CN108885337A - Light-beam scanner and pattern plotter device - Google Patents

Abstract

The scanning element (Un) that the light beam (LBn) that the polygonal mirror (PM) that will can be changed by the angle of reflecting surface of the invention is biased to is projected to substrate (P) has：Reflective optics (CY2, M10) again, its reflect initially in polygonal mirror (PM) reflection the 1st the reflected beams (LBn) and generate towards polygonal mirror (PM) the 2nd the reflected beams (LBn), and in make on the non-deviation direction that the deviations direction with polygonal mirror (PM) intersects the 2nd the reflected beams (LBn) convergence；And optical system (FT, CY3) is used in scanning, incident 2nd the reflected beams (LBn) resulting 3rd the reflected beams (LBn) of secondary reflection and are projected in polygonal mirror (PM) towards substrate (P) again.

Description

Light-beam scanner and pattern plotter device

Technical field

The present invention relates to a kind of light beam scanning dresses of luminous point for scanning the light beam on the plane of illumination for exposing to object Set and describe using such light-beam scanner the pattern plotter device for exposing set pattern.

Background technique

All the time, it is known that as the high speed printer of affairs, in order to which the luminous point of laser beam is projected to photosensitive drums Equal irradiated bodies (object), and one side makes luminous point carry out main scanning in one-dimensional square by polygonal rotating mirror, makes to be shone on one side Beam is mobile in the sub-scanning direction orthogonal with main scanning line direction, thus in describing required pattern or image on irradiated body (text, figure, photo etc.), such as the light scanning apparatus using Japanese Unexamined Patent Application 61-7818 bulletin as shown below.

It is disclosed in Japanese Unexamined Patent Application 61-7818 bulletin, what setting was rotated centered on rotary shaft has deviation anti- The polygonal rotating mirror in face and 2 amendment plane mirrors in a manner of crest line and rotating shaft direct cross with deviation reflecting surface opposite direction are penetrated, Make incident beam to the deviation reflecting surface of polygonal rotating mirror in amendment use round trip between plane mirror and as scanning light Beam to scanning surface guide, thereby to because be biased to reflecting surface face inclination etc. caused by scan line deformation carry out optics amendment.In In Japanese Unexamined Patent Application 61-7818 bulletin, to comprising rotary shaft and the plane orthogonal with the crest line of 2 amendment plane mirrors The projection image of scanning light beam with and the plane angulation (injection angle) of rotating shaft direct cross set as 5 °~15 ° of mode 2 amendments configuration of plane mirror and the incidence angle of incident beam.

Fig. 2 such as Japanese Unexamined Patent Application 61-7818 bulletin is (more in will initially be incident to rotation or shown in Fig. 8 to Figure 10) The light beam of the deviation reflecting surface of face mirror and the deviation for reflecting and being incident to for the second time polygonal rotating mirror with plane mirror in 2 amendments For the light beam of reflecting surface when the situation for the same position for being set as being biased on reflecting surface on the direction of rotary shaft, plane is used in 2 amendments Mirror angulation (angle β) becomes the not acute angle up to 90 °.When this situation, if the deviation reflecting surface of polygonal rotating mirror is opposite It is tilted in the face parallel with rotary shaft, is then back to the deviation reflecting surface of polygonal rotating mirror in 2 amendment plane mirror reflections Light beam can be in big on the direction of rotary shaft relative to the position of the light beam for the deviation reflecting surface for being initially incident to polygonal rotating mirror Width it is displaced.Therefore, it is necessary to be ensured in advance that the size of the rotary axis direction of the deviation reflecting surface of polygonal rotating mirror to cope with the position It moves.The lightweight of polygonal rotating mirror generates limitation as a result, and the upper limit of the rotation speed of polygonal rotating mirror is restricted.

Summary of the invention

1st aspect of the invention is a kind of light-beam scanner, be will can be changed by the angle of reflecting surface it is movable Reflecting member and the light beam being biased to is projected to irradiated body, and have：Reflective optics again has the 1st optical component, should The reflection of 1st optical component is initially generated in the 1st the reflected beams of the movable reflecting member reflection towards the movable reflection 2nd the reflected beams of component, and intersect in the deviation direction with the light beam generated by the movable reflecting member Restrain the 2nd the reflected beams on non-deviation direction；And scanning optical system, incident 2nd the reflected beams are in institute State movable reflecting member again resulting 3rd the reflected beams of secondary reflection and towards the irradiated body project.

2nd aspect of the invention is a kind of light-beam scanner, be will by with reflecting surface towards different Multiple reflectings surface movable reflecting member and the light beam be biased to is projected to irradiated body, and have：Reflective optics again, Resulting 1st the reflected beams of the 1st reflective surface of the movable reflecting member are incident in, and are generated towards the movable reflection The 2nd the reflected beams that 2nd reflectings surface different from the 1st reflecting surface of component advance；And scanning optical system, it is incident In the 2nd reflective surface of the movable reflecting member the 3rd the reflected beams and be projected to the irradiated body.

3rd aspect of the invention is a kind of pattern plotter device, in the state of keeping substrate mobile in set direction, Using the light-beam scanner of the 1st aspect or the 2nd aspect of the invention, the light beam is projected to as described illuminated On the substrate of body, and make the light beam in the main scanning direction scanning intersected with the set direction, thereby in described Depicting pattern on substrate.

Detailed description of the invention

Fig. 1 shows the device inspection apparatus of the exposure device comprising implementing exposure-processed to substrate of the 1st implementation form The figure of schematic configuration.

Fig. 2 is shown in the detailed figure that rotating cylinder shown in Fig. 2 is wound with the state of substrate.

The figure to mutatis mutandis label that Fig. 3 is shown in the description line of the luminous point scanned on substrate and is formed on substrate.

Fig. 4 is the schematic configuration diagram of light beam switching part shown in FIG. 1.

Fig. 5 indicates the figure of the specific composition around selection optical element shown in Fig. 4 and incident mirror.

Fig. 6 indicates the perspective view of the composition of scanning element shown in FIG. 1.

Fig. 7 is figure when observing scanning element shown in fig. 6 from +Y direction.

The reflection angle of light beam when Fig. 8 is reflective surface 2 times to polygonal mirror PM shown in Fig. 6 is illustrated.

Fig. 9 is the figure of the rotation angle of polygonal mirror needed for illustrating 1 scanning.

Figure 10 indicates the electrical composition figure of exposure device shown in FIG. 1.

Figure 11 indicates the composition figure of the scanning element in the variation 1 of the 1st implementation form.

Figure 12 is the composition of the 2 secondary reflection light beam of reflecting surface to make polygonal mirror in the variation 2 of the 1st implementation form Figure.

Figure when Figure 13 A is the composition for the scanning element for observing the 2nd implementation form from -Y direction, Figure 13 B is from +Z direction Observe the figure when composition of the scanning element of the 2nd implementation form.

Figure 14 indicates the figure of the configuration example of the scanning element in the variation 1 of the 2nd implementation form.

Figure 15 is the composition figure to make 2 secondary reflection description light beam of polygonal mirror in the 3rd implementation form.

Figure 16 is the composition figure to make 2 secondary reflection light beam of polygonal mirror in the variation 1 of the 3rd implementation form.

Figure 17 indicates the composition figure of the scanning element in the variation of the 1st~the 3rd implementation form.

Specific embodiment

Light-beam scanner and pattern plotter device for aspect of the invention, enumerate preferable implementation form, and one Face referring to accompanying schema, on one side in being illustrated in detail below.Furthermore aspect of the invention is not limited to grade implementation Form, also comprising addition numerous variations or improvement.It also, can be easily comprising dealer that is, in following documented constituent element Imagining, substantially the same, documented constituent element can be suitably combined below.Also, can be in not departing from the present invention Purport in the range of carry out constituent element various omissions, displacement or change.

[the 1st implementation form]

Fig. 1 shows the devices of the exposure device EX comprising implementing exposure-processed to substrate (irradiated body) P of the 1st implementation form The schematic configuration diagram of part manufacture system 10.Furthermore in the following description, as long as setting is not specified, by gravity direction It is set as the XYZ orthogonal coordinate system system of Z-direction, and illustrates X-direction, Y-direction and Z-direction according to arrow shown in figure.

Device inspection apparatus 10 is the system implemented set processing (exposure-processed etc.) to substrate P and manufacture electronic device (substrate board treatment).Device inspection apparatus 10 is that have such as flexible display, membranaceous touch-control of the manufacture as electronic device The manufacture system of the production line of panel, the membranaceous colored filter of liquid crystal display panel, soft wiring or soft sensor etc. System.Hereinafter, being illustrated premised on flexible display as electronic device.As flexible display, there is for example organic EL aobvious Show device, liquid crystal display etc..Device inspection apparatus 10 has the construction of so-called roll-to-roll (Roll To Roll) mode, that is, Substrate P is sent out from substrate (sheet substrate) P of the sheet of soft (pliability) is rolled into scroll-like supply roller (not shown), in After continuously implementing various processing to the substrate P sent out, various treated substrate Ps are batched by recycling roll (not shown). Therefore, various treated substrate Ps become multiple devices state connected in the conveyance direction of substrate P, and become more chamferings and use Substrate.The substrate P sent out from the supply roller is sequentially in manufacturing device PR1, exposure device EX and manufacturing device PR2 by reality Various processing are applied, and are batched by the recycling roll.There is substrate P the moving direction (conveyance direction) of substrate P to become length Edge direction (long size), width direction become the band-like shape of short side direction (short size).

In this implementation form, X-direction is to automatically supply roller towards recycling roll in substrate P in the horizontal plane orthogonal with Z-direction Direction, and be the long dimension direction (longitudinal direction) of substrate P.Y-direction is in the horizontal plane orthogonal with Z-direction and X-direction Orthogonal direction, and be the width direction (short dimensional directions) of substrate P.Furthermore -Z direction is set as the direction that gravity works The conveyance direction of substrate P is set as +X direction by (gravity direction).

Substrate P is for example using resin film or the foil being made of metal or alloy such as stainless steels (foil) etc..As resin The material of film for example also can be used comprising polyvinyl resin, acrylic resin, polyester resin, ethylene-vinyl alcohol copolymer resin, Corvic, celluosic resin, polyamide, polyimide resin, polycarbonate resin, polystyrene resin and At least one or more in vinyl acetate resin.Also, thickness or the rigidity (young's modulus) of substrate P are as long as such as in passing through device It will not the range of folding line or non-reversible gauffer caused by substrate P is generated because of bending when the transport path of part manufacture system 10 It can.As the base material of substrate P, with a thickness of 10 μm~200 μm PET (polyethylene terephthalate) below or PEN (poly- naphthalene two Formic acid second diester) etc. film be preferable sheet substrate typical case.

The situation being heated in being managed since there are substrate Ps everywhere in being carried out in device inspection apparatus 10, so preferably The substrate P of the less big material of selected thermal expansion coefficient.For example, can inhibit heat swollen and inorganic filler is mixed in resin film Swollen coefficient.Inorganic filler may be, for example, titanium oxide, zinc oxide, aluminium oxide or silica etc..Also, substrate P can be to pass through float method The individual layers of 100 μm of thickness or so or 35 μm or so of very thin glass of equal manufactures, also can be for described in the very thin glass gluing Laminate made of resin film, foil etc..

And say, the pliability (flexibility) of substrate P is even if refer to that the power for applying self weight degree to substrate P also may not be used Cut or fracture and by the curved property of the substrate P.Also, being also contained in by the curved property of power of self weight degree flexible Property.Also, flexible degree is according to the material of substrate P, size, thickness, film forming in layer construction, temperature or humidity in substrate P It waits environment etc. and changes.As long as in short, in removing in the device inspection apparatus 10 that substrate P is accurately wound in this implementation form It can not be bent and occur when sending the situations of conveyance direction conversion component such as various conveyings roller set on path, rotating cylinder Folding line or breakage (generating broken or crackle) and successfully transport substrate P, then can be described as flexible range.

Manufacturing device (processing unit) PR1 one side will automatically supply the next substrate P of roller conveying towards exposure device EX with set Speed in along long dimension direction conveyance direction (+X direction) conveying, one in face of be sent to exposure device EX substrate P carry out The processing of preceding step.By the processing of the preceding step, the substrate P for being sent to exposure device EX, which becomes, is formed with photonasty in its surface The substrate (sensitive substrate) of functional layer (photoinduction layer).

The photonasty functional layer is coated in substrate P in the form of a solution, and becomes layer (film) by dry.Photonasty function The typical case of ergosphere is photoresist (liquid or dry film shape), but as the material without carrying out development treatment, is had by ultraviolet light Photonasty silane coupling agent (SAM) that parent/liquid repellency of the part of irradiation is upgraded or in the part by ultraviolet irradiation Appear the photonasty reducing agent etc. of plating also former base.In the situation for using photonasty silane coupling agent as photonasty functional layer When, the pattern part through ultraviolet exposure in substrate P from liquid repellency modification be lyophily.Therefore, by as lyophily The upper selection coating of part contain electric conductivity ink (ink containing silver or the electric conductivity nanoparticle such as copper) or semiconductor material The liquid etc. of material, can be formed will become electrode, semiconductor, insulation or the wiring of connection for constituting membrane transistor (TFT) etc. Pattern layer.When using the situation of photonasty reducing agent as photonasty functional layer, in substrate P through ultraviolet exposure Pattern part appears plating also former base.Therefore, after exposure, substrate P is impregnated in the plating liquid containing palladium ion etc. immediately solid It fixes time, thereby forms the pattern layer of (precipitation) palladium.Such plating is the manufacture of addition (additive), but except this with It outside, can also be premised on the etching process as the manufacture for subtracting into (subtractive).When this situation, it is sent to exposure device The substrate P of EX also can for by base material be set as PET or PEN and in its surface comprehensively or selectively AM aluminum metallization (Al) or copper (Cu) etc. Metallic diaphragm, and further lamination photoresist layer forms thereon.

Exposure device (processing unit) EX is that one side will be from the substrate P that manufacturing device PR1 is moved towards manufacturing device PR2 It is exposed the processing unit of processing in face of substrate P in conveyance direction (+X direction) conveying, one with set speed.Exposure device EX (such as constitutes electricity to the pattern of the irradiation of the surface (surface of photonasty functional layer, i.e. photosurface) of substrate P and electronic device The pattern of the electrode or wiring of the TFT of sub- device etc.) corresponding light pattern.Thereby, it is formed and the figure in photonasty functional layer The corresponding sub-image of case (modification portion).

In this implementation form, exposure device EX is the exposure device, so-called without using the direct imaging mode of mask The exposure device (pattern plotter device) of grating scanning mode.Exposure device EX one side is in +X direction (set direction, subscan Direction) conveying substrate P, on one side by the luminous point SP of the light beam LB (pulsed light beam) of the pulse type of exposure in the illuminated of substrate P One-dimensionally scan (main scanning) in set scanning direction (Y-direction) on face (photosurface), and by the intensity of luminous point SP according to Pattern data (describing the data, pattern-information) modulation (ON/OFF) at high speed.Thereby, describe in the plane of illumination of substrate P and expose Light light pattern corresponding with the set pattern of electronic device, circuit or wiring etc..Also that is, subscan and luminous point in substrate P In the main scanning of SP, luminous point SP in relatively two-dimensional scanning on the plane of illumination (surface of photonasty functional layer) of substrate P, thus Describe in the plane of illumination of substrate P and exposes set pattern.Also, since substrate P is transported along conveyance direction (+X direction), So set interval along the long dimension direction of substrate P is separated by the exposure area W of exposure device EX exposing patterns and Multiple (referring to Fig. 3) are set.Due to W-shaped at electronic device in the exposure area, so exposure area W is also that device forms area Domain.

Manufacturing device (processing unit) PR2 one side is by the substrate P come from exposure device EX conveying towards recycling roll with set Speed in along long dimension direction conveyance direction (+X direction) conveying, carried out on one side to exposed device EX exposure-processed The processing (for example, plating or development, etching process etc.) of the subsequent step of substrate P.By the processing of the subsequent step, and In the pattern layer for forming device in substrate P.

Secondly, being illustrated in further detail to exposure device EX.Exposure device EX is accommodated in temperature adjustment chamber ECV. The temperature adjustment chamber ECV inhibited and inside is remained set temperature, set humidity in inside conveying substrate P because Change in shape caused by temperature, and hygroscopicity or the electrification of the electrostatic generated along with conveying etc. for inhibiting substrate P.Temperature adjustment Chamber ECV is the setting face E that manufacturing works are configured at via antivibration cell S U1, SU2 being passively or actively.Antivibration unit SU1, SU2 reduce the vibration from setting face E.Setting face E can be the ground of factory itself, also can be exclusively to be set to ground The face on setting pedestal (pedestal) on face to produce horizontal plane.Exposure device EX at least has substrate transport mechanism 12, light Source device 14, light beam switching part BDU, describe head 16, control device 18, multiple aligming microscope AMm (furthermore m=1,2,3, 4) and multiple encoder head ENja, ENjb (furthermore j=1,2,3).Each portion of the control of control device 18 exposure device EX.The control Device 18 processed includes computer and the record media having program recorded thereon etc., executes program as this implementation form by the computer Control device 18 functions.

Substrate transport mechanism 12 is a part for constituting the base board delivery device of device inspection apparatus 10, and will be from manufacture dress The substrate P of PR1 conveying is set after in exposure device EX with set speed conveying, manufacturing device is sent to set speed PR2.The upstream side (-X direction side) of the conveyance direction of 12 self-reference substrate P of substrate transport mechanism sequentially has marginal position controller EPC, driving roller R1, tension adjustment roller RT1, rotating cylinder (cylinder rotating cylinder) DR, tension adjustment roller RT2, driving roller R2 and Drive roller R3.By substrate P is set up in substrate transport mechanism 12 marginal position controller EPC, driving roller R1~R3, Tension adjustment roller RT1, RT2 and rotating cylinder (cylinder rotating cylinder) DR and be specified in exposure device EX transport substrate P carrying channel Diameter.

Marginal position controller EPC adjusts width direction (Y-direction and the substrate P from the manufacturing device PR1 substrate P transported Short dimensional directions) on position.Also that is, marginal position controller EPC in the state of being applied with set tension to be removed It is ± ten several μm~tens of μm or so that the position of the end (edge) of the width direction for the substrate P sent, which is in relative to target position, Range (permissible range) in mode, keep substrate P mobile in width direction, so as to adjust the position in the width direction of substrate P It sets.Marginal position controller EPC has substrate P to be applied with the roller and detection substrate P that the state of set tension is set up Width direction end (edge) position edge sensor (not shown) (end test section).Marginal position controller EPC makes the roller of marginal position controller EPC in Y-direction based on detection signal detected by the edge sensor It is mobile, so as to adjust the position in the width direction of substrate P.Roller (clamping roller) R1 one side is driven to keep from marginal position control The front and back side two sides of the substrate P of device EPC conveying processed, rotate on one side, so that substrate P be transported towards rotating cylinder DR.Furthermore side The long dimension direction that edge positioner EPC can also be wound in the substrate P of rotating cylinder DR begins relative to the central axis AXo of rotating cylinder DR Position in the width direction of orthogonal mode appropriate adjustment substrate P eventually, and to correct the slope on the direction of travel of substrate P The mode of error suitably adjusts the rotary shaft of the roller of marginal position controller EPC and the depth of parallelism of Y-axis.

Rotating cylinder DR has in the central axis AXo of the Y-direction extension intersected with the Z-direction that gravity works and from central axis The cylindric outer peripheral surface of AXo radii fixus.Rotating cylinder DR one side makes a part of substrate P in length along the outer peripheral surface (periphery) Dimensional directions are supported (holding) in barrel surface sigmoid, are rotated centered on central axis AXo on one side and by substrate P in+X Direction conveying.Rotating cylinder DR is supported in its outer peripheral surface for the area in the substrate P of light beam LB (luminous point SP) projection for describing head 16 Domain (part).Rotating cylinder DR is the face (back side) of opposite side with the face (face for being formed with the side of photosurface) for forming electronic device certainly It is collateral to hold (contiguity is kept) substrate P.In the two sides of the Y-direction of rotating cylinder DR, set in such a way that rotating cylinder DR is around central axis AXo rotation It is equipped with the axis Sft supported by cricoid bearing.Rotating cylinder DR is driven by the rotation (not shown) that free control device 18 controls in the future The rotating torques of dynamic source (for example, motor or deceleration mechanism etc.) are assigned to axis Sft and around central axis AXo with fixed rotation speed Degree rotation.Furthermore it for convenience, will be comprising central axis AXo and the plane parallel with YZ plane is known as median plane Poc.

Driving roller (clamping roller) R2, R3 separates set interval along the conveyance direction (+X direction) of substrate P and matches It sets, and assigns set slack (surplus) to the substrate P after exposure.Drive roller R2, R3 in the same manner as driving roller R1, one Face keeps the front and back side two sides of substrate P, rotates on one side, and substrate P is transported towards manufacturing device PR2.Tension adjustment rolling Cylinder RT1, RT2 are to be pressed to -Z direction, and assign both to the substrate P for being wound to rotating cylinder DR and being supported in long dimension direction Fixed tension.Thereby, make to assign to the tension stability of the long dimension direction for the substrate P for hanging around rotating cylinder DR and turn to set range It is interior.Control device 18 makes to drive roller R1 by controlling rotary driving source (for example, motor or deceleration mechanism etc.) (not shown) ~R3 rotation.Furthermore the rotary shaft of the rotary shaft and tension adjustment roller RT1, RT2 that drive roller R1~R3 is with rotating cylinder DR's Central axis AXo is parallel.

Light supply apparatus 14 generates and projects light beam (pulsed light beam, pulsed light, laser) LB of pulse type.Light beam LB be in 370nm wavelength band below has the ultraviolet of peak wavelength, and the luminous frequency of light beam LB is (frequency of oscillation, set Frequency) it is set as Fa.The light beam LB that light supply apparatus 14 projects is incident to via light beam switching part BDU describes head 16.Light supply apparatus 14 according to control device 18 control, with luminous frequency Fa issue and outgoing beam LB.The light supply apparatus 14 can be infrared by generating The semiconductor Laser device of the pulsed light of wavelength region, fiber amplifier and by the pulsed light of enlarged infrared wavelength region Be converted to the composition such as Wavelength changing element (higher hamonic wave generating element) of the pulsed light of ultraviolet wavelength region.By by this method Light supply apparatus 14 is constituted, available frequency of oscillation Fa is hundreds of MHz and the fluorescent lifetime of 1 pulsed light is picosecond (picosecond) pulsed light of the ultraviolet light of the high brightness of left and right.Furthermore the light beam LB for projecting light supply apparatus 14 becomes flat The light of row light beam.In this 1st implementation form, as light supply apparatus 14 using such as Japanese Unexamined Patent Publication 2015-210437 bulletin (ginseng According to Figure 17) shown in light supply apparatus.Also, the light beam LB that light supply apparatus 14 projects is set as the P-polarized light as rectilinearly polarized light.

Light beam switching part BDU make light beam LB be incident to constitute describe head 16 multiple scanning element Un (furthermore n=1, 2 ..., 6) in any scanning element Un, and switch for light beam LB incidence scanning element Un.Also, light beam switching part BDU To sequentially it switch in scanning element U1~U6 for the scanning element Un of light beam LB incidence.Also that is, by light beam LB (LBn) timesharing point Each scanning element Un of dispensing.For example, light beam switching part BDU by for the scanning element Un of light beam LB incidence according to U1 → U2 → U3 → U4 → U5 → U6 sequence switches over.Furthermore coming from for scanning element Un will be incident to via light beam switching part BDU by existing The light beam LB of light supply apparatus 14 is expressed as the situation of LBn.Moreover, in the presence of the light beam LBn for indicating to be incident to scanning element U1 with LB1 And the situation for the light beam LBn for being incident to scanning element U2~U6 is similarly indicated with LB2~LB6.

In such a way that light beam LB is incident to the scanning element Un for the scanning for carrying out luminous point SP, switching supplies light beam switching part BDU The scanning element Un of light beam LBn incidence.Furthermore carry out luminous point SP scanning scanning element Un according to U1 → U2 → U3 → U4 → The sequence of U5 → U6 switches over.

Describe head 16 as so-called more scannings made of arranging multiple scanning element Un (U1~U6) of same composition The description head of type.Describe head 16 and is supported by multiple scanning element Un (U1~U6) in the outer peripheral surface (periphery) by rotating cylinder DR Substrate P a part of depicting pattern.Each scanning element Un (U1~U6) is on one side by the light beam LBn from light beam switching part BDU It is projected in substrate P (on the plane of illumination of substrate P), on one side in (convergence) light beam of optically focused in substrate P LBn.Thereby, it is projected to base Light beam LBn (LB1~LB6) on plate P becomes luminous point SP.Also, each scanning element Un (U1~U6) has polygonal mirror PM, rotation is used The luminous point for the light beam LBn (LB1~LB6) that the polygonal mirror PM turned will be projected in substrate P in main scanning direction (Y-direction) scanning SP.By the scanning of luminous point SP, and in the (scanning of the linear description line for the pattern for providing out to describe 1 row amount in substrate P Line) SLn (furthermore n=1,2 ..., 6).Also that is, description line SLn, which is, indicates scanning of the luminous point SP of light beam LBn in substrate P Track.

Scanning element U1 is along line SL1 scanning point SP is described, and similarly, scanning element U2~U6 is along description line SL2 ~SL6 scanning point SP.As shown in Figure 2 and Figure 3, the description line SLn (SL1~SL6) of multiple scanning element Un (U1~U6) across Median plane Poc (referring to Fig.1, Fig. 3) and be dislocation arrangement in the circumferencial direction of rotating cylinder DR and be configured to 2 rows.Odd number describes line SL1, SL3, SL5 are located relative to the quilt of the substrate P of the upstream side (-X direction side) for the conveyance direction that median plane Poc is substrate P On shadow surface, and set interval is separated along the Y direction and is configured to 1 row.Even number describes line SL2, SL4, SL6 and is located at phase For on the plane of illumination of the substrate P in the downstream side (+X direction side) for the conveyance direction that median plane Poc is substrate P, and along the side Y 1 row is configured to set interval is separated.

Therefore, multiple scanning element Un (U1~U6) are also across median plane Poc and in the conveyance direction of substrate P in dislocation row Column are configured to 2 rows (referring to Fig. 2).Also that is, odd number scanning element U1, U3, U5 configuration are being substrate relative to median plane Poc The upstream side (-X direction side) of the conveyance direction of P, and separate set interval along the Y direction and be configured to 1 row.Even number is swept Unit U2, U4, U6 configuration are retouched in the downstream side (+X direction side) relative to the conveyance direction that median plane Poc is substrate P, and along Y-direction separates set interval and is configured to 1 row.Odd number scanning element U1, U3, U5 and even number scanning element U2, It is symmetrically arranged when U4, U6 are from XZ planar observation relative to median plane Poc.

It is set as, in X-direction, odd number describes line SL1, SL3, SL5 and even number describes line SL2, SL4, SL6 It is spaced from each other, but connects in not being separated from each other in Y-direction (width direction of substrate P, main scanning direction).Description line SL1~ The central axis AXo of the width direction (Y-direction) of SL6 and substrate P that is, rotating cylinder DR are substantially parallel.Furthermore it is so-called to describe line SLn connects in Y-direction to be instigated through the end of the pattern respectively described for describing line SLn each other in adjacent in Y-direction or one Divide repetition.When making the end duplicate situation each other by the pattern respectively described for describing line SLn, such as preferably relative to each Describe line SLn length for comprising describe starting point or describe end point inside in Y-direction number % range below be allowed to It repeats.

In this way, in a manner of multiple scanning element Un (U1~U6) all whole of the width direction of covering exposure area W, Each scanning element Un (U1~U6) shares scanning area.Thereby, each scanning element Un (U1~U6) can be in the width side in substrate P To each depicting pattern for the multiple regions (describing range) being divided into.For example, if by the Y-direction of 1 scanning element Un The sweep length length of line SLn (describe) is set as 20~60mm or so, then by by the 3 of odd number scanning element U1, U3, U5 Totally 6 scanning element Un are configured a 3 with even number scanning element U2, U4, U6 in Y-direction, and allow to the side Y described To width extend to 120~360mm or so.Each length (length for describing range) principle for describing line SLn (SL1~SL6) On be set as identical.Also that is, being set in principle along the scanning distance of the luminous point SP for the light beam LBn respectively scanned for describing line SL1~SL6 It is identical.

When the situation of this implementation form, because the light beam LB from light supply apparatus 14 is pulsed light, so, in the main scanning phase Between be projected to describe line SLn on luminous point SP it is discrete according to the frequency of oscillation Fa (for example, 100MHz) of light beam LB.Therefore, must The luminous point SP and luminous point SP by next 1 pulse light projection by the 1 pulse light projection of light beam LB must be made in main scanning direction weight It is folded.The amount of the overlapping is scanning speed (speed of the main scanning) Vs and light beam LB of size φ according to luminous point SP, luminous point SP Frequency of oscillation Fa and set.Effective size φ of luminous point SP is the intensity distribution in luminous point SP with the approximate situation of Gaussian Profile When, by the 1/e of the peak strength of luminous point SP²(or 1/2) determines.In this implementation form, with luminous point SP relative to effective big The mode of small (size) φ overlapping φ × 1/2 or so, sets the scan velocity V s and frequency of oscillation Fa of luminous point SP.Therefore, luminous point The projection interval along main scanning direction of SP becomes φ/2.Therefore, more satisfactory to be, (just with description line SLn in sub-scanning direction The direction of friendship) on, also in along between 1 scanning for the luminous point SP for describing line SLn and next scanning, substrate P is in circumference side The mode of substantially 1/2 distance of the effective size φ of luminous point SP is moved up, the rotation speed of rotating cylinder DR is set.Into one Step, in by descriptions line SLn adjacent in the Y direction when the situation that main scanning direction connects, also it is more satisfactory be allowed to be overlapped φ/ 2.In this implementation form, size (size) φ of luminous point SP is set as 3 μm.

Each scanning element Un (U1~U6) to less than in XZ plane with each light beam LBn towards before the central axis AXo of rotating cylinder DR Into mode project each light beam LBn towards substrate P.Thereby, the light beam to advance from each scanning element Un (U1~U6) towards substrate P The optical path (beam center axis) of LBn is in the normal parallel in XZ plane with the plane of illumination of substrate P.At this point, being swept from odd number The optical axis (central axis) of light beam LB1, LB3, LB5 that unit U1, U3, U5 are projected towards substrate P is retouched in becoming identical in XZ plane Direction, and it is Chong Die with following rhumb line Lx2 (referring to Fig.1).Also, being thrown from even number scanning element U2, U4, U6 towards substrate P The optical axis (central axis) of light beam LB2, LB4, LB6 for penetrating in XZ plane become the same direction, and with following rhumb line Lx3 (ginseng According to Fig. 1) overlapping.Rhumb line Lx2 and rhumb line Lx3 is in the side for becoming ± θ 1 in XZ plane relative to median plane Poc with angle Formula sets (referring to Fig.1).Also that is, in XZ plane, the light beam that is projected from odd number scanning element U1, U3, U5 towards substrate P The direction of travel of the direction of travel of LB and the light beam projected from even number scanning element U2, U4, U6 towards substrate P is relative in Heart face Poc is symmetrical.Also, each scanning element Un (U1~U6) with expose to describe line SLn (SL1~SL6) light beam LBn in YZ The mode vertical relative to the plane of illumination of substrate P is towards substrate P illumination beam LBn in the parallel face of plane.That is, in illuminated On the main scanning direction of luminous point SP on face, it is scanned with the state of telecentricity to be projected to the light beam LBn (LB1~LB6) of substrate P.

Multiple aligming microscope AMm (AM1~AM4) shown in FIG. 1 are shown in Fig. 3 to be formed in substrate P to detect It is multiple to mutatis mutandis label MKm (MK1~MK4), and be set along the Y direction multiple (being 4 in this 1st implementation form).It is more A label MKm (MK1~MK4) is the set pattern and base to make to be depicted in the exposure area W on the plane of illumination of substrate P Plate P relatively aligns the reference mark of (alignment).Multiple aligming microscope AMm (AM1~AM4) are in the outer peripheral surface by rotating cylinder DR Multiple label MKm (MK1~MK4) are detected in the substrate P that (periphery) is supported.Multiple aligming microscope AMm (AM1~AM4) set The irradiated area in the substrate P irradiated compared with the luminous point SP from the light beam LBn (LB1~LB6) for describing head 16 is placed in (by retouching The region that line drawing SL1~SL6 is surrounded) more by the upstream side (-X direction side) of the conveyance direction of substrate P.

Aligming microscope AMm (AM1~AM4) has：Light source will be projected to substrate P to mutatis mutandis illumination light；Observe light System (include object lens), obtain the surface of substrate P comprising label MKm regional area (viewing area) Vwm (Vw1~ Vw4 intensified image)；And the photographing elements such as CCD, CMOS, Deng during substrate P is mobile in conveyance direction, to be removed with substrate P The corresponding high-speed shutter of speed Vt is sent to shoot the intensified image.The camera shooting of multiple aligming microscope AMm (AM1~AM4) respectively shot Signal (image data) is sent to control device 18.Control device 18 is by carrying out the image solutions of the multiple image pickup signals sent Analysis, and detect the position (marker location information) of the label MKm (MK1~MK4) in substrate P.Furthermore it is to mutatis mutandis illumination light Light, such as 500~800nm of wavelength for not having the wavelength region of sensitivity substantially relative to the photonasty functional layer in substrate P are left Right light.

Multiple label MK1~MK4 are set to around each exposure area W.Marking MK1, MK4 is in the base of exposure area W The two sides of the width direction of plate P along substrate P long dimension direction at regular intervals Dh be formed with it is multiple.Label MK1 is formed In the -Y direction side of the width direction of substrate P, MK4 is marked to be formed in the +Y direction side of the width direction of substrate P.Such label MK1, MK4 are configured to, in the state that substrate P is not affected by biggish tension or is heat-treated and is deformed, in the long ruler of substrate P Become same position on very little direction (X-direction).Further, mark MK2, MK3 between label MK1 and label MK4 and exposure region The +X direction side of domain W and the gutter of -X direction side are formed along the width direction (short dimensional directions) of substrate P.Mark MK2 shape At the -Y direction side of the width direction in substrate P, MK3 is marked to be formed in the +Y direction side of substrate P.

Further, the Y-direction of the label MK1 of the end of the -Y direction side of substrate P and the label MK2 of gutter are arranged in Interval, gutter label MK2 with mark MK3 Y-direction interval and be arranged in substrate P +Y direction side end mark The interval of the Y-direction of the label MK3 of note MK4 and gutter is set as same distance.Equal label MKm (MK1~MK4) can be in It is formed together when forming the 1st layer pattern layer.For example, can be when exposing 1 layer pattern, in the exposure area W's for exposing patterns Surrounding also exposes the pattern of label MKm together.Furthermore label MKm can be also formed in the W of exposure area.For example, also can be in exposure It is formed in the W of light region and along the profile of exposure area W.Also, can also will be formed in the pattern of the electronic device in the W of exposure area In commitment positions pattern part or set shape the part MKm that marks.

As shown in figure 3, aligming microscope AM1 is to shoot the mark in viewing area (detection zone) Vw1 for being present in object lens The mode of note MK1 configures.Similarly, aligming microscope AM2~AM4 is to shoot in the viewing area Vw2~Vw4 for being present in object lens The mode of label MK2~MK4 configure.Therefore, multiple aligming microscope AM1~AM4 are the positions with multiple label MK1~MK4 It sets accordingly, the -Y direction side of self-reference substrate P is arranged with the sequence of AM1~AM4 along the width direction of substrate P.

Multiple aligming microscope AMm (AM1~AM4) are arranged to, in X-direction, exposure position (describe line SL1~ SL6) length of the X-direction at a distance from viewing area Vwm (Vw1~Vw4) compared with exposure area W is short.Furthermore it is set to Y-direction The quantity of aligming microscope AMm can be changed according to the quantity of the label MKm for the width direction for being formed in substrate P.Also, each see Examining the size on the plane of illumination of the substrate P of region Vwm (Vw1~Vw4) is the size or alignment essence according to label MK1~MK4 It spends (positional accuracy measurement) and sets, be the size of 100~500 μm of square or so.

Furthermore in this 1st implementation form, in the description line in X-direction, making odd number scanning element U1, U3, U5 Position proximity of description line SL2, SL4, the SL6 of SL1, SL3, SL5 and even number scanning element U2, U4, U6 in substrate P, Therefore, multiple aligming microscope AM (AM1~AM4) are configured in the upstream side for describing line SL1, SL3, SL5.However, in surprise The description line SL2 for describing line SL1, SL3, SL5 and even number scanning element U2, U4, U6 of number scanning element U1, U3, U5, SL4, SL6, also can be with (substrates along the X direction when the position in substrate P is separated by the situation of both set a distances or more in circumferencial direction The conveyance direction of P) configuration odd number scanning element U1, U3, U5 and even number scanning element U2, U4, U6 it is corresponding and divide Multiple aligming microscope AMm (AM1~AM4) are not set.Also that is, in X-direction, describe line SL1, SL3, SL5 in odd number The same position of upstream side multiple aligming microscope AM (AM1~AM4) are set along the Y direction into 1 row, and in X-direction On, it will in the same position that even number describes the downstream side of line SL1, SL3, SL5 and the upstream side of description line SL2, SL4, SL6 Multiple aligming microscope AM (AM1~AM4) are set along the Y direction into 1 row.

As shown in Fig. 2, being provided with the whole shape of the circumferencial direction of the outer peripheral surface throughout rotating cylinder DR in the both ends of rotating cylinder DR As cricoid tool graduated scale portion SDa, SDb.SDa, SDb are in the circumferencial direction of the outer peripheral surface of rotating cylinder DR in the scale portion The diffraction grating for being equipped with grid line (scale) concavely or convexly is carved with fixed spacing (for example, 20 μm), and is configured to incremental Scale.Scale portion SDa, the SDb is integrally rotated around central axis AXo with rotating cylinder DR.As reading scale portion SDa, SDb Scale read head multiple encoder head EN1a~EN3a, EN1b~EN3b by with the scale portion SDa, SDb it is opposite in a manner of It is arranged (referring to Fig.1, Fig. 2).

Encoder head ENja, ENjb are the measuring light beams of each projection to scale portion SDa, SDb and optical detection rotating cylinder The rotary angle position of DR.With the opposite ground scale portion SDa of the end for the -Y direction side for being set to rotating cylinder DR, it is provided with 3 volumes Code device head ENja (EN1a, EN2a, EN3a).Similarly, with SDb pairs of the scale portion of the end for the +Y direction side for being set to rotating cylinder DR Xiang Di is provided with 3 encoder head ENjb (EN1b, EN2b, EN3b).

Encoder head EN1a, EN1b are the upstream side (- X for being disposed relative to the conveyance direction that median plane Poc is substrate P Direction side), and (referring to Fig.1, Fig. 2) is configured on rhumb line Lx1.Rhumb line Lx1 becomes in link encoder head in XZ plane The line in launching position (reading position) and central axis AXo on scale portion SDa, SDb of the measurement light beam of EN1a, EN1b. Also, rhumb line Lx1 become in link in XZ plane each aligming microscope AMm (AM1~AM4) viewing area Vwm (Vw1~ Vw4) with the line of central axis AXo.Also that is, multiple aligming microscope AMm (AM1~AM4) are also configured on rhumb line Lx1.

Encoder head EN2a, EN2b are the upstream side (- X for being disposed relative to the conveyance direction that median plane Poc is substrate P Direction side), and it is set to the downstream side (+X direction side) that the conveyance direction of substrate P is more leaned on compared with encoder head EN1a, EN1b.Coding Device head EN2a, EN2b are configured on rhumb line Lx2 (referring to Fig.1, Fig. 2).Rhumb line Lx2 becomes in link encoder in XZ plane The measurement light beam of head EN2a, EN2b in launching position (reading position) and central axis AXo on scale portion SDa, SDb Line.

Encoder head EN3a, EN3b are the downstream side (+X for being disposed relative to the conveyance direction that median plane Poc is substrate P Direction side), and (referring to Fig.1, Fig. 2) is configured on rhumb line Lx3.Rhumb line Lx3 becomes in link encoder head in XZ plane The line in launching position (reading position) and central axis AXo on scale portion SDa, SDb of the measurement light beam of EN3a, EN3b.

Furthermore in it is corresponding with even number scanning element U2, U4, U6 and by multiple aligming microscope AMm (AM1~AM4) When being configured to the situation of 1 row along the Y direction, in another on the rhumb line Lx4 for multiple aligming microscope AMm (AM1~AM4) are arranged Row setting encoder head EN4a, EN4b.When this situation, aligming microscope AMm (AM1~AM4) and encoder head EN4a, EN4b It is set between odd number scanning element U1, U3, U5 and even number scanning element U2, U4, U6.Furthermore certainly, rhumb line Lx4 is the line by central axis AXo.

Each encoder head ENja (EN1a~EN3a), ENjb (EN1b~EN3b) towards scale portion SDa, SDb by projecting Measurement light beam and Photoelectric Detection its reflected beams (diffraction light), and will be defeated as the detection signal (diphase signal) of pulse signal Out to control device 18.Control device 18 passes through the detection signal (diphase signal) to each encoder head ENja (EN1a~EN3a) It carries out interpolation processing and is counted the amount of movement of the grid of scale portion SDa, SDb by digit counter, and with secondary micron Resolution measurement rotating cylinder DR rotary angle position and angle change.According to the angle change of rotating cylinder DR, pass through number The frequency (or period) for the pulse signal that counter counts also can measure the conveying speed Vt of substrate P.

Any of the digital count value of detection signal (diphase signal) based on each for coming self-encoding encoder head EN1a, EN1b Person or its average value are used as the rotary angle position of the rotating cylinder DR observed from rhumb line Lx1.Similarly, it is based on encoder head Any one or average value of the digital count value of each of EN2a, EN2b are used as the rotation from the rhumb line Lx2 rotating cylinder DR observed Angle position, any one or average value of the digital count value of each based on encoder head EN3a, EN3b are used as from rhumb line The rotary angle position of the rotating cylinder DR of Lx3 observation.Furthermore except the foozle etc. because of rotating cylinder DR causes rotating cylinder DR relative to center Other than the situation that axis AXo is eccentrically rotated, the digital count value in principle based on encoder head EN1a, EN1b each is set as identical. In the same way, the digital count value based on encoder head EN2a, EN2b each is also set as identical, is based on encoder head The digital count value of each of EN3a, EN3b is also set as identical.

By using by multiple aligming microscope AMm (AM1~AM4), scale portion SDa, SDb and multiple encoder heads ENja (EN1a~EN3a), ENjb (EN1b~EN3b) constituted to Barebone, can accurately grasp the conveying shape of substrate P State (whether crooked), the position of the position of exposure area W, description line SL1~SL6 in substrate P etc..In this way, for will Multiple encoder head ENja (EN1a~EN3a), ENjb (EN1b~EN3b) are configured at and are formed as cricoid scale along barrel surface Composition around portion SDa, SDb, for example, being disclosed in No. 2013/146184 bulletin of International Publication No..

Secondly, being simply illustrated using composition of the Fig. 4 to light beam switching part BDU.Light beam switching part BDU is for example such as state As border discloses and is explained in detail in No. 2015/166910 bulletin, have multiple selections with optical element AOMn (AOM1~ AOM6), multiple reflecting mirror M1~M3, multiple incidence mirror IMn (IM1~IM6) and absorber TR.Selection optical element AOMn (AOM1~AOM6) is to light beam LB with permeability person, and is the acousto-optic varying element (AOM driven by ultrasonic signals： Acousto-Optic Modulator).Multiple selection optical element AOMn (AOM1~AOM6) and multiple incident mirror IMn (IM1~IM6) is arranged in correspondence with multiple scanning element Un (U1~U6).For example, selection optical element AOM1 and incidence Mirror IM1 is arranged in correspondence with scanning element U1, similarly, selection optical element AOM2~AOM6 and incident mirror IM2~IM6 It is to be arranged in correspondence with respectively with scanning element U2~U6.

Light beam LB from light supply apparatus 14 is bent its optical path by reflecting mirror M1~M3 and guides to absorber TR. Hereinafter, with selection being the feelings of off-state (state for not applying ultrasonic signals) with optical element AOMn (AOM1~AOM6) Shape is described in detail.

Light beam LB and X-axis from light supply apparatus 14 advance in +X direction in parallel and are incident to reflecting mirror M1.In reflection After the light beam LB that mirror M1 is reflected to +Y direction is directed through selection optical element AOM1, AOM3, AOM5 with the sequence, arrive Reach reflecting mirror M2.Reflecting mirror M3 is incident in the light beam LB that reflecting mirror M2 is reflected to +X direction.In reflecting mirror M3 to -Y direction After the light beam LB of reflection is directed through selection optical element AOM2, AOM4, AOM6 with the sequence, it is directed to absorber TR.Absorber TR is to inhibit light beam LB to absorb the ligh trap of light beam LB to external leakage.

If each selection optical element AOMn is applied ultrasonic signals (high-frequency signal), generation makes incidence be light beam (0 Secondary light) LB is using the resulting 1 diffraction light of diffraction angle diffraction corresponding with the frequency of high frequency as outgoing beam (light beam LBn).Cause This, learns the light beam that element AOM1 is projected as 1 diffraction light and becomes LB1, similarly, use up member from selection from selecting to use up The light beam that part AOM2~AOM6 is projected as 1 diffraction light becomes LB2~LB6.In this way, each selection optical element AOMn (AOM1~AOM6) plays the function of being biased to the optical path of the light beam LB from light supply apparatus 14.But actual acousto-optic modulation The generation efficiency of 1 diffraction light of element is 80% or so of 0 light, therefore, passes through each selection optical element AOMn (AOM1 ~AOM6) each and the strength reduction of the light beam LBn (LB1~LB6) that is biased to more original light beam LB.Also, being used up in selection Learn element AOMn (AOM1~AOM6) any one be on state when, non-diffraction and keep straight on 0 light residual 20% or so, but It is finally absorbed by absorber TR.

As the light beam LBn (LB1 by selection with optical element AOMn (AOM1~AOM6) 1 diffraction light being biased to ~LB6) it is projected to corresponding incidence mirror IMn (IM1~IM6).Incident mirror IMn (IM1~IM6) is by incident light beam LBn (LB1~LB6) is guided to the light conducting member of corresponding scanning element Un (U1~U6).For example, passing through selection optical element AOM1 and the light beam LB1 being biased to is incident to after incident mirror IM1, be directed to scanning element U1.

The mutually the same persons such as composition, function, effect can be used with optical element AOMn (AOM1~AOM6) in each selection.It is multiple Selection leads on/off according to the driving signal (high-frequency signal) for carrying out self-control device 18 with optical element AOMn (AOM1~AOM6) The generation ON/OFF opened, and the incident resulting diffraction light of light beam LB diffraction will be made.For example, selection optical element AOM1 In being not applied to the driving signal for carrying out self-control device 18 (high-frequency signal) when being the state disconnected, then incident come from is not made The light beam LB diffraction of light supply apparatus 14 and pass it through.Therefore, choosing is incident to the light beam LB of optical element AOM1 through selection It selects with optical element AOM3.On the other hand, selection optical element AOM1 is in the driving signal for being applied to self-control device 18 (high-frequency signal) and when being on state, then make incident light beam LB diffraction and towards incident mirror IM1.Also that is, according to the driving Signal, selection are switched to conducting with optical element AOM1.In this manner, by by multiple selections optical element AOMn Any one of (AOM1~AOM6) is switched to conducting, can guide light beam LBn to any scanning element Un, and changeable for light The scanning element Un of beam LBn incidence.In this 1st implementation form, by for the scanning element Un of light beam LBn incidence with U1 → U2 → U3 → U4 → U5 → U6 sequence switches over, therefore, as long as the selection of conducting will be switched to optical element AOMm with AOM1 → AOM2 → AOM3 → AOM4 → AOM5 → AOM6 sequence switches over.Furthermore in example shown in Fig. 4, indicating will Selection is switched to the state for being connected and light beam LB6 being made to be incident to scanning element U6 with optical element AOM6.

Fig. 5 is to indicate selection with the figure specifically constituted around optical element AOMn and incident mirror IMn.In principle, it selects It selects mutually the same with the composition around optical element AOMn and incident mirror IMn, therefore, only to selection optical element AOM1 and enters The composition penetrated around mirror IM1 is illustrated.

There is the parallel of the small diameter (the 1st diameter) of 1mm or so for selection optical element AOM1, such as incidence The light beam LB of light beam.(driving signal is disconnected when not inputting the state as the driving signal of high-frequency signal (ultrasonic signals) Open), selection optical element AOM1 make incident light beam LB not diffraction and be directed through.It is penetrated through light beam LB and is set to its light The collector lens G1 and collimation lens G2a of road and the selection optical element AOM3 for being incident to back segment.Selection will be passed through at this time The optical axis (central axis) of light beam LB with optical element AOM1 by collector lens G1 and collimation lens G2a is set as AXa.Optically focused Lens G1 will transmit through the light beam LB of selection optical element AOM1 in the rear side between collector lens G1 and collimation lens G2a Focus optically focused.Collimation lens G2a makes the light beam LB by dissipating after collector lens G1 optically focused become collimated light beam.Pass through standard Straight lens G2a and the diameter for becoming the light beam LB of collimated light beam becomes the 1st diameter.The rear side focus and collimation of collector lens G1 is saturating The front side focus of mirror G2a is in consistent in set permissible range.Collector lens G1 and collimation lens G2a constitutes the relaying of equimultiple Lens system.Also, the front side focus of collector lens G1 is with the deviation position that is generated with optical element AOM1 by selection in set Permissible range in it is consistent.In Fig. 5, the distance of the front side focus of collector lens G1 is indicated with fa, and rear side focus is indicated with fb Distance.

On the other hand, when incidence has the state as the driving signal of high-frequency signal, selection is produced with optical element AOM1 It is raw to make incident light beam LB with the light beam LB1 (1 diffraction light) of diffraction angular divergence corresponding with the frequency of high-frequency signal.With with height The corresponding diffraction angle of the frequency of frequency signal is incident to through collector lens G1 towards the light beam LB1 that -Z direction is biased to and is set to optically focused The incident mirror of the position of the rear side focus of lens G1 or the position near it (is penetrated, so also known as due to falling light beam towards -Z direction Mirror is penetrated to fall) IM1.Collector lens G1 is with the optical axis of optical axis (central axis) AXb and light beam LB of the light beam LB1 being biased to towards -Z direction AXa parallel mode is bent light beam LB1 and makes light beam LB1 on the reflecting surface of incident mirror IM1 or its neighbouring optically focused (convergence). By relative to through selection with the light beam LB of optical element AOM1 and be set to the incident mirror IM1 of -Z direction side and towards -Z direction The light beam LB1 of reflection is incident to scanning element U6 via collimation lens G2b.Collimation lens G2b will pass through collector lens G1 The collimated light beam of diameter identical with the 1st diameter is set as by the light beam LB1 of the rear diverging of optically focused.The rear side focus of collector lens G1 Front side focus with collimation lens G2b is in consistent in set permissible range.Collector lens G1 and collimation lens G2b composition etc. Relay lens system again.

Secondly, being illustrated using the composition of Fig. 6, Fig. 7 to scanning element (light-beam scanner) Un.Each scanning element Un (U1~U6) is therefore identical composition is only simply illustrated scanning element U1.The structure of the expression scanning element U1 of Fig. 6 At perspective view, figure when observing scanning element U1 shown in fig. 6 from +Y direction of Fig. 7.Scanning element U1 has cylindrical lens CY1, the wave plate of polarization spectroscope PBS, λ/4 QP, polygonal mirror (movable reflecting member) PM, cylindrical lens CY2, reflecting mirror M10, f θ are saturating Mirror FT, reflecting mirror M11 and cylindrical lens CY3.

In the light beam LB1 for the collimated light beam that incidence mirror (light conducting member) IM1 shown in fig. 5 is reflected towards -Z direction by not scheming The beam expander optical system of formula and be converted to set diameter widened compared with the 1st diameter (for example, 1mm or so) (for example, number mm) Collimated light beam after, be incident to scanning element U1 along the optical axis AX1 parallel with Z axis.It is incident to the light beam of scanning element U1 LB1 (hereinafter, sometimes referred to as incident beam LB1a) has the cylindrical lens of bus in Y-direction by being set on optical axis AX1 (the 2nd optical component) CY1 and be incident to polarization spectroscope PBS.The polarization separation face Qs of polarization spectroscope PBS is relative to X/Y plane 45 degree of inclination, penetrates the light of P-polarized light, and reflects the rectilinearly polarized light (S-polarization polarized along the direction orthogonal with P-polarized light Light) light.Since the light beam LB that light supply apparatus 14 projects is P-polarized light, so polarization point is incident to via cylindrical lens CY1 The light of light microscopic PBS is along optical axis AX1 through polarization spectroscope PBS and through the -Z direction side for being set to polarization spectroscope PBS After the wave plate of λ/4 QP, it is directed to the reflecting surface RP of polygonal mirror PM.Furthermore the wave plate of polarization spectroscope PBS and λ/4 QP is constituted Light splitting member.

Polygonal mirror PM is that have rotary shaft AXp and be formed parallel to rotary shaft AXp multiple around rotary shaft AXp The polygonal rotating mirror of reflecting surface RP (the quantity Np of reflecting surface RP is set as 8 in this 1st implementation form).Polygonal mirror PM be configured to Rotary shaft AXp orthogonal plane tilts 45 degree relative to X/Y plane, so that being incident to polygonal mirror PM's from polarization spectroscope PBS The reflecting mirror M10 of the incident beam LB1a of reflecting surface RP towards the position for the -X direction side for being set to polygonal mirror PM reflects.Multi-panel Mirror PM centered on rotary shaft AXp in order to rotate the luminous point SP of light beam LB1 in scanning on the plane of illumination of substrate P.It can lead to Crossing makes polygonal mirror PM make the pulse type for exposing to reflecting surface RP in set direction of rotation rotation centered on rotary shaft AXp The angle of reflection of light beam LB1a continuously change.Thereby, light beam LB1 can be made to be biased to by 1 reflecting surface RP, and base will be exposed to The luminous point SP of light beam LB1 on the plane of illumination of plate P is scanned along main scanning direction (width direction, the Y-direction of substrate P).Therefore, In polygonal mirror PM rotation turn around when, on the plane of illumination of substrate P along describe line SL1 scanning point SP number maximum become 8 times identical with the quantity of reflecting surface RP.Furthermore polygonal mirror PM passes through rotary driving source (example under the control of control device 18 Such as, motor etc.) RM1 (referring to Fig.1 0) and rotated with fixed speed.

Polygonal mirror PM in make in the face parallel with X/Y plane comprising the optical axis AX2 set in parallel with X-axis from polarize point The incident beam LB1a of light microscopic PBS incidence is biased to, and is biased to centered on optical axis AX2 in Y-direction.Cylindrical lens CY1 along Y The bus that direction extends is located in the plane (plane parallel with X/Y plane) that incident beam LB1a is polarized.The optical axis AX2 is orthogonal with optical axis AX1, and include optical axis AX1, AX2 and rotary shaft AXp plane it is parallel with XZ plane.

In Y-direction have bus cylindrical lens (the 2nd optical component) CY1 with the main scanning direction based on polygonal mirror PM In (direction is biased in direction of rotation) orthogonal non-scan direction (direction of Z-direction or rotary shaft AXp), make incident light beam LB1 It is restrained on the reflecting surface RP of polygonal mirror PM.Also that is, cylindrical lens CY1 converges to light beam LB1 in Y-direction on reflecting surface RP The slit-shaped (long ellipticity) of extension.Furthermore in Y-direction there is the cylindrical lens CY1 of bus to sweep in the master based on polygonal mirror PM It retouches and incident incident beam LB1a is not restrained and penetrates it as directional light on direction (being biased to direction).

By the reflecting surface RP of polygonal mirror PM towards -X direction lateral reflection incident beam LB1a reflected light (hereinafter, having When referred to as the 1st the reflected beams LB1b) reflecting mirror M10 is incident to by cylindrical lens (the 1st optical component) CY2.In reflecting surface RP reflection the 1st the reflected beams LB1b in the non-scan direction (Z-direction) orthogonal with the main scanning direction based on polygonal mirror PM, It dissipates on one side, is incident to cylindrical lens CY2 on one side, but by becoming parallel in cylindrical lens CY2 of the Y-direction with bus Light.Therefore, the 1st the reflected beams LB1b of reflecting mirror M10 is incident to as the incident beam with cylindrical lens CY1 to be incident to The collimated light beam of LB1a roughly the same diameter.Furthermore the front side focus of the rear side focus of cylindrical lens CY1 and cylindrical lens CY2 In on the reflecting surface RP of the polygonal mirror PM for incident beam LB1a incidence in consistent in set permissible range.

Reflecting mirror M10 is by the 1st the reflected beams LB1b initially reflected by the reflecting surface RP of polygonal mirror PM again towards multi-panel The reflecting surface RP of mirror PM reflects.By the reflected light of reflecting mirror M10 the 1st the reflected beams LB1b reflected (hereinafter, the sometimes referred to as the 2nd The reflected beams LB1c) it is incident to the reflecting surface RP of original reflection incident beam LB1a.Hereinafter, in order to be readily appreciated that explanation, with RPa indicates the reflecting surface RP of the polygonal mirror PM for the incident beam LB1a incidence through polarization spectroscope PBS.Therefore, anti-by the 1st Irradiating light beam LB1b is incident towards the reflecting mirror M10 reflecting surface RP reflected and the 2nd the reflected beams LB1c for being reflected by reflecting mirror M10 Reflecting surface RP become reflecting surface RPa together.Pass through cylindrical lens CY2 in the 2nd the reflected beams LB1c of reflecting mirror M10 reflection It is incident to reflecting surface RPa.Therefore, the 2nd the reflected beams LB1c for being again incident on reflecting surface RPa passes through cylindrical lens CY2 In the non-scan direction (side of Z-direction or rotary shaft AXp orthogonal with main scanning direction (being biased to direction) based on polygonal mirror PM To) on restrain on reflecting surface RPa.Also that is, cylindrical lens CY2 by the 2nd the reflected beams LB1c in converged on reflecting surface RPa in The slit-shaped (long ellipticity) that Y-direction extends.It non-is swept orthogonal with the main scanning direction (be biased to direction) based on polygonal mirror PM Retouch on direction (direction of Z-direction or rotary shaft AXp), the convergence position on the reflecting surface RPa based on cylindrical lens CY1 be based on Convergence position on the reflecting surface RPa of cylindrical lens CY2 is set as same position.Also that is, being swept with the master based on polygonal mirror PM It retouches in the orthogonal non-scan direction (direction of Z-direction or rotary shaft AXp) in direction (being biased to direction), is initially incident to reflecting surface The position of the incident beam LB1a of RPa and the position of (the 2nd time) again the 2nd incident the reflected beams LB1c are set at essentially identical Position.Thereby, the thickness (length in the direction rotary shaft AXp) of polygonal mirror PM can be made relatively thin.Also, flat by bus and Y-direction Capable cylindrical lens CY1, CY2 and following cylindrical lens CY3, even if the direction there are reflecting surface RPa relative to rotary shaft AXp Inclined situation also can inhibit its influence.For example, can inhibit the luminous point SP of the light beam LB1 on the plane of illumination for exposing to substrate P The irradiation position of (describe line SL1) deviates due to each reflecting surface RP of polygonal mirror PM respective small slope error in X-direction. Furthermore reflecting mirror M10 and cylindrical lens CY2 constitutes reflective optics again.

The reflecting surface RPa of polygonal mirror PM is anti-towards +Z direction side by the 2nd the reflected beams LB1c reflected by reflecting mirror M10 It penetrates.Polygonal mirror PM in make comprising the optical axis AX1 parallel with Z axis and in the face parallel with YZ plane self-reflection mirror M10 it is incident the 2nd The reflected beams LB1c is biased to.By polygonal mirror PM reflecting surface RPa again the 2nd the reflected beams LB1c of secondary reflection reflected light (hereinafter, Sometimes referred to as the 3rd the reflected beams LB1d) it is again incident on polarization spectroscope PBS.Herein, in polygonal mirror PM and polarization spectroscope It is provided with the wave plate QP of λ/4 between PBS, therefore, the light of the reflecting surface RPa of polygonal mirror PM is incident to through polarization spectroscope PBS Beam LB1a is converted to the light of circularly polarized light from P-polarized light.Also, reflecting and being again incident on partially in the reflecting surface RPa of polygonal mirror PM The light beam LB1d of vibration spectroscope PBS is converted to the light of S polarized light from circularly polarized light.Therefore, the 3rd the reflected beams LB1d passes through opposite In X/Y plane tilt the polarization separation face Qs of 45 degree of polarization spectroscope PBS and towards +X direction lateral reflection.

Being incident to by the 3rd the reflected beams LB1d that polarization separation face Qs is reflected towards +X direction side has the light parallel with X-axis The f θ lens FT of axis AXf.F θ lens FT be the 3rd the reflected beams LB1d that will be reflected by polygonal mirror PM in comprising optical axis AXf and with The telecentric system of reflecting mirror M11 (finally for substrate P) is projected in the parallel face of X/Y plane in the mode parallel with optical axis AXf Scanning lens.F θ lens FT will be projected to the 3rd the reflected beams of reflecting mirror M11 (being finally substrate P) centered on optical axis AXf LB1d is scanned in Y-direction.Light beam LB1 changes to the incidence angle θ of f θ lens FT according to the rotation angle (θ/4) of polygonal mirror PM.fθ Light beam LB1 (LB1d) is projected to the base directly proportional to the incidence angle θ via reflecting mirror M11 and cylindrical lens CY3 by lens FT Image height position on the plane of illumination of plate P.If focal length is set as fo and image height position is set as y, f θ lens FT is with full The mode of the relationship (distortion aberration) of sufficient y=fo × θ designs.Therefore, can by the f θ lens FT by light beam LB1 in the side Y To being accurately scanned with constant speed.Plane comprising optical axis AX1, AX2, AXf is parallel with XZ plane, in entering to f θ lens FT When firing angle θ is 0 degree, the chief ray for being incident to the light beam LB1 (LB1d) of f θ lens FT advances on optical axis AXf.

Furthermore in this 1st implementation form, reflect light beam LB1 twice in the reflecting surface RPa of polygonal mirror PM, therefore, light Beam LB1 becomes 4 times of the rotation angle of polygonal mirror PM to the incidence angle θ of f θ lens FT.However, in making light beam LB1 reflex to multi-panel The reflecting surface RPa of mirror PM only 1 situation when, rotation angle of the light beam LB1 to the incidence angle θ of f θ lens FT as polygonal mirror PM 2 times.Therefore, twice by the reflecting surface RPa that makes light beam LB1 reflex to polygonal mirror PM, the scanning speed of luminous point SP can be set as 2 Times.The situation is described in detail below using Fig. 8.

In reflecting mirror M10 reflect and be incident to the 2nd the reflected beams LB1c of polygonal mirror PM with the master based on polygonal mirror PM In the orthogonal non-scan direction (Z-direction) in scanning direction (being biased to direction), received by cylindrical lens CY2 on reflecting surface RPa It holds back.Therefore, in reflecting surface RPa reflect and the 3rd the reflected beams LB1d towards f θ lens FT is swept with the master based on polygonal mirror PM It retouches in the orthogonal non-scan direction (Z-direction) in direction (being biased to direction), dissipates on one side, be incident to f θ lens FT on one side.Another party Face is reflected in reflecting mirror M10 and is incident to the 2nd the reflected beams LB1c of polygonal mirror PM in the main scanning direction based on polygonal mirror PM Become directional light on (being biased to direction).Therefore, it reflects in reflecting surface RPa and exists towards the 3rd the reflected beams LB1d of f θ lens FT Become collimated light beam on main scanning direction (being biased to direction) based on polygonal mirror PM.

F θ lens FT is in the non-scan direction (Z-direction) orthogonal with main scanning direction (being biased to direction) based on polygonal mirror PM On make diverging, while incident the 3rd the reflected beams LB1d become roughly parallel light.F θ lens FT is based on polygonal mirror PM's Make the 3rd the reflected beams LB1d of incident directional light in restraining in substrate P on main scanning direction (be biased to direction).Therefore, f θ is saturating The front side focus of mirror FT is located at on the reflecting surface RPa of the polygonal mirror PM of light beam LB (LB1a, LB1c) incidence, rear side focus is located at In substrate P.Through f θ lens FT light beam LB1d bent by reflecting mirror M11 after, by Y-direction have bus column Face lens (the 3rd optical component) CY3 and to reaching substrate P.Reflecting mirror M11 is in XZ plane, with the light of the 3rd the reflected beams LB1d The mode that axis is Chong Die with rhumb line Lx2 and advances reflects the 3rd the reflected beams LB1d towards substrate P.Cylindrical lens CY3 with base In in the orthogonal non-scan direction (Z-direction) of the main scanning direction (being biased to direction) of polygonal mirror PM, make through the flat of f θ lens FT 3rd the reflected beams LB1d of row light in substrate P in restraining.Therefore, the light beam LB1 for being projected to substrate P passes through f θ lens FT and column Face lens CY3 and in converging to luminous point SP in substrate P.Furthermore the rear side focus of cylindrical lens CY3 is located in substrate P.The f θ is saturating Mirror FT and cylindrical lens CY3 constitutes scanning optical system.

Furthermore in Fig. 7, with the chief ray of the light beam LB1d that is reflected by reflecting mirror M11 towards -Z direction (or f θ lens The optical axis AXf of FT) in the mode in the face parallel with XZ plane relative to Z axis tilt angle theta 1, configure reflecting mirror M11 and cylinder Lens CY3.The angle, θ 1 is corresponding with the slope angle ± θ 1 of rhumb line Lx2 (or Lx3) from median plane Poc shown in Fig. 1.Cause This, the reflecting surface (plane) of reflecting mirror M11 is arranged obliquely in a manner of becoming angle (45 ° of-θ/2) relative to X/Y plane.So And in the state for illustrating each of the scanning element Un (U1~U6) of Fig. 6, Fig. 7 certainly relative to the integral inclined angle, θ of X/Y plane When 1 situation, the reflecting surface of reflecting mirror M11 is configured to intersect with optical axis AXf with 45 °, so as to will be from the light beam of f θ lens FT The chief ray of LB1d in the face XZ with 90 ° reflect.

Secondly, Fig. 8 is said to the reflection angle of light beam LB1 when being reflected 2 times by the reflecting surface RPa of polygonal mirror PM It is bright.Furthermore in Fig. 8, schematically it is indicated to be readily appreciated that the optical path of light beam LB1, therefore, polygonal mirror PM, Polarization spectroscope PBS, the configuration of cylindrical lens CY2 and reflecting mirror M10 and Fig. 7, that shown in Figure 8 are slightly different.

In Fig. 8, by the angle for the reflecting surface RPa of the polygonal mirror PM of incident beam LB1a incidence relative to datum level Po Variable quantity is set as Δ θ.Datum level Po is set as comprising the rotary shaft AXp of polygonal mirror PM and parallel with along the face that Y-direction extends Face.Furthermore when the situation that reflecting surface RPa is 0 degree relative to the angle variable quantity Δ θ of datum level Po, enter along optical axis AX1 The incident beam LB1a for being incident upon the reflecting surface RPa of polygonal mirror PM is incident to reflecting mirror M10 along optical axis AX2.Therefore, in this feelings When shape, the reflecting surface RPa of polygonal mirror PM is incident to along optical axis AX2 in the 2nd the reflected beams LB1c that reflecting mirror M10 reflects, The 3rd the reflected beams LB1d reflected at this advances along optical axis AX1 to polarization spectroscope PBS, thereafter, in the light of f θ lens FT Pass through on axis AXf.Furthermore if observing in the optical path of light beam LB1, optical axis AX1, AX2, AXf are on the same axis.

The incident beam of the reflecting surface RPa of polygonal mirror PM is incident to through cylindrical lens CY1 and polarization spectroscope PBS The 1st the reflected beams LB1b of LB1a is with angle corresponding with angle variable quantity Δ θ to reflecting mirror M10 lateral reflection.At this point, flat in XY On face, 1st the reflected beams LB1b variable quantity relative to the incident angle of optical axis AX2 of the self-reflection face RPa towards reflecting mirror M10 As 2 × Δ θ.After being again incident on the reflecting surface RPa of polygonal mirror PM by the 2nd the reflected beams LB1c that reflecting mirror M10 reflects, It is guided via polarization spectroscope PBS to f θ lens FT.At this point, the 3rd the reflected beams LB1d is with corresponding with angle variable quantity Δ θ Angle is again reflected and is incident to f θ lens FT.Therefore, on X/Y plane, the 3rd the reflected beams LB1d is relative to f θ lens FT Optical axis AXf incident angle variable quantity become 4 × Δ θ.In this way, making light beam LB1a in the reflecting surface RPa the 1st of polygonal mirror PM The deviation angle of the 1st the reflected beams LB1b when secondary reflection becomes 2 times of the angle variable quantity Δ θ of the reflecting surface RPa of polygonal mirror PM, Reflecting surface is become by the deviation angle of the 3rd the reflected beams LB1d of the 2nd secondary reflection in reflecting surface RP (to the incidence angle of f θ lens FT) 4 times of the angle variable quantity Δ θ of RPa.Therefore, in the scanning of the description line SL1 of the luminous point SP of scanning light beam LB1 (LB1d) is long Degree is when being set as fixed situation, be allowed to reflect 1 time in reflecting surface RPa and compared with the situation that is scanned, if being allowed in reflection Face RPa is reflected 2 times and is scanned, then the rotation angle of polygonal mirror PM needed for effective scanning can be set as half.

Fig. 9 is the figure of the rotation angle of polygonal mirror PM needed for illustrating 1 scanning.Angle, θ m shown in Fig. 9 is polygonal mirror PM rotates the angle of 1 reflecting surface RP.In this 1st implementation form, polygonal mirror PM is the rotating multisurface with 8 reflecting surface RP Mirror, therefore, angle, θ m become 45 degree (=360 degree/8).During polygonal mirror PM rotates angle, θ m, luminous point is actually contributed to The angle, θ w of the scanning of SP is small compared with angle, θ m.Moreover, will make when the sweep length for describing line SL1 is set as fixed situation Reflected 1 time in reflecting surface RPa and the angle, θ w when situation of scanning point SP is set as θ w1, will be allowed to reflect in reflecting surface RPa 2 times and the angle, θ w when situation of scanning point SP is set as θ w2.Herein, angle, θ w1 is set as that 1 can will be reflected in reflecting surface RPa Secondary light beam (LB1a) is passed through to the angular range of f θ lens FT1.

As described above, becoming anti-to the incident angle of f θ lens FT in being allowed to when reflecting surface RPa reflects 1 situation 2 times for penetrating the angle variable quantity Δ θ of face RPa, if being allowed to reflect 2 times in reflecting surface RPa, to the incident angle of f θ lens FT Changing (deviation angle) becomes 4 times of angle variable quantity Δ θ of reflecting surface RPa, and therefore, angle, θ w1, θ w2 become θ w2=1/2 × θ w1.Therefore, if angle, θ w1 is for example set as 15 degree, when reflecting surface RPa is allowed to reflect 1 time and the situation of scanning point SP Reflecting surface RPa scan efficiency α 1 become degree/45 degree=1/3 α 1=θ w1/ θ m=15, be allowed to reflect 2 times in reflecting surface RPa And the scan efficiency α 2 of the reflecting surface RPa when situation of scanning point SP becomes degree/45 degree=1/6 α 2=θ w2/ θ m=7.5.

Therefore, in polygonal mirror PM reflecting surface RPa rotate 1 reflecting surface RP during, by selection with optical element AOM1~ AOM6 is sequentially switched to conducting one by one, thereby, can by for the scanning element Un of light beam LBn incidence for example with U1 → U2 → U3 → U4 The sequence of → U5 → U6 switches over.Also that is, since the rotation angle, θ w2 for facilitating actual scanning is 7.5 degree, so polygonal mirror PM rotates the rotation angle for being helpless to actual scanning in the angle (45 °) of 1 reflecting surface RP up to 37.5 degree, does not make light beam during this period LBn is incident to the polygonal mirror PM of scanning element U1, and becomes useless.Therefore, by being optionally switched during this is useless Light beam LBn simultaneously makes its timesharing be incident to other scanning elements U2~U6, can effectively apply flexibly light beam LBn.Furthermore it is single in each scanning The scanning that first Un (U1~U6) starts luminous point SP rises to before starting next scanning, and polygonal mirror PM rotates 45 degree.

Herein, multiple scanning element Un are for example in order to U1 → U2 → U3 → U4 → U5 → U6 sequential scan luminous point SP, It must make the polygonal mirror PM synchronous rotary of each scanning element Un (U1~U6), and its rotary angle position must become set phase Position relationship.Also, multiple selections of light beam switching part BDU must be cut with any of optical element AOMn (AOM1~AOM6) It is changed to conducting, light beam LBn can be made to be incident to scanning element Un during scanning point SP in scanning element Un.Hereinafter, using Figure 10 illustrates to be set to the schematically structure of the control circuit system in control device 18 shown in Fig. 1 to realize the situation At.

Firstly, being initially illustrated to the rotation control of the polygonal mirror PM of multiple scanning element Un (U1~U6).In respectively sweeping Unit Un (U1~U6) is retouched, origin sensor OPn (OP1~OP6) is provided with.Each origin sensor OPn (OP1~OP6) is if be The light that can begin through reflecting surface RP is come in the rotation position of the reflecting surface RP of the polygonal mirror PM of scanning element Un (U1~U6) The commitment positions of the scanning of point SP then generate the origin signal SZn (SZ1~SZ6) of pulse type.In other words, each origin sensor OPn (OP1~OP6) in next to carry out the reflecting surface RP of scanning of luminous point SP angle become set angle position when, It generates origin signal SZn (SZ1~SZ6).Since polygonal mirror PM has 8 reflecting surface RP, so origin sensor OPn (OP1~ OP6) in scanning element Un (U1~U6) polygonal mirror PM rotation turn around during, export 8 origin signal SZn (SZ1~ SZ6).The origin signal SZn (SZ1~SZ6) that each origin sensor OPn (OP1~OP6) generates is sent to control device 18 Polygonal mirror drive control part 20.Origin sensor OPn has：Light beam send photosystem opa, by the photosensitive sexual function to substrate P The laser beam Bga of the wavelength region of layer non-photo-sensing is projected relative to reflecting surface RP；And light beam receiving system opb, it is received in The reflected beams Bgb of the laser beam Bga (continuous luminous) of reflecting surface RP reflection simultaneously generates origin signal SZ1.

The polygonal mirror PM of each scanning element Un (U1~U6) by the inclusion of motor etc. rotary driving source RMn (RM1~RM6) Driving and rotated centered on rotary shaft AXp.Polygonal mirror drive control part 20 by control make each scanning element Un (U1~ U6 the rotary driving source RMn (RM1~RM6) of polygonal mirror PM rotation), and control the rotation of polygonal mirror PM.Polygonal mirror driving control Portion 20 processed is based on origin signal SZn (SZ1~SZ6), with the rotation angle of the polygonal mirror PM of multiple scanning element Un (U1~U6) Position becomes the mode of set phase relation, makes the polygonal mirror PM synchronous rotary of multiple scanning element Un (U1~U6).Also that is, With the rotation speed (revolution) of the polygonal mirror PM of multiple scanning element Un (U1~U6) is mutually the same and phase of rotary angle position Position deviates the mode of fixed angle one by one, controls the rotation of the polygonal mirror PM of multiple scanning element Un (U1~U6).

The angle, θ w2 for facilitating the actual scanning of luminous point SP is 7.5 degree in this implementation form, therefore, polygonal mirror driving Control unit 20 is staggered 7.5 degree of state one by one with the rotary angle position in the polygonal mirror PM of multiple scanning element Un (U1~U6) The mode of lower constant speed rotation, the rotation of the polygonal mirror PM of the multiple scanning element Un (U1~U6) of synchronously control.In this 1st implementation shape In state, the sequence of sequence that is, the scanning element Un of the scanning of progress luminous point SP for the scanning element Un of light beam LBn incidence is set For U1 → U2 → U3 → U4 → U5 → U6, therefore, with according to this sequentially by the more of each of multiple scanning element Un (U1~U6) Be staggered one by one 7.5 degree of mode of the rotary angle position of face mirror PM is controlled.

Specifically, polygonal mirror drive control part 20 is believed with the origin of the origin sensor OP1 of self-scanning in future unit U1 Number SZ1 is set as the side that benchmark makes the origin signal SZ2 delay time Ts of the origin sensor OP2 from scanning element U2 and generates Formula, the rotation of the polygonal mirror PM of synchronously control scanning element U2.Time Ts is the time needed for polygonal mirror PM rotates 7.5 degree. Also, polygonal mirror drive control part 20 makes the origin sensor OP3's from scanning element U3 so that origin signal SZ1 is set as benchmark Origin signal SZ3 delay 2 × time Ts and the mode that generates, the rotation of the polygonal mirror PM of synchronously control scanning element U3.With same The mode of sample, by origin signal SZ1 be set as benchmark make origin signal SZ4, SZ5, SZ6 each postpone 3 × time Ts, 4 × Time Ts, 5 × time Ts and the mode generated, the rotation of each polygonal mirror PM of synchronously control scanning element U4~U6.Furthermore it is more Face mirror drive control part 20 exports acquired origin signal SZ1~Z6 to AOM drive control part 22 shown in Fig. 10.

Secondly, being illustrated to by multiple selections with the time point that optical element AOMn (AOM1~AOM6) is switched to conducting. Multiple selections that AOM drive control part (light beam switching drive control part) 22 shown in Fig. 10 controls light beam switching part BDU are used up It learns element AOMn (AOM1~AOM6), in the scanning of luminous point SP since 1 scanning element Un to before next scanning, Light beam LB (LBn) timesharing from light supply apparatus 14 is sequentially distributed to 6 scanning element Un (U1~U6).

If being produced specifically, AOM drive control part 22 generates origin signal SZn (SZ1~SZ6) from origin signal SZn The set time (turn-on time Ton) is to right with the scanning element Un (U1~U6) of generation origin signal SZn (SZ1~SZ6) after life The selection answered applies driving signal (high-frequency signal) HFn (HF1~HF6) with optical element AOMn (AOM1~AOM6).Thereby, quilt The selection for applying driving signal (high-frequency signal) HFn becomes on state in turn-on time Ton with optical element AOMn, so as to Light beam LBn is set to be incident to corresponding scanning element Un.Also, due to making light beam LBn be incident to the scanning list of generation origin signal SZn First Un, so light beam LBn can be made to be incident to the scanning element Un that can carry out the scanning of luminous point SP.Furthermore turn-on time Ton It is the time Ts time below that polygonal mirror PM rotates 7.5 degree.

In 6 scanning element U1~U6 generate origin signal SZ1~SZ6 be with time Ts interval and with SZ1 → SZ2 → SZ3 → SZ4 → SZ5 → SZ6 sequence generates.Therefore, to multiple selections optical element AOM1~AOM6, with time Ts interval And driving signal (high-frequency signal) HFn is applied with HF1 → HF2 → HF3 → HF4 → HF5 → HF6 sequence.Therefore, can will for come From 1 scanning element Un of the light beam LBn incidence of light supply apparatus 14 with time Ts interval and with U1 → U2 → U3 → U4 → U5 → The sequence of U6 switches over, and multiple scanning element Un (U1~U6) can carry out the scanning of luminous point SP with the sequence.

Light supply apparatus 14 has control circuit 14a.Control circuit 14a controls the not shown of light supply apparatus 14 as follows Semiconductor Laser device, that is, clock signal LTC is generated with frequency of oscillation Fa, and clock signal LTC is responded and issues kind Light.The kind light for the infrared region that the semiconductor Laser device issues is amplified by fiber amplifier, and passes through wavelength convert Element and the pulsed light that the pulsed light of enlarged infrared wavelength region is converted to ultraviolet wavelength region.Purple made of the conversion The pulsed light of outer wavelength region is exported as light beam LB from light supply apparatus 14.Also, the light beam LB that light supply apparatus 14 projects becomes According to the pattern of 1 row (1 the describes line SLn) amount described by the scanning element Un for light beam LB (LBn) incidence by its intensity It is tuned as the light beam LBn of high levels and low level.For example, during light beam LBn is incident to scanning element U1, from light supply apparatus The intensity of the 14 light beam LB projected carries out intensity modulation according to the pattern of the 1 description line SL1 described by scanning element U1.It is such The composition of light supply apparatus 14 is disclosed in Japanese Unexamined Patent Publication 2015-210437 bulletin as described.Control circuit 14a generate when Arteries and veins signal LTC is output to the polygonal mirror drive control part 20 being set in control device 18, AOM drive control part 22 and control Device 24 processed.Polygonal mirror drive control part 20, AOM drive control part 22 and controller 24 are acted according to clock signal LTC.Again Person, controller 24 are all together control as control polygonal mirror drive control part 20, AOM drive control part 22 and light supply apparatus 14 Portion functions.Polygonal mirror drive control part 20 to controller 24, controls acquired origin signal SZn (SZ1~SZ6) output Scanning element Un (U1~U6) of the device 24 processed using origin signal SZn (SZ1~SZ6) to the scanning that next carry out luminous point SP It is managed.Then, next controller 24 will will carry out the discribed 1 row amount (light of scanning element Un of luminous point SP scanning 1 scanning amount of point SP) pattern-information export to light supply apparatus 14.Light supply apparatus 14 is with the period with clock signal LTC Corresponding temporal analytical density carries out modulation to the intensity of the light beam LB projected based on the pattern-information at high speed.

In this way, by the reflecting surface RPa for making polygonal mirror PM twice the reflected beams LBn and the luminous point SP of light beam LBn that polarizes is thrown It is incident upon in substrate P, therefore, the scanning speed of luminous point SP can be accelerated.Also, due to the scanning for the reflecting surface RP that can reduce polygonal mirror PM Efficiency, also that is, the rotation angle for facilitating the polygonal mirror PM of actual scanning can be reduced, so 1 reflection can be rotated in polygonal mirror PM Light beam LBn timesharing is distributed to more scanning element Un during the RP of face.Also, using cylindrical lens CY1, CY2, be based on It will most in the orthogonal non-scan direction (direction of Z-direction or rotary shaft AXp) of the main scanning direction (being biased to direction) of polygonal mirror PM The light beam LB1 and the position of (the 2nd time) again incident light beam LB1 for being just incident to reflecting surface RPa are set as identical position.By This, can make the thickness (length in the direction rotary shaft AXp) of polygonal mirror PM relatively thin.Therefore, polygonal mirror PM lightweight, polygonal mirror can be made The rotation speed of PM improves.

Also, the deviation angle (the rotation angle as illustrated in figure 9, when due to by polygonal mirror PM scanning light beam LBn (LB1d) Degree) θ w2 becomes half, so also become the 1/6 of half by the scan efficiency α 1 of 1 reflecting surface RPa of polygonal mirror PM, but in When scan efficiency α 1 remains 1/3 situation, since angle, θ m corresponding with the 1 of polygonal mirror PM reflecting surface RP can be set For half, so can be used the polygonal mirror of 16 reflecting surface RP as polygonal mirror PM.Further, in this implementation form, by Fig. 6, The reflecting surface of reflecting mirror M10 shown in Fig. 7 is set as the plane parallel with YZ plane and is illustrated, but can also be set as radius of curvature compared with The curved surface of big concave spherical surface shape or recessed cylinder planar.It can correct or delay by the way that the reflecting surface of reflecting mirror M10 is set as curved surface It is small with the Z-direction for the reflected beams LB1b that may be generated due to the reflecting surface RP of polygonal mirror PM and rotary shaft AXp are staggered Influence caused by change in location (describes the distortion etc. of line SLn).

[variation of the 1st implementation form]

1st implementation form can proceed as follows deformation.

(variation 1) Figure 11 is the composition figure for indicating the scanning element U1a in variation 1.Furthermore for the described 1st Implementation form similarly constitutes the identical symbol of note.Also, in this variation 1, structure identical with the scanning element U1a of Figure 11 At 6 scanning element Una (U1a~U6a) be also arranged with configuration as shown in Figure 2.Due to multiple scanning element Una (U1a~ U6a) become identical composition, so be illustrated for enumerating scanning element U1a.Scanning element U1a has reflecting mirror M12, column Face lens CY1, the wave plate of polarization spectroscope PBS, λ/4 QP, polygonal mirror PM, cylindrical lens CY2, reflecting mirror M10, f θ lens FT and Cylindrical lens CY3.Furthermore the polarization spectroscope wave plate of PBS and λ/4 QP constitutes light splitting member, cylindrical lens CY1 and reflecting mirror M10 Constitute reflective optics again.Also, f θ lens FT and cylindrical lens CY3 constitute scanning optical system.

It reflects and is enlarged to towards -Z direction by incidence mirror (penetrating mirror as falling for light conducting member) IM1 shown in fig. 5 The light beam LB1 of the collimated light beam of set diameter is incident to scanning element U1a along the optical axis AX1 parallel with Z axis.It is incident to and sweeps It retouches the light beam LB1 (hereinafter, sometimes referred to as incident beam LB1a) of unit U1a and passes through the reflecting mirror that is set on optical axis AX1 with 45 ° M12 and along the optical axis AX3 parallel with X-axis towards -X direction reflect.The incident beam reflected by reflecting mirror M12 towards -X direction LB1a via be set on optical axis AX3 in Y-direction have bus cylindrical lens CY1, the polarization spectroscope wave plate of PBS and λ/4 QP and the reflecting surface RPa for being incident to polygonal mirror PM.Furthermore it though being described in the 1st implementation form, is still to attached Band one says that light beam LB1 is the light of P-polarized light, and polarization spectroscope PBS penetrates the light of P-polarized light and reflects the light of S polarized light.

Polygonal mirror PM is configured to the plane orthogonal with the rotary shaft AXp of polygonal mirror PM and tilts relative to X/Y plane not up to 45 ° Small angle so that self-reflection mirror M12 is incident to the incident beam LB1a of the reflecting surface RPa of polygonal mirror PM towards setting Reflecting mirror M10 reflection in the position of the +Z direction side of the position and polarization spectroscope PBS of the +X direction side of polygonal mirror PM.Multi-panel Mirror PM is in comprising optical axis AX4 and relative to making the incident beam LB1a reflected in reflecting surface RPa in the inclined plane of X/Y plane Reflected light (hereinafter, the 1st the reflected beams LB1b) is biased to.The bus of cylindrical lens CY2 extended along Y-direction is located at the 1st reflection In the plane that light beam LB1b is polarized.Plane comprising optical axis AX1, AX3, AX4 and rotary shaft AXp is parallel with XZ plane.

In Y-direction have bus cylindrical lens CY1 with based on polygonal mirror PM main scanning direction (direction of rotation, partially To direction) make incident incident beam LB1a in polygonal mirror in orthogonal non-scan direction (direction of Z-direction or rotary shaft AXp) It is restrained on the reflecting surface RPa of PM.Also that is, cylindrical lens CY1 converges to incident beam LB1a in Y-direction on reflecting surface RPa The slit-shaped (long ellipticity) of extension.

It is incident to by the 1st the reflected beams LB1b that the reflecting surface RPa of polygonal mirror PM reflects by cylindrical lens CY2 Reflecting mirror M10.In the 1st the reflected beams LB1b that reflecting surface RPa reflects orthogonal with the main scanning direction based on polygonal mirror PM In non-scan direction (Z-direction) diverging, while be incident to cylindrical lens CY2, but the cylinder by having bus in Y-direction Lens CY2 and become directional light.Therefore, the 1st the reflected beams LB1b that be incident to reflecting mirror M10 becomes and cylinder to be incident to The collimated light beam of the incident beam LB1a of lens CY1 roughly the same diameter.Furthermore the rear side focus and column of cylindrical lens CY1 The front side focus of face lens CY2 on reflecting surface RPa in set permissible range it is consistent.

Reflecting mirror M10 is by the 1st the reflected beams LB1b initially reflected by the reflecting surface RPa of polygonal mirror PM again towards multi-panel The reflecting surface RPa of mirror PM reflects.In reflecting mirror M10 reflection the 1st the reflected beams LB1b reflected light (hereinafter, the sometimes referred to as the 2nd The reflected beams LB1c) reflecting surface RPa is incident to by cylindrical lens CY2.Therefore, it is incident to by cylindrical lens CY2 The 2nd the reflected beams LB1c of reflecting surface RPa is in the Non-scanning mode orthogonal with main scanning direction (being biased to direction) based on polygonal mirror PM It is restrained on (direction of Z-direction or rotary shaft AXp) on reflecting surface RPa in direction.Also that is, cylindrical lens CY2 is by the 2nd the reflected beams LB1c in converged on reflecting surface RPa in Y-direction extend slit-shaped (long ellipticity).With the main scanning based on polygonal mirror PM In the orthogonal non-scan direction (direction of Z-direction or rotary shaft AXp) in direction (being biased to direction), based on the anti-of cylindrical lens CY1 It penetrates the convergence position on the RPa of face and the convergence position on the reflecting surface RPa based on cylindrical lens CY2 and is set at essentially identical position It sets.Thereby, the thickness (length in the direction rotary shaft AXp) of polygonal mirror PM can be made relatively thin.

The reflecting surface RPa of polygonal mirror PM is anti-towards +X direction side by the 2nd the reflected beams LB1c reflected by reflecting mirror M10 It penetrates.Sometimes the 3rd reflected light will be known as by the reflected light of the reflecting surface RPa light beam LB1 (the 2nd the reflected beams LB1c) of secondary reflection again Beam LB1d.Polygonal mirror PM is in making the 3rd the reflected beams LB1d comprising the optical axis AX3 parallel with X-axis and in the face parallel with X/Y plane It is biased to, and is biased to centered on optical axis AX3 along Y-direction.By the 3rd reflected light of the reflecting surface RPa secondary reflection again of polygonal mirror PM Beam LB1d is incident to polarization spectroscope PBS.Due to being provided with the wave plate QP of λ/4 between polygonal mirror PM and polarization spectroscope PBS, therefore And by the reflecting surface RP of polygonal mirror PM again secondary reflection and the 3rd the reflected beams LB1d that is incident to polarization spectroscope PBS passes through polarization The polarization separation face Qs of spectroscope PBS and towards substrate P to -Z direction lateral reflection.Polarization separation face Qs is in XZ plane, with light The mode that the optical axis of beam LB1d is Chong Die with the optical axis AXf of rhumb line Lx2 and f θ lens FT and advances is towards f θ lens FT reflected light Beam LB1d.

F θ lens FT be the light beam LB1d that will be reflected by polygonal mirror PM chief ray in comprising optical axis AXf with XZ plane just The scanning lens of the telecentric system of substrate P is projected in the plane of friendship in the mode parallel with optical axis AXf.F θ lens FT will be with light The light beam LB1d that substrate P is projected to centered on axis AXf is scanned along Y-direction.Incidence angle θ from light beam LB1d to f θ lens FT according to more The rotation angle (θ/4) of face mirror PM and change.Light beam LB1d is projected to and the incidence angle by f θ lens FT via cylindrical lens CY3 Image height position on the plane of illumination of θ directly proportional substrate P.Also, being projected to substrate P by f θ lens FT and cylindrical lens CY3 Light beam LB1d in converging to luminous point SP in substrate P.Plane comprising optical axis AX1, AX3, AX4, AXf is parallel with XZ plane, and When being 0 degree to the incidence angle θ of f θ lens FT, the light beam LB1d for being incident to f θ lens FT advances on optical axis AXf.Furthermore f The front side focus of θ lens FT is located at on the reflecting surface RPa of the polygonal mirror PM of light beam LB incidence, rear side focus is located in substrate P. Also, the rear side focus of cylindrical lens CY3 is located in substrate P.In this variation 1, can also it play same with the 1st implementation form Deng effect, effect.Further, in this variation, the light beam LB1a or light beam of the reflecting surface RPa of polygonal mirror PM will be incident to The incident angle of LB1c is set as smaller than the situation of Fig. 6, Fig. 7 (incident angle is 45 °).Therefore, compared with the situation of Fig. 6, Fig. 7, The Z-direction of the reflected beams LB1b, LB1d for the generation that may be staggered because of the reflecting surface RP and rotary shaft AXp of polygonal mirror PM can be reduced Influence caused by small change in location (describes the degree of the distortion of line SLn).

(variation 2) Figure 12 is the reflecting surface RPa to make polygonal mirror PM in variation 2 the reflected beams LBn twice Constitute figure.Furthermore for similarly constituting the identical symbol of note with the 1st implementation form.By (not shown) in Y-direction Cylindrical lens with bus, the light beam LB1a for being incident to polygonal mirror PM (are biased to the main scanning direction based on polygonal mirror PM Direction) it is restrained on reflecting surface RPa in orthogonal non-scan direction (Z-direction).The light reflected by the reflecting surface RPa of polygonal mirror PM Beam LB1b is incident to reflecting mirror M20 via relay lens system G20.Reflecting mirror M20 is by incident light beam LB1b towards multi-panel The reflecting surface RPa of mirror PM reflects.In reflecting mirror M20 reflection light beam LB1b the reflected beams LB1c again by relay lens system System G20 and be incident to the reflecting surface RPa of polygonal mirror PM.By relay lens system G20, reflecting surface RPa and reflecting mirror M20 at For conjugate relation.Therefore, the light beam LB1b that be incident to reflecting mirror M20 (is biased to the main scanning direction based on polygonal mirror PM Direction) in orthogonal non-scan direction (Z-direction), in converging on Z-direction on the reflecting surface of reflecting mirror M20.Also, self-reflection mirror M20 be incident to the light beam LB1c of the reflecting surface RPa of polygonal mirror PM also with main scanning direction (the deviation side based on polygonal mirror PM To) in orthogonal non-scan direction (Z-direction), in converging on Z-direction on reflecting surface RPa.Moreover, being again incident on polygonal mirror PM Reflecting surface RPa light beam LB1c towards f θ lens FT become light beam LB1d and reflect.Furthermore in the scanning side with polygonal mirror PM To in orthogonal Z-direction, initially it is incident to the convergence position of the light beam LB1a of reflecting surface RPa and is again incident on reflecting surface RPa Light beam LB1c convergence position it is roughly the same.In this variation 2, the effect same with the 1st implementation form can be also played Fruit.Further, by using short focal length person as relay lens system G20, can shorten from polygonal mirror PM to reflecting mirror M20 Optical path length, or can reducing glass bore.

[the 2nd implementation form]

Secondly, being illustrated to the scanning element U1b of the 2nd implementation form.Figure 13 A is to implement shape from -Y direction observation the 2nd The figure when composition of the scanning element U1b of state, Figure 13 B are the compositions that the scanning element U1b of the 2nd implementation form is observed from +Z direction When figure.Furthermore for similarly constituting with the 1st implementation form, it is attached with same symbol.Also, due to scanning element Unb (U1b~U6b) has identical composition, so be illustrated for only lifting scanning element U1b.Further, in this 2nd implementation form In, substrate P is transported in parallel to +X direction with X/Y plane.Scanning element U1b has the cylindrical lens for having bus in Y-direction CYa~CYd, the wave plate of polarization spectroscope PBS1, PBS2, λ/4 QP1, QP2, f θ lens FT1, imaging len FT2, polygonal mirror PM and Reflecting mirror M30.Furthermore the wave plate of polarization spectroscope PBS1, PBS2 and λ/4 QP1, QP2 constitute light splitting member, f θ lens FT1 and column Lens (the 3rd optical component) CYd in face constitutes scanning optical system.Also, cylindrical lens (the 1st optical component) CYb, CYc and anti- It penetrates mirror M30 and constitutes reflective optics again.

The light beam LB1 of the collimated light beam reflected by incidence mirror (light conducting member) IM1 shown in fig. 5 towards -Z direction along The optical axis AX1 parallel with Z axis is incident to scanning element U1b.Furthermore in this implementation form, to be incident to scanning element U1b's Light beam LB1 (hereinafter, sometimes referred to as incident beam LB1a) be by collector lens (not shown) in optically focused on the p1 of face for circle Point after be incident to scanning element U1b, therefore be to dissipate on one side, be incident to scanning element U1b on one side.It is incident to scanning element The incident beam LB1a of U1b, which is penetrated, has the cylindrical lens (the 2nd optical component) of bus in Y-direction along what optical axis AX1 was arranged CYa and be incident to polarization spectroscope PBS1.The polarization separation face Qs of polarization spectroscope PBS1 relative to X/Y plane tilt 45 degree, and The light of reflected P polarized light penetrates the light of S polarized light.Therefore, polarization spectroscope PBS1 is incident to by cylindrical lens CYa Incident beam LB1a (light of P-polarized light) by the polarization separation face Qs of polarization spectroscope PBS1 towards -X direction lateral reflection. Divided towards the incident beam LB1a that -X direction reflects via polarization is set to by the polarization separation face Qs of polarization spectroscope PBS1 The λ of the -X direction of light microscopic PBS1/4 wave plate QP1 and f θ lens FT1 and the reflecting surface RPa for being incident to polygonal mirror PM.F θ lens FT1 Optical axis AXf1 it is parallel with X-axis, the rotary shaft AXp of polygonal mirror PM is set in parallel with Z axis.Include optical axis AXf1 and rotary shaft The plane of AXp is parallel with XZ plane.At this point, the emitting side of incident beam LB1a from f θ lens FT1 are incident to f θ lens FT1.Again Person, the reflecting surface RP of polygonal mirror PM are configured at the position (position of front side focus) of the entrance pupil of f θ lens FT1.

Herein, cylindrical lens CYa is orthogonal with main scanning direction (direction is biased in direction of rotation) based on polygonal mirror PM Make in non-scan direction (Z-direction) diverging, while incident incident beam LB1a become directional light (3A referring to Fig.1).Also, Cylindrical lens CYa dissipate one side on the main scanning direction (direction of rotation, be biased to direction) based on polygonal mirror PM, while incidence Incident beam LB1a be directed through (3B referring to Fig.1).Furthermore the front side focus of cylindrical lens CYa is set on the p1 of face.F θ is saturating Mirror FT1 makes to pass through in the non-scan direction orthogonal with main scanning direction (direction is biased in direction of rotation) based on polygonal mirror PM Cylindrical lens CYa and become directional light incident beam LB1a in polygonal mirror PM reflecting surface RPa restrain (3A referring to Fig.1).Also, F θ lens FT1 makes to send out on one side in the X/Y plane as the main scanning direction (direction is biased in direction of rotation) based on polygonal mirror PM It dissipates, the light beam LB1a that one side is incident becomes directional light (3B referring to Fig.1).Thereby, it is projected to the incident beam LB1a of reflecting surface RPa In converged on reflecting surface RP in Y-direction extend slit-shaped (long ellipticity) (3A, Figure 13 B referring to Fig.1).

Furthermore in XZ plane, from polarization spectroscope PBS1 via f θ lens FT1 and towards the reflecting surface RPa of polygonal mirror PM The incident beam LB1a of advance is incident to reflecting surface RPa by the position of the +Z direction side of the optical axis AXf1 of f θ lens FT1, and Optical axis AXf1 roughly the same (3A referring to Fig.1) in position convergent on reflecting surface RPa and f θ lens FT1.Also, in X/Y plane, The incident beam LB1a and f θ to advance from polarization spectroscope PBS1 via f θ lens FT1 towards the reflecting surface RPa of polygonal mirror PM The optical axis AXf1 of lens FT1 is overlapped and is incident to reflecting surface RPa (3B referring to Fig.1).Herein, the reflecting surface RPa of polygonal mirror PM is set Due to the pupil location (position of front side focus) of f θ lens FT1, the rear side focus of f θ lens FT1 is set in Figure 13 A, Figure 13 B In the position in face p2 of the +X direction far from polarization spectroscope PBS1.Face p2 is set to the relationship with face p1 optical conjugate, And it is set as the final also relationship with the surface of substrate P conjugation.

The reflecting surface RPa of polygonal mirror PM is by incident incident beam LB1a towards f θ lens FT1 to +X direction lateral reflection.It is logical The rotation of polygonal mirror PM is crossed, incident incident beam LB1a is biased to towards Y-direction.The incident beam LB1a reflected by reflecting surface RPa Reflected light (hereinafter referred to as the 1st the reflected beams LB1b) by postrotational polygonal mirror PM on X/Y plane with optical axis AXf1 Centered on towards Y-direction be biased to.In the 1st the reflected beams LB1b that reflecting surface RPa reflects in the light for passing through f θ lens FT1 in XZ plane The -Z direction side of axis AXf1 and be incident to f θ lens FT1.

Self-reflection face RPa towards f θ lens FT the 1st the reflected beams LB1b with the main scanning direction based on polygonal mirror PM In (be biased to direction) orthogonal non-scan direction diverging, while be incident to f θ lens FT1, but formed by f θ lens FT1 For directional light (3A referring to Fig.1).Also, self-reflection face RPa towards f θ lens FT the 1st the reflected beams LB1b comprising be based on multi-panel In the face XY of the main scanning direction (being biased to direction) of mirror PM, it is incident to f θ lens FT1 as directional light, but pass through f θ lens FT1 And in converging to circular point (3B referring to Fig.1) on the p2 of face.

Polarization spectroscope PBS2 is incident to through the wave plate of λ/4 QP2 through the 1st the reflected beams LB1b of f θ lens FT1.It should The wave plate of λ/4 QP2 and polarization spectroscope PBS2, which is situated between, is configured at-the Z of the wave plate of λ/4 QP1 and polarization spectroscope PBS1 every barn door DO Direction side.Barn door DO is set to the optical axis AXf1 comprising f θ lens FT1 and in the plane parallel with X/Y plane.Polarization spectro The polarization separation face Qs of mirror PBS1 tilts 45 degree, and the light of reflected P polarized light relative to X/Y plane, penetrates the light of S polarized light. Herein, the incident beam LB1a for being initially incident to polygonal mirror PM is converted to circularly polarized light from P-polarized light by the wave plate of λ/4 QP1 Light, initially in polygonal mirror PM reflection the 1st the reflected beams LB1b S-polarization is converted to from circularly polarized light by the wave plate of λ/4 QP2 The light of light.Therefore, the 1st the reflected beams LB1b for being incident to polarization spectroscope PBS2 is directed through polarization spectroscope PBS2.

The 1st the reflected beams LB1b to advance through polarization spectroscope PBS2 to -X direction side is by being configured at polarization spectro Cylindrical lens (the 1st optical component) CYb and imaging len FT2 of the +X direction side of mirror PBS2 and be incident to reflecting mirror M30.Rear side The cylindrical lens CYb that focus is set on the p2 of face non-is swept orthogonal with the main scanning direction (be biased to direction) based on polygonal mirror PM It retouches in direction (Z-direction), makes the 1st the reflected beams LB1b through the directional light of f θ lens FT1 and polarization spectroscope PBS2 in face (3A referring to Fig.1) is restrained on p2.Face p2 is also the position of the rear side focus of f θ lens FT1, therefore, based on polygonal mirror PM's On main scanning direction (be biased to direction), through f θ lens FT1 and polarization spectroscope PBS2 the 1st the reflected beams LB1b also in face p2 Upper convergence (3B referring to Fig.1).Face p1 and face p2 becomes conjugate relation.Furthermore reflecting mirror M30 is for lens error correction and as recessed Spherical reflector is configured at position, the i.e. pupil location of the rear side focus of imaging len FT2, but also can be plane reflection in principle Mirror.Further, system imaging len FT2 and reflecting mirror M30 being composed is as the imaging spy in the face side p2 with telecentricity The relay optical system of the equimultiple of property functions, and the luminous point that face p2 is concentrated on by the convergence of light beam LB1b is made again The different positions on the p2 of face are imaged in for luminous point made of light beam LB1c convergence.

Therefore, incident with the state dissipated towards the 1st the reflected beams LB1b of reflecting mirror M30 via imaging len FT2 To imaging len FT2, but after becoming collimated light beam by imaging len FT2, it is incident to reflecting mirror M30.Furthermore it is imaged The optical axis AXf1 of the optical axis AXf2 and f θ lens FT1 of lens FT2 is set on coaxial.Be incident to imaging len FT2 the 1st is anti- Irradiating light beam LB1b is to be incident to imaging len FT2 in the -Z direction side in XZ plane by optical axis AXf2, and in reflecting mirror M30 On, the central axis of the 1st the reflected beams LB1b is consistent with optical axis AXf2 (3A referring to Fig.1).The rear side focus of imaging len FT2 The position of (pupil plane) is set on the p2 of face.

By reflecting mirror M30 towards -X direction lateral reflection the 1st the reflected beams LB1b reflected light (hereinafter referred to as the 2nd reflected light Beam LB1c) polarization spectroscope PBS1 is again incident on by imaging len FT2 and cylindrical lens (the 1st optical component) CYc.The 2 the reflected beams LB1c are incident to imaging len FT2 by the +Z direction side of optical axis AXf2.Imaging len FT2 will be by reflecting mirror 2nd the reflected beams LB1c of the collimated light beam of M30 reflection is in converging to circular point on the p2 of face.In convergent 2nd reflection of face p2 Light beam LB1c one side dissipates, and is incident to after the cylindrical lens CYc with the bus parallel with Y-axis on one side, is incident to polarization point Light microscopic PBS1.The 2nd the reflected beams LB1c of polarization spectroscope PBS1 is incident to (inclined with the main scanning direction based on polygonal mirror PM To direction) directional light is become by cylindrical lens CYc in orthogonal non-scan direction (Z-direction), and it is being based on polygonal mirror PM Main scanning direction (be biased to direction) on directly one side dissipate, while be incident to polarization spectroscope PBS1.Due to be incident to partially The 2nd the reflected beams LB1c of vibration spectroscope PBS1 becomes the light of S polarized light, so it is directed through polarization spectroscope PBS1.Through The 2nd the reflected beams LB1c of polarization spectroscope PBS1 is again incident on polygonal mirror PM by wave plate QP1 and f the θ lens of λ/4 FT1 Reflecting surface RPa.The emitting side of 2nd the reflected beams LB1c from f θ lens FT1 are incident to f θ lens FT1.

F θ lens FT1 converges to the 2nd incident the reflected beams LB1c in Y on the reflecting surface RP (RPa) of polygonal mirror PM The slit-shaped (long ellipticity) that direction extends.At this point, in the Z-direction orthogonal with the scanning direction of polygonal mirror PM (being biased to direction) On, the incoming position on the reflecting surface RPa of the 2nd the reflected beams LB1c and the incident position on the reflecting surface RPa of incident beam LB1a It sets consistent.By the reflected light (hereinafter referred to as the 3rd the reflected beams LB1d) of reflecting surface RPa the 2nd the reflected beams LB1c of secondary reflection again Polarization spectroscope PBS2 is incident to by the f θ lens wave plate of FT1 and λ/4 QP2.Herein, it is again incident on the 2nd of polygonal mirror PM the The reflected beams LB1c is converted to the light of circularly polarized light by the wave plate of λ/4 QP1 from S polarized light, in polygonal mirror PM secondary reflection again 3rd the reflected beams LB1d is converted to the light of P-polarized light by the wave plate of λ/4 QP2 from circularly polarized light.Therefore, polarization is incident to The 3rd the reflected beams LB1d of spectroscope PBS2 is reflected towards -Z direction by the polarization separation face Qs of polarization spectroscope PBS2 and is thrown It is incident upon substrate P.Pass through cylindrical lens (the 3rd optics towards the 3rd the reflected beams LB1d that -Z direction reflects by polarization separation face Qs Component) CYd and be projected to substrate P.Edge light beam LB1 (the 3rd the reflected beams LB1d) that self-scanning unit U1b is projected towards substrate P Substrate P normal projection.

Herein, f θ lens FT1 makes to be reflected by reflecting surface RPa on the scanning direction (be biased to direction) of polygonal mirror PM and incident Directional light the 3rd the reflected beams LB1d in being restrained in substrate P.Also, f θ lens FT1 is (inclined with the scanning direction of polygonal mirror PM To direction) on orthogonal direction, make to be reflected by reflecting surface RPa and dissipate, while incident the 3rd the reflected beams LB1d become Directional light, but converged in substrate P by cylindrical lens CYd.Thereby, light beam LB1 (the 3rd reflected light of substrate P is projected to Beam LB1d) become luminous point SP and is projected to substrate P.In this way, face p1, face p2 and substrate P are each conjugate relation.

Herein, as shown in FIG. 13A, in the direction orthogonal with the scanning direction of polygonal mirror PM (being biased to direction) (in XZ plane) On, from the reflecting surface RPa of polygonal mirror PM towards optical path, shape and the self-reflection mirror of the 1st the reflected beams LB1b of reflecting mirror M10 M30 is towards the optical path of the 2nd the reflected beams LB1c of reflecting surface RPa of polygonal mirror PM, shape relative to including optical axis AXf1 (AXf2) and parallel with X/Y plane plane is symmetrical.Also, from polarization spectroscope PBS1 initially toward the reflecting surface RPa of polygonal mirror PM The optical path of incident beam LB1a, shape with from polarization spectroscope PBS1 again towards polygonal mirror PM reflecting surface RPa it is the 2nd anti- Optical path, the shape phase on the direction (in XZ plane) orthogonal with the scanning direction of polygonal mirror PM (being biased to direction) of irradiating light beam LB1c Together.Further, from the reflecting surface RPa of polygonal mirror PM towards optical path, the shape of the 1st the reflected beams LB1b of polarization spectroscope PBS2 With the reflecting surface RPa from polygonal mirror PM towards the optical path of the 3rd the reflected beams LB1d of polarization spectroscope PBS2, shape with multi-panel It is identical on the orthogonal direction (in XZ plane) in the scanning direction (being biased to direction) of mirror PM.

On the other hand, as shown in Figure 13 B, on the scanning direction of polygonal mirror PM (be biased to direction) (on X/Y plane), root According to the angle of the reflecting surface RPa of polygonal mirror PM, the optical path of the 1st the reflected beams LB1d of the reflected beams LB1b~the 3rd is different.Herein, Reflecting surface RPa is set as Δ θ relative to the angle of YZ plane.In (flat in XY on the scanning direction (being biased to direction) of polygonal mirror PM On face), the central axis for being reflected by the reflecting surface RPa of polygonal mirror PM and being incident to the 1st the reflected beams LB1b of f θ lens FT1 is (main Light) relative to f θ lens FT1 optical axis AXf1 (central axis of incident beam LB1a) angle (absolute value) become 2 × Δ θ. Also, in (on X/Y plane), being again incident on the reflecting surface RP of polygonal mirror PM on the scanning direction (being biased to direction) of polygonal mirror PM The 2nd the reflected beams LB1c the optical axis AXf1 (center of incident beam LB1a of the central axis (chief ray) relative to f θ lens FT1 Axis) angle (absolute value) become 2 × Δ θ.Therefore, on the scanning direction of polygonal mirror PM (be biased to direction) (in X/Y plane On), the central axis (key light of the 1st the reflected beams LB1b of f θ lens FT1 is reflected and is incident to by the reflecting surface RPa of polygonal mirror PM Line) or convergence divergent state, the central axis (master with the 2nd the reflected beams LB1c for the reflecting surface RP for being again incident on polygonal mirror PM Light) or convergence divergent state it is symmetrical relative to optical axis AXf1 (central axis of incident beam LB1a).Also, sweeping in polygonal mirror PM It retouches on direction (be biased to direction) (on X/Y plane), reflects and be incident to the of f θ lens FT1 by the reflecting surface RPa of polygonal mirror PM Optical axis AXf1 (central axis of incident beam LB1a) of the optical axis (central axis) of 3 the reflected beams LB1d relative to f θ lens FT1 Angle (absolute value) becomes 4 × Δ θ.

Therefore, in the 2nd implementation form, the effect same with the 1st implementation form can also be played.Figure 13 A, figure It is and relay lens shown in fig. 12 above by imaging len FT2 and reflecting mirror the M30 system being composed shown in 13B The same telecentricity equimultiple relay optical system of system G20, and by using short focal length person as imaging len FT2, it can make It is minimized from face p2 to the composition of reflecting mirror M30.

[variation of the 2nd implementation form]

2nd implementation form can be deformed as following.

(variation 1) when the situation of the scanning element Unb of the 2nd implementation form, scanning element Unb is in f θ lens The direction optical axis AXf1, AXf2 of FT1 and imaging len FT2 is elongated.Therefore, as shown in figure 14, in pass through the 1st implementation form Illustrated in rotating cylinder DR be bent substrate P and support the substrate P and by scanning element shown in the 2nd implementation form When Unb configures multiple situations along the conveyance direction of substrate P, it is necessary to be configured according to the conveyance direction (X-direction) along substrate P Multiple scanning element Unb odd number and even number and be separated by configuration in X-direction (circumferencial direction of rotating cylinder DR).Thereby, edge Conveyance direction configuration multiple scanning element Unb description line SLn (launching position of luminous point SP) between distance it is elongated.Cause This, if being provided only with 1 aligming microscope AMm of the upstream side of multiple scanning element Unb in the conveyance direction of substrate P (AM1~AM4), then alignment precision can reduce sometimes.Therefore, in this variation 1, as shown in figure 14, relative to along substrate P Conveyance direction setting odd number scanning element Unb and even number scanning element Unb respective positions, in substrate P Multiple aligming microscope AMm (AM1~AM4) are arranged in the upstream side of conveyance direction.

(variation 2) makes 1 light beam LB1a be incident to 1 scanning element Unb in the 2nd implementation form, but also may be used 2 light beam LBn (LB1a) are made to be slightly spaced from and be incident to the cylindrical lens CYa of 1 scanning element Unb in Y-direction.In this situation When, to be incident to 2 light beam LB1a of cylindrical lens CYa each central axis it is parallel with optical axis AX1 and be located at comprising optical axis AX1 The parallel plane of YZ plane on.Thereby, due to being scanned by 2 luminous point SP, so can higher speed ground depicting pattern. Also, can will be helped making 2 light beam LB1a be incident to scanning element Unb in such a way that the scanning area of 2 luminous point SP is shared Further become half in the rotation angle of the actual scanning of polygonal mirror PM.

[the 3rd implementation form]

In the 1st and the 2nd implementation form (also include variation), with the 1st time by the more of light beam LBn (LB1a) reflection The reflecting surface RP of face mirror PM mode identical with the 2nd reflecting surface RP of polygonal mirror PM by light beam LBn (LB1c) reflection, makes light Beam LBn is incident to polygonal mirror PM.However, in this 3rd implementation form, with the 1st time by the anti-of the light beam LBn polygonal mirror PM reflected Optical component is reflected in the mode that penetrate face RP different from the reflecting surface RP of polygonal mirror PM that the 2nd time reflects light beam LBn, change again It constitutes.

Figure 15 is the composition figure to make two secondary reflection description light beam LBn of polygonal mirror PM in the 3rd implementation form.Again Person is attached with identical symbol for similarly constituting with the described 1st, the 2nd implementation form.In this implementation form, with the 1st time The reflecting surface RP for the polygonal mirror PM that light beam LBn reflects is different from the reflecting surface RP of polygonal mirror PM that the 2nd time reflects light beam LBn Mode constitute and reflect optical component again.

In Figure 15, by the cylindrical lens in Y-direction with bus (not shown), make the light beam for being incident to polygonal mirror PM LB1a is in the non-scan direction (direction of rotary shaft AXp) orthogonal with main scanning direction (being biased to direction) based on polygonal mirror PM It is restrained on reflecting surface RPa.The light beam LB1b reflected by the reflecting surface RPa of polygonal mirror PM is incident by relay lens system G30 After reflecting to reflecting mirror M50 and by reflecting mirror M50, it is incident to reflecting mirror M51.Pass through relay lens system G30, reflecting surface RPa and reflecting mirror M51 becomes conjugate relation.Therefore, to be incident to the light beam LB1b of reflecting mirror M51 with based on polygonal mirror PM's In on the reflecting surface of reflecting mirror M51 in the orthogonal non-scan direction (direction of rotary shaft AXp) of main scanning direction (being biased to direction) Convergence.Also, the light beam LB1c reflected by reflecting mirror M51 is entered by after reflecting mirror M52 reflection by relay lens system G31 It is incident upon the reflecting surface RP of polygonal mirror PM.It is and reflection by the reflecting surface RP of relay lens system G31 incidence for light beam LB1c Face RPa different reflecting surface RP (hereinafter, RPb).Become altogether by relay lens system G31, reflecting mirror M51 and reflecting surface RPb Yoke relationship.Therefore, to be incident to the light beam LB1c of reflecting surface RPb with the main scanning direction (being biased to direction) based on polygonal mirror PM In orthogonal non-scan direction (direction of rotary shaft AXp), restrained on reflecting surface RPb.Then, in the reflecting surface of polygonal mirror PM The light beam LB1d of RPb reflection is reflected towards f θ lens FT.Furthermore on the direction orthogonal with the scanning direction of polygonal mirror PM, light Beam LBn is in position convergent on reflecting surface RPa (position in the direction that rotary shaft AXp extends) and light beam LBn on reflecting surface RPb Convergent position (position in the direction that rotary shaft AXp extends) is consistent.

In this above implementation form, by relay lens system G30, G31 in Figure 15 and reflecting mirror M50, M51, M52 constitutes reflective optics again, and plays and the same effect of the 1st implementation form, effect.

(variation 1) Figure 16 is in the variation 1 of the 3rd implementation form (Figure 15) to make polygonal mirror PM reflected light twice The composition figure of beam LBn.Furthermore for similarly constituting the identical symbol of note with the 3rd implementation form.In this variation 1 In, with the 1st reflecting surface RP by the polygonal mirror PM that light beam LBn reflects with the 2nd time by the anti-of the light beam LBn polygonal mirror PM reflected Penetrate the different mode of face RP, make light beam LBn be incident to the reflective optics again of polygonal mirror PM composition and Figure 15 composition not Together.

By the cylindrical lens in Y-direction with bus (not shown), the light beam LB1a of polygonal mirror PM to be incident to is made to exist In reflection in the non-scan direction (direction of rotary shaft AXp) orthogonal with main scanning direction (being biased to direction) based on polygonal mirror PM It is restrained on the RPa of face.The light beam LB1b reflected by the reflecting surface RPa of polygonal mirror PM is anti-by being incident to after lens system G50a Penetrate mirror M60.Reflecting mirror M61 is incident in the light beam LB1b of reflecting mirror M60 reflection.The light beam LB1c reflected by reflecting mirror M61 leads to Cross the reflecting surface RPb that lens system G50b is incident to polygonal mirror PM.Reflecting surface RPb is the reflecting surface different from reflecting surface RPa RP.Lens system G50a, G50b is formed in the middle position in optical path (between reflecting mirror M60, M61) and forms pupil plane ep's Relay lens system G50, and by relay lens system G50, reflecting surface RPa, RPb are each conjugate relation.Therefore, it The light beam LB1c of reflecting surface RPb is incident in the Non-scanning mode side orthogonal with main scanning direction (being biased to direction) based on polygonal mirror PM It is restrained on (direction of rotary shaft AXp) on reflecting surface RPb.Then, the light beam reflected in the reflecting surface RPb of polygonal mirror PM LBn is reflected towards f θ lens FT.Furthermore on the direction orthogonal with the scanning direction of polygonal mirror PM, light beam LB1a is in reflecting surface The upper convergent position (position in the direction that rotary shaft AXp extends) of RPa is with light beam LBn in position convergent on reflecting surface RPb (rotation The position in the direction that shaft AXp extends) it is consistent.In this variation 1, the effect same with the 1st implementation form can be also played Fruit.

[variation of the 1st~the 3rd implementation form]

In each implementation form, use polygonal mirror PM as movable reflecting member, but galvanometer mirror etc. also can be used Pendular reflex component is biased to light beam LBn.Also, can also be set as shown in figure 17 when using the situation of galvanometer mirror GM and sweep Retouch unit U1d.Furthermore for similarly constituting with the 1st~the 3rd implementation form, it is attached with same symbol.Also, due to sweeping Unit Und (U1d~U6d) is retouched with identical composition, so be illustrated for only lifting scanning element U1d.

The X-axis of the optical axis AXf and orthogonal coordinate system XYZ of f θ lens FT configure in parallel, and galvanometer mirror (movably reflects structure Part, pendular reflex component) GM rotation (vibration) central axis Cg and Z axis configure in parallel.The 1st reflecting surface of galvanometer mirror GM M10 and the 2nd reflecting surface m11 are with parallel with Z axis and (deflection angle is in the neutral position of the vibration around Pivot axle Cg 0 degree) it is set relative to the optical axis AXf of f θ lens FT in the mode of angle for becoming 45 degree in the face XY.Galvanometer mirror GM (swing) is vibrated in the range of set deflection angle ± θ g.In the table that the 1st reflecting surface m10 is for example set as to galvanometer mirror GM When the situation in face, the 2nd reflecting surface m11 becomes the back side of galvanometer mirror GM.

The light beam LB1 (hereinafter, incident beam LB1a) for being incident to scanning element U1d keeps its optical path curved by reflecting mirror etc. After folding, advance along -Y direction, and be incident to the 1st reflecting surface m10 of galvanometer mirror GM.By the 1st reflecting surface of galvanometer mirror GM M10 reflection incident beam LB1a reflected light (hereinafter, the 1st the reflected beams LB1b) by reflecting mirror MRa, MRb reflect and again It is incident to galvanometer mirror GM.At this point, the reflected light of the 1st the reflected beams LB1b by reflecting mirror MRa, MRb reflection is (hereinafter, the 2nd is anti- Irradiating light beam LB1c) it is incident to the 2nd reflecting surface m11 of galvanometer mirror GM.In the 2nd the reflected beams LB1c of the 2nd reflecting surface m11 reflection Reflected light (hereinafter, the 3rd the reflected beams LB1d) substrate P is projected to as luminous point SP by f θ lens FT.

Furthermore in the light beam scanning unit using galvanometer mirror GM, the not set face to correct reflecting surface is inclined Cylindrical lens, but when must carry out the situation of face tilt correction, as long as on the direction orthogonal with scanning direction, it will be comprising making The each of incident beam LB1a and the 2nd the reflected beams LB1c are in convergent cylinder on the 1st reflecting surface m10 and on the 2nd reflecting surface m11 The optical system of lens is set in the optical path of light beam LB.When this situation, between f θ lens FT and substrate P, setting Have in making the 3rd the reflected beams LB1d saturating in cylinder convergent in substrate P on the direction orthogonal with the scanning direction of galvanometer mirror GM Mirror.By shown in Figure 17 constitute, that is, be easy to use galvanometer mirror GM situation when, also can order incident beam LB1a be biased to 1st reflecting surface m10 is different from the 2nd reflecting surface m11 for enabling the 2nd the reflected beams LB1c be biased to.Also, due to the deflection of galvanometer mirror GM Angle is ± θ g, so, it is saturating that the 3rd the reflected beams LB1d being biased in the range of ± 4 θ g centered on optical axis AXf is incident to f θ Mirror FT.Therefore, in this variation, the effect same with the 1st implementation form can also be played.Galvanometer mirror GM is in deflection angle Range both ends, it is linear poor, therefore, usually in the amplitude angle comprising vibration central location it is linear preferably relatively narrow Light beam scanning is carried out in deflection angle ranges, but optical component is reflected by reflecting mirror MRa, MRb again by being arranged such as Figure 17, It can be scanned in carrying out linear preferably light beam in wider angular range.

Claims (13)

1. a kind of light-beam scanner, which is characterized in that be the movable reflecting member that will can be changed by the angle of reflecting surface The light beam that will be skewed towards is projected to irradiated body, and has：

Reflective optics again, has the 1st optical component, and the 1st optical component is reflected initially in the movable reflection structure 1st the reflected beams of part reflection and generate the 2nd the reflected beams towards the movable reflecting member, and in by it is described can The 2nd the reflected beams are restrained on the non-deviation direction that the deviation direction for the light beam that dynamic reflecting member generates intersects；And

Scanning optical system, secondary reflection the resulting 3rd is anti-again in the movable reflecting member for incident 2nd the reflected beams Irradiating light beam, and projected towards the irradiated body.

2. light-beam scanner as described in claim 1, which is characterized in that be initially incident to the institute of the movable reflecting member State light beam and incident the 2nd the reflected beams again on the reflecting surface of the movable reflecting member in the non-deviation direction On be set in identical position.

3. light-beam scanner as claimed in claim 1 or 2, which is characterized in that be further equipped with described in making initially to be incident to The light beam of movable reflecting member in convergent 2nd optical component on the non-deviation direction, and

The scanning optical system has the f θ for being incident in the movable reflecting member the 3rd the reflected beams of secondary reflection again Lens system and make the 3rd the reflected beams from the f θ lens system towards the irradiated body in the non-deviation side Upward convergent 3rd optical component.

4. light-beam scanner as claimed any one in claims 1 to 3, which is characterized in that be further equipped with and be set to institute The light splitting member between movable reflecting member and the reflective optics again is stated, and

Initially by the 1st the reflected beams of the movable reflecting member reflection, it is incident to via the light splitting member described Reflective optics again, and 2nd the reflected beams of the reflective optics towards the movable reflecting member again described in The scanning optical system is incident to via the light splitting member.

5. light-beam scanner as claimed in claim 4, which is characterized in that the light splitting member includes polarization spectroscope and wave Piece, and

The light beam for being initially incident to the movable reflecting member is set as rectilinearly polarized light.

6. light-beam scanner as claimed any one in claims 1 to 3, which is characterized in that being further equipped with initially to enter The light beam for being incident upon the movable reflecting member is drawn in a manner of from the incidence of the emitting side of scanning optical system The light conducting member led, and

The movable reflecting member will use the light beam of the emitting side incidence of optical system anti-as the described 1st from the scanning Irradiating light beam towards scanning optics systematic reflection,

The reflective optics again will be reflected as the movable reflecting member and by described in the scanning optical system 1st the reflected beams from the scanning use the emitting side of optical system incident and as towards described the of the movable reflecting members The reflection of 2 the reflected beams,

With optical system, further incident 2nd the reflected beams pass through movable reflecting member secondary reflection again for the scanning The 3rd the reflected beams, and towards the irradiated body project.

7. light-beam scanner as claimed in claim 6, which is characterized in that be further equipped with：

1st light splitting member is set between scanning optical system and the reflective optics again and leads described in Light component is incident to the optical path of the light beam of the scanning optical system and reflects and lead in the reflective optics again Cross the optical path of the scanning optical system and the 2nd the reflected beams towards the movable reflecting member；And

2nd light splitting member is set between the scanning optical system and the reflective optics again and initially by institute State movable reflecting member reflect and by the optical path of the 1st the reflected beams of the scanning optical system and by it is described can Dynamic reflecting member secondary reflection and passes through the optical paths of scanning the 3rd the reflected beams of optical system again；And

3rd the reflected beams are projected to the irradiated body via the 2nd light splitting member.

8. light-beam scanner as claimed any one in claims 1 to 3, which is characterized in that

The movable reflecting member have reflecting surface towards mutually different multiple reflectings surface,

The movable reflecting member by the light beam of initial incidence in the 1st reflective surface,

The reflective optics again by by the 1st the reflected beams of the 1st reflective surface towards the movable reflection 2nd reflective surfaces different from the 1st reflecting surface of component.

9. a kind of light-beam scanner, which is characterized in that be will by with reflecting surface towards mutually different multiple reflections The movable reflecting member in face and the light beam being biased to is projected to irradiated body, and have：

Reflective optics again, is incident in the 1st the reflected beams of the 1st reflective surface of the movable reflecting member, and produces The 2nd the reflected beams that raw 2nd reflectings surface different from the 1st reflecting surface towards the movable reflecting member advance；And

Scanning optical system, the 3rd the reflected beams of incident the 2nd reflective surface by the movable reflecting member are simultaneously It is projected to the irradiated body.

10. a kind of pattern plotter device, which is characterized in that be the right to use in the state of moving substrate in set direction Benefit require any one of 1 to 9 described in light-beam scanner, the light beam is projected to the base as the irradiated body On plate, and make the light beam in the main scanning direction scanning intersected with the set direction, thereby describes on the substrate Pattern.

11. pattern plotter device as claimed in claim 10, which is characterized in that swept along the moving direction and master of the substrate At least one party for retouching direction is to configured with multiple light-beam scanners.

12. pattern plotter device as claimed in claim 11, which is characterized in that have and be formed in the substrate to detect Set label to Barebone, and

It is described corresponding with the position of multiple light-beam scanners of moving direction configuration along the substrate to Barebone And it is respectively set.

13. the pattern plotter device as described in any in claim 10 to 12, which is characterized in that the substrate is flexible Strip sheet substrate, and

The pattern plotter device is further equipped with to have to be prolonged in the width direction that the long dimension direction with the sheet substrate is intersected The rotating cylinder of the central axis and the cylindric outer peripheral surface from the central axis radii fixus stretched, and

The rotating cylinder shines the outer peripheral surface on one side gives a part of the sheet substrate deviously in the long dimension direction To support, is rotated centered on the central axis on one side and keep the sheet substrate mobile in the long dimension direction, and

The light beam is projected in the sheet substrate supported by the rotating cylinder by the light-beam scanner.