonal mirror PM in pinching on reflecting surface RP at The strip (long ellipticity) extended in the face parallel with X/Y plane.In this way, passing through the 1st cylindrical lens CY1 and lens system G10 and following 2nd cylindrical lens CY2, even if having reflecting surface RP relative to Z-direction inclined situation (reflecting surface RP relative to The inclination of the normal of X/Y plane), it also can inhibit its influence.For example, can inhibit the light beam on the plane of illumination for exposing to substrate P The irradiation position of LB1 (describing line SL1) is due to each reflecting surface RP of polygonal mirror PM respective small slope error (face inclination) in X Direction offset, that is, the face tilt correction of each reflecting surface RP can be carried out.Furthermore the light beam LB1 after reflecting surface RP reflection is being based on On the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 of polygonal mirror PM, directly entered in the form of substantially parallel light beam Be incident upon f θ lens system FT, be biased on the orthogonal direction (sub-scanning direction) in direction in the light beam LB1 of polygonal mirror PM, with F θ lens system FT is incident in the state of the diverging of predetermined value aperture (NA).

Furthermore the refraction on the deviation direction (main scanning direction of luminous point SP) with polygonal mirror PM of the 1st cylindrical lens CY1 The corresponding rear side focus of power and the front side focus of lens system G10 be set as in set permissible range on the p2 of face it is consistent.Thoroughly The rear side focus of mirror system G10 and the front side focus of f θ lens system FT be set as in set permissible range polygonal mirror PM's It is consistent to be biased to position (on reflecting surface RP).

F θ lens system FT on the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 based on polygonal mirror PM, As shown in figure 5, making the light beam LB1 of the substantially parallel light beam after reflecting surface RP reflects in pinching in substrate P (optically focused).In turn, f θ lens system FT as shown in figure 4, be biased on the orthogonal direction (sub-scanning direction) in direction in the light beam LB1 of polygonal mirror PM, So that the light beam LB1 dissipated after reflecting surface RP reflects is become substantially parallel light beam, and it is projected to the 2nd cylindrical lens CY2.

The 2nd cylindrical lens (the 2nd optical component) CY2 for the plano-convex being made of simple lens be in Y-direction (main scanning side To) parallel direction holds the saturating of the refracting power of the anisotropy with focusing force with bus and in a direction (sub-scanning direction) Mirror.2nd cylindrical lens CY2 makes on the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 based on polygonal mirror PM Incident light beam LB1 be directed through as it is.Therefore, as shown in figure 5, through the 2nd cylindrical lens CY2 light beam LB1 in base In on the deviation direction (main scanning direction, direction of rotation) of the light beam LB1 of polygonal mirror PM, pass through the refracting power of f θ lens system FT In in substrate P by become beam waist in a manner of optically focused.On the other hand, the 2nd cylindrical lens CY2 with the light beam based on polygonal mirror PM On the orthogonal direction (sub-scanning direction) in the deviation direction (main scanning direction) of LB1, as shown in figure 4, making incident substantially flat The light beam LB1 of row light beam in substrate P by become beam waist in a manner of optically focused (pinching).Therefore, the light beam of substrate P is projected to LB1 is in becoming generally circular luminous point SP (for example, diameter be 3 μm) in substrate P.As described above, the 1st cylindrical lens CY1 and the 2nd Cylindrical lens CY2 is and the side orthogonal with bus by such a way that mutually orthogonal directions have focusing force (refracting power) Formula configuration.The 1st cylindrical lens CY1 makes light beam LBn on main scanning direction as a result, with the face p2 in the front of lens system G10 One-dimensionally after pinching, in make on the reflecting surface RP of polygonal mirror PM light beam LBn in one-dimensionally the mode of pinching is sent out on sub-scanning direction Wave function, the 2nd cylindrical lens CY2 so that light beam LBn after f θ lens system FT in one-dimensionally pinching on sub-scanning direction Mode functions.

In this way, being provided with the 1st cylindrical lens CY1 and the 2nd column being made of simple lens in the orthogonal mode of bus Face lens CY2, so the deviation direction that by lens system G10, can correct well the light beam LBn based on polygonal mirror PM is (main Scanning direction) and the light beam LBn in the sub-scanning direction orthogonal with main scanning direction this both direction spherical aberration.Therefore, It can inhibit the deterioration of the imaging performance in substrate P.Also, by setting the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2, it can also Inhibition is carried out similarly because retouching caused by the respective small slope error (face inclination) of the reflecting surface RP of polygonal mirror PM with existing Offset of the line drawing SLn to X-direction (sub-scanning direction), i.e. progress face tilt correction.

Furthermore the spot position (best focus position) of the luminous point SP for the light beam LBn that be projected in substrate P is in master Scanning direction (be biased to direction) and the sub-scanning direction orthogonal with main scanning direction in mode consistent in set permissible range into Row optical design.Also, the numerical aperture NA on the main scanning direction for the light beam LBn (luminous point SP) that be projected in substrate P_yAnd Numerical aperture NA on the sub-scanning direction orthogonal with main scanning direction_xIt is in (consistent) side equal in set permissible range Formula is designed.Furthermore in 1 embodiment of Yu Ben, numerical aperture NA_x≒ numerical aperture NA_y, so sometimes also only with NA table Show the numerical aperture of the light beam LBn of substrate P to be projected to.The spherical aberration of light beam LBn is indicated with following relative deviation, The relative deviation is the central axis (key light relative to light beam LBn when making the optimum focusing face pinching in light beam LBn direction design Line) inclination angle (to the incident angle in optimum focusing face) β different light each optically focused position focus direction it is opposite Deviation.The light of central axis (chief ray) inclined angle beta vertical with optimum focusing face relative to light beam LBn is by sin β And the numerical aperture Na β calculated is indicated.The maximum numerical aperture NA of light beam LBn is wavelength X according to light beam LBn, luminous point SP Effective diameter φ and f θ lens system FT focal length and substantially determine.

Secondly, respective to the 1st cylindrical lens CY1, the 2nd cylindrical lens CY2, lens system G10 and f θ lens system FT The determining method of the expansion multiplying power of focal length, the aperture diaphragm diameter of aperture diaphragm PA and beam expander BE is illustrated.Furthermore With f_C1The focal length of the 1st cylindrical lens CY1 is indicated, with f_C2The focal length of the 2nd cylindrical lens CY2 is indicated, with f_GIndicate lens system G10 Focal length, the focal length of f θ lens system FT is indicated with f θ.Also, the aperture diaphragm diameter of aperture diaphragm PA is set as φ_a。

Focal length f_C1、f_C2、f_G, f θ have it is following shown in formula (1) relationship.Based on the formula (1), the 1st cylindrical lens is determined CY1, the 2nd cylindrical lens CY2, the respective focal length of lens system G10 and f θ lens system FT, thus can make substrate P to be projected to Light beam LBn numerical aperture NA_xWith numerical aperture NA_yIt is equal.

f_G ²/f_C1=f θ²/f_C2…(1)

Also, aperture diaphragm diameter phi_aWith numerical aperture NA (=NA_x≒NA_y) relationship with formula (2) shown in following.

φ_a=2 × NA (f θ × f_C1/f_G)=2 × NA × (f_G×f_C2/fθ)…(2)

By determining aperture diaphragm diameter φ based on the formula (2)_a, can get desired numerical aperture.Also, beam expander BE Expansion multiplying power it is bigger, become more by the aperture diaphragm PA light quantity blocked, therefore light quantity loss becomes bigger.On the other hand, The expansion multiplying power of beam expander BE is smaller, becomes smaller in the effective numerical aperture of image planes (in substrate P), therefore resolution (light The fine degree of the diameter phi of point SP) it reduces.Therefore, more satisfactory is to set optimal expansion in view of light quantity and the balance of resolution The expansion multiplying power of beam device BE.

Also, in the 1st cylindrical lens CY1, the 2nd cylindrical lens CY2 and f θ lens system FT etc. each optical specification substantially When fixed situation, with the spherical aberration S on the main scanning direction (being biased to direction) of light beam LBn₁And the main scanning with light beam LBn Spherical aberration S on the orthogonal sub-scanning direction in direction₂At least meet it is following shown in any of formula (3)~(6) conditions Mode sets the optical specification of lens system G10 (spherical lens G10a, 10b).Also, the optics in only f θ lens system FT is advised When the substantially fixed situation of lattice, in a manner of meeting any of formula (3)~(6) condition, (spherical surface is saturating by setting lens system G10 Mirror G10a, 10b) optical specification and the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 each optical specification.

|S₁- S₂| < S_C1×fθ²/f_G ²- S_C2…(3)

S₁< S_C1×fθ²/f_G ², and S₂< S_C2…(4)

|S₁- S₂| < λ/NA_y ², and | S₁- S₂| < λ/NA_x ²…(5)

S₁< λ/NA_y ², and S₂< λ/NA_x ²…(6)

Wherein, | S₁- S₂| indicate spherical aberration S₁With spherical aberration S₂Absolute value of the difference, S_C1It indicates saturating by the 1st cylinder Spherical aberration caused by mirror CY1 monomer, S_C2Indicate the spherical aberration as caused by the 2nd cylindrical lens CY2 monomer, λ indicates light The wavelength of beam LBn.Furthermore spherical aberration S₁With spherical aberration S₂Absolute value of the difference | S₁- S₂| if | S₂- S₁| it is also identical. Also, being illustrated for enumerating scanning element U1, optics is similarly carried out certainly for other scanning elements U2~U6 and is set Meter.

Herein, in existing way, that is, make the extending direction of each bus of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 When the situation set in parallel with main scanning direction (Y-direction), focal length f_C1、f_C2, f θ have it is following shown in formula (7) Relationship.When the situation, only the 1st cylindrical lens CY1 parallel with Y-direction by the extending direction of bus, will be projected to more The light beam LBn of the reflecting surface RP of face mirror PM on reflecting surface RP just by pinching at along direction (the main scanning side parallel with X/Y plane To) extend strip (long ellipticity), there is no need to lens system G10.

f_C1×f_C2=f θ²…(7)

Also, the diameter phi of the circular open of aperture diaphragm PA_aWith numerical aperture NA have it is following shown in formula (8) pass System.

φ_a=2 × NA × θ=2 f × NA × (f_C1×f_C2/fθ)…(8)

[embodiment]

The face tilt correction of the face tilt correction of this 1st embodiment and existing way is compared.Because needing to the greatest extent may be used The two can be compared under the same terms, thus numerical aperture NA and to be incident to scanning element Un light beam LBn specification It is identical each other.Light beam LBn be the monochromatic light that wavelength is 354.7nm and in optical axis center (beam center line) at a distance of 0.25mm Position intensity become 1/e²Non-polarized Gaussian beam.Numerical aperture NA divides to include main scanning direction (being biased to direction) Numerical aperture NA in plane (YZ plane)_yAnd plane (the XZ comprising the direction (sub-scanning direction) orthogonal with main scanning direction Plane) in numerical aperture NA_xAnd it handles, and NA_y=NA_x=0.06.Also, for f θ lens system FT and the 2nd cylindrical lens CY2, also for this 1st embodiment in existing way using identical person.By the focal length f θ of f θ lens system FT be set as f θ= 100mm, by the focal length f of the 2nd cylindrical lens CY2 of the plano-convex being made of simple lens_C2It is set as f_C2=14.5mm.Furthermore being can Only assess the influence of the spherical aberration as caused by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2, f θ lens system FT setting For the lens with the ideal f- θ characteristic that will not generate aberration.Firstly, by comparing example 1 to the scanning element of existing way The specific design example of the optical system of the face tilt correction of Un is illustrated, and then passes through 1 pair of the 1st embodiment of sheet of embodiment The specific design example of optical system of face tilt correction of scanning element Un be illustrated.Furthermore 1 embodiment of Yu Ben In existing way, said to the common identical symbol of component mark of common component or function is constituted each other It is bright.Also, for the sake of simplicity, each of reflecting mirror M21, M22, M23 is omitted in design example (lens data).

(comparative example 1)

In comparative example 1, the bus of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 is set in main scanning direction (Y-direction), and not set lens system G10.Fig. 6 indicates the optics of the beam expander BE to the 2nd cylindrical lens CY2 in comparative example 1 Design the lens data of example.Fig. 7 is in parallel with the plane in deviation direction (scanning direction of luminous point SP) comprising light beam LBn The skeleton diagram of the state of the light beam LBn of the beam expander BE to substrate (image planes) P in comparative example 1 is indicated in face.Fig. 8 is oneself and light beam The orthogonal plane (face comprising sub-scanning direction) in the deviation direction (main scanning direction) of LBn observes beam expander BE shown in Fig. 7 To the skeleton diagram of the state of the light beam LBn of the reflecting surface RP of polygonal mirror PM.Fig. 9 is from the deviation direction (main scanning with light beam LBn Direction) orthogonal planar observation polygonal mirror PM shown in Fig. 7 light beam LBn of the reflecting surface RP to substrate (image planes) P state Skeleton diagram.Furthermore in Fig. 6, after polygonal mirror PM reflection, the sign symbol of face interval and radius of curvature is exchanged and is indicated.Fig. 7 ~Fig. 9 is indicated to follow each optics of beam expander BE~substrate P in the diminution proportional arrangement comparative example 1 of the numerical example of Fig. 6 The figure of the case where component (the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 etc.).

The light beam LBn (effective beam diameter φ is set as 0.5mm) of the collimated light beam of scanning element Un is incident in turning It is changed to using after the widened collimated light beam of beam expander BE being made of 5 spherical lens LG1~LG5, passes through aperture diaphragm PA And it is shaped as the light beam of the circular section of special diameter.The aperture diaphragm diameter phi of aperture diaphragm PA_aIt is to be based on above-mentioned formula (8), And it is set as 12mm.Also, becoming the 1/e on axis with intensity²Position become aperture diaphragm diameter phi_aThe side radius, that is, 6mm The expansion multiplying power of beam expander BE is set as 24 times by formula.At this point, the ratio of light quantity loss caused by aperture diaphragm PA becomes about 13.5%.

Be configured at the rear of beam expander BE and the 1st cylindrical lens CY1 of plano-convex that is made of simple lens with based on more On the orthogonal direction in the deviation direction (main scanning direction) of the light beam LBn of face mirror PM, incident light beam LBn is concentrated on multi-panel (referring to Fig. 8) on the reflecting surface RP of mirror PM.The focal length f of 1st cylindrical lens CY1_C1It is to be based on above-mentioned formula (7), and be set as f_C1= 693.1mm.The reflecting surface RP of polygonal mirror PM is located at the rear side focus of the 1st cylindrical lens CY1.Furthermore based on polygonal mirror PM's On the deviation direction (main scanning direction) of light beam LBn, through the light beam LBn keeping parallelism light state (ginseng of the 1st cylindrical lens CY1 According to Fig. 7).Therefore, the light beam LBn that be projected to polygonal mirror PM is biased to the strip that direction extends at edge in pinching on reflecting surface RP (long ellipticity).

Light beam LBn after the reflecting surface RP reflection of polygonal mirror PM with angle corresponding with the rotation angle of polygonal mirror PM, It is incident to the f θ lens system FT that focal length f θ is 100mm.The reflecting surface RP of polygonal mirror PM be to reach f θ lens system FT before The mode of the position of side focus configures.Therefore, f θ lens system FT is (main in the deviation direction of the light beam LBn based on polygonal mirror PM Scanning direction) on, the light beam LBn after the reflecting surface RP of polygonal mirror PM reflection is concentrated on to the quilt of substrate P with the state of telecentricity (referring to Fig. 7) on shadow surface (image planes).On the other hand, f θ lens system FT is in the deviation with the light beam LBn based on polygonal mirror PM On the orthogonal sub-scanning direction in direction (main scanning direction), make the light beam LBn for reflecting and dissipating in the reflecting surface RP of polygonal mirror PM As directional light (referring to Fig. 9).

Through f θ lens system FT light beam LBn by being configured at rear and the focal length f of f θ lens system FT_C2For 14.5mm The 2nd cylindrical lens CY2, the plane of illumination of substrate P is also concentrated on the sub-scanning direction of the light beam LBn based on polygonal mirror PM (referring to Fig. 9) in (image planes).The position of 2nd cylindrical lens CY2 is with the main scanning direction of the light beam LBn based on polygonal mirror PM On spot position and sub-scanning direction on spot position in consistent mode is true in set permissible range in focus direction It is fixed, and it is set as plane of illumination (image planes) of the spot position as substrate P.

In this way, in the optical path brought up via the 1st cylindrical lens CY1, f θ lens system FT and the 2nd cylindrical lens CY2, And light beam LBn can be generated into the spot position such as light beam LBn in main scanning side when optically focused in substrate P is the situation of luminous point SP To the aberration to differ widely with sub-scanning direction.Its cause is generated spherical aberration when light beam LBn pinching is luminous point.Figure 10, Figure 11 is the figure being illustrated to the state of the spherical aberration of the light beam LBn towards substrate P, and Figure 10 indicates the master of light beam LBn The state of spherical aberration on scanning direction, Figure 11 indicate the state of the spherical aberration on the sub-scanning direction of light beam LBn.

As shown in Figure 10, light beam LBn is incident to f θ in becoming the collimated light beam with certain rugosity on main scanning direction It is (poly- to be mainly concentrated on the set Z location on chief ray (beam center line) Lpr by f θ lens system FT by lens system FT Burnt position).At this point, the 2nd cylindrical lens CY2 is purely by way of parallel-plate and plays a role.The light beam projected from f θ lens system FT Maximum numerical aperture NA on the main scanning direction of LBn_yIt is based on the light LLa towards focal point relative to chief ray Lpr Inclination angle (incidence angle) β a press NA_y=sin β a and determine.It is less than the incident angle β a of light LLa in light beam LBn comprising incidence angle The light LLc of incident angle β b of light LLb (incidence angle is set as β b), incidence angle less than light LLb (incidence angle is set as β C) etc..Herein, if the focal point of the light LLa of incident angle β a is the focal position Zma of Z-direction, the light of incident angle β b The focal position Zmb of the focal point of LLb, the focal point of the light LLc of incident angle β c focal position Zmc both with respect to focusing position Zma is set to deviate in Z-direction.Such offset is spherical aberration.

Also, as shown in figure 11, light beam LBn is incident to f θ lens system FT in becoming divergent beams on sub-scanning direction, After being converted to collimated light beam by f θ lens system FT, by the refraction action of the 2nd cylindrical lens CY2, and it is concentrated on key light Set Z location (focal position) on line (beam center line) Lpr.The pair of the light beam LBn projected from the 2nd cylindrical lens CY2 is swept Retouch the maximum numerical aperture NA on direction_xIt is set as and the maximum numerical aperture NA on main scanning direction_yUnanimously.Therefore, in On sub-scanning direction, by NA_x(the focal position Zsa of incident angle β a) optically focused, incidence angle are small by=sin β a and the light LLa determined It is less than the light of incident angle β b in the focal position Zsb of light LLb (incidence angle is set as β b) optically focused of incident angle β a, incidence angle The focal position Zsc's of LLc (incidence angle is set as β c) optically focused is each also inclined in Z-direction (focus direction) due to spherical aberration It moves.Furthermore it in Figure 10, Tu11Zhong, is said by such a way that the optical path of f θ lens system FT to substrate P generates spherical aberration It is bright, reach the light that generated actual spherical aberration is projected by the light supply apparatus 14 for being provided from Fig. 2 in the light beam LBn of substrate P The influence for the various optical components (lens, AOM, reflecting mirror) that beam passes through.

Figure 12 and Figure 13 is the lens data based on comparative example 1 shown in fig. 6, by the maximum numerical aperture of light beam LBn NA (=NA_y≒NA_x) be set as the 0.06 spherical aberration characteristic for simulate resulting light beam LBn, horizontal axis indicate by design most Good focal position is set as the focal position (μm) of zero point, and longitudinal axis expression will be corresponding with the maximum numerical aperture NA of light beam LBn The maximum incident angle β a (NAa=sin β a) of light LLa is standardized as the incident angle β of 1.0 (β max).Therefore, in Figure 12, Figure 13 In, such as incident angle β is the angle of 0.5 half for meaning maximum incident angle β a.In turn, the characteristic shown in solid in Figure 12 It (A) is the spherical aberration characteristic being projected on the main scanning direction of the light beam LBn of substrate P, characteristic (B) shown in dotted line is projection Spherical aberration characteristic to the sub-scanning direction of the light beam LBn of substrate P.Characteristic shown in Figure 13 (C) is indicated in Figure 12 Characteristic (A) and characteristic (B) difference ((B)-(A)) caused by spherical aberration characteristic, be projected to according to as luminous point SP The incident angle β of light beam LBn in substrate P, best focus position offset, and generate tens μm of spherical aberration.

Herein, the characteristic in Figure 12 (A) is the spherical aberration as caused by beam expander BE and f θ lens system FT, Tu12Zhong Characteristic (B) be by the synthesis system of beam expander BE, the 1st cylindrical lens CY1, f θ lens system FT and the 2nd cylindrical lens CY2 Generated spherical aberration.Therefore, the characteristic (C) of the difference of characteristic (A) and characteristic (B) mainly with by the 1st cylindrical lens CY1 and Spherical aberration characteristic caused by 2nd cylindrical lens CY2 is corresponding.

(embodiment 1)

In embodiment 1, as described above, the extending direction of the bus of the 1st cylindrical lens CY1 is set as sub-scanning direction The extending direction of the bus of 2nd cylindrical lens CY2 is set as main scanning direction (Y-direction) by (X-direction), and saturating in the 1st cylinder Lens system G10 is provided between mirror CY1 and polygonal mirror PM.Figure 14 indicates the beam expander BE in embodiment 1 to the 2nd cylindrical lens The lens data of the optical design of CY2.Also, Figure 15 be in deviation direction (the scanning side of luminous point SP comprising light beam LBn To) the parallel face of plane in observe light beam LBn of the beam expander BE to substrate (image planes) P in embodiment 1 state outline Figure.Figure 16 is in sight (in the face comprising sub-scanning direction) in the face orthogonal with deviation direction (main scanning direction) of light beam LBn Examine the skeleton diagram of the state of the light beam LBn of the reflecting surface RP of beam expander BE shown in figure 15 to polygonal mirror PM.Figure 17 is Yu Yuguang Observation multi-panel shown in figure 15 (in the face comprising sub-scanning direction) in the orthogonal face in the deviation direction (main scanning direction) of beam LBn The skeleton diagram of the light beam LBn of the reflecting surface RP of mirror PM to substrate (image planes) P.It, will after polygonal mirror PM reflection furthermore in Figure 14 The sign symbol of face interval and radius of curvature is exchanged and is indicated.Figure 15~Figure 17 is indicated to follow the practical contracting of the numerical example of Figure 14 Small scale configures beam expander BE~substrate P each optical component (the 1st cylindrical lens CY1 and the 2nd cylindrical lens in embodiment 1 CY2 etc.) the case where.

In embodiment 1, with the distance (optical path length) of the 1st cylindrical lens CY1 to image planes (plane of illumination of substrate P) with Mode of the comparative example 1 compared to short 300mm or so, is based on above-mentioned formula (1), by the focal length f of lens system G10_GIt is set as f_G= 201.2mm, by the focal length f of the 1st cylindrical lens CY1_C1It is set as f_C1=58mm.As a result, in the present embodiment 1, with comparative example 1 Design example compare, it can be achieved that section space-efficient optical system.In turn, the shell of scanning element Un can also be reduced, therefore can also Seek lightweight.

Light beam LBn (effective diameter 0.5mm) Yu Liyong for being incident to the collimated light beam of scanning element Un is saturating by 4 spherical surfaces After the beam expander BE that mirror LGa~LGd is constituted expands, set beam diameter is shaped as by aperture diaphragm PA.Aperture diaphragm The aperture diaphragm diameter phi of PA_aIt is to be based on above-mentioned formula (2), and be set as 3.5mm.Light beam after being expanded by beam expander BE In, with center at a distance of aperture diaphragm diameter phi_aThe position half, that is, 1.75mm, intensity become axis on 1/e²Mode, The expansion multiplying power of beam expander BE is set as 7 times.In this way, the expansion multiplying power of beam expander BE becomes smaller, therefore compared with comparative example 1 It is easy to carry out the design of beam expander BE, the spherical aberration generated by beam expander BE can also be reduced.

It is configured at the rear of beam expander BE, is made of simple lens and focal length f_C1For the 1st cylindrical lens of the plano-convex of 58mm CY1 is concentrated on the 1st on the deviation direction (main scanning direction) of the light beam LBn based on polygonal mirror PM, by incident light beam LBn The face p2 (the 1st position) (referring to Fig.1 5) of the rear side focus of cylindrical lens CY1.The face position p2 be located at the 1st cylindrical lens CY1 with It is configured between the lens system G10 of the rear side of the 1st cylindrical lens CY1.Furthermore with the light beam LBn based on polygonal mirror PM The orthogonal sub-scanning direction in deviation direction (main scanning direction) on, through the light beam LBn keeping parallelism of the 1st cylindrical lens CY1 Light state (referring to Fig.1 6).

Lens system G10 (the focal length f being made of 2 spherical lenses G10a, G10b_G=201.2mm) it is with lens system Consistent side in position (face p2) Yu Jiding permissible range of the front side focus of G10 of uniting and the rear side focus of the 1st cylindrical lens CY1 Formula configuration.Therefore, through the light beam LBn of lens system G10 in the state on the main scanning direction of light beam LBn being collimated light beam (referring to Fig.1 5), in the reflecting surface RP for being concentrated on polygonal mirror PM on the sub-scanning direction orthogonal with the main scanning direction of light beam LBn Upper (referring to Fig.1 6).The reflecting surface RP of polygonal mirror PM is set in a manner of the position for reaching the rear side focus of lens system G10. Therefore, the light beam LBn that be projected to polygonal mirror PM is biased to direction (main scanning direction) extension at edge in pinching on reflecting surface RP Strip (long ellipticity).

Light beam LBn after the reflecting surface RP reflection of polygonal mirror PM is entered with angle corresponding with the rotation angle of polygonal mirror PM It is incident upon the f θ lens system FT of focal length f θ=100mm.F θ lens system FT is to reach f θ lens with the reflecting surface RP of polygonal mirror PM The mode of the position of the front side focus of system FT configures.Therefore, f θ lens system FT is in the inclined of the light beam LBn based on polygonal mirror PM To on direction (main scanning direction), by the light beam LBn after the reflecting surface RP of polygonal mirror PM reflection with the state (light beam of telecentricity The optical axis AXf of chief ray Lpr and f θ the lens system FT of LBn parallel always state) be concentrated on substrate P plane of illumination (as Face) on (referring to Fig.1 5).On the other hand, on the sub-scanning direction orthogonal with main scanning direction, f θ lens system FT will be in more The light beam LBn that the reflecting surface RP of face mirror PM reflects and becomes divergent beams is converted to collimated light beam (referring to Fig.1 7).

Finally, through f θ lens system FT light beam LBn by being configured at rear and the focal length f of f θ lens system FT_C2= The 2nd cylindrical lens CY2 of 14.5mm, orthogonal with deviation direction (main scanning direction) of light beam LBn based on polygonal mirror PM On sub-scanning direction, also by become luminous point SP in a manner of be concentrated on substrate P plane of illumination (image planes) on (referring to Fig.1 7).This The position of 2 cylindrical lens CY2 be on the main scanning direction of the light beam LBn based on polygonal mirror PM spot position and subscan side Upward spot position in consistent mode determines in set permissible range in focus direction, and be set as the spot position at For the plane of illumination (image planes) of substrate P.In the composition of above Figure 14~Figure 17 (and Fig. 4, Fig. 5), beam expander BE, aperture light Optical system until late PA, reflecting mirror M21, the 1st cylindrical lens CY1, reflecting mirror M22, lens system G10, reflecting mirror M23 is made It is functioned for the 1st adjustment optical system comprising the 1st optical element or the 1st lens component (the 1st cylindrical lens CY1), it should 1st optical element or the 1st lens component (the 1st cylindrical lens CY1) have to make polygonal mirror PM to be projected to (movably be biased to structure Part) light beam LBn in the refracting power of the anisotropy of pinching on the sub-scanning direction orthogonal with main scanning direction.In turn, in Figure 14 Reflecting mirror M24 and the 2nd column in the composition of~Figure 17 (and Fig. 4, Fig. 5), after f θ lens system FT (scanning optical system) Face lens CY2 as comprising the 2nd optical element or the 2nd lens component (the 2nd cylindrical lens CY2) the 2nd adjustment optical system and It functions, the 2nd optical element or the 2nd lens component (the 2nd cylindrical lens CY2) have to make from f θ lens system FT court To substrate P light beam LBn in the refracting power of the anisotropy of pinching on sub-scanning direction.

Figure 18 and Figure 19 is the lens data based on embodiment 1 shown in Figure 14 by the maximum numerical aperture of light beam LBn NAa is set as the 0.06 spherical aberration characteristic for simulate resulting light beam LBn, and horizontal axis is indicated the best focus position in design It is set as the focal position (μm) of zero point, the longitudinal axis indicates the standardized incident angle β in the same manner as fig. 12 above, Figure 13.In Figure 18 Characteristic (A) shown in solid be the spherical aberration characteristic being projected on the main scanning direction of the light beam LBn of substrate P, dotted line institute The characteristic (B) shown is the spherical aberration characteristic being projected on the sub-scanning direction of the light beam LBn of substrate P.Also, shown in Figure 19 Characteristic (C) is spherical aberration characteristic caused by indicating the difference ((B)-(A)) of characteristic (A) and characteristic (B) in Figure 18.This Locate, the characteristic (A) in Figure 18 is by the conjunction of beam expander BE, the 1st cylindrical lens CY1, lens system G10 and f θ lens system FT At spherical aberration caused by system, the characteristic (B) in Figure 18 be by beam expander BE, lens system G10, f θ lens system FT, And the 2nd cylindrical lens CY2 synthesis system caused by spherical aberration.Therefore, the characteristic of characteristic (A) and the difference of characteristic (B) (C) mainly corresponding with the spherical aberration characteristic as caused by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2.

Simulation as a result, compared with the characteristic (A) of the spherical aberration of the comparative example 1 shown in the fig. 12 above, (B), Yu Shi The absolute value of aberration point reduces 1 digit or so when applying the situation of example 1.Such as by the characteristic (A) in Figure 18 it is found that passing through lens system G10 and correct the spherical aberration as caused by the 1st cylindrical lens CY1, therefore will not occur to be projected to as luminous point SP substantially The offset of light beam LBn best focus position corresponding with incident angle β in substrate P.Offset, that is, the spherical aberration meets above-mentioned Formula (4), the condition of (6).Similarly, such as by the characteristic (B) in Figure 18 it is found that being corrected by lens system G10 by the 2nd cylinder Spherical aberration caused by lens CY2, thus will not occur substantially as luminous point SP and be projected to the light beam LBn in substrate P with The offset of the corresponding best focus position of incident angle β.Offset, that is, the spherical aberration meets above-mentioned formula (4), the condition of (6).And And such as by the characteristic of Figure 19 (C) it is found that being corrected by lens system G10 by the 1st cylindrical lens CY1 and the 2nd cylindrical lens Spherical aberration caused by CY2, therefore will not occur to be projected to the light beam LBn in substrate P and incidence as luminous point SP substantially The difference of the corresponding best focus position of angle beta.Difference, that is, spherical aberration difference of the best focus position meets above-mentioned formula (3), the condition of (5).It is projected to the spherical aberration of the light beam of substrate P in this way, reducing in advance and reduces the figure that can describe in turn The minimum feature (high-resolution) of case is corresponding, for for reduce the effective diameter of luminous point SP being projected in substrate P and by light The situation that the maximum numerical aperture NAa of beam LBn increases to 0.07 or more is effective.

As described above, scanning element Un in this 1st embodiment is in order to which one side is by the light beam LBn from light supply apparatus 14 Be projected to substrate P, on one side in one-dimensionally scanning light beam LBn in substrate P, and have: the 1st cylindrical lens CY1 has in a direction There is focusing force；Polygonal mirror PM, incidence penetrate the light beam LBn of the 1st cylindrical lens CY1, make above-mentioned light to carry out one-dimensional scanning Beam LBn is biased to；F θ lens system FT, the light beam LBn that is biased to by polygonal mirror PM of incidence, and with the state of telecentricity by light beam LBn is projected to substrate P；And the 2nd cylindrical lens CY2, incidence penetrates the light beam LBn of f θ lens system FT, and has in a direction There is focusing force；Moreover, by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 there is focusing force (folding in mutually orthogonal directions Penetrate power) mode configure, and then be provided between the 1st cylindrical lens CY1 and polygonal mirror PM to correct aberration (sphere mapping Difference) lens system G10.

It as a result, can the inclination of face caused by each reflecting surface of modifying factor polygonal mirror PM and the launching position of light beam LBn that generates Offset, and the sphere mapping as caused by the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 can be corrected with a simple configuration Difference.Therefore, it can inhibit the deterioration of the imaging performance of luminous point SP, so that raising is (fine in the resolution for the pattern described in substrate P Degree).Also, the focal length f of the 1st cylindrical lens CY1 can be made_C1And the 2nd cylindrical lens CY2 focal length f_C2Respectively less than f θ lens system FT Focal length f θ, therefore can realize section space-efficient optical system (referring to Fig. 7~Fig. 9 and Figure 15~Figure 17), scanning can also be reduced The shell of unit Un, so lightweight can also be sought.

Incident light beam LBn is concentrated on polygonal mirror PM on the deviation direction of polygonal mirror PM by the 1st cylindrical lens CY1 Front, lens system G10 is on above-mentioned deviation direction, making the light beam LBn after dissipating by the 1st cylindrical lens CY1 optically focused As directional light, and on the sub-scanning direction orthogonal with above-mentioned deviation direction, incident light beam LBn is concentrated on polygonal mirror On the reflecting surface RP of PM.The light beam LBn that can will be projected to polygonal mirror PM as a result, is biased to direction at edge in pinching on reflecting surface RP The strip (long ellipticity) of extension.Moreover, f θ lens system FT gathers incident light beam LBn on above-mentioned deviation direction Light makes through lens system G10 in substrate P, and on the direction orthogonal with above-mentioned deviation direction in optically focused on reflecting surface RP And the light beam LB after dissipating becomes directional light, the 2nd cylindrical lens CY2 will be entered on the direction orthogonal with above-mentioned deviation direction The light beam LBn penetrated is concentrated in substrate P.Even if having as a result, reflecting surface RP relative to Z-direction inclined situation (reflecting surface RP The inclination of normal relative to X/Y plane), since reflecting surface RP and substrate P are in being in that conjugate relation (close by imaging on sub-scanning direction System), so the launching position that also can inhibit the respective light beam LBn of reflecting surface RP is deviated in sub-scanning direction.

(variation 1)

According to this 1st embodiment, the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2's is each such as embodiment 1 (Figure 14) Shown, the face of light beam incident side is formed as in the barrel surface on sub-scanning direction with fixed radius of curvature, light beam emitting side Face be formed as plane, and be made of lens.However, each cylinder of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 Face may be alternatively formed to (cut open the flexure plane that the slightly different multiple faces of radius of curvature are smoothly formed by connecting in vertical with bus It is aspherical in the shape of face).Also, each planar side of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 can also be processed into There is the cylinder planar of set radius of curvature (finite value other than ∞) in main scanning direction or sub-scanning direction.Also, wanting incident Wavelength X to each light beam LBn (outgoing beam of light supply apparatus 14) of scanning element Un is not limited to embodiment 1 and compares The wavelength 354.7nm of set ultraviolet region, can also be other wavelength (light of visibility region, infrared region) in example 1.Also, If carrying out achromatism by lens system G10, multiple light beams that wavelength can be made different coaxial (or parallel) it is incident to multi-panel Mirror PM, so as to the surface of the different multiple luminous point SP scanning substrate P of wavelength.Alternatively, passing through the colour killing of lens system G10 Difference can also be such that light beam LBn becomes relative to central wavelength in the broadband light of distribution intensity in fixed wave-length coverage.Also, light Beam LBn can both have polarized component without non-polarized ingredient, can also be the intensity distribution in beam profile and non-gaussian point Cloth but uniform intensity distribution (substantially rectangular or trapezoidal distribution).

(variation 2)

In the first embodiment described above, it is biased to light beam LBn using polygonal mirror PM, but the inspection that can be swung can also be used Flowmeter mirror (being movably biased to component, swinging mirror) is biased to light beam LBn.The light when situation, after the reflection of galvanometer mirror Beam LBn is also projected to substrate P (plane of illumination) via f θ lens system FT, so in needing to the reflecting surface of galvanometer mirror When modified situation is implemented in face inclination, as long as the 1st cylindrical lens CY1 and lens system is similarly arranged in the front of galvanometer mirror G10, and the 2nd cylindrical lens CY2 is set after f θ lens system FT.Also, lens system G10 is by 2 spherical lenses G10a, G10b are constituted, but can also be made of the lens of single lens or 3 or more.Also, constituting the ball of lens system G10 Lens G10a, G10b can also be made of non-spherical lens in face.In turn, use cylindrical lens as the 1st optical component CY1 and 2 optical component CY2, but as long as be a direction refracting power for the refracting power in the direction orthogonal with the direction relatively Big lens.For example, toric lens or anamorphote can also be used as the 1st optical component CY1 and the 2nd optical component CY2。

(variation 3)

According to this 1st embodiment, the 1st cylindrical lens CY1 and each of the 2nd cylindrical lens CY2 are by simple lens institute structure At.The production and assembling (adjustment) of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 becomes simply, to can inhibit cost as a result,. However, particularly the 2nd cylindrical lens CY2 can also be constituted with multi-disc lens to implement the amendment of the spherical aberration of light beam LBn.In When being constituted the situation of the 2nd cylindrical lens CY2 with multi-disc (such as 2) lens, need to carry out to make the bus between multi-disc lens The accurately consistent adjustment operation of mutual gyrobearing.Furthermore it is saturating in being constituted the 2nd cylinder with multi-disc (such as 2) lens When the situation of mirror CY2, the direction that the bus of the 1st cylindrical lens CY1 can be made to extend is parallel with main scanning direction such as comparative example 1, Even if omitting lens system G10, the spherical aberration for being projected to the light beam LBn of substrate P can also be corrected well.But in the situation When, as shown in comparative example 1, need to make the focal length f of the 1st cylindrical lens CY1_C1It is longer than the focal length f θ of f θ lens system FT, therefore sweeps The overall length for retouching the optical path of unit Un is elongated.However, sometimes also by the focal length f of the 2nd cylindrical lens CY2_C2It is set as saturating relative to f θ The focal length f θ of mirror system FT is smaller, and inhibits smaller by spherical aberration.

In the variation 3 or embodiment 1 (Figure 14~Figure 17), it can get a kind of light-beam scanner and (or describe dress Set), in the luminous point SP of substrate P (irradiated body) one-dimensionally scanning light beam LBn, and it is provided with the 1st cylindrical lens CY1 the (the 1st Optical component), to the reflecting surface RP to the polygonal mirror PM (light beam deviation component) for being biased to light beam LBn, projection In the light beam LBn of pinching on sub-scanning direction；F θ lens system FT (scanning optical system), to incidence through polygonal mirror PM The light beam LBn of deviation, and it is projected to substrate P, and in carrying out one-dimensional scanning in substrate P；And the 2nd cylindrical lens CY2 the (the 2nd Optical component), it is configured between substrate P and f θ lens system FT, by the light beam LBn that will be projected from f θ lens system FT in pair The simple lens or multi-disc lens of scanning direction pinching are constituted；By the focal length f θ and the 2nd cylindrical lens that make f θ lens system FT The focal length f of CY2_C2Relationship be f θ > f_C2, and reduce the ball that the light beam LBn of substrate P is projected to predetermined value aperture Surface aberration.

[the 2nd embodiment]

It is also simply illustrated in fig. 4 above, in the lens system for constituting beam expander BE in scanning element Un In optical path between Be1, Be2, to make to describe line SLn in sub-scanning direction (X-direction) minor shifts, and it is provided with as software With optical component being capable of inclined parallel-plate HVP.Figure 20 A, Figure 20 B are inclined to line SLn is described because of the inclination of parallel-plate HVP The figure that the case where shifting is illustrated, Figure 20 A are to indicate the plane of incidence and outgoing plane parallel to each other of parallel-plate HVP relative to light beam The center line (chief ray) of LBn is in the figure of 90 degree of state, i.e. expression parallel-plate HVP is in state diagram not inclined in the face XZ.Figure 20B is the center line (chief ray) that indicates the plane of incidence and outgoing plane parallel to each other of parallel-plate HVP relative to light beam LBn from 90 When spending inclined situation, i.e. parallel-plate HVP is relative to the inclined state diagram with angle η of the face YZ.

In turn, in Figure 20 A, Figure 20 B, at not inclined state (angle η=0 degree) parallel-plate HVP, lens system The optical axis Axe of Be1, Be2 are set as the center of the circular open by aperture diaphragm PA, to be incident to the light beam of beam expander BE The adjusting of centerline of LBn is coaxial with optical axis AXe.Also, the position of the rear side focus of lens system Be2 is configured to and aperture diaphragm The position consistency of the circular open of PA.The position of aperture diaphragm PA is set as, and passes through the 1st cylindrical lens shown in fig. 16 above CY1 and lens system G10 (spherical lens G10a, 10b), on sub-scanning direction from the position of the reflecting surface RP of polygonal mirror PM When (or position of the front side focus of f θ lens system FT) is observed, become the position of substantially pupil.On the other hand, in main scanning side Upwards, aperture diaphragm PA is configured to the position optical conjugate with the i.e. entrance pupil in position of the front side focus of f θ lens system FT. Therefore, when making parallel-plate HVP with angle η and inclined situation, the light beam of lens system Be2 is incident to through parallel-plate HVP The center line of LBn (being herein divergent beams) is minutely moved in parallel relative to optical axis Axe to -Z direction, from lens system Be2 The light beam LBn of injection is converted to collimated light beam, and the center line of light beam LBn is slightly slanted relative to optical axis Axe.

Because the position of the rear side focus of lens system Be2 is configured to the position consistency with the circular open of aperture diaphragm PA, Therefore from the light beam LBn (collimated light beam) that lens system Be2 is obliquely projected will not on aperture diaphragm PA to Z-direction deviate, and Continue to be projected to circular open.Therefore, by the light beam LBn of the circular open of aperture diaphragm PA in the 1/e in intensity distribution²'s In the state that the intensity of flat zone is accurately weakened, slightly to incline in the face XZ in sub-scanning direction relative to optical axis Axe Oblique angle, the 1st cylindrical lens CY1 of directive back segment.Aperture diaphragm PA on sub-scanning direction from the reflecting surface of polygonal mirror PM When RP is observed, correspond to pupil location, according on the sub-scanning direction of the light beam LBn of the circular open by aperture diaphragm PA Inclination angle will be incident to the light beam LBn (in pinching on sub-scanning direction) of the reflecting surface RP of polygonal mirror PM in the position on reflecting surface It sets and slightly deviates.Therefore, the light beam LBn after the reflecting surface RP reflection of polygonal mirror PM is also with relative to including f θ shown in Fig. 4 The state that the optical axis AXf of lens system FT and the face parallel with the face XY are deviated gently towards Z-direction is incident to f θ lens system FT. As a result, to be incident to the light beam LBn of the 2nd cylindrical lens CY2 in subscan when the situation of the optical path shown in fig. 17 above Direction is slightly slanted, and the position of the luminous point SP for the light beam LBn that be projected in substrate P is slightly deviated to sub-scanning direction.Furthermore In Fig. 4, Tu20Zhong, it is set as having the spherical surface of positive refracting power saturating the two for constituting lens system Be1, Be2 of beam expander BE Mirror (convex lens), but the lens system Be1 of the incident side of light beam LBn can also be set as the spherical lens with negative refractive power (concavees lens).When the situation, from lens system Be1 project light beam LBn not pinching and become divergent beams be incident to Mirror system Be2, and beam diameter is converted to through widened collimated light beam by lens system Be2.

In such as comparative example 1 above, the bus of the bus and the 2nd cylindrical lens CY2 that make the 1st cylindrical lens CY1 is each other When configuring in parallel, and being constituted the situation of the 2nd cylindrical lens CY2 with simple lens, as shown in Figure 12 and Figure 13, the biggish ball of remaining Surface aberration.It therefore, can be because if being set in the beam expander BE (Fig. 7, Fig. 8) of comparative example 1 and making its inclination for parallel-plate HVP It is incident to the position of the light beam LBn of the 2nd cylindrical lens CY2 or favours sub-scanning direction and slightly change, and generate bigger Spherical aberration.On the other hand, in such as embodiment 1, by the mother of the bus of the 1st cylindrical lens CY1 and the 2nd cylindrical lens CY2 Line is configured with orthogonal relationship, and when being provided with the situation of lens system G10, or as illustrated in variation 3 As when being constituted the situation of the 2nd cylindrical lens CY2 with multi-disc lens, sphere mapping difference can be repaired well as shown in Figure 18, Figure 19 Just to effective size (diameter) φ or less of luminous point SP.Therefore, saturating because to be incident to the 2nd cylinder when tilting parallel-plate HVP The position of the light beam LBn of mirror CY2 favours the increment of sphere mapping difference that sub-scanning direction slightly changes and generates and is also pressed down It is made smaller.

Because parallel-plate HVP shown in Fig. 4 (Figure 20) is set to each of scanning element Un, therefore scanning element Un can be made respectively The tilt angle rl of parallel-plate HVP continuously change, thus can make in the office of the sub-scanning direction for the pattern described in substrate P Portion part is flexible with small ratio.Therefore, even if there is long dimension direction (sub-scanning direction) upper substrate portion P in substrate P Flexible situation can also be well maintained the 2nd layer of pattern relative to base pattern (the 1st layer of figure having been formed in substrate P Case) overlapping exposures (description) when overlapping accuracy.The part of the long dimension direction (sub-scanning direction) of substrate P is flexible can for example to be led to Following method is crossed to predict before each implementation pattern plotter of scanning element Un: will in long dimension direction with constant spacing (such as The alignment mark for 10mm) being formed in the width direction two sides of substrate P is expanded using aligming microscope, and sequentially using photographing element It is shot, image analysis is carried out to the variation (spacing variation of label etc.) of the long dimension direction of mark position.Alignment mark Configuration and an example of configuration etc. of aligming microscope be disclosed in such as No. 2015/152218 bulletin of International Publication No..

Claims (10)

1. a kind of drawing apparatus will be partial to the light beam in the 1st direction by movably deviation component on one side, be thrown with scanning with optical system It is incident upon on irradiated body, on one side in carrying out one-dimensional scanning along above-mentioned 1st direction on above-mentioned irradiated body, in above-mentioned irradiated body Depicting pattern has:

1st adjustment optical system, it includes the 1st lens component, the 1st lens component has above-mentioned movable inclined to make to be projected to To component above-mentioned light beam in the 2nd direction convergent anisotropy refracting power orthogonal with above-mentioned 1st direction；And

2nd adjustment optical system, it includes the 2nd lens component, the 2nd lens component has to make from above-mentioned scanning optics System towards above-mentioned irradiated body above-mentioned light beam in the above-mentioned convergent anisotropy refracting power in 2nd direction；

The wavelength of above-mentioned light beam is set as λ, numerical aperture of the above-mentioned light beam in above-mentioned 1st direction of above-mentioned irradiated body will be projected to Diameter is set as NA_y, NA will be set as in the numerical aperture in above-mentioned 2nd direction_x, the above-mentioned light beam of above-mentioned irradiated body will be projected to upper The spherical aberration for stating the 1st direction is set as S₁, S will be set as in the spherical aberration in above-mentioned 2nd direction₂When, above-mentioned 1st lens component with Above-mentioned 2nd lens component is set to meet two following conditions any one:

S₁< λ/NA_y ²And S₂< λ/NA_x ²And

|S₁- S₂| < λ/NA_y ²And | S₁- S₂| < λ/NA_x ²。

2. drawing apparatus as described in claim 1, wherein it is above-mentioned 1st adjustment optical system include the 3rd lens component, the 3rd Lens component have make to project after injecting by the above-mentioned light beam of above-mentioned 1st lens component to it is above-mentioned it is movable be biased to component it is equal to Property refracting power；

Above-mentioned 1st lens component is configured to make above-mentioned light beam exist between above-mentioned 1st lens component and above-mentioned 3rd lens component Above-mentioned 1st direction convergence.

3. drawing apparatus as claimed in claim 2 is further equipped with the light supply apparatus for issuing above-mentioned light beam；

Above-mentioned 1st adjustment optical system, further includes the expansion for expanding the diameter of the above-mentioned light beam projected from above-mentioned light supply apparatus Beam device system.

4. drawing apparatus as claimed in claim 3, wherein the above-mentioned spherical aberration S in above-mentioned 1st direction₁, it is by above-mentioned expansion Beam device system, above-mentioned 1st lens component, above-mentioned 3rd lens component and above-mentioned scanning are generated with optical system；

Above-mentioned spherical aberration S in above-mentioned 2nd direction₂, it is by above-mentioned beam expander system, above-mentioned 3rd lens component, above-mentioned scanning It is generated with optical system and above-mentioned 2nd lens component.

5. the drawing apparatus as described in any one of claim 2 to 4, wherein in order to make to be projected on above-mentioned irradiated body The numerical aperture in above-mentioned 1st direction of above-mentioned light beam and the numerical aperture in above-mentioned 2nd direction are consistent in set permissible range,

It is set as the focal length of above-mentioned 1st lens component being set as f_C1, the focal length of above-mentioned 2nd lens component is set as f_C2, will be upper The focal length for stating the 3rd lens component is set as f_G, and when the focal length of above-mentioned scanning optical system is set as f θ, Yu Jiding error model It encloses and interior meets following relationship:

f_G ²/f_C1=f θ²/f_C2。

6. drawing apparatus as claimed in claim 5, wherein by the focal length f of above-mentioned 1st lens component_C1With above-mentioned 2nd lens structure The focal length f of part_C2It is set as small compared with the focal length f θ of above-mentioned scanning optical system jointly.

7. drawing apparatus as described in claim 1, wherein the focal length of above-mentioned 1st lens component is set as f_C1, by the above-mentioned 2nd The focal length of lens component is set as f_C2, when the focal length of above-mentioned scanning optical system is set as f θ,

By above-mentioned focal length f_C1It is set as more above-mentioned focal length f θ long, and by above-mentioned focal length f_C2It is set as small compared with above-mentioned focal length f θ.

8. drawing apparatus as claimed in claim 6, is further equipped with aperture diaphragm, which will inject into the above-mentioned 1st The above-mentioned beam shaping of lens component is the light beam of the circular section of set diameter,

It is set as each number in above-mentioned 1st direction and above-mentioned 2nd direction of the above-mentioned light beam that will be projected on above-mentioned irradiated body When value aperture is set as NA, pass through the diameter phi of the above-mentioned light beam after above-mentioned aperture diaphragm shaping_a, Yu Jiding error range is interior to be met Following relationship:

φ a=2 × NA (f θ × f_C1/f_G)=2 × NA × (f_G×f_C2/fθ)。

9. drawing apparatus as claimed in claim 1 or 7, wherein above-mentioned 1st lens component and above-mentioned 2nd lens component include The refracting power of mutually orthogonal directions is different in the vertical face of the optical path advanced from above-mentioned light beam cylindrical lens, double-curved surface are saturating Mirror and anamorphote it is any.

10. drawing apparatus as claimed in claim 5, wherein above-mentioned 1st lens component and above-mentioned 2nd lens component are included in The cylindrical lens different from the refracting power of mutually orthogonal directions in the vertical face of optical path that above-mentioned light beam is advanced, double-curved surface are saturating Mirror and anamorphote it is any,

Above-mentioned 3rd lens component includes to have iso refracting power in the face vertical with the optical path that above-mentioned light beam is advanced Spherical lens or non-spherical lens.