CN109502860A - 显影废液处理装置和处理方法 - Google Patents
显影废液处理装置和处理方法 Download PDFInfo
- Publication number
- CN109502860A CN109502860A CN201810998990.0A CN201810998990A CN109502860A CN 109502860 A CN109502860 A CN 109502860A CN 201810998990 A CN201810998990 A CN 201810998990A CN 109502860 A CN109502860 A CN 109502860A
- Authority
- CN
- China
- Prior art keywords
- leading portion
- back segment
- cooling crystallization
- filtrate
- enrichment facility
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007788 liquid Substances 0.000 title claims abstract description 110
- 239000002699 waste material Substances 0.000 title claims abstract description 43
- 238000003672 processing method Methods 0.000 title claims abstract description 8
- 238000002425 crystallisation Methods 0.000 claims abstract description 100
- 230000008025 crystallization Effects 0.000 claims abstract description 100
- 238000001816 cooling Methods 0.000 claims abstract description 94
- 239000000706 filtrate Substances 0.000 claims abstract description 71
- 239000013078 crystal Substances 0.000 claims abstract description 46
- 239000007787 solid Substances 0.000 claims abstract description 35
- 238000000034 method Methods 0.000 claims abstract description 29
- 238000004090 dissolution Methods 0.000 claims abstract description 21
- 238000000926 separation method Methods 0.000 claims abstract description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 58
- 239000012535 impurity Substances 0.000 claims description 50
- 238000010438 heat treatment Methods 0.000 claims description 19
- 239000002002 slurry Substances 0.000 claims description 19
- 239000006166 lysate Substances 0.000 claims description 15
- 239000012141 concentrate Substances 0.000 claims description 14
- 238000001704 evaporation Methods 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 14
- 238000005259 measurement Methods 0.000 claims description 9
- 238000004064 recycling Methods 0.000 abstract description 8
- 238000000746 purification Methods 0.000 abstract description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 24
- 239000000203 mixture Substances 0.000 description 12
- 238000002835 absorbance Methods 0.000 description 10
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 238000011084 recovery Methods 0.000 description 8
- 238000004458 analytical method Methods 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000004615 ingredient Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000004411 aluminium Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000006835 compression Effects 0.000 description 2
- 238000007906 compression Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000029087 digestion Effects 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000002203 pretreatment Methods 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- 241000208340 Araliaceae Species 0.000 description 1
- 235000005035 Panax pseudoginseng ssp. pseudoginseng Nutrition 0.000 description 1
- 235000003140 Panax quinquefolius Nutrition 0.000 description 1
- 235000013399 edible fruits Nutrition 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 235000008434 ginseng Nutrition 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
- B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/22—Treatment of water, waste water, or sewage by freezing
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/02—Treatment of water, waste water, or sewage by heating
- C02F1/04—Treatment of water, waste water, or sewage by heating by distillation or evaporation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/38—Treatment of water, waste water, or sewage by centrifugal separation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/52—Treatment of water, waste water, or sewage by flocculation or precipitation of suspended impurities
- C02F2001/5218—Crystallization
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/04—Flow arrangements
- C02F2301/046—Recirculation with an external loop
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Hydrology & Water Resources (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
- Excavating Of Shafts Or Tunnels (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017177403A JP7055326B2 (ja) | 2017-09-15 | 2017-09-15 | 現像廃液処理装置及び処理方法 |
| JP2017-177403 | 2017-09-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN109502860A true CN109502860A (zh) | 2019-03-22 |
Family
ID=65745634
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810998990.0A Pending CN109502860A (zh) | 2017-09-15 | 2018-08-29 | 显影废液处理装置和处理方法 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7055326B2 (ja) |
| KR (1) | KR102499569B1 (ja) |
| CN (1) | CN109502860A (ja) |
| TW (1) | TWI821186B (ja) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1053567A (ja) * | 1996-08-12 | 1998-02-24 | Showa Denko Kk | 現像廃液からの水酸化テトラアルキルアンモニウムの精製回収法 |
| CN101111804A (zh) * | 2004-11-30 | 2008-01-23 | 株式会社德山 | 显影废液的处理方法 |
| WO2008056671A1 (fr) * | 2006-11-09 | 2008-05-15 | Tokuyama Corporation | Procédé de neutralisation d'un résidu liquide de révélateur contenant de l'hydroxyde de tétraalkylammonium |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1292812A (en) * | 1969-02-10 | 1972-10-11 | Ici Ltd | Separation process |
| JP3109525B2 (ja) | 1990-12-27 | 2000-11-20 | クロリンエンジニアズ株式会社 | 水酸化テトラアルキルアンモニムの再生方法 |
| JPH0631105A (ja) * | 1992-07-06 | 1994-02-08 | Kennel F Griffith | 結晶化可能な物質を超精製する多段階再結晶化 |
| JPH1110134A (ja) * | 1997-06-20 | 1999-01-19 | Fujitsu Ltd | 廃液処理装置及び廃液処理方法 |
| JPH11226302A (ja) * | 1998-02-12 | 1999-08-24 | Kurita Water Ind Ltd | 排液の処理方法 |
| JP2003340449A (ja) | 2002-05-27 | 2003-12-02 | Babcock Hitachi Kk | テトラアルキルアンモニウムヒドロキシド含有廃水の処理方法 |
| JP2004066102A (ja) | 2002-08-06 | 2004-03-04 | Babcock Hitachi Kk | 廃液処理方法及び装置 |
| JP2006157399A (ja) | 2004-11-29 | 2006-06-15 | Hitachi Ltd | 電子署名付き電子文書交換支援方法及び情報処理装置 |
| JP2008073639A (ja) | 2006-09-22 | 2008-04-03 | Kurita Water Ind Ltd | ホウ素の回収装置 |
| WO2014122000A1 (de) | 2013-02-05 | 2014-08-14 | Siemens Aktiengesellschaft | Verfahren und vorrichtung zur aufbereitung einer mit kohlendioxid verunreinigten aminosäuresalzlösung |
-
2017
- 2017-09-15 JP JP2017177403A patent/JP7055326B2/ja active Active
-
2018
- 2018-05-23 TW TW107117507A patent/TWI821186B/zh active
- 2018-07-11 KR KR1020180080800A patent/KR102499569B1/ko active IP Right Grant
- 2018-08-29 CN CN201810998990.0A patent/CN109502860A/zh active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1053567A (ja) * | 1996-08-12 | 1998-02-24 | Showa Denko Kk | 現像廃液からの水酸化テトラアルキルアンモニウムの精製回収法 |
| CN101111804A (zh) * | 2004-11-30 | 2008-01-23 | 株式会社德山 | 显影废液的处理方法 |
| WO2008056671A1 (fr) * | 2006-11-09 | 2008-05-15 | Tokuyama Corporation | Procédé de neutralisation d'un résidu liquide de révélateur contenant de l'hydroxyde de tétraalkylammonium |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20190031129A (ko) | 2019-03-25 |
| TW201915071A (zh) | 2019-04-16 |
| JP7055326B2 (ja) | 2022-04-18 |
| JP2019051479A (ja) | 2019-04-04 |
| KR102499569B1 (ko) | 2023-02-15 |
| TWI821186B (zh) | 2023-11-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20190322 |
|
| WD01 | Invention patent application deemed withdrawn after publication |