CN109155242B

CN109155242B - Gas distribution showerhead for semiconductor processing

Info

Publication number: CN109155242B
Application number: CN201780031024.5A
Authority: CN
Inventors: A·N·恩古耶; D·卢博米尔斯基; M·T·萨米尔
Original assignee: Applied Materials Inc
Current assignee: Applied Materials Inc
Priority date: 2016-05-20
Filing date: 2017-04-20
Publication date: 2023-05-09
Anticipated expiration: 2037-04-20
Also published as: KR20190005235A; WO2017200696A1; KR20180138565A; US10829855B2; JP2019123940A; US10577690B2; JP2019517143A; KR102156389B1; TWI696211B; KR102156390B1; JP6818782B2; KR102214350B1; JP6751448B2; TW201742109A; TWI759741B; US20170335456A1; US20170335457A1; CN109594061A; KR20200108119A; CN109155242A

Abstract

Embodiments disclosed herein generally relate to a gas distribution assembly for providing improved uniform distribution of process gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a zone divider, and a dual zone showerhead. The gas distribution assembly provides independent center-to-edge flow banding, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.

Description

Gas distribution showerhead for semiconductor processing

Technical Field

Embodiments of the present disclosure generally relate to systems and apparatus for processing semiconductor substrates. More specifically, embodiments of the present disclosure relate to a gas distribution assembly having a dual zone showerhead for improved deposition uniformity over a large area substrate.

Background

A gas distribution showerhead is disposed in a semiconductor processing chamber and typically overlies a workpiece or substrate. As the demand for electronic devices such as flat panel displays and integrated circuits continues to increase, the size of substrates and chambers for processing substrates will also continue to increase. Displays and integrated circuits are typically manufactured by a series of processes in which layers are deposited on a substrate and the deposited material is etched into a desired pattern. These processes typically include Chemical Vapor Deposition (CVD).

In addition, as the substrate size continues to increase, uniformity of films deposited on the substrate becomes increasingly difficult. Accordingly, there is a need in the art for a processing chamber that can improve substrate process uniformity. In particular, there is a need for an improved gas distribution assembly that provides improved uniform distribution of process gases in a semiconductor processing chamber.

Disclosure of Invention

In one embodiment, a gas distribution assembly is disclosed. The gas distribution assembly includes: a gas distribution plate; a partition plate coupled to the gas distribution plate; and a dual zone showerhead coupled to the zone divider. The gas distribution plate includes: at least one gas supply inlet; a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; and a first plurality of gas holes disposed within the plurality of passages and passing through the gas distribution plate. The partition plate includes: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner region from the outer region. The dual zone showerhead includes: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a groove disposed between the inner region and the outer region. The trench is configured to receive the first barrier wall such that an inner region of the dual region showerhead is physically separated from an outer region of the dual region showerhead. Further, the second and fourth plurality of gas holes are patterned to avoid coaxial flow, and the third and fifth plurality of gas holes are patterned to avoid coaxial flow.

In another embodiment, a gas distribution assembly is disclosed. The gas distribution assembly includes: a gas distribution plate; a partition plate coupled to the gas distribution plate; a dual zone showerhead coupled to the zone divider; and a mixing manifold operatively coupled to the gas distribution plate. The gas distribution plate includes: at least one gas supply inlet; a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; and a first plurality of gas holes disposed within the plurality of passages and passing through the gas distribution plate. The partition plate includes: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner region from the outer region. The dual zone showerhead includes: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a groove disposed between the inner region and the outer region. The trench is configured to receive the first barrier wall such that an inner region of the dual region showerhead is physically separated from an outer region of the dual region showerhead. The mixing manifold includes a plurality of mixing channels. The mixing channels each include a first portion and a second portion. The diameter of the choke passage disposed between the first portion and the second portion is smaller than any diameter of the first portion or the second portion.

In another embodiment, a gas distribution assembly is disclosed. The gas distribution assembly includes: a mixing manifold coupled to the gas distribution plate; a partition plate coupled to the gas distribution plate; and a dual zone showerhead coupled to the zone divider. The mixing manifold includes a plurality of mixing channels. The mixing channel comprises a first portion and a second portion, wherein a diameter of a choke channel disposed between the first portion and the second portion is smaller than any diameter of the first portion or the second portion. The gas distribution plate includes: at least one gas supply inlet; a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; and a first plurality of gas holes disposed within the plurality of passages and passing through the gas distribution plate. The partition plate includes: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner region from the outer region. The dual zone showerhead includes: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a groove disposed between the inner region and the outer region. The trench is configured to receive the first barrier wall such that an inner region of the dual region showerhead is physically separated from an outer region of the dual region showerhead. The second plurality of gas holes and the fourth plurality of gas holes are patterned to avoid coaxial flow, and wherein the third plurality of gas holes and the fifth plurality of gas holes are patterned to avoid coaxial flow.

In another embodiment, a process chamber is disclosed. The processing chamber includes: a chamber body at least partially defining a processing volume within the chamber body; a substrate support disposed in the processing volume and coupled with the chamber body; an inlet adapter; and a gas distribution assembly. The gas distribution assembly includes: a mixing manifold defining a plurality of mixing channels; a partition plate; and the double-zone spray head is coupled with the zone partition plate. The partition plate includes: an inner zone defining a first plurality of gas holes; an outer region defining a second plurality of gas holes; and a first barrier wall separating the inner region from the outer region. The dual zone showerhead includes: an inner zone defining a third plurality of gas holes; an outer region defining a fourth plurality of gas holes; and a groove disposed between the inner region and the outer region. The trench is configured to receive the first barrier wall such that an inner region of the dual region showerhead is physically separated from an outer region of the dual region showerhead. The first and third pluralities of gas holes are patterned to avoid coaxial flow, and the second and fourth pluralities of gas holes are patterned to avoid coaxial flow.

In another embodiment, a process chamber is disclosed. The processing chamber includes: a chamber body defining a processing volume within the chamber body; a gas distribution plate; a partition plate coupled to the gas distribution plate; a dual zone showerhead coupled to the zone divider; and a mixing manifold operatively coupled to the gas distribution plate. The gas distribution plate includes: at least one gas supply inlet; and a first plurality of gas holes defined through the gas distribution plate. The partition plate includes: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner region from the outer region. The dual zone showerhead includes: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a groove disposed between the inner region and the outer region. The trench is configured to receive the first barrier wall such that an inner region of the dual region showerhead is physically separated from an outer region of the dual region showerhead. The mixing manifold includes a plurality of mixing channels. The mixing channel comprises a first portion and a second portion, wherein a diameter of a choke channel disposed between the first portion and the second portion is smaller than any diameter of the first portion or the second portion.

In another embodiment, a process chamber is disclosed. The processing chamber includes: a chamber body defining a processing volume within the chamber body; a substrate support disposed in the processing volume and coupled to the chamber body; a gas supply coupled to the chamber body; a gas distribution assembly disposed in the chamber body; and a mixing manifold operatively coupled to the gas distribution plate. The gas distribution assembly includes: a gas distribution plate; a partition plate coupled to the gas distribution plate; and a dual zone showerhead coupled to the zone divider. The gas distribution plate includes: at least one gas supply inlet; and a first plurality of gas holes disposed through the gas distribution plate. The partition plate includes: an inner zone comprising a second plurality of gas holes; an outer zone comprising a third plurality of gas holes; and a first barrier wall separating the inner region from the outer region. The dual zone showerhead includes: an inner zone comprising a fourth plurality of gas holes; an outer zone comprising a fifth plurality of gas holes; and a groove disposed between the inner region and the outer region. The trench is configured to receive the first barrier wall such that an inner region of the dual region showerhead is physically separated from an outer region of the dual region showerhead. The mixing manifold includes a plurality of mixing channels including a first portion and a second portion, wherein a diameter of a choke channel disposed between the first portion and the second portion is less than any diameter of the first portion or the second portion.

Drawings

So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments, some of which are illustrated in the appended drawings. It is to be noted, however, that the appended drawings illustrate only typical embodiments of this disclosure and are therefore not to be considered limiting of its scope, for the disclosure may admit to other equally effective embodiments.

Fig. 1 is a schematic cross-sectional view of a processing chamber according to one embodiment disclosed herein.

FIG. 2A is a schematic perspective view of the top of a gas distribution plate according to one embodiment disclosed herein.

FIG. 2B is a schematic perspective view of the bottom of the gas distribution plate of FIG. 2A according to one embodiment disclosed herein.

FIG. 3 is a schematic perspective view of the top of a divider plate according to one embodiment disclosed herein.

FIG. 4 is a schematic perspective view of the top of a spray head according to one embodiment disclosed herein.

To facilitate understanding, identical reference numerals have been used, where possible, to designate identical elements that are common to the figures. It is contemplated that elements disclosed in one embodiment may be beneficially utilized on other embodiments without specific recitation.

Detailed Description

Fig. 1 is a cross-sectional view of a processing system 100. The processing system 100 includes a gas source 102 and a processing chamber 104. The process chamber 104 has a process volume 105 defined therein. In some embodiments, the processing volume is defined by a spacer 122 surrounding a substrate support 124, the substrate support 124 for holding a substrate thereon. The substrate may be disposed on the substrate support 124 across a processing region 128 from a gas distribution showerhead 130. The substrate may enter and exit the process chamber 104 through a slit valve opening 132 disposed through the process chamber 104. In some embodiments, the substrate support 124 is coupled to a pedestal heater 126, the pedestal heater 126 being configured to provide heat to the substrate support.

The general direction of gas and/or product flow is downward in the orientation of fig. 1, and this direction may be referred to herein as "downstream", while the opposite direction upward in the orientation of fig. 1 may be referred to as "upstream". Moreover, a significant portion of the apparatus shown in fig. 1 may be cylindrically symmetric about the central axis 106, with the associated directions defined as a radial direction 108 and an azimuthal direction 110. This directional convention may be used herein, although one skilled in the art will appreciate that many of the principles described herein are not limited to cylindrically symmetric systems.

As shown in fig. 1, the process chamber 104 generally includes an inlet adapter 112 disposed downstream of at least one flow ratio controller 114 coupled to the process chamber 104. In some embodiments, the processing system 100 may include a plurality of flow ratio controllers 114. As shown in fig. 1, two four-way flow ratio controllers 114 are coupled to the process chamber 104. The flow ratio controller 114 may be disposed outside and/or inside the processing region 128. Each flow ratio controller 114 may provide independent chamber matching. Gas may enter the inlet adapter 112 from the flow ratio controller 114 on a first side 116A of the inlet adapter 112 such that gas is provided to a first section of the gas distribution assembly. Further, gas may enter the inlet adapter 112 from the flow ratio controller 114 on the second side 116B of the inlet adapter such that gas is also provided to the second section of the gas distribution assembly. The gas entering the flow ratio controller 114 may be HF and/or NH ₃ 。

The inlet adapter 112 may be coupled to the mixing plate 118. Mixing plate 118 may be disposed downstream of inlet adapter 112. The mixing plate 118 may be coupled to a gas distribution assembly 134. The gas distribution assembly 134 may be disposed downstream of the mixing plate 118. In some embodiments, the gas distribution assembly 134 may include a mixing manifold 120, gas distribution showerhead 130, gas distribution plate 136, and/or zoned plate 138, among others. A zonal isolation plate 138 is coupled to the spacer 122 to further define the processing region 128.

The mixing manifold 120 is operably coupled to the mixing plate 118 at a first end and to the gas distribution plate 136 at a second end. The mixing manifold 120 includes a plurality of mixing channels 140. As shown in fig. 1, two mixing channels are shown. Each mixing channel 140 includes a first portion 142 and a second portion 144 separated by a choke channel 146. A choke passage 146 is provided between the first portion 142 and the second portion 144. The diameter of the choke passage 146 is smaller than the diameter of the first portion 142 and/or the second portion 144. The difference in diameters of the choke passage 146 and the first portion 142 or the second portion 144 may allow for a variable flow rate of the gas.

The gas distribution assembly 134 also includes a gas distribution plate 136. A gas distribution plate 136 is coupled to the mixing manifold 120 and, in some embodiments, is disposed downstream of the mixing manifold 120. In some embodiments, the gas distribution plate 136 comprises an aluminum material, such as 6061-T6 aluminum material. In some embodiments, the gas distribution plate 136 may comprise a ceramic material, a dielectric material, a quartz material, or a stainless steel material.

The gas distribution assembly also includes a zoned baffle 138. The blocker plate 138 is coupled to the gas distribution plate 136 and, in some embodiments, is disposed downstream of the gas distribution plate 136. In some embodiments, the zoned separator 138 comprises an aluminum material, for example, 6061-T6 aluminum material. In some embodiments, the zonal isolation 138 may comprise a ceramic material, a dielectric material, a quartz material, or a stainless steel material.

The gas distribution assembly also includes a gas distribution showerhead 130. The gas distribution showerhead 130 is coupled to the divider plate 138 and, in some embodiments, is disposed downstream of the divider plate 138. In certain embodiments, a gas distribution showerhead 130 may be disposed between a zoned baffle 138 and the processing region 128. In some embodiments, the gas distribution showerhead 130 comprises an aluminum material, such as 6061-T6 aluminum material. In some embodiments, the gas distribution showerhead 130 may comprise a ceramic material, a dielectric material, a quartz material, or a stainless steel material.

Fig. 2A and 2B each schematically illustrate a gas distribution plate 136. Fig. 2A shows a top surface 202 of the gas distribution plate 136. As shown, the gas distribution plate 136 includes at least one gas supply inlet 206. Although a first gas supply inlet 206A and a second gas supply inlet 206B are shown, it is contemplated that any number of gas supply inlets 206, such as one gas supply inlet or four gas supply inlets, may be included in the gas distribution plate 136. The first gas supply inlet 206A is operatively connected with the first mixing channel 140 of the mixing manifold 120 at a first location. The first location may be disposed at the central axis 106 or adjacent the central axis 106. The first gas supply inlet 206A is further operatively connected to the partition plate 138. The second gas supply inlet 206B is operatively connected to the second mixing channel 140 of the mixing manifold 120 at a second location. The second location may be disposed adjacent to the first location. A second gas supply inlet 206B is also operatively connected to the partition plate 138. Each gas supply inlet 206 may receive gas via the mixing manifold 120. The first gas supply inlet 206A may distribute gas to the partition plate 138 via the passages 208.

As shown in fig. 2A, the gas distribution plate 136 includes a plurality of gas passages 210. The plurality of gas passages 210 form a path splitting manifold in the gas distribution plate 136. The plurality of gas channels 210 are coupled to at least one gas supply inlet. As shown in fig. 2A, a plurality of gas channels 210 are operatively connected at a first end to the second gas supply inlet 206B. At a second end of the plurality of gas channels 210, the plurality of gas channels 210 are operatively connected to a first plurality of gas holes 212. A first plurality of gas holes 212 are disposed within the plurality of gas passages 210 and extend through the gas distribution plate 136 at a second end.

A plurality of gas passages 210 are disposed radially outward from the center of the gas distribution plate 136. Further, a plurality of gas channels 210 are distributed around the first gas supply inlet 206A and/or the second gas supply inlet 206B. As shown in fig. 2A, the plurality of gas passages 210 are symmetrically distributed about the first gas supply inlet 206A and/or the second gas supply inlet 206B, however, it is contemplated that the plurality of gas passages may also be asymmetrically distributed about the first gas supply inlet 206A and/or the second gas supply inlet 206B. As shown in the embodiment of the gas distribution plate 136 shown in fig. 2A, the first gas supply inlet 206A may supply gas through an inner region of the gas distribution plate and the second gas supply inlet 206B may supply gas through an outer region of the gas distribution plate. The plurality of gas passages 210 are arranged in a plurality of tees 214, wherein the gas flow is split approximately equally into opposite circumferential directions at each tee 214. The individual tees 214 are connected in series such that the gas flow is divided between successively shorter

arcuate channels

210A, 210B, 210C in order starting from the long channel 210A and ending with the short channel 210C. The short channel 210C terminates at a tip where at least one of the first plurality of gas holes 212 is located. Each tee 214 is symmetrical about the gas distribution plate 136 such that the distance that gas travels through each gas channel 210 is the same. This feature helps to provide a uniform gas pressure in all of the first plurality of gas holes 212. Furthermore, each tee 214 equally distributes the flow rate of gas at that joint. The plurality of gas channels 210 provide a recursive gas flow. The plurality of gas passages 210 may be fabricated via electron beam welding. As shown in fig. 2A, the first plurality of gas holes 212 may include eight equally distributed gas holes 212 that provide gas outlets to the partition plate 138. However, it is contemplated that the first plurality of gas holes 212 may include any number of gas holes.

Fig. 2B shows the bottom surface 204 of the gas distribution plate 136. As shown, the gas exits a first plurality of gas holes 212 that extend through the bottom surface 204 of the gas distribution plate 136. The first plurality of gas holes 212 are equally spaced around the outer portion of the gas distribution plate. Upon exiting the first plurality of gas holes 212, gas may flow into the outer region 304 of the partition plate 138, as will be discussed below. In addition, the gas exits a first gas supply inlet 206A that also extends through the bottom surface 204 of the gas distribution plate 136. Upon exiting the first gas supply inlet 206A, gas may flow into the inner zone 302 of the zone divider 138, as will be discussed below.

Fig. 3 shows a top view of the section divider 138. It should be noted that in some embodiments, the corresponding bottom view of the divider 138 may be substantially similar to the top view of the divider 138. A partition plate 138 is disposed between the gas distribution plate 136 and the gas distribution showerhead 130. In some embodiments, a zone divider 138 is coupled to the gas distribution plate 136 and/or the gas distribution showerhead 130.

In some embodiments, and as shown in fig. 3, the zoned barrier 138 is a dual zoned barrier 138. Thus, the compartment divider 138 includes an inner region 302 and an outer region 304. The inner region 302 may be disposed within the outer region 304. In some embodiments, the inner zone 302 may be disposed entirely within the outer zone 304. In other embodiments, the outer region 304 may surround the inner region 302.

The inner zone 302 includes a second plurality of gas holes 306. In some embodiments, the second plurality of gas holes 306 may be straight drilled gas holes. The straight drilled gas holes may each have a longitudinal axis aligned with the longitudinal axis of the divider plate 138 and/or the gas distribution showerhead 130. In other embodiments, the second plurality of gas holes 306 may be drilled at an angle. In other embodiments, the second plurality of gas holes 306 may include straight drilled gas holes and/or a mixture of gas holes drilled at an angle. Accordingly, the gas holes drilled at an angle may have a longitudinal axis that is not aligned with the longitudinal axis of the divider plate 138 and/or the gas distribution showerhead 130. Further, in some embodiments, the second plurality of gas holes 306 may have a diameter between about 0.01 inches and about 0.3 inches, for example, about 0.015 inches. Thus, in some embodiments, the second plurality of gas holes 306 may each have a uniform width. In other embodiments, the second plurality of gas holes 306 may each have a variable width. Further, each of the second plurality of gas holes 306 may be equally spaced apart, however, in some embodiments, each of the second plurality of gas holes 306 may be variably spaced apart.

The outer region 304 includes a third plurality of gas holes 308. In some embodiments, the third plurality of gas holes 308 may be straight drilled gas holes. The straight drilled gas holes may each have a longitudinal axis aligned with the longitudinal axis of the divider plate 138 and/or the gas distribution showerhead 130. In other embodiments, the third plurality of gas holes 308 may be drilled at an angle. In other embodiments, the third plurality of gas holes 308 may include straight drilled gas holes and/or a mixture of gas holes drilled at an angle. Thus, the gas holes drilled at an angle may have a longitudinal axis that is not aligned with the longitudinal axis of the divider plate 138. Further, in some embodiments, the third plurality of gas holes 308 may have a diameter between about 0.01 inches and about 0.3 inches, for example, about 0.015 inches. Thus, in some embodiments, the third plurality of gas holes 308 may each have a uniform width. In other embodiments, the third plurality of gas holes 308 may each have a variable width. Further, each of the third plurality of gas holes 308 may be equally spaced apart, however, in some embodiments, each of the third plurality of gas holes 308 may be variably spaced apart. In general, the divider plate 138 may include between about 600 gas holes and about 2200 gas holes.

The zoned plate 138 may include a plurality of surfaces 312, wherein each surface 312 is layered such that each surface has a different elevation from the zoned plate. In some embodiments, and as shown in fig. 3, the zoned separator may have a first surface 312A, a second surface 312B, and a third surface 312C. The first surface 312A may have the lowest height, and the third surface 312C may have the highest height. The inner zone 302 and the outer zone 304 are disposed in the same surface. As shown, the inner zone 302 and the outer zone 304 are disposed within the first surface 312A. However, it is contemplated that the inner zone 302 and the outer zone 304 may be disposed entirely and/or partially on different surfaces 312.

The first barrier wall 310 is disposed between the inner zone 302 and the outer zone 304 of the zone divider 138. The first barrier wall 310 is coupled to the compartment ceiling 138 and extends outwardly from the first surface 312A of the compartment ceiling 138. The top surface 314 of the first barrier wall 310 may be substantially flush with a higher layered surface of the partition wall, e.g., the second surface 312B or the third surface 312C. In some embodiments, the first barrier wall 310 may extend between about 0.125 inches and about 0.350 inches outwardly from the first surface 312A of the partition wall.

A first inner O-ring 316 (see fig. 1) may be disposed on the first surface of the first barrier wall 310 and/or coupled to the first surface of the first barrier wall 310. Returning to fig. 2B, a trench 216 may be formed in the bottom surface 204 of the gas distribution plate 136. The grooves 216 in the gas distribution plate 136 may be sized to receive and/or receive the first barrier wall 310 and the first inner O-ring 316 of the zone partition plate 138 such that the inner zone 302 and the outer zone 304 of the zone partition plate 138 are sealingly closed and/or coupled to the top surface of the zone partition plate when the zone partition plate 138 is coupled to the gas distribution plate 136. Thus, a first inner O-ring 316 is disposed between the first barrier wall 310 and the gas distribution plate 136. In some embodiments, the first inner O-ring 316 comprises a perfluoroelastomer material, such as a Kalrez material.

The zonal isolation plate 138 may include a groove 318 formed on one surface of the zonal isolation plate 138. The groove 318 may be disposed around the outer region 304 of the zone divider 138 such that the groove 318 surrounds the second surface 312B. The grooves 318 are configured to seal the zone divider 138 to the gas distribution plate 136. The grooves 318 in the blocker plate 138 may be sized to accept and/or receive the first outer O-ring 315 (see fig. 1) such that the blocker plate 138 is sealingly coupled to the gas distribution plate when the blocker plate 138 is coupled to the gas distribution plate 136. Thus, a first outer O-ring 315 is disposed within the groove 318 and between the zone divider 138 and the gas distribution plate 136. In some embodiments, the first outer O-ring 315 comprises a perfluoroelastomer material, such as a Kalrez material.

As mentioned above, the bottom side of the zoned barrier 138 is substantially similar to the top side of the zoned barrier 138 shown in fig. 3. Accordingly, the bottom side (not shown) of the zonal isolation plate 138 also includes an inner zone and an outer zone that are coupled to the inner zone 302 and the outer zone 304, respectively, via a second plurality of gas holes 306 and a third plurality of gas holes 308, respectively. Further, an inner region on the bottom side of the partition plate 138 may be disposed within an outer region of the bottom side of the partition plate. In some embodiments, the inner zone on the bottom side of the zone divider 138 may be disposed entirely within the outer zone on the bottom side of the zone divider 138. In other embodiments, an outer region on the bottom side of the section divider 138 may surround an inner region on the bottom side of the section divider 138.

The bottom side of the partition plate 138 may also include a plurality of surfaces 312, wherein each surface 312 is layered such that each surface has a different rise from the partition plate 138. In addition, the bottom side of the partition wall 138 also includes a second barrier wall (shown in FIG. 1) that is substantially similar to the first barrier wall 310 discussed above. The second barrier rib is disposed between an inner region on the bottom side of the section divider 138 and an outer region on the bottom side of the section divider 138. The second barrier wall is coupled to the zone divider 138 and extends outwardly from the surface of the zone divider 138. The top surface of the second barrier wall may be substantially flush with the higher layered surface of the partition wall, as discussed above with reference to the first barrier wall 310.

The second inner O-ring 316 may be disposed on and/or coupled to the first surface of the second barrier wall. As shown in fig. 4 below, a first trench 416 may be formed in the top surface 404 of the gas distribution showerhead 130. The first groove 416 in the gas distribution showerhead 130 may be sized to receive and/or receive the second barrier wall and the second inner O-ring 316 of the district partition plate 138 such that, upon coupling the gas distribution showerhead 130 with the district partition plate 138, the inner region on the bottom side of the district partition plate 138 and the outer region on the bottom side of the district partition plate 138 are hermetically closed and/or coupled on the bottom surface of the district partition plate. Thus, the second inner O-ring 316 is disposed between the first barrier wall 310 and the gas distribution showerhead 130. In some embodiments, the second inner O-ring 316 comprises a perfluoroelastomer material, such as a Kalrez material.

Fig. 4 shows a top view of the gas distribution showerhead 130. The gas distribution showerhead 130 is disposed between a zoned baffle 138 and the processing region 128. In some embodiments, the gas distribution showerhead 130 is coupled to the divider 138 and/or the divider 122.

In some embodiments, and as shown in FIG. 4, the gas distribution showerhead 130 may be a dual zone showerhead. Thus, the gas distribution showerhead 130 includes an inner region 406 and an outer region 408. The inner region 406 may be disposed within the outer region 408. In some embodiments, the inner region 406 may be disposed entirely within the outer region 408. In other embodiments, the outer region 408 may surround the inner region 406.

As shown, the gas distribution showerhead 130 has an inner region 406 and an outer region 408 on the top surface of the gas distribution showerhead 130. The inner region 406 of the gas distribution showerhead 130 may correspond to and/or be operatively connected with the inner region of the zone divider 138. The inner region 406 of the gas distribution showerhead 130 includes a fourth plurality of gas holes 410 therethrough.

In some embodiments, the fourth plurality of gas holes 410 may be straight drilled gas holes. The straight drilled gas holes may each have a longitudinal axis aligned with the longitudinal axis of the divider plate 138 and/or the gas distribution showerhead 130. In other embodiments, the fourth plurality of gas holes 410 may be drilled at an angle. In other embodiments, the fourth plurality of gas holes 410 may include straight drilled gas holes and/or a mixture of gas holes drilled at an angle. Thus, the gas holes drilled at an angle may have a longitudinal axis that is not aligned with the longitudinal axis of the gas distribution showerhead 130. Further, in some embodiments, the fourth plurality of gas holes 410 may have a diameter between about 0.01 inches and about 0.6 inches, for example, about 0.03 inches. Thus, in some embodiments, the fourth plurality of gas holes 410 may each have a uniform width. In other embodiments, the fourth plurality of gas holes 410 may each have a variable width. Further, each of the fourth plurality of gas holes 410 may be equally spaced apart, however, in some embodiments, each of the fourth plurality of gas holes 410 may be variably spaced apart.

The outer region 408 of the gas distribution showerhead 130 may correspond to and/or be operatively connected with the outer region of the zone divider 138. The outer region of the gas distribution showerhead 130 includes a fifth plurality of gas holes 412 therethrough. In some embodiments, the fifth plurality of gas holes 412 may be straight drilled gas holes. The straight drilled gas holes may each have a longitudinal axis aligned with the longitudinal axis of the divider plate 138 and/or the gas distribution showerhead 130. In other embodiments, the fifth plurality of gas holes 412 may be drilled at an angle. In other embodiments, the fifth plurality of gas holes 412 may include straight drilled gas holes and/or a mixture of gas holes drilled at an angle. Thus, the gas holes drilled at an angle may have a longitudinal axis that is not aligned with the longitudinal axis of the gas distribution showerhead 130. Further, in some embodiments, the fifth plurality of gas holes 412 may have a diameter between about 0.01 inches and about 0.6 inches, for example, about 0.03 inches. As such, in some embodiments, the fifth plurality of gas holes 412 may each have a uniform width. In other embodiments, the fifth plurality of gas holes 412 may each have a variable width. Further, each of the fifth plurality of gas holes 412 may be equally spaced apart, however, in some embodiments, each of the fifth plurality of gas holes 412 may be variably spaced apart. In general, the gas distribution showerhead 130 may include between about 600 gas holes and about 2200 gas holes.

The gas distribution showerhead 130 further includes a first groove 416 disposed within the gas distribution showerhead 130. In some embodiments, the first groove 416 is disposed between the inner region 406 of the gas distribution showerhead 130 and the outer region 408 of the gas distribution showerhead 130. The first trench 416 may surround the inner region 406. The first groove 416 is configured to receive the first barrier wall 310 and the first inner O-ring 316 of the compartment plate, or in some embodiments, the first groove 416 is configured to receive the second barrier wall disposed on the bottom side of the compartment plate 138 and the second inner O-ring 316 also disposed on the bottom side of the compartment plate 138. The first trench 416 is configured to receive the first barrier wall 310 and/or a second barrier wall (not shown) such that the inner region 406 of the gas distribution showerhead 130 is physically separated from the outer region 408 of the gas distribution showerhead 130.

In some embodiments, the gas distribution showerhead 130 may further include a second groove 418 disposed within the gas distribution showerhead 130. The second groove 418 may be disposed about the outer region of the gas distribution showerhead 130 such that the second groove 418 surrounds the outer region 408. The second groove 418 is configured to seal the zonal baffle 138 to the gas distribution showerhead 130. The second groove 418 in the gas distribution showerhead 130 may be sized to accept and/or receive the second outer O-ring 315 (see fig. 1) such that the district partition 138 is sealingly coupled to the gas distribution showerhead 130 when the district partition 138 is coupled to the gas distribution showerhead 130. Thus, a second outer O-ring 315 is disposed within the second groove 418 between the divider plate 138 and the gas distribution showerhead 130. In some embodiments, the second outer O-ring 315 comprises a perfluoroelastomer material, such as a Kalrez material.

In certain embodiments, the gas distribution showerhead 130 may further include a void region 420 disposed between the fifth plurality of gas holes 412 and the second grooves 418. Void region 420 may surround outer region 408 and/or fifth plurality of gas holes 412. Void region 420 may not include gas holes.

Referring now to fig. 1, 2 and 3, when the gas distribution plate 136 is coupled and/or operatively connected to the blocker plate 138, a first plenum 150 is formed/disposed between the gas distribution plate 136 and the outer region 304 of the blocker plate 138. In addition, a second plenum 152 is formed/disposed between the gas distribution plate 136 and the inner region 302 of the partition plate 138. Moreover, when the blocker plate 138 is coupled and/or operatively connected to the gas distribution showerhead 130, the outer region 304 of the blocker plate 138 is aligned with the outer region 408 of the gas distribution showerhead 130 and the inner region 302 of the blocker plate 138 is aligned with the inner region 406 of the gas distribution showerhead 130. In addition, a third plenum 154 is formed/disposed between the outer region 304 of the partition plate 138 and the outer region 408 of the gas distribution showerhead 130. In addition, a fourth plenum 156 is formed/disposed between the inner region 302 of the partition plate 138 and the inner region 406 of the gas distribution showerhead 130. The first barrier wall 310 and/or the second barrier wall may separate the first air chamber 150 from the second air chamber 152 and the third air chamber 154 from the fourth air chamber 156. Each of the first, second, third, and/or

fourth gas chambers

150, 152, 154, and/or 156 allows for abrupt expansion of the gas, providing a more uniform flow.

Referring now to fig. 1, 3 and 4, the second plurality of gas holes 306 of the divider plate 138 and the fourth plurality of gas holes 410 of the gas distribution showerhead 130 are patterned such that coaxial flow is avoided when the divider plate 138 is coupled and/or operatively connected to the gas distribution showerhead 130. Thus, the longitudinal axis of each of the second plurality of gas holes 306 of the divider plate 138 is not aligned with the longitudinal axis of any of the fourth plurality of gas holes 410 of the gas distribution showerhead 130. Further, the third plurality of gas holes 308 of the divider plate 138 and the fifth plurality of gas holes 412 of the gas distribution showerhead 130 are patterned such that when the divider plate 138 is coupled and/or operatively connected to the gas distribution showerhead 130, coaxial flow is avoided. Thus, the longitudinal axis of each of the third plurality of gas holes 308 of the divider plate 138 is not aligned with the longitudinal axis of any of the fifth plurality of gas holes 412 of the gas distribution showerhead 130.

Advantages of the present disclosure include independent center-to-edge flow zonal, independent HF/NH ₃ Delivering and mixing HF/NH on cover via mixing manifold ₃ Recursive distribution in a gas distribution plate. In addition, an improved uniform distribution of the process gas into the semiconductor processing chamber is achieved. Further, embodiments of the present disclosure are retrofittable to existing, existing equipment. In addition, parts made from electroless nickel 6061-T6 aluminum provide improved corrosion resistance.

Additional advantages include the ability to vary and/or modify the flow rate in the process chamber to allow improved uniformity across the substrate. For example, there may be different flow rates between the inner and outer regions of the gas distribution assembly.

In summary, embodiments disclosed herein relate to a gas distribution assembly for providing improved uniform distribution of process gases into a semiconductor processing chamber. The gas distribution assembly includes a gas distribution plate, a zone divider, and a dual zone showerhead. The gas distribution assembly provides independent center-to-edge flow banding, independent two precursor delivery, two precursor mixing via a mixing manifold, and recursive mass flow distribution in the gas distribution plate.

While the foregoing is directed to embodiments of the present disclosure, other and further embodiments of the disclosure may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.

Claims

1. A gas distribution assembly, comprising:

a gas distribution plate, comprising:

at least one gas supply inlet;

a plurality of channels forming a path splitting manifold operatively connected to the gas supply inlet; a kind of electronic device with high-pressure air-conditioning system

A first plurality of gas holes disposed within the plurality of passages and through the gas distribution plate;

a mixing manifold operatively coupled to the gas distribution plate and having a top side and a bottom side, the mixing manifold defining a plurality of mixing channels leading from the top side to the bottom side, wherein one of the mixing channels of the plurality of mixing channels comprises:

a choke portion; and

the first portion and the second portion,

wherein the diameter of the choke portion is disposed between the first portion and the second portion, and the diameter is less than any diameter of the first portion or the second portion;

a zonal baffle coupled to the gas distribution plate and disposed downstream of the mixing channel, the zonal baffle comprising:

an inner zone comprising a second plurality of gas holes;

an outer zone comprising a third plurality of gas holes; a kind of electronic device with high-pressure air-conditioning system

A first barrier wall separating the inner region from the outer region;

a dual zone showerhead coupled to the zone divider, the dual zone showerhead comprising:

an inner zone comprising a fourth plurality of gas holes;

an outer zone comprising a fifth plurality of gas holes; a kind of electronic device with high-pressure air-conditioning system

A trench disposed between the inner region and the outer region, wherein the trench is configured to receive the first barrier wall such that an inner region of the dual-region showerhead is physically separated from an outer region of the dual-region showerhead; a kind of electronic device with high-pressure air-conditioning system

Wherein the second plurality of gas holes and the fourth plurality of gas holes are patterned to avoid coaxial flow, and wherein the third plurality of gas holes and the fifth plurality of gas holes are patterned to avoid coaxial flow.

2. The gas distribution assembly of claim 1, wherein an inner region of the dual-zone showerhead is aligned with an inner region of the zone divider.

3. The gas distribution assembly of claim 1, wherein an outer region of the dual zone showerhead is aligned with an outer region of the zone divider.

4. The gas distribution assembly of claim 1, wherein the plurality of channels are symmetrically distributed about the gas supply inlet.

5. The gas distribution assembly of claim 1, further comprising:

a first plenum disposed between the gas distribution plate and an outer region of the partition plate; a kind of electronic device with high-pressure air-conditioning system

And a second gas chamber disposed between the gas distribution plate and an inner region of the partition plate.

6. The gas distribution assembly of claim 1, further comprising:

the third air chamber is arranged between the double-zone spray head and the outer zone of the zone partition plate; a kind of electronic device with high-pressure air-conditioning system

And the fourth air chamber is arranged between the double-zone spray head and the inner zone of the zone separation plate.

7. The gas distribution assembly of claim 1, further comprising:

a first O-ring disposed between the first barrier wall and the gas distribution plate; a kind of electronic device with high-pressure air-conditioning system

And the second O-shaped ring is arranged between the first barrier wall and the double-area spray head.

8. The gas distribution assembly of claim 7, wherein the first O-ring and the second O-ring comprise a perfluoroelastomer material.

9. The gas distribution assembly of claim 1, wherein the gas distribution plate, the zone divider, or the dual zone showerhead comprises an aluminum material, a ceramic material, a dielectric material, a quartz material, or a stainless steel material.

10. The gas distribution assembly of claim 9, wherein the aluminum material is 6061-T6 aluminum material.

11. The gas distribution assembly of claim 1, wherein the first plurality of gas holes is at least eight gas holes.

12. The gas distribution assembly of claim 1, wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes each have a longitudinal axis aligned with a longitudinal axis of the dual zone showerhead.

13. The gas distribution assembly of claim 1, wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes each have a uniform width.

14. The gas distribution assembly of claim 1, wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes each have a longitudinal axis that is not aligned with a longitudinal axis of the dual zone showerhead.

15. The gas distribution assembly of claim 1, wherein the second plurality of gas holes, the third plurality of gas holes, the fourth plurality of gas holes, and the fifth plurality of gas holes each have a variable width.

16. A gas distribution assembly, comprising:

a gas distribution plate, comprising:

at least one gas supply inlet;

a blocker plate coupled to the gas distribution plate, the blocker plate comprising:

an inner zone comprising a second plurality of gas holes;

A first barrier wall separating the inner region from the outer region;

an inner zone comprising a fourth plurality of gas holes;

A trench disposed between the inner region and the outer region, wherein the first barrier wall is disposed within a portion of the trench that is sized to receive the first barrier wall such that a portion of the first barrier wall extends within the trench and an inner region of the dual-region spray is physically separated from an outer region of the dual-region spray; a kind of electronic device with high-pressure air-conditioning system

A mixing manifold having a top side and a bottom side, the mixing manifold operatively coupled to the gas distribution plate, the mixing manifold comprising:

a plurality of mixing channels leading from the top side to the bottom side, wherein one of the mixing channels of the plurality of mixing channels comprises a choke portion, a first portion, and a second portion, wherein a diameter of the choke portion disposed between the first portion and the second portion is smaller than any diameter of the first portion or the second portion, and wherein the divider is disposed downstream of the mixing channel.

17. The gas distribution assembly of claim 16, wherein the second plurality of gas holes and the fourth plurality of gas holes are patterned to avoid coaxial flow, and wherein the third plurality of gas holes and the fifth plurality of gas holes are patterned to avoid coaxial flow.

18. The gas distribution assembly of claim 16, further comprising:

a first plenum disposed between the gas distribution plate and an outer region of the partition plate; and

19. The gas distribution assembly of claim 16, further comprising:

20. A gas distribution assembly, comprising:

a mixing manifold having a top side and a bottom side, the mixing manifold comprising:

a plurality of mixing channels leading from the top side to the bottom side, wherein one of the mixing channels of the plurality of mixing channels comprises a choke portion, a first portion, and a second portion, wherein a diameter of the choke portion disposed between the first portion and the second portion is smaller than any diameter of the first portion or the second portion;

a gas distribution plate coupled to the mixing manifold, the gas distribution plate comprising:

at least one gas supply inlet;

an inner zone comprising a second plurality of gas holes;

A first barrier wall separating the inner region from the outer region;

an inner zone comprising a fourth plurality of gas holes;

A trench disposed between the inner region and the outer region, wherein the trench is configured to receive the first barrier wall such that the inner region of the dual-region showerhead is physically separated from the outer region of the dual-region showerhead, and