CN109202696A - A kind of thinned pad of Diamond Ceramics - Google Patents

A kind of thinned pad of Diamond Ceramics Download PDF

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Publication number
CN109202696A
CN109202696A CN201811053065.7A CN201811053065A CN109202696A CN 109202696 A CN109202696 A CN 109202696A CN 201811053065 A CN201811053065 A CN 201811053065A CN 109202696 A CN109202696 A CN 109202696A
Authority
CN
China
Prior art keywords
substrate
thinned
pad
chip
circulating line
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201811053065.7A
Other languages
Chinese (zh)
Inventor
颜杰钦
郭东勇
李泽辉
颜均城
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Roc Grinding Far Away Science And Technology Ltd Of Taishan City
Original Assignee
Roc Grinding Far Away Science And Technology Ltd Of Taishan City
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Roc Grinding Far Away Science And Technology Ltd Of Taishan City filed Critical Roc Grinding Far Away Science And Technology Ltd Of Taishan City
Priority to CN201811053065.7A priority Critical patent/CN109202696A/en
Publication of CN109202696A publication Critical patent/CN109202696A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • B24B37/20Lapping pads for working plane surfaces
    • B24B37/26Lapping pads for working plane surfaces characterised by the shape of the lapping pad surface, e.g. grooved

Abstract

The invention discloses a kind of Diamond Ceramics, and pad is thinned, including substrate and grinding layer, the top surface of the substrate is arranged in the grinding layer, the grinding layer is provided with interlaced chip space, the grinding table of protrusion is formed between the chip space, the grinding table surface is provided with lug boss, and the lug boss is round table-like;The substrate is provided with the chip-removal hole for running through the substrate and grinding layer along the vertical direction, and the chip-removal hole is connected to the chip space;Heat dissipation channel is provided in the substrate, the heat dissipation channel includes water inlet line, outlet conduit and a plurality of circulating line composition, the center of circle of a plurality of circulating line is identical, and the water inlet line is connected to a plurality of circulating line, and the outlet conduit is connected to a plurality of circulating line.

Description

A kind of thinned pad of Diamond Ceramics
Technical field
The present invention relates to a kind of Diamond Ceramics, and pad is thinned.
Background technique
The polishing grinding material of the sheet-like flexibles matrixes such as common sand paper is typically only capable to since shape is not fixed to manual throwing Light or to hand-operated tools polishing operation, cannot be used in machinery equipment, therefore not using this common polishing grinding material It can improve efficiency, and it is bad to radiate, the heat for the generation that rubs may or cause to polish product and burn to change colour and influence whole throw Light effect.
Summary of the invention
In order to overcome the disadvantages and deficiencies of the prior art, the invention discloses a kind of Diamond Ceramics, and pad, including base is thinned The top surface of the substrate is arranged in material and grinding layer, the grinding layer, and the grinding layer is provided with interlaced chip space, institute The grinding table that protrusion is formed between chip space is stated, the grinding table surface is provided with lug boss, and the lug boss is round table-like; The substrate is provided with the chip-removal hole for running through the substrate and grinding layer along the vertical direction, and the chip-removal hole is connected to the chip removal Slot;Heat dissipation channel is provided in the substrate, the heat dissipation channel includes water inlet line, outlet conduit and a plurality of circulating line group At the center of circle of a plurality of circulating line is identical, and the water inlet line is connected to a plurality of circulating line, the outlet pipe Road is connected to a plurality of circulating line.
As a further improvement of the present invention, the cross section of the circulating line is circle.
As a further improvement of the present invention, it is provided with three circulating lines altogether.
As a further improvement of the present invention, it is provided with 15 chip-removal holes altogether.
As a further improvement of the present invention, the chip-removal hole is uniformly arranged in the substrate and grinding layer.
As a further improvement of the present invention, the shape of the grinding table is cylinder.
As a further improvement of the present invention, the lug boss is made of silicon nitride ceramics.
A kind of thinned mat structure of Diamond Ceramics of the invention is simple, perfect heat-dissipating.
In order to better understand and implement, the invention will now be described in detail with reference to the accompanying drawings.
Detailed description of the invention
Fig. 1 is front schematic view of the present invention.
Fig. 2 is top view of the invention.
Fig. 3 is the schematic diagram of heat dissipation channel in substrate of the present invention.
Specific embodiment
Fig. 1-3 is please referred to, the invention discloses a kind of Diamond Ceramics, and pad, including substrate 10 and grinding layer 20, institute is thinned The top surface that the substrate 10 is arranged in grinding layer 20 is stated, the grinding layer 20 is provided with interlaced chip space 21, the row The grinding table 22 of protrusion is formed between bits slot 21,22 surface of grinding table is provided with lug boss 23, and the lug boss 23 is It is round table-like;The substrate 10 is provided with the chip-removal hole 11 for running through the substrate 10 and grinding layer 20 along the vertical direction, the chip removal Hole 11 is connected to the chip space 21;Be provided with heat dissipation channel in the substrate 10, the heat dissipation channel include water inlet line 31, Outlet conduit 32 and a plurality of circulating line 33 form, and the center of circle of a plurality of circulating line 33 is identical, and the water inlet line 31 is It is connected to a plurality of circulating line 33, the outlet conduit 32 is connected to a plurality of circulating line 33.
The cross section of the circulating line 33 is circle.It is provided with three circulating lines 33 altogether.It is provided with 15 altogether A chip-removal hole 11.The chip-removal hole 11 is uniformly arranged in the substrate 10 and grinding layer 20.The shape of the grinding table 22 Shape is cylinder.The lug boss 23 is made of silicon nitride ceramics.
The water inlet line 31 and the outlet conduit 32 extend since 10 lateral surface of substrate into the substrate 10 And the circulating line 33 is passed through, cooling water source is accessed from the water inlet line 31, and coolant liquid is flowed through from the circulating line 33 It is flowed out later from the outlet conduit 32.The contact surface of the lug boss 23 and workpiece is smooth, does not easily cause secondary scuffing.Clast Can be mobile from chip space 21, and be discharged through the chip-removal hole 11.It is preferable that the grinding table 22 is set as cylindrical stability.
A kind of thinned mat structure of Diamond Ceramics of the invention is simple, perfect heat-dissipating.
The invention is not limited to above embodiment, if not departing from the present invention to various changes or deformation of the invention Spirit and scope, if these changes and deformation belong within the scope of claim and equivalent technologies of the invention, then this hair It is bright to be also intended to encompass these changes and deformation.

Claims (7)

1. pad is thinned in a kind of Diamond Ceramics, it is characterised in that: including substrate and grinding layer, the grinding layer is arranged in the base The top surface of material, the grinding layer are provided with interlaced chip space, and the grinding table of protrusion, institute are formed between the chip space It states grinding table surface and is provided with lug boss, the lug boss is round table-like;The substrate is provided with along the vertical direction through described The chip-removal hole of substrate and grinding layer, the chip-removal hole are connected to the chip space;Heat dissipation channel is provided in the substrate, it is described Heat dissipation channel includes water inlet line, outlet conduit and a plurality of circulating line composition, and the center of circle of a plurality of circulating line is identical, institute It states water inlet line to be connected to a plurality of circulating line, the outlet conduit is connected to a plurality of circulating line.
2. pad is thinned in a kind of Diamond Ceramics according to claim 1, it is characterised in that: the cross section of the circulating line For circle.
3. pad is thinned in a kind of Diamond Ceramics according to claim 1, it is characterised in that: be provided with three annulars altogether Pipeline.
4. pad is thinned in a kind of Diamond Ceramics according to claim 1, it is characterised in that: be provided with 15 rows altogether Consider hole to be worth doing.
5. pad is thinned in a kind of Diamond Ceramics according to claim 4, it is characterised in that: the chip-removal hole is uniformly arranged on In the substrate and grinding layer.
6. pad is thinned in a kind of Diamond Ceramics according to claim 1, it is characterised in that: the shape of the grinding table is circle Cylindricality.
7. pad is thinned in a kind of Diamond Ceramics according to claim 1, it is characterised in that: the lug boss is made pottery by silicon nitride Porcelain is made.
CN201811053065.7A 2018-09-10 2018-09-10 A kind of thinned pad of Diamond Ceramics Pending CN109202696A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201811053065.7A CN109202696A (en) 2018-09-10 2018-09-10 A kind of thinned pad of Diamond Ceramics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201811053065.7A CN109202696A (en) 2018-09-10 2018-09-10 A kind of thinned pad of Diamond Ceramics

Publications (1)

Publication Number Publication Date
CN109202696A true CN109202696A (en) 2019-01-15

Family

ID=64987393

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201811053065.7A Pending CN109202696A (en) 2018-09-10 2018-09-10 A kind of thinned pad of Diamond Ceramics

Country Status (1)

Country Link
CN (1) CN109202696A (en)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202726714U (en) * 2012-07-06 2013-02-13 元亮科技有限公司 Grinding polishing disk with circulation water cooling device
CN204277743U (en) * 2014-10-29 2015-04-22 安阳方圆研磨材料有限责任公司 Hard polishing pad
US20150283671A1 (en) * 2014-04-08 2015-10-08 Kinik Company Chemical mechanical polishing conditioner
CN105328560A (en) * 2015-09-22 2016-02-17 广东长盈精密技术有限公司 Two-sided grinding process
CN107073688A (en) * 2014-10-28 2017-08-18 阪东化学株式会社 Grind material and grind the manufacture method of material
CN206717685U (en) * 2014-09-26 2017-12-08 阪东化学株式会社 Grinding pad
CN108188921A (en) * 2018-03-09 2018-06-22 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) Water circle device and grinding device
CN108430701A (en) * 2016-01-06 2018-08-21 阪东化学株式会社 Grind material
CN108472789A (en) * 2016-01-08 2018-08-31 阪东化学株式会社 Grind material
CN208744535U (en) * 2018-09-10 2019-04-16 台山市远鹏研磨科技有限公司 A kind of thinned pad of Diamond Ceramics

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202726714U (en) * 2012-07-06 2013-02-13 元亮科技有限公司 Grinding polishing disk with circulation water cooling device
US20150283671A1 (en) * 2014-04-08 2015-10-08 Kinik Company Chemical mechanical polishing conditioner
CN206717685U (en) * 2014-09-26 2017-12-08 阪东化学株式会社 Grinding pad
CN107073688A (en) * 2014-10-28 2017-08-18 阪东化学株式会社 Grind material and grind the manufacture method of material
CN204277743U (en) * 2014-10-29 2015-04-22 安阳方圆研磨材料有限责任公司 Hard polishing pad
CN105328560A (en) * 2015-09-22 2016-02-17 广东长盈精密技术有限公司 Two-sided grinding process
CN108430701A (en) * 2016-01-06 2018-08-21 阪东化学株式会社 Grind material
CN108472789A (en) * 2016-01-08 2018-08-31 阪东化学株式会社 Grind material
CN108188921A (en) * 2018-03-09 2018-06-22 北京半导体专用设备研究所(中国电子科技集团公司第四十五研究所) Water circle device and grinding device
CN208744535U (en) * 2018-09-10 2019-04-16 台山市远鹏研磨科技有限公司 A kind of thinned pad of Diamond Ceramics

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