CN109001228B - Rotary workbench with backlight illumination for detecting substrate defects - Google Patents
Rotary workbench with backlight illumination for detecting substrate defects Download PDFInfo
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- CN109001228B CN109001228B CN201811087515.4A CN201811087515A CN109001228B CN 109001228 B CN109001228 B CN 109001228B CN 201811087515 A CN201811087515 A CN 201811087515A CN 109001228 B CN109001228 B CN 109001228B
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- 239000000758 substrate Substances 0.000 title claims abstract description 93
- 238000005286 illumination Methods 0.000 title claims abstract description 51
- 230000007547 defect Effects 0.000 title claims abstract description 48
- 239000000463 material Substances 0.000 claims description 8
- 238000000034 method Methods 0.000 claims description 5
- 230000008569 process Effects 0.000 claims description 5
- 238000001514 detection method Methods 0.000 abstract description 25
- 235000012431 wafers Nutrition 0.000 abstract description 13
- 238000007789 sealing Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 8
- 238000005259 measurement Methods 0.000 description 6
- 239000004065 semiconductor Substances 0.000 description 6
- 238000006073 displacement reaction Methods 0.000 description 4
- 238000001228 spectrum Methods 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 230000004069 differentiation Effects 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/01—Arrangements or apparatus for facilitating the optical investigation
- G01N2021/0106—General arrangement of respective parts
- G01N2021/0112—Apparatus in one mechanical, optical or electronic block
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- Life Sciences & Earth Sciences (AREA)
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- Pathology (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
The invention provides a rotary workbench with backlight illumination for detecting substrate defects, wherein a positioning device comprises a circular ring tray aiming at substrates with different sizes, and scales are arranged on the circular ring tray to position the circular substrates with different specifications; the cylindrical connecting bracket is used for connecting the substrate positioning device and the backlight lighting device to realize the sealing of the light source; a backlight illumination device providing a plurality of forms of light sources while ensuring uniform illumination; the annular adapter plate is used for fixing the lighting device and the rotary table; the rotary table can drive the backlight illumination device and the substrate positioning device to realize rotary motion; and the base is provided with a detachable function and is used for fixing the substrate positioning device and connecting with the detection platform. Compared with the existing device, the invention not only can realize accurate positioning and rotation movement of substrate wafers with various specifications for full-field scanning test, but also can provide backlight sources with various uniform illumination, thereby meeting the illumination requirements in different defect detection.
Description
Technical Field
The invention relates to the field of substrate defect measurement, in particular to a rotary workbench with backlight illumination for detecting substrate defects.
Background
With the rapid development of semiconductor materials, there is a great demand for high-performance semiconductor materials, especially in the fields of LED lighting, power electronics, new energy automobiles, and the like; the semiconductor substrate serves as a support for the entire device, the quality of the substrate being directly related to the performance of the device. The substrate material is inevitably damaged in the processing process, defects are left on the surface of the substrate, the substrate is in a round transparent/semitransparent state, the light transmittance is high, the color contrast between the defects and the substrate is low, and therefore, the requirements on nondestructive optical detection are high.
In the substrate defect detection system, the movement modes of the lighting device, the positioning device and the workbench occupy important positions. The illumination mode, angle, light uniformity, intensity and the like directly influence the measurement effect and the difficulty of later image processing; the positioning accuracy is directly affected by the substrate placement mode, the placement flatness and the measurement repeatability; the selection of the movement mode of the workbench directly influences the detection speed, particularly in a high-precision measurement system, the rotary movement is added under the condition of small detection field, and the full-field detection time is shortened.
In the existing detection device, an optical lens surface defect detection system designed by patent CN 204064972U is provided with three light sources and three cameras, and the positioning, the front detection and the back detection of the optical lens are respectively completed. Through the combination of thimble structure and manipulator, accomplish the exchange of optical lens positive and negative, realize the automated inspection of optical lens positive and negative flaw under different stations. However, if the whole system adopts front direct incidence and single light source illumination, the light source does not have tightness, and is easy to be interfered by external light during front and back detection, thus affecting the accuracy of detection results. The device for detecting the semiconductor wafer is designed in the patent CN 204359271U, the movement of the device is controlled by the calculation and analysis of the outline image of the semiconductor wafer by a computer, the detection light is projected at a specific position of the semiconductor wafer, and the light intensity and the spectrum information are sent to the computer by a light path collecting system to form a light intensity and spectrum data information graph corresponding to the position. The light source of the device is embedded in the detection system, only one illumination selection is available, and only the light intensity and spectrum information corresponding to the wafer position can be acquired. The defect measuring device for wafers designed in patent CN 106574900A adopts an upper blower and a lower blower to spray air to the surface of the wafer to fix the wafer, and three measuring devices are configured to detect the defects on the upper, lower and side surfaces of the wafer. However, the device is only suitable for single-size wafer detection, and the positioning accuracy cannot be ensured. Therefore, under the single-light-source illumination mode, the single-size workbench and the positioning device cannot meet the detection requirements of transparent or semitransparent substrate materials with different specifications and different defect types.
Disclosure of Invention
The invention aims to provide a rotary table with backlight for detecting substrate defects, which aims to solve the main technical problem of providing the rotary table with the backlight for detecting the substrate defects.
In order to solve the above technical problems, the present invention provides a rotating table for detecting substrate defects with backlight, comprising: the device comprises a base, a rotary table, a circular adapter plate, a backlight device, a cylindrical connecting bracket and a substrate positioning device;
the bottom end surface of the rotary table is detachably and fixedly connected with the upper surface of the base; the upper surface of the rotary table is connected with the annular connecting plate in a linkage way; the motor drives the rotary table to drive the annular connecting plate to rotate;
the backlight illumination device is arranged on one surface of the annular connecting plate, which is far away from the rotary table, and the light emergent direction of the backlight illumination device is the direction far away from the annular connecting plate; one surface of the backlight illumination device, which is far away from the annular connecting plate, is connected with the substrate positioning device through the cylindrical connecting bracket;
the cylindrical connecting support irradiates the outgoing light of the backlight device into the cylindrical connecting support and blocks the ambient light from entering the cylindrical connecting support.
In a preferred embodiment: the substrate positioning device comprises a plurality of positioning circular ring trays which are arranged in concentric circles.
In a preferred embodiment: the inner side of the positioning circular ring tray is provided with a chamfer slope with an inclination angle of 45 degrees; the upper surface of the positioning circular ring tray is provided with an arc-shaped groove near the inner circle, so that the circular ring tray and the substrate can be conveniently taken and placed.
In a preferred embodiment: the upper surface of the positioning circular ring tray is provided with scales, the scales of each positioning circular ring tray are uniformly arranged at intervals along the radial direction and are arranged in a shape of a Chinese character 'mi' along the circumferential direction at intervals, and the scales are used for positioning, analyzing and reading the relative positions of the defects of the substrate and tracking the positions in the measuring process.
In a preferred embodiment: the inner side wall of the positioning circular ring tray is provided with a substrate positioning edge; the inner side wall of the positioning circular ring tray is provided with circular ring-shaped steps for supporting the substrate.
In a preferred embodiment: the cylindrical connecting support is of a hollow structure in the middle, and a step is arranged on the inner side of the hollow structure and is used for connecting the substrate positioning device and the backlight lighting device;
in a preferred embodiment: the illumination modes of the backlight device comprise direct type backlight illumination, low-angle illumination and high-angle illumination, and are uniform illumination, and the illumination modes are selected according to the defect types of the substrate materials.
In a preferred embodiment: the light intensity adjusting mode of the backlight illuminating device comprises the step of adjusting the area of the whole illuminating device, wherein the whole illuminating device is averagely divided into 8 areas according to a shape like a Chinese character 'mi', each area is provided with a gear switch, and the illumination intensity and angle are selected according to the type and the azimuth of the detected substrate material and the defect.
In a preferred embodiment: the annular adapter plate is used for fixing the backlight illumination device and the rotary table through the counter bore, so that rotation in the rotation process is reduced.
In a preferred embodiment: the two sides of the detachable base are provided with trapezoidal grooves, so that the workbench can be conveniently taken and placed manually.
The invention has the advantages and positive effects that: a rotary workbench with backlight illumination for detecting substrate defects meets the substrate detection requirements of various specifications and sizes, provides various illumination modes and meets the detection requirements of various defect types. The rotary workbench for detection has the advantages of simple structure, light weight, convenience, capability of being used after being placed on a displacement table and high practicability.
Drawings
FIG. 1 is a schematic diagram of a rotary table with backlight for detecting substrate defects;
FIGS. 2 a-2 b are cross-sectional views of a structure of a rotary table for detecting defects on a substrate with backlight according to the present invention in the direction A-A;
FIG. 3 is a top view of a substrate positioning device;
FIG. 4 is an exploded view of a substrate positioning device;
FIGS. 5 a-5B are cross-sectional views of a single positioning ring pallet in the B-B direction;
FIGS. 6 a-6 b are cross-sectional views of a cylindrical connecting bracket in the C-C direction;
FIGS. 7 a-7 b are cross-sectional views of the backlighting arrangement in the direction D-D;
FIG. 8 is a top view of a backlight illumination device;
FIG. 9 is a schematic diagram of substrate defects;
FIGS. 10 a-10 b are cross-sectional views of the annular web in the E-E direction;
FIGS. 11 a-11 c are three views of a rotary table;
fig. 12 a-12 c are three views of the base.
In the figure:
1. substrate positioning device 2, cylindrical connecting support 3 and backlight device
4. Annular connecting plate 5, rotary table 6 and detachable base
11. Circular ring tray 112, circular ring tray 2 13, circular ring tray 3
111. Annular tray support step 112, annular tray ramp groove 113, annular tray graduation line
114. Arc-shaped groove 115 of circular tray, substrate positioning edge 21 and 22 steps
23. Cylindrical support graduation mark 31, low angle backlighting mode 32, high angle backlighting mode
33. Positioning counter bore 51, rotary table main body of direct type backlight illumination modes 41 and 42
52. Positioning holes 63 and trapezoid grooves of rotary table motors 61 and 62
Detailed Description
In order to further explain the objects, technical schemes and features of the present invention, the structure and working principle of the rotary table for detecting substrate defects with backlight according to the present invention will be further described in detail with reference to the accompanying drawings and specific examples.
Fig. 1 and 2 are a schematic structural view and a cross-sectional view of a rotary table for detecting defects of a substrate with backlight according to the present invention. The rotary workbench with the backlight for detecting the substrate defects comprises a substrate positioning device 1, a cylindrical support 2, a backlight device 3, a circular connecting plate 4, a rotary table 5 and a detachable base 6. The substrate positioning device 1 is arranged above the backlight device 3, and the substrate positioning device and the backlight device are fixedly connected through the cylindrical support 2; the annular connecting plate 4 is used for connecting the fixed lighting device 3 and the rotary table 5; the rotary table 5 can drive the lighting device 3, the cylindrical support 2 and the substrate positioning device 1 to perform rotary motion together; the rotary table 5 is fixed above the detachable base 6, and a positioning hole is reserved below the detachable base 6, so that the whole workbench for detection is conveniently fixed above the displacement table.
Positioning of the substrate material the substrate positioning device 1 is shown in fig. 3, 4 in top view and in exploded view. The present invention is exemplified by 2 inch, 4 inch and 6 inch substrates, but is not limited to these 3 size substrate wafers. As can be seen from fig. 3, the positioning device mainly comprises a positioning circular ring tray, when detecting a 6-inch substrate, only the positioning circular ring tray 13 is needed, when detecting a 4-inch substrate, the positioning circular ring tray 12 needs to be added on the positioning circular ring tray 13, and when detecting a 2-inch substrate, the positioning circular ring tray 11 is added on the tray for detecting a 4-inch substrate; each positioning circular ring tray is provided with scale marks 114 with 5mm intervals, the scale marks 114 are scattered in a shape of a Chinese character 'mi' by taking the center of a circle of the circular ring tray as the center, and a substrate positioning edge scale mark is arranged on one side of the circular ring tray, so that the circular substrate is conveniently positioned, and the relative positions of defects can be obtained during measurement so as to be measured again. As shown in fig. 5, the inner side of each circular tray has a substrate positioning edge 115 for fixing and positioning the substrate; three annular steps 111 are arranged on the inner side of each annular tray and are used for supporting a substrate or supporting the annular tray when detecting a substrate wafer; the inner side of the circular ring trays is provided with chamfer slopes 112 which are not more than 45 degrees, so that the circular ring trays can be conveniently taken and placed, and the substrates and the circular ring trays can be conveniently taken and placed; symmetrical arc grooves 113 are also provided on the surface of the ring tray to facilitate manual handling of the substrate wafers.
As shown in FIG. 6, the cylindrical connecting support 2 is of a hollow structure in the middle, a step 21 and a step 22 are arranged on the inner wall of the hollow structure, the substrate positioning device 1 is embedded above, and the lighting device 3 is embedded below. The upper surface of the cylindrical connecting bracket is provided with graduation marks 23 along the circumferential direction for positioning the circular ring tray.
As shown in fig. 7, the lighting device 3 provides three main lighting modes: direct backlight 33, high angle backlight 32 and low angle backlight 31. Selecting direct-lit backlight 33 when detecting full-field defects of the substrate; when defects such as broken corners and pits of the substrate are detected, high-angle backlight illumination 32 is selected; when defects such as scratches, cracks, and the like are detected, the low-angle backlight 31 is selected. The direct backlight 33 is arranged in a circular shape (triangle, diamond, or rice), and the distance between each small bulbs is equal. The uniformity of the lighting device 3 is related to several parameters: the distance between the sample to be measured and the lighting device 3, the lighting angle between the sample to be measured and the light sources, the arrangement of the light sources, the light intensity distribution of each light source, and the like.
Each LED light source in the lighting device 3 is identical, and the light intensity distribution of each light source conforms to the lambertian distribution. The individual LEDs are small in size relative to the entire optical system, so the individual LEDs can be regarded as point light sources. The plurality of LEDs are arranged in an array to improve the total luminous flux, and the arrangement modes of the LEDs can be annular, linear, triangular, rectangular, diamond-shaped and the like. The illuminance at a certain point in space should be a superposition of the illuminance emitted by each LED in the array at that point, and the number of LEDs should be even to ensure uniformity. The distribution function of the light intensity of the single LED is that
I θ ＝I 0 cosθ (1)
Since the light intensity distribution of the light source is a cosine function of the light emission angle, the illuminance of the light beam on the target surface is also a cosine function, that is, the illuminance distribution on the target surface is expressed as:
E(r,θ)＝E 0 (r)cos m θ (2)
wherein θ represents the angle between the light emitted from the LED light source to a point on the target surface and the normal line of the light emitting surface, E 0 (r) represents the illuminance value at the distance r from the light source in the normal direction of the light emitting surface, and the value m depends on the relative position of the LED chip and the curved center of the LED package lens, and is related to primary optical design. N LEDs are arranged into a circular ring array in a rectangular coordinate system, and the radius of the circular ring is r, so that the coordinates of the LEDs are respectivelyn=0, 1,2, …, N. The illuminance at any point in the space illuminated by the LED is expressed as:
from this, the illuminance emitted to the substrate is the superposition of N LED illuminations, the size of the circular array radius r is adjusted to determine that the illuminance distribution uniformity in the central area is the greatest when the substrate plane is away from the light source z, the E (x, y, z) is subjected to the second differentiation, where x=0, y=0,the conditions of maximum uniformity are known as follows:
from the above equation, it can be seen that the radius of the circular array is independent of the number of LEDs, and that the size of N (> 3) does not change the maximum uniformity condition. Therefore, the direct type backlight 31 satisfies the uniformity condition.
The illumination intensity of the illumination device 3 is regulated in two ways, one is that the illumination intensity of each small bulb is regulated through a button; the other is area adjustment, the lighting device 3 is divided into 8 areas according to the shape of a Chinese character 'mi', as shown in fig. 8, each area is provided with a switch, the switch and the illumination intensity adjustment can be controlled, when the illumination intensity is required to be weaker, besides adjusting the brightness of each small bulb, only symmetrical partial areas such as areas 1, 3, 5 and 7 can be started. For defects with different shapes in different areas, when detecting, the light intensity of a single area is controlled to obtain an image with higher contrast, for example, the position of the defect in the area 1 shown in fig. 9, if the light intensity is required to be stronger when detecting the defect, the light intensity of the area 1 can be singly increased.
The annular connecting plate 4 is shown in fig. 10, the upper half part is used for fixing the lighting device 3 on the annular connecting plate 4 through a positioning counter bore 41, and the lower half part is fixedly connected with the rotary table 5 through a positioning counter bore 42.
The turntable 5 is controlled by a stepping motor 52 to drive the substrate positioning device 1 and the backlight device 3 to perform rotary motion, and in the detection system, the XY displacement table can be matched to realize full-field defect detection of the substrate surface.
As shown in FIG. 12, the detachable base 6 has a trapezoid groove 63 on the inner side for facilitating the movement of the workbench, a positioning hole 61 on the upper side for fixing with the annular connecting plate, and a positioning hole 62 on the lower side for directly fixing the workbench on the displacement table. A circular hole 65 is provided in the middle and a recess 64 is provided in the bottom, through which the line of the light source is connected to the outside control switch.
The rotary workbench with the backlight for detecting the substrate defects has the advantages of simple and compact structure and strong practicability, and is suitable for a multi-size, multi-defect and all-dimensional substrate defect detection system. And different detection optical systems are replaced according to different measurement requirements, so that the flexibility is high.
The foregoing is only a preferred embodiment of the present invention, but the design concept of the present invention is not limited thereto, and any person skilled in the art will be able to make insubstantial modifications of the present invention within the scope of the present invention disclosed herein by this concept, which falls within the actions of invading the protection scope of the present invention.
Claims (6)
1. A rotary table for detecting defects of a substrate with backlight illumination, comprising: the device comprises a detachable base, a rotary table, a circular ring-shaped adapter plate, a backlight lighting device, a cylindrical connecting bracket and a substrate positioning device;
the bottom end surface of the rotary table is detachably and fixedly connected with the upper surface of the detachable base; the upper surface of the rotary table is connected with the annular adapter plate in a linkage manner; the motor drives the rotary table to drive the annular adapter plate to rotate;
the backlight illumination device is arranged on one surface of the annular adapter plate, which is far away from the rotary table, and the light emergent direction of the backlight illumination device is the direction far away from the annular adapter plate; one surface of the backlight illumination device, which is far away from the annular adapter plate, is connected with the substrate positioning device through the cylindrical connecting bracket;
the cylindrical connecting bracket irradiates the outgoing light of the backlight device into the cylindrical connecting bracket and blocks the ambient light from entering the cylindrical connecting bracket;
the illumination mode of the backlight illumination device comprises direct type backlight illumination, low-angle illumination and high-angle illumination, and the illumination modes are uniform illumination; selecting direct type backlight illumination when detecting full field defects of the substrate; when detecting the collapse angle and pitting defect of the substrate, selecting high-angle backlight illumination; selecting low-angle backlight illumination when detecting scratches and crack defects;
the substrate positioning device comprises a plurality of positioning circular ring trays which are arranged in concentric circles; the inner side of the positioning circular ring tray is provided with a chamfer slope with an inclination angle of 45 degrees; the upper surface of the positioning circular ring tray is provided with an arc-shaped groove near the inner circle, so that the circular ring tray and the substrate can be conveniently taken and placed; the upper surface of each positioning circular ring tray is provided with scales, the scales of each positioning circular ring tray are uniformly arranged at intervals along the radial direction and are arranged in a shape of a Chinese character 'mi' at intervals along the circumferential direction, and the scales are used for positioning, analyzing and reading the relative positions of the defects of the substrate and tracking the positions in the measuring process; the inner side wall of the positioning circular ring tray is provided with a substrate positioning edge; the inner side wall of the positioning circular ring tray is provided with circular ring-shaped steps for supporting the substrate.
2. The rotary table for detecting defects of a substrate with backlight as claimed in claim 1, wherein: the cylindrical connecting support is of a hollow structure in the middle, and a step is arranged on the inner side of the hollow structure and is used for connecting the substrate positioning device and the backlight lighting device.
3. The rotary table for detecting defects of a substrate with backlight as claimed in claim 1, wherein: the light intensity adjusting mode of the backlight illuminating device comprises the step of adjusting the area of the whole illuminating device, wherein the whole illuminating device is averagely divided into 8 areas according to a shape like a Chinese character 'mi', each area is provided with a gear switch, and the illumination intensity and angle are selected according to the material of the substrate to be tested and the type and the azimuth of the defect.
4. The rotary table for detecting defects of a substrate with backlight as claimed in claim 1, wherein: the annular adapter plate is used for fixing the backlight illumination device and the rotary table through the counter bore, so that rotation in the rotation process is reduced.
5. The rotary table for detecting defects of a substrate with backlight as claimed in claim 1, wherein: the two sides of the detachable base are provided with trapezoidal grooves, so that the workbench can be conveniently taken and placed manually.
6. The rotary table for detecting defects of a substrate with backlight according to claim 1, wherein: the substrate is a transparent/semitransparent round wafer, and the size of the substrate is as follows: one of 2 inches, 4 inches, 6 inches, 8 inches.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201811087515.4A CN109001228B (en) | 2018-09-18 | 2018-09-18 | Rotary workbench with backlight illumination for detecting substrate defects |
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| CN201811087515.4A CN109001228B (en) | 2018-09-18 | 2018-09-18 | Rotary workbench with backlight illumination for detecting substrate defects |
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| CN109001228B true CN109001228B (en) | 2024-02-27 |
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| CN109001228A (en) | 2018-12-14 |
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